JPH117121A - Surface protective film - Google Patents
Surface protective filmInfo
- Publication number
- JPH117121A JPH117121A JP17642197A JP17642197A JPH117121A JP H117121 A JPH117121 A JP H117121A JP 17642197 A JP17642197 A JP 17642197A JP 17642197 A JP17642197 A JP 17642197A JP H117121 A JPH117121 A JP H117121A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- protective film
- surface protective
- adhesion preventing
- preventing layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、プリント基板用原
稿、印刷物などに用いる表面保護フィルムに関し、特に
プリント基板作製工程などにおいて粘着性を有するフォ
トレジストを露光する際の原稿表面に好適に用いられる
表面保護フィルムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface protection film used for a printed circuit board document, a printed matter, and the like, and more particularly, to a surface protection film suitably used for exposing a tacky photoresist in a printed circuit board manufacturing process or the like. It relates to a surface protection film.
【０００２】[0002]
【従来の技術】通常、プリント配線板や樹脂凸版は、液
状フォトレジストなどの粘着性のあるフォトレジストに
露光用原稿を密着露光して作製される。かかるに露光用
原稿は、フォトレジストに密着して使用されるので、そ
の表面に何らの処理も施さないと、露光終了後の原稿を
剥がす際にフォトレジストの一部が原稿表面に転写さ
れ、汚れを生じてしまう。このような事情から、従来よ
り露光用原稿上のフォトレジストに対向する面に、表面
にレジスト付着防止層を有する表面保護フィルムを設け
るようにしている。このようなフォトマスク用表面保護
フィルムとしては、ポリエステル基材の片面に粘着層
が、他面にレジスト付着防止層が設けられている。2. Description of the Related Art Generally, a printed wiring board and a resin relief printing plate are manufactured by closely exposing an exposure document to an adhesive photoresist such as a liquid photoresist. Since the exposure document is used in close contact with the photoresist, if the surface is not subjected to any processing, a part of the photoresist is transferred to the surface of the document when the document after the exposure is peeled off, It causes dirt. Under such circumstances, a surface protection film having a resist adhesion preventing layer on the surface thereof is conventionally provided on the surface of the exposure document facing the photoresist. As such a surface protective film for photomasks, an adhesive layer is provided on one side of a polyester substrate, and a resist adhesion preventing layer is provided on the other side.
【０００３】このようなレジスト付着防止層は、樹脂及
び離型性付与剤（以下、離型剤という）の混合物から構
成されており、この離型剤としては低分子量のシリコー
ン系添加剤が一般に用いられている。Such a resist adhesion preventing layer is composed of a mixture of a resin and a releasing agent (hereinafter referred to as a releasing agent). As the releasing agent, a low molecular weight silicone-based additive is generally used. Used.
【０００４】[0004]
【発明が解決しようとする課題】しかし、このような離
型剤は、離型性は得られるものの、離型剤がレジスト側
に転写し、後工程で種々の問題が生ずる。このような問
題としては、プリフラックスを塗布する際にプリフラッ
クスがはじいてしまう、文字印刷時にインキをはじいて
しまう等があげられる。このため、転写した離型剤を除
去するなどの工程が別に必要とされる。However, although such a release agent has the releasability, the release agent is transferred to the resist side, and various problems occur in the subsequent steps. Such problems include the pre-flux repelling when applying the pre-flux and the ink repelling during character printing. For this reason, a separate step of removing the transferred release agent is required.
【０００５】本発明は、上記の欠点を解消するためにな
されたものであって、粘着性のフォトレジストが付着せ
ず、かつ、離型剤がレジストに転写しない表面保護フィ
ルムを提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned drawbacks, and has as its object to provide a surface protective film in which a tacky photoresist does not adhere and a release agent does not transfer to the resist. Aim.
【０００６】[0006]
【課題を解決するための手段】上記目的を解決する本発
明の表面保護フィルムとしては、透明支持体上の一方の
面にレジスト付着防止層を設け、反対面に粘着層を設け
た表面保護フィルムであって、前記レジスト付着防止層
はシロキサン結合を有する有機化合物から誘導される単
位もしくはフッ素原子含有単量体から誘導される単位を
枝成分に有するグラフトポリマーを含有するものであ
る。As a surface protective film of the present invention which solves the above-mentioned object, a surface protective film having a resist adhesion preventing layer provided on one surface of a transparent support and an adhesive layer provided on the other surface. The resist adhesion preventing layer contains a graft polymer having, as a branch component, a unit derived from an organic compound having a siloxane bond or a unit derived from a fluorine atom-containing monomer.
【０００７】[0007]
【発明の実施の形態】以下、本発明を図１を用いて詳述
する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to FIG.
【０００８】表面保護フィルム４の透明支持体２として
は、露光の際に使われる紫外線の透過率の高い物で有れ
ば良く、ポリエチレンテレフタレート、ポリカーボネー
ト、ポリプロピレン、ポリエチレン、ポリ塩化ビニル、
ポリエチレンナフタレート、ポリスチレン等の透明なプ
ラスチックフィルムが用いられる。特に二軸延伸された
ポリエチレンテレフタレートフィルムが強度、耐熱性、
寸法安定性に優れているために好適に使用される。透明
支持体の厚みは、解像度に影響するため薄い方が好まし
いが、取扱性も考慮して、１〜１００μｍ、好ましくは
２〜２５μｍ、さらに好ましくは４〜１２μｍ程度であ
る。[0008] The transparent support 2 of the surface protective film 4 may be a material having a high transmittance for ultraviolet light used for exposure, and may be polyethylene terephthalate, polycarbonate, polypropylene, polyethylene, polyvinyl chloride, or the like.
A transparent plastic film such as polyethylene naphthalate or polystyrene is used. Especially biaxially stretched polyethylene terephthalate film has strength, heat resistance,
It is suitably used because of its excellent dimensional stability. The thickness of the transparent support is preferably small to affect the resolution, but is 1 to 100 μm, preferably 2 to 25 μm, and more preferably about 4 to 12 μm in consideration of handling properties.
【０００９】透明支持体の片面に設けられる粘着層３
は、一般に使用されるアクリル系粘着剤、ゴム系粘着剤
などが使用される。また、帯電防止などの性能を持つ粘
着剤を使用しても良い。粘着層の厚みとしては、透明性
（解像度）を阻害せず、適度な粘着性が得られるよう、
０．５〜２０μｍ、好ましくは１〜１０μｍ、さらに好
ましくは２〜４μｍの範囲が採用される。Adhesive layer 3 provided on one side of transparent support
For example, generally used acrylic pressure-sensitive adhesives, rubber-based pressure-sensitive adhesives and the like are used. Further, an adhesive having performance such as antistatic property may be used. As for the thickness of the adhesive layer, the transparency (resolution) is not impaired, and a proper adhesiveness is obtained.
A range of 0.5 to 20 μm, preferably 1 to 10 μm, more preferably 2 to 4 μm is employed.
【００１０】表面保護フィルムの他面に形成されるレジ
スト付着防止層１は、シロキサン結合を有する有機化合
物から誘導される単位もしくはフッ素原子含有単量体か
ら誘導される単位を枝成分に有するグラフトポリマーを
含有するものである。前記グラフトポリマーは単独で使
用することも可能であるが、通常は透明支持体への接着
性などを考慮して前記グラフトポリマーを離型剤として
他のバインダーポリマーに混合して使用する。The resist adhesion preventing layer 1 formed on the other surface of the surface protective film is a graft polymer having, as a branch component, a unit derived from an organic compound having a siloxane bond or a unit derived from a fluorine atom-containing monomer. It contains. The graft polymer may be used alone, but usually, the graft polymer is mixed with another binder polymer as a mold release agent in consideration of adhesiveness to a transparent support and the like.
【００１１】シロキサン結合を有する有機化合物から誘
導される単位もしくはフッ素原子含有単量体から誘導さ
れる単位を枝成分に有するグラフトポリマーとしては、
シリコーンマクロモノマーもしくはパーフルオロアルキ
ルマクロモノマーなどと、アクリル系、ウレタン系、ポ
リエステル系モノマーなどとの共重合により合成され
た、幹部分が各樹脂系ポリマーで、枝部分にシロキサン
結合またはフッ素原子を含有する櫛形グラフトポリマー
が好適に使用される。このような離型剤を使用すること
で、プリフラックスやインキなどのハジキを起こすこと
なく、レジスト等の付着を極めて有効に防止できるもの
である。The graft polymer having a unit derived from an organic compound having a siloxane bond or a unit derived from a fluorine atom-containing monomer as a branch component includes:
Resin polymer synthesized by copolymerization of silicone macromonomer or perfluoroalkyl macromonomer with acrylic, urethane, or polyester monomer. A comb-shaped graft polymer is preferably used. By using such a release agent, adhesion of a resist or the like can be extremely effectively prevented without causing repelling such as preflux or ink.
【００１２】レジスト付着防止層に使用されるバインダ
ーポリマーとしては、ウレタン系樹脂、アクリル系樹
脂、塩化ビニル系樹脂、アルキッド樹脂、ポリエステル
樹脂、塩化ビニリデン系樹脂、アミノ系樹脂、メラミン
系樹脂等があげられ、これらは単独あるいは混合して用
いられる。Examples of the binder polymer used in the resist adhesion preventing layer include urethane resins, acrylic resins, vinyl chloride resins, alkyd resins, polyester resins, vinylidene chloride resins, amino resins, and melamine resins. These are used alone or as a mixture.
【００１３】前記グラフトポリマーを前記バインダーポ
リマーに混合して使用する場合の混合割合としては、バ
インダーポリマーとグラフトポリマーの種類により一概
にはいえないが、前記バインダーポリマー１００重量部
に対して前記グラフトポリマーを１〜１００重量部、好
ましくは２〜３０重量部の範囲で使用される。[0013] The mixing ratio when the graft polymer is mixed with the binder polymer is not necessarily specified depending on the types of the binder polymer and the graft polymer. In an amount of 1 to 100 parts by weight, preferably 2 to 30 parts by weight.
【００１４】なお、レジスト付着防止層には真空プリン
ターでレジスト付着防止層をフォトレジストに密着させ
露光する際の密着性を良好にするため、透明性及び光を
乱反射させない範囲で顔料などを添加しても良い。In order to improve the adhesion of the resist adhesion preventing layer to the photoresist by using a vacuum printer and to improve the adhesion when exposing, a pigment or the like is added to the resist adhesion preventing layer within a range that does not irregularly reflect light. May be.
【００１５】レジスト付着防止層の厚みとしては、透明
性（解像度）を維持しつつ、必要とされる離型性を得る
ため、０．０５〜５μｍ、好ましくは０．１〜２μｍの
範囲が採用される。The thickness of the resist adhesion preventing layer is in the range of 0.05 to 5 μm, preferably 0.1 to 2 μm in order to obtain the required releasability while maintaining transparency (resolution). Is done.
【００１６】[0016]
【実施例】以下、本発明の実施例を説明する。なお、本
実施例の「％」、「部」とあるのは特に断りのない限り
重量基準である。Embodiments of the present invention will be described below. In this example, “%” and “parts” are based on weight unless otherwise specified.
【００１７】［実施例１］厚さ６μｍのポリエチレンテ
レフタレートフィルム（ルミラー：東レ社）の片面に下
記レジスト付着防止層用塗布液を、反対面に下記粘着層
用塗布液をバーコーターにより塗布、９０℃・２分の乾
燥を行い塗膜を形成した。これらの膜厚は、レジスト付
着防止層約１μｍ、粘着層約２μｍであり、粘着層に取
扱上のため、厚さ２５μｍのポリエチレンテレフタレー
ト離型フィルム（ＭＲＢ：ダイアホイルヘキスト社）を
貼り合わせて表面保護フィルムを作製した。Example 1 A coating solution for a resist adhesion preventing layer shown below was applied to one side of a 6 μm thick polyethylene terephthalate film (Lumilar: Toray Industries, Ltd.), and a coating solution for the following adhesive layer was applied to the other side using a bar coater. The coating was formed by drying at 2 ° C. for 2 minutes. These film thicknesses are about 1 μm for the resist adhesion preventing layer and about 2 μm for the adhesive layer. For handling the adhesive layer, a 25 μm thick polyethylene terephthalate release film (MRB: Diafoil Hoechst) is attached to the surface. A protective film was produced.
【００１８】 ・シリコーン−アクリルグラフトポリマー （LSI-60：綜研化学社）（固形分４５％） ０．５部 ・トルエン ２０部 ・メチルエチルケトン ２０部[0018] ・ Silicone-acrylic graft polymer (LSI-60: Soken Chemical Co.) (solid content 45%) 0.5 parts ・ Toluene 20 parts ・ Methyl ethyl ketone 20 parts
【００１９】〈粘着層用塗布液〉 ・アクリル酸エステル共重合体（固形分４０％） （アロンタック SCL-200：東亞合成化学社） １０部 ・トルエン １０部 ・酢酸エチル １０部<Coating solution for adhesive layer> Acrylic ester copolymer (solid content 40%) (Arontack SCL-200: Toagosei Chemical Co., Ltd.) 10 parts Toluene 10 parts Ethyl acetate 10 parts
【００２０】［実施例２］実施例１のレジスト付着防止
層用塗布液中「シリコーン−アクリルグラフトポリマー
０．５部」を「フッ素−アクリルグラフトポリマー
（ＧＦ−３００（固形分２５％）：東亞合成化学社）
１．０部」に変更した以外は、実施例１と同様にして表
面保護フィルムを作製した。Example 2 In the coating solution for the resist adhesion preventing layer of Example 1, "0.5 parts of silicone-acrylic graft polymer" was replaced with "fluorine-acrylic graft polymer (GF-300 (solid content 25%): Toa) Synthetic Chemical Company)
A surface protective film was produced in the same manner as in Example 1, except that the composition was changed to "1.0 parts".
【００２１】［比較例１］実施例１のレジスト付着防止
層用塗布液中「シリコーン−アクリルグラフトポリマー
０．５部」を「シリコーン添加剤（ペインタッド５３
（固形分１０％）：ダウコーニング社） ２．０部」に
変更した以外は実施例１と同様にして表面保護フィルム
を作製した。COMPARATIVE EXAMPLE 1 In the coating solution for the resist adhesion preventing layer of Example 1, "0.5 parts of silicone-acrylic graft polymer" was replaced with "Silicone additive (Paintad 53)".
(Solid content: 10%): Dow Corning Co.) A surface protective film was produced in the same manner as in Example 1, except that the composition was changed to 2.0 parts.
【００２２】［比較例２］実施例１の表面保護フィルム
のレジスト付着防止層を設けないものを表面保護フィル
ムとして作製した。Comparative Example 2 The surface protective film of Example 1 without the resist adhesion preventing layer was prepared as the surface protective film.
【００２３】実施例、比較例で得られた表面保護フィル
ムについて以下の評価試験を行った。The following evaluation tests were performed on the surface protective films obtained in Examples and Comparative Examples.
【００２４】Ａ．プラスチックフィルムへの離型剤の転
写性（転写１） 表面保護フィルムのレジスト付着防止層面と未処理のポ
リエチレンテレフタレートフィルム（ＰＥＴフィルム）
を重ね合わせ、これに４０g/cm2の荷重をかけ、１２０
℃の状態で１時間静置した後、ＰＥＴフィルム側にマジ
ックで画線を引きそのハジキ具合を目視により評価し、
離型剤のプラスチックフィルムへの転写の有無を確認し
た。マジック画線にハジキがなかったものを「○」、ハ
ジキを生じたものを「×」とした。A. Transferability of release agent to plastic film (Transfer 1) Surface of resist-adhesion preventing layer of surface protective film and untreated polyethylene terephthalate film (PET film)
And apply a load of 40 g / cm 2 on the
After standing for 1 hour in the state of ° C., an image is drawn on the PET film side by magic, and the repelling condition is visually evaluated.
The presence or absence of transfer of the release agent to the plastic film was confirmed. A mark where no repelling was found in the magic image was marked with “○”, and a sign with repelling was marked with “x”.
【００２５】Ｂ．レジストへの離型剤の転写性（転写
２） 回路パターンのない原稿に表面保護フィルムを貼り合わ
せ、ソルダーレジストの塗布された銅板の前記レジスト
と、前記表面保護フィルムのレジスト付着防止層が対向
するように密着して露光し、銅板上のレジストを全面硬
化させた。その後、表面保護フィルムを貼り合わせた原
稿を剥がし、硬化したレジストにマジックで画線を引
き、目視にてそのハジキ具合を観察し、離型剤のレジス
トへの転写の有無を確認した。マジック画線にハジキが
なかったものを「○」、ハジキを生じたものを「×」と
した。B. Transferability of release agent to resist (transfer 2) A surface protection film is attached to an original without a circuit pattern, and the resist of the copper plate coated with the solder resist and the resist adhesion preventing layer of the surface protection film face each other. The resist on the copper plate was entirely cured as described above. Thereafter, the original on which the surface protective film was stuck was peeled off, an image was drawn on the cured resist by magic, the repellency was visually observed, and the presence or absence of transfer of the release agent to the resist was confirmed. A mark where no repelling was found in the magic image was marked with “○”, and a sign with repelling was marked with “x”.
【００２６】Ｃ．表面保護フィルムへのレジスト付着防
止性（剥離性） レジスト付着防止層の離型効果を確認するため、粘着テ
ープをレジスト付着防止層に貼り合わせ、その剥離力を
テンシロンによって測定した。剥離力が１g/inch〜１２
０g/inchであったものを「○」、１２０g/inch以上であ
ったものを「×」とした。C. Anti-adhesion preventing property to surface protection film (peelability) In order to confirm the releasing effect of the anti-resist adhesion layer, an adhesive tape was attached to the anti-resist adhesion layer, and the peeling force was measured by Tensilon. Peeling force is 1g / inch ~ 12
What was 0 g / inch was rated as “○”, and one that was 120 g / inch or more was rated “x”.
【００２７】Ｄ．表面保護フィルムの全光線透過率（透
過率） 表面保護フィルムの光学的透明性を評価するため、表面
保護フィルムの全光線透過率をＪＩＳ−Ｋ７１０５に準
じて測定した。単位は「％」で示される。D. Total light transmittance (transmittance) of surface protective film In order to evaluate the optical transparency of the surface protective film, the total light transmittance of the surface protective film was measured according to JIS-K7105. The unit is indicated by “%”.
【００２８】Ｅ．表面保護フィルムのヘーズ（ヘーズ） 表面保護フィルムの曇りを評価するために、表面保護フ
ィルムのヘーズをＪＩＳ−Ｋ７１０５に準じて測定し
た。単位は「％」で示される。E. Haze of surface protective film (haze) In order to evaluate the haze of the surface protective film, the haze of the surface protective film was measured according to JIS-K7105. The unit is indicated by “%”.
【００２９】これらの評価結果を表１に示す。Table 1 shows the results of these evaluations.
【００３０】[0030]
【表１】 [Table 1]
【００３１】以上の結果から明らかなように、実施例
１、２の表面保護フィルムは離型剤の転写が全く認めら
れなかった。一方、比較例１のものは離型剤の転写が認
められた。また、比較例２のものはレジスト付着防止層
が無いため転写するものはないが、剥離性が悪く、レジ
スト付着防止効果を得ることはできなかった。As is clear from the above results, no transfer of the release agent was observed in the surface protective films of Examples 1 and 2. On the other hand, in the case of Comparative Example 1, transfer of the release agent was observed. In Comparative Example 2, there was no transfer because there was no resist adhesion preventing layer, but the peelability was poor, and no effect of resist adhesion could be obtained.
【００３２】これらのことから、実施例１、２の表面保
護フィルムは、離型剤の転写を抑えると共にレジストの
付着を防止することが可能なものである。From these facts, the surface protection films of Examples 1 and 2 are capable of suppressing the transfer of the release agent and the adhesion of the resist.
【００３３】さらに、実施例１、２のものは、比較例
１、２のものと比較して全光線透過率、ヘーズ共に同レ
ベルであり、十分な透明性が確保されていることが分か
る。Further, in Examples 1 and 2, the total light transmittance and the haze were the same as those in Comparative Examples 1 and 2, indicating that sufficient transparency was secured.
【００３４】[0034]
【発明の効果】本発明の表面保護フィルムは、レジスト
付着防止層における離型剤にシロキサン結合を有する有
機化合物から誘導される単位もしくはフッ素原子含有単
量体から誘導される単位を枝成分に有するグラフトポリ
マーを用いることによって、レジストなどの原稿への転
写を防止できるとともに、表面保護フィルムからレジス
トなどへの離型剤の転写を抑えることが可能になった。
これによって、プリント配線板作製時において、露光後
レジスト側に転写した離型剤を除去する等の煩雑な工程
が省略でき作業効率が向上する。The surface protective film of the present invention has, as a branch component, a unit derived from an organic compound having a siloxane bond or a unit derived from a fluorine atom-containing monomer as a release agent in the resist adhesion preventing layer. By using the graft polymer, transfer of a resist or the like to a document can be prevented, and transfer of a release agent from the surface protective film to the resist or the like can be suppressed.
Thus, when manufacturing a printed wiring board, complicated steps such as removal of the release agent transferred to the resist after exposure can be omitted, and the working efficiency can be improved.
【図１】 本発明の表面保護フィルムの実施例を示す断
面図。FIG. 1 is a sectional view showing an example of a surface protective film of the present invention.
１・・・レジスト付着防止層 ２・・・透明支持体 ３・・・粘着層 ４・・・表面保護フィルム DESCRIPTION OF SYMBOLS 1 ... Resist adhesion prevention layer 2 ... Transparent support 3 ... Adhesive layer 4 ... Surface protective film
Claims (1)
止層を設け、反対面に粘着層を設けた表面保護フィルム
であって、前記レジスト付着防止層はシロキサン結合を
有する有機化合物から誘導される単位もしくはフッ素原
子含有単量体から誘導される単位を枝成分に有するグラ
フトポリマーを含有することを特徴とする表面保護フィ
ルム。1. A surface protection film comprising a transparent support having a resist adhesion preventing layer on one surface and an adhesive layer on the other surface, wherein the resist adhesion preventing layer is derived from an organic compound having a siloxane bond. A surface protective film comprising a graft polymer having a unit to be formed or a unit derived from a fluorine atom-containing monomer as a branch component.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17642197A JP4257803B2 (en) | 1997-06-17 | 1997-06-17 | Surface protection film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17642197A JP4257803B2 (en) | 1997-06-17 | 1997-06-17 | Surface protection film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH117121A true JPH117121A (en) | 1999-01-12 |
| JP4257803B2 JP4257803B2 (en) | 2009-04-22 |
Family
ID=16013412
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17642197A Expired - Lifetime JP4257803B2 (en) | 1997-06-17 | 1997-06-17 | Surface protection film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4257803B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003096409A (en) * | 2001-09-20 | 2003-04-03 | Kimoto & Co Ltd | Surface protecting film |
| JP2005181931A (en) * | 2003-12-24 | 2005-07-07 | Kimoto & Co Ltd | Surface protective coat and surface protective film |
| JP2007071933A (en) * | 2005-09-05 | 2007-03-22 | Adtec Engineeng Co Ltd | Exposure apparatus |
| WO2009051059A1 (en) * | 2007-10-19 | 2009-04-23 | Sekisui Chemical Co., Ltd. | Adhesive tape for protecting photomask |
| CN103472673A (en) * | 2013-09-16 | 2013-12-25 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof |
-
1997
- 1997-06-17 JP JP17642197A patent/JP4257803B2/en not_active Expired - Lifetime
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003096409A (en) * | 2001-09-20 | 2003-04-03 | Kimoto & Co Ltd | Surface protecting film |
| JP2005181931A (en) * | 2003-12-24 | 2005-07-07 | Kimoto & Co Ltd | Surface protective coat and surface protective film |
| JP2007071933A (en) * | 2005-09-05 | 2007-03-22 | Adtec Engineeng Co Ltd | Exposure apparatus |
| JP4616733B2 (en) * | 2005-09-05 | 2011-01-19 | 株式会社アドテックエンジニアリング | Exposure equipment |
| WO2009051059A1 (en) * | 2007-10-19 | 2009-04-23 | Sekisui Chemical Co., Ltd. | Adhesive tape for protecting photomask |
| JP4448897B2 (en) * | 2007-10-19 | 2010-04-14 | 積水化学工業株式会社 | Photomask protective adhesive tape |
| JPWO2009051059A1 (en) * | 2007-10-19 | 2011-03-03 | 積水化学工業株式会社 | Photomask protective adhesive tape |
| CN103472673A (en) * | 2013-09-16 | 2013-12-25 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof |
| US9482941B2 (en) | 2013-09-16 | 2016-11-01 | Boe Technology Group Co., Ltd. | Mask and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4257803B2 (en) | 2009-04-22 |
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