JPH09156953A - Non-alkali glass base plate - Google Patents
Non-alkali glass base plateInfo
- Publication number
- JPH09156953A JPH09156953A JP34634095A JP34634095A JPH09156953A JP H09156953 A JPH09156953 A JP H09156953A JP 34634095 A JP34634095 A JP 34634095A JP 34634095 A JP34634095 A JP 34634095A JP H09156953 A JPH09156953 A JP H09156953A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- base plate
- alkali
- glass substrate
- resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、液晶ディスプレイ、Ｅ
Ｌディスプレイ等のディスプレイ、フィルター、センサ
ー等の基板として用いられる無アルカリガラス基板に関
するものである。The present invention relates to a liquid crystal display, E
The present invention relates to a non-alkali glass substrate used as a substrate for displays such as L displays, filters, and sensors.
【０００２】[0002]
【従来の技術】従来より、液晶ディスプレイ等のフラッ
トパネルディスプレイ、フィルター、センサー等の基板
として、ガラス基板が広く使用されている。2. Description of the Related Art Conventionally, glass substrates have been widely used as substrates for flat panel displays such as liquid crystal displays, filters and sensors.
【０００３】この種のガラス基板の表面には、透明導電
膜、絶縁膜、半導体膜、金属膜等が成膜され、しかもフ
ォトリソグラフィ−エッチング（フォトエッチング）に
よって種々の回路やパターンが形成される。これらの成
膜、フォトエッチング工程において、ガラス基板には、
種々の熱処理や薬品処理が施される。A transparent conductive film, an insulating film, a semiconductor film, a metal film, etc. are formed on the surface of a glass substrate of this kind, and various circuits and patterns are formed by photolithography-etching (photoetching). . In these film formation and photo etching steps, the glass substrate is
Various heat treatments and chemical treatments are performed.
【０００４】例えば薄膜トランジスタ（ＴＦＴ）型アク
ティブマトリックス液晶ディスプレイの場合、ガラス基
板上に絶縁膜や透明導電膜が成膜され、さらにアモルフ
ァスシリコンや多結晶シリコンのＴＦＴが、フォトエッ
チングによって多数形成される。このような工程におい
て、ガラス基板は、数百度の熱処理を受けると共に、硫
酸、塩酸、アルカリ溶液、フッ酸等の種々の薬品による
処理を受ける。In the case of a thin film transistor (TFT) type active matrix liquid crystal display, for example, an insulating film and a transparent conductive film are formed on a glass substrate, and a large number of amorphous silicon and polycrystalline silicon TFTs are formed by photoetching. In such a step, the glass substrate is subjected to heat treatment at several hundreds of degrees, and is also treated with various chemicals such as sulfuric acid, hydrochloric acid, an alkaline solution and hydrofluoric acid.
【０００５】従ってＴＦＴ型アクティブマトリックス液
晶ディスプレイに使用されるガラス基板には、以下のよ
うな特性が要求される。Therefore, the glass substrate used for the TFT type active matrix liquid crystal display is required to have the following characteristics.
【０００６】（１）ガラス中にアルカリ金属酸化物が含
有されていると、熱処理中にアルカリイオンが成膜され
た半導体物質中に拡散し、膜特性の劣化を招くため、実
質的にアルカリ金属酸化物を含有しないこと。(1) If the glass contains an alkali metal oxide, alkali ions are diffused during the heat treatment into the semiconductor material on which the film is formed, and the film characteristics are deteriorated. Do not contain oxides.
【０００７】（２）フォトエッチング工程において使用
される種々の酸、アルカリ等の薬品によって劣化しない
ような耐薬品性を有すること。(2) It has chemical resistance so that it is not deteriorated by various chemicals such as acids and alkalis used in the photoetching process.
【０００８】（３）成膜、アニール等の工程における熱
処理によって、熱収縮しないこと。そのため高い歪点を
有すること。例えば多結晶シリコンＴＦＴ−ＬＣＤの場
合、その工程温度が約６００℃以上であるため、このよ
うな用途のガラス基板には、歪点が６５０℃以上である
ことが要求される。(3) The film should not shrink due to heat treatments such as film formation and annealing. Therefore, it must have a high strain point. For example, in the case of a polycrystalline silicon TFT-LCD, the process temperature is about 600 ° C. or higher, and thus the glass substrate for such an application is required to have a strain point of 650 ° C. or higher.
【０００９】また溶融性、成形性を考慮して、この種の
ガラス基板には、以下のような特性も要求される。In consideration of meltability and moldability, the glass substrate of this type is also required to have the following characteristics.
【００１０】（４）ガラス中に基板として好ましくない
溶融欠陥が発生しないよう、溶融性に優れていること。(4) It has excellent meltability so that melting defects that are not desirable as a substrate in the glass do not occur.
【００１１】（５）ガラス中に溶融、成形中に発生する
異物が存在しないように、耐失透性に優れていること。(5) The glass is excellent in devitrification resistance so that foreign matter generated during melting and molding does not exist in the glass.
【００１２】また近年、ＴＦＴ型アクティブマトリック
ス液晶ディスプレイ等の電子機器は、パーソナルな分野
への利用が進められており、機器の軽量化が要求されて
いる。これに伴ってガラス基板にも軽量化が要求されて
おり、薄板化が進められている。しかしながらこの種の
電子機器は、大型化も進められており、ガラス基板の強
度を考慮すると、薄板化については自ずと限界がある。
そこでガラス基板の軽量化を図る目的で、ガラスの密度
を低くすることが望まれており、具体的には、２．６ｇ
／ｃｍ3 以下にすることが要求されている。Further, in recent years, electronic devices such as TFT type active matrix liquid crystal displays have been increasingly used in personal fields, and it is required to reduce the weight of the devices. Along with this, the glass substrate is also required to be lightweight, and thinning is being promoted. However, this type of electronic device is also being made larger, and considering the strength of the glass substrate, there is naturally a limit to thinning.
Therefore, in order to reduce the weight of the glass substrate, it is desired to reduce the density of the glass, specifically, 2.6 g.
/ Cm 3 or less is required.
【００１３】[0013]
【発明が解決しようとする課題】従来よりＴＦＴ型アク
ティブマトリックス液晶ディスプレイ基板に用いられて
いる無アルカリガラスとしては、石英ガラス、バリウム
硼珪酸ガラス及びアルミノ珪酸塩ガラスが存在するが、
いずれも一長一短がある。As the alkali-free glass conventionally used for the TFT type active matrix liquid crystal display substrate, there are quartz glass, barium borosilicate glass and aluminosilicate glass.
Both have advantages and disadvantages.
【００１４】すなわち石英ガラスは、耐薬品性、耐熱性
に優れ、低密度であるが、材料コストが高いという難点
がある。That is, quartz glass is excellent in chemical resistance and heat resistance and has a low density, but has a drawback that the material cost is high.
【００１５】またバリウム硼珪酸ガラスとしては、市販
品としてコーニング社製＃７０５９が存在するが、この
ガラスは耐酸性に劣るため、フォトエッチング工程にお
いてガラス基板の表面に変質や白濁、荒れが生じやす
く、しかも基板からの溶出成分によって薬液を汚染しや
すい。さらにこのガラスは、歪点が低いため、熱収縮や
熱変形を起こしやすく、耐熱性に劣っている。またその
密度も、２．７６ｇ／ｃｍ3 と高い。As the barium borosilicate glass, there is a commercially available product # 7059 manufactured by Corning Co., Ltd. However, since this glass is inferior in acid resistance, alteration, white turbidity and roughness are likely to occur on the surface of the glass substrate in the photoetching process. Moreover, the chemical solution is easily contaminated by the components eluted from the substrate. Furthermore, since this glass has a low strain point, it is likely to undergo heat shrinkage or thermal deformation, and is inferior in heat resistance. The density is also high at 2.76 g / cm 3 .
【００１６】アルミノ珪酸塩ガラスは、耐熱性に優れて
いるが、現在市場にあるガラス基板の多くが、溶融性が
悪く、大量生産に不向きである。またこれらのガラス基
板は、密度が２．７ｇ／ｃｍ3 以上と高かったり、耐薬
品性に劣るものが多く、全ての要求特性を満足するもの
は未だ存在しないというのが実情である。Aluminosilicate glass is excellent in heat resistance, but most of the glass substrates currently on the market have poor melting properties and are not suitable for mass production. In addition, many of these glass substrates have high densities of 2.7 g / cm 3 or more and are inferior in chemical resistance, and in reality, none of them satisfy all the required characteristics.
【００１７】本発明の目的は、上記した要求特性項目
（１）〜（５）の全てを満足し、しかも密度が２．６ｇ
／ｃｍ3 以下の無アルカリガラス基板を提供することで
ある。The object of the present invention is to satisfy all of the above-mentioned required characteristic items (1) to (5) and to have a density of 2.6 g.
The purpose is to provide a non-alkali glass substrate having a density of not more than / cm 3 .
【００１８】[0018]
【課題を解決するための手段】本発明の無アルカリガラ
ス基板は、重量百分率で、ＳｉＯ2 ５５〜６５％、Ａ
ｌ2 Ｏ3 １０〜２０％、Ｂ2 Ｏ3 ４〜１２％、Ｍｇ
Ｏ ３〜６．４％、ＣａＯ ４．６〜１０％、ＳｒＯ
０〜５％、ＢａＯ ０．５〜９．５％、ＺｎＯ０〜５
％、ＺｒＯ2 ０〜１．５％、ＴｉＯ2 ０〜５％の組
成を有し、実質的にアルカリ金属酸化物、ＰｂＯを含有
しないことを特徴とする。The alkali-free glass substrate of the present invention has a weight percentage of SiO 2 55-65%, A 2.
l 2 O 3 10~20%, B 2 O 3 4~12%, Mg
O 3 to 6.4%, CaO 4.6 to 10%, SrO
0-5%, BaO 0.5-9.5%, ZnO0-5
%, ZrO 2 0 to 1.5%, TiO 2 0 to 5%, and substantially no alkali metal oxide or PbO.
【００１９】また本発明の無アルカリガラス基板は、モ
ル比で、Ｂ2 Ｏ3 ＜（ＭｇＯ＋ＣａＯ）の条件を満足す
ることを特徴とする。Further, the alkali-free glass substrate of the present invention is characterized by satisfying the condition of B 2 O 3 <(MgO + CaO) in molar ratio.
【００２０】[0020]
【作用】以下、本発明の無アルカリガラス基板の構成成
分を上記のように限定した理由を説明する。The reason why the components of the alkali-free glass substrate of the present invention are limited as described above will be described below.
【００２１】ＳｉＯ2 が、５５％より少ないと、耐薬品
性、特に耐酸性が悪くなると共に、歪点が低くなり、耐
熱性が悪化し、しかも低密度化が図り難くなる。また６
５％より多いと、高温粘度が大きくなり、溶融性が悪化
すると共に、ガラス中にクリストバライトの失透異物が
析出しやすくなる。If the content of SiO 2 is less than 55%, the chemical resistance, particularly the acid resistance, deteriorates, the strain point decreases, the heat resistance deteriorates, and it becomes difficult to reduce the density. Also 6
If it is more than 5%, the viscosity at high temperature becomes large, the meltability deteriorates, and devitrified foreign matter of cristobalite tends to precipitate in the glass.
【００２２】Ａｌ2 Ｏ3 が、１０％より少ないと、失透
温度が上昇し、ガラス中にクリストバライトの失透異物
が析出しやすくなると共に、ガラスの歪点が低下し、耐
熱性が悪くなる。また２０％より多いと、ガラスの高温
粘度が高くなり、溶融性が悪化する。When Al 2 O 3 is less than 10%, the devitrification temperature rises, devitrification foreign substances of cristobalite tend to precipitate in the glass, the strain point of the glass lowers, and the heat resistance deteriorates. . On the other hand, if it is more than 20%, the high temperature viscosity of the glass tends to be high and the meltability tends to deteriorate.
【００２３】Ｂ2 Ｏ3 は、融剤として働き、粘性を下
げ、溶融性を改善すると共に密度を低下させる作用を有
する成分であり、４〜１２％含有する。４％より少ない
と、融剤としての働きが不十分となり、１２％より多い
と、ガラスの歪点が低下し、耐熱性が悪くなると共に耐
酸性も悪くなる。耐酸性を最も良い状態に保つために
は、Ｂ2 Ｏ3 量を４．６〜９％に規制することが望まし
い。B 2 O 3 is a component which acts as a flux, lowers viscosity, improves meltability and lowers density, and is contained in an amount of 4 to 12%. When it is less than 4%, the function as a flux becomes insufficient, and when it is more than 12%, the strain point of the glass is lowered, heat resistance is deteriorated and acid resistance is also deteriorated. In order to keep the acid resistance in the best state, it is desirable to regulate the amount of B 2 O 3 to 4.6-9%.
【００２４】ＭｇＯは、歪点を下げずに高温粘性を下
げ、ガラスの溶融性を改善する作用を有しており、二価
のアルカリ土類酸化物の中で、最も密度を下げる効果が
大きい成分であるが、３％より少ないと、このような効
果が得られ難くなり、また６．４％より多いと、失透温
度が上昇し、エンスタタイト（ＭｇＯ・ＳｉＯ2 ）の結
晶異物がガラス中に析出しやすくなる。MgO has the effect of lowering the high temperature viscosity without lowering the strain point and improving the meltability of glass, and has the greatest effect of lowering the density of the divalent alkaline earth oxides. If it is less than 3%, it is difficult to obtain such an effect. If it is more than 6.4%, the devitrification temperature rises, and the crystal foreign matter of enstatite (MgO.SiO 2 ) becomes glass. It tends to precipitate inside.
【００２５】ＣａＯも、ＭｇＯと同様に歪点を下げずに
高温粘性を下げ、ガラスの溶融性を改善する効果を有す
る成分である。またＣａＯは、ＭｇＯと異なり、ガラス
の耐失透性を高める効果をも有しており、その含有量
は、４．６〜１０％、好ましくは４．６〜８％である。
４．６％より少ないと、上記のような効果が得られ難く
なり、１０％より多く含有すると、ガラスの耐酸性が悪
化すると共に、ガラスの密度が大きくなるため好ましく
ない。Like MgO, CaO is also a component which has the effect of lowering the high temperature viscosity without lowering the strain point and improving the meltability of glass. Unlike MgO, CaO also has the effect of increasing the devitrification resistance of glass, and its content is 4.6 to 10%, preferably 4.6 to 8%.
If it is less than 4.6%, it becomes difficult to obtain the above effects, and if it is more than 10%, the acid resistance of the glass deteriorates and the density of the glass increases, which is not preferable.
【００２６】ＭｇＯとＣａＯは、ガラスの溶融性を向上
させる上で、必要欠くべからざる成分であるが、その一
方を極端に多く含有させることは望ましくない。すなわ
ちＭｇＯの方が多すぎると、失透性が悪化し、ＣａＯが
多すぎると、密度が低下すると共に、耐酸性が悪化する
ため、両成分が適度の割合で共存するように規制するこ
とが望ましい。MgO and CaO are necessary and indispensable components for improving the melting property of glass, but it is not desirable to contain one of them in an extremely large amount. That is, when MgO is too much, devitrification deteriorates, and when CaO is too much, the density decreases and the acid resistance deteriorates. Therefore, it is necessary to control both components to coexist in a proper ratio. desirable.
【００２７】さらに本発明においては、モル比で、Ｍｇ
ＯとＣａＯの合量を、Ｂ2 Ｏ3 量よりも多くすると、ガ
ラスの歪点の低下を防ぎ、また耐酸性を良好に保ち、し
かもガラスの溶融性を飛躍的に向上させる効果が大とな
るためより好ましい。Furthermore, in the present invention, the molar ratio of Mg is
When the total amount of O and CaO is larger than the B 2 O 3 amount, the effect of preventing the strain point of the glass from being lowered, maintaining good acid resistance, and dramatically improving the meltability of the glass is significant. Is more preferable.
【００２８】ＳｒＯは、ガラスの耐薬品性と耐失透性を
向上させる成分であるが、５％より多いと、溶融性が悪
くなると共に、ガラスの密度が著しく上昇するため好ま
しくない。SrO is a component that improves the chemical resistance and devitrification resistance of the glass, but if it exceeds 5%, the meltability deteriorates and the density of the glass increases remarkably, which is not preferable.
【００２９】ＢａＯも、ＳｒＯと同様、ガラスの耐薬品
性と耐失透性を向上させる上で重要な成分であるが、
０．５％より少ないと、このような効果が得られず、
９．５％より多いと、溶融性が悪くなると共に、ガラス
の密度が著しく上昇するため好ましくない。Like SrO, BaO is an important component for improving the chemical resistance and devitrification resistance of glass,
If it is less than 0.5%, such an effect cannot be obtained,
When it is more than 9.5%, the meltability becomes poor and the density of the glass remarkably increases, which is not preferable.
【００３０】ＺｎＯは、溶融性を改善する成分である
が、５％より多いと、ガラスが急激に失透しやすくなる
と共に、歪点が低下するため、優れた耐熱性が得られな
い。ZnO is a component that improves the meltability, but if it exceeds 5%, the glass tends to devitrify rapidly and the strain point decreases, so that excellent heat resistance cannot be obtained.
【００３１】ただし本発明においては、ＭｇＯ、Ｃａ
Ｏ、ＳｒＯ、ＢａＯ及びＺｎＯの合量が１０％より少な
いと、ガラスの失透温度が上昇し、ガラス中に結晶異物
が析出しやすくなり、またこれらの成分の合量が、２０
％より多いと、ガラスの密度が上昇して基板の軽量化を
図ることが困難となるため好ましくない。However, in the present invention, MgO, Ca
When the total amount of O, SrO, BaO and ZnO is less than 10%, the devitrification temperature of the glass rises, crystal foreign matter is likely to precipitate in the glass, and the total amount of these components is 20%.
%, It is not preferable because the density of glass increases and it becomes difficult to reduce the weight of the substrate.
【００３２】ＺｒＯ2 は、ガラスの耐薬品性、特に耐酸
性を改善すると共に、高温粘性を下げて溶融性を向上さ
せる成分であるが、１．５％より多いと、失透温度が上
昇し、ジルコンの失透異物が析出しやすくなるため好ま
しくない。ZrO 2 is a component that improves the chemical resistance, particularly acid resistance, of the glass and lowers the viscosity at high temperature to improve the meltability, but if it exceeds 1.5%, the devitrification temperature rises. It is not preferable because devitrification foreign matter of zircon is easily deposited.
【００３３】ＴｉＯ2 も、ガラスの耐薬品性、特に耐酸
性を改善すると共に、高温粘性を低下し、溶融性を向上
させる成分であるが、５％より多いと、ガラスが着色し
やすくなり、透過率が低下し、ディスプレイ用途に不向
きとなるため好ましくない。TiO 2 is also a component that improves the chemical resistance of glass, particularly acid resistance, and also lowers the high temperature viscosity and improves the meltability, but if it exceeds 5%, the glass tends to be colored, It is not preferable because the transmittance is lowered and it becomes unsuitable for display applications.
【００３４】また本発明においては、上記成分以外に
も、特性を損なわない範囲で、他の成分を添加させるこ
とが可能であり、例えば清澄剤として、Ａｓ2 Ｏ3 、Ｓ
ｂ2 Ｏ3 、Ｆ2 、Ｃｌ2 、ＳＯ3 といった成分やＡｌ、
Ｓｉといった金属粉末等を添加させることが可能であ
る。In the present invention, in addition to the above-mentioned components, other components may be added within a range that does not impair the characteristics. For example, As 2 O 3 or S may be used as a fining agent.
b 2 O 3 , F 2 , Cl 2 , SO 3 and other components, Al,
It is possible to add a metal powder such as Si.
【００３５】ただしガラス中にアルカリ金属酸化物が含
有されると、ガラス基板上に形成される各種の膜や半導
体素子の特性を劣化させるため好ましくない。また一般
に融剤として使用されるＰｂＯは、ガラスの耐薬品性を
著しく低下させると共に、溶融時に融液の表面から揮発
し、環境を汚染する虞れもあるため好ましくない。さら
にＰ2 Ｏ5 も一般に融剤として使用されるが、ガラスを
分相させると共に、耐薬品性を著しく低下させるため好
ましくない。またＣｕＯを含有すると、ガラスが着色す
るため、ディスプレイ用ガラス基板としては使用できな
くなる。However, it is not preferable that the glass contains an alkali metal oxide because it deteriorates the characteristics of various films and semiconductor elements formed on the glass substrate. In addition, PbO, which is generally used as a fluxing agent, is not preferable because it may significantly lower the chemical resistance of glass and volatilize from the surface of the melt during melting to pollute the environment. Further, P 2 O 5 is also generally used as a fluxing agent, but it is not preferable because it causes phase separation of glass and remarkably reduces chemical resistance. In addition, when CuO is contained, the glass is colored and cannot be used as a glass substrate for a display.
【００３６】[0036]
【実施例】以下、本発明の無アルカリガラス基板を実施
例に基づいて詳細に説明する。EXAMPLES The alkali-free glass substrate of the present invention will be described in detail below based on examples.
【００３７】表１、２は、実施例のガラス（試料Ｎｏ．
１〜７）と比較例のガラス（試料Ｎｏ．８〜１３）の組
成（重量％）と特性を示したものであり、また表３、４
は、表１、２のガラス組成をモル％で示したものであ
る。Tables 1 and 2 show the glasses of the examples (Sample No.
1 to 7) and the glass (Sample No. 8 to 13) of the comparative example, the composition (% by weight) and characteristics are shown in Tables 3 and 4.
Shows the glass composition of Tables 1 and 2 in mol%.
【００３８】[0038]
【表１】 [Table 1]
【００３９】[0039]
【表２】 [Table 2]
【００４０】[0040]
【表３】 [Table 3]
【００４１】[0041]
【表４】 [Table 4]
【００４２】表中の各試料は、次のようにして作製し
た。まず表の組成となるようにガラス原料を調合し、白
金坩堝に入れ、１５８０℃で、２４時間溶融した後、カ
ーボン板上に流し出し、板状に成形した。Each sample in the table was prepared as follows. First, glass raw materials were prepared so as to have the composition shown in the table, put in a platinum crucible, melted at 1580 ° C. for 24 hours, poured out onto a carbon plate, and molded into a plate shape.
【００４３】表から明らかなように、実施例であるＮ
ｏ．１〜７の各試料は、いずれも密度が２．５７ｇ／ｃ
ｍ3 以下、歪点が６６５℃以上であり、しかも耐塩酸性
に優れていた。また各試料とも、失透温度が１１２０℃
以下と低いため、耐失透性に優れ、１０2.5 ポイズに相
当する温度が１５００℃以下であるため、溶融性も良好
であった。As is apparent from the table, N which is the embodiment
o. Each of the samples 1 to 7 has a density of 2.57 g / c
m 3 or less, the strain point was 665 ° C. or more, and the hydrochloric acid resistance was excellent. The devitrification temperature of each sample was 1120 ° C.
Since it was as low as the following, the devitrification resistance was excellent, and the temperature corresponding to 10 2.5 poise was 1500 ° C. or less, and the meltability was also good.
【００４４】それに対し比較例であるＮｏ．８の試料
は、ＳｉＯ2 が多く、ＣａＯが少ないため、耐失透性と
溶融性に劣り、Ｎｏ．９の試料は、ＣａＯが少なく、Ｂ
ａＯが多く、しかもＭｇＯ、ＣａＯ、ＳｒＯ、ＢａＯ及
びＺｎＯの合量が２０％以上であるため、密度が高く、
溶融性に劣っていた。またＮｏ．１０の試料は、ＣａＯ
が多いため、耐塩酸性に劣ると共に密度が高く、Ｎｏ．
１１の試料は、ＭｇＯとＣａＯが少ないため、溶融性に
劣り、Ｎｏ．１２の試料は、ＭｇＯが多く、ＢａＯを含
まないため、耐塩酸性にやや劣り、耐失透性に劣ってい
た。さらにＮｏ．１３の試料は、Ｂ2Ｏ3が多く、しかも
ＭｇＯとＣａＯの合量が、Ｂ2 Ｏ3 よりも少ないため、
歪点が低く、耐塩酸性にやや劣っていた。On the other hand, No. The sample of No. 8 has a large amount of SiO 2 and a small amount of CaO, and therefore is inferior in devitrification resistance and meltability. Sample 9 has less CaO and B
Since aO is large and the total amount of MgO, CaO, SrO, BaO and ZnO is 20% or more, the density is high,
It was inferior in meltability. No. 10 samples are CaO
Since it has a high density, it has poor hydrochloric acid resistance and a high density.
The sample of No. 11 was inferior in meltability because it contained a small amount of MgO and CaO, and No. 11 sample. The sample of No. 12 had a large amount of MgO and did not contain BaO, and thus had a slightly poor hydrochloric acid resistance and a poor devitrification resistance. Furthermore, No. 13 samples are often B 2 O 3, moreover the total amount of MgO and CaO, less than B 2 O 3 because,
It had a low strain point and was slightly inferior in hydrochloric acid resistance.
【００４５】尚、表中の密度は、周知のアルキメデス法
によって測定し、歪点は、ＡＳＴＭＣ３３６−７１の方
法に基づいて測定した。The density in the table was measured by the well-known Archimedes method, and the strain point was measured by the method of ASTM C336-71.
【００４６】また耐塩酸性は、各試料を光学研磨してか
ら、８０℃に保持された１０重量％塩酸水溶液に２４時
間浸漬した後、ガラス基板の表面状態を観察することに
よって評価したものであり、ガラス基板の表面が白濁し
たり、クラックが入ったものを×、わずかに白濁が見ら
れたものを△、全く変化のなかったものを○とした。The hydrochloric acid resistance was evaluated by optically polishing each sample, immersing it in a 10 wt% hydrochloric acid aqueous solution kept at 80 ° C. for 24 hours, and then observing the surface condition of the glass substrate. The case where the surface of the glass substrate was clouded or cracked was evaluated as x, the case where a slight cloudiness was observed was evaluated as Δ, and the sample where there was no change was evaluated as o.
【００４７】さらに失透温度は、各試料から３００〜５
００μｍの粒径を有するガラス粉末を作製し、これを白
金ボート内に入れ、温度勾配炉中で２４時間熱処理した
後、ガラスを取り出し、失透の発生した温度を顕微鏡観
察で確認することによって測定した。Further, the devitrification temperature is 300 to 5 from each sample.
Measured by making glass powder having a particle size of 00 μm, putting it in a platinum boat, heat treating it in a temperature gradient furnace for 24 hours, taking out the glass, and confirming the temperature at which devitrification occurred by microscopic observation. did.
【００４８】また１０2.5 ポイズ温度は、高温粘度であ
る１０2.5 ポイズに相当する温度を示すものであり、こ
の温度が低いほど、溶融成形性に優れていることにな
る。The 10 2.5 poise temperature indicates a temperature corresponding to a high temperature viscosity of 10 2.5 poise, and the lower the temperature, the better the melt moldability.
【００４９】[0049]
【発明の効果】以上のように本発明の無アルカリガラス
基板は、実質的にアルカリ金属酸化物とＰｂＯを含有せ
ず、耐熱性、耐薬品性、溶融成形性に優れ、しかも密度
が２．６ｇ／ｃｍ3 以下であるため、特に軽量化が要求
されるＴＦＴ型アクティブマトリックス液晶ディスプレ
イに使用されるガラス基板として好適である。As described above, the alkali-free glass substrate of the present invention contains substantially no alkali metal oxide and PbO, is excellent in heat resistance, chemical resistance, melt moldability, and has a density of 2. Since it is 6 g / cm 3 or less, it is suitable as a glass substrate used for a TFT type active matrix liquid crystal display which is required to be particularly lightweight.
Claims (2)
％、Ａｌ2 Ｏ3 １０〜２０％、Ｂ2 Ｏ3 ４〜１２
％、ＭｇＯ ３〜６．４％、ＣａＯ ４．６〜１０％、
ＳｒＯ ０〜５％、ＢａＯ ０．５〜９．５％、ＺｎＯ
０〜５％、ＺｒＯ2 ０〜１．５％、ＴｉＯ2 ０〜
５％の組成を有し、実質的にアルカリ金属酸化物、Ｐｂ
Ｏを含有しないことを特徴とする無アルカリガラス基
板。1. A weight percentage of SiO 2 55-65.
%, Al 2 O 3 10 to 20%, B 2 O 3 4 to 12
%, MgO 3 to 6.4%, CaO 4.6 to 10%,
SrO 0 to 5%, BaO 0.5 to 9.5%, ZnO
0~5%, ZrO 2 0~1.5%, TiO 2 0~
It has a composition of 5% and is substantially alkali metal oxide, Pb.
A non-alkali glass substrate containing no O.
Ｏ）の条件を満足することを特徴とする請求項１記載の
無アルカリガラス基板。2. A molar ratio of B 2 O 3 <(MgO + Ca
The alkali-free glass substrate according to claim 1, which satisfies the condition (O).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34634095A JP3858293B2 (en) | 1995-12-11 | 1995-12-11 | Alkali-free glass substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34634095A JP3858293B2 (en) | 1995-12-11 | 1995-12-11 | Alkali-free glass substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09156953A true JPH09156953A (en) | 1997-06-17 |
| JP3858293B2 JP3858293B2 (en) | 2006-12-13 |
Family
ID=18382754
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34634095A Expired - Fee Related JP3858293B2 (en) | 1995-12-11 | 1995-12-11 | Alkali-free glass substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3858293B2 (en) |
Cited By (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09263421A (en) * | 1996-03-28 | 1997-10-07 | Asahi Glass Co Ltd | Alkali-free glass and flat display panel |
| JPH1072237A (en) * | 1996-06-03 | 1998-03-17 | Asahi Glass Co Ltd | Alkali-free glass and liquid crystal display panel |
| WO1998027019A1 (en) * | 1996-12-17 | 1998-06-25 | Corning Incorporated | Glasses for display panels and photovoltaic devices |
| JPH11292563A (en) * | 1998-04-03 | 1999-10-26 | Nippon Electric Glass Co Ltd | Alkali-free glass substrate |
| DE19916296C1 (en) * | 1999-04-12 | 2001-01-18 | Schott Glas | Alkali-free aluminoborosilicate glass and its use |
| EP1078893A2 (en) * | 1999-08-21 | 2001-02-28 | Schott Glas | Alkali-free aluminoborosilicate glasses and their applications |
| DE10000839C1 (en) * | 2000-01-12 | 2001-05-10 | Schott Glas | Alkali-free aluminoborosilicate glass used as substrate glass in displays and in thin layer photovoltaics contains oxides of silicon, boron, aluminum, magnesium, calcium, strontium, barium and zinc |
| DE10000837C1 (en) * | 2000-01-12 | 2001-05-31 | Schott Glas | Alkali-free alumino-borosilicate glass used as substrate glass in thin film transistor displays and thin layer solar cells contains oxides of silicon, boron, aluminum, magnesium, strontium, and barium |
| WO2001000538A3 (en) * | 1999-06-29 | 2001-07-05 | Hoya Corp | Glass composition for use in a liquid crystal panel |
| DE10000838A1 (en) * | 2000-01-12 | 2001-07-26 | Schott Glas | Aluminoborosilicate glass used as substrate glass in displays and in a thin layer photovoltaic cell contains oxides of silicon, boron, aluminum, strontium and barium |
| DE10000836A1 (en) * | 2000-01-12 | 2001-07-26 | Schott Glas | Alkali-free aluminoborosilicate glass and its uses |
| EP1152990A1 (en) * | 1998-11-30 | 2001-11-14 | Corning Incorporated | Glasses for flat panel displays |
| JP2002003240A (en) * | 2000-06-19 | 2002-01-09 | Nippon Electric Glass Co Ltd | Glass substrate for liquid crystal display |
| JP2002029775A (en) * | 1999-08-03 | 2002-01-29 | Asahi Glass Co Ltd | Nonalkali glass |
| EP1219573A1 (en) * | 2000-12-22 | 2002-07-03 | Schott Glas | Alkali-free aluminoborosilicate glasses and their applications |
| DE10114581A1 (en) * | 2001-03-24 | 2002-10-10 | Schott Glas | Alkali-free aluminoborosilicate glass and uses |
| US6537937B1 (en) * | 1999-08-03 | 2003-03-25 | Asahi Glass Company, Limited | Alkali-free glass |
| JP2004075494A (en) * | 2002-08-22 | 2004-03-11 | Nippon Electric Glass Co Ltd | Glass substrate and its manufacturing method |
| JP2004536768A (en) * | 2001-08-02 | 2004-12-09 | スリーエム イノベイティブ プロパティズ カンパニー | Manufacturing method of amorphous material and ceramic |
| JP2007008812A (en) * | 2006-09-21 | 2007-01-18 | Nippon Electric Glass Co Ltd | Alkali free glass substrate |
| WO2007095115A1 (en) * | 2006-02-10 | 2007-08-23 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| WO2007132737A1 (en) * | 2006-05-12 | 2007-11-22 | Asahi Glass Company, Limited | Process for producing alkali-free glass |
| JP2008214188A (en) * | 2008-05-12 | 2008-09-18 | Nippon Electric Glass Co Ltd | Glass substrate |
| WO2009090013A1 (en) * | 2008-01-17 | 2009-07-23 | Schott Ag | Alkali-free glass |
| JP2011085582A (en) * | 2009-09-18 | 2011-04-28 | Nippon Electric Glass Co Ltd | Radiation shielding safety glass and method of manufacturing the same |
| US8007913B2 (en) | 2006-02-10 | 2011-08-30 | Corning Incorporated | Laminated glass articles and methods of making thereof |
| JP2013014510A (en) * | 2003-12-26 | 2013-01-24 | Asahi Glass Co Ltd | Alkali-free glass substrate, and liquid crystal display panel |
| WO2013047586A1 (en) * | 2011-09-30 | 2013-04-04 | ＡｖａｎＳｔｒａｔｅ株式会社 | Glass substrate for flat panel display |
| WO2013099970A1 (en) * | 2011-12-28 | 2013-07-04 | ＡｖａｎＳｔｒａｔｅ株式会社 | Glass substrate for flat panel displays and method for manufacturing same |
| US8713967B2 (en) | 2008-11-21 | 2014-05-06 | Corning Incorporated | Stable glass sheet and method for making same |
| WO2015009483A1 (en) * | 2013-07-16 | 2015-01-22 | Corning Incorporated | Alkali-free aluminosilicate glasses, suitable as substrate for induction heating cooktops |
| WO2015041246A1 (en) * | 2013-09-20 | 2015-03-26 | 旭硝子株式会社 | Non-alkali glass |
| WO2015080044A1 (en) * | 2013-11-27 | 2015-06-04 | 日本電気硝子株式会社 | Glass |
| JP2016011256A (en) * | 2012-12-28 | 2016-01-21 | ＡｖａｎＳｔｒａｔｅ株式会社 | Glass substrate for display and manufacturing method therefor |
| JP2016512486A (en) * | 2013-03-14 | 2016-04-28 | コーニング インコーポレイテッド | Dimensionally stable anti-damage glass plate |
| JP2017007939A (en) * | 2011-12-29 | 2017-01-12 | 日本電気硝子株式会社 | Alkali-free glass |
| WO2017188126A1 (en) * | 2016-04-27 | 2017-11-02 | 旭硝子株式会社 | Non-alkali glass |
| JP2018100217A (en) * | 2018-01-17 | 2018-06-28 | 日本電気硝子株式会社 | Glass and glass substrate |
| JP2019077611A (en) * | 2019-01-31 | 2019-05-23 | 日本電気硝子株式会社 | Glass and glass substrate |
| JP2019077612A (en) * | 2018-01-17 | 2019-05-23 | 日本電気硝子株式会社 | Glass and glass substrate |
| JP2021522152A (en) * | 2018-04-25 | 2021-08-30 | 成都光明光▲電▼股▲分▼有限公司 | Glass composition |
| US11168018B2 (en) | 2013-08-15 | 2021-11-09 | Corning Incorporated | Aluminoborosilicate glass substantially free of alkali oxides |
| USRE49307E1 (en) | 2013-08-15 | 2022-11-22 | Corning Incorporated | Alkali-doped and alkali-free boroaluminosilicate glass |
-
1995
- 1995-12-11 JP JP34634095A patent/JP3858293B2/en not_active Expired - Fee Related
Cited By (91)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09263421A (en) * | 1996-03-28 | 1997-10-07 | Asahi Glass Co Ltd | Alkali-free glass and flat display panel |
| JPH1072237A (en) * | 1996-06-03 | 1998-03-17 | Asahi Glass Co Ltd | Alkali-free glass and liquid crystal display panel |
| WO1998027019A1 (en) * | 1996-12-17 | 1998-06-25 | Corning Incorporated | Glasses for display panels and photovoltaic devices |
| USRE38959E1 (en) | 1996-12-17 | 2006-01-31 | Corning Incorporated | Glasses for display panels and photovoltaic devices |
| JPH11292563A (en) * | 1998-04-03 | 1999-10-26 | Nippon Electric Glass Co Ltd | Alkali-free glass substrate |
| EP1152990A1 (en) * | 1998-11-30 | 2001-11-14 | Corning Incorporated | Glasses for flat panel displays |
| US6831029B2 (en) | 1998-11-30 | 2004-12-14 | Corning Incorporated | Glasses for flat panel displays |
| EP1152990A4 (en) * | 1998-11-30 | 2004-11-10 | Corning Inc | Glasses for flat panel displays |
| US7365038B2 (en) | 1998-11-30 | 2008-04-29 | Corning Incorporated | Glasses for flat panel displays |
| US7524784B2 (en) | 1998-11-30 | 2009-04-28 | Corning Incorporated | Glasses for flat panel displays |
| US6319867B1 (en) | 1998-11-30 | 2001-11-20 | Corning Incorporated | Glasses for flat panel displays |
| DE19916296C1 (en) * | 1999-04-12 | 2001-01-18 | Schott Glas | Alkali-free aluminoborosilicate glass and its use |
| WO2001000538A3 (en) * | 1999-06-29 | 2001-07-05 | Hoya Corp | Glass composition for use in a liquid crystal panel |
| KR100623805B1 (en) * | 1999-06-29 | 2006-09-18 | 호야 가부시키가이샤 | Glass substrate and glass composition for use in a liquid crystal panel |
| JP4576680B2 (en) * | 1999-08-03 | 2010-11-10 | 旭硝子株式会社 | Alkali-free glass |
| US6537937B1 (en) * | 1999-08-03 | 2003-03-25 | Asahi Glass Company, Limited | Alkali-free glass |
| JP2002029775A (en) * | 1999-08-03 | 2002-01-29 | Asahi Glass Co Ltd | Nonalkali glass |
| US6417124B1 (en) | 1999-08-21 | 2002-07-09 | Schott Glas | Alkali-free aluminoborosilicate glass, and uses thereof |
| EP1078893A2 (en) * | 1999-08-21 | 2001-02-28 | Schott Glas | Alkali-free aluminoborosilicate glasses and their applications |
| EP1078893A3 (en) * | 1999-08-21 | 2002-01-23 | Schott Glas | Alkali-free aluminoborosilicate glasses and their applications |
| DE10000838B4 (en) * | 2000-01-12 | 2005-03-17 | Schott Ag | Alkali-free aluminoborosilicate glass and its uses |
| DE10000839C1 (en) * | 2000-01-12 | 2001-05-10 | Schott Glas | Alkali-free aluminoborosilicate glass used as substrate glass in displays and in thin layer photovoltaics contains oxides of silicon, boron, aluminum, magnesium, calcium, strontium, barium and zinc |
| DE10000838A1 (en) * | 2000-01-12 | 2001-07-26 | Schott Glas | Aluminoborosilicate glass used as substrate glass in displays and in a thin layer photovoltaic cell contains oxides of silicon, boron, aluminum, strontium and barium |
| EP1118593A3 (en) * | 2000-01-12 | 2001-09-12 | Schott Glas | Alkali-free aluminoborosilicate glass and its use |
| US6867158B2 (en) | 2000-01-12 | 2005-03-15 | Schott Glas | Flat panel liquid-crystal display such as for a laptop computer |
| EP1118594A3 (en) * | 2000-01-12 | 2001-08-01 | Schott Glas | Alkali-free aluminoborosilicate glass and its use |
| US6671026B2 (en) | 2000-01-12 | 2003-12-30 | Schott Glas | Flat panel liquid-crystal display such as for a laptop computer |
| EP1118596A3 (en) * | 2000-01-12 | 2001-08-01 | Schott Glas | Alkali-free aluminoborosilicate glass and its use |
| US6707526B2 (en) | 2000-01-12 | 2004-03-16 | Schott Glas | Flat panel liquid crystal display such as for a laptop computer, having alkali-free aluminoborosilicate glass |
| DE10000837C1 (en) * | 2000-01-12 | 2001-05-31 | Schott Glas | Alkali-free alumino-borosilicate glass used as substrate glass in thin film transistor displays and thin layer solar cells contains oxides of silicon, boron, aluminum, magnesium, strontium, and barium |
| DE10000836A1 (en) * | 2000-01-12 | 2001-07-26 | Schott Glas | Alkali-free aluminoborosilicate glass and its uses |
| EP1118595A3 (en) * | 2000-01-12 | 2001-09-12 | Schott Glas | ALkali-free aluminoborosilicate glass and its use |
| US6852658B2 (en) | 2000-01-12 | 2005-02-08 | Schott Glas | Flat panel liquid-crystal display, such as for a laptop computer |
| DE10000836B4 (en) * | 2000-01-12 | 2005-03-17 | Schott Ag | Alkali-free aluminoborosilicate glass and its uses |
| JP2002003240A (en) * | 2000-06-19 | 2002-01-09 | Nippon Electric Glass Co Ltd | Glass substrate for liquid crystal display |
| EP1219573A1 (en) * | 2000-12-22 | 2002-07-03 | Schott Glas | Alkali-free aluminoborosilicate glasses and their applications |
| US6858552B2 (en) | 2000-12-22 | 2005-02-22 | Schott Glas | Alkali-free aluminoborosilicate glasses and uses thereof |
| JP2002234752A (en) * | 2000-12-22 | 2002-08-23 | Carl Zeiss:Fa | Nonalkali aluminoborosilicate glass and its use |
| DE10114581C2 (en) * | 2001-03-24 | 2003-03-27 | Schott Glas | Alkali-free aluminoborosilicate glass and uses |
| DE10114581A1 (en) * | 2001-03-24 | 2002-10-10 | Schott Glas | Alkali-free aluminoborosilicate glass and uses |
| JP2004536768A (en) * | 2001-08-02 | 2004-12-09 | スリーエム イノベイティブ プロパティズ カンパニー | Manufacturing method of amorphous material and ceramic |
| JP2004075494A (en) * | 2002-08-22 | 2004-03-11 | Nippon Electric Glass Co Ltd | Glass substrate and its manufacturing method |
| JP2013014510A (en) * | 2003-12-26 | 2013-01-24 | Asahi Glass Co Ltd | Alkali-free glass substrate, and liquid crystal display panel |
| JP2009525942A (en) * | 2006-02-10 | 2009-07-16 | コーニング インコーポレイテッド | Glass composition having high thermal and chemical stability and method for producing the same |
| US10364177B2 (en) | 2006-02-10 | 2019-07-30 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| US8763429B2 (en) | 2006-02-10 | 2014-07-01 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| US8753993B2 (en) | 2006-02-10 | 2014-06-17 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| WO2007095115A1 (en) * | 2006-02-10 | 2007-08-23 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| US7833919B2 (en) | 2006-02-10 | 2010-11-16 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| KR101399745B1 (en) * | 2006-02-10 | 2014-05-26 | 코닝 인코포레이티드 | Glass composition having high thermal and chemical stability and methods of making thereof |
| JP2016026138A (en) * | 2006-02-10 | 2016-02-12 | コーニング インコーポレイテッド | Glass composition having high thermal and chemical stability, and production method of the same |
| US8007913B2 (en) | 2006-02-10 | 2011-08-30 | Corning Incorporated | Laminated glass articles and methods of making thereof |
| CN103121796A (en) * | 2006-02-10 | 2013-05-29 | 康宁股份有限公司 | Glass compositions having high thermal and chemical stability and methods of making thereof |
| JP5212102B2 (en) * | 2006-05-12 | 2013-06-19 | 旭硝子株式会社 | Method for producing alkali-free glass |
| KR101022682B1 (en) * | 2006-05-12 | 2011-03-22 | 아사히 가라스 가부시키가이샤 | Process for producing alkali-free glass |
| WO2007132737A1 (en) * | 2006-05-12 | 2007-11-22 | Asahi Glass Company, Limited | Process for producing alkali-free glass |
| JP2007008812A (en) * | 2006-09-21 | 2007-01-18 | Nippon Electric Glass Co Ltd | Alkali free glass substrate |
| WO2009090013A1 (en) * | 2008-01-17 | 2009-07-23 | Schott Ag | Alkali-free glass |
| JP2008214188A (en) * | 2008-05-12 | 2008-09-18 | Nippon Electric Glass Co Ltd | Glass substrate |
| US8713967B2 (en) | 2008-11-21 | 2014-05-06 | Corning Incorporated | Stable glass sheet and method for making same |
| JP2011085582A (en) * | 2009-09-18 | 2011-04-28 | Nippon Electric Glass Co Ltd | Radiation shielding safety glass and method of manufacturing the same |
| WO2013047586A1 (en) * | 2011-09-30 | 2013-04-04 | ＡｖａｎＳｔｒａｔｅ株式会社 | Glass substrate for flat panel display |
| JPWO2013047586A1 (en) * | 2011-09-30 | 2015-03-26 | ＡｖａｎＳｔｒａｔｅ株式会社 | Glass substrate for flat panel display |
| JPWO2013099970A1 (en) * | 2011-12-28 | 2015-05-11 | ＡｖａｎＳｔｒａｔｅ株式会社 | Glass substrate for flat panel display and manufacturing method thereof |
| TWI673246B (en) * | 2011-12-28 | 2019-10-01 | 日商安瀚視特股份有限公司 | Glass substrate for flat panel display and manufacturing method thereof |
| KR20140074245A (en) * | 2011-12-28 | 2014-06-17 | 아반스트레이트 가부시키가이샤 | Glass substrate for flat panel display and method for manufacturing same |
| WO2013099970A1 (en) * | 2011-12-28 | 2013-07-04 | ＡｖａｎＳｔｒａｔｅ株式会社 | Glass substrate for flat panel displays and method for manufacturing same |
| CN103429547A (en) * | 2011-12-28 | 2013-12-04 | 安瀚视特控股株式会社 | Glass substrate for flat panel displays and method for manufacturing same |
| JP2017007939A (en) * | 2011-12-29 | 2017-01-12 | 日本電気硝子株式会社 | Alkali-free glass |
| JP2016011256A (en) * | 2012-12-28 | 2016-01-21 | ＡｖａｎＳｔｒａｔｅ株式会社 | Glass substrate for display and manufacturing method therefor |
| JP2016512486A (en) * | 2013-03-14 | 2016-04-28 | コーニング インコーポレイテッド | Dimensionally stable anti-damage glass plate |
| US9932262B2 (en) | 2013-03-14 | 2018-04-03 | Corning Incorporated | Dimensionally-stable, damage-resistant, glass sheets |
| JP2019163209A (en) * | 2013-07-16 | 2019-09-26 | コーニング インコーポレイテッド | Alkali-free aluminosilicate glasses, suitable as substrate for induction heating cooktops |
| WO2015009483A1 (en) * | 2013-07-16 | 2015-01-22 | Corning Incorporated | Alkali-free aluminosilicate glasses, suitable as substrate for induction heating cooktops |
| JP2016525058A (en) * | 2013-07-16 | 2016-08-22 | コーニング インコーポレイテッド | Alkali-free aluminosilicate glass suitable as base material for induction heating cooking top plate |
| US10219328B2 (en) | 2013-07-16 | 2019-02-26 | Eurokera | Alkali-free aluminosilicate glasses, suitable as substrate for induction heating cooktops applications |
| USRE49307E1 (en) | 2013-08-15 | 2022-11-22 | Corning Incorporated | Alkali-doped and alkali-free boroaluminosilicate glass |
| US11168018B2 (en) | 2013-08-15 | 2021-11-09 | Corning Incorporated | Aluminoborosilicate glass substantially free of alkali oxides |
| CN105555725A (en) * | 2013-09-20 | 2016-05-04 | 旭硝子株式会社 | Non-alkali glass |
| WO2015041246A1 (en) * | 2013-09-20 | 2015-03-26 | 旭硝子株式会社 | Non-alkali glass |
| WO2015080044A1 (en) * | 2013-11-27 | 2015-06-04 | 日本電気硝子株式会社 | Glass |
| KR20180136443A (en) * | 2016-04-27 | 2018-12-24 | 에이지씨 가부시키가이샤 | Alkali-free glass |
| KR20220084427A (en) * | 2016-04-27 | 2022-06-21 | 에이지씨 가부시키가이샤 | Non-alkali glass |
| JPWO2017188126A1 (en) * | 2016-04-27 | 2019-03-07 | Ａｇｃ株式会社 | Alkali-free glass |
| WO2017188126A1 (en) * | 2016-04-27 | 2017-11-02 | 旭硝子株式会社 | Non-alkali glass |
| TWI714762B (en) * | 2016-04-27 | 2021-01-01 | 日商Ａｇｃ股份有限公司 | Alkali-free glass |
| US11066325B2 (en) | 2016-04-27 | 2021-07-20 | AGC Inc. | Alkali-free glass |
| JP2018100217A (en) * | 2018-01-17 | 2018-06-28 | 日本電気硝子株式会社 | Glass and glass substrate |
| JP2019077612A (en) * | 2018-01-17 | 2019-05-23 | 日本電気硝子株式会社 | Glass and glass substrate |
| JP2021522152A (en) * | 2018-04-25 | 2021-08-30 | 成都光明光▲電▼股▲分▼有限公司 | Glass composition |
| JP2019077611A (en) * | 2019-01-31 | 2019-05-23 | 日本電気硝子株式会社 | Glass and glass substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3858293B2 (en) | 2006-12-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3858293B2 (en) | Alkali-free glass substrate | |
| JP3666610B2 (en) | Alkali-free glass substrate | |
| JP2990379B2 (en) | Alkali-free glass substrate | |
| JP3666608B2 (en) | Alkali-free glass substrate | |
| KR100262116B1 (en) | Alkali-free glass substrate | |
| CA2113505C (en) | High liquidus viscosity glasses for flat panel displays | |
| US4994415A (en) | SiO2 -Al2 O3 -BaO glass substrates with improved chemical resistance for use in display panels and others having thin films | |
| US5326730A (en) | Barium aluminosilicate glasses | |
| TW555715B (en) | Alkali-free glass and glass plate for a display | |
| KR100319348B1 (en) | Method for manufacturing glass sheet with flawless surface and soluble glass of alkali-free metal for this purpose | |
| JP3144823B2 (en) | Alkali-free glass | |
| CA2314295C (en) | Alkali-free aluminoborosilicate glass, its use and process for its preparation | |
| JP3396835B2 (en) | Aluminoborosilicate glass containing no alkali metal and its use | |
| JP4789059B2 (en) | Alkali-free glass substrate | |
| JP3800657B2 (en) | Alkali-free glass and flat display panel | |
| JP2001151534A (en) | Glass substrate for liquid crystal display | |
| JPH04325435A (en) | Alkali-free glass | |
| JPH04325436A (en) | Alkali-free glass | |
| WO1998027019A1 (en) | Glasses for display panels and photovoltaic devices | |
| JP3800443B2 (en) | Non-alkali glass substrate for display and method for producing the same | |
| JP4789058B2 (en) | Alkali-free glass substrate | |
| JP2002029776A (en) | Nonalkali glass excellent in crack resistance | |
| JPH02133334A (en) | Alkali-free glass | |
| JP7389400B2 (en) | Alkali-free glass plate | |
| JP2001122637A (en) | Glass substrate for display |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20040921 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050613 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050809 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20060829 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20060911 |
|
| R150 | Certificate of patent (=grant) or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100929 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100929 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110929 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120929 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130929 Year of fee payment: 7 |
|
| LAPS | Cancellation because of no payment of annual fees |