JPS5244571A - Method of forming fine pattern - Google Patents
Method of forming fine patternInfo
- Publication number
- JPS5244571A JPS5244571A JP12096275A JP12096275A JPS5244571A JP S5244571 A JPS5244571 A JP S5244571A JP 12096275 A JP12096275 A JP 12096275A JP 12096275 A JP12096275 A JP 12096275A JP S5244571 A JPS5244571 A JP S5244571A
- Authority
- JP
- Japan
- Prior art keywords
- fine pattern
- forming fine
- corrosion resistance
- ion implantation
- photoresist film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Abstract
PURPOSE: To provide corrosion resistance to a photoresist film by ion implantation thereby performing etching of a fine pattern.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12096275A JPS5244571A (en) | 1975-10-06 | 1975-10-06 | Method of forming fine pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12096275A JPS5244571A (en) | 1975-10-06 | 1975-10-06 | Method of forming fine pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5244571A true JPS5244571A (en) | 1977-04-07 |
Family
ID=14799296
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12096275A Pending JPS5244571A (en) | 1975-10-06 | 1975-10-06 | Method of forming fine pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5244571A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57157523A (en) * | 1981-03-25 | 1982-09-29 | Hitachi Ltd | Forming method for pattern |
JPS5884430A (en) * | 1981-11-14 | 1983-05-20 | Daikin Ind Ltd | Method of increasing etching resistance of resist film |
-
1975
- 1975-10-06 JP JP12096275A patent/JPS5244571A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57157523A (en) * | 1981-03-25 | 1982-09-29 | Hitachi Ltd | Forming method for pattern |
JPS5884430A (en) * | 1981-11-14 | 1983-05-20 | Daikin Ind Ltd | Method of increasing etching resistance of resist film |
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