JPS6413544A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS6413544A
JPS6413544A JP62168658A JP16865887A JPS6413544A JP S6413544 A JPS6413544 A JP S6413544A JP 62168658 A JP62168658 A JP 62168658A JP 16865887 A JP16865887 A JP 16865887A JP S6413544 A JPS6413544 A JP S6413544A
Authority
JP
Japan
Prior art keywords
film
light
cel
resist
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62168658A
Other languages
Japanese (ja)
Inventor
Toshihiko Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62168658A priority Critical patent/JPS6413544A/en
Publication of JPS6413544A publication Critical patent/JPS6413544A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a high quality resist pattern having high resolution and free from ripples at the side by forming a film (CEL film) whose light transmissivity is increased on being irradiated with light for patternwise exposure on a resist film. CONSTITUTION:A CEL film (contrast enhancement layer) whose light transmissivity is increased on being irradiated with light for patternwise exposure is formed on a resist film formed on a substrate. The resist film is patternwise exposed through the CEL film and uniformly irradiated with light different from light for the patternwise exposure in wavelength and making the light transmissivity of the bleached part of the CEL film higher than that of the unbleached part. The CEL film is then removed and the resist film is developed. A resist pattern having high resolution, lateral smoothness and a steep cross-sectional shape can be formed and unevenness of quality is reduced.
JP62168658A 1987-07-08 1987-07-08 Pattern forming method Pending JPS6413544A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62168658A JPS6413544A (en) 1987-07-08 1987-07-08 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62168658A JPS6413544A (en) 1987-07-08 1987-07-08 Pattern forming method

Publications (1)

Publication Number Publication Date
JPS6413544A true JPS6413544A (en) 1989-01-18

Family

ID=15872103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62168658A Pending JPS6413544A (en) 1987-07-08 1987-07-08 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS6413544A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008021952A2 (en) * 2006-08-11 2008-02-21 Battelle Memorial Institute Patterning compositions, masks, and methods
US7626185B2 (en) 2006-08-11 2009-12-01 Battelle Memorial Institute Patterning compositions, masks, and methods

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008021952A2 (en) * 2006-08-11 2008-02-21 Battelle Memorial Institute Patterning compositions, masks, and methods
WO2008021952A3 (en) * 2006-08-11 2008-08-21 Battelle Memorial Institute Patterning compositions, masks, and methods
US7626185B2 (en) 2006-08-11 2009-12-01 Battelle Memorial Institute Patterning compositions, masks, and methods

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