JPH0888096A - Plasma generating method - Google Patents
Plasma generating methodInfo
- Publication number
- JPH0888096A JPH0888096A JP6222980A JP22298094A JPH0888096A JP H0888096 A JPH0888096 A JP H0888096A JP 6222980 A JP6222980 A JP 6222980A JP 22298094 A JP22298094 A JP 22298094A JP H0888096 A JPH0888096 A JP H0888096A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- magnetic field
- generating
- region
- coils
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、電磁波と磁界との相互
作用によりプラズマを発生させる方法に係り、特に、プ
ラズマ発生時のプラズマ発生方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for generating plasma by the interaction of electromagnetic waves and magnetic fields, and more particularly to a method for generating plasma when plasma is generated.
【０００２】[0002]
【従来の技術】従来のプラズマ発生方法においては、電
磁波と磁場との相互作用によるプラズマ発生方法はある
一定条件を満たした場合に、プラズマ発生に再現性よく
着火するものである。なお、この種の装置として関連す
るものには、例えば、特開平５−１９５２２９号公報が
挙げられる。2. Description of the Related Art In the conventional plasma generation method, the plasma generation method by the interaction between an electromagnetic wave and a magnetic field ignites the plasma generation with good reproducibility when a certain condition is satisfied. As a device related to this type, for example, Japanese Patent Laid-Open No. 5-195229 can be cited.
【０００３】[0003]
【発明が解決しようとする課題】一般に、電磁波と磁界
によりプラズマを発生させる場合、いくつかの条件を満
たすことが必要となる。それらの条件が十分に満たされ
ず、プラズマ発生に再現性がなく着火不良等の問題が発
生する場合がある。Generally, when plasma is generated by electromagnetic waves and magnetic fields, it is necessary to satisfy some conditions. In some cases, these conditions are not sufficiently satisfied, plasma is not reproducible, and problems such as poor ignition occur.
【０００４】本発明の目的は、特に磁場条件を使用し、
プラズマ発生効率を向上させるプラズマ発生方法を提供
することにある。The object of the present invention is to use especially magnetic field conditions,
It is an object of the present invention to provide a plasma generation method that improves plasma generation efficiency.
【０００５】[0005]
【課題を解決するための手段】プラズマ発生室の構造等
の条件により、プラズマを発生することのできる磁場
（例えばＥＣＲ面）と電磁波の伝播状態の関係から、プ
ラズマを発生させることができる磁場を、プラズマ発生
室のどの場所に発生させるかにより、プラズマ発生効率
を向上させることができる。According to the conditions such as the structure of the plasma generating chamber, the magnetic field capable of generating plasma is determined from the relationship between the magnetic field capable of generating plasma (for example, ECR surface) and the propagation state of electromagnetic waves. The plasma generation efficiency can be improved depending on where in the plasma generation chamber the plasma is generated.
【０００６】[0006]
【作用】本発明によれば、プラズマ発生中に短時間、磁
場を変化させることにより、プラズマ発生効率を向上さ
せ、着火不良を低減することができる。According to the present invention, by changing the magnetic field for a short time during plasma generation, plasma generation efficiency can be improved and ignition defects can be reduced.
【０００７】つまり、最終的に使用する磁場条件の前に
プラズマ発生効率の良い磁場条件を使用し、一旦プラズ
マを発生させてから最終的な磁場条件に変更することで
プラズマ発生効率を向上させる。That is, the magnetic field condition with good plasma generation efficiency is used before the finally used magnetic field condition, and the plasma generation efficiency is improved by once generating plasma and then changing to the final magnetic field condition.
【０００８】又、磁場を変化させることで、その間にプ
ラズマを発生させる条件を満たす、磁場条件をプラズマ
発生室の各所に発生させ、プラズマ発生効率を向上させ
る。Further, by changing the magnetic field, magnetic field conditions satisfying the conditions for generating plasma during that time are generated in various places in the plasma generation chamber, and the plasma generation efficiency is improved.
【０００９】[0009]
【実施例】以下、本発明の一実施例を図１により説明す
る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIG.
【００１０】図１は本発明の一実施例のプラズマ発生装
置を示す説明図である。図１において、プラズマ発生装
置はコイル１０と電磁波発生装置３０、プラズマ発生室
２０を使用している。コイル１０は上下２つのコイルか
らなり、上下２つのコイル１０により、プラズマ発生室
の任意の高さに、特定の磁場を発生させることができ
る。FIG. 1 is an explanatory view showing a plasma generator according to an embodiment of the present invention. In FIG. 1, the plasma generator uses a coil 10, an electromagnetic wave generator 30, and a plasma generation chamber 20. The coil 10 is composed of upper and lower two coils, and a specific magnetic field can be generated at an arbitrary height of the plasma generation chamber by the upper and lower two coils 10.
【００１１】このような構成のプラズマ発生装置を使用
し、プラズマを発生させるとき、コイル１０による磁場
に、電磁波発生装置３０により発生する電磁波４０が必
要となる。When plasma is generated using the plasma generator having such a structure, the electromagnetic field 40 generated by the electromagnetic wave generator 30 is required for the magnetic field generated by the coil 10.
【００１２】つまり、領域６０に特定の磁場を発生さ
せ、電磁波４０を伝えプラズマが発生しない場合がある
とき、本発明におけるプラズマ発生方法ではコイル１０
に特定の磁場をプラズマの発生に条件の良い領域５０に
発生させ、電磁波４０との相互作用でまずプラズマを発
生させる。次に、コイル１０への電流を変化し、前述し
た磁場と同磁場を領域６０に発生させる。そうすると、
プラズマ発生領域は領域６０に変化するが、プラズマは
発生しつづける。That is, when there is a case where a specific magnetic field is generated in the region 60 and the electromagnetic wave 40 is transmitted and plasma is not generated, the coil 10 is used in the plasma generating method of the present invention.
First, a specific magnetic field is generated in the region 50 where the conditions for plasma generation are good, and the plasma is first generated by the interaction with the electromagnetic wave 40. Next, the current to the coil 10 is changed to generate the same magnetic field as described above in the region 60. Then,
The plasma generation region changes to the region 60, but the plasma continues to be generated.
【００１３】[0013]
【発明の効果】以上説明したように本発明によれば、コ
イルへの電流を変化させ、磁場を変化させることでプラ
ズマ発生効率を向上できる。As described above, according to the present invention, the plasma generation efficiency can be improved by changing the current to the coil and changing the magnetic field.
【図１】本発明による一実施例のプラズマ発生装置の説
明図である。FIG. 1 is an explanatory diagram of a plasma generator according to an embodiment of the present invention.
１０…コイル、２０…プラズマ発生室、３０…電磁場発
生装置、４０…電磁波、５０，６０…プラズマ発生領
域。10 ... Coil, 20 ... Plasma generating chamber, 30 ... Electromagnetic field generating device, 40 ... Electromagnetic wave, 50, 60 ... Plasma generating region.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 吉田 剛 山口県下松市大字東豊井794番地 日立テ クノエンジニアリング株式会社笠戸事業所 内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tsuyoshi Yoshida 794 Azuma Higashitoyo, Kudamatsu City, Yamaguchi Prefecture Hitachi Techno Engineering Co., Ltd. Kasado Plant
Claims (1)
方法であって、プラズマ発生時に磁場を変化させること
を特徴とするプラズマ発生方法。1. A method for generating plasma by an electrode wave and a magnetic field, wherein the magnetic field is changed when the plasma is generated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6222980A JPH0888096A (en) | 1994-09-19 | 1994-09-19 | Plasma generating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6222980A JPH0888096A (en) | 1994-09-19 | 1994-09-19 | Plasma generating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0888096A true JPH0888096A (en) | 1996-04-02 |
Family
ID=16790916
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6222980A Pending JPH0888096A (en) | 1994-09-19 | 1994-09-19 | Plasma generating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0888096A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002533950A (en) * | 1998-12-30 | 2002-10-08 | ラム リサーチ コーポレーション | Method for igniting a plasma in a plasma processing reactor |
| WO2004012251A1 (en) * | 2002-07-30 | 2004-02-05 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
-
1994
- 1994-09-19 JP JP6222980A patent/JPH0888096A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002533950A (en) * | 1998-12-30 | 2002-10-08 | ラム リサーチ コーポレーション | Method for igniting a plasma in a plasma processing reactor |
| WO2004012251A1 (en) * | 2002-07-30 | 2004-02-05 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
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