JPS5219984A - Manufacture process for a isolation layer used to make a semiconductor element - Google Patents

Manufacture process for a isolation layer used to make a semiconductor element

Info

Publication number
JPS5219984A
JPS5219984A JP9605375A JP9605375A JPS5219984A JP S5219984 A JPS5219984 A JP S5219984A JP 9605375 A JP9605375 A JP 9605375A JP 9605375 A JP9605375 A JP 9605375A JP S5219984 A JPS5219984 A JP S5219984A
Authority
JP
Japan
Prior art keywords
make
isolation layer
semiconductor element
manufacture process
layer used
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9605375A
Other languages
Japanese (ja)
Inventor
Ryosaku Komatsu
Yoshio Haruhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9605375A priority Critical patent/JPS5219984A/en
Publication of JPS5219984A publication Critical patent/JPS5219984A/en
Pending legal-status Critical Current

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  • Element Separation (AREA)

Abstract

PURPOSE: To pour p type ion to the N type semiconductor substrate an order to make a p type conductine area as a isolation layer. In this way, we make plural isolation layers at the same time with a desired size and high precision, saving the manufacture work.
COPYRIGHT: (C)1977,JPO&Japio
JP9605375A 1975-08-07 1975-08-07 Manufacture process for a isolation layer used to make a semiconductor element Pending JPS5219984A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9605375A JPS5219984A (en) 1975-08-07 1975-08-07 Manufacture process for a isolation layer used to make a semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9605375A JPS5219984A (en) 1975-08-07 1975-08-07 Manufacture process for a isolation layer used to make a semiconductor element

Publications (1)

Publication Number Publication Date
JPS5219984A true JPS5219984A (en) 1977-02-15

Family

ID=14154703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9605375A Pending JPS5219984A (en) 1975-08-07 1975-08-07 Manufacture process for a isolation layer used to make a semiconductor element

Country Status (1)

Country Link
JP (1) JPS5219984A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS577927A (en) * 1980-06-17 1982-01-16 Matsushita Electronics Corp Manufacture of semiconductor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4929792A (en) * 1972-07-18 1974-03-16

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4929792A (en) * 1972-07-18 1974-03-16

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS577927A (en) * 1980-06-17 1982-01-16 Matsushita Electronics Corp Manufacture of semiconductor

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