JPH11203660A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH11203660A JPH11203660A JP29698398A JP29698398A JPH11203660A JP H11203660 A JPH11203660 A JP H11203660A JP 29698398 A JP29698398 A JP 29698398A JP 29698398 A JP29698398 A JP 29698398A JP H11203660 A JPH11203660 A JP H11203660A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- layer
- film
- magnetic
- lubricating oil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は記録媒体に係り、特に磁
気ディスク、磁気テープなどの磁気記録媒体に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a recording medium, and more particularly to a magnetic recording medium such as a magnetic disk and a magnetic tape.
【０００２】[0002]
【従来の技術】近年、磁気記録媒体の分野では記録密度
向上が最大の課題となっている。このためには、従来か
ら行われている磁性粉末をバインダと共に塗布し乾燥さ
せて固定して磁性媒体層を形成する方法では磁性体充て
ん率向上に限界があり、磁性物質を直接薄膜化する方法
が考案されている。2. Description of the Related Art In recent years, in the field of magnetic recording media, improvement of recording density has become a major issue. For this purpose, the conventional method of applying a magnetic powder together with a binder, drying and fixing to form a magnetic medium layer has a limit in improving the magnetic material filling rate, and a method of directly thinning a magnetic substance. Has been devised.
【０００３】上記薄膜化方法としては、例えば蒸着、め
っき、スパッタリングなどがある。これらの方法により
形成した磁性媒体薄膜は、一般に記録再生時にヘッドと
の摺動により摩耗し、脱落しやすく、かつ摩擦係数が高
いためヘッドを痛める。特にリジッドな磁気ディスクの
場合には、ヘッド浮上特性の劣下が起こり、磁気テープ
ではテープ走行性不良の原因になる。The above-mentioned thinning method includes, for example, vapor deposition, plating, sputtering and the like. The magnetic medium thin film formed by these methods generally wears due to sliding with the head during recording and reproduction, easily falls off, and damages the head because of its high friction coefficient. In particular, in the case of a rigid magnetic disk, the head flying characteristics deteriorate, and in the case of a magnetic tape, this causes a tape running defect.
【０００４】そこで磁性媒体層上に保護層を設けて、長
寿命化や走行性向上をはかる工夫が種々行われている。
例えば特開昭５７−１１６７７１号公報には、イミド基
を有する高分子をスパッタする方法が示されており、特
開昭５８−７７０３１号公報には高分子化合物をターゲ
ット材料としてスパッタする例がある。また、カーボン
やＢＮ、ＭｏＳ2等は以前から固体潤滑剤として知られ
ており、これらをスパッタや蒸着により薄膜化する方法
もある。Therefore, various measures have been taken to provide a protective layer on the magnetic medium layer to extend the life and improve the running property.
For example, JP-A-57-116771 discloses a method of sputtering a polymer having an imide group, and JP-A-58-77031 discloses an example of sputtering using a polymer compound as a target material. . Further, carbon, BN, MoS 2, and the like have been known as solid lubricants for some time, and there is a method of thinning them by sputtering or vapor deposition.
【０００５】一方、摺動面に滑性を与える潤滑油として
フッ素系潤滑油を用いることがあり、ＫＲＹＴＯＸ
(Ｒ)、ＶＯＮＢＬＩＮ(Ｒ)等が市販されている。On the other hand, a fluorine-based lubricating oil is sometimes used as a lubricating oil for imparting lubrication to a sliding surface, and KRYTOX
(R), VONBLIN (R) and the like are commercially available.
【０００６】[0006]
【発明が解決しようとする課題】我々は上記の方法を各
々試みたが、有機高分子やカーボンなどをスパッタした
場合には保護膜なしの場合に比べ確かに摺動時の摩耗が
軽減された。しかし長時間の摺動により膜はがれを生
じ、摩耗粉が急増することにより磁性媒体層も破壊され
寿命となるため、実用上はさらに寿命を延ばす必要があ
った。また潤滑油を磁性層上に塗布した場合には、厚く
塗布するとヘッド粘着が起こり、薄く塗布すると潤滑効
果が小さく十分な効果が得られなかった。We tried each of the above methods, but when organic polymer or carbon was sputtered, the wear during sliding was certainly reduced as compared with the case without a protective film. . However, the film is peeled off due to long-time sliding, and the magnetic medium layer is destroyed due to a sudden increase in abrasion powder, resulting in a long life. Therefore, it was necessary to further extend the life in practical use. Also, when the lubricating oil was applied on the magnetic layer, if it was applied thickly, head sticking occurred, and if it was applied thinly, the lubricating effect was small and a sufficient effect could not be obtained.
【０００７】本発明の目的は上記した従来技術の欠点を
なくし、対ヘッド摺動において潤滑性に優れ、摩耗の少
ない磁気記録媒体を提供することにある。It is an object of the present invention to provide a magnetic recording medium which eliminates the above-mentioned disadvantages of the prior art and has excellent lubrication and low abrasion when sliding against a head.
【０００８】[0008]
【課題を解決するための手段】上記目的は、磁気層上に
硬質カーボン膜と含フッ素潤滑油の複合層を設けること
により達成される。The above objects can be attained by providing a composite layer of a hard carbon film and a fluorine-containing lubricating oil on a magnetic layer.
【０００９】この複合層により、カーボン層単独あるい
は潤滑油層単独の場合に比べ飛躍的な耐摩耗性改善が実
現されることがわかった。It has been found that the composite layer achieves a remarkable improvement in wear resistance as compared with the case of using only the carbon layer or the lubricating oil layer alone.
【００１０】一般に潤滑油による潤滑機構は、摺動面と
被摺動面との間に油膜の層ができた場合に流体潤滑とな
り、固体同志が接触しないため理想的な潤滑作用が達成
される。しかるに高密度磁気記録媒体においては、ヘッ
ドと媒体の間隔を広げることは特性劣化の原因となるた
め好ましくない。特に本発明に係わる薄膜磁気記録媒体
では、潤滑層は0.1μｍ以下、好ましくは0.03μｍ以下
とされる。In general, a lubricating mechanism using lubricating oil provides fluid lubrication when an oil film layer is formed between a sliding surface and a sliding surface, and an ideal lubricating action is achieved because solids do not come into contact with each other. . However, in the case of a high-density magnetic recording medium, it is not preferable to increase the distance between the head and the medium because it causes deterioration of characteristics. In particular, in the thin-film magnetic recording medium according to the present invention, the thickness of the lubricating layer is 0.1 μm or less, preferably 0.03 μm or less.
【００１１】しかし、このような厚さでは油膜の均一性
が保てず、部分的に破断が生じて摺動面と被摺動面が部
分的に接触するいわゆる境界摩耗の領域となる。この領
域においては油の潤滑特性が十分に生かされず、摩耗係
数が大きくなり、かつ被摺動面の摩耗が生じ、記録特性
の劣下やエラー発生又は走行性不良の原因となる。However, with such a thickness, the uniformity of the oil film cannot be maintained, and the oil film is partially broken, which is a so-called boundary wear area where the sliding surface and the sliding surface are in partial contact. In this region, the lubricating properties of the oil are not fully utilized, the wear coefficient is increased, and the sliding surface is worn, resulting in poor recording characteristics, errors, or poor running properties.
【００１２】本発明においては潤滑油層の下地となる硬
質カーボン層がそれ自身潤滑性および耐摩耗性を有する
ため境界潤滑における固体間の摺動を大巾に軽減し、潤
滑油の効果を助けていることが飛躍的な特性向上の第一
の原因である。また、これと逆に潤滑油の存在によりカ
ーボン層の摩耗作用が軽減されていることや含フッ素潤
滑油のカーボン膜に対するなじみ性等いくつかの原因の
組み合わせにより本発明の効果が発現されていると考え
られる。In the present invention, since the hard carbon layer serving as the base of the lubricating oil layer itself has lubricity and wear resistance, sliding between solids in boundary lubrication is greatly reduced, and the effect of the lubricating oil is assisted. Is the primary cause of the dramatic improvement in characteristics. Conversely, the effect of the present invention is exhibited by a combination of several causes such as the wear action of the carbon layer being reduced due to the presence of the lubricating oil and the conformability of the fluorine-containing lubricating oil to the carbon film. it is conceivable that.
【００１３】なお硬質カーボン層の厚さと潤滑油層の厚
さは共に0.001〜0.1μｍであり、好ましくは0.01〜0.06
μｍである。The thickness of the hard carbon layer and the thickness of the lubricating oil layer are both 0.001 to 0.1 μm, preferably 0.01 to 0.06 μm.
μm.
【００１４】本発明における硬質カーボン膜はカーボン
又はグラフアイト状カーボン素材を不活性ガス又は不活
性ガスと炭化水素ガスの混合ガス雰囲気中でスパッタす
るか炭化水素ガスを放電エネルギ−により分解反応さ
せ、基体上に堆積させることにより形成される。スパッ
タの場合ガス圧が高いと膜の硬度が低下するので0.01Ｔ
orr以下が好ましい。スパッタの方法には直流スパッ
タ、交流スパッタ、高周波スパッタ、直流マグネトロン
スパッタ、高周波マグネトロンスパッタ、イオンビーム
スパッタ等があり、いずれでもよいが、硬質な膜を形成
するためにはエネルギー密度を高くするのがよく、たと
えば高周波マグネトロンスパッタではターゲット面積あ
たりの投入電力は１Ｗ／cm2以上、好ましくは1.5〜0.3
Ｗ／cm2である。また、基体を保持する側の電極に０〜
−３ＫＶの範囲より選ばれる電圧を印加しつつスパッタ
することは膜の硬度を増大しかつ膜と基体との密着性を
向上させる効果がある。In the present invention, the hard carbon film is formed by sputtering carbon or graphite-like carbon material in an inert gas or a mixed gas atmosphere of an inert gas and a hydrocarbon gas, or by causing a decomposition reaction of the hydrocarbon gas by discharge energy. It is formed by depositing on a substrate. In the case of sputtering, if the gas pressure is high, the hardness of the film will decrease.
orr or less is preferred. Sputtering methods include direct current sputtering, alternating current sputtering, high frequency sputtering, direct current magnetron sputtering, high frequency magnetron sputtering, ion beam sputtering, and the like. Any of these methods may be used. For example, in high frequency magnetron sputtering, the input power per target area is 1 W / cm 2 or more, preferably 1.5 to 0.3
W / cm 2 . In addition, 0 to 0
Sputtering while applying a voltage selected from the range of -3 KV has the effects of increasing the hardness of the film and improving the adhesion between the film and the substrate.
【００１５】上記スパッタで形成された炭素膜は硬度は
大であるがしばしば内部応力のために変形し基体からは
がれたり亀裂を生じたりする。これを防ぐためにはスパ
ッタ雰囲気に炭化水素ガスを混入するのがよい。上記炭
化水素ガスとしては、メタン、エタン、プロパン、ブタ
ン、イソブタン、シクロブタン、ペンタン、イソペタ
ン、ナオペンタン、ヘキサン、ベンゼン、トルエン等を
用いることができる。このようにしてスパッタ形成され
た膜には少量の水素が含まれるが、水素の比率が多いも
のは硬度が減少するため原子数の比で炭素の30％以下と
するものが好ましい。Although the carbon film formed by the above sputtering has a high hardness, it is often deformed due to internal stress and peels off or cracks from the substrate. In order to prevent this, it is preferable to mix a hydrocarbon gas into the sputtering atmosphere. As the hydrocarbon gas, methane, ethane, propane, butane, isobutane, cyclobutane, pentane, isopentane, naopentane, hexane, benzene, toluene and the like can be used. Although a small amount of hydrogen is contained in the film formed by sputtering in this manner, it is preferable that the ratio of the number of atoms be 30% or less in terms of the number of atoms because those having a large ratio of hydrogen decrease the hardness.
【００１６】一方、炭化水素ガスを放電エネルギーで分
解する場合には真空容器中に炭化水素ガスを単独または
不活性ガスと１：0.1ないし１：20の割合で混合して導
入し、ガス圧を0.01〜１Ｔorrの中から選ばれた値に保
持し、容器内部に放電を発生させて該炭化水素を分解活
性化し、容器内に設置された被加工物基体表面に炭素お
よび水素から成る膜を堆積させる。前記炭化水素として
はスパッタの項で既に列記した化合物の中から選ぶこと
ができる。On the other hand, when the hydrocarbon gas is decomposed by the discharge energy, the hydrocarbon gas is introduced into the vacuum vessel alone or mixed with an inert gas at a ratio of 1: 0.1 to 1:20, and the gas pressure is reduced. A value selected from 0.01 to 1 Torr is maintained, a discharge is generated inside the container to decompose and activate the hydrocarbon, and a film composed of carbon and hydrogen is deposited on the surface of the workpiece substrate installed in the container. Let it. The hydrocarbon can be selected from the compounds already listed in the section on sputtering.
【００１７】また不活性ガスとしてはＨｅ、Ｎｅ、Ａ
ｒ、Ｋｒ、Ｘｅの中から選ぶのがよいが、この他にＨ2
を用いることもできる。前記放電の発生方法としては内
部電極に高電圧を印加するか容器外部から高周波電磁誘
導によるか、又はマイクロ波を導入して発生させる。内
部電極を用いる場合には電源としては直流から高周波ま
でのいずれの周波数を用いてもよい。ただし、硬質の膜
を得るためには放電エネルギーを大きくするのが好まし
く、かつ基体の温度は可能な限り高くするのがよい。As the inert gas, He, Ne, A
r, Kr, but better to choose among Xe, H 2 In addition
Can also be used. The discharge is generated by applying a high voltage to the internal electrodes, by high-frequency electromagnetic induction from outside the container, or by introducing microwaves. When an internal electrode is used, any frequency from DC to high frequency may be used as a power source. However, in order to obtain a hard film, it is preferable to increase the discharge energy, and the temperature of the base is preferably as high as possible.
【００１８】磁性体薄膜は、例えばＦｅ、Ｃｏ、Ｎｉ、
Ｃｒなどの金属やこれらの合金、あるいはこれらの酸化
物などの中で強磁性を有する物質からなる薄膜であり、
蒸着、めっき、スパッタリングイオンプレーティング等
の方法で形成される。The magnetic thin film is made of, for example, Fe, Co, Ni,
It is a thin film made of a substance having ferromagnetism in metals such as Cr, alloys thereof, or oxides thereof,
It is formed by a method such as vapor deposition, plating, and sputtering ion plating.
【００１９】本発明で用いる含フッ素潤滑油としては、
たとえば一般式(化１)The fluorine-containing lubricating oil used in the present invention includes:
For example, the general formula
【００２０】[0020]
【化１】 Embedded image
【００２１】で与えられる分子量4000〜6200のポリパー
フロロアルキルエーテルがあり（但し式中ＲはＦ、ＣＦ
3又はＣＨ3）、ＫＲＹＴＯＸ(Ｒ)、ＶＯＮＢＬＩＮ(Ｒ)
等の名称で市販されているものを用いることができる。
また、上記ポリパーフロロアルキルエーテルの誘導体も
使用できる。上記誘導体としては例えば一般式(化２)There is a polyperfluoroalkyl ether having a molecular weight of 4000 to 6200 given by the formula (where R is F, CF
3 or CH 3 ), KRYTOX (R), VONBLIN (R)
Commercially available under the name such as
In addition, derivatives of the above polyperfluoroalkyl ethers can also be used. The derivative is, for example, a compound represented by the general formula (Chemical Formula 2)
【００２２】[0022]
【化２】 Embedded image
【００２３】あるいは末端をＣＯＯＨで置換した上記パ
ーフロロポリエーテルなどがある潤滑油層の形成方法と
しては潤滑油をフレオン等の溶剤に溶かし、塗布乾燥さ
せるのがよい。塗布の方法にはスピンコート、ディップ
法またはスプレーによる吹きつけ法などがあり、いずれ
を用いてもよい。Alternatively, as a method for forming a lubricating oil layer containing the above-mentioned perfluoropolyether whose terminal is substituted with COOH, it is preferable to dissolve the lubricating oil in a solvent such as freon and to apply and dry it. The coating method includes a spin coating method, a dipping method, a spraying method using a spray, and the like, and any of them may be used.
【００２４】[0024]
【発明の実施の形態】以下、本発明を実施例により説明
する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described with reference to embodiments.
【００２５】(実施例１)表面に厚さ３μｍのアルマイト
層を設けたアルミ製ディスク基板上に、Ｆｅをターゲッ
トとしてＡｒ／Ｏ2混合ガス雰囲気中でスパッタし、厚
さ0.2μｍのＦｅ3Ｏ4層を形成した。該基板を空気中で
熱酸化しγ−Ｆｅ3Ｏ4磁性層を形成した。(Example 1) On an aluminum disk substrate provided with a 3 μm-thick alumite layer on its surface, sputtering was performed in an Ar / O 2 mixed gas atmosphere using Fe as a target, and Fe 3 O having a thickness of 0.2 μm was used. Four layers were formed. The substrate was thermally oxidized in air to form a γ-Fe 3 O 4 magnetic layer.
【００２６】次いで該基板にカーボンをターゲットとし
てＡｒ雰囲気中で高周波マグネトロンスパッタによりス
パッタし炭素膜を形成させた。Ａｒのガス圧は0.003Ｔo
rr、スパッタ中の投入電力密度はターゲット面積あたり
３Ｗ／cm2であった。膜厚は0.02μｍとした。Next, the substrate was sputtered by high frequency magnetron sputtering in an Ar atmosphere using carbon as a target to form a carbon film. The gas pressure of Ar is 0.003 To
rr, the input power density during sputtering was 3 W / cm 2 per target area. The thickness was 0.02 μm.
【００２７】このようにして形成した炭素膜は非常に硬
く、0.1Ｒのサファイア針で50ｇの荷重をかけて引掻い
ても傷を生じなかった。該基板をＫＲＹＴＯＸ(Ｒ)をフ
レオン中に0.1vol％の濃度で溶かした溶液中に浸し、約
10cm／secの速度で引き上げて乾燥させ炭素膜上にＫＲ
ＹＴＯＸ(Ｒ)潤滑層を設けた。このようなプロセスで製
造した磁気ディスク基板に10Ｒの球面をもつサファイア
製摺動子を20ｇの荷重で押しつけ、ディスクを2000rpm
で回転させて摩擦係数と磁性層が破壊するまでの回転数
で測定した。結果を表１のNo.１に示した。特性は良好
であった。The carbon film thus formed was very hard, and did not scratch when it was scratched with a 0.1 R sapphire needle under a load of 50 g. The substrate is immersed in a solution of KRYTOX® in Freon at a concentration of 0.1 vol%, and
Pulled up at a speed of 10 cm / sec, dried and dried on a carbon film with KR
A YTOX® lubrication layer was provided. A sapphire slider having a spherical surface of 10R is pressed against a magnetic disk substrate manufactured by such a process with a load of 20 g, and the disk is 2,000 rpm.
And the number of rotations until the magnetic layer was broken. The results are shown in No. 1 of Table 1. The characteristics were good.
【００２８】[0028]
【表１】 [Table 1]
【００２９】(実施例２)カーボンターゲットをグラファ
イトカーボンとし、それ以外は実施例１と同様のプロセ
スで磁気ディスクを作製し、摺動評価を行った。結果を
表１のNo.２に示した。特性は良好であった。Example 2 A magnetic disk was manufactured by the same process as in Example 1 except that the carbon target was graphite carbon, and the sliding evaluation was performed. The results are shown in No. 2 of Table 1. The characteristics were good.
【００３０】(実施例３)実施例１と同様のプロセスで磁
性層を形成した磁気ディスク基板を250mm径の平行電極
を有する真空容器の１方の電極面に取りつけ、系内を排
気した後Ａｒとメタンを５対１の割合で混合したガスを
導入し、系内圧を0.2Ｔorrに保った。その後基板を取り
つけた側の電極に13.56ＭＨｚの高周波を300Ｗ印加して
グロー放電を発生させ、基板表面に厚さ0.03μｍの膜を
堆積させた。この基板を容器から取り出し実施例１と同
様の手順で潤滑油層を設け摺動評価を行った。結果を表
１のNo.３に示した。特性は良好であった。(Embodiment 3) A magnetic disk substrate on which a magnetic layer was formed by the same process as in Embodiment 1 was mounted on one electrode surface of a vacuum vessel having parallel electrodes having a diameter of 250 mm. A gas obtained by mixing methane and methane at a ratio of 5: 1 was introduced, and the internal pressure of the system was maintained at 0.2 Torr. Thereafter, 300 W of high frequency of 13.56 MHz was applied to the electrode on the side where the substrate was mounted to generate glow discharge, and a 0.03 μm thick film was deposited on the surface of the substrate. The substrate was taken out of the container, a lubricating oil layer was provided in the same procedure as in Example 1, and the sliding was evaluated. The results are shown in No. 3 of Table 1. The characteristics were good.
【００３１】(実施例４)厚さ12μｍポリエチレンテレフ
タレートフィルムの片面にＣｏ／Ｎｉ合金を0.1μｍの
厚みに蒸着し、磁性層を形成した。該磁性層表面に実施
例１と同じ手順で厚さ0.02μｍのカーボンおよびグラフ
ァイトカーボンのスパッタ膜を設けた後、実施例１と同
じＫＲＹＴＯＸ(Ｒ)溶液に浸し、引き上げて潤滑油層を
設け、磁気テープとした。Example 4 A Co / Ni alloy was vapor-deposited to a thickness of 0.1 μm on one side of a 12 μm-thick polyethylene terephthalate film to form a magnetic layer. After a carbon and graphite carbon sputtered film having a thickness of 0.02 μm was provided on the surface of the magnetic layer in the same procedure as in Example 1, it was immersed in the same KRYTOX® solution as in Example 1 and pulled up to provide a lubricating oil layer. It was a tape.
【００３２】この磁気テープを８ｍｍ巾にスリットし、
４ｍｍφのＳＵＳ製ピンに磁性層側が接触するように90
°の角度で巻きつけ、20ｇの荷重をかけて１ｍ／minの
速度でテープを往復動させた。100回摺動後の摩擦係数
と傷のはいり方を観察した。結果を表２のNo.６に示し
た。特性は良好であった。This magnetic tape is slit into a width of 8 mm,
Make sure that the magnetic layer side is in contact with the 4mmφ SUS pin.
The tape was wound at an angle of °, and the tape was reciprocated at a speed of 1 m / min under a load of 20 g. The coefficient of friction and the manner of scratching after sliding 100 times were observed. The results are shown in No. 6 of Table 2. The characteristics were good.
【００３３】[0033]
【表２】 [Table 2]
【００３４】(比較例１)実施例１のディスク用基板に磁
性層のみを実施例１と同様にして形成したものを、実施
例１と同様に摺動評価した。結果を表１のNo.４に示し
た。特性は良くなかった。(Comparative Example 1) The disk substrate of Example 1 in which only the magnetic layer was formed in the same manner as in Example 1 was evaluated for sliding as in Example 1. The results are shown in No. 4 of Table 1. The properties were not good.
【００３５】(比較例２)実施例１のディスク用基板に実
施例１と同様にして磁性層を設けた後、実施例１と同様
の条件でカーボンをスパッタしたもの、およびカーボン
スパッタなしで実施例１と同様にしてＫＲＹＴＯＸ Ｒ
の潤滑層を設けたものを、実施例１と同様に摺動評価し
た。結果表１のNo.５に示した。特性は良くなかった。(Comparative Example 2) A magnetic layer was provided on the disk substrate of Example 1 in the same manner as in Example 1, and then carbon was sputtered under the same conditions as in Example 1 and without carbon sputter. KRYTOX R as in Example 1
The sliding evaluation was performed in the same manner as in Example 1 except that the lubricating layer was provided. The results are shown in No. 5 of Table 1. The properties were not good.
【００３６】(比較例３)実施例４で用いたポリエチレン
テレフタレートフィルムに、実施例４と同様にしてＣｏ
／Ｎｉ合金の磁性層のみを設けたものおよび、実施例４
と同様にして磁性層とカーボンスパッタ膜を設けたも
の、実施例４と同様にして磁性層とＫＲＹＴＯＸ(Ｒ)の
潤滑層を設けたものをそれぞれ実施例4と同様に評価し
た。結果を表２のNo.７に示した。特性は良くなかっ
た。Comparative Example 3 The polyethylene terephthalate film used in Example 4 was replaced with Co in the same manner as in Example 4.
With only a magnetic layer of Ni / Ni alloy and Example 4
A magnetic layer and a carbon sputtered film were provided in the same manner as in Example 4, and a magnetic layer and a KRYTOX (R) lubricating layer were provided in the same manner as in Example 4, respectively. The results are shown in No. 7 of Table 2. The properties were not good.
【００３７】[0037]
【発明の効果】以上示したように、本研究によれば磁気
記録媒体の摩擦係数を下げ、摩耗に対し飛躍的な耐性を
もたせることができるため対ヘッド耐動特性を向上させ
磁気記録媒体の寿命および信頼性向上に大きな効果があ
る。As described above, according to the present study, the coefficient of friction of the magnetic recording medium can be reduced, and the magnetic recording medium can be provided with remarkable resistance to abrasion. This has a great effect on improving reliability.
─────────────────────────────────────────────────────
────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成１０年１１月１７日[Submission date] November 17, 1998
【手続補正１】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】特許請求の範囲[Correction target item name] Claims
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【特許請求の範囲】[Claims]
【手続補正２】[Procedure amendment 2]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】０００６[Correction target item name] 0006
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【０００６】[0006]
【発明が解決しようとする課題】我々は上記の方法を各
々試みたが、有機高分子やカーボンなどをスパッタした
場合には保護膜なしの場合に比べ確かに摺動時の摩耗が
軽減された。しかし長時間の摺動により膜はがれを生
じ、摩耗粉が急増することにより磁性媒体層も破壊され
寿命となるため、実用上はさらに寿命を延ばす必要があ
った。また潤滑油を磁性層上に塗布した場合には、厚く
塗布するとヘッド粘着が起こり、薄く塗布すると潤滑効
果が小さく十分な効果が得られなかった。また、上記ス
パッタで形成された炭素膜は硬度は大であるがしばしば
内部応力のために変形し基体からはがれたり亀裂を生じ
たりする。 We tried each of the above methods, but when organic polymer or carbon was sputtered, the wear during sliding was certainly reduced as compared with the case without a protective film. . However, the film is peeled off due to long-time sliding, and the magnetic medium layer is destroyed due to a sudden increase in abrasion powder, resulting in a long life. Therefore, it was necessary to further extend the life in practical use. Also, when the lubricating oil was applied on the magnetic layer, if it was applied thickly, head sticking occurred, and if it was applied thinly, the lubricating effect was small and sufficient effect could not be obtained. In addition,
The carbon film formed by the putter has high hardness but often
Deformation due to internal stress, peeling or cracking from the substrate
Or
【手続補正３】[Procedure amendment 3]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】０００７[Correction target item name] 0007
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【０００７】本発明の目的は上記した従来技術の欠点を
なくし、対ヘッド摺動において潤滑性に優れ、摩耗が少
なく、膜のはがれや亀裂のない磁気記録媒体を提供する
ことにある。An object of the present invention eliminates the disadvantages of the prior art described above, excellent lubricity in pairs head sliding, wear less <br/> phrase, to provide a magnetic recording medium free from peeling or cracking of the membrane It is in.
【手続補正４】[Procedure amendment 4]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】０００８[Correction target item name] 0008
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【０００８】[0008]
【課題を解決するための手段】上記目的は、基体上に設
けられた磁性層と、この磁性層上に設けられた保護層と
からなる磁気記録媒体において、前記保護層は、水素を
含みその水素の比率が原子数の比で炭素の３０％以下で
ある硬質カーボン層と、該硬質カーボン層の上に設けら
れた含フッ素潤滑油層を設けることにより達成される。SUMMARY OF THE INVENTION The above object is attained by mounting on a substrate.
Magnetic layer, and a protective layer provided on the magnetic layer.
In the magnetic recording medium comprising: the protective layer contains hydrogen.
If the hydrogen content is less than 30% of carbon in terms of the number of atoms
A hard carbon layer and a layer provided on the hard carbon layer.
This is achieved by providing a fluorinated lubricating oil layer .
【手続補正５】[Procedure amendment 5]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００１１[Correction target item name] 0011
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【００１１】しかし、このような厚さでは油膜の均一性
が保てず、部分的に破断が生じて摺動面と被摺動面が部
分的に接触するいわゆる境界摩耗の領域となる。この領
域においては油の潤滑特性が十分に生かされず、摩擦係
数が大きくなり、かつ被摺動面の摩耗が生じ、記録特性
の劣下やエラー発生又は走行性不良の原因となる。However, with such a thickness, the uniformity of the oil film cannot be maintained, and the oil film is partially broken, which is a so-called boundary wear area where the sliding surface and the sliding surface are in partial contact. In this region, the lubricating properties of the oil are not sufficiently utilized, the friction coefficient is increased, and the sliding surface is worn, which causes poor recording characteristics, errors, or poor running performance. Become.
【手続補正６】[Procedure amendment 6]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００１４[Correction target item name] 0014
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【００１４】本発明における硬質カーボン膜はカーボン
又はグラフアイト状カーボン素材を不活性ガスと炭化水
素ガスの混合ガス雰囲気中でスパッタするか炭化水素ガ
スを放電エネルギ−により分解反応させ、基体上に堆積
させることにより形成される。スパッタの場合ガス圧が
高いと膜の硬度が低下するので0.01Ｔorr以下が好まし
い。スパッタの方法には直流スパッタ、交流スパッタ、
高周波スパッタ、直流マグネトロンスパッタ、高周波マ
グネトロンスパッタ、イオンビームスパッタ等があり、
いずれでもよいが、硬質な膜を形成するためにはエネル
ギー密度を高くするのがよく、たとえば高周波マグネト
ロンスパッタではターゲット面積あたりの投入電力は１
Ｗ／cm2以上、好ましくは1.5〜0.3Ｗ／cm2である。ま
た、基体を保持する側の電極に０〜−３ＫＶの範囲より
選ばれる電圧を印加しつつスパッタすることは膜の硬度
を増大しかつ膜と基体との密着性を向上させる効果があ
る。The hard carbon film in the present invention is deposited on a substrate by sputtering carbon or graphite-like carbon material in a mixed gas atmosphere of an inert gas and a hydrocarbon gas or by causing a hydrocarbon gas to undergo a decomposition reaction by discharge energy. It is formed by having In the case of sputtering, if the gas pressure is high, the hardness of the film is reduced. DC sputtering, AC sputtering,
There are high frequency sputtering, DC magnetron sputtering, high frequency magnetron sputtering, ion beam sputtering, etc.
Either one may be used, but it is preferable to increase the energy density in order to form a hard film. For example, in high frequency magnetron sputtering, the input power per target area is 1 unit.
W / cm 2 or more, preferably 1.5~0.3W / cm 2. Sputtering while applying a voltage selected from the range of 0 to -3 KV to the electrode holding the base has the effects of increasing the hardness of the film and improving the adhesion between the film and the base.
【手続補正７】[Procedure amendment 7]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００１５[Correction target item name] 0015
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【００１５】上記スパッタで形成された炭素膜は硬度は
大であるがしばしば内部応力のために変形し基体からは
がれたり亀裂を生じたりする。本発明は、これを防ぐた
めにスパッタ雰囲気に炭化水素ガスを混入する。上記炭
化水素ガスとしては、メタン、エタン、プロパン、ブタ
ン、イソブタン、シクロブタン、ペンタン、イソペタ
ン、ナオペンタン、ヘキサン、ベンゼン、トルエン等を
用いることができる。このようにしてスパッタ形成され
た膜には少量の水素が含まれるが、水素の比率が多いも
のは硬度が減少するため、本発明では、原子数の比で炭
素の30％以下とするものである。Although the carbon film formed by the above sputtering has a high hardness, it often deforms due to internal stress and peels off or cracks from the substrate. The present invention is, you mixed hydrocarbon gas to spatter atmosphere <br/> Me which prevent this. As the hydrocarbon gas, methane, ethane, propane, butane, isobutane, cyclobutane, pentane, isopentane, naopentane, hexane, benzene, toluene and the like can be used. While such is included a small amount of hydrogen in the film that is sputtered in the order of decreasing hardness there are many ratios of hydrogen, in the present invention, intended to a ratio of number of atoms than 30% carbon There is .
【手続補正８】[Procedure amendment 8]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００３５[Correction target item name] 0035
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【００３５】(比較例２)実施例１のディスク用基板に実
施例１と同様にして磁性層を設けた後、実施例１と同様
の条件でカーボンをスパッタしたもの、およびカーボン
スパッタなしで実施例１と同様にしてＫＲＹＴＯＸ
（Ｒ）の潤滑層を設けたものを、実施例１と同様に摺動
評価した。結果を表１のNo.５に示した。特性は良くな
かった。(Comparative Example 2) A magnetic layer was provided on the disk substrate of Example 1 in the same manner as in Example 1, and then carbon was sputtered under the same conditions as in Example 1 and without carbon sputter. KRYTOX in the same manner as in Example 1.
(R) The lubrication layer provided was evaluated for sliding in the same manner as in Example 1. The results are shown in Table 5, No. 5. The properties were not good.
【手続補正９】[Procedure amendment 9]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００３７[Correction target item name] 0037
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【００３７】[0037]
【発明の効果】以上説明したように、本発明によれば、
磁気記録媒体の保護膜としての炭素膜に原子数の比で炭
素の３０％以下の水素を含有させることにより、炭素膜
に亀裂やはがれが発生するのを防止することができ、記
録媒体の信頼性の向上に大きな効果がある。 As described above, according to the present invention,
In a carbon film as a protective film of a magnetic recording medium,
Carbon film by containing 30% or less of hydrogen
Can prevent cracks and peeling from occurring.
This has a great effect on improving the reliability of the recording medium.
Claims (1)
と、この磁性層上に設けられた保護層とからなる磁気記
録媒体において、前記保護層は水素を含み、その水素の
比率が原子数の比で炭素の３０％以下である硬質カーボ
ン層と含フッ素潤滑油層からなることを特徴とする磁気
記録媒体。1. A magnetic recording medium comprising a base, a magnetic layer provided on the base, and a protective layer provided on the magnetic layer, wherein the protective layer contains hydrogen, and the ratio of the hydrogen is reduced. A magnetic recording medium comprising a hard carbon layer having a ratio of the number of atoms of 30% or less of carbon and a fluorine-containing lubricating oil layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29698398A JPH11203660A (en) | 1984-11-26 | 1998-10-19 | Magnetic recording medium |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6095118A JP2892588B2 (en) | 1984-11-26 | 1984-11-26 | Manufacturing method of magnetic recording medium |
| JP29698398A JPH11203660A (en) | 1984-11-26 | 1998-10-19 | Magnetic recording medium |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6095118A Division JP2892588B2 (en) | 1984-11-26 | 1984-11-26 | Manufacturing method of magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11203660A true JPH11203660A (en) | 1999-07-30 |
Family
ID=14128929
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6095118A Expired - Lifetime JP2892588B2 (en) | 1984-11-26 | 1984-11-26 | Manufacturing method of magnetic recording medium |
| JP29698398A Pending JPH11203660A (en) | 1984-11-26 | 1998-10-19 | Magnetic recording medium |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6095118A Expired - Lifetime JP2892588B2 (en) | 1984-11-26 | 1984-11-26 | Manufacturing method of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (2) | JP2892588B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012227383A (en) * | 2011-04-20 | 2012-11-15 | Showa Denko Kk | Semiconductor light-emitting element, electrode structure, and light-emitting device |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6023406B2 (en) * | 1977-05-18 | 1985-06-07 | 日本電気株式会社 | magnetic disk |
| US4188434A (en) * | 1978-05-15 | 1980-02-12 | Storage Technology Corporation | Lubricant for a magnetic member |
| JPS57167131A (en) * | 1981-04-03 | 1982-10-14 | Fujitsu Ltd | Magnetic recording medium |
| JPS5961106A (en) * | 1982-09-30 | 1984-04-07 | Nec Corp | Magnetic memory body |
| JPS59127232A (en) * | 1983-01-11 | 1984-07-23 | Seiko Epson Corp | Magnetic recording medium |
| JPS61122627A (en) * | 1984-11-20 | 1986-06-10 | Hamamatsu Photonics Kk | Space optical modulating tube |
-
1984
- 1984-11-26 JP JP6095118A patent/JP2892588B2/en not_active Expired - Lifetime
-
1998
- 1998-10-19 JP JP29698398A patent/JPH11203660A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012227383A (en) * | 2011-04-20 | 2012-11-15 | Showa Denko Kk | Semiconductor light-emitting element, electrode structure, and light-emitting device |
| US8884329B2 (en) | 2011-04-20 | 2014-11-11 | Toyoda Gosei Co., Ltd. | Semiconductor light-emitting element, electrode structure and light-emitting device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07134821A (en) | 1995-05-23 |
| JP2892588B2 (en) | 1999-05-17 |
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