JPS53104173A - Master reticle for photo mask production - Google Patents
Master reticle for photo mask productionInfo
- Publication number
- JPS53104173A JPS53104173A JP1823177A JP1823177A JPS53104173A JP S53104173 A JPS53104173 A JP S53104173A JP 1823177 A JP1823177 A JP 1823177A JP 1823177 A JP1823177 A JP 1823177A JP S53104173 A JPS53104173 A JP S53104173A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- master reticle
- mask production
- reticle
- master
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To shorten the time in producing a photo mask by providing many same unit patterns, which can be printed simultaneously, closely in parallel in a master reticle which is constituted by single pattern.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1823177A JPS53104173A (en) | 1977-02-23 | 1977-02-23 | Master reticle for photo mask production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1823177A JPS53104173A (en) | 1977-02-23 | 1977-02-23 | Master reticle for photo mask production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53104173A true JPS53104173A (en) | 1978-09-11 |
Family
ID=11965886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1823177A Pending JPS53104173A (en) | 1977-02-23 | 1977-02-23 | Master reticle for photo mask production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53104173A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6438747A (en) * | 1987-08-04 | 1989-02-09 | Sanyo Electric Co | Production of photomask |
WO2004079799A1 (en) * | 2003-03-05 | 2004-09-16 | Tadahiro Ohmi | Mask repeater and mask manufacturing method |
JP2005183692A (en) * | 2003-12-19 | 2005-07-07 | Tadahiro Omi | Mask forming apparatus |
-
1977
- 1977-02-23 JP JP1823177A patent/JPS53104173A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6438747A (en) * | 1987-08-04 | 1989-02-09 | Sanyo Electric Co | Production of photomask |
JPH0545944B2 (en) * | 1987-08-04 | 1993-07-12 | Sanyo Electric Co | |
WO2004079799A1 (en) * | 2003-03-05 | 2004-09-16 | Tadahiro Ohmi | Mask repeater and mask manufacturing method |
JP2005183692A (en) * | 2003-12-19 | 2005-07-07 | Tadahiro Omi | Mask forming apparatus |
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