JPS53106573A - Gas treatment method of semiconductor wafers - Google Patents
Gas treatment method of semiconductor wafersInfo
- Publication number
- JPS53106573A JPS53106573A JP2125277A JP2125277A JPS53106573A JP S53106573 A JPS53106573 A JP S53106573A JP 2125277 A JP2125277 A JP 2125277A JP 2125277 A JP2125277 A JP 2125277A JP S53106573 A JPS53106573 A JP S53106573A
- Authority
- JP
- Japan
- Prior art keywords
- treatment method
- gas treatment
- semiconductor wafers
- boat
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To pervent influent air from reaching substrates, make possible slow cooling, prevent warpage of the substrates and make possible the automation of putting in and out of boat by placing a shield object slightly smaller in diameter than the inside diameter of a furnace core tube to the end on the downstream side of the boat.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2125277A JPS53106573A (en) | 1977-02-28 | 1977-02-28 | Gas treatment method of semiconductor wafers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2125277A JPS53106573A (en) | 1977-02-28 | 1977-02-28 | Gas treatment method of semiconductor wafers |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53106573A true JPS53106573A (en) | 1978-09-16 |
Family
ID=12049875
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2125277A Pending JPS53106573A (en) | 1977-02-28 | 1977-02-28 | Gas treatment method of semiconductor wafers |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53106573A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5870832A (en) * | 1981-10-23 | 1983-04-27 | Nec Kyushu Ltd | Heat treatment system |
-
1977
- 1977-02-28 JP JP2125277A patent/JPS53106573A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5870832A (en) * | 1981-10-23 | 1983-04-27 | Nec Kyushu Ltd | Heat treatment system |
JPS6259626B2 (en) * | 1981-10-23 | 1987-12-11 | Kyushu Nippon Electric |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5295173A (en) | Lead frame | |
JPS53106573A (en) | Gas treatment method of semiconductor wafers | |
JPS5240059A (en) | Process for production of semiconductor device | |
JPS5391446A (en) | Air conditioner | |
JPS52143760A (en) | Quartz tube in heat treatment furnace | |
JPS5426664A (en) | Tool for heat treatment of semiconductor wafer | |
JPS53142185A (en) | Manufacture of walled emitter type semiconductor device | |
JPS543473A (en) | Manufacture of semiconductor device | |
JPS52149969A (en) | Method of putting wafers into and out from reaction tube in heat-treatment furnace | |
JPS542670A (en) | Plasma etching method | |
JPS5219347A (en) | Method to cool down transport pipe line of low temperature liquefied g as | |
JPS5425159A (en) | Thermal processing method for semiconductor | |
JPS52155969A (en) | Reduced pressure heat treatment furnace of semiconductor wafers | |
JPS53123081A (en) | Semiconductor wafer heat treatment apparatus | |
JPS5365058A (en) | Production of semiconductor device | |
JPS51131458A (en) | A process for treatment of high temperature high pressure exhaust gas | |
JPS51148609A (en) | Process for the control of sulfur oxide in exhaust gas at sintering pr ocess | |
JPS5230171A (en) | Method for fabrication of semiconductor device | |
JPS52154361A (en) | Production of semiconductor device | |
JPS5424575A (en) | Handling method of wafer | |
JPS53117380A (en) | Heat treatmetn apparatus for semiconductor wafers | |
JPS5357974A (en) | Electron beam exposure method | |
JPS5237653A (en) | Prevention of a bolt from falling off | |
JPS51116988A (en) | Manufacturing method of a cable with fins | |
JPS5346271A (en) | Impurity gettering method in quartz tube for furnace |