JPH09255354A - Glass composition for substrate - Google Patents

Glass composition for substrate

Info

Publication number
JPH09255354A
JPH09255354A JP8061295A JP6129596A JPH09255354A JP H09255354 A JPH09255354 A JP H09255354A JP 8061295 A JP8061295 A JP 8061295A JP 6129596 A JP6129596 A JP 6129596A JP H09255354 A JPH09255354 A JP H09255354A
Authority
JP
Japan
Prior art keywords
glass
strain point
thermal expansion
substrate
glass composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8061295A
Other languages
Japanese (ja)
Inventor
Manabu Nishizawa
学 西沢
Takashi Maeda
敬 前田
Yasumasa Nakao
泰昌 中尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP8061295A priority Critical patent/JPH09255354A/en
Publication of JPH09255354A publication Critical patent/JPH09255354A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight

Abstract

PROBLEM TO BE SOLVED: To obtain a glass composition for substrate which has an adequately high strain point, is able to efficiently preheat and has the same average thermal expansion coefficient as that of a soda-lime glass at 50-350 deg.C by using a specific glass composition. SOLUTION: The glass composition for substrate has 500-625 deg.C strain point, 70-90×10<-7> / deg.C average thermal expansion coefficient at 50-350 deg.C and substantially a following composition by wt.%. That is, 35-54 SiO2 , 0-14 Al2 O3 , 0-8 B2 O3 0-10% MgO, 0-10 CaO, 8-25 SrO, 8-25 BaO, 0-16 Na2 O, 0-16 K2 O, 0-6 Li2 O and 0-6 ZrO2 . The strain point is particularly preferably regulated to 525-600 deg.C to perform efficient preheat treatment.

Description

【発明の詳細な説明】Detailed Description of the Invention

【０００１】[0001]

【発明の属する技術分野】本発明は、フラットディスプ
レイ、特にプラズマディスプレイパネル（ＰＤＰ）に用
いるガラス基板組成物に関するものである。TECHNICAL FIELD The present invention relates to a glass substrate composition used for a flat display, particularly a plasma display panel (PDP).

【０００２】[0002]

【従来の技術】ＰＤＰは一般的に、基板ガラス上に金属
電極、絶縁ペースト、リブペースト等を５５０〜６００
℃程度の最高温度で焼成した後、対向板と周囲をフリッ
トシールすることにより製造される。従来、このための
基板ガラスとして建築用あるいは自動車用として広く用
いられるソーダライムガラスが一般的に用いられてき
た。2. Description of the Related Art Generally, a PDP has metal electrodes, an insulating paste, a rib paste, etc. on a substrate glass in the range of 550 to 600.
After baking at the maximum temperature of about ° C, it is manufactured by frit sealing the opposing plate and the surroundings. Conventionally, soda lime glass, which is widely used for construction or automobiles, has been generally used as a substrate glass for this purpose.

【０００３】しかし、ソーダライムガラスの歪点は５０
０℃程度であるため、上記の最高温度で熱処理を受ける
と基板ガラスが変形、あるいは収縮をおこし、寸法が著
しく変化する。したがって、対向板との電極位置合わせ
を精度良く実現しにくいという課題があった。特に、生
産性の高いベルト炉のような連続式の焼成炉を使用して
製造を行う場合、焼成中にガラス板の先端と後端で温度
差がつき、ガラス板が前後に非対称な寸法変化を起こす
という問題があった。However, the strain point of soda lime glass is 50.
Since the temperature is about 0 ° C., when the heat treatment is performed at the above-mentioned maximum temperature, the substrate glass is deformed or contracted, and the dimensions are significantly changed. Therefore, there is a problem that it is difficult to accurately perform electrode alignment with the facing plate. In particular, when manufacturing using a continuous firing furnace such as a belt furnace with high productivity, there is a temperature difference between the front and rear edges of the glass plate during firing, and the glass plate has an asymmetric dimensional change in the front and back. There was a problem of causing.

【０００４】このガラス基板の熱変形あるいは熱収縮の
問題を解決するため、特開平３−４０９３３や特開平７
−２５７９３７に開示されたような、熱膨張係数がソー
ダライムガラスと近く、ガラス転移点、歪点が高いガラ
スが知られている。このようなガラスを用いると、連続
式の焼成炉でＰＤＰ製造の熱処理を行っても、ソーダラ
イムガラスで問題となるような前後に非対称な寸法変化
を起こしにくいため、高い精度でパネルを焼成すること
が可能となる。In order to solve the problem of thermal deformation or thermal contraction of the glass substrate, JP-A-3-40933 and JP-A-7-40933 are proposed.
It is known that a glass having a thermal expansion coefficient close to that of soda lime glass and a high glass transition point and a high strain point as disclosed in US Pat. When such a glass is used, even if the heat treatment for PDP production is performed in a continuous firing furnace, an asymmetric dimensional change before and after, which is a problem with soda lime glass, is unlikely to occur, so the panel is fired with high accuracy. It becomes possible.

【０００５】[0005]

【発明が解決しようとする課題】しかしながら、このよ
うなガラス組成でもフロート法などの大量生産型の徐冷
設備で生産した場合は、熱収縮率は依然と大きく、ＰＤ
Ｐ等の作製の前に熱収縮をあらかじめ充分行わせる「前
熱処理」を必要とする場合がある。すなわち、フロート
設備での徐冷は切断を可能とするための最低限の熱処理
であり、ＰＤＰ生産の熱処理工程で熱収縮を生じさせな
いようにするための熱処理には足りないからである。However, even if such a glass composition is produced by a mass production type slow cooling equipment such as the float method, the heat shrinkage rate is still large, and the PD
In some cases, "pre-heat treatment" for preliminarily performing heat shrinkage is required before producing P or the like. That is, the gradual cooling in the float equipment is the minimum heat treatment for enabling cutting, and is insufficient for the heat treatment for preventing heat shrinkage in the heat treatment step of PDP production.

【０００６】ＰＤＰ作製時の熱収縮量のスペックを満足
するのに要する前熱処理時間を考えたとき、この時間を
最低限の時間で効率的に行うためには、徐冷点が余りに
高いと適当ではない。一方、徐冷点が余りに低いと、前
述の非対象の寸法変化を起こすおそれがある。本発明者
らの検討の結果、ＰＤＰ作製時の温度が、ガラスの徐冷
点からその上約５０℃の範囲にあることが望ましいこと
がわかった。ガラスの歪点と徐冷点の温度差はガラス組
成により異なるが、一般に徐冷点は歪点より約５０℃高
いこと、ＰＤＰ作製時の熱処理温度が５００〜６００℃
であることを考えあわせると、効率的に熱収縮を低減で
きるガラスの歪点の条件は、５００〜６２５℃になる。Considering the pre-heat treatment time required to satisfy the specification of the amount of heat shrinkage during PDP production, it is appropriate that the annealing point is too high in order to efficiently perform this time in the minimum time. is not. On the other hand, if the annealing point is too low, the asymmetrical dimensional change described above may occur. As a result of the study by the present inventors, it was found that the temperature during PDP production is preferably in the range of about 50 ° C. from the annealing point of the glass. Although the temperature difference between the strain point and the annealing point of glass differs depending on the glass composition, the annealing point is generally about 50 ° C. higher than the strain point, and the heat treatment temperature at the time of PDP production is 500 to 600 ° C.
Considering that, the condition of the strain point of glass that can efficiently reduce the heat shrinkage is 500 to 625 ° C.

【０００７】本発明の目的は効率的な前熱処理が可能な
適当な高さの歪点を有し、かつ５０〜３５０℃の平均熱
膨張係数がソーダライムガラスと同等の基板用ガラスを
提示することにある。An object of the present invention is to provide a glass for a substrate which has a strain point of an appropriate height capable of efficient preheat treatment and has an average coefficient of thermal expansion of 50 to 350 ° C. equivalent to that of soda lime glass. Especially.

【０００８】[0008]

【課題を解決するための手段】本発明は歪点が５００〜
６２５℃、５０〜３５０℃の平均熱膨張係数が７０〜９
０×１０-7／℃であって、実質的に重量％で、 ＳｉＯ2 ： ３５〜５４、 Ａｌ2 Ｏ3 ： ０〜１４、 Ｂ2 Ｏ3 ： ０〜 ８、 ＭｇＯ ： ０〜１０、 ＣａＯ ： ０〜１０、 ＳｒＯ ： ８〜２５、 ＢａＯ ： ８〜２５、 Ｎａ2 Ｏ ： ０〜１６、 Ｋ2 Ｏ ： ０〜１６、 Ｌｉ2 Ｏ ： ０〜 ６、 ＺｒＯ2 ： ０〜 ６、 からなる基板用ガラス組成物である。The present invention has a strain point of 500 to
Average thermal expansion coefficient of 625 ° C and 50 to 350 ° C is 70 to 9
A 0 × 10 -7 / ℃, substantially wt%, SiO 2: 35~54, Al 2 O 3: 0~14, B 2 O 3: 0~ 8, MgO: 0~10, CaO : 0~10, SrO: 8~25, BaO : 8~25, Na 2 O: 0~16, K 2 O: 0~16, Li 2 O: 0~ 6, ZrO 2: 0~ 6, consisting of It is a glass composition for substrates.

【０００９】[0009]

【発明の実施の形態】本発明による組成の限定理由は以
下の通りである。The reasons for limiting the composition according to the present invention are as follows.

【００１０】ＳｉＯ2 ：ガラスの骨格を成す成分であ
る。含有量が３５重量％（以下％と表記する）未満では
他の成分の割合が増し、熱膨張係数が大きくなりすぎ
る。５４％を超えると歪点が高くなる。好ましくは３７
〜５２％である。SiO 2 is a component forming the skeleton of glass. If the content is less than 35% by weight (hereinafter referred to as%), the proportion of other components increases and the thermal expansion coefficient becomes too large. If it exceeds 54%, the strain point becomes high. Preferably 37
~ 52%.

【００１１】Ａｌ2 Ｏ3 ：必須成分ではないが、歪点を
上げる効果があるため、歪点の調整のために、含有する
ことができる。しかし、１４％より多いと歪点が高くな
りすぎる。好ましくは１２％以下である。Al 2 O 3 : Although not an essential component, it has the effect of increasing the strain point, so it can be contained for adjusting the strain point. However, if it exceeds 14%, the strain point becomes too high. It is preferably 12% or less.

【００１２】Ｂ2 Ｏ3 :必須成分ではないが、ガラスの
熔解性、失透抑制の効果があり、また歪点低下の効果が
あるので歪点調整のために含有することができる。しか
し、８％を超えると歪点が低くなりすぎるおそれがあ
る。好ましくは６％以下である。B 2 O 3 : Although it is not an essential component, it has the effects of glass meltability and devitrification suppression, and also has the effect of lowering the strain point, so it can be contained for adjusting the strain point. However, if it exceeds 8%, the strain point may be too low. It is preferably 6% or less.

【００１３】ＭｇＯ：必須成分ではないが、ガラスの熔
解時の粘性を下げ、熔解を促進するので含有することが
できる。しかし、１０％を超えると、失透温度が高くな
る。好ましくは８％以下である。MgO: Although it is not an essential component, it can be contained because it lowers the viscosity of the glass during melting and promotes melting. However, if it exceeds 10%, the devitrification temperature becomes high. Preferably it is 8% or less.

【００１４】ＣａＯ：必須成分ではないが、ガラスの熔
解時の粘性を下げ、熔解を促進するので含有することが
できる。しかし、１０％を超えると、失透温度が高くな
る。好ましくは８％以下である。CaO: Although it is not an essential component, it can be contained because it lowers the viscosity of the glass during melting and accelerates melting. However, if it exceeds 10%, the devitrification temperature becomes high. Preferably it is 8% or less.

【００１５】ＳｒＯ：ガラスの熔解時の粘性を下げ、熔
解を促進する効果がある。８％未満では熱膨張係数が小
さくなりすぎる。一方、２５％を超えると熱膨張係数が
大きくなりすぎる。好ましくは９〜２２％である。SrO: It has the effect of lowering the viscosity of glass during melting and promoting melting. If it is less than 8%, the thermal expansion coefficient tends to be too small. On the other hand, if it exceeds 25%, the coefficient of thermal expansion becomes too large. It is preferably 9 to 22%.

【００１６】ＢａＯ：ガラスの熔解時の粘性を下げ、熔
解を促進する効果がある。８％未満では熱膨張係数が小
さくなりすぎる。一方、２５％以上では熱膨張係数が大
きくなりすぎる。好ましくは９〜２２％である。BaO: Has the effect of lowering the viscosity of glass during melting and promoting melting. If it is less than 8%, the thermal expansion coefficient tends to be too small. On the other hand, if it is 25% or more, the thermal expansion coefficient becomes too large. It is preferably 9 to 22%.

【００１７】ＭｇＯ、ＣａＯ、ＳｒＯおよびＢａＯは、
溶解促進のため、合量で２６％超含有することが好まし
い。より好ましくは、２８％以上である。MgO, CaO, SrO and BaO are
In order to promote dissolution, it is preferable that the total amount exceeds 26%. More preferably, it is 28% or more.

【００１８】Ｎａ2 Ｏ：必須成分ではないが、ガラスの
熔解時の粘性を下げ、熔解を促進する効果があるので含
有することができる。１６％を超えると、熱膨張係数が
大きくなりすぎ、また、化学的耐久性が低下する。好ま
しくは１５％以下である。Na 2 O: Although it is not an essential component, it can be contained because it has the effect of lowering the viscosity of the glass during melting and promoting the melting. If it exceeds 16%, the coefficient of thermal expansion becomes too large and the chemical durability is lowered. It is preferably 15% or less.

【００１９】Ｋ2 Ｏ：必須成分ではないが、ガラスの熔
解時の粘性を下げ、熔解を促進する効果があるので含有
することができる。１６％を超えると、熱膨張係数が大
きくなりすぎ、また、化学的耐久性が低下する。好まし
くは１５％以下である。K 2 O: Although it is not an essential component, it can be contained because it has the effect of lowering the viscosity of the glass during melting and promoting the melting. If it exceeds 16%, the coefficient of thermal expansion becomes too large and the chemical durability is lowered. It is preferably 15% or less.

【００２０】Ｌｉ2 Ｏ：必須成分ではないが、ガラスの
熔解時の粘性を下げ、熔解を促進する効果があるので含
有することができる。６％を超えると、熱膨張係数が大
きくなりすぎ、また、化学的耐久性が低下する。好まし
くは、５％以下である。Li 2 O: Although not an essential component, it can be contained because it has the effect of lowering the viscosity of the glass during melting and promoting the melting. If it exceeds 6%, the coefficient of thermal expansion becomes too large and the chemical durability is lowered. Preferably, it is at most 5%.

【００２１】Ｎａ2 Ｏ、Ｋ2 ＯおよびＬｉ2 Ｏは多すぎ
ると、熱膨張係数が大きくなりすぎ、また、化学的耐久
性が低下するおそれがある。したがって、好ましくは、
合量で１０％未満、特に好ましくは合量で５％以下であ
る。If the amounts of Na 2 O, K 2 O and Li 2 O are too large, the coefficient of thermal expansion becomes too large, and the chemical durability may decrease. Therefore, preferably,
The total amount is less than 10%, particularly preferably the total amount is 5% or less.

【００２２】ＺｒＯ2 ：必須成分ではないが、歪点を上
げる効果があり、歪点調整のために、含有することがで
きる。６％を超えると、歪点が高くなりすぎる。好まし
くは、５％以下である。ZrO 2 : Although not an essential component, it has the effect of raising the strain point and can be contained for adjusting the strain point. If it exceeds 6%, the strain point becomes too high. Preferably, it is at most 5%.

【００２３】以上の成分の他、ＳＯ3 、Ａｓ2 Ｏ3 、Ｓ
ｂ2 Ｏ3 等の清澄剤、Ｆｅ2 Ｏ3 、ＮｉＯ、ＣｏＯ、Ｔ
ｉＯ2 、Ｓｅ、ＣｅＯ2 等の着色剤等を適宜使用でき
る。また、ＣａＯ、ＭｇＯと同様の効果を得るために、
ＺｎＯを２％以下添加することもできる。In addition to the above components, SO 3 , As 2 O 3 and S
Refining agents such as b 2 O 3 , Fe 2 O 3 , NiO, CoO, T
Colorants such as iO 2 , Se, and CeO 2 can be used as appropriate. In order to obtain the same effect as CaO and MgO,
ZnO may be added in an amount of 2% or less.

【００２４】本発明の基板用ガラス組成物は、典型的に
は、５０〜３５０℃の平均熱膨張係数が７０×１０-7〜
９０×１０-7／℃の範囲にあるので、従来と同様のフリ
ット材料を用いて、ＰＤＰを組み立てることができる。The glass composition for a substrate of the present invention typically has an average coefficient of thermal expansion at 50 to 350 ° C. of 70 × 10 −7 to.
Since it is in the range of 90 × 10 −7 / ° C., it is possible to assemble the PDP by using the same frit material as the conventional one.

【００２５】また、本発明の基板用ガラス組成物の歪点
は、前熱処理を効率的に行うため、５００〜６２５℃の
範囲にあることが好ましい。特に好ましくは、５２５〜
６００℃の範囲である。Further, the strain point of the glass composition for a substrate of the present invention is preferably in the range of 500 to 625 ° C. in order to efficiently carry out the preheat treatment. Particularly preferably, 525-
It is in the range of 600 ° C.

【００２６】本発明のガラスは、ＰＤＰ用基板として好
適である。その分光透過率は４２５〜４７５ｎｍ、５１
０〜５６０ｎｍ、６００〜６５０ｎｍの範囲でそれぞれ
８５％以上となっていることが好ましい。これらの波長
範囲での発光が効率的に表示に利用できるからである。The glass of the present invention is suitable as a substrate for PDP. Its spectral transmittance is 425-475 nm, 51
It is preferably 85% or more in the ranges of 0 to 560 nm and 600 to 650 nm, respectively. This is because light emission in these wavelength ranges can be efficiently used for display.

【００２７】本発明のガラスは、例えば次のような方法
で製造できる。通常使用される各成分の原料を目標組成
になるように調合し、これを熔解炉に連続的に投入し、
１５００〜１６５０℃に加熱して溶融する。この溶融ガ
ラスをフロート法により所定の板厚に成形し、徐冷後切
断する。The glass of the present invention can be manufactured, for example, by the following method. The raw materials for each of the commonly used ingredients are blended to achieve the target composition and then continuously charged into the melting furnace.
It is melted by heating to 1500 to 1650 ° C. This molten glass is formed into a predetermined plate thickness by the float method, gradually cooled, and then cut.

【００２８】[0028]

【実施例】各成分の原料を目標組成になるように調合
し、白金るつぼを用いて１５５０〜１６５０℃に加熱し
４〜５時間かけて溶融した。熔解にあたっては、白金ス
ターラーを挿入し２時間撹拌してガラスの均質化を行っ
た。以上のようにして得られたガラスの平均熱膨張係数
α、歪点Ｔs 、比重を測定し、表１〜３にガラス組成と
ともに示した。また、例１、６、１０、１９、２０につ
いては前処理に要する時間を３種類のプロセス温度（６
００℃、５５０℃、５００℃）について示した。[Examples] Raw materials for each component were prepared so as to have a target composition, heated to 1550 to 1650 ° C using a platinum crucible and melted for 4 to 5 hours. Upon melting, a platinum stirrer was inserted and stirred for 2 hours to homogenize the glass. The average thermal expansion coefficient α, strain point T s , and specific gravity of the glass obtained as described above were measured and shown in Tables 1 to 3 together with the glass composition. In addition, in Examples 1, 6, 10, 19, and 20, the time required for the pretreatment was set to three process temperatures (6
00 ° C., 550 ° C., 500 ° C.).

【００２９】表のうち例１９、例２０は比較例である。
各特性の測定は以下のような方法で行った。Examples 19 and 20 in the table are comparative examples.
The measurement of each characteristic was performed by the following methods.

【００３０】平均熱膨脹係数α（単位：×１０-7／
℃）：示差熱膨張計を用い、石英ガラスを参照試料とし
て毎分５℃で昇温しながら、室温〜屈伏点までの膨張曲
線を測定し、５０〜３５０℃の平均熱膨張係数を読み取
り、記録した。Average coefficient of thermal expansion α (unit: × 10 -7 /
C): using a differential thermal dilatometer, while increasing the temperature at 5 ° C. per minute using quartz glass as a reference sample, the expansion curve from room temperature to the yield point is measured, and the average thermal expansion coefficient of 50 to 350 ° C. Recorded.

【００３１】歪点Ｔs （単位：℃）：ＪＩＳ Ｒ３１０
３に記載のファイバー法による。Strain point T s (unit: ° C.): JIS R310
According to the fiber method described in 3.

【００３２】比重：アルキメデス法による。 要前処理時間（単位：hrs ）：プロセス温度（６００
℃、５５０℃、５００℃）に１時間保持する熱処理で、
熱収縮量が５０ｐｐｍ以下となるのに要する熱処理時間
を示した。前熱処理の最高温度と徐冷速度はプロセス温
度に最適となるように設定した。Specific gravity: According to Archimedes method. Pretreatment time required (unit: hrs): Process temperature (600
C., 550.degree. C., 500.degree. C.) for 1 hour
The heat treatment time required for the heat shrinkage to be 50 ppm or less is shown. The maximum temperature of pre-heat treatment and the slow cooling rate were set to be optimum for the process temperature.

【００３３】表１〜３より明らかなように、本発明の実
施例にかかるガラスの歪点は５００〜６２５℃の範囲に
あり、効率的な前熱処理が可能である。また、５０〜３
５０℃の平均熱膨張係数は７０〜９０×１０-7／℃の間
にあり、ソーダライムガラスと同等である。As is clear from Tables 1 to 3, the strain points of the glasses according to the examples of the present invention are in the range of 500 to 625 ° C., and efficient preheat treatment is possible. Also, 50 to 3
The average coefficient of thermal expansion at 50 ° C. is between 70 and 90 × 10 −7 / ° C., which is equivalent to that of soda lime glass.

【００３４】一方、例１９、例２０は歪点が高く、前処
理に時間を要する。On the other hand, in Examples 19 and 20, the strain point is high and the pretreatment requires time.

【００３５】[0035]

【表１】 [Table 1]

【００３６】[0036]

【表２】 [Table 2]

【００３７】[0037]

【表３】 [Table 3]

【００３８】[0038]

【発明の効果】本発明によるガラスは、熱収縮を抑える
ための前熱処理が効率的に行えるため、プラズマディス
プレイ用基板等、製造時に熱処理を受ける用途に好適で
ある。また、熱膨張係数がソーダライムガラスと同等で
あるため、従来用いているフリット等を用いてＰＤＰを
製造できる。さらに本発明のガラスは、フロート法によ
る生産にも適したものである。EFFECT OF THE INVENTION The glass according to the present invention can be preheated efficiently for suppressing heat shrinkage, and is therefore suitable for applications such as substrates for plasma displays which are subjected to heat treatment during manufacturing. Further, since the coefficient of thermal expansion is similar to that of soda lime glass, it is possible to manufacture a PDP using a conventionally used frit or the like. Furthermore, the glass of the present invention is suitable for production by the float method.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｈ０１Ｊ 17/16 Ｈ０１Ｊ 17/16 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code Agency reference number FI Technical display location H01J 17/16 H01J 17/16

Claims (2)

【特許請求の範囲】[Claims] 【請求項１】歪点が５００〜６２５℃、５０〜３５０℃
の平均熱膨張係数が７０〜９０×１０-7／℃であって、
実質的に重量％で、 ＳｉＯ2 ： ３５〜５４、 Ａｌ2 Ｏ3 ： ０〜１４、 Ｂ2 Ｏ3 ： ０〜 ８、 ＭｇＯ ： ０〜１０、 ＣａＯ ： ０〜１０、 ＳｒＯ ： ８〜２５、 ＢａＯ ： ８〜２５、 Ｎａ2 Ｏ ： ０〜１６、 Ｋ2 Ｏ ： ０〜１６、 Ｌｉ2 Ｏ ： ０〜 ６、 ＺｒＯ2 ： ０〜 ６、 からなる基板用ガラス組成物。1. A strain point of 500 to 625 ° C., 50 to 350 ° C.
Has an average coefficient of thermal expansion of 70 to 90 × 10 −7 / ° C.,
Substantially wt%, SiO 2: 35~54, Al 2 O 3: 0~14, B 2 O 3: 0~ 8, MgO: 0~10, CaO: 0~10, SrO: 8~25, BaO: 8~25, Na 2 O: 0~16, K 2 O: 0~16, Li 2 O: 0~ 6, ZrO 2: 0~ 6, the glass composition for substrates made of. 【請求項２】歪点が５２５〜６００℃であることを特徴
とする請求項１に記載の基板用ガラス組成物。2. The glass composition for a substrate according to claim 1, which has a strain point of 525 to 600 ° C.
JP8061295A 1996-03-18 1996-03-18 Glass composition for substrate Pending JPH09255354A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8061295A JPH09255354A (en) 1996-03-18 1996-03-18 Glass composition for substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8061295A JPH09255354A (en) 1996-03-18 1996-03-18 Glass composition for substrate

Publications (1)

Publication Number Publication Date
JPH09255354A true JPH09255354A (en) 1997-09-30

Family

ID=13167070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8061295A Pending JPH09255354A (en) 1996-03-18 1996-03-18 Glass composition for substrate

Country Status (1)

Country Link
JP (1) JPH09255354A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000203872A (en) * 1998-09-11 2000-07-25 Nippon Sheet Glass Co Ltd Glass composition, substrate for information recording medium by using the same, and information recording medium
JP2001064034A (en) * 1999-08-24 2001-03-13 Asahi Glass Co Ltd Glass base plate for display
WO2001017921A1 (en) 1999-09-04 2001-03-15 Schott Glas Alkaline-earth aluminoborosilicate glass and the uses thereof
US6268304B1 (en) 1998-04-28 2001-07-31 Asahi Glass Company Ltd. Plate glass and substrate glass for electronics
WO2001056941A1 (en) 2000-02-04 2001-08-09 Schott Glas Alkali-containing aluminum borosilicate glass and utilization thereof
US6297182B1 (en) 1998-08-11 2001-10-02 Asahi Glass Company Ltd. Glass for a substrate
JP2002338297A (en) * 2001-05-09 2002-11-27 Minolta Co Ltd Glass substrate and medium for information recording and element for optical communication using the substrate
JP2005089286A (en) * 2003-08-12 2005-04-07 Nippon Electric Glass Co Ltd Glass base plate for flat panel display device
JP2007210839A (en) * 2006-02-09 2007-08-23 Central Glass Co Ltd Substrate glass for display device
WO2009081906A1 (en) 2007-12-26 2009-07-02 Central Glass Company, Limited Glass composition
JP2011063464A (en) * 2009-09-16 2011-03-31 Nippon Electric Glass Co Ltd Glass plate for plasma display
US8623776B2 (en) 2008-02-26 2014-01-07 Corning Incorporated Silicate glasses having low seed concentration
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6268304B1 (en) 1998-04-28 2001-07-31 Asahi Glass Company Ltd. Plate glass and substrate glass for electronics
US6297182B1 (en) 1998-08-11 2001-10-02 Asahi Glass Company Ltd. Glass for a substrate
JP2000203872A (en) * 1998-09-11 2000-07-25 Nippon Sheet Glass Co Ltd Glass composition, substrate for information recording medium by using the same, and information recording medium
JP2001064034A (en) * 1999-08-24 2001-03-13 Asahi Glass Co Ltd Glass base plate for display
WO2001017921A1 (en) 1999-09-04 2001-03-15 Schott Glas Alkaline-earth aluminoborosilicate glass and the uses thereof
DE19942259C1 (en) * 1999-09-04 2001-05-17 Schott Glas Alkaline earth aluminum borosilicate glass and its uses
US6680266B1 (en) * 1999-09-04 2004-01-20 Schott Glas Alkaline-earth aluminoborosilicate glass and the uses thereof
WO2001056941A1 (en) 2000-02-04 2001-08-09 Schott Glas Alkali-containing aluminum borosilicate glass and utilization thereof
JP2002338297A (en) * 2001-05-09 2002-11-27 Minolta Co Ltd Glass substrate and medium for information recording and element for optical communication using the substrate
JP2005089286A (en) * 2003-08-12 2005-04-07 Nippon Electric Glass Co Ltd Glass base plate for flat panel display device
JP2007210839A (en) * 2006-02-09 2007-08-23 Central Glass Co Ltd Substrate glass for display device
WO2009081906A1 (en) 2007-12-26 2009-07-02 Central Glass Company, Limited Glass composition
US8623776B2 (en) 2008-02-26 2014-01-07 Corning Incorporated Silicate glasses having low seed concentration
US9073779B2 (en) 2008-02-26 2015-07-07 Corning Incorporated Fining agents for silicate glasses
US10040715B2 (en) 2008-02-26 2018-08-07 Corning Incorporated Silicate glasses having low seed concentration
US10626042B2 (en) 2008-02-26 2020-04-21 Corning Incorporated Fining agents for silicate glasses
JP2011063464A (en) * 2009-09-16 2011-03-31 Nippon Electric Glass Co Ltd Glass plate for plasma display
CN113248136A (en) * 2021-05-31 2021-08-13 江苏科技大学 Glass for neutron scattering device and preparation method thereof
CN113248136B (en) * 2021-05-31 2023-02-28 江苏科技大学 Glass for neutron scattering device and preparation method thereof
CN115745398A (en) * 2022-11-30 2023-03-07 成都光明光电股份有限公司 Glass composition

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