JPS505083B1 - - Google Patents

Info

Publication number
JPS505083B1
JPS505083B1 JP8050570A JP8050570A JPS505083B1 JP S505083 B1 JPS505083 B1 JP S505083B1 JP 8050570 A JP8050570 A JP 8050570A JP 8050570 A JP8050570 A JP 8050570A JP S505083 B1 JPS505083 B1 JP S505083B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8050570A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8050570A priority Critical patent/JPS505083B1/ja
Priority to DE19712146167 priority patent/DE2146167A1/en
Priority to GB4331271A priority patent/GB1329888A/en
Publication of JPS505083B1 publication Critical patent/JPS505083B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
JP8050570A 1970-09-16 1970-09-16 Pending JPS505083B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8050570A JPS505083B1 (en) 1970-09-16 1970-09-16
DE19712146167 DE2146167A1 (en) 1970-09-16 1971-09-15 Photosensitive mass
GB4331271A GB1329888A (en) 1970-09-16 1971-09-16 Phenolic resin compositions containing it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8050570A JPS505083B1 (en) 1970-09-16 1970-09-16

Publications (1)

Publication Number Publication Date
JPS505083B1 true JPS505083B1 (en) 1975-02-28

Family

ID=13720154

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8050570A Pending JPS505083B1 (en) 1970-09-16 1970-09-16

Country Status (3)

Country Link
JP (1) JPS505083B1 (en)
DE (1) DE2146167A1 (en)
GB (1) GB1329888A (en)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635854B2 (en) * 1973-08-03 1981-08-20
JPS5723253B2 (en) * 1974-03-25 1982-05-18
DE2847878A1 (en) * 1978-11-04 1980-05-22 Hoechst Ag LIGHT SENSITIVE MIXTURE
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
DE3043967A1 (en) 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE BASED ON O-NAPHTHOCHINONDIAZIDES AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
EP0070624B1 (en) * 1981-06-22 1986-11-20 Philip A. Hunt Chemical Corporation Novolak resin and a positive photoresist composition containing the same
JPS5988734A (en) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd Photosensitive composition
DE3586263D1 (en) * 1984-03-07 1992-08-06 Ciba Geigy Ag METHOD FOR PRODUCING IMAGES.
DE3418477A1 (en) * 1984-05-18 1985-11-21 Rütgerswerke AG, 6000 Frankfurt RADIATION-HARDENING BINDING AGENT AND METHOD FOR THE PRODUCTION OF FLAT AREAS
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
JP2944296B2 (en) 1992-04-06 1999-08-30 富士写真フイルム株式会社 Manufacturing method of photosensitive lithographic printing plate
JP3290316B2 (en) 1994-11-18 2002-06-10 富士写真フイルム株式会社 Photosensitive lithographic printing plate
JP3506295B2 (en) 1995-12-22 2004-03-15 富士写真フイルム株式会社 Positive photosensitive lithographic printing plate
US6511790B2 (en) 2000-08-25 2003-01-28 Fuji Photo Film Co., Ltd. Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP2036721B1 (en) 2000-11-30 2011-02-09 FUJIFILM Corporation Planographic printing plate precursor
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
JP4404734B2 (en) 2004-09-27 2010-01-27 富士フイルム株式会社 Planographic printing plate precursor
JP4474296B2 (en) 2005-02-09 2010-06-02 富士フイルム株式会社 Planographic printing plate precursor
JP4404792B2 (en) 2005-03-22 2010-01-27 富士フイルム株式会社 Planographic printing plate precursor
JP2009085984A (en) 2007-09-27 2009-04-23 Fujifilm Corp Planographic printing plate precursor
JP4890403B2 (en) 2007-09-27 2012-03-07 富士フイルム株式会社 Planographic printing plate precursor
JP2009083106A (en) 2007-09-27 2009-04-23 Fujifilm Corp Lithographic printing plate surface protective agent and plate making method for lithographic printing plate
JP4994175B2 (en) 2007-09-28 2012-08-08 富士フイルム株式会社 Planographic printing plate precursor and method for producing copolymer used therefor
JP4790682B2 (en) 2007-09-28 2011-10-12 富士フイルム株式会社 Planographic printing plate precursor
CN101855026A (en) 2007-11-14 2010-10-06 富士胶片株式会社 Method of drying coating film and process for producing lithographic printing plate precursor
JP2009236355A (en) 2008-03-26 2009-10-15 Fujifilm Corp Drying method and device
JP5164640B2 (en) 2008-04-02 2013-03-21 富士フイルム株式会社 Planographic printing plate precursor
JP5183380B2 (en) 2008-09-09 2013-04-17 富士フイルム株式会社 Photosensitive lithographic printing plate precursor for infrared laser
JP2010237435A (en) 2009-03-31 2010-10-21 Fujifilm Corp Lithographic printing plate precursor
US8883401B2 (en) 2009-09-24 2014-11-11 Fujifilm Corporation Lithographic printing original plate
JP5490168B2 (en) 2012-03-23 2014-05-14 富士フイルム株式会社 Planographic printing plate precursor and lithographic printing plate preparation method
JP5512730B2 (en) 2012-03-30 2014-06-04 富士フイルム株式会社 Preparation method of lithographic printing plate

Also Published As

Publication number Publication date
GB1329888A (en) 1973-09-12
DE2146167A1 (en) 1972-03-23

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