JPH095527A - Light transmission body pattern forming method - Google Patents
Light transmission body pattern forming methodInfo
- Publication number
- JPH095527A JPH095527A JP17273895A JP17273895A JPH095527A JP H095527 A JPH095527 A JP H095527A JP 17273895 A JP17273895 A JP 17273895A JP 17273895 A JP17273895 A JP 17273895A JP H095527 A JPH095527 A JP H095527A
- Authority
- JP
- Japan
- Prior art keywords
- transmission body
- light guide
- light transmission
- light
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Light Guides In General And Applications Therefor (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、アクリル樹脂等透明板
を導光体材料とし、導光体側面に蛍光灯等線状光源を位
置させ、さらに導光体面上に非散乱部・散乱部より成る
導光体パターンを形成した導光体を用いる表示用あるい
は照明用面光源の導光体パターン形成方法に関するもの
である。非散乱部・散乱部より成る導光体パターンは、
散乱部面積を蛍光灯等線状光源よりの距離に対して変化
させ、輝度均一性を達成するためのものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention uses a transparent plate such as an acrylic resin as a light guide material, a linear light source such as a fluorescent lamp is located on the side surface of the light guide, and a non-scattering portion / scattering portion is provided on the light guide surface. The present invention relates to a method of forming a light guide pattern of a surface light source for display or illumination using a light guide having a light guide pattern made of The light guide pattern consisting of non-scattering part and scattering part is
This is for achieving uniform brightness by changing the area of the scattering part with respect to the distance from the linear light source such as a fluorescent lamp.
【０００２】[0002]
【従来の技術】従来の非散乱部・散乱部より成る導光体
パターン形成方法は、以下２方法のいずれかが採用され
ている。 透明板上にスクリーン印刷にて酸化チタン等散乱材
を印刷する。 粗面部・平滑部より成るパターンを内蔵する金型に
て、透明材を射出成形する。このとき、転写されたパタ
ーンにて粗面部が散乱部となり、平滑部が非散乱部とな
る。2. Description of the Related Art One of the following two methods is adopted as a conventional method for forming a light guide pattern composed of a non-scattering portion and a scattering portion. A scattering material such as titanium oxide is printed on the transparent plate by screen printing. A transparent material is injection-molded with a mold that incorporates a pattern consisting of rough and smooth portions. At this time, in the transferred pattern, the rough surface portion becomes the scattering portion and the smooth portion becomes the non-scattering portion.
【０００３】[0003]
【発明が解決しようとする課題】従来の非散乱部・散乱
部より成る導光体パターン形成方法にはそれぞれ以下の
問題点があった。まず、スクリーン印刷にて散乱材を透
明板上に印刷する方法では、印刷時に所定パターンをあ
らかじめ形成しておいたスクリーンを透明板に機械的に
接触させることが必要であるため、スクリーンの伸び，
スクリーンの目詰まり等の不具合が発生しやすくパター
ン形成繰り返し精度が低いという欠点があった。導光体
パターンにて輝度均一性を達成しているため、パターン
形成繰り返し精度が低いと輝度均一性の安定性が得られ
にくくなる。また、射出成形する方法は、金型の作製が
必要のため高価になるという欠点があった。さらに、厚
さ２ミリ程度の薄型導光体射出成形にては、成形時に導
光体本体にそり等本体形状不具合が発生しやすく成形作
業自体困難であった。The conventional methods for forming a light guide pattern composed of a non-scattering portion and a scattering portion have the following problems. First, in the method of printing the scattering material on the transparent plate by screen printing, it is necessary to mechanically contact the screen on which the predetermined pattern is formed in advance with the transparent plate at the time of printing.
However, there is a drawback in that a problem such as clogging of the screen is likely to occur and the pattern forming repeatability is low. Since the brightness uniformity is achieved by the light guide pattern, it is difficult to obtain the stability of the brightness uniformity when the pattern forming repeatability is low. Further, the injection molding method has a drawback that it is expensive because it requires the production of a mold. Further, in the injection molding of a thin light guide body having a thickness of about 2 mm, a body shape defect such as a warp is likely to occur in the light guide body during molding, and the molding operation itself is difficult.
【０００４】[0004]
【課題を解決するための手段】本発明の非散乱部・散乱
部より成る導光体パターン形成方法は、少なくとも１面
が粗面化された透明材料導光体粗面上に硬化時透明とな
る光硬化性樹脂を塗布し、その上に所定パターンをあら
かじめ形成しておいたフォトマスクを光硬化性樹脂と空
間をあけて位置させ、露光・現像処理を行い、フォトマ
スク光透過部直下部にては光硬化性樹脂を硬化させ平滑
面が導光体最外層になるようにして、これを導光体非散
乱部とし、フォトマスク光遮蔽部直下部にては光硬化性
樹脂を除去し、導光体本体粗面を最外層としこれを導光
体散乱部とするものである。A method of forming a light guide pattern comprising a non-scattering portion and a scattering portion according to the present invention is a transparent material whose at least one surface is roughened. Immediately below the photomask light transmitting part, apply a photocurable resin that has a The photocurable resin is cured so that the smooth surface becomes the outermost layer of the light guide, and this is used as the light guide non-scattering part, and the photocurable resin is removed just below the photomask light shielding part. Then, the rough surface of the light guide body is used as the outermost layer, and this is used as the light guide scattering section.
【０００５】[0005]
【作用】本発明の非散乱部・散乱部より成る導光体パタ
ーン形成方法においては、所定パターンをあらかじめ形
成しておいたフォトマスクと導光体間に及びフォトマス
クと光硬化性樹脂間に機械的接触がないため、パターン
形成繰り返し精度が高くなる。また、金型が不要のため
安価となり、さらに、薄型導光体の導光体パターン形成
作業にても導光体本体に形状不具合が発生することはな
く、形成作業も容易である。In the method for forming a light guide pattern comprising non-scattering parts and scattering parts according to the present invention, between the photomask and the light guide and the photomask and the photocurable resin in which a predetermined pattern is formed in advance. Since there is no mechanical contact, the pattern forming repeatability becomes high. Further, since a mold is not required, the cost is low, and even in the work of forming the light guide pattern of the thin light guide, the shape of the light guide body is not defective, and the forming work is easy.
【０００６】[0006]
【実施例】図１は本発明の実施例を示す側断面図であ
り、非散乱部・散乱部より成る導光体パターン形成過程
を示している。まず図１（ａ）に示すように、少なくと
も１面が粗面化されたアクリル等透明材料導光体１の粗
面２上に硬化後透明となる光硬化性樹脂３を塗布する。
その上に、所定パターンをあらかじめ形成しておいたフ
ォトマスク４を光硬化性樹脂３と空間をあけて位置させ
る。ここで４ａがフォトマスク光透過部であり、４ｂが
フォトマスク光遮蔽部である。更に、その上から光硬化
性樹脂３硬化波長を持つ光５を照射し、露光する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a side sectional view showing an embodiment of the present invention, showing a process for forming a light guide pattern composed of a non-scattering portion and a scattering portion. First, as shown in FIG. 1A, a photocurable resin 3 that becomes transparent after curing is applied onto a rough surface 2 of a transparent material light guide 1 such as acrylic having at least one surface roughened.
A photomask 4 on which a predetermined pattern has been formed in advance is placed on top of it with a space between it and the photocurable resin 3. Here, 4a is a photomask light transmitting portion, and 4b is a photomask light shielding portion. Further, light 5 having a curing wavelength of the photo-curable resin 3 is irradiated from above and exposed.
【０００７】次に、導光体１を現像液にて洗浄する現像
工程を行うと図１（ｂ）に示すように、フォトマスク光
透過部４ａ直下部の光硬化性樹脂３ａは硬化し残存し、
この部分での導光体最外層は平滑面となる。また、フォ
トマスク光遮蔽部４ｂ直下部の光硬化性樹脂は除去され
導光体本体粗面２が表れ、この部分にてはこれが最外層
となる。平滑面は非散乱部となり、粗面部は散乱部とな
るため、上記処理にて、非散乱部・散乱部より成る導光
体パターンが形成される。Next, when a developing step of washing the light guide 1 with a developing solution is performed, as shown in FIG. 1B, the photocurable resin 3a immediately below the photomask light transmitting portion 4a is cured and remains. Then
The outermost layer of the light guide in this portion becomes a smooth surface. Further, the photocurable resin immediately below the photomask light-shielding portion 4b is removed to expose the rough surface 2 of the light guide body, which is the outermost layer. Since the smooth surface serves as the non-scattering portion and the rough surface serves as the scattering portion, the light guide pattern including the non-scattering portion and the scattering portion is formed by the above processing.
【０００８】[0008]
【発明の効果】以上のように本発明では、所定パターン
をあらかじめ形成しておいたフォトマスクと導光体間及
びフォトマスクと光硬化性樹脂間に機械的接触のない露
光・現像処理工程にて、非散乱部・散乱部より成る導光
体パターンを形成するためパターン形成繰り返し精度が
高くなる。すなわち、導光体パターンにて輝度均一性を
達成しているので、結局、本発明では輝度均一性が高ま
る。また、高価な金型が不要なため安価に形成でき、さ
らに、薄型導光体の導光体パターン形成にても、導光体
本体に形状不具合が発生することがなくなる。As described above, according to the present invention, the exposure / development processing step is performed without mechanical contact between the photomask and the light guide body in which a predetermined pattern is formed in advance and between the photomask and the photocurable resin. Since the light guide pattern including the non-scattering portion and the scattering portion is formed, the pattern forming repeatability is increased. That is, since the light guide pattern achieves the brightness uniformity, the brightness uniformity is eventually increased in the present invention. In addition, since an expensive mold is not required, it can be formed at a low cost, and even when forming a light guide pattern of a thin light guide, a shape defect does not occur in the light guide body.
【０００９】[0009]
【図１】 本発明の実施例を示す側断面図FIG. 1 is a side sectional view showing an embodiment of the present invention.
１ 導光体 ２ 粗面 ３ 光硬化性樹脂 ３ａ フォトマスク 光透過部直下部 光硬化性樹脂 ４ フォトマスク ４ａ フォトマスク 光透過部 ４ｂ フォトマスク 光遮蔽部 ５ 光 DESCRIPTION OF SYMBOLS 1 Light guide 2 Rough surface 3 Photocurable resin 3a Photomask Light-transmitting part immediately below Photocurable resin 4 Photomask 4a Photomask Light-transmitting part 4b Photomask Light-shielding part 5 Light
Claims (1)
導光体粗面上に硬化後透明となる光硬化性樹脂を塗布
し、その上に所定パターンのフォトマスクを光硬化性樹
脂を空間を設けて位置させ露光・現像処理を行い、フォ
トマスク光透過部直下部にては光硬化性樹脂を硬化さ
せ、平滑面が導光体最外層となるようにしてこれを導光
体非散乱部とし、フォトマスク光遮蔽部直下部にては光
硬化性樹脂を除去し、導光体本体粗面を最外層とし、こ
れを導光体散乱部とすることを特徴とする非散乱部・散
乱部より成る導光体パターン形成方法。1. A transparent material light guide body having at least one roughened surface is coated with a photocurable resin which becomes transparent after being cured, and a photomask having a predetermined pattern is provided thereon with a photocurable resin. A space is provided for exposure and development, and the photo-curable resin is cured directly below the photomask light-transmitting part so that the smooth surface is the outermost layer of the light guide and the light guide is not applied. A non-scattering part, which is a scattering part, in which the photocurable resin is removed just below the photomask light-shielding part, and the rough surface of the light guide body is used as the outermost layer, and this is used as the light guide scattering part. A method for forming a light guide pattern including a scattering section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17273895A JPH095527A (en) | 1995-06-14 | 1995-06-14 | Light transmission body pattern forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17273895A JPH095527A (en) | 1995-06-14 | 1995-06-14 | Light transmission body pattern forming method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH095527A true JPH095527A (en) | 1997-01-10 |
Family
ID=15947407
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17273895A Pending JPH095527A (en) | 1995-06-14 | 1995-06-14 | Light transmission body pattern forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH095527A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10224267A1 (en) * | 2002-05-31 | 2003-12-11 | Kostal Leopold Gmbh & Co Kg | Fiber optic light guide body (FOLGB) for decoupling has a surface for decoupling rays of light coupled into the FOLGB and a diffuser layer for even light density near this surface |
| KR100739258B1 (en) * | 2000-12-21 | 2007-07-12 | 주식회사 하이닉스반도체 | Pattern in semiconductor device and method for forming the same |
-
1995
- 1995-06-14 JP JP17273895A patent/JPH095527A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100739258B1 (en) * | 2000-12-21 | 2007-07-12 | 주식회사 하이닉스반도체 | Pattern in semiconductor device and method for forming the same |
| DE10224267A1 (en) * | 2002-05-31 | 2003-12-11 | Kostal Leopold Gmbh & Co Kg | Fiber optic light guide body (FOLGB) for decoupling has a surface for decoupling rays of light coupled into the FOLGB and a diffuser layer for even light density near this surface |
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