JPH11328748A - Master disk - Google Patents
Master diskInfo
- Publication number
- JPH11328748A JPH11328748A JP15392498A JP15392498A JPH11328748A JP H11328748 A JPH11328748 A JP H11328748A JP 15392498 A JP15392498 A JP 15392498A JP 15392498 A JP15392498 A JP 15392498A JP H11328748 A JPH11328748 A JP H11328748A
- Authority
- JP
- Japan
- Prior art keywords
- disk
- master
- nickel
- plating layer
- electroless plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ＣＤ、ＭＤ、ＣＤ
−Ｒ、ＣＤ−ＲＷ、ＭＯ、ＤＶＤなどの光ディスクや光
磁気ディスク等のディスク状媒体を射出成形するために
成形金型内に装着して用いられるディスク原盤、所謂ス
タンパーに関するものである。TECHNICAL FIELD The present invention relates to a CD, an MD, and a CD.
The present invention relates to a master disc, that is, a so-called stamper, which is used by being mounted in a molding die for injection-molding a disc-shaped medium such as an optical disc such as -R, CD-RW, MO, and DVD, and a magneto-optical disc.
【０００２】[0002]
【従来の技術】従来、光ディスクや光磁気ディスク等の
ディスク状媒体を射出成形するのに用いられるディスク
原盤は、マルチメディア化が進む中で、大容量にするに
は高密度記録が不可欠で記録媒体への要求精度が高まっ
ている。例えば、ＤＶＤ−ＲＡＭなどはトラックピッチ
をＣＤに比べて狭くした上に、グルーブだけにしか行わ
れていなかった記録をランド、グルーブ両方に行って来
ているので、射出成形ではトラックピッチを狭くするこ
とで、転写精度が厳しくなる。また、離型時にディスク
原盤と粘着してランド部が欠ける現象が起こりやすくラ
ンド部にも記録することになると、この部分の要求精度
も非常に高くせざるをえなくなる。従来のＣＤ−ＤＡ，
ＣＤ−ＲのＣＤファミリーやＭＤなどのディスクでは、
成形基板の厚みが、１．２ｍｍであったのに対してＤＶ
Ｄ−ＲＯＭ，ＤＶＤ−ＲＡＭやＤＶＤ−ＲなどのＤＶＤ
は０．６ｍｍ基板２枚を張り合わせて使用することで
０．６ｍｍとなったので、さらに成形を難しくする原因
になっている。そして、ＣＤ−Ｒなどで製造時に最も多
い品質不良の一つとして、ディスク基板のディスク原盤
からの離型時にディスク基板のランドの一部分がディス
ク原盤に粘着残留してランドが欠けてた状態となり、目
視でも同心円状にムラ（以下離型ムラと称す）になって
いるのが確認できる程である。また、この現象は、成形
条件の厳しいＤＶＤではさらに多くなっていて、ランド
の欠けた部分がジッターを悪化させ、ブロックエラーレ
ートを悪化させる結果となっている。更にＭＤなどの小
径ディスクでは、この現象の影響は分かりにくいが、同
様なことが起こっていて、付着樹脂がトラッキングエラ
ーノイズとして出てくる欠点ともなっている。2. Description of the Related Art Conventionally, as a master disk used for injection molding a disk-shaped medium such as an optical disk or a magneto-optical disk, high-density recording is indispensable for increasing the capacity while multimedia is progressing. The accuracy required for media is increasing. For example, in a DVD-RAM or the like, the track pitch is made narrower than that of a CD, and the recording performed only on the groove is performed on both the land and the groove. Therefore, the track pitch is narrowed by injection molding. As a result, transfer accuracy becomes severe. In addition, the phenomenon that the land portion is chipped due to sticking to the disk master during release is likely to occur, and if recording is performed also on the land portion, the required accuracy of this portion must be extremely high. Conventional CD-DA,
For discs such as the CD-R CD family and MD,
Although the thickness of the molded substrate was 1.2 mm, DV
DVD such as D-ROM, DVD-RAM and DVD-R
Is reduced to 0.6 mm by bonding two 0.6 mm substrates together, which is a factor that makes molding more difficult. Then, as one of the most common quality defects at the time of manufacturing in a CD-R or the like, when the disk substrate is released from the disk master, a part of the land of the disk substrate remains adhered to the disk master and the land is chipped. The degree of concentric unevenness (hereinafter referred to as mold release unevenness) is enough to be visually confirmed. In addition, this phenomenon is more frequent in DVDs having severe molding conditions, and as a result, the chipped portions of the land worsen the jitter and the block error rate. Further, in the case of a small-diameter disk such as an MD, the effect of this phenomenon is difficult to understand, but the same phenomenon occurs, and this has the disadvantage that the adhered resin appears as tracking error noise.
【０００３】[0003]
【発明が解決しようとする課題】ところが、記録媒体の
高密度記録の要請に対処するためには、前述の離型ムラ
の発生をなくさなければならないが、ニッケル電解メッ
キ層（電鋳）の上にリンまたはボロンを含むニッケル無
電解メッキ層を形成した従来のディスク原盤では、ディ
スク原盤とディスク基板の溶融樹脂との粘着性と、溶融
樹脂の流動時の流入抵抗によって、離型ムラをなくすこ
とができなく品質不良に成ることが多く問題であった。
また、この種のニッケル無電解メッキ層のあるディスク
原盤であれば、射出成形を繰り返していくと、ディスク
原盤の電解メッキ層が溶融樹脂と接触することで、表層
に突起が生じることもあるが、単にこの射出成形時での
加熱で自然発生した突起では、１０秒前後の成形サイク
ルの間だけ加熱するものであるため、断続的な熱サイク
ルで成長するため、突起の大きさがまちまちで、非常に
大きな突起になる場合も少なからずあって、突起の生じ
る間隔も不均一である。この自然発生した突起は、離型
性を若干向上させる効果があるが、大きさや間隔が揃っ
ていないため従来のディスク原盤によって成形されたデ
ィスク基板はノイズ成分となって特性低下の原因となる
欠点となっていた。However, in order to meet the demand for high-density recording on a recording medium, it is necessary to eliminate the occurrence of the above-mentioned uneven release. In a conventional disk master having a nickel electroless plating layer containing phosphorus or boron formed thereon, unevenness in release is eliminated by the adhesiveness between the disk master and the molten resin of the disk substrate and the inflow resistance of the molten resin when flowing. There were many problems that the quality could not be improved and the quality was poor.
In addition, in the case of a disc master having this type of nickel electroless plating layer, when injection molding is repeated, the electrolytic plating layer of the disc master comes into contact with the molten resin, so that projections may be generated on the surface layer. However, in the case of protrusions that are generated spontaneously due to heating during injection molding, the protrusions are heated only during a molding cycle of about 10 seconds, and grow in intermittent heat cycles. There are quite a few cases where the projections become very large, and the intervals at which the projections occur are also uneven. These spontaneously generated protrusions have the effect of slightly improving the releasability, but because the size and spacing are not uniform, the disk substrate formed by the conventional disk master becomes a noise component and causes a deterioration in characteristics. Had become.
【０００４】本発明は、これら従来の欠点を排除しよう
とするもので、ディスク原盤とディスク基板の溶融樹脂
との粘着性と、溶融樹脂の流動時の流入抵抗を良好にし
て、ディスク基板の離型ムラの発生をなくし、高密度の
記録媒体を高品質の状態で製造できるディスク原盤を提
供することを目的としたものである。SUMMARY OF THE INVENTION The present invention is intended to eliminate these conventional disadvantages, and improves the adhesiveness between the disk master and the molten resin of the disk substrate and the inflow resistance of the molten resin during the flow to improve the separation of the disk substrate. It is an object of the present invention to provide a disk master capable of producing a high-density recording medium in a high-quality state by eliminating the occurrence of mold unevenness.
【０００５】[0005]
【課題を解決するための手段】上述の課題を解決するた
めに、請求項１の発明は、ニッケル電解メッキ層（電
鋳）の上にリンまたはボロンを含むニッケル無電解メッ
キ層を形成したディスク原盤において、該ディスク原盤
を温度２５０〜４５０℃で、熱処理して前記無電解メッ
キ層の表層上に微小な突起を生成したものである。In order to solve the above-mentioned problems, a first aspect of the present invention is a disk in which a nickel electroless plating layer containing phosphorus or boron is formed on a nickel electrolytic plating layer (electroforming). In the master, the disk master is heat-treated at a temperature of 250 to 450 ° C. to form minute projections on the surface layer of the electroless plating layer.
【０００６】請求項２の発明は、請求項１に記載のディ
スク原盤において、前記ディスク原盤が真空中で熱処理
されることを特徴とする。また、請求項３の発明は、前
記ディスク原盤が、不活性ガス、酸素、窒素のいずれか
の雰囲気中で熱処理されることを特徴としている。さら
に、請求項４の発明では、前記突起の高さが１００〜２
００ であって、その密度を１０個／μｍ2 以上とした
ことを特徴とする。According to a second aspect of the present invention, in the disk master according to the first aspect, the disk master is heat-treated in a vacuum. The invention according to claim 3 is characterized in that the disk master is heat-treated in an atmosphere of any of inert gas, oxygen and nitrogen. Further, in the invention according to claim 4, the height of the projection is 100 to 2
00, wherein the density is 10 pieces / μm 2 or more.
【０００７】[0007]
【発明の実施の形態】本発明においては、ディスク基板
の樹脂と接する表面にニッケル無電解メッキ層を形成
し、該無電解メッキ層を導電膜として電鋳（電解メッ
キ）を行なってディスク原盤を得るものであるが、前記
ニッケル無電解メッキ層を改質することで、溶融樹脂と
の粘着性ならびに溶融樹脂の流入抵抗を大幅に軽減する
ことで、ディスク基板の離型ムラの発生をなくし、高品
質のディスク基板の製造が可能となる。即ち、ニッケル
電解メッキ層（電鋳）の上にリンまたはボロンを含むニ
ッケル無電解メッキ層を形成したディスク原盤を温度２
５０〜４５０℃の加熱雰囲気下で所定時間放置した熱処
理で、リンまたはボロンが表層に移動しニッケルと結び
ついて、硬質で平均した大きさで、間隔もそろった状態
で微小突起を生成し、例えば、その高さが１００〜２０
０ であって、その密度を１０個／μｍ2 以上とした状
態で生成して均一性のある表面に形成し、前記ニッケル
無電解メッキ層の表層上に微小な突起を均等に多く配備
したことで、濡れ性が低下すると共に、動摩擦抵抗が減
少して、溶融樹脂との粘着力が弱くなって、樹脂の流動
性とディスク基板の離型性を大幅に向上でき、この結果
使用中に付着物質の発生が少なく高品質のディスク基板
が生産されるものである。DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, a nickel electroless plating layer is formed on a surface of a disk substrate in contact with a resin, and the electroless plating layer is used as a conductive film to perform electroforming (electrolytic plating). Although it is obtained, by modifying the nickel electroless plating layer, by significantly reducing the inflow resistance of the molten resin and the adhesiveness with the molten resin, to eliminate the occurrence of release unevenness of the disk substrate, High quality disk substrates can be manufactured. That is, a disc master in which a nickel electroless plating layer containing phosphorus or boron was formed on a nickel electroplating layer (electroforming) was heated at a temperature of 2%.
In a heat treatment left for a predetermined time under a heating atmosphere of 50 to 450 ° C., phosphorus or boron moves to the surface layer and binds with nickel to form fine projections in a hard, average size and evenly spaced state. , Its height is 100-20
0, formed at a density of 10 / μm 2 or more, formed on a uniform surface, and provided with a large number of fine protrusions evenly on the surface of the nickel electroless plating layer. As a result, the wettability is reduced, the dynamic frictional resistance is reduced, the adhesive strength with the molten resin is weakened, and the fluidity of the resin and the releasability of the disc substrate can be greatly improved, resulting in adhesion during use. A high-quality disk substrate is produced with less generation of substances.
【０００８】[0008]
【実施例】以下、図１及び図２の例の実施例で説明する
と、レーザー光Ａでグルーブ記録Ｂをした記録ディスク
原盤１とする（図１）のに、ガラス原盤２上にフォトレ
ジスト３を塗布し（図２ａ）、レーザー光Ａで微細パタ
ーンＣをカッティングして（図２ｂ）、現像を行ない
（図２ｃ）その後、ニッケル電解メッキ（電鋳）を行な
う際の導電膜として、リンまたはボロンを含むニッケル
無電解メッキ層４が形成され（図２ｄ）、その上にニッ
ケル電解メッキ層５が電鋳形成されて（図２ｅ）、前記
ニッケル無電解メッキ層４がガラス原盤２から離して記
録ディスク原盤１とする（図２ｆ）。こうして製作した
記録ディスク原盤１を温度２５０〜４５０℃で熱処理す
る。例えば温度２５０〜４５０℃の加熱雰囲気下で所定
時間、例えば１０〜６０分間熱処理して、リンまたはボ
ロンをニッケル無電解メッキ層４の内部から表層に移動
させニッケルと結びつけて、硬質で微小な突起を均一に
生成させたのち常温で自然冷却する。この表面のニッケ
ル無電解メッキ層４を改質した記録ディスク原盤１を用
いてディスク基板を射出成形すると、離型ムラの発生が
なく、高密度の記録媒体を高品質の状態で製造できる。DESCRIPTION OF THE PREFERRED EMBODIMENTS In the following, description will be made with reference to the embodiment shown in FIGS. 1 and 2 by using a recording disk master 1 on which groove recording B is performed by a laser beam A (FIG. 1). Is applied (FIG. 2a), the fine pattern C is cut with a laser beam A (FIG. 2b), development is performed (FIG. 2c), and then phosphorous or nickel is used as a conductive film when nickel electroplating (electroforming) is performed. A nickel electroless plating layer 4 containing boron is formed (FIG. 2 d), and a nickel electroplating layer 5 is electroformed thereon (FIG. 2 e), and the nickel electroless plating layer 4 is separated from the glass master 2. This is a recording disk master 1 (FIG. 2f). The recording disk master 1 thus manufactured is heat-treated at a temperature of 250 to 450 ° C. For example, heat treatment is performed in a heating atmosphere at a temperature of 250 to 450 ° C. for a predetermined time, for example, 10 to 60 minutes, and phosphorus or boron is transferred from the inside of the nickel electroless plating layer 4 to the surface layer and combined with nickel to form hard and minute projections. And then naturally cooled at room temperature. When a disk substrate is injection-molded using the recording disk master 1 in which the nickel electroless plating layer 4 on the surface is modified, a high-density recording medium can be manufactured in a high-quality state without occurrence of mold release unevenness.
【０００９】この場合、前期記録ディスク原盤１を射出
成形金型（図示せず）内に装着してディスク基板を成形
するが、記録ディスク原盤１の無電解メッキ層４の表層
に微小突起が均一に形成されていることで、表面荒さが
微増し、ディスク基板の離型性を向上するし、しかもリ
ンまたはボロンが、表面付近に多く存在することで、ぬ
れ性が低下する、即ちぬれ難くなるし、溶融樹脂の粘着
力が弱まって記録ディスク原盤１側にとられているラン
ド（基板凸部）が欠けることが少なくなって、高密度の
記録媒体を高品質の状態で製造できる。なお、リンまた
はボロンが、多く含まれるほど、ニッケル−リンまたは
ニッケル−ボロンは、動摩擦係数が低くなるので、成形
基板に残留する応力が低下してディスク基板の機械特性
をも向上することができる。In this case, the recording disk master 1 is mounted in an injection mold (not shown) to form a disk substrate, and fine protrusions are uniformly formed on the surface layer of the electroless plating layer 4 of the recording disk master 1. Is formed, the surface roughness is slightly increased, the releasability of the disk substrate is improved, and moreover, phosphorus or boron is largely present near the surface, so that the wettability is reduced, that is, the wettability is reduced. However, the adhesive strength of the molten resin is weakened, and the lands (substrate projections) formed on the recording disk master 1 side are less likely to be chipped, so that a high-density recording medium can be manufactured in a high quality state. The more phosphorus or boron is included, the lower the coefficient of kinetic friction of nickel-phosphorus or nickel-boron, so that the stress remaining on the molded substrate is reduced and the mechanical properties of the disk substrate can be improved. .
【００１０】なお、前記ディスク原盤を温度２５０〜４
５０℃の加熱雰囲気下で所定時間放置するのは、温度２
５０℃未満であると、ディスク原盤１の表層に突起が生
成しにくく、生成されても現れる微小突起が不均一に形
成されて、数も少なくディスク基板の離型性を向上する
には至らないし、また、４５０℃以上とすると形成され
る突起が高さの高くなりすぎるか或いは大きくなりすぎ
るほか、突起の高さにバラツキがあって、大きさもまち
まちとなり均一性を保つことができなくなるので避ける
べきで、さらに加熱が急であると均一性が損なわれるの
で好ましくなく、熱処理温度と加熱処理時間とを勘案し
て好ましくは３００〜４００℃の加熱雰囲気下で１０〜
６０分間、好ましくは１５〜５０分間熱処理するのがよ
い。熱処理後は、大気温度まで２〜４時間徐冷する。The master disk is heated at a temperature of 250-4.
Leaving in a heating atmosphere of 50 ° C. for a predetermined time is performed at a temperature of 2 ° C.
If the temperature is lower than 50 ° C., projections are hardly generated on the surface layer of the master disc 1, and even if they are generated, minute projections appearing are formed nonuniformly, so that the number is small and the releasability of the disk substrate cannot be improved. In addition, when the temperature is set to 450 ° C. or higher, the height of the projections formed is too high or too large. In addition, the heights of the projections vary, and the sizes vary, and uniformity cannot be maintained. Further, if the heating is too rapid, the uniformity is impaired, which is not preferable. In consideration of the heat treatment temperature and the heat treatment time, the heating is preferably performed under a heating atmosphere of 300 to 400 ° C.
Heat treatment is preferably performed for 60 minutes, preferably 15 to 50 minutes. After the heat treatment, it is gradually cooled to the atmospheric temperature for 2 to 4 hours.
【００１１】また、この熱処理時間も処理温度が高い場
合には短く、処理温度が低い場合には長く調節して処理
し、ディスク原盤表面の無電解メッキ層４を改質した形
態とすることが配慮されるが、熱処理時間をパラメータ
とした時の熱処理温度の範囲は、３７０−２ｔ（ｍｉ
ｎ）＜Ｔ（℃）＜４７０−２ｔ（ｍｉｎ）とするのがよ
い（図３）。即ち、例えば、熱処理時間１０分の場合
は、熱処理温度は３５０〜４５０℃、３０分の場合は、
３１０〜４１０℃、６０分の場合は２５０〜３５０℃の
温度範囲を表している。即ち、このディスク原盤１を用
いて射出成形されるディスク基板が、ＣＤ−ＤＡ、ＤＶ
Ｄ−ＲＡＭなどでは、離型ムラが大幅に改善され、ま
た、基板径が小さいため離型ムラが出にくいＭＤでは付
着樹脂によるトラッキングエラーノイズが減少した。The heat treatment time may be short when the processing temperature is high, and long when the processing temperature is low, so that the electroless plating layer 4 on the surface of the master disk is modified. Although consideration is given, the range of the heat treatment temperature when the heat treatment time is used as a parameter is 370-2t (mi).
n) <T (° C.) <470-2t (min) (FIG. 3). That is, for example, when the heat treatment time is 10 minutes, the heat treatment temperature is 350 to 450 ° C., and when the heat treatment time is 30 minutes,
In the case of 310 to 410 ° C. and 60 minutes, the temperature range is 250 to 350 ° C. That is, a disk substrate injection-molded using the disk master 1 is a CD-DA, a DV
In the case of a D-RAM or the like, the release unevenness was greatly improved, and the tracking error noise due to the adhered resin was reduced in the MD in which the release unevenness was difficult to occur due to a small substrate diameter.
【００１２】なお、前記熱処理で生成される突起が、小
さいと離型性が悪く、大きいと特性上ノイズの増大問題
があるので、その高さを１００〜２００ であって、そ
の密度を１０個／μｍ2 以上とするのがよい。特に、従
来品のスタンパーを使用して４１万枚成形した後の表面
状態をＡＦＭ（原子間力顕微鏡）画像で観察すると、自
然発生した突起は大きさが不均一で少量生成しているの
が確認された。これに対し、本願発明の実施例である３
００℃で１時間熱処理したものの表面状態をＡＦＭ画像
（図５）で観察すると前記従来品に比べて多量の突起が
略均一の大きさで均一（２０／μｍ2 ）に分布発生して
いるのが確認された。If the protrusions formed by the heat treatment are small, the releasability is poor, and if the protrusions are large, there is a problem of an increase in noise. Therefore, the height is 100 to 200 and the density is 10 pieces. / Μm 2 or more. In particular, when the surface state after forming 410,000 sheets using a conventional stamper is observed with an AFM (atomic force microscope) image, it is found that the naturally generated projections are uneven in size and are generated in small quantities. confirmed. On the other hand, 3 which is the embodiment of the present invention is
Observation of the surface state of the product heat-treated at 00 ° C. for 1 hour by an AFM image (FIG. 5) reveals that a large amount of projections are generated with a substantially uniform size and distribution (20 / μm 2 ) as compared with the conventional product. Was confirmed.
【００１３】本発明の具体例を次に示す。 実施例 前述の手法で製作したディスク原盤を温度３００℃の加
熱雰囲気下で時間６０分間、熱処理した場合、ニッケル
−リン無電解メッキ層の表層に粒径５０〜８０ｎｍ、高
さ５〜１０ｎｍの突起が平均２００ｎｍの間隔で一様に
形成できた。このスタンパーを使用して２５万枚成形後
にその表面に付着した物質の量を原子で表す指標の付着
物量は、炭素ベースで４１．０％減少した（表１参
照）。 実施例 前述の手法で製作したディスク原盤を温度４００℃の加
熱雰囲気下で時間１０分間、熱処理した場合、ニッケル
−リン無電解メッキ層の表層に粒径４０〜９０ｎｍ、高
さ５〜１２ｎｍの突起が平均２７０ｎｍの間隔で一様に
形成できた。このスタンパーを前記実施例の使用条件
後その表面に付着した物質の量を原子で表す指標の付着
物量は、炭素ベースで３９．３％減少した（表１参
照）。表２は、スタンパー表面のぬれ性を測定したもの
で、従来品に較べてぬれ性が低下しており、このため成
形時の樹脂流入抵抗が減少すると共に、離型性が向上す
る。A specific example of the present invention will be described below. Example When a disk master manufactured by the above-described method was heat-treated in a heating atmosphere at a temperature of 300 ° C. for 60 minutes, a protrusion having a particle size of 50 to 80 nm and a height of 5 to 10 nm was formed on the surface of the nickel-phosphorus electroless plating layer. Were uniformly formed at an average interval of 200 nm. After molding 250,000 sheets using this stamper, the amount of attached matter, which is an index indicating the amount of material attached to the surface by atoms, was reduced by 41.0% on a carbon basis (see Table 1). Example When a disc master manufactured by the above-described method was heat-treated in a heating atmosphere at a temperature of 400 ° C. for 10 minutes, a protrusion having a particle size of 40 to 90 nm and a height of 5 to 12 nm was formed on the surface of the nickel-phosphorus electroless plating layer. Were uniformly formed at an average interval of 270 nm. After the stamper was used under the conditions of the above-described embodiment, the amount of the substance attached to the surface, which indicates the amount of the substance attached to the surface by atoms, was reduced by 39.3% on a carbon basis (see Table 1). Table 2 shows the measurement of the wettability of the surface of the stamper. The wettability is lower than that of the conventional product, so that the resin inflow resistance at the time of molding is reduced and the releasability is improved.
【００１４】[0014]
【表 １】 [Table 1]
【００１５】[0015]
【表 ２】 [Table 2]
【００１６】各実施例においては、前記ディスク原盤１
は、真空中で熱処理するのが、ニッケル−リン無電解メ
ッキ層の表層に生ずる突起の性状に安定性が見られ均一
性が得られるので、この雰囲気で処理するのがよいが、
他に不活性ガス、酸素、窒素のいずれかの雰囲気中で熱
処理されることも推奨される有効な処理条件の一つであ
る。In each embodiment, the disk master 1
Is heat-treated in a vacuum, and the properties of the projections formed on the surface layer of the nickel-phosphorous electroless plating layer are stable and uniformity can be obtained.
In addition, heat treatment in an atmosphere of an inert gas, oxygen, or nitrogen is one of the recommended effective treatment conditions.
【００１７】[0017]
【発明の効果】本発明は、ニッケル電解メッキ層（電
鋳）の上にリンまたはボロンを含むニッケル無電解メッ
キ層を形成したディスク原盤であって、該ディスク原盤
を温度２５０〜４５０℃で熱処理して前記無電解メッキ
層の表層上に微小な突起を生成したことにより、ディス
ク原盤の表面の無電解メッキ層を改質することができ、
ディスク原盤とディスク基板の溶融樹脂との粘着性と、
溶融樹脂の流動時の流入抵抗を良好にすると共に、離型
性を向上し、これによって表面付着物質が減少するため
高品質の記録媒体を多量生産できるものである。According to the present invention, there is provided a disk master in which a nickel electroless plating layer containing phosphorus or boron is formed on a nickel electrolytic plating layer (electroforming), wherein the disk master is heat-treated at a temperature of 250 to 450 ° C. By generating minute projections on the surface layer of the electroless plating layer, it is possible to modify the electroless plating layer on the surface of the disc master,
The adhesiveness between the disc master and the molten resin of the disc substrate,
In addition to improving the inflow resistance of the molten resin at the time of flow, the releasability is improved, and the amount of substances adhering to the surface is reduced, so that a high-quality recording medium can be mass-produced.
【図１】本発明によるディスク原盤の一部の表面を拡大
した状態の斜視図で、（ａ）はグルーブ記録を示す。
（ｂ）はランド／グルーブ記録を示す。FIG. 1 is a perspective view showing a partially enlarged surface of a master disc according to the present invention, and FIG. 1 (a) shows groove recording.
(B) shows land / groove recording.
【図２】図１のディスク原盤の製造工程を示す実施例で
であり、（ａ）はフォトレジスト塗布工程、（ｂ）はレ
ーザーカッティング工程、（ｃ）は現像工程、（ｄ）は
無電解メッキ工程、（ｅ）は電解メッキ工程、（ｆ）は
ディスク原盤の離型工程を示す。FIGS. 2A and 2B are examples showing a manufacturing process of the master disc of FIG. 1, wherein FIG. 2A shows a photoresist coating process, FIG. 2B shows a laser cutting process, FIG. 2C shows a developing process, and FIG. The plating step, (e) shows the electrolytic plating step, and (f) shows the mold release step of the master disk.
【図３】本発明の実施例の処理時間と処理温度との関係
を示す特性線図である。FIG. 3 is a characteristic diagram showing a relationship between a processing time and a processing temperature in an example of the present invention.
【図４】本発明のディスク原盤表面の熱処理前のＡＦＭ
画像写真を示す。FIG. 4 shows an AFM of a disk master according to the present invention before heat treatment.
An image photograph is shown.
【図５】本発明のディスク原盤熱処理後の表面のＡＦＭ
画像写真を示す。FIG. 5 is an AFM of a surface after heat treatment of a master disk according to the present invention.
An image photograph is shown.
１ ディスク原盤 ２ ガラス原盤 ３ フォトレジスト ４ 無電解メッキ層 ５ 電解メッキ層 Ａ レーザー光 Ｂ グルーブ記録 Ｃ 微細パターン DESCRIPTION OF SYMBOLS 1 Disc master 2 Glass master 3 Photoresist 4 Electroless plating layer 5 Electroplating layer A Laser beam B Groove recording C Fine pattern
Claims (4)
ンまたはボロンを含むニッケル無電解メッキ層を形成し
たディスク原盤において、該ディスク原盤を温度２５０
〜４５０℃で熱処理して前記無電解メッキ層の表層上に
微小な突起を生成したことを特徴とするディスク原盤。1. A disk master having a nickel electroless plating layer containing phosphorus or boron formed on a nickel electrolytic plating layer (electroforming), wherein the disk master has a temperature of 250.degree.
A master disk, wherein heat treatment is performed at a temperature of about 450 ° C. to form minute projections on the surface of the electroless plating layer.
れることを特徴とする請求項１記載のディスク原盤。2. The disk master according to claim 1, wherein the disk master is heat-treated in a vacuum.
素、窒素のいずれかの雰囲気中で熱処理されることを特
徴とする請求項１記載のディスク原盤。3. The master disc according to claim 1, wherein the master disc is heat-treated in an atmosphere of an inert gas, oxygen, or nitrogen.
って、その密度を１０個／μｍ2 以上としたことを特徴
とする請求項１，２または３記載のディスク原盤。4. The disk master according to claim 1, wherein the height of the projections is 100 to 200 and the density is 10 protrusions / μm 2 or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15392498A JPH11328748A (en) | 1998-05-19 | 1998-05-19 | Master disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15392498A JPH11328748A (en) | 1998-05-19 | 1998-05-19 | Master disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11328748A true JPH11328748A (en) | 1999-11-30 |
Family
ID=15573068
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15392498A Withdrawn JPH11328748A (en) | 1998-05-19 | 1998-05-19 | Master disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11328748A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1154421A2 (en) * | 2000-05-12 | 2001-11-14 | Pioneer Corporation | Production method for optical disc |
| JP2008111175A (en) * | 2006-10-31 | 2008-05-15 | Fujikura Kasei Co Ltd | Composite metal powder, its production method, and electrically conductive paste |
-
1998
- 1998-05-19 JP JP15392498A patent/JPH11328748A/en not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1154421A2 (en) * | 2000-05-12 | 2001-11-14 | Pioneer Corporation | Production method for optical disc |
| EP1154421A3 (en) * | 2000-05-12 | 2006-06-07 | Pioneer Corporation | Production method for optical disc |
| EP1764797A3 (en) * | 2000-05-12 | 2008-11-19 | Pioneer Corporation | Production method for optical disc |
| JP2008111175A (en) * | 2006-10-31 | 2008-05-15 | Fujikura Kasei Co Ltd | Composite metal powder, its production method, and electrically conductive paste |
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