JPS5091272A - - Google Patents
Info
- Publication number
- JPS5091272A JPS5091272A JP13775273A JP13775273A JPS5091272A JP S5091272 A JPS5091272 A JP S5091272A JP 13775273 A JP13775273 A JP 13775273A JP 13775273 A JP13775273 A JP 13775273A JP S5091272 A JPS5091272 A JP S5091272A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13775273A JPS5091272A (ja) | 1973-12-12 | 1973-12-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13775273A JPS5091272A (ja) | 1973-12-12 | 1973-12-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5091272A true JPS5091272A (ja) | 1975-07-21 |
Family
ID=15205994
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13775273A Pending JPS5091272A (ja) | 1973-12-12 | 1973-12-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5091272A (ja) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5374384A (en) * | 1976-12-15 | 1978-07-01 | Toshiba Corp | Semiconductor device and its manufacture |
| JPS54152868A (en) * | 1978-05-24 | 1979-12-01 | Hitachi Ltd | Manufacture of semiconductor device |
| JPS55130168A (en) * | 1979-03-29 | 1980-10-08 | Fujitsu Ltd | Method of forming mos oxide film |
| JPS60154628A (ja) * | 1984-01-25 | 1985-08-14 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置の製造方法 |
| JPS61193456A (ja) * | 1985-02-21 | 1986-08-27 | Toshiba Corp | 半導体素子の製造方法 |
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1973
- 1973-12-12 JP JP13775273A patent/JPS5091272A/ja active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5374384A (en) * | 1976-12-15 | 1978-07-01 | Toshiba Corp | Semiconductor device and its manufacture |
| JPS54152868A (en) * | 1978-05-24 | 1979-12-01 | Hitachi Ltd | Manufacture of semiconductor device |
| JPS55130168A (en) * | 1979-03-29 | 1980-10-08 | Fujitsu Ltd | Method of forming mos oxide film |
| JPS6131613B2 (ja) * | 1979-03-29 | 1986-07-21 | Fujitsu Ltd | |
| JPS60154628A (ja) * | 1984-01-25 | 1985-08-14 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置の製造方法 |
| JPS61193456A (ja) * | 1985-02-21 | 1986-08-27 | Toshiba Corp | 半導体素子の製造方法 |
| JPH0380338B2 (ja) * | 1985-02-21 | 1991-12-24 | Toshiba Kk |