JPS53104173A - Master reticle for photo mask production - Google Patents

Master reticle for photo mask production

Info

Publication number
JPS53104173A
JPS53104173A JP1823177A JP1823177A JPS53104173A JP S53104173 A JPS53104173 A JP S53104173A JP 1823177 A JP1823177 A JP 1823177A JP 1823177 A JP1823177 A JP 1823177A JP S53104173 A JPS53104173 A JP S53104173A
Authority
JP
Japan
Prior art keywords
photo mask
master reticle
mask production
reticle
master
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1823177A
Other languages
Japanese (ja)
Inventor
Tadao Kachi
Michio Hirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1823177A priority Critical patent/JPS53104173A/en
Publication of JPS53104173A publication Critical patent/JPS53104173A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To shorten the time in producing a photo mask by providing many same unit patterns, which can be printed simultaneously, closely in parallel in a master reticle which is constituted by single pattern.
COPYRIGHT: (C)1978,JPO&Japio
JP1823177A 1977-02-23 1977-02-23 Master reticle for photo mask production Pending JPS53104173A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1823177A JPS53104173A (en) 1977-02-23 1977-02-23 Master reticle for photo mask production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1823177A JPS53104173A (en) 1977-02-23 1977-02-23 Master reticle for photo mask production

Publications (1)

Publication Number Publication Date
JPS53104173A true JPS53104173A (en) 1978-09-11

Family

ID=11965886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1823177A Pending JPS53104173A (en) 1977-02-23 1977-02-23 Master reticle for photo mask production

Country Status (1)

Country Link
JP (1) JPS53104173A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6438747A (en) * 1987-08-04 1989-02-09 Sanyo Electric Co Production of photomask
WO2004079799A1 (en) * 2003-03-05 2004-09-16 Tadahiro Ohmi Mask repeater and mask manufacturing method
JP2005183692A (en) * 2003-12-19 2005-07-07 Tadahiro Omi Mask forming apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6438747A (en) * 1987-08-04 1989-02-09 Sanyo Electric Co Production of photomask
JPH0545944B2 (en) * 1987-08-04 1993-07-12 Sanyo Electric Co
WO2004079799A1 (en) * 2003-03-05 2004-09-16 Tadahiro Ohmi Mask repeater and mask manufacturing method
JP2005183692A (en) * 2003-12-19 2005-07-07 Tadahiro Omi Mask forming apparatus

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