JPH0929251A - Ultrapure water preparing apparatus - Google Patents
Ultrapure water preparing apparatusInfo
- Publication number
- JPH0929251A JPH0929251A JP18001895A JP18001895A JPH0929251A JP H0929251 A JPH0929251 A JP H0929251A JP 18001895 A JP18001895 A JP 18001895A JP 18001895 A JP18001895 A JP 18001895A JP H0929251 A JPH0929251 A JP H0929251A
- Authority
- JP
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- Prior art keywords
- water
- ultrapure water
- membrane
- dissolved oxygen
- ion exchange
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Treatment Of Water By Ion Exchange (AREA)
- Physical Water Treatments (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Degasification And Air Bubble Elimination (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は超純水製造装置に係
り、特に溶存酸素濃度がきわめて低い超純水を得る超純
水製造装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrapure water production system, and more particularly to an ultrapure water production system for obtaining ultrapure water having an extremely low dissolved oxygen concentration.
【０００２】[0002]
【従来の技術】従来、半導体洗浄用水として用いられて
いる超純水は、図２に示すように前処理システム１、一
次純水システム２及びサブシステム３から構成される超
純水製造装置で原水（工業用水、市水、井水等）を処理
することにより製造されている。図２において、各シス
テムの役割は次の通りである。2. Description of the Related Art Conventionally, ultrapure water used as semiconductor cleaning water is used in an ultrapure water production system comprising a pretreatment system 1, a primary pure water system 2 and a subsystem 3 as shown in FIG. It is manufactured by treating raw water (industrial water, city water, well water, etc.). In FIG. 2, the role of each system is as follows.
【０００３】凝集、加圧浮上（沈殿）、濾過装置等より
なる前処理システム１では、原水中の懸濁物質やコロイ
ド物質の除去を行う。逆浸透膜分離装置、脱気装置及び
イオン交換装置（混床式又は４床５塔式）を備える一次
純水システム２では原水中のイオンや有機成分の除去を
行う。なお、逆浸透膜分離装置では、塩類除去のほかに
イオン性、コロイド性のＴＯＣを除去する。イオン交換
装置では、塩類除去のほかにイオン交換樹脂によって吸
着又はイオン交換されるＴＯＣ成分を除去する。脱気装
置（窒素脱気又は真空脱気）では溶存酸素の除去を行
う。In the pretreatment system 1 comprising a flocculation, pressure floating (precipitation), a filtration device, etc., suspended substances and colloidal substances in raw water are removed. The primary pure water system 2 equipped with a reverse osmosis membrane separation device, a degassing device, and an ion exchange device (mixed bed type or four-bed, five-column type) removes ions and organic components in raw water. The reverse osmosis membrane separation device removes ionic and colloidal TOC in addition to removing salts. In addition to removing salts, the ion exchange device removes TOC components adsorbed or ion exchanged by the ion exchange resin. The deaerator (nitrogen deaeration or vacuum deaeration) removes dissolved oxygen.
【０００４】熱交換器、低圧紫外線酸化装置、ポリッシ
ャー（非再生式イオン交換樹脂装置）及び限外濾過膜分
離装置を備えるサブシステム４では、水の純度をより一
層高め超純水にする。なお、低圧紫外線酸化装置では、
低圧紫外線ランプより出される１８５ｎｍの紫外線によ
りＴＯＣを有機酸さらにはＣＯ2 まで分解する。分解さ
れた有機物及びＣＯ2 は後段のイオン交換樹脂で除去さ
れる。限外濾過膜分離装置では、微小粒子が除去されイ
オン交換樹脂の流出粒子も除去される。In the subsystem 4 including the heat exchanger, the low-pressure ultraviolet oxidation device, the polisher (non-regenerative ion exchange resin device) and the ultrafiltration membrane separation device, the purity of water is further increased to ultrapure water. In addition, in the low pressure ultraviolet oxidation device,
TOC is decomposed into organic acid and further CO 2 by the 185 nm ultraviolet ray emitted from the low-pressure ultraviolet lamp. The decomposed organic matter and CO 2 are removed by the ion exchange resin in the latter stage. In the ultrafiltration membrane separator, fine particles are removed and outflow particles of the ion exchange resin are also removed.
【０００５】[0005]
【発明が解決しようとする課題】超純水中の溶存酸素
は、シリコンウェハーの自然酸化膜の厚さをコントロー
ルする上で重要な因子であるが、上記従来の超純水製造
装置によれば、溶存酸素濃度が５〜１０ｐｐｂ程度とな
ってしまい、さらに低い溶存酸素値が要求されるケース
では要求水質を満足できなくなる。Dissolved oxygen in ultrapure water is an important factor in controlling the thickness of the natural oxide film on a silicon wafer. However, the dissolved oxygen concentration becomes about 5 to 10 ppb, and in the case where a lower dissolved oxygen value is required, the required water quality cannot be satisfied.
【０００６】本発明は、超純水中の溶存酸素を効率的に
除去できる超純水製造装置を提供することを目的とす
る。It is an object of the present invention to provide an ultrapure water production system capable of efficiently removing dissolved oxygen in ultrapure water.
【０００７】[0007]
【課題を解決するための手段】本発明の超純水製造装置
は、一次純水を導入し、少なくとも紫外線照射酸化装置
（紫外線酸化装置）とイオン交換純水装置とを有するサ
ブシステムに通水して超純水を得る超純水製造装置にお
いて、該イオン交換純水装置の後段に膜式脱気装置を配
置したことを特徴とする。In the ultrapure water production system of the present invention, primary pure water is introduced and water is passed through a subsystem having at least an ultraviolet irradiation oxidizer (ultraviolet oxidizer) and an ion exchange pure water device. In the ultrapure water production apparatus for obtaining ultrapure water by means of the above, a membrane type deaerator is arranged at a stage subsequent to the ion exchange pure water apparatus.
【０００８】本発明者らは、図２に示されるような超純
水製造装置における溶存酸素濃度の推移を調べた結果、
サブシステム内の低圧紫外線酸化装置出口で一旦溶存酸
素濃度は低下するが、後段のポリッシャー出口で再度低
圧紫外線酸化装置入口の溶存酸素濃度まで（場合によっ
てはそれ以上に）上昇してしまい、結果的に低圧紫外線
酸化装置の溶存酸素除去効果が表れないことを確認し
た。即ち、一次純水システムの流出水の溶存酸素濃度は
約５〜１０ｐｐｂであり、この水が低圧紫外線酸化装置
で処理されることにより、溶存酸素濃度は０〜５ｐｐｂ
に低減するが、ポリッシャー出口水の溶存酸素濃度は再
び５〜１０ｐｐｂ程度に上昇しており、結果として得ら
れる超純水の溶存酸素濃度は５〜１０ｐｐｂとなる。The present inventors investigated the transition of the dissolved oxygen concentration in the ultrapure water production system as shown in FIG.
The dissolved oxygen concentration at the outlet of the low-pressure UV oxidizer in the subsystem temporarily decreases, but at the polisher outlet of the latter stage, it rises to the dissolved oxygen concentration at the inlet of the low-pressure UV oxidizer again (in some cases, more), resulting in It was confirmed that the dissolved oxygen removal effect of the low-pressure UV oxidizer did not appear. That is, the dissolved oxygen concentration of the outflow water of the primary pure water system is about 5 to 10 ppb, and the dissolved oxygen concentration is 0 to 5 ppb by treating this water with the low-pressure ultraviolet oxidation device.
However, the dissolved oxygen concentration of the outlet water of the polisher has risen to about 5 to 10 ppb again, and the dissolved oxygen concentration of the resulting ultrapure water is 5 to 10 ppb.
【０００９】本発明者らは、この現象について鋭意検討
した結果、下記（１）式のような反応が低圧紫外線酸化
装置からポリッシャーの間で生じていることを見出し
た。As a result of diligent studies on this phenomenon, the present inventors have found that the reaction represented by the following formula (1) occurs between the low pressure ultraviolet oxidation device and the polisher.
【００１０】[0010]
【化１】 Embedded image
【００１１】即ち、低圧紫外線酸化装置入口では水（Ｈ
2 Ｏ）とＴＯＣが存在するが、一次純水中のＴＯＣが極
めて低い場合、紫外線酸化装置における紫外線照射量が
設計値よりも過剰となる。（例えば、紫外線照射量をＴ
ＯＣ１０ｐｐｂに対応した照射量とした紫外線酸化装置
にＴＯＣ５ｐｐｂの一次純水が流入する場合、紫外線照
射量がＴＯＣ５ｐｐｂ分だけ過剰となる。）そして、Ｈ
2 Ｏが、この過剰な紫外線の照射によりＯＨラジカルを
介してＨ2 Ｏ2 （過酸化水素）となり、溶存酸素はＴＯ
Ｃ分解に使用されるために見掛け上溶存酸素濃度が低下
する。しかし、生成したＨ2 Ｏ2 はポリッシャー（特に
ポリッシャー内のアニオン交換樹脂）の接触触媒作用で
分解され、再度Ｏ2 が発生するため、ポリッシャー出口
水の溶存酸素濃度が上昇する。That is, water (H
2 O) and TOC exist, but when the TOC in the primary pure water is extremely low, the ultraviolet irradiation amount in the ultraviolet oxidation device becomes excessively higher than the designed value. (For example, the ultraviolet irradiation dose is T
When the primary pure water of TOC5ppb flows into the ultraviolet oxidizer having the irradiation amount corresponding to OC10ppb, the ultraviolet irradiation amount becomes excessive by the amount of TOC5ppb. ) And H
2 O becomes H 2 O 2 (hydrogen peroxide) through the OH radical by the irradiation of this excess ultraviolet light, and dissolved oxygen becomes TO.
Since it is used for C decomposition, the dissolved oxygen concentration apparently decreases. However, the generated H 2 O 2 is decomposed by the catalytic action of the polisher (in particular, the anion exchange resin in the polisher), and O 2 is again generated, so that the dissolved oxygen concentration of the outlet water of the polisher rises.
【００１２】本発明は、紫外線酸化装置からイオン交換
装置を通ることにより発生した溶存酸素を膜式脱気装置
で除去することにより、得られる超純水中の溶存酸素値
を低下させるようにしたものである。The present invention reduces the dissolved oxygen value in the ultrapure water obtained by removing the dissolved oxygen generated by passing through the ion exchange device from the ultraviolet oxidation device by the membrane type deaeration device. It is a thing.
【００１３】[0013]
【発明の実施の形態】以下、図面を参照して本発明を詳
細に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.
【００１４】図１は本発明の超純水製造装置の一実施例
を示す系統図である。FIG. 1 is a system diagram showing an embodiment of the ultrapure water production system of the present invention.
【００１５】各種前処理工程より得られた一次純水（通
常の場合、ＴＯＣ濃度２ｐｐｂ以下の純水）をサブタン
ク１１、ポンプ１２、熱交換器１３、低圧紫外線酸化装
置１４、イオン交換装置（本実施例ではアニオン交換樹
脂とカチオン交換樹脂とをイオン負荷に応じて混合した
デミナー）１５、膜式脱気装置１６及び限外濾過膜分離
装置１７に順次に通水し、得られた極低溶存酸素の超純
水をユースポイント１８に送る。The primary pure water (generally, pure water having a TOC concentration of 2 ppb or less) obtained from various pretreatment steps is used as a subtank 11, a pump 12, a heat exchanger 13, a low-pressure ultraviolet oxidizer 14, an ion exchanger (the main one). In the example, water was sequentially passed through a deminer (a mixture of an anion exchange resin and a cation exchange resin depending on the ion load) 15, a membrane degasser 16 and an ultrafiltration membrane separator 17 to obtain an extremely low dissolved amount. The oxygen ultrapure water is sent to the use point 18.
【００１６】膜式脱気装置としては、脱気膜の一方の側
に水を流し、他方の側を真空ポンプで排気し、溶存酸素
を膜を透過させて真空側に移行させて除去するようにし
たものが用いられる。なお、この膜の真空側には若干の
水分が脱気膜を透過して出てくるので、この真空側に窒
素等のガスを流し、水分を除去して膜性能の低下を防止
するのが好ましい。Ｎ2 流量は一定でも良く、変動させ
ても良い。As the membrane type deaerator, water is made to flow on one side of the deaerator and the other side is evacuated by a vacuum pump so that dissolved oxygen permeates the membrane and is transferred to the vacuum side for removal. The one used is used. It should be noted that some moisture comes out through the degassing membrane on the vacuum side of this membrane, so that gas such as nitrogen is caused to flow on this vacuum side to remove moisture and prevent deterioration of membrane performance. preferable. The N 2 flow rate may be constant or may be varied.
【００１７】脱気膜は、酸素、窒素、蒸気等のガスは通
過するが水は透過しない膜であれば良く、例えば、シリ
コンゴム系、ポリテトラフルオロエチレン系、ポリオレ
フィン系、ポリウレタン系等がある。この脱気膜として
は市販の各種のものを用いることができる。The degassing film may be a film that allows gases such as oxygen, nitrogen and steam to pass through but does not allow water to pass through, and examples thereof include silicone rubber type, polytetrafluoroethylene type, polyolefin type and polyurethane type. . As the degassing membrane, various commercially available ones can be used.
【００１８】この膜式脱気装置の真空度は５５〜７０Ｔ
ｏｒｒ、Ｎ2 等のガスの真空側流量は水流量の５〜２５
％とするのが好ましい。なお、この運転条件は、膜性能
により任意に設定できるが、通常上記のような範囲が好
ましい。真空度が過度に低いと脱気効率が低下し、逆に
過度に大きいと膜を通して水も透過側に出てきて効率が
悪くなる。Ｎ2 流量は過度に少ないと水分除去が十分で
なく脱気効率が低下し、大きすぎると真空度が上がらず
脱気効率が低下する。The degree of vacuum of this membrane type deaerator is 55 to 70T.
The vacuum side flow rate of gas such as orr and N 2 is 5 to 25 of the water flow rate.
% Is preferable. The operating conditions can be set arbitrarily depending on the membrane performance, but usually the above range is preferable. If the degree of vacuum is too low, the degassing efficiency will decrease. On the other hand, if it is too large, water will also come out to the permeate side through the membrane and the efficiency will deteriorate. If the N 2 flow rate is excessively low, moisture removal is insufficient and the degassing efficiency is lowered, and if it is too high, the degree of vacuum is not raised and the degassing efficiency is lowered.
【００１９】なお、図１の構成は本発明の一例であり、
本発明はサブシステムにおいて紫外線酸化装置、イオン
交換装置及び膜式脱気装置を備えている限り各種の機器
を組み合わせることができる。例えば、膜脱気の後に限
外濾過（ＵＦ）装置や逆浸透膜装置を設置しても良い。
また、原水をｐＨ４．５以下の酸性下、かつ、酸化剤存
在下で加熱分解処理して原水中の尿素及び他のＴＯＣ成
分を分解した後、脱イオン処理する装置を組み込むこと
もできる。紫外線酸化装置、イオン交換装置、膜式脱気
装置は多段に設置されても良い。なお、図１のように、
膜式脱気装置の後段にＵＦ装置を設置することにより、
脱気膜で発生した微粒子を除去し、ユースポイントへの
持ち込みを阻止できる。The configuration shown in FIG. 1 is an example of the present invention.
In the present invention, various devices can be combined as long as the subsystem includes an ultraviolet oxidation device, an ion exchange device, and a membrane degassing device. For example, an ultrafiltration (UF) device or a reverse osmosis membrane device may be installed after the membrane degassing.
It is also possible to incorporate a device for deionizing the raw water by heating and decomposing the raw water under acidic conditions of pH 4.5 or less and in the presence of an oxidizing agent to decompose urea and other TOC components in the raw water. The ultraviolet oxidation device, the ion exchange device, and the membrane type degassing device may be installed in multiple stages. In addition, as shown in FIG.
By installing a UF device in the latter stage of the membrane type deaerator,
The particles generated in the degassing film can be removed, and it can be prevented from being brought to the point of use.
【００２０】本発明においては、紫外線酸化装置で紫外
線照射された水をイオン交換樹脂に接触させた後、膜脱
気処理することが重要であり、膜式脱気装置を紫外線酸
化装置とイオン交換樹脂との間に配置しても、得られる
超純水中の溶存酸素は低減しない。In the present invention, it is important to carry out membrane degassing treatment after contacting the water irradiated with ultraviolet rays with the ultraviolet oxidizer with the ion exchange resin. The membrane degasser is ion exchanged with the ultraviolet oxidizer. Dissolving oxygen in the obtained ultrapure water does not decrease even if it is arranged between the resin and the resin.
【００２１】[0021]
【実施例】以下に比較例及び実施例を挙げて本発明をよ
り具体的に説明する。EXAMPLES The present invention will be described more specifically with reference to Comparative Examples and Examples below.
【００２２】比較例１ 原水（厚木市水：ＴＯＣ７００〜８００ｐｐｂ、溶存酸
素８０００ｐｐｂ、電導度２４０μＳ／ｃｍ）を図２の
装置によって処理して超純水を製造した。Comparative Example 1 Raw water (Atsugi City water: TOC 700 to 800 ppb, dissolved oxygen 8000 ppb, conductivity 240 μS / cm) was treated by the apparatus of FIG. 2 to produce ultrapure water.
【００２３】実施例１〜３ サブシステムを、膜式脱気装置を組み込んだ図１のもの
とし、膜式脱気装置の運転条件及び通水量を表１の通り
としたほかは比較例１と同様にして超純水を製造した。Examples 1 to 3 are the same as those of Comparative Example 1 except that the subsystems shown in FIG. 1 in which the membrane deaerator is incorporated are used, and the operating conditions and water flow of the membrane deaerator are as shown in Table 1. Ultrapure water was manufactured in the same manner.
【００２４】この比較例及び実施例における各装置の仕
様は下記の通りである。The specifications of each device in the comparative example and the example are as follows.
【００２５】低圧紫外線照射酸化装置：８０Ｗ×４本
（０．３２ｋＷ） （発生波長：１８５ｎｍ及び２５４ｎｍ） ポリッシャー（デミナー）：カチオン交換樹脂とアニオ
ン交換樹脂とを混合充填した混床式イオン交換装置 ＳＶ＝７０〜８０ｈｒ-1 限外濾過膜分離装置：ＫＵ−１０１０（栗田工業株式会
社製） 脱気膜： Hoechst Celanese 製Ｌｉｑｕｉ−Ｃｅｌ １
本 ハウジング：５ＰＣＨ−１２０ カートリッジ：５ＰＣＨ−１１８，ＳＮ：１２２１Low-pressure UV irradiation oxidizer: 80 W x 4 (0.32 kW) (Generation wavelength: 185 nm and 254 nm) Polisher (Dinner): Mixed bed type ion exchanger SV mixed and filled with cation exchange resin and anion exchange resin = 70-80 hr -1 ultrafiltration membrane separator: KU-1010 (manufactured by Kurita Water Industries Ltd.) Degassing membrane: Liquid-Cel 1 manufactured by Hoechst Celanese
This housing: 5PCH-120 Cartridge: 5PCH-118, SN: 1221
【００２６】[0026]
【表１】 [Table 1]
【００２７】得られた超純水の電導度と低圧紫外線酸化
装置以降の各装置の流出水の溶存酸素は表２に示す通り
であった。The conductivity of the obtained ultrapure water and the dissolved oxygen in the outflow water of each device after the low pressure ultraviolet oxidation device are shown in Table 2.
【００２８】[0028]
【表２】 [Table 2]
【００２９】表２より、本発明例によると溶存酸素濃度
が極めて低い超純水が得られることが明らかである。From Table 2, it is clear that according to the examples of the present invention, ultrapure water having an extremely low dissolved oxygen concentration can be obtained.
【００３０】[0030]
【発明の効果】以上詳述した通り、本発明の超純水製造
装置によると、溶存酸素濃度が著しく低い超純水を製造
できる。As described in detail above, according to the ultrapure water production system of the present invention, ultrapure water having a remarkably low dissolved oxygen concentration can be produced.
【図１】本発明の超純水製造装置の一実施例を示す系統
図である。FIG. 1 is a system diagram showing an embodiment of an ultrapure water production system of the present invention.
【図２】従来の超純水製造装置を示す系統図である。FIG. 2 is a system diagram showing a conventional ultrapure water production system.
【符号の説明】 １ 前処理システム ２ 一次純水システム ３ サブシステム １１ サブタンク １２ ポンプ １３ 熱交換器 １４ 低圧紫外線酸化装置 １５ イオン交換装置（デミナー） １６ 膜式脱気装置 １７ 限外濾過膜分離装置[Explanation of Codes] 1 Pretreatment System 2 Primary Pure Water System 3 Subsystem 11 Subtank 12 Pump 13 Heat Exchanger 14 Low Pressure UV Oxidation Device 15 Ion Exchanger (Deminer) 16 Membrane Degassing Device 17 Ultrafiltration Membrane Separation Device
Claims (1)
射酸化装置とイオン交換純水装置とを有するサブシステ
ムに通水して超純水を得る超純水製造装置において、 該イオン交換純水装置の後段に膜式脱気装置を配置した
ことを特徴とする超純水製造装置。1. An ultrapure water producing apparatus for obtaining ultrapure water by introducing primary pure water and passing it through a subsystem having at least an ultraviolet irradiation oxidizer and an ion exchange pure water apparatus. An ultrapure water production system characterized in that a membrane-type deaerator is arranged in the latter stage of the system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18001895A JPH0929251A (en) | 1995-07-17 | 1995-07-17 | Ultrapure water preparing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18001895A JPH0929251A (en) | 1995-07-17 | 1995-07-17 | Ultrapure water preparing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0929251A true JPH0929251A (en) | 1997-02-04 |
Family
ID=16076028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18001895A Pending JPH0929251A (en) | 1995-07-17 | 1995-07-17 | Ultrapure water preparing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0929251A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004024639A1 (en) * | 2002-09-12 | 2004-03-25 | Chemitreat Pte Ltd | Method of removing organic impurities from water |
| US6733661B2 (en) | 2001-03-26 | 2004-05-11 | Renesas Technology Corp. | Ultrapure water producing apparatus |
| KR100796561B1 (en) * | 2006-08-16 | 2008-01-23 | 지은상 | Deionized water system with membrabe separation technology for power plant |
| JP2008119658A (en) * | 2006-11-15 | 2008-05-29 | Kurita Water Ind Ltd | Ultraviolet oxidation apparatus and organic matter removal apparatus |
| JP2012510365A (en) * | 2008-12-01 | 2012-05-10 | テクニシェ・ユニヴェルシテイト・デルフト | Process for producing ultrapure water using membranes |
| WO2019155672A1 (en) * | 2018-02-07 | 2019-08-15 | 栗田工業株式会社 | Fine particle management method for ultrapure water production system |
| JP2020199436A (en) * | 2019-06-06 | 2020-12-17 | 栗田工業株式会社 | Ultrapure water production device, and ultrapure water production method |
| JP2022029769A (en) * | 2020-08-05 | 2022-02-18 | 水ｉｎｇ株式会社 | Pure water production apparatus and pure water production method |
-
1995
- 1995-07-17 JP JP18001895A patent/JPH0929251A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6733661B2 (en) | 2001-03-26 | 2004-05-11 | Renesas Technology Corp. | Ultrapure water producing apparatus |
| WO2004024639A1 (en) * | 2002-09-12 | 2004-03-25 | Chemitreat Pte Ltd | Method of removing organic impurities from water |
| GB2408737A (en) * | 2002-09-12 | 2005-06-08 | Chemitreat Pte Ltd | Method of removing organic impurities from water |
| JP2005538827A (en) * | 2002-09-12 | 2005-12-22 | ケミトリート ピーティーイー リミテッド | Method for removing organic impurities from water |
| GB2408737B (en) * | 2002-09-12 | 2006-06-07 | Chemitreat Pte Ltd | Method of removing organic impurities from water |
| KR100796561B1 (en) * | 2006-08-16 | 2008-01-23 | 지은상 | Deionized water system with membrabe separation technology for power plant |
| JP2008119658A (en) * | 2006-11-15 | 2008-05-29 | Kurita Water Ind Ltd | Ultraviolet oxidation apparatus and organic matter removal apparatus |
| JP2012510365A (en) * | 2008-12-01 | 2012-05-10 | テクニシェ・ユニヴェルシテイト・デルフト | Process for producing ultrapure water using membranes |
| WO2019155672A1 (en) * | 2018-02-07 | 2019-08-15 | 栗田工業株式会社 | Fine particle management method for ultrapure water production system |
| JP2019136628A (en) * | 2018-02-07 | 2019-08-22 | 栗田工業株式会社 | Particle management method for ultrapure water production system |
| JP2020199436A (en) * | 2019-06-06 | 2020-12-17 | 栗田工業株式会社 | Ultrapure water production device, and ultrapure water production method |
| JP2022029769A (en) * | 2020-08-05 | 2022-02-18 | 水ｉｎｇ株式会社 | Pure water production apparatus and pure water production method |
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