JPS5213775A - Production method of semiconductor device - Google Patents

Production method of semiconductor device

Info

Publication number
JPS5213775A
JPS5213775A JP8914475A JP8914475A JPS5213775A JP S5213775 A JPS5213775 A JP S5213775A JP 8914475 A JP8914475 A JP 8914475A JP 8914475 A JP8914475 A JP 8914475A JP S5213775 A JPS5213775 A JP S5213775A
Authority
JP
Japan
Prior art keywords
semiconductor device
production method
oxidation film
temperature
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8914475A
Other languages
Japanese (ja)
Inventor
Hiroaki Shimizu
Kenichi Muramoto
Hidenori Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8914475A priority Critical patent/JPS5213775A/en
Publication of JPS5213775A publication Critical patent/JPS5213775A/en
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)

Abstract

PURPOSE: In order to promote the adhesiveness of photo-resist film, through forming a oxidation film with the temperature which does not injure the characteristics of a semiconductor on a oxidation film, which contains phosphorous, being formed with high temperature.
COPYRIGHT: (C)1977,JPO&Japio
JP8914475A 1975-07-23 1975-07-23 Production method of semiconductor device Pending JPS5213775A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8914475A JPS5213775A (en) 1975-07-23 1975-07-23 Production method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8914475A JPS5213775A (en) 1975-07-23 1975-07-23 Production method of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5213775A true JPS5213775A (en) 1977-02-02

Family

ID=13962661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8914475A Pending JPS5213775A (en) 1975-07-23 1975-07-23 Production method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5213775A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5439326A (en) * 1977-09-02 1979-03-26 Inoue Japax Res Inc Electrolyte

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5439326A (en) * 1977-09-02 1979-03-26 Inoue Japax Res Inc Electrolyte

Similar Documents

Publication Publication Date Title
JPS51123561A (en) Production method of semicondvctor device
JPS52128066A (en) Manufacture of semiconductor device
JPS5240059A (en) Process for production of semiconductor device
JPS5213775A (en) Production method of semiconductor device
JPS529379A (en) Semiconductor device manufacturing process
JPS51134566A (en) Semiconductor unit manufacturing process
JPS51130176A (en) Semiconductor device process
JPS51118391A (en) Manufacturing process for semiconducter unit
JPS51147286A (en) Manufacturing process of semiconductor
JPS51147184A (en) Method of mawufacturing of mosic circuit device
JPS51112292A (en) Semiconductor device
JPS528787A (en) Semiconductor device process
JPS51134587A (en) Production method of semiconductor integrated-circuit device
JPS51132763A (en) Production method of semiconductor device
JPS5242369A (en) Process for production of semiconductor device
JPS52179A (en) Method of fabricating semiconductor
JPS5377168A (en) Production of semiconductor device
JPS51151071A (en) Manufacturing method of a semiconductor apparatus
JPS51112279A (en) Semiconductor device
JPS52154343A (en) Production of semiconductor device
JPS51151089A (en) Manufacturing method of a semiconductor
JPS51137390A (en) Thin film current magnetic effect element manufacturing method
JPS51113469A (en) Manufacturing method of semiconductor device
JPS5261956A (en) Production of semiconductor device
JPS5211867A (en) Manufacturing method of a semiconductor device