JPS526853B2 - - Google Patents
Info
- Publication number
- JPS526853B2 JPS526853B2 JP47129102A JP12910272A JPS526853B2 JP S526853 B2 JPS526853 B2 JP S526853B2 JP 47129102 A JP47129102 A JP 47129102A JP 12910272 A JP12910272 A JP 12910272A JP S526853 B2 JPS526853 B2 JP S526853B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47129102A JPS526853B2 (ja) | 1972-12-22 | 1972-12-22 | |
US425827A US3905907A (en) | 1972-12-22 | 1973-12-18 | Solutions for chemical dissolution treatment of metal materials |
DE2364162A DE2364162C3 (de) | 1972-12-22 | 1973-12-21 | Saure wäßrige Metallbehandlungslösung |
GB5955073A GB1455464A (en) | 1972-12-22 | 1973-12-21 | Solutions and processes for the treatment of metal surfaces |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47129102A JPS526853B2 (ja) | 1972-12-22 | 1972-12-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4986225A JPS4986225A (ja) | 1974-08-19 |
JPS526853B2 true JPS526853B2 (ja) | 1977-02-25 |
Family
ID=15001105
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP47129102A Expired JPS526853B2 (ja) | 1972-12-22 | 1972-12-22 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3905907A (ja) |
JP (1) | JPS526853B2 (ja) |
DE (1) | DE2364162C3 (ja) |
GB (1) | GB1455464A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59101123U (ja) * | 1982-12-24 | 1984-07-07 | 木村工機株式会社 | エア−コンデイシヨナ− |
JPH03255820A (ja) * | 1990-03-05 | 1991-11-14 | Mitsubishi Electric Corp | 空気調和機 |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5418228B2 (ja) * | 1973-03-02 | 1979-07-05 | ||
JPS5161500A (ja) * | 1974-11-27 | 1976-05-28 | Dai Ichi Kogyo Seiyaku Co Ltd | Kasankasuisosuiyozonenzai |
SE400581B (sv) * | 1974-12-13 | 1978-04-03 | Nordnero Ab | Bad for kemisk polering av koppar och dess legeringar |
SE400575B (sv) * | 1974-12-13 | 1978-04-03 | Nordnero Ab | Bad for betning av koppar och dess legeringar |
FR2297906A1 (fr) * | 1975-01-14 | 1976-08-13 | Ugine Kuhlmann | Stabilisation du peroxyde d'hydrogene dans les bains acides pour le decapage des metaux |
JPS5286933A (en) * | 1976-01-14 | 1977-07-20 | Tokai Electro Chemical Co | Method of treating surface of copper and copper alloy |
US4067751A (en) * | 1976-05-11 | 1978-01-10 | Vereinigte Metallwerke Ranshofen-Berndorf Aktiengesellschaft | Aqueous NaCl test solution for aluminum and its alloys |
US4080246A (en) * | 1976-06-29 | 1978-03-21 | Gaf Corporation | Novel etching composition and method for using same |
US4169068A (en) * | 1976-08-20 | 1979-09-25 | Japan Synthetic Rubber Company Limited | Stripping liquor composition for removing photoresists comprising hydrogen peroxide |
US4220706A (en) * | 1978-05-10 | 1980-09-02 | Rca Corporation | Etchant solution containing HF-HnO3 -H2 SO4 -H2 O2 |
BE871631A (fr) * | 1978-10-27 | 1979-04-27 | Centre Rech Metallurgique | Procede de decapage continu de toles en acier. |
DE2847267C2 (de) * | 1978-10-31 | 1993-12-23 | Decker Gmbh & Co Kg Geb | Stabilisator für eine wäßrige Lösung zum Beizen und/oder chemischen Glänzen von Gegenständen aus Kupfer oder Kupferlegierungen in einem mehrstufigen Verfahren und Verwendung des Stabilisators |
DE2849894A1 (de) * | 1978-11-17 | 1980-05-29 | Hoechst Ag | Verfahren zum reinigen von kupfer enthaltenden metalloberflaechen |
US4233112A (en) * | 1979-06-25 | 1980-11-11 | Dart Industries Inc. | Dissolution of metals utilizing an aqueous H2 SO4 -H2 O2 -polysulfide etchant |
US4236957A (en) * | 1979-06-25 | 1980-12-02 | Dart Industries Inc. | Dissolution of metals utilizing an aqueous H2 SOY --H2 O.sub. -mercapto containing heterocyclic nitrogen etchant |
US4233113A (en) * | 1979-06-25 | 1980-11-11 | Dart Industries Inc. | Dissolution of metals utilizing an aqueous H2 O2 -H2 SO4 -thioamide etchant |
US4233111A (en) * | 1979-06-25 | 1980-11-11 | Dart Industries Inc. | Dissolution of metals utilizing an aqueous H2 SO4 -H2 O2 -3-sulfopropyldithiocarbamate etchant |
US4746369A (en) * | 1982-01-11 | 1988-05-24 | Enthone, Incorporated | Peroxide selective stripping compositions and method |
JPS58197277A (ja) * | 1982-05-08 | 1983-11-16 | Mitsubishi Gas Chem Co Inc | 金属の化学的溶解処理液 |
DE3244443C2 (de) * | 1982-12-01 | 1986-11-06 | Späne, Rainer, 7888 Rheinfelden | Verfahren zur Entfernung von eisen-, calcium- und manganhaltigen Verockerungen und/oder Versinterungen aus zur Wasserversorgung betriebenen Einrichtungen |
US4491500A (en) * | 1984-02-17 | 1985-01-01 | Rem Chemicals, Inc. | Method for refinement of metal surfaces |
DE3642604A1 (de) * | 1986-12-13 | 1988-06-23 | Henkel Kgaa | Verwendung kurzkettiger alkansulfonsaeuren in reinigungs- und desinfektionsmitteln |
JPS63172799A (ja) * | 1987-01-12 | 1988-07-16 | 日本パ−カライジング株式会社 | アルミニウムの表面洗浄剤 |
US4946520A (en) * | 1987-02-02 | 1990-08-07 | Phelps Dodge Industries, Inc. | Copper rod manufactured by casting, hot rolling and chemically shaving and pickling |
US4754803A (en) * | 1987-02-02 | 1988-07-05 | Phelps Dodge Industries, Inc. | Manufacturing copper rod by casting, hot rolling and chemically shaving and pickling |
US4812173A (en) * | 1987-05-01 | 1989-03-14 | Ciba-Geigy Corporation | Stabilized hydrogen peroxide contact lens disinfecting solution |
US4851077A (en) * | 1988-05-19 | 1989-07-25 | Mcdonnell Douglas Corporation | Chemical milling of lithium aluminum alloy |
US5052421A (en) * | 1988-07-19 | 1991-10-01 | Henkel Corporation | Treatment of aluminum with non-chrome cleaner/deoxidizer system followed by conversion coating |
GB8829253D0 (en) * | 1988-12-15 | 1989-01-25 | Imasa Ltd | Method of removing deposits of tin lead or tin/lead alloys from copper substrates and compositions for use therein |
DE3900207A1 (de) * | 1989-01-05 | 1990-07-12 | Basf Ag | Verwendung von copolymerisaten aus 1,2-di-alkoxyethylenen und monoethylenisch ungesaettigten dicarbonsaeureanhydriden in waschmitteln und waschmittel, die diese copolymerisate enthalten |
FR2650303B1 (fr) * | 1989-07-26 | 1993-12-10 | Ugine Aciers Chatillon Gueugnon | Procede de decapage en bain acide de produits metalliques contenant du titane ou au moins un element chimique de la famille du titane |
US5248386A (en) * | 1991-02-08 | 1993-09-28 | Aluminum Company Of America | Milling solution and method |
US5100500A (en) * | 1991-02-08 | 1992-03-31 | Aluminum Company Of America | Milling solution and method |
IT1255855B (it) * | 1992-10-12 | 1995-11-17 | Cesare Pedrazzini | Processo di decapaggio e di passivazione per lamiere di titanio in nastro, senza impiego di acido nitrico. |
JPH07295170A (ja) * | 1994-04-20 | 1995-11-10 | Eastman Kodak Co | 漂白剤組成物 |
US5454876A (en) * | 1994-08-02 | 1995-10-03 | 21St Century Companies, Inc. | Process for reducing lead leachate in brass plumbing components |
TW466728B (en) * | 1999-05-21 | 2001-12-01 | Cfmt Inc | Methods for wet processing electronic components having copper containing surfaces |
ATE404498T1 (de) * | 2001-04-09 | 2008-08-15 | Ak Steel Properties Inc | Verfahren und vorrichtung zur entfernung von wasserstoffperoxid aus beizlösungen |
CN1244717C (zh) | 2001-04-09 | 2006-03-08 | Ak资产公司 | 用于不锈钢级的过氧化氢酸洗方案 |
EP1377692B1 (en) | 2001-04-09 | 2005-11-09 | AK Steel Properties, Inc. | Hydrogen peroxide pickling of silicon-containing electrical steel grades |
JP2003045539A (ja) * | 2001-05-22 | 2003-02-14 | Enplas Corp | コンタクトピン及び電気部品用ソケット |
JP4047556B2 (ja) * | 2001-05-22 | 2008-02-13 | 株式会社エンプラス | コンタクトピン及び電気部品用ソケット |
DE102005011298A1 (de) | 2005-03-04 | 2006-09-07 | Gebr. Schmid Gmbh & Co. | Vorrichtung und Verfahren zum Ätzen von Substraten |
KR100712879B1 (ko) | 2005-04-06 | 2007-04-30 | 주식회사 잉크테크 | 에칭액 조성물 |
US7976723B2 (en) * | 2007-05-17 | 2011-07-12 | International Business Machines Corporation | Method for kinetically controlled etching of copper |
KR101845083B1 (ko) * | 2010-12-10 | 2018-04-04 | 동우 화인켐 주식회사 | 액정표시장치용 어레이 기판의 제조방법 |
DE102010054509A1 (de) * | 2010-12-14 | 2012-06-14 | Thyssenkrupp Electrical Steel Gmbh | Verfahren zur Herstellung eines kornorientierten Elektrobands |
JP2013199702A (ja) * | 2012-02-24 | 2013-10-03 | Mitsubishi Shindoh Co Ltd | 銅或いは銅基合金表面の酸化皮膜の除去方法 |
CN104327857B (zh) * | 2014-09-30 | 2016-01-13 | 江西省平波电子有限公司 | 一种触摸屏用蚀刻液及其制备方法 |
US20230317464A1 (en) * | 2022-03-31 | 2023-10-05 | Fujifilm Electronic Materials U.S.A., Inc. | Surface Treatment Compositions and Methods |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2428804A (en) * | 1945-09-07 | 1947-10-14 | Esther M Terry | Copper cleaning composition |
DE974400C (de) * | 1952-11-16 | 1960-12-15 | Henkel & Cie Gmbh | Beize fuer Buntmetalle |
DE1121594B (de) * | 1960-07-07 | 1962-01-11 | Henkel & Cie Gmbh | Verfahren zur Herstellung fluessiger, lagerbestaendiger, Aktivsauerstoff enthaltender Konzentrate |
US3232884A (en) * | 1961-05-31 | 1966-02-01 | Lemaire Emile | Baths for photogravure process |
US3389066A (en) * | 1964-06-03 | 1968-06-18 | Kyowa Hakko Kogyo Kk | Method for electrolytically polishing iron and iron alloys |
DE1253008B (de) * | 1964-08-22 | 1967-10-26 | Degussa | Verfahren zum AEtzen von Kupferfolien fuer die Herstellung von gedruckten Schaltungen |
DE1287406B (de) * | 1964-08-25 | 1969-01-16 | Standard Elektrik Lorenz Ag | AEtzbad zum Abaetzen von Kupfer, insbesondere von kupferkaschierten Isolierstoffplatten |
US3412032A (en) * | 1965-02-01 | 1968-11-19 | Revere Copper & Brass Inc | Etching bath composition |
FR1468442A (fr) * | 1965-04-27 | 1967-02-03 | Lancy Lab | Décapage de cuivre |
US3337462A (en) * | 1965-10-25 | 1967-08-22 | Dow Chemical Co | Etching bath and method of etching |
JPS502382B1 (ja) * | 1967-03-31 | 1975-01-25 | ||
GB1279834A (en) * | 1968-10-07 | 1972-06-28 | Chugai Kasei Co Ltd | Improvements in metal cleaning and etching compositions |
JPS5010698B1 (ja) * | 1970-12-26 | 1975-04-23 | ||
BE791457A (fr) * | 1971-11-18 | 1973-05-16 | Du Pont | Solutions acides stabilisees d'eau oxygenee |
-
1972
- 1972-12-22 JP JP47129102A patent/JPS526853B2/ja not_active Expired
-
1973
- 1973-12-18 US US425827A patent/US3905907A/en not_active Expired - Lifetime
- 1973-12-21 GB GB5955073A patent/GB1455464A/en not_active Expired
- 1973-12-21 DE DE2364162A patent/DE2364162C3/de not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59101123U (ja) * | 1982-12-24 | 1984-07-07 | 木村工機株式会社 | エア−コンデイシヨナ− |
JPH03255820A (ja) * | 1990-03-05 | 1991-11-14 | Mitsubishi Electric Corp | 空気調和機 |
Also Published As
Publication number | Publication date |
---|---|
JPS4986225A (ja) | 1974-08-19 |
US3905907A (en) | 1975-09-16 |
GB1455464A (en) | 1976-11-10 |
DE2364162C3 (de) | 1982-09-02 |
DE2364162B2 (de) | 1976-12-23 |
DE2364162A1 (de) | 1974-07-11 |