JPS505084B1 - - Google Patents

Info

Publication number
JPS505084B1
JPS505084B1 JP8050970A JP8050970A JPS505084B1 JP S505084 B1 JPS505084 B1 JP S505084B1 JP 8050970 A JP8050970 A JP 8050970A JP 8050970 A JP8050970 A JP 8050970A JP S505084 B1 JPS505084 B1 JP S505084B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8050970A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8050970A priority Critical patent/JPS505084B1/ja
Priority to DE19712146166 priority patent/DE2146166A1/en
Priority to GB4324871A priority patent/GB1330932A/en
Publication of JPS505084B1 publication Critical patent/JPS505084B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
JP8050970A 1970-09-16 1970-09-16 Pending JPS505084B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8050970A JPS505084B1 (en) 1970-09-16 1970-09-16
DE19712146166 DE2146166A1 (en) 1970-09-16 1971-09-15 Photosensitive mass
GB4324871A GB1330932A (en) 1970-09-16 1971-09-16 Phenolic resin condensation product and light-sensitive compositions containing it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8050970A JPS505084B1 (en) 1970-09-16 1970-09-16

Publications (1)

Publication Number Publication Date
JPS505084B1 true JPS505084B1 (en) 1975-02-28

Family

ID=13720268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8050970A Pending JPS505084B1 (en) 1970-09-16 1970-09-16

Country Status (3)

Country Link
JP (1) JPS505084B1 (en)
DE (1) DE2146166A1 (en)
GB (1) GB1330932A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0021716A1 (en) * 1979-06-16 1981-01-07 Konica Corporation Condensation product and lithographic printing plates containing said product
CN1320014C (en) * 2002-10-15 2007-06-06 爱克发-格法特公司 Polymer for heat-sensitive lithographic printing plate precursor
WO2008114766A1 (en) * 2007-03-12 2008-09-25 Tohto Kasei Co., Ltd. Novel polyvalent hydroxy compound, method for producing the compound, epoxy resin and epoxy resin composition each using the compound, and cured product of the composition
JP2022033731A (en) * 2016-07-21 2022-03-02 三菱瓦斯化学株式会社 Compound, resin and composition, and method for forming resist pattern and method for forming circuit pattern

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
US4260673A (en) * 1979-09-05 1981-04-07 Minnesota Mining And Manufacturing Company Single sheet color proofing system
DE3100077A1 (en) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE CONTAINING A NAPHTHOCHINONDIAZIDESULPHONIC ACID ESTER, AND METHOD FOR PRODUCING THE NAPHTHOCHINONDIAZIDESULPHONIC ACID ESTER
DE3127754A1 (en) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE BASED ON O-NAPHTHOCHINONDIAZIDES AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
DE3586263D1 (en) * 1984-03-07 1992-08-06 Ciba Geigy Ag METHOD FOR PRODUCING IMAGES.
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
DE3629122A1 (en) * 1986-08-27 1988-03-10 Hoechst Ag METHOD FOR PRODUCING AN O-NAPHTHOCHINONDIAZIDSULFONIC ACID ESTER, AND LIGHT-SENSITIVE MIXTURE CONTAINING IT
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists
DE3935876A1 (en) * 1989-10-27 1991-05-02 Basf Ag RADIATION-SENSITIVE MIXTURE
JP2944296B2 (en) 1992-04-06 1999-08-30 富士写真フイルム株式会社 Manufacturing method of photosensitive lithographic printing plate
JP3290316B2 (en) 1994-11-18 2002-06-10 富士写真フイルム株式会社 Photosensitive lithographic printing plate
JP3506295B2 (en) 1995-12-22 2004-03-15 富士写真フイルム株式会社 Positive photosensitive lithographic printing plate
US6511790B2 (en) 2000-08-25 2003-01-28 Fuji Photo Film Co., Ltd. Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
DE60137398D1 (en) 2000-11-30 2009-03-05 Fujifilm Corp Lithographic printing plate precursors
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
JP4404734B2 (en) 2004-09-27 2010-01-27 富士フイルム株式会社 Planographic printing plate precursor
JP4474296B2 (en) 2005-02-09 2010-06-02 富士フイルム株式会社 Planographic printing plate precursor
JP4404792B2 (en) 2005-03-22 2010-01-27 富士フイルム株式会社 Planographic printing plate precursor
JP4890403B2 (en) 2007-09-27 2012-03-07 富士フイルム株式会社 Planographic printing plate precursor
JP2009085984A (en) 2007-09-27 2009-04-23 Fujifilm Corp Planographic printing plate precursor
JP2009083106A (en) 2007-09-27 2009-04-23 Fujifilm Corp Lithographic printing plate surface protective agent and plate making method for lithographic printing plate
JP4790682B2 (en) 2007-09-28 2011-10-12 富士フイルム株式会社 Planographic printing plate precursor
JP4994175B2 (en) 2007-09-28 2012-08-08 富士フイルム株式会社 Planographic printing plate precursor and method for producing copolymer used therefor
CN101855026A (en) 2007-11-14 2010-10-06 富士胶片株式会社 Method of drying coating film and process for producing lithographic printing plate precursor
JP2009236355A (en) 2008-03-26 2009-10-15 Fujifilm Corp Drying method and device
JP5164640B2 (en) 2008-04-02 2013-03-21 富士フイルム株式会社 Planographic printing plate precursor
JP5183380B2 (en) 2008-09-09 2013-04-17 富士フイルム株式会社 Photosensitive lithographic printing plate precursor for infrared laser
JP2010237435A (en) 2009-03-31 2010-10-21 Fujifilm Corp Lithographic printing plate precursor
CN105082725B (en) 2009-09-24 2018-05-04 富士胶片株式会社 Original edition of lithographic printing plate
JP5490168B2 (en) 2012-03-23 2014-05-14 富士フイルム株式会社 Planographic printing plate precursor and lithographic printing plate preparation method
JP5512730B2 (en) 2012-03-30 2014-06-04 富士フイルム株式会社 Preparation method of lithographic printing plate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0021716A1 (en) * 1979-06-16 1981-01-07 Konica Corporation Condensation product and lithographic printing plates containing said product
CN1320014C (en) * 2002-10-15 2007-06-06 爱克发-格法特公司 Polymer for heat-sensitive lithographic printing plate precursor
WO2008114766A1 (en) * 2007-03-12 2008-09-25 Tohto Kasei Co., Ltd. Novel polyvalent hydroxy compound, method for producing the compound, epoxy resin and epoxy resin composition each using the compound, and cured product of the composition
JP2022033731A (en) * 2016-07-21 2022-03-02 三菱瓦斯化学株式会社 Compound, resin and composition, and method for forming resist pattern and method for forming circuit pattern

Also Published As

Publication number Publication date
DE2146166A1 (en) 1972-03-23
GB1330932A (en) 1973-09-19

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