JPS5114181A - KISHITSUNOHI FUKUHOHO - Google Patents
KISHITSUNOHI FUKUHOHOInfo
- Publication number
- JPS5114181A JPS5114181A JP7498975A JP7498975A JPS5114181A JP S5114181 A JPS5114181 A JP S5114181A JP 7498975 A JP7498975 A JP 7498975A JP 7498975 A JP7498975 A JP 7498975A JP S5114181 A JPS5114181 A JP S5114181A
- Authority
- JP
- Japan
- Prior art keywords
- kishitsunohi
- fukuhoho
- kishitsunohi fukuhoho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US48090974A | 1974-06-19 | 1974-06-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5114181A true JPS5114181A (en) | 1976-02-04 |
Family
ID=23909852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7498975A Pending JPS5114181A (en) | 1974-06-19 | 1975-06-19 | KISHITSUNOHI FUKUHOHO |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5114181A (en) |
DE (1) | DE2513813A1 (en) |
FR (1) | FR2288793A1 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55104478A (en) * | 1979-01-30 | 1980-08-09 | Nippon Kogaku Kk <Nikon> | Metallizing apparatus |
JPS6096756A (en) * | 1983-10-27 | 1985-05-30 | Mitsubishi Electric Corp | Vapor deposition apparatus |
JPH01108364A (en) * | 1987-10-19 | 1989-04-25 | Ishikawajima Harima Heavy Ind Co Ltd | Method for supplying material for vapor deposition of vapor source |
JP2006504869A (en) * | 2002-11-05 | 2006-02-09 | テバ ドュンシッヒトテヒニク ゲーエムベーハー | Apparatus and method for depositing a coating material |
JP2013007083A (en) * | 2011-06-23 | 2013-01-10 | Fujifilm Corp | Film forming apparatus |
CN105586570A (en) * | 2014-11-17 | 2016-05-18 | 上海和辉光电有限公司 | Radiation source evaporation system and evaporation control method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7398605B2 (en) * | 2005-02-04 | 2008-07-15 | Eastman Kodak Company | Method of feeding particulate material to a heated vaporization surface |
-
1975
- 1975-03-27 DE DE19752513813 patent/DE2513813A1/en active Pending
- 1975-06-10 FR FR7518101A patent/FR2288793A1/en not_active Withdrawn
- 1975-06-19 JP JP7498975A patent/JPS5114181A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55104478A (en) * | 1979-01-30 | 1980-08-09 | Nippon Kogaku Kk <Nikon> | Metallizing apparatus |
JPS6096756A (en) * | 1983-10-27 | 1985-05-30 | Mitsubishi Electric Corp | Vapor deposition apparatus |
JPH01108364A (en) * | 1987-10-19 | 1989-04-25 | Ishikawajima Harima Heavy Ind Co Ltd | Method for supplying material for vapor deposition of vapor source |
JP2006504869A (en) * | 2002-11-05 | 2006-02-09 | テバ ドュンシッヒトテヒニク ゲーエムベーハー | Apparatus and method for depositing a coating material |
JP2013007083A (en) * | 2011-06-23 | 2013-01-10 | Fujifilm Corp | Film forming apparatus |
CN105586570A (en) * | 2014-11-17 | 2016-05-18 | 上海和辉光电有限公司 | Radiation source evaporation system and evaporation control method |
Also Published As
Publication number | Publication date |
---|---|
FR2288793A1 (en) | 1976-05-21 |
DE2513813A1 (en) | 1976-01-02 |
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