JPH08238672A - Polystyrene film - Google Patents
Polystyrene filmInfo
- Publication number
- JPH08238672A JPH08238672A JP4304995A JP4304995A JPH08238672A JP H08238672 A JPH08238672 A JP H08238672A JP 4304995 A JP4304995 A JP 4304995A JP 4304995 A JP4304995 A JP 4304995A JP H08238672 A JPH08238672 A JP H08238672A
- Authority
- JP
- Japan
- Prior art keywords
- film
- refractive index
- thickness
- syndiotactic
- breakdown voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はシンジオタクチックポリ
スチレン系フィルムに関し、より詳しくは、ハンドリン
グ性および均一性に優れ、且つ絶縁破壊電圧に優れたポ
リスチレン系フィルムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a syndiotactic polystyrene film, and more particularly to a polystyrene film which is excellent in handleability and uniformity and has a high dielectric breakdown voltage.
【０００２】[0002]
【従来の技術】シンジオタクチックスチレン系重合体を
主成分とする樹脂組成物を二軸延伸し、熱固定した二軸
延伸フィルムは、耐熱性、電気的特性などに優れ、フィ
ルムコンデンサの誘電体に用途展開されている（例え
ば、特開平２−１４３８５１号公報、特開平３−１２４
７５０号公報、特開平５−２００８５８号公報）。2. Description of the Related Art A biaxially stretched film obtained by biaxially stretching a resin composition containing a syndiotactic styrene-based polymer as a main component and heat-fixing is excellent in heat resistance and electrical characteristics, and is a dielectric material for film capacitors. Has been used for various purposes (for example, JP-A-2-143851 and JP-A-3-124).
750, JP-A-5-200858).
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、これら
従来のシンジオタクチックポリスチレン系フィルムにお
いては、絶縁破壊電圧が不良であったり、またはフィル
ムの厚みむらが大きいために絶縁破壊電圧のばらつきが
生じたり、あるいはこれらフィルムをコンデンサに用い
ると容量のばらつきが発生するという問題があった。す
なわち、絶縁破壊電圧が不良となった場合、フィルム厚
を厚くする必要が生じ、その結果コンデンサの体積が大
きくなるという問題があり、また、容量や絶縁破壊電圧
のばらつきが大きい場合、コンデンサの信頼性が得られ
ないという問題があった。However, in these conventional syndiotactic polystyrene-based films, the dielectric breakdown voltage is poor, or variations in the dielectric breakdown voltage occur due to large thickness unevenness of the film, Alternatively, when these films are used for capacitors, there is a problem that variations in capacitance occur. That is, when the breakdown voltage becomes defective, there is a problem that it is necessary to increase the film thickness, and as a result, the volume of the capacitor increases, and when the capacitance and the breakdown voltage vary widely, the reliability of the capacitor is increased. There was a problem that the sex could not be obtained.
【０００４】また、コンデンサの小型化、靜電容量の増
大の観点から、現在、誘電体の薄手化が強く求められて
いる。しかし、シンジオタクチックポリスチレン系フィ
ルムを単に薄手化したのでは、フィルムの製造時及び加
工時のハンドリング特性が不良となる。Further, from the viewpoint of miniaturization of capacitors and increase of electrostatic capacity, thinning of dielectrics is currently strongly demanded. However, if the syndiotactic polystyrene-based film is simply thinned, the handling properties during the production and processing of the film will be poor.
【０００５】本発明の目的は、このような実情に鑑み、
ハンドリング性および厚み均一性に優れ、且つ絶縁破壊
電圧に優れたポリスチレン系フィルムを提供することに
ある。In view of such circumstances, the object of the present invention is to
An object of the present invention is to provide a polystyrene-based film which is excellent in handleability and thickness uniformity and is also excellent in dielectric breakdown voltage.
【０００６】[0006]
【課題を解決するための手段】本発明のポリスチレン系
フィルムは、シンジオタクチック構造を有するスチレン
系重合体からなり、複屈折の最大値ΔｎMAX と最小値Δ
ｎMIN の差ΔｎMAX −ΔｎMIN が０．０１以下であり、
且つ平均屈折率が１．５８２以上１．５９０以下である
ことを特徴とするものである。The polystyrene film of the present invention comprises a styrene polymer having a syndiotactic structure, and has a maximum birefringence value Δn MAX and a minimum birefringence value Δn MAX.
the difference Δn MAX -Δn MIN of n MIN is less than or equal to 0.01,
The average refractive index is 1.582 or more and 1.590 or less.
【０００７】以下、本発明について詳細に説明する。本
発明のポリスチレン系フィルムの複屈折の最大値Δｎ
MAX と最小値ΔｎMINの差ΔｎMAX −ΔｎMIN は０．０
１以下であり、好ましくは０．００８以下であり、更に
好ましくは０．００７以下である。差ΔｎMAX −Δｎ
MIN が０．０１より大きい場合には厚みむらが大きくな
るため、フィルムの絶縁破壊電圧の絶対値の変動が大き
くなり且つ容量変化が増大するため、コンデンサとして
の信頼性が低くなる。Hereinafter, the present invention will be described in detail. Maximum value of birefringence Δn of the polystyrene film of the present invention
The difference between MAX and minimum value Δn MIN is Δn MAX −Δn MIN is 0.0
It is 1 or less, preferably 0.008 or less, and more preferably 0.007 or less. Difference Δn MAX −Δn
When MIN is larger than 0.01, the thickness unevenness becomes large, the fluctuation of the absolute value of the dielectric breakdown voltage of the film becomes large, and the capacitance change increases, so that the reliability as a capacitor becomes low.
【０００８】本発明のポリスチレン系フィルムの平均屈
折率は、下限については１．５８２以上であり、好まし
くは１．５８４以上である。平均屈折率が１．５８２未
満では絶縁破壊電圧が不良となり、さらにハンドリング
性が不良となる。また、平均屈折率の上限については
１．５９０以下であり、好ましくは１．５８９以下であ
り、更に好ましくは１．５８８以下である。平均屈折率
が１．５９０より大きくなると厚みむらが大きくなるた
め、フィルムの絶縁破壊電圧の絶対値の変動が大きくな
り且つ容量変化が増大するため、コンデンサとしての信
頼性が低くなる。The lower limit of the average refractive index of the polystyrene film of the present invention is 1.582 or more, preferably 1.584 or more. If the average refractive index is less than 1.582, the dielectric breakdown voltage becomes poor and the handling property becomes poor. The upper limit of the average refractive index is 1.590 or less, preferably 1.589 or less, and more preferably 1.588 or less. When the average refractive index is larger than 1.590, the thickness unevenness becomes large, the variation of the absolute value of the dielectric breakdown voltage of the film becomes large, and the capacitance change becomes large, so that the reliability as a capacitor becomes low.
【０００９】本発明に用いられるシンジオタクチック構
造を有するスチレン系重合体とは、立体化学構造がシン
ジオタクチック構造、すなわち炭素−炭素結合から形成
された主鎖に対して側鎖であるフェニル基や置換フェニ
ル基が交互に反対方向に位置する立体構造を有するもの
である。本発明において、シンジオタクチック構造スチ
レン系重合体は、核磁気共鳴法（13Ｃ−ＮＭＲ法）によ
り定量されるタクティシティが、ダイアッド（構成単位
が２個）で８５％以上、ペンタッド（構成単位が５個）
で５０％以上のシンジオタクチック構造であることが望
ましい。The styrene polymer having a syndiotactic structure used in the present invention is a phenyl group having a stereochemical structure of syndiotactic structure, that is, a side chain with respect to a main chain formed from carbon-carbon bonds. And a substituted phenyl group have a three-dimensional structure in which they are alternately located in opposite directions. In the present invention, the syndiotactic styrene-based polymer has a tacticity quantified by a nuclear magnetic resonance method ( 13 C-NMR method) of 85% or more in a diad (two constitutional units) and a pentad (constitutional unit). 5)
It is desirable to have a syndiotactic structure of 50% or more.
【００１０】本発明におけるスチレン系重合体として
は、例えば、ポリスチレン、ポリ（ｐ- 、ｍ- 又はｏ-
メチルスチレン）、ポリ（２，４−、２，５−、３，４
−又は３，５−ジメチルスチレン）、ポリ（ｐ- ターシ
ャリーブチルスチレン）などのポリ（アルキルスチレ
ン）； ポリ（ｐ- 、ｍ- 又はｏ- クロロスチレン）、
ポリ（ｐ- 、ｍ- 又はｏ- ブロモスチレン）、ポリ（ｐ
- 、ｍ- 又はｏ- フロオロスチレン）、ポリ（ｏ- メチ
ル- ｐ- フロオロスチレン）などのポリ（ハロゲン化ス
チレン）； ポリ（ｐ- 、ｍ- 又はｏ- クロロメチルス
チレン）などのポリ（ハロゲン置換アルキルスチレ
ン）； ポリ（ｐ- 、ｍ- 又はｏ- メトキシスチレ
ン）、ポリ（ｐ- 、ｍ- 又はｏ- エトキシスチレン）な
どのポリ（アルコキシスチレン）； ポリ（ｐ- 、ｍ-
又はｏ- カルボキシメチルスチレン）などのポリ（カル
ボキシアルキルスチレン）； ポリ（ｐ- ビニルベンジ
ルプロピルエーテル）などのポリ（アルキルエーテルス
チレン）； ポリ（ｐ- トリメチルシリルスチレン）な
どのポリ（アルキルシリルスチレン）； さらにはポリ
（ビニルベンジルジメトキシホスファイド）などが挙げ
られる。Examples of the styrene polymer in the present invention include polystyrene, poly (p-, m- or o-.
Methylstyrene), poly (2,4-, 2,5-, 3,4
-Or 3,5-dimethylstyrene), poly (alkylstyrene) such as poly (p-tert-butylstyrene); poly (p-, m- or o-chlorostyrene),
Poly (p-, m- or o-bromostyrene), poly (p
-, M- or o- fluorostyrene), poly (o-methyl-p-fluorostyrene) and other poly (halogenated styrene); poly (p-, m- or o-chloromethylstyrene) and other poly (Halogen-substituted alkylstyrene); poly (p-, m- or o-methoxystyrene), poly (p-, m- or o-ethoxystyrene), and other poly (alkoxystyrene); poly (p-, m-
Or poly (carboxyalkylstyrene) such as o-carboxymethylstyrene); poly (alkyletherstyrene) such as poly (p-vinylbenzylpropyl ether); poly (alkylsilylstyrene) such as poly (p-trimethylsilylstyrene); Further, poly (vinylbenzyldimethoxyphosphide) and the like can be mentioned.
【００１１】本発明においては、前記スチレン系重合体
のなかで、特にポリスチレンが好適である。また、本発
明で用いるシンジオタクチック構造を有するスチレン系
重合体は、必ずしも単一化合物である必要はなく、シン
ジオタクティシティが前記範囲内であれば、アタクチッ
ク構造やアイソタクチック構造のスチレン系重合体との
混合物や、スチレン系共重合体及びそれらの混合物でも
よい。In the present invention, polystyrene is particularly preferable among the styrene polymers. Further, the styrene-based polymer having a syndiotactic structure used in the present invention does not necessarily have to be a single compound. It may be a mixture with a polymer, a styrene-based copolymer or a mixture thereof.
【００１２】また本発明に用いるスチレン系重合体は、
重量平均分子量が好ましくは１０，０００以上、更に好
ましくは５０，０００以上である。重量平均分子量が１
０，０００未満のものでは、強伸度特性や耐熱性に優れ
たフィルムを得られにくくなる。重量平均分子量の上限
については、特に限定されるものではないが、１，５０
０，０００以上では、延伸張力の増加に伴う破断の発生
などが生じるため余り好ましくない。The styrenic polymer used in the present invention is
The weight average molecular weight is preferably 10,000 or more, more preferably 50,000 or more. Weight average molecular weight is 1
If it is less than 10,000, it becomes difficult to obtain a film having excellent strength and elongation characteristics and heat resistance. The upper limit of the weight average molecular weight is not particularly limited, but 1,50
If it is more than 10,000, breakage may occur with an increase in stretching tension, which is not preferable.
【００１３】本発明に用いるシンジオタクチックスチレ
ン系重合体には必要に応じて、公知の酸化防止剤、帯電
防止剤、滑り性を付与するための微粒子等を適量配合す
ることができる。これら各種添加剤の配合量の合計は、
シンジオタクチックスチレン系重合体１００重量部に対
して１０重量部以下が望ましい。１０重量部を超えると
延伸時に破断を起こしやすくなり、生産安定性不良とな
るので好ましくない。If necessary, the syndiotactic styrene polymer used in the present invention may contain known antioxidants, antistatic agents, fine particles for imparting lubricity, and the like in appropriate amounts. The total amount of these various additives is
The amount is preferably 10 parts by weight or less based on 100 parts by weight of the syndiotactic styrene polymer. If it exceeds 10 parts by weight, breakage easily occurs during stretching, resulting in poor production stability.
【００１４】微粒子としては、例えば、シリカ、二酸化
チタン、タルク、カオリナイト、ゼオライト等の金属酸
化物、炭酸カルシウム、リン酸カルシウム、硫酸バリウ
ムなどの金属の塩、シリコーン樹脂、架橋ポリスチレン
等の有機重合体からなる粒子等が挙げられる。これら微
粒子は、いずれか一種を単独で用いてもよく、また２種
以上を併用してもよい。使用する微粒子の平均粒子系
は、０．０１μｍ以上２．０μｍ以下が好ましく、特に
０．０５μｍ以上１．５μｍ以下が好ましく、粒子径の
ばらつき度（標準偏差と平均粒子径との比率）が２５％
以下であることが好ましい。これら微粒子の添加量は、
シンジオタクチックスチレン系重合体１００重量部に対
して０．００５重量部以上２．０重量部以下とすること
が好ましく、特に０．０１重量部以上１．０重量部以下
が好ましい。Examples of the fine particles include metal oxides such as silica, titanium dioxide, talc, kaolinite and zeolite, metal salts such as calcium carbonate, calcium phosphate and barium sulfate, organic polymers such as silicone resin and crosslinked polystyrene. And the like. Any one of these fine particles may be used alone, or two or more thereof may be used in combination. The average particle system of the fine particles used is preferably 0.01 μm or more and 2.0 μm or less, particularly preferably 0.05 μm or more and 1.5 μm or less, and the degree of variation in particle size (the ratio of the standard deviation to the average particle size) is 25. %
The following is preferred. The amount of these fine particles added is
The amount is preferably 0.005 parts by weight or more and 2.0 parts by weight or less, and particularly preferably 0.01 parts by weight or more and 1.0 parts by weight or less, relative to 100 parts by weight of the syndiotactic styrene polymer.
【００１５】本発明のポリスチレン系フィルムの前記平
均屈折率は、フィルムの製膜条件により調整される。す
なわち、一般に、延伸倍率を大きくすると平均屈折率が
大きくなり、延伸温度を高くすると平均屈折率が小さく
なり、熱固定温度を高くすると平均屈折率が大きくな
る。得られたフィルムの平均屈折率および複屈折の最大
値ΔｎMAX と最小値ΔｎMI N の差ΔｎMAX −ΔｎMIN が
前記所定の範囲に入るならば製造条件は特に限定されな
いが、公知の方法、例えば、縦延伸及び横延伸を順に行
なう逐次二軸延伸方法のほか、横・縦・縦延伸法、縦・
横・縦延伸法、縦・縦・横延伸法などの延伸方法を採用
することができ、要求される強度や寸法安定性などの諸
特性に応じて選択される。また、熱固定処理、縦弛緩処
理、横弛緩処理などを施すことができる。また、蒸着層
の接着特性等を向上するために、インラインコートやオ
フラインコートにより接着層を設けたり、コロナ処理や
火炎プラズマ処理等を行なうことができる。The average refractive index of the polystyrene film of the present invention is adjusted by the film forming conditions. That is, in general, increasing the draw ratio increases the average refractive index, increasing the drawing temperature decreases the average refractive index, and increasing the heat setting temperature increases the average refractive index. The production conditions are not particularly limited as long as the difference Δn MAX −Δn MIN between the maximum value Δn MAX and the minimum value Δn MI N of the average refractive index and the birefringence of the obtained film is within the above-mentioned predetermined range, but a known method, For example, in addition to the sequential biaxial stretching method in which longitudinal stretching and transverse stretching are carried out in order, transverse / longitudinal / longitudinal stretching method, longitudinal
A stretching method such as a transverse / longitudinal stretching method or a longitudinal / longitudinal / transverse stretching method can be adopted, and is selected according to various characteristics such as required strength and dimensional stability. Further, heat setting treatment, vertical relaxation treatment, lateral relaxation treatment, etc. can be performed. Further, in order to improve the adhesive property of the vapor deposition layer, an adhesive layer can be provided by in-line coating or off-line coating, corona treatment or flame plasma treatment can be performed.
【００１６】[0016]
【実施例】以下に実施例にて本発明を具体的に説明する
が、本発明はこれら実施例のみに限定されるものではな
い。まず、フィルムの評価方法を以下に示す。EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. First, the evaluation method of the film is shown below.
【００１７】(1) 平均屈折率、複屈折の最大値と最小値
の差ΔｎMAX −ΔｎMIN 図１に示すように、各実施例で得られたフィルム(F) か
ら、フィルム(F) 長手方向に１０ｃｍごとに４ｃｍ×２
ｃｍの１０コの測定用サンプル(1)(2)(3)(4)……(10)を
切り出した。アタゴ光学社製アッベ屈折計４Ｔを用い
て、上記各測定用サンプルそれぞれについて、屈折率を
フィルム(F) 長手方向、幅方向および厚み方向について
測定し、これら３方向の屈折率を平均し屈折率ｎ1 、ｎ
2 、ｎ3 、ｎ4 、……、ｎ10を求めた。これら１０コの
屈折率の平均値（ｎ1 ＋ｎ2 ＋ｎ3 ＋ｎ4 ＋……＋
ｎ10）／１０を平均屈折率とした。また、各測定用サン
プルそれぞれについて、幅方向の屈折率と長手方向の屈
折率の差の絶対値を算出し、それらの最大のものΔｎ
MAX と最少のものΔｎMIN の差ΔｎMAX −ΔｎMIN の差
を複屈折の最大値と最小値の差とした。(1) Difference between maximum and minimum values of average refractive index and birefringence Δn MAX −Δn MIN As shown in FIG. 1, from the film (F) obtained in each Example, the film (F) longitudinal 4 cm x 2 for every 10 cm in the direction
10 measurement samples (1) (2) (3) (4) ... (10) of 10 cm were cut out. Using the Abbe refractometer 4T manufactured by Atago Optical Co., the refractive index of each of the above measurement samples was measured in the longitudinal direction, width direction and thickness direction of the film (F), and the refractive index in these three directions was averaged to obtain the refractive index. n 1 , n
2 , n 3 , n 4 , ..., N 10 were obtained. The average value of the refractive index of these 10 (n 1 + n 2 + n 3 + n 4 + ... +
The average refractive index was n 10 ) / 10. For each measurement sample, the absolute value of the difference between the refractive index in the width direction and the refractive index in the longitudinal direction is calculated, and the maximum value of them Δn
The difference between the difference Δn MAX -Δn MIN of MAX and minimum ones [Delta] n MIN and the difference between the maximum value and the minimum value of the birefringence.
【００１８】(2) 絶縁破壊電圧 ＪＩＳ Ｃ−２３１８に準じて行なった。１０ＫＶ直流
耐電圧試験機を用い、２３℃、５０％ＲＨの雰囲気下に
おいて、１００Ｖ／ｓｅｃの昇圧速度で、フィルムが破
壊し短絡したときの電圧を読み取った。(2) Dielectric breakdown voltage It was performed according to JIS C-2318. Using a 10 KV DC withstanding voltage tester, the voltage when the film was broken and short-circuited was read at a pressure rising rate of 100 V / sec in an atmosphere of 23 ° C. and 50% RH.
【００１９】(3) 厚みむら ミクロン計測器社製連続厚さ測定器により、フィルムの
幅方向の中央部を長手方向に沿って測定し、次式により
算出した。 厚みむら＝［（最大厚さ−最少厚さ）／平均厚さ］×１
００（％） 得られた厚みむらの値から、次のように評価した。 １級：厚みむら≧１０％ ２級：８％≦厚みむら＜１０％ ３級：６％≦厚みむら＜８％ ４級：４％≦厚みむら＜６％ ５級：厚みむら＜４％(3) Thickness unevenness A continuous thickness measuring instrument manufactured by Micron Instruments Co., Ltd. was used to measure the central portion in the width direction of the film along the longitudinal direction, and the thickness was calculated by the following formula. Thickness unevenness = [(maximum thickness-minimum thickness) / average thickness] x 1
00 (%) The value of the obtained thickness unevenness was evaluated as follows. Grade 1: Thickness unevenness ≧ 10% Grade 2: 8% ≦ Thickness unevenness <10% Grade 3: 6% ≦ Thickness unevenness <8% Grade 4: 4% ≦ Thickness unevenness <6% Grade 5: Thickness unevenness <4%
【００２０】(4) フィルムのハンドリング特性 広幅のスリットロールを高速でスリットし、小幅のロー
ルに巻直すに際しロール端部の巻ずれ、しわ、バルブ等
を生じないで問題のないロールが得られるかどうかを４
段階評価し、次のランク付けで評価した。 １級：問題のないスリットロールを得ることは極めて困
難 ２級：低速で問題のないスリットロールが得られる ３級：中速で問題のないスリットロールが得られる ４級：高速で問題のないスリットロールが得られる(4) Film handling characteristics Is it possible to obtain a satisfactory roll without causing misalignment of the roll end, wrinkles, valves, etc. when a wide slit roll is slit at a high speed and rewound into a narrow roll? Please 4
It was evaluated on a scale and evaluated according to the following ranking. 1st grade: It is extremely difficult to obtain a problem-free slit roll 2nd grade: A low-quality slit roll can be obtained 3rd grade: A medium-speed slit roll can be obtained 4th grade: A high-speed slit that does not have a problem Roll is obtained
【００２１】(5) 平均粒子径 微粒子を（株）日立製作所製Ｓ−５１０型走査型電子顕
微鏡で観察し、写真撮影したものを拡大して複写し、微
粒子の外形をトレースし任意に２００個の粒子を黒く塗
りつぶした。この像をニコレ（株）製ルーゼックス５０
０型画像解析装置を用いて、それぞれの粒子の水平方向
のフェレ径を測定し、その平均値を平均粒子径とした。
また、粒子径のばらつき度は下記の式により算出した。 ばらつき度＝（粒子径の標準偏差／平均粒子径）×１０
０（％）(5) Average Particle Size Fine particles are observed with a S-510 scanning electron microscope manufactured by Hitachi, Ltd., and a photograph is enlarged and copied to trace the outer shape of the fine particles and optionally 200 particles. Particles are painted black. This image is made by Nicolet Co., Ltd. Luzex 50
The Feret diameter in the horizontal direction of each particle was measured using a 0 type image analyzer, and the average value was taken as the average particle diameter.
The degree of variation in particle size was calculated by the following formula. Variability = (standard deviation of particle diameter / average particle diameter) × 10
0 (%)
【００２２】［実施例１］滑剤として、平均粒子径０．
５μｍ、ばらつき度２０％、面積形状係数８０％のシリ
カを、シンジオタクチックポリスチレン（重量平均分子
量２５０，０００）１００重量部に対して０．５重量部
添加したポリマーチップと、滑剤の添加されていない前
記シンジオタクチックポリスチレンのポリマーチップを
重量比で１対９の割合で混合した後、乾燥し、２９０℃
で溶融し、８００μｍのリップギャップのＴダイから押
し出し、５０℃の冷却ロールに靜電印荷法により密着・
冷却固化し、６０μｍの無定形シートを得た。該無定形
シートをまず金属ロールにより９５℃に予熱し、表面温
度１４０℃のセラミックロールを用い縦方向に３倍延伸
した後冷却し、更に１２０℃の金属ロールを用い縦方向
に１．２倍延伸した。次いで、テンターでフィルムを１
１０℃に予熱し、横方向に延伸温度１２０℃で２倍延伸
し、更に１５０℃で１．６倍延伸した後、２６０℃で１
０秒熱固定処理した。その後、２２０℃で３％横弛緩処
理した。得られたフィルムの厚みは５．３μｍであり、
走行性、ハンドリング性が良好であった。得られたフィ
ルムの物性を表１に示す。Example 1 As a lubricant, an average particle size of 0.
A polymer chip was prepared by adding 0.5 parts by weight of silica having 5 μm, a degree of variation of 20%, and an area shape factor of 80% to 100 parts by weight of syndiotactic polystyrene (weight average molecular weight 250,000), and a lubricant was added. The above syndiotactic polystyrene polymer chips were mixed at a weight ratio of 1: 9, dried, and dried at 290 ° C.
Melted and extruded from a T-die with a lip gap of 800 μm, and adhered to a cooling roll at 50 ° C by the electrostatic charge method.
It was cooled and solidified to obtain a 60 μm amorphous sheet. The amorphous sheet was first preheated to 95 ° C. with a metal roll, stretched 3 times in the longitudinal direction using a ceramic roll having a surface temperature of 140 ° C., and then cooled, and further 1.2 times in the longitudinal direction using a metal roll at 120 ° C. It was stretched. Then roll the film with a tenter.
Preheated to 10 ° C, stretched 2 times in the transverse direction at a stretching temperature of 120 ° C, further stretched 1.6 times at 150 ° C, and then stretched at 260 ° C for 1 time.
It was heat-set for 0 seconds. Then, a lateral relaxation treatment was performed at 220 ° C. for 3%. The thickness of the obtained film was 5.3 μm,
The runnability and handleability were good. Table 1 shows the physical properties of the obtained film.
【００２３】［実施例２］縦延伸を１４０℃のセラミッ
クロールにおいて２．４倍延伸した後、一度冷却し、更
に１２０℃の金属ロールで１．５倍延伸した以外は、実
施例１と同様に行なった。得られたフィルムの厚みは
５．３μｍであった。得られたフィルムの物性を表１に
示す。[Example 2] Same as Example 1 except that the film was longitudinally stretched 2.4 times on a ceramic roll at 140 ° C, cooled once, and further stretched 1.5 times on a metal roll at 120 ° C. I went to. The thickness of the obtained film was 5.3 μm. Table 1 shows the physical properties of the obtained film.
【００２４】［実施例３］テンターでフィルムを１２５
℃に予熱し、横方向に延伸温度１２０℃で２倍延伸し、
更に１５０℃で１．６倍延伸した以外は、実施例１と同
様に行なった。得られたフィルムの厚みは５．３μｍで
あった。得られたフィルムの物性を表１に示す。[Embodiment 3] The film is put to 125 with a tenter.
Preheated to ℃, and stretched in the transverse direction at a stretching temperature of 120 ℃ 2 times,
The procedure of Example 1 was repeated, except that the film was stretched 1.6 times at 150 ° C. The thickness of the obtained film was 5.3 μm. Table 1 shows the physical properties of the obtained film.
【００２５】［比較例１］縦延伸１４３℃のセラミック
ロールにおいて２．４倍延伸した後冷却せず、更に１２
０℃の金属ロールで１．５倍延伸した以外は実施例１と
同様に行なった。得られたフィルムの厚みは５．３μｍ
であった。得られたフィルムの物性を表１に示す。[Comparative Example 1] Longitudinal stretching A ceramic roll having a temperature of 143 ° C. was stretched 2.4 times and then was not cooled.
The same procedure as in Example 1 was performed except that the film was stretched 1.5 times with a metal roll at 0 ° C. The thickness of the obtained film is 5.3 μm
Met. Table 1 shows the physical properties of the obtained film.
【００２６】［比較例２］テンターでフィルムを１３０
℃に予熱し、横方向に延伸温度１３０℃で２倍延伸し、
更に１５０℃で１．６倍延伸した以外は、実施例１と同
様に行なった。得られたフィルムの厚みは５．３μｍで
あった。得られたフィルムの物性を表１に示す。[Comparative Example 2] 130 films were formed using a tenter.
Preheated to ℃, and then stretched in the transverse direction twice at a stretching temperature of 130 ℃,
The procedure of Example 1 was repeated, except that the film was stretched 1.6 times at 150 ° C. The thickness of the obtained film was 5.3 μm. Table 1 shows the physical properties of the obtained film.
【００２７】［比較例３］滑剤として、平均粒子径０．
５μｍ、ばらつき度２０％、面積形状係数８０％のシリ
カを、シンジオタクチックポリスチレン（重量平均分子
量２５０，０００）１００重量部に対して０．５重量部
添加したポリマーチップと、滑剤の添加されていない前
記シンジオタクチックポリスチレンのポリマーチップを
重量比で１対９の割合で混合した後、乾燥し、２９０℃
で溶融し、８００μｍのリップギャップのＴダイから押
し出し、５０℃の冷却ロールに靜電印荷法により密着・
冷却固化し、４８μｍの無定形シートを得た。無定形シ
ートをまず金属ロールにより９５℃に予熱し、表面温度
１４０℃のセラミックロールを用い縦方向に３倍延伸し
た。次いで、テンターでフィルムを１２０℃に予熱し、
横方向に延伸温度１２０℃で２倍延伸し、更に１５０℃
で１．５倍延伸した後、２６０℃で１０秒熱固定処理し
た。その後、２２０℃で３％横弛緩処理した。得られた
フィルムの厚みは５．３μｍであった。得られたフィル
ムの物性を表１に示す。[Comparative Example 3] As a lubricant, an average particle diameter of 0.
A polymer chip was prepared by adding 0.5 parts by weight of silica having 5 μm, a degree of variation of 20%, and an area shape factor of 80% to 100 parts by weight of syndiotactic polystyrene (weight average molecular weight 250,000), and a lubricant was added. The above syndiotactic polystyrene polymer chips were mixed at a weight ratio of 1: 9, dried, and dried at 290 ° C.
Melted and extruded from a T-die with a lip gap of 800 μm, and adhered to a cooling roll at 50 ° C by the electrostatic charge method.
It was cooled and solidified to obtain a 48 μm amorphous sheet. The amorphous sheet was first preheated to 95 ° C. with a metal roll and stretched 3 times in the machine direction using a ceramic roll with a surface temperature of 140 ° C. Then preheat the film to 120 ° C with a tenter,
Stretched 2 times in the transverse direction at a stretching temperature of 120 ° C, then 150 ° C
Then, the film was stretched 1.5 times by heating at 260 ° C. and heat-set at 260 ° C. for 10 seconds. Then, a lateral relaxation treatment was performed at 220 ° C. for 3%. The thickness of the obtained film was 5.3 μm. Table 1 shows the physical properties of the obtained film.
【００２８】[0028]
【表１】 [Table 1]
【００２９】表１より、実施例１、２、３で得られたフ
ィルムはフィルム製造時のハンドリング性および厚み均
一性に優れ、且つ絶縁破壊電圧に優れたものであること
が分かる。一方、比較例１で得られたフィルムは平均屈
折率が１．５８１と小さく、ハンドリング性に劣る。比
較例２で得られたフィルムは複屈折の最大値と最小値の
差ΔｎMAX −ΔｎMIN が０．０１１と大きく、厚み均一
性に劣る。また、比較例３で得られたフィルムは平均屈
折率が１．５９１と大きく、やはり厚み均一性に劣る。From Table 1, it can be seen that the films obtained in Examples 1, 2 and 3 are excellent in handling property and thickness uniformity during the production of the film, and also excellent in dielectric breakdown voltage. On the other hand, the film obtained in Comparative Example 1 has a small average refractive index of 1.581 and is inferior in handleability. The film obtained in Comparative Example 2 has a large difference Δn MAX −Δn MIN between the maximum and minimum values of birefringence of 0.011 and is inferior in thickness uniformity. In addition, the film obtained in Comparative Example 3 has a large average refractive index of 1.591 and is also inferior in thickness uniformity.
【００３０】[0030]
【発明の効果】本発明のポリスチレン系フィルムは、上
述のように構成されており、ハンドリング性および厚み
均一性に優れ、且つ絶縁破壊電圧に優れるものである。
従って、本発明のポリスチレン系フィルムは、特にコン
デンサ用として有用であり、工業的価値は非常に大き
い。EFFECT OF THE INVENTION The polystyrene film of the present invention is constructed as described above, and is excellent in handling property and thickness uniformity, and also excellent in dielectric breakdown voltage.
Therefore, the polystyrene film of the present invention is particularly useful for capacitors and has a great industrial value.
【図１】フィルムの平均屈折率および複屈折の測定方法
を説明するための図である。FIG. 1 is a diagram for explaining a method for measuring an average refractive index and a birefringence of a film.
(F) …フィルム (1)(2)(3)(4)…測定用サンプル (F)… Films (1) (2) (3) (4)… Samples for measurement
Claims (1)
ン系重合体からなり、複屈折の最大値ΔｎMAX と最小値
ΔｎMIN の差ΔｎMAX −ΔｎMIN が０．０１以下であ
り、且つ平均屈折率が１．５８２以上１．５９０以下で
あることを特徴とするポリスチレン系フィルム。1. A styrene-based polymer having a syndiotactic structure, wherein the difference Δn MAX −Δn MIN between the maximum value Δn MAX and the minimum value Δn MIN of birefringence is 0.01 or less, and the average refractive index is A polystyrene-based film having a thickness of 1.582 or more and 1.590 or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4304995A JP3567516B2 (en) | 1995-03-02 | 1995-03-02 | Polystyrene film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4304995A JP3567516B2 (en) | 1995-03-02 | 1995-03-02 | Polystyrene film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08238672A true JPH08238672A (en) | 1996-09-17 |
| JP3567516B2 JP3567516B2 (en) | 2004-09-22 |
Family
ID=12653033
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4304995A Expired - Lifetime JP3567516B2 (en) | 1995-03-02 | 1995-03-02 | Polystyrene film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3567516B2 (en) |
-
1995
- 1995-03-02 JP JP4304995A patent/JP3567516B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP3567516B2 (en) | 2004-09-22 |
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