JPH10270850A - Built-up printed board and its manufacture - Google Patents

Built-up printed board and its manufacture

Info

Publication number
JPH10270850A
JPH10270850A JP9033297A JP9033297A JPH10270850A JP H10270850 A JPH10270850 A JP H10270850A JP 9033297 A JP9033297 A JP 9033297A JP 9033297 A JP9033297 A JP 9033297A JP H10270850 A JPH10270850 A JP H10270850A
Authority
JP
Japan
Prior art keywords
layer
via hole
insulating layer
conductor layer
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9033297A
Other languages
Japanese (ja)
Inventor
Makoto Kobayashi
誠 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Avionics Co Ltd
Original Assignee
Nippon Avionics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Avionics Co Ltd filed Critical Nippon Avionics Co Ltd
Priority to JP9033297A priority Critical patent/JPH10270850A/en
Publication of JPH10270850A publication Critical patent/JPH10270850A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To manufacture a built-up printed board having a high wiring density, by providing a coaxial via hole which connects at least three layers of circuit patterns. SOLUTION: The case of having three layers on one side is explained. First, copper toils 12 are adhered on the both planes of an insulating board and a copper laminated board 10 whereupon a first pattern is formed is prepared. From the copper laminated board 10, a laminate body 42 is obtained. Then, a second insulating layer 44 is formed on the surface of the laminate body 42, and a laminate body 48 having the three layers on one side is obtained. A small opening 52a for a via hole which penetrates the second conducting layer 46, the insulating layer 44 and a first conducting layer 38 and reaches the middle of the first insulating layer 30 is formed. Then, the small opening 52a is irradiated with laser beams. As a result, under the small opening 52a, the lower copper foil 12 appears at the bottom of a small hole 52b provided for a via hole. After conductivity is given to the surface of the small hole 52b that includes the inner plane, electrolytic plating is performed and a third conducting layer 54 is formed. The third conducting layer 54 formed on the inner plane of the small hole 52b becomes a via hole 52.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、異なる層の回路パ
ターンを接続するビアホールを有するビルドアッププリ
ント配線板に係り、特に少なくとも3層の回路パターン
を接続する同軸上のビアホールを有するビルドアッププ
リント配線板とその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a build-up printed wiring board having via holes connecting circuit patterns of different layers, and more particularly to a build-up printed wiring board having coaxial via holes connecting at least three circuit patterns. The present invention relates to a plate and a method for manufacturing the plate.

【0002】[0002]

【従来の技術】多層プリント配線板の製造方法におい
て、絶縁基板の少なくとも一方の面に回路パターンと絶
縁層とを順次積み上げてゆくビルドアップ法が公知であ
る。この場合には、各層の回路パターン間を電気的に接
続するために、ビアホール(バイアホール、ビヤホー
ル)を設けている。
2. Description of the Related Art In a method of manufacturing a multilayer printed wiring board, there is known a build-up method in which a circuit pattern and an insulating layer are sequentially stacked on at least one surface of an insulating substrate. In this case, via holes (via holes, via holes) are provided to electrically connect the circuit patterns of each layer.

【0003】図2は、従来のフォトリソグラフ法による
片側3層ビルドアッププリント配線板の回路パターンを
接続するフォトビアホールの製造工程を示す図である。
図2を用いてフォトビアホールの形成法を説明する。図
2において10は銅張積層板であり、紙やガラス繊維な
どの補強基材に樹脂を含浸させたシート(プリプレグ)
を重ね、加圧加熱処理して得た絶縁板(積層板)の両面
または片面に銅箔12を張り付けたものである。ここで
はガラス布にエポキシ樹脂を含浸させたもの、例えばN
EMA規格FR−4の両面銅張積層板を用いる。この銅
箔12、12には公知のフォトエッチング法によって適
宜の第1回路パターンが形成される。
FIG. 2 is a view showing a process of manufacturing a photo via hole for connecting a circuit pattern of a one-sided three-layer build-up printed wiring board by a conventional photolithographic method.
A method for forming a photo via hole will be described with reference to FIG. In FIG. 2, reference numeral 10 denotes a copper-clad laminate, which is a sheet (prepreg) in which a reinforcing base material such as paper or glass fiber is impregnated with a resin.
Are laminated, and a copper foil 12 is adhered to both surfaces or one surface of an insulating plate (laminated plate) obtained by pressurizing and heating. Here, a glass cloth impregnated with an epoxy resin, for example, N
A double-sided copper-clad laminate of EMA standard FR-4 is used. An appropriate first circuit pattern is formed on the copper foils 12 by a known photoetching method.

【0004】そしてこの片面(図2の上方)に感光性樹
脂、例えばエポキシアクリレート系の光硬化性樹脂を塗
布する(図2(A))。この光硬化性樹脂の塗布層(光
硬化性樹脂絶縁層)30を低温の恒温槽に入れ、樹脂の
溶媒中に含まれる揮発性有機溶剤を除いて乾燥させ、膜
質を適当に硬化させる。次にこの積層体32の表面にビ
アホールのパターンを焼付けたフォトマスク34を密着
させ、あるいは僅かに離して位置合わせを行い、適切な
波長の光(通常紫外線(UV)の光線を用いる)を照射
して露光する(図2(B))。この結果ビアホールのパ
ターンの下の絶縁層30は硬化せず、パターン以外の部
分の絶縁層30が硬化する。
[0004] A photosensitive resin, for example, an epoxy acrylate-based photocurable resin is applied to one surface (the upper part of FIG. 2) (FIG. 2A). The photo-curable resin coating layer (photo-curable resin insulating layer) 30 is placed in a low-temperature constant-temperature bath, dried except for the volatile organic solvent contained in the resin solvent, and the film quality is appropriately cured. Next, a photomask 34 in which a via hole pattern is baked is brought into close contact with the surface of the laminated body 32, or is positioned slightly apart to perform positioning, and is irradiated with light of an appropriate wavelength (usually using ultraviolet (UV) light). And exposure (FIG. 2B). As a result, the insulating layer 30 under the via hole pattern is not cured, and the insulating layer 30 other than the pattern is cured.

【0005】そしてアルカリ溶剤の現像液で現像して未
硬化部分(可溶部分)を取り去れば、フォトマスク34
に焼付けられたビアホールのパターンに一致する小孔3
6、すなわちフォトビアホール用の小孔36が形成され
る(図2(C))。この表面に銅めっきを施して第1導
体層38を形成すれば、下の第1回路パターンを形成し
た銅箔12と表面の第1導体層38とを接続するビアホ
ール40が得られる(図2(D))。
[0005] Then, by developing with a developing solution of an alkaline solvent to remove an uncured portion (soluble portion), the photomask 34 is removed.
Small holes 3 matching the pattern of via holes baked in
6, that is, small holes 36 for photo via holes are formed (FIG. 2C). If the first conductor layer 38 is formed by applying copper plating to this surface, a via hole 40 connecting the copper foil 12 on which the first circuit pattern below is formed and the first conductor layer 38 on the surface is obtained (FIG. 2). (D)).

【0006】なお表面の第1導体層38にはフォトエッ
チング法などにより適宜の第2回路パターンを形成す
る。こうして、積層体42を得る。
An appropriate second circuit pattern is formed on the first conductive layer 38 on the surface by a photoetching method or the like. Thus, a laminate 42 is obtained.

【0007】続いて、この積層体42の表面に光硬化性
樹脂を塗布する。この光硬化性樹脂の塗布層(光硬化性
樹脂絶縁層)44を低温の恒温槽に入れ、樹脂の溶媒中
に含まれる揮発性有機溶剤を除いて乾燥させ、膜質を適
当に硬化させる。次にこの積層体の表面にビアホールの
パターンを焼付けたフォトマスクを密着させ、あるいは
僅かに離して位置合わせを行い、適切な波長の光(通常
紫外線(UV)の光線を用いる)を照射して露光する。
この結果ビアホールのパターンの下の絶縁層44は硬化
せず、パターン以外の部分の絶縁層44が硬化する。
Subsequently, a photocurable resin is applied to the surface of the laminate 42. The photo-curable resin coating layer (photo-curable resin insulating layer) 44 is placed in a low-temperature constant-temperature bath, dried except for the volatile organic solvent contained in the solvent of the resin, and the film quality is appropriately cured. Next, a photomask in which a via hole pattern is baked is brought into close contact with the surface of the laminated body, or is positioned slightly away from the laminated body, and is irradiated with light having an appropriate wavelength (usually using ultraviolet (UV) light). Expose.
As a result, the insulating layer 44 under the via hole pattern is not cured, and the insulating layer 44 other than the pattern is cured.

【0008】そしてアルカリ溶剤の現像液で現像して未
硬化部分(可溶部分)を取り去れば、フォトマスクに焼
付けられたビアホールのパターンに一致するフォトビア
ホール用の小孔が形成される。この表面に銅めっきを施
して第2導体層46を形成すれば、下の第2回路パター
ンを形成した第1導体層38と表面の第2導体層46と
を接続するビアホール48が得られる(図2(E))。
このようにして、第1回路パターンを形成した銅箔12
と第2回路パターンを形成した第1導体層38と第2導
体層46を接続するビアホール40、48は重なること
がないようにずらして形成され、図2(E)に示すよう
に階段状に形成される。 なお第2導体層46には必要
に応じてフォトエッチング法などによって第3回路パタ
ーンを形成するのは勿論である。
When the uncured portion (soluble portion) is removed by developing with a developing solution of an alkaline solvent, small holes for the photo via hole corresponding to the via hole pattern baked on the photo mask are formed. If the second conductor layer 46 is formed by applying copper plating to this surface, a via hole 48 connecting the first conductor layer 38 on which the lower second circuit pattern is formed and the second conductor layer 46 on the surface is obtained ( (E of FIG. 2).
Thus, the copper foil 12 on which the first circuit pattern is formed is formed.
The via holes 40 and 48 connecting the first conductor layer 38 and the second conductor layer 46 on which the second circuit pattern is formed and the first conductor layer 38 are formed so as to be shifted from each other so as not to overlap, and as shown in FIG. It is formed. It is needless to say that a third circuit pattern is formed on the second conductor layer 46 by a photoetching method or the like as necessary.

【0009】[0009]

【発明が解決しようとする課題】図2により説明したよ
うに従来のフォトリソグラフ法を用いてビアホールを形
成するので、一度の露光・現像により多数のフォトビア
ホールを能率良く形成することができ、生産性を高くす
ることが可能である。しかしながら、このフォトリソグ
ラフ法によりビアホールが形成されたビルドアッププリ
ント配線板においては、図2(E)に示すように、形成
されたビアホールは階段状に配置されるので、異なる回
路パターンを接続する度にビアホールが必要になるため
配線密度が低下し、また信号ライン長も長くなるので、
信号伝搬速度も低下するという問題点があった。また、
この問題点は積層数が増すほど顕著な問題となって表れ
る。本発明は、上記課題を解決するためになされたもの
で、少なくとも3層の回路パターンを接続する同軸上に
形成されたビアホールを備えるビルドアッププリント配
線板を提供することを第1の目的とし、その製造方法を
提供することを第2の目的とする。
As described with reference to FIG. 2, since the via holes are formed by using the conventional photolithography method, a large number of photo via holes can be efficiently formed by one exposure and development. It is possible to increase the quality. However, in the build-up printed wiring board in which via holes are formed by the photolithographic method, as shown in FIG. 2E, the formed via holes are arranged in steps, so that different circuit patterns are connected each time. Since via holes are required, the wiring density decreases, and the signal line length also increases.
There is a problem that the signal propagation speed is also reduced. Also,
This problem becomes more prominent as the number of layers increases. The present invention has been made in order to solve the above problems, and has as its first object to provide a build-up printed wiring board including a coaxially formed via hole for connecting at least three layers of circuit patterns, A second object is to provide a method of manufacturing the same.

【0010】[0010]

【課題を解決するための手段】本発明によれば、異なる
層の回路パターンを接続するビアホールを有するビルド
アッププリント配線板において、少なくとも3層の回路
パターンを接続する同軸上のビアホールを有することを
特徴とするビルドアッププリント配線板、により達成さ
れる。
According to the present invention, a build-up printed wiring board having via holes for connecting circuit patterns of different layers has a coaxial via hole for connecting at least three circuit patterns. This is achieved by a build-up printed wiring board characterized by the following.

【0011】また、第2の目的はビルドアッププリント
配線板の製造方法において、 a)第1回路パターンを形成した銅張り積層板上に感光
性樹脂を積層して第1絶縁層を形成し、 b)この第1絶縁層上に第1導体層を形成し、 c)この第1導体層上に感光性樹脂を積層して第2絶縁
層を形成し、 d)この第2絶縁層上に第2導体層を形成し、 e)ドリル加工により、この第2導体層から第2絶縁
層、第1導体層を貫通し、第1絶縁層の中間まで到達す
る小開口部を形成し、 f)前記第2導体層にレーザを照射して、この小開口部
から前記第1回路パターンに到達するビアホール用小孔
を形成し、 g)前記第2導体層上、および前記ビアホール用小孔に
銅めっきを施して第3導体層を形成する、ことを特徴と
するビルドアッププリント配線板の製造方法、により達
成される。
A second object of the present invention is to provide a method of manufacturing a build-up printed wiring board, comprising: a) forming a first insulating layer by laminating a photosensitive resin on a copper-clad laminate on which a first circuit pattern is formed; b) forming a first conductive layer on the first insulating layer; c) laminating a photosensitive resin on the first conductive layer to form a second insulating layer; d) forming a second insulating layer on the second insulating layer. Forming a second conductor layer; e) forming a small opening penetrating from the second conductor layer through the second insulation layer and the first conductor layer and reaching the middle of the first insulation layer by drilling; f) A) irradiating the second conductor layer with a laser to form a via hole small hole reaching the first circuit pattern from the small opening; and g) forming a via hole on the second conductor layer and the via hole small hole. Forming a third conductor layer by applying copper plating; A method of manufacturing a wire plate.

【0012】[0012]

【発明の実施の形態】図1は本発明によるビルドアップ
プリント配線板の製造法の1実施形態を示す図である。
図1においても、片側3層の場合について説明する。
FIG. 1 is a diagram showing one embodiment of a method of manufacturing a build-up printed wiring board according to the present invention.
FIG. 1 also describes the case of three layers on one side.

【0013】まず、前記図2で用いたのと同様な絶縁基
板の両面に銅箔12を張り付け、第1回路パターンを形
成した銅張り積層板10を用意する。この銅張り積層板
10に前記図2(A)〜(D)に示す工程を経て、積層
体42を得る(図1(A))。ここで、30は第1絶縁
層、38は銅めっき処理により得られた第1導体層であ
る。なお表面の第1導体層38にはフォトエッチング法
などにより適宜の第2回路パターンを形成する。なお、
図1(A)にはフォトビアホールは本発明に直接関係し
ないので省略してある。
First, copper foils 12 are adhered to both sides of an insulating substrate similar to that used in FIG. 2 to prepare a copper-clad laminate 10 on which a first circuit pattern is formed. The copper-clad laminate 10 is subjected to the steps shown in FIGS. 2A to 2D to obtain a laminate 42 (FIG. 1A). Here, reference numeral 30 denotes a first insulating layer, and reference numeral 38 denotes a first conductor layer obtained by a copper plating process. An appropriate second circuit pattern is formed on the first conductive layer 38 on the surface by a photoetching method or the like. In addition,
In FIG. 1A, photo via holes are omitted because they are not directly related to the present invention.

【0014】続いて、上記の工程を再度繰り返し、積層
体42の表面に第2絶縁層44を形成し、片面3層の積
層体48を得る(図1(B))。ここで、46は銅めっ
き処理により得られた第2導体層である。なお、ここで
もフォトビアホールは省略してある。
Subsequently, the above steps are repeated again to form a second insulating layer 44 on the surface of the laminated body 42 to obtain a laminated body 48 having three layers on one side (FIG. 1B). Here, reference numeral 46 denotes a second conductor layer obtained by a copper plating process. Note that the photo via hole is also omitted here.

【0015】次に、ドリル加工により、第2導体層4
6、絶縁層44、第1導体層38を貫通し、第1絶縁層
30の中間まで到達するビアホール用の小開口部52a
を形成する(図1(C))。次に、小開口部52aを指
向してレーザーが照射される。レーザーは表面の第2導
体層46は透過できないので、第2導体層50の銅箔が
ない小開口部52aを通して第1絶縁層30を加熱し消
失させる。この結果小開口部52aの下にビアホール用
の小孔52bが形成される。レーザーは下の銅箔12の
下に到達することができないから、小孔52bの底には
下の銅箔12が現れる(図2(D))。
Next, the second conductor layer 4 is drilled.
6, a small opening 52a for a via hole penetrating through the insulating layer 44 and the first conductor layer 38 and reaching the middle of the first insulating layer 30
Is formed (FIG. 1C). Next, a laser beam is directed toward the small opening 52a. Since the laser cannot pass through the second conductive layer 46 on the surface, the first insulating layer 30 is heated and disappears through the small opening 52a of the second conductive layer 50 where there is no copper foil. As a result, a small hole 52b for a via hole is formed below the small opening 52a. Since the laser cannot reach below the lower copper foil 12, the lower copper foil 12 appears at the bottom of the small hole 52b (FIG. 2D).

【0016】次に、片面3層の積層体48は銅めっきさ
れる。すなわち無電解銅めっきにより小孔52bの内面
を含む表面に導電性が付与された後、電解銅めっきが施
され、所定厚さの第3導体層54が形成される。小孔5
2bの内面に形成された第3導体層54は、下の銅箔1
2の第1回路パターンと中間の第1導体層の第2回路パ
ターンと上の第2導体層46とを接続するビアホール5
2となる(図1(E))。なお表面の第2導体層50に
はフォトエッチング法などにより適宜の第3回路パター
ンを形成することは勿論である。
Next, the laminate 48 having three layers on one side is plated with copper. That is, after the surface including the inner surface of the small hole 52b is given conductivity by electroless copper plating, electrolytic copper plating is performed to form the third conductor layer 54 having a predetermined thickness. Small hole 5
The third conductor layer 54 formed on the inner surface of the lower copper foil 1
Via hole 5 for connecting the first circuit pattern of No. 2 with the second circuit pattern of the intermediate first conductive layer and the upper second conductive layer 46
2 (FIG. 1 (E)). It is needless to say that an appropriate third circuit pattern is formed on the second conductor layer 50 on the surface by a photoetching method or the like.

【0017】このようにして、3層間の接続用ビアホー
ルを同軸上に形成したビルドアッププリント配線板を製
造できる。本実施形態では片面ビルドアッププリント配
線板を例にとって説明しているが、両面ビルドアッププ
リント配線板も同様にして製造できるのは勿論であり、
また3層の場合を例に説明してあるが、3層以上のもの
も前述の手順を繰り返すことによって製造できることも
勿論である。
In this way, it is possible to manufacture a build-up printed wiring board in which connection via holes between three layers are formed coaxially. In the present embodiment, a single-sided build-up printed circuit board is described as an example, but it is a matter of course that a double-sided build-up printed circuit board can be manufactured in the same manner.
Although the case of three layers is described as an example, it is needless to say that a structure having three or more layers can be manufactured by repeating the above-described procedure.

【0018】[0018]

【発明の効果】請求項1の発明によれば、以上説明した
ように、隣接する層間の接続用ビアホールは従来方法で
形成し、特に3層以上層間の接続用ビアホールは同軸上
に形成することにしたので、従来のように階段状に形成
する必要がなくなり、この3層以上層間接続用ビアホー
ル形成に必要な領域を削減できるから、ビルドアッププ
リント配線板の配線密度を向上させることが可能とな
り、プリント基板の小型化に寄与できるので、同じ規模
の回路を実装可能な低コストのビルドアッププリント配
線板を提供できる。加えて、配線密度が向上するので、
信号ライン長を短く形成できるから、信号伝搬速度が向
上し、高速処理が必要な回路を形成することが可能とな
り、高周波用プリント配線板に好適なビルドアッププリ
ント配線板を提供できる。また、請求項2の発明によれ
ば、このビルドアッププリント配線板の製造方法を提供
できる。
According to the first aspect of the present invention, as described above, connection via holes between adjacent layers are formed by a conventional method, and particularly, connection via holes between three or more layers are formed coaxially. As a result, it is not necessary to form a step-like structure as in the prior art, and it is possible to reduce the area required for forming three or more layers of via holes for interlayer connection, thereby improving the wiring density of the build-up printed wiring board. Since this can contribute to miniaturization of the printed circuit board, a low-cost build-up printed circuit board on which circuits of the same scale can be mounted can be provided. In addition, since the wiring density is improved,
Since the signal line length can be reduced, the signal propagation speed can be improved, a circuit requiring high-speed processing can be formed, and a build-up printed wiring board suitable for a high-frequency printed wiring board can be provided. Further, according to the invention of claim 2, it is possible to provide a method of manufacturing this build-up printed wiring board.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明によるビルドアッププリント配線板の製
造法の1実施形態を示す図である。
FIG. 1 is a diagram showing one embodiment of a method for manufacturing a build-up printed wiring board according to the present invention.

【図2】従来のビルドアップ法による多層プリント配線
板の製造工程を示す図である。
FIG. 2 is a view showing a manufacturing process of a multilayer printed wiring board by a conventional build-up method.

【符号の説明】 10 銅張り積層板 12 銅箔 14 第1絶縁層 30 第2絶縁層 32、42 積層体 34 フォトマスク 36 小孔 38 第1導体層 40、48、52 ビアホール 46 第2導体層DESCRIPTION OF SYMBOLS 10 Copper-clad laminate 12 Copper foil 14 First insulating layer 30 Second insulating layer 32, 42 Laminated body 34 Photomask 36 Small hole 38 First conductive layer 40, 48, 52 Via hole 46 Second conductive layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 異なる層の回路パターンを接続するビア
ホールを有するビルドアッププリント配線板において、
少なくとも3層の回路パターンを接続する同軸上のビア
ホールを有することを特徴とするビルドアッププリント
配線板。
1. A build-up printed wiring board having via holes connecting circuit patterns of different layers,
A build-up printed wiring board having coaxial via holes for connecting at least three circuit patterns.
【請求項2】 ビアホールを有するビルドアッププリン
ト配線板の製造方法において、 a)第1回路パターンを形成した銅張り積層板上に感光
性樹脂を積層して第1絶縁層を形成し、 b)この第1絶縁層上に第1導体層を形成し、 c)この第1導体層上に感光性樹脂を積層して第2絶縁
層を形成し、 d)この第2絶縁層上に第2導体層を形成し、 e)ドリル加工により、この第2導体層から第2絶縁
層、第1導体層を貫通し、第1絶縁層の中間まで到達す
る小開口部を形成し、 f)前記第2導体層にレーザを照射して、この小開口部
から前記第1回路パターンに到達するビアホール用小孔
を形成し、 g)前記第2導体層上、および前記ビアホール用小孔に
銅めっきを施して第3導体層を形成する、ことを特徴と
するビルドアッププリント配線板の製造方法。
2. A method of manufacturing a build-up printed wiring board having a via hole, comprising: a) forming a first insulating layer by laminating a photosensitive resin on a copper-clad laminate having a first circuit pattern formed thereon; Forming a first conductive layer on the first insulating layer; c) laminating a photosensitive resin on the first conductive layer to form a second insulating layer; d) forming a second conductive layer on the second insulating layer. Forming a conductor layer; e) forming a small opening through the second conductor layer through the second insulation layer and the first conductor layer and reaching the middle of the first insulation layer by drilling; Irradiating a laser to the second conductor layer to form via hole small holes reaching the first circuit pattern from the small openings; and g) copper plating on the second conductor layer and the via hole small holes. Forming a third conductor layer by performing the following steps: Method of manufacturing a line plate.
JP9033297A 1997-03-25 1997-03-25 Built-up printed board and its manufacture Pending JPH10270850A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9033297A JPH10270850A (en) 1997-03-25 1997-03-25 Built-up printed board and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9033297A JPH10270850A (en) 1997-03-25 1997-03-25 Built-up printed board and its manufacture

Publications (1)

Publication Number Publication Date
JPH10270850A true JPH10270850A (en) 1998-10-09

Family

ID=13995572

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9033297A Pending JPH10270850A (en) 1997-03-25 1997-03-25 Built-up printed board and its manufacture

Country Status (1)

Country Link
JP (1) JPH10270850A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002324975A (en) * 2001-04-25 2002-11-08 Toppan Printing Co Ltd Multilayer printed wiring board and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002324975A (en) * 2001-04-25 2002-11-08 Toppan Printing Co Ltd Multilayer printed wiring board and its manufacturing method

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