JPH11310429A - Glass composition for substrate board - Google Patents

Glass composition for substrate board

Info

Publication number
JPH11310429A
JPH11310429A JP11729398A JP11729398A JPH11310429A JP H11310429 A JPH11310429 A JP H11310429A JP 11729398 A JP11729398 A JP 11729398A JP 11729398 A JP11729398 A JP 11729398A JP H11310429 A JPH11310429 A JP H11310429A
Authority
JP
Japan
Prior art keywords
glass
less
thermal expansion
substrate
cao
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11729398A
Other languages
Japanese (ja)
Inventor
Tetsuya Nakajima
哲也 中島
Takashi Maeda
敬 前田
Yasumasa Nakao
泰昌 中尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP11729398A priority Critical patent/JPH11310429A/en
Publication of JPH11310429A publication Critical patent/JPH11310429A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a glass composition for substrate board to be used in a flat display, particularly for a field emission display(FED) that uses transference electrodes and seals the panel peripheries with frit or for a plasma display panel(PDP). SOLUTION: This glass composition contains 65-73 wt.% of SiO2 , 0-8 wt.% of Al2 O3 , 65-73 wt.% of SiO2 +Al2 O3 , 2-10 wt.% of B2 O3 , 0-10 wt.% of MgO, 0-15 wt.% of CaO, 0-12 wt.% of Na2 O, 0-16 wt.% of K2 O, 1-20 wt.% of Na2 O+ K2 O; 17-33 wt.% of MgO+CaO+Na2 O+K2 O and 27-35 wt.% of B2 O3 +MgO+ CaO+Na2 O+K2 O.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【０００１】[0001]

【発明の属する技術分野】本発明は、フラットディスプ
レイ、特に透明電極を使用し、パネル周囲をフリットシ
ールすることで製造されるフィールドエミッションディ
スプレイ（ＦＥＤ）やプラズマディスプレイパネル（Ｐ
ＤＰ）用などの基板用ガラス組成物に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat display, particularly a field emission display (FED) and a plasma display panel (P) manufactured by using a transparent electrode and frit sealing around the panel.
The present invention relates to a glass composition for a substrate such as DP).

【０００２】[0002]

【従来の技術】フラットディスプレイに関して様々な表
示方式が開発されているが、そのなかでも、前面、背面
のガラス基板上に電極を形成し、両基板間で発生させた
電子線や放電を利用し蛍光体を発光させる自発光式のデ
ィスプレイが注目されてきている。その代表例としては
ＦＥＤやＰＤＰなどが挙げられる。2. Description of the Related Art Various display methods have been developed for flat displays. Among them, electrodes are formed on front and rear glass substrates, and an electron beam or discharge generated between the two substrates is used. A self-luminous display that emits a phosphor has been attracting attention. Representative examples include FED and PDP.

【０００３】ＦＥＤは現在様々な方式が提案されている
が、いずれも、背面基板上の電極で発生させた電子線を
前面基板上の透明電極に照射し、透明電極上にパターニ
ングした蛍光体を励起・発光させる方式を採用してい
る。このとき、ブラウン管と同様に照射空間は真空状態
が必要となるため、パネルは周囲をフリットシールされ
た後、真空排気されて作製される。[0003] Various types of FEDs have been proposed at present, but in each case, an electron beam generated by an electrode on a rear substrate is irradiated on a transparent electrode on a front substrate to form a patterned phosphor on the transparent electrode. Excitation and light emission are adopted. At this time, as in the case of the cathode ray tube, the irradiation space needs to be in a vacuum state. Therefore, the panel is prepared by frit sealing the periphery and then evacuating the panel.

【０００４】また、ＰＤＰは一般的に、前面基板上の透
明電極間でプラズマ放電を起こし紫外線を発生させ、背
面基板上に形成された画素空間中の蛍光体を励起・発光
させている。この放電はＸｅ−Ｎｅ混合ガス中で行う必
要があるため、パネルは周囲をフリットシールし混合ガ
スを封入して作製される。In general, a PDP generates a plasma discharge between transparent electrodes on a front substrate to generate ultraviolet rays to excite and emit a phosphor in a pixel space formed on a rear substrate. Since this discharge needs to be performed in a Xe-Ne mixed gas, the panel is prepared by frit sealing the periphery and sealing the mixed gas.

【０００５】いずれの方式にも共通することとして、前
面基板上に透明電極を形成すること、および前面、背面
の基板をフリットシールしてパネルを作製することが挙
げられる。透明電極としてはＩＴＯ（Ｉｎ2 Ｏ3 ：Ｓ
ｎ）やＳｎＯ2 が一般的に用いられている。Common to both methods is to form a transparent electrode on the front substrate and to produce a panel by frit sealing the front and rear substrates. ITO (In 2 O 3 : S) is used as the transparent electrode.
n) and SnO 2 are generally used.

【０００６】[0006]

【発明が解決しようとする課題】このようなフラットデ
ィスプレイ用基板として、建築用または自動車用として
広く用いられるソーダ石灰ガラスや、特開平３−４０９
３３や特開平７−２５７９３７、特開平８−１６５１３
８、特開平８−２９０９３８、特開平９−２０２６４１
等に開示された、耐熱性を改善した高歪点ガラスが知ら
れている。しかし、透明電極として使用されるＩＴＯや
ＳｎＯ2 の５０〜３５０℃における平均熱膨張係数は約
４０×１０-7／℃であるのに対し、これら基板ガラスの
５０〜３５０℃における平均熱膨張係数は７５×１０-7
〜９５×１０-7／℃と大きいため、温度変化によって生
じる膨脹、収縮のため両者が剥離したり、透明電極膜に
クラックを生じたりするなどの問題があり、歩留を低下
させるという課題があった。As such a flat display substrate, soda-lime glass widely used for architectural or automobile use, and Japanese Unexamined Patent Application Publication No. 3-409 / 1991.
33, JP-A-7-257937, JP-A-8-16513
8, JP-A-8-290938, JP-A-9-202641
And the like, a high strain point glass with improved heat resistance is known. However, while the average thermal expansion coefficient at 50 to 350 ° C. of ITO or SnO 2 used as a transparent electrode is about 40 × 10 -7 / ℃, average thermal expansion coefficient at 50 to 350 ° C. These substrate glass Is 75 × 10 -7
Since it is as large as about 95 × 10 −7 / ° C., there are problems such as separation due to expansion and contraction caused by a change in temperature, cracks in the transparent electrode film, etc., and a problem of lowering the yield. there were.

【０００７】また、平均熱膨張係数が５０×１０-7／℃
以下である液晶用の基板ガラスも知られている（特開昭
６３−７４９３５、特開平４−１６００３０、特開平４
−３２５４３４、特開平６−２６３４７３）。これらを
基板ガラスとして用いれば、透明電極との熱膨脹係数が
近いため、上記歩留を向上することが可能となる。しか
し、これら基板ガラスの熱膨張係数は非常に小さく、こ
れに適当なシールフリット材料の焼成温度は非常に高い
ため、フリットシール時に画素を構成している他の部材
の化学変化や軟化流動が起こるという問題があった。Further, the average thermal expansion coefficient is 50 × 10 −7 / ° C.
The following liquid crystal substrate glasses are also known (Japanese Patent Application Laid-Open Nos. Sho 63-74935, Hei 4-160030, Hei 4
-325434, JP-A-6-263473). When these are used as the substrate glass, the coefficient of thermal expansion is close to that of the transparent electrode, so that the yield can be improved. However, since the thermal expansion coefficient of these substrate glasses is very small and the firing temperature of the appropriate seal frit material is very high, chemical changes and softening flow of other members constituting the pixel occur during frit sealing. There was a problem.

【０００８】ここで、平均熱膨張係数が６０×１０-7〜
７５×１０-7／℃である基板用ガラスが知られている
（特開平３−１７０３４３、特開平９−２４９４３
０）。これらのガラスを基板として用いれば、透明電極
と熱膨脹係数が比較的近いため、上記歩留を向上するこ
とが可能となり、またアルミナセラミックス基板用のシ
ールフリット材料を用いて他の部材の化学変化や軟化流
動を起こすことなくパネルを製造することが可能とな
る。しかし、特開平３−１７０３４３記載のガラス組成
物は比重が大きく、部材の軽量化が困難であり、また傷
が付きやすいという課題があった。また、特開平９−２
４９４３０記載のガラス組成物はＳｉＯ2 およびＡｌ2
Ｏ3 含有量が多いため、高温粘度が高く、フロート成形
が困難であるという課題があった。フロート成形はガラ
スの粘度として１０4 ポアズに相当する温度付近で行わ
れるが、１３００℃を超える温度では成形が困難である
ため、それ以下の温度で成形できるガラスが求められて
いる。Here, the average thermal expansion coefficient is 60 × 10 -7 to
Glasses for substrates having a density of 75 × 10 −7 / ° C. are known (JP-A-3-170343, JP-A-9-24943).
0). When these glasses are used as a substrate, the above-mentioned yield can be improved because the coefficient of thermal expansion is relatively close to that of the transparent electrode. A panel can be manufactured without causing a softening flow. However, the glass composition described in JP-A-3-170343 has a problem that the specific gravity is large, it is difficult to reduce the weight of the member, and the glass composition is easily damaged. Also, Japanese Patent Application Laid-Open No. 9-2
49430 is SiO 2 and Al 2
Since the O 3 content is large, there is a problem that the high temperature viscosity is high and the float molding is difficult. Float molding is carried out at a temperature corresponding to a viscosity of 10 4 poise as the viscosity of the glass. However, it is difficult to form the glass at a temperature exceeding 1300 ° C. Therefore, a glass which can be formed at a temperature lower than that is required.

【０００９】また、平均熱膨張係数が７２×１０-7付近
であるガラスとしてショット社のＤ２６３、コーニング
社の＃０２１１などが知られている。しかし、これらの
ガラスはＺｎＯを多量含有するため、フロート法による
成形時に失透が生じやすいという課題があった。Further, as a glass having an average coefficient of thermal expansion of about 72 × 10 -7 , D263 manufactured by Schott and # 0211 manufactured by Corning are known. However, since these glasses contain a large amount of ZnO, there is a problem that devitrification easily occurs during molding by the float method.

【００１０】[0010]

【課題を解決するための手段】本発明は、５０〜３５０
℃の平均熱膨張係数が６０×１０-7〜７５×１０-7／℃
の範囲にあり、重量％表示で実質的に、 ＳｉＯ2 ６５〜７３未満、 Ａｌ2 Ｏ3 ０〜８未満、 ＳｉＯ2 ＋Ａｌ2 Ｏ3 ６５〜７３未満、 Ｂ2 Ｏ3 ２〜１０、 ＭｇＯ ０〜１０、 ＣａＯ ０〜１５、 Ｎａ2 Ｏ ０〜１２、 Ｋ2 Ｏ ０〜１６、 Ｎａ2 Ｏ＋Ｋ2 Ｏ １〜２０、 ＭｇＯ＋ＣａＯ＋Ｎａ2 Ｏ＋Ｋ2 Ｏ １７超〜３３、 Ｂ2 Ｏ3 ＋ＭｇＯ＋ＣａＯ＋Ｎａ2 Ｏ＋Ｋ2 Ｏ ２７超〜３５、 からなる基板に用いるためのガラス組成物である。SUMMARY OF THE INVENTION According to the present invention, there is provided a method comprising
Average coefficient of thermal expansion at 60 ° C. is 60 × 10 −7 to 75 × 10 −7 / ° C.
In the range of substantially in weight percentages less than SiO 2 65~73, Al 2 O 3 less than 0~8, SiO 2 + Al 2 O 3 less than 65~73, B 2 O 3 2~10, MgO 0 ~10, CaO 0~15, Na 2 O 0~12, K 2 O 0~16, Na 2 O + K 2 O 1~20, MgO + CaO + Na 2 O + K 2 O 17 super ~33, B 2 O 3 + MgO + CaO + Na 2 O + K 2 O A glass composition for use in a substrate consisting of more than 27 to 35.

【００１１】[0011]

【発明の実施の形態】本発明による組成の成分について
説明する。 ＳｉＯ2 ：ガラスの骨格を形成する成分で、６５重量％
（以下単に％と記載する）未満では、ガラスの耐熱性が
悪くなり、化学的耐久性が低下する。好ましくは６５．
５％以上である。他方、７３％以上では熱膨張係数が低
下する。好ましくは７２．５％以下である。DESCRIPTION OF THE PREFERRED EMBODIMENTS The components of the composition according to the present invention will be described. SiO 2 : a component forming a glass skeleton, 65% by weight
If it is less than (hereinafter simply referred to as%), the heat resistance of the glass deteriorates, and the chemical durability decreases. Preferably 65.
5% or more. On the other hand, if it is 73% or more, the thermal expansion coefficient decreases. Preferably it is 72.5% or less.

【００１２】Ａｌ2 Ｏ3 ：必須成分ではないが、ガラス
転移点を上げ、耐熱性を向上させる効果があるため含有
させうる。好ましくは０．５％以上である。しかし、８
％以上ではガラスの高温粘度が上昇し、フロート成形が
困難になる。好ましくは７．５％以下である。Al 2 O 3 : Although not an essential component, it can be contained because it has an effect of raising the glass transition point and improving heat resistance. Preferably it is 0.5% or more. But 8
% Or more, the high temperature viscosity of the glass increases, and float molding becomes difficult. Preferably it is 7.5% or less.

【００１３】ＳｉＯ2 ＋Ａｌ2 Ｏ3 ：ガラスの耐熱性や
化学的耐久性を向上させるため、合量で６５％以上含有
する。好ましくは６５．５％以上である。他方、合量で
７３％以上ではガラスの熱膨張係数が低下し、かつフロ
ート成形が困難になる。好ましくは７２．５％以下であ
る。SiO 2 + Al 2 O 3 : 65% or more in total in order to improve the heat resistance and chemical durability of glass. It is preferably at least 65.5%. On the other hand, if the total amount is 73% or more, the thermal expansion coefficient of the glass decreases, and float molding becomes difficult. Preferably it is 72.5% or less.

【００１４】Ｂ2 Ｏ3 ：ガラスの溶解時の粘性を下げ、
溶解を促進する効果があるため２％以上含有する。好ま
しくは３％以上である。しかし、１０％超ではガラスの
熱膨脹係数が低下する。好ましくは９％以下である。B 2 O 3 : lowers the viscosity of glass at the time of melting,
Since it has the effect of accelerating dissolution, it is contained at 2% or more. It is preferably at least 3%. However, if it exceeds 10%, the thermal expansion coefficient of the glass decreases. Preferably it is 9% or less.

【００１５】ＭｇＯ：必須成分ではないが、ガラスの溶
解時の粘性を下げ、溶解を促進する効果があるので含有
させうる。好ましくは１％以上である。しかし、１０％
超ではガラスの熱膨張係数が大きくなり、かつ失透温度
が高くなる。好ましくは９％以下である。MgO: Although not an essential component, it can be contained because it has the effect of lowering the viscosity of glass at the time of melting and promoting melting. It is preferably at least 1%. But 10%
If it is more than the glass, the coefficient of thermal expansion of the glass increases, and the devitrification temperature increases. Preferably it is 9% or less.

【００１６】ＣａＯ：必須成分ではないが、ガラスの溶
解時の粘性を下げ、溶解を促進する効果があるので含有
させうる。好ましくは１％以上である。しかし、１５％
超ではガラスの熱膨張係数が大きくなり、かつ失透温度
が高くなる。好ましくは１４％以下である。CaO: Although not an essential component, CaO can be contained because it has the effect of lowering the viscosity of glass at the time of melting and promoting melting. It is preferably at least 1%. But 15%
If it is more than the glass, the coefficient of thermal expansion of the glass increases, and the devitrification temperature increases. Preferably it is 14% or less.

【００１７】Ｎａ2 Ｏ：必須成分ではないが、ガラスの
溶解時の粘性を下げ、溶解を促進する効果があるので含
有させうる。好ましくは１％以上である。しかし、１２
％超ではガラスの熱膨張係数が大きくなり、かつガラス
の化学耐久性が低下する傾向がある。好ましくは１１％
以下である。Na 2 O: Although not an essential component, it can be contained because it has the effect of lowering the viscosity of glass at the time of melting and promoting melting. It is preferably at least 1%. However, 12
%, The thermal expansion coefficient of the glass tends to increase, and the chemical durability of the glass tends to decrease. Preferably 11%
It is as follows.

【００１８】Ｋ2 Ｏ：必須成分ではないが、ガラスの溶
解時の粘性を下げ、溶解を促進する効果があるので含有
させうる。好ましくは１％以上である。しかし、１６％
超ではガラスの熱膨張係数が大きくなり、かつガラスの
化学耐久性が低下する傾向がある。好ましくは１５％以
下である。K 2 O: Although not an essential component, it can be contained because it has the effect of lowering the viscosity of glass at the time of melting and promoting melting. It is preferably at least 1%. But 16%
If it is larger, the coefficient of thermal expansion of the glass tends to increase, and the chemical durability of the glass tends to decrease. Preferably it is 15% or less.

【００１９】Ｎａ2 Ｏ＋Ｋ2 Ｏ：ガラスの溶解温度での
粘性を下げ、溶解しやすくするため、合量で１％以上含
有する。好ましくは２％以上である。他方、合量で２０
％超ではガラスの熱膨張係数が大きくなり、かつ化学耐
久性が低下する。好ましくは１９％以下である。Na 2 O + K 2 O: In order to reduce the viscosity of glass at the melting temperature and to facilitate melting, it is contained in a total amount of 1% or more. It is preferably at least 2%. On the other hand, 20
%, The coefficient of thermal expansion of the glass increases and the chemical durability decreases. Preferably it is 19% or less.

【００２０】ＭｇＯ＋ＣａＯ＋Ｎａ2 Ｏ＋Ｋ2 Ｏ：ガラ
スの溶解温度での粘性を下げ、溶解しやすくするため、
合量で１７％超含有する。好ましくは１８％以上であ
る。他方、合量で３３％超ではガラスの熱膨張係数が大
きくなり、かつ失透温度が高くなり、化学耐久性が低下
する。好ましくは３２％以下である。MgO + CaO + Na 2 O + K 2 O: In order to lower the viscosity of glass at the melting temperature and to facilitate melting,
Contains more than 17% in total. It is preferably at least 18%. On the other hand, if the total amount exceeds 33%, the thermal expansion coefficient of the glass increases, the devitrification temperature increases, and the chemical durability decreases. Preferably it is 32% or less.

【００２１】Ｂ2 Ｏ3 ＋ＭｇＯ＋ＣａＯ＋Ｎａ2 Ｏ＋Ｋ
2 Ｏ：ガラスの溶解温度での粘性を下げ、溶解しやすく
するため、合量で２７％超含有する。好ましくは２７．
５％以上である。他方、合量で３５％超ではガラスの熱
膨張係数が大きくなり、かつ失透温度が高くなり、化学
耐久性が低下する。好ましくは３４．５％以下である。B 2 O 3 + MgO + CaO + Na 2 O + K
2 O: In order to lower the viscosity at the melting temperature of the glass and facilitate melting, the total content is more than 27%. Preferably 27.
5% or more. On the other hand, if the total amount exceeds 35%, the thermal expansion coefficient of the glass increases, the devitrification temperature increases, and the chemical durability decreases. Preferably it is 34.5% or less.

【００２２】以上の成分の他、ＳＯ3 、Ａｓ2 Ｏ3 、Ｓ
ｂ2 Ｏ3 等の清澄剤、Ｆｅ2 Ｏ3 、ＮｉＯ、ＣｏＯ等の
着色剤を適宜使用できる。また、電子線等によるブラウ
ニングを防止するため、ＴｉＯ2 、ＣｅＯ2 をそれぞれ
２％以下、合量で２％以下添加できる。In addition to the above components, SO 3 , As 2 O 3 , S
A fining agent such as b 2 O 3 and a coloring agent such as Fe 2 O 3 , NiO and CoO can be used as appropriate. In order to prevent browning due to an electron beam or the like, TiO 2 and CeO 2 can be added in an amount of 2% or less, respectively, and a total amount of 2% or less.

【００２３】また、ＣａＯ、ＭｇＯと同様の効果を得る
ために、ＳｒＯ、ＢａＯ、ＺｎＯを添加できる。ただ
し、ＳｒＯ、ＢａＯの過度の添加は比重を大きくするお
それがあり、またＺｎＯの過度の添加は失透温度の上昇
をまねくおそれがあるため、ＳｒＯ、ＢａＯ、ＺｎＯを
それぞれ２％以下、合量で２％以下とすることが好まし
い。また、Ｎａ2 Ｏ、Ｋ2 Ｏと同様の効果を得るため
に、Ｌｉ2 Ｏを添加できる。ただし、過度の添加はガラ
ス転移点の低下をもたらすおそれがあるため、１％以下
とすることが好ましい。In order to obtain the same effect as CaO and MgO, SrO, BaO and ZnO can be added. However, excessive addition of SrO and BaO may increase the specific gravity, and excessive addition of ZnO may increase the devitrification temperature. Therefore, the content of SrO, BaO and ZnO is 2% or less, respectively. Is preferably 2% or less. Further, Li 2 O can be added to obtain the same effect as Na 2 O and K 2 O. However, since excessive addition may cause a decrease in the glass transition point, it is preferably 1% or less.

【００２４】本発明の基板用ガラス組成物は、典型的に
は、５０〜３５０℃の平均熱膨張係数が６０×１０-7〜
７５×１０-7／℃の範囲にあるので、ガラス基板上に透
明電極を形成しても膜の剥離やクラックが発生しにく
く、高い歩留でＦＥＤやＰＤＰなどのパネルを製造する
ことが可能となる。また、アルミナセラミックス基板用
のシールフリット材料を用いてパネル周囲をシールし、
パネルを製造することが可能である。より好ましくは５
０〜３５０℃の平均熱膨張係数が６１×１０-7〜７４×
１０-7／℃の範囲である。The glass composition for a substrate of the present invention typically has an average coefficient of thermal expansion at 50 to 350 ° C. of 60 × 10 −7 to 60 × 10 −7 .
Since it is in the range of 75 × 10 −7 / ° C., even if a transparent electrode is formed on a glass substrate, peeling or cracking of the film hardly occurs, and panels such as FED and PDP can be manufactured with high yield. Becomes In addition, the periphery of the panel is sealed using a seal frit material for an alumina ceramics substrate,
Panels can be manufactured. More preferably 5
The average thermal expansion coefficient at 0 to 350 ° C. is 61 × 10 −7 to 74 ×
It is in the range of 10 -7 / ° C.

【００２５】また、本発明の基板用ガラス組成物の、ガ
ラスの粘度として１０4 ポアズに相当する温度は１３０
０℃以下であることが好ましい。より好ましくは１２７
０℃以下である。このため、フロート法による成形に適
している。さらに、本発明の基板用ガラス組成物の比重
は２．６未満であることが好ましい。これによって、部
材の軽量化が達成でき、より軽いパネルの製造が可能と
なる。The glass composition for a substrate according to the present invention has a glass viscosity of 10 4 poise at a temperature of 130 poise.
It is preferably 0 ° C. or lower. More preferably 127
0 ° C. or less. Therefore, it is suitable for molding by the float method. Further, the specific gravity of the glass composition for a substrate of the present invention is preferably less than 2.6. As a result, the weight of the member can be reduced, and a lighter panel can be manufactured.

【００２６】本発明のガラスは、例えば次のような方法
で製造できる。通常使用される各成分の原料を目標組成
となるように調合し、これを溶解炉に連続的に投入し、
１５００〜１７００℃に加熱して溶融する。この溶解ガ
ラスをフロート法により所定の板厚に成形し、徐冷後切
断する。The glass of the present invention can be produced, for example, by the following method. The raw materials of each commonly used component are blended to have the target composition, and this is continuously charged into the melting furnace,
It heats to 1500-1700 degreeC and melts. This molten glass is formed into a predetermined thickness by a float method, and then cut after slow cooling.

【００２７】[0027]

【実施例】各成分の原料を目標組成になるように調合
し、白金坩堝を用いて１５５０〜１６５０℃の温度で４
時間加熱し溶融した。溶解にあたっては、白金スターラ
ーを挿入し２時間撹拌しガラスの均質化を行った。次い
で溶解ガラスを流し出し、板状に成形後徐冷した。EXAMPLE A raw material of each component was prepared to have a target composition, and was heated at a temperature of 1550-1650 ° C. using a platinum crucible.
Heated and melted for hours. Upon melting, a platinum stirrer was inserted and stirred for 2 hours to homogenize the glass. Next, the molten glass was poured out, formed into a plate, and then gradually cooled.

【００２８】こうして得られたガラスの比重ｄ、平均熱
膨張係数α（単位：×１０-7／℃）、ガラス転移点Ｔg
（単位：℃）、ガラスの粘度として１０4 ポアズに相当
する温度Ｔ4 （単位：℃）を測定し、表１〜２にガラス
組成とともに示した。以下に各物性の測定方法を示す。The specific gravity d of the glass thus obtained, the average coefficient of thermal expansion α (unit: × 10 −7 / ° C.), the glass transition point T g
(Unit: ° C.), temperature T 4 (unit: ° C.) corresponding to 10 4 poise as the viscosity of glass was measured, and shown in Tables 1 and 2 together with the glass composition. The method for measuring each physical property is described below.

【００２９】比重：泡を含まない約２０ｇのガラス塊を
アルキメデス法によって測定する。Specific gravity: About 20 g of a lump of glass containing no bubbles is measured by the Archimedes method.

【００３０】平均熱膨張係数：示差熱膨張計を用いて、
石英ガラスを参照試料として室温から５℃／分の割合で
昇温した際のガラスの伸び率を測定する。測定はガラス
が軟化してもはや伸びが観測されなくなる温度（屈伏
点）まで行い、５０〜３５０℃の平均の線熱膨張係数を
算出した。Average coefficient of thermal expansion: Using a differential thermal dilatometer,
Using a quartz glass as a reference sample, the elongation of the glass is measured when the temperature is raised from room temperature at a rate of 5 ° C./min. The measurement was performed until the temperature at which the glass was softened and elongation was no longer observed (yield point), and the average linear thermal expansion coefficient at 50 to 350 ° C was calculated.

【００３１】ガラス転移点：熱膨張曲線における屈曲点
をガラス転移点とした。Glass transition point: The bending point in the thermal expansion curve was taken as the glass transition point.

【００３２】ガラスの粘度として１０4 ポアズに相当す
る温度：ガラスの粘度として１０4ポアズに相当する温
度を回転粘度計にて測定した。The temperature corresponding to 10 4 poise as a viscosity of the glass was measured the temperature corresponding to 10 4 poise as a viscosity of the glass at a rotational viscometer.

【００３３】このうち、例１５〜１９は比較例であり、
例１５はソーダ石灰ガラスの例、例１６は特開平３−１
７０３４３記載の組成物の例、例１７〜１９は特開平９
−２４９４３０記載の組成物の例である。Examples 15 to 19 are comparative examples.
Example 15 is an example of soda-lime glass, and Example 16 is JP-A-3-1.
Examples of the composition described in No. 70343, Examples 17 to 19
-249430 is an example of the composition described.

【００３４】表１より明らかなように、本発明の実施例
におけるガラスの平均熱膨張係数は６０×１０-7〜７５
×１０-7／℃の範囲にあるため、ガラス基板上に透明電
極を形成しても膜の剥離やクラックが発生しにくく、高
い歩留でＦＥＤやＰＤＰなどのパネルを製造することが
可能となる。また、アルミナセラミックス基板用のシー
ルフリット材料を用いてパネル周囲をシールし、パネル
を製造することができる。また、ガラスの粘度として１
０4 ポアズに相当する温度が１３００℃以下であるた
め、フロート法による成形に適している。さらに、比重
が２．６未満であるため、部材の軽量化が達成でき、よ
り軽いパネルの製造が可能となる。As is apparent from Table 1, the average thermal expansion coefficient of the glass in Examples of the present invention is 60 × 10 -7 to 75.
Since it is within the range of × 10 -7 / ° C, even if a transparent electrode is formed on a glass substrate, peeling or cracking of the film is unlikely to occur, and it is possible to manufacture a panel such as an FED or PDP with a high yield. Become. Further, the panel can be manufactured by sealing the periphery of the panel using a seal frit material for an alumina ceramic substrate. In addition, the viscosity of glass is 1
Since 0 4 temperature corresponding to poise is 1300 ° C. or less, suitable for forming by a float process. Further, since the specific gravity is less than 2.6, the weight of the member can be reduced, and a lighter panel can be manufactured.

【００３５】一方、例１５は平均熱膨張係数が８７×１
０-7／℃であるため、ガラス基板上に透明電極を形成し
たときに膜の剥離やクラックが発生しやすく、高い歩留
でパネルを製造することは困難である。また、例１６は
比重が大きいため、部材の軽量化は困難である。また、
例１７〜１９はガラスの粘度として１０4 ポアズに相当
する温度が１３００℃以上になるため、フロート法によ
る成形が困難である。On the other hand, in Example 15, the average coefficient of thermal expansion was 87 × 1.
Since it is 0 -7 / ° C, peeling or cracking of the film is likely to occur when a transparent electrode is formed on a glass substrate, and it is difficult to manufacture a panel with a high yield. In Example 16, since the specific gravity is large, it is difficult to reduce the weight of the member. Also,
In Examples 17 to 19, since the temperature corresponding to 10 4 poise as the viscosity of the glass was 1300 ° C. or more, molding by the float method was difficult.

【００３６】[0036]

【表１】 [Table 1]

【００３７】[0037]

【表２】 [Table 2]

【００３８】[0038]

【発明の効果】本発明によるガラスは、平均熱膨張係数
が６０×１０-7〜７５×１０-7／℃の範囲にあるため、
ガラス基板上に透明電極を形成しても膜の剥離やクラッ
クが発生しにくく、またアルミナセラミックス基板用の
シールフリット材料を用いてパネル周囲をシールできる
ため、フラットディスプレイ、特にＦＥＤやＰＤＰ用な
どの基板等、かかる特性を要求する用途に最適である。
また、ガラスの粘度として１０4 ポアズに相当する温度
が１３００℃以下であるため、フロート法による成形に
適している。さらに、比重が２．６未満であるため、部
材の軽量化が達成でき、より軽いパネルの製造が可能と
なる。The glass according to the present invention has an average coefficient of thermal expansion in the range of 60 × 10 −7 to 75 × 10 −7 / ° C.
Even if a transparent electrode is formed on a glass substrate, peeling and cracking of the film hardly occur, and the periphery of the panel can be sealed using a seal frit material for an alumina ceramics substrate, so that flat displays, especially for FEDs and PDPs, etc. Most suitable for applications requiring such characteristics, such as substrates.
Further, since the temperature corresponding to 10 4 poise as the viscosity of glass is 1300 ° C. or less, it is suitable for molding by the float method. Further, since the specific gravity is less than 2.6, the weight of the member can be reduced, and a lighter panel can be manufactured.

Claims (3)

【特許請求の範囲】[Claims] 【請求項１】５０〜３５０℃の平均熱膨張係数が６０×
１０-7〜７５×１０-7／℃の範囲にあり、重量％表示で
実質的に、 ＳｉＯ2 ６５〜７３未満、 Ａｌ2 Ｏ3 ０〜８未満、 ＳｉＯ2 ＋Ａｌ2 Ｏ3 ６５〜７３未満、 Ｂ2 Ｏ3 ２〜１０、 ＭｇＯ ０〜１０、 ＣａＯ ０〜１５、 Ｎａ2 Ｏ ０〜１２、 Ｋ2 Ｏ ０〜１６、 Ｎａ2 Ｏ＋Ｋ2 Ｏ １〜２０、 ＭｇＯ＋ＣａＯ＋Ｎａ2 Ｏ＋Ｋ2 Ｏ １７超〜３３、 Ｂ2 Ｏ3 ＋ＭｇＯ＋ＣａＯ＋Ｎａ2 Ｏ＋Ｋ2 Ｏ ２７超〜３５、 からなる基板に用いるためのガラス組成物。An average thermal expansion coefficient at 50 to 350 ° C. is 60 ×
10 in the range of -7 to 75 × 10 -7 / ° C., substantially in weight percentages less than SiO 2 65~73, Al 2 O 3 less than 0~8, SiO 2 + Al 2 O 3 less than 65-73 , B 2 O 3 2~10, MgO 0~10, CaO 0~15, Na 2 O 0~12, K 2 O 0~16, Na 2 O + K 2 O 1~20, MgO + CaO + Na 2 O + K 2 O 17 ultra- 33, B 2 O 3 + MgO + CaO + Na 2 O + K 2 O 27 super 35, glass composition for use in a substrate made of. 【請求項２】ガラスの粘度として１０4 ポアズに相当す
る温度が１３００℃以下である請求項１記載の基板に用
いるためのガラス組成物。2. The glass composition for use in a substrate according to claim 1, wherein a temperature corresponding to a viscosity of the glass of 10 4 poise is 1300 ° C. or less. 【請求項３】比重が２．６未満である請求項１または２
記載の基板に用いるためのガラス組成物。3. The method according to claim 1, wherein the specific gravity is less than 2.6.
A glass composition for use in the substrate as described.
JP11729398A 1998-04-27 1998-04-27 Glass composition for substrate board Pending JPH11310429A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11729398A JPH11310429A (en) 1998-04-27 1998-04-27 Glass composition for substrate board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11729398A JPH11310429A (en) 1998-04-27 1998-04-27 Glass composition for substrate board

Publications (1)

Publication Number Publication Date
JPH11310429A true JPH11310429A (en) 1999-11-09

Family

ID=14708176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11729398A Pending JPH11310429A (en) 1998-04-27 1998-04-27 Glass composition for substrate board

Country Status (1)

Country Link
JP (1) JPH11310429A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002201040A (en) * 2000-10-31 2002-07-16 Asahi Glass Co Ltd Aluminoborosilicate glass
WO2003045862A3 (en) * 2001-11-19 2003-10-02 Schott Glas Method for the production of borosilicate glass with a surface suitable for modification, glass obtained according to said method and the use thereof
WO2009060871A1 (en) * 2007-11-06 2009-05-14 Asahi Glass Company, Limited Glass plate for substrate
WO2009154064A1 (en) * 2008-06-18 2009-12-23 日本板硝子株式会社 Scale-like glass and coated scale-like glass
WO2012057232A1 (en) * 2010-10-27 2012-05-03 旭硝子株式会社 Glass plate and process for production thereof
EP2682374A1 (en) * 2011-02-28 2014-01-08 Asahi Glass Company, Limited Tempered glass plate
EP2426093A4 (en) * 2009-04-28 2014-05-14 Asahi Glass Co Ltd Glass plate for substrate
US9394195B2 (en) 2012-04-27 2016-07-19 Asahi Glass Company, Limited Glass plate

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002201040A (en) * 2000-10-31 2002-07-16 Asahi Glass Co Ltd Aluminoborosilicate glass
WO2003045862A3 (en) * 2001-11-19 2003-10-02 Schott Glas Method for the production of borosilicate glass with a surface suitable for modification, glass obtained according to said method and the use thereof
US7155934B2 (en) 2001-11-19 2007-01-02 Schott Ag Method for the production of borosilicate glass with a surface suitable for modification glass obtained according to said method and the use thereof
WO2009060871A1 (en) * 2007-11-06 2009-05-14 Asahi Glass Company, Limited Glass plate for substrate
US7951734B2 (en) 2007-11-06 2011-05-31 Asahi Glass Company, Limited Glass plate for substrate
WO2009154064A1 (en) * 2008-06-18 2009-12-23 日本板硝子株式会社 Scale-like glass and coated scale-like glass
US9212288B2 (en) 2008-06-18 2015-12-15 Nippon Sheet Glass Company, Limited Glass flake and coated glass flake
EP2426093A4 (en) * 2009-04-28 2014-05-14 Asahi Glass Co Ltd Glass plate for substrate
US9174867B2 (en) 2010-10-27 2015-11-03 Asahi Glass Company, Limited Glass plate and process for its production
US8828898B2 (en) 2010-10-27 2014-09-09 Asahi Glass Company, Limited Glass plate and process for its production
CN103189324A (en) * 2010-10-27 2013-07-03 旭硝子株式会社 Glass plate and process for production thereof
WO2012057232A1 (en) * 2010-10-27 2012-05-03 旭硝子株式会社 Glass plate and process for production thereof
CN103189324B (en) * 2010-10-27 2016-01-20 旭硝子株式会社 Sheet glass and manufacture method thereof
JP5880439B2 (en) * 2010-10-27 2016-03-09 旭硝子株式会社 Glass plate and method for producing the same
JP2016084281A (en) * 2010-10-27 2016-05-19 旭硝子株式会社 Glass plate
EP2682374A1 (en) * 2011-02-28 2014-01-08 Asahi Glass Company, Limited Tempered glass plate
EP2682374A4 (en) * 2011-02-28 2015-04-29 Asahi Glass Co Ltd Tempered glass plate
US9394195B2 (en) 2012-04-27 2016-07-19 Asahi Glass Company, Limited Glass plate

Similar Documents

Publication Publication Date Title
US6313052B1 (en) Glass for a substrate
US5854153A (en) Glasses for display panels
US5780373A (en) Glass composition and substrate for plasma display
US6162750A (en) Substrate glass and plasma display made by using the same
JP4320823B2 (en) Substrate glass composition
US6500778B1 (en) Glass substrate for a display
JPH10152339A (en) Heat-resistant class composition
JPH11310430A (en) Glass composition for substrate board
WO1996009259A1 (en) Substrate glasses for plasma displays
JPH11240735A (en) Glass composition for use as substrate
JPH08133778A (en) Glass composition and substrate for plasma display
JP4692915B2 (en) Front glass substrate for plasma display devices.
JPH11310432A (en) Glass composition for substrate board
JPH11310431A (en) Glass composition for substrate board
JP2003261352A (en) Glass for display and glass part for display
JP4045662B2 (en) Heat resistant glass composition and plasma display panel using the same
JPH09255354A (en) Glass composition for substrate
JP2001226138A (en) Glass substrate for flat panel display device
JPH11310429A (en) Glass composition for substrate board
JPH08290939A (en) Glass for substrate
EP0853070A1 (en) Substrate glass and plasma display made by using the same
JPH09255356A (en) Glass composition for substrate
JP4169013B2 (en) Substrate glass composition
JP3897209B2 (en) Glass for exhaust pipe
JPH09301733A (en) Glass composition for substrate