JPS53120380A - Measuring method of exposure accuracy of electron ray exposure apparatus - Google Patents

Measuring method of exposure accuracy of electron ray exposure apparatus

Info

Publication number
JPS53120380A
JPS53120380A JP3569377A JP3569377A JPS53120380A JP S53120380 A JPS53120380 A JP S53120380A JP 3569377 A JP3569377 A JP 3569377A JP 3569377 A JP3569377 A JP 3569377A JP S53120380 A JPS53120380 A JP S53120380A
Authority
JP
Japan
Prior art keywords
measuring method
exposure
electron ray
accuracy
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3569377A
Other languages
Japanese (ja)
Other versions
JPS5416192B2 (en
Inventor
Mamoru Nakasuji
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3569377A priority Critical patent/JPS53120380A/en
Publication of JPS53120380A publication Critical patent/JPS53120380A/en
Publication of JPS5416192B2 publication Critical patent/JPS5416192B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To make psssible easy measurement of exposure accuracy from the results of measurement of spacking between patterns by forming the same pattern in a slightly deviated position through double exposure.
COPYRIGHT: (C)1978,JPO&Japio
JP3569377A 1977-03-30 1977-03-30 Measuring method of exposure accuracy of electron ray exposure apparatus Granted JPS53120380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3569377A JPS53120380A (en) 1977-03-30 1977-03-30 Measuring method of exposure accuracy of electron ray exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3569377A JPS53120380A (en) 1977-03-30 1977-03-30 Measuring method of exposure accuracy of electron ray exposure apparatus

Publications (2)

Publication Number Publication Date
JPS53120380A true JPS53120380A (en) 1978-10-20
JPS5416192B2 JPS5416192B2 (en) 1979-06-20

Family

ID=12448968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3569377A Granted JPS53120380A (en) 1977-03-30 1977-03-30 Measuring method of exposure accuracy of electron ray exposure apparatus

Country Status (1)

Country Link
JP (1) JPS53120380A (en)

Also Published As

Publication number Publication date
JPS5416192B2 (en) 1979-06-20

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