JPS53105982A - Micropattern formation method - Google Patents
Micropattern formation methodInfo
- Publication number
- JPS53105982A JPS53105982A JP2123377A JP2123377A JPS53105982A JP S53105982 A JPS53105982 A JP S53105982A JP 2123377 A JP2123377 A JP 2123377A JP 2123377 A JP2123377 A JP 2123377A JP S53105982 A JPS53105982 A JP S53105982A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- formation method
- micropattern
- micropattern formation
- thicknesst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To obtain a micropattern of thicknesst, by providing the auxiliary thin film of more than 2t thickness onto the thin film of thicknesst or the resist mask, giving an ion etching only to the auxiliary thin film using the resist formed on the auxiliary thin film for the mask and then giving an etching with no exfoliation of the resist mask.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2123377A JPS53105982A (en) | 1977-02-28 | 1977-02-28 | Micropattern formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2123377A JPS53105982A (en) | 1977-02-28 | 1977-02-28 | Micropattern formation method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53105982A true JPS53105982A (en) | 1978-09-14 |
JPS6152568B2 JPS6152568B2 (en) | 1986-11-13 |
Family
ID=12049304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2123377A Granted JPS53105982A (en) | 1977-02-28 | 1977-02-28 | Micropattern formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53105982A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60137023A (en) * | 1983-12-26 | 1985-07-20 | Fujitsu Ltd | Forming method of pattern and device used for executing said method |
JPS60140725A (en) * | 1983-12-28 | 1985-07-25 | Fujitsu Ltd | Pattern forming method |
JP2012208481A (en) * | 2011-03-11 | 2012-10-25 | Semiconductor Energy Lab Co Ltd | Liquid crystal display device and manufacturing method for liquid crystal display device |
-
1977
- 1977-02-28 JP JP2123377A patent/JPS53105982A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60137023A (en) * | 1983-12-26 | 1985-07-20 | Fujitsu Ltd | Forming method of pattern and device used for executing said method |
JPS60140725A (en) * | 1983-12-28 | 1985-07-25 | Fujitsu Ltd | Pattern forming method |
JPH0469418B2 (en) * | 1983-12-28 | 1992-11-06 | Fujitsu Ltd | |
JP2012208481A (en) * | 2011-03-11 | 2012-10-25 | Semiconductor Energy Lab Co Ltd | Liquid crystal display device and manufacturing method for liquid crystal display device |
US9454048B2 (en) | 2011-03-11 | 2016-09-27 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device and manufacturing method of liquid crystal display device |
Also Published As
Publication number | Publication date |
---|---|
JPS6152568B2 (en) | 1986-11-13 |
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