JPH0821643B2 - Package structure - Google Patents

Package structure

Info

Publication number
JPH0821643B2
JPH0821643B2 JP63105494A JP10549488A JPH0821643B2 JP H0821643 B2 JPH0821643 B2 JP H0821643B2 JP 63105494 A JP63105494 A JP 63105494A JP 10549488 A JP10549488 A JP 10549488A JP H0821643 B2 JPH0821643 B2 JP H0821643B2
Authority
JP
Japan
Prior art keywords
solder
insulating substrate
substrate
package
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63105494A
Other languages
Japanese (ja)
Other versions
JPH01278051A (en
Inventor
恒太郎 能勢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP63105494A priority Critical patent/JPH0821643B2/en
Publication of JPH01278051A publication Critical patent/JPH01278051A/en
Publication of JPH0821643B2 publication Critical patent/JPH0821643B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、絶縁基板パッケージ構造体に関し、特に、
絶縁基板の底部をハンダ接合するときに好都合な基板パ
ッケージ構造体に関する。
TECHNICAL FIELD The present invention relates to an insulating substrate package structure, and in particular,
The present invention relates to a substrate package structure which is convenient when soldering the bottom of an insulating substrate.

[従来の技術] 従来、電子部品パッケージ構造において、絶縁基板上
にICなどを搭載し、その絶縁基板をメタルパッケージベ
ースに接合し、ハーメチックパッケージするものであ
る。この場合、絶縁基板をロウ付けしたり、はんだ付け
で、ベースに取り付ける方法がある。
[Prior Art] Conventionally, in an electronic component package structure, an IC or the like is mounted on an insulating substrate, and the insulating substrate is bonded to a metal package base to form a hermetic package. In this case, there is a method of attaching the insulating substrate to the base by brazing or soldering.

このようなパッケージ混成集積回路の構造としては、
その絶縁基板(裏)表面を、Mo−Mn法或いは活性金属法
などにより、ロウ付け可能にしたり、或いはベーパーコ
ーテイングを用いたり、或いはAgペーストを焼き付け
て、はんだ付け可能な状態にし、その上にロウ付け(或
いははんだ付け)する方法が、取られ実用されている。
As a structure of such a package hybrid integrated circuit,
The surface of the insulating substrate (back) can be brazed by the Mo-Mn method or the active metal method, or vapor coating can be used, or Ag paste can be baked to make it ready for soldering. A brazing (or soldering) method has been adopted and put into practical use.

このような従来法では、リードピンとパッケージのベ
ースが、はんだ付けにより短絡したり、また、短絡しな
いようにはんだ付け個所を、充分に分離する必要があっ
た。その結果、充分な接合面積をとれなかったり、平行
性がとれない場合があり、接合層の厚さがバラツキ、基
板の端部に隙間が生じるおそれがあった。
In such a conventional method, it is necessary to sufficiently separate the lead pin and the package base from each other so that the lead pin and the package base are short-circuited by soldering or are not short-circuited. As a result, a sufficient bonding area may not be obtained or parallelism may not be achieved, the thickness of the bonding layer may vary, and a gap may occur at the end of the substrate.

また、作業に習熟を必要とする等の短所があった。歩
留りや信頼性も十分なものがなかった。また、放熱特性
のバラツキも、良くなかった。
In addition, there is a disadvantage that it requires skill to work. The yield and reliability were not sufficient. Also, the variation in heat dissipation characteristics was not good.

[発明が解決しようとする問題点] 本発明は、セラミックス基板に絶縁体を厚膜印刷する
ことにより、メタルパッケージとの間のはんだ付けによ
る接合を行なう時に、リードピンとパッケージ間の短絡
の歩留りと信頼性と放熱特性と、基板端のワイヤーボン
デイング特性を向上できる絶縁基板パッケージ構造体を
提供するものである。
[Problems to be Solved by the Invention] According to the present invention, by printing a thick film of an insulator on a ceramic substrate, the yield of a short circuit between a lead pin and a package can be improved when a soldering joint with a metal package is performed. Provided is an insulating substrate package structure capable of improving reliability, heat dissipation characteristics, and wire bonding characteristics at a substrate end.

[発明の構成] [問題点を解決するための手段] 本発明の要旨とするものは、リード差込用穴を有する
絶縁基板を有するメタルハーメチックパッケージ構造体
において、該絶縁基板の底表面の該リード差込用穴の周
囲に、ハンダ流れ防止凸条部を設け、ハンダで該絶縁基
板の底面にメタライズされた導体層をメタルハーメチッ
クベース面に接合した構造を有することを特徴とする絶
縁基板を有するメタルハーメチックパッケージ構造体で
ある。
[Structure of the Invention] [Means for Solving the Problems] The gist of the present invention is to provide a metal hermetic package structure having an insulating substrate having a lead insertion hole, in which the bottom surface of the insulating substrate is A solder flow prevention ridge is provided around the lead insertion hole, and a conductive layer metallized to the bottom surface of the insulating substrate by solder is bonded to the metal hermetic base surface to form an insulating substrate. It is a metal hermetic package structure having.

[作用] 本発明によると、混成集積回路において、セラミック
ス基板をメタルハーメチックパッケージのベースにハン
ダ付けで接合する場合に、セラミックス基板の接合面に
厚膜導体を印刷形成し、焼成し、更に、絶縁体のハンダ
の流れ防止ガイドを印刷形成し、焼成し、その後に、ハ
ンダ接合するような構造を用いる混成集積回路である。
[Operation] According to the present invention, in a hybrid integrated circuit, when a ceramic substrate is joined to a metal hermetic package base by soldering, a thick film conductor is printed on the joint surface of the ceramic substrate, fired, and insulated. A hybrid integrated circuit using a structure in which a body solder flow prevention guide is printed, fired, and then soldered.

本発明による混成集積回路構造体は、リード挿込用穴
を有する絶縁基板を有するメタルハーメチックパッケー
ジ構造体において、該絶縁基板の底表面の該リード挿込
用穴の周囲にハンダ流れ防止凸条部を設け、ハンダで該
絶縁基板の底面をメタルハーメーチックベース面に接合
した構造を有するものである。
The hybrid integrated circuit structure according to the present invention is a metal hermetic package structure having an insulating substrate having a lead insertion hole, wherein a solder flow preventing ridge portion is provided around the lead insertion hole on the bottom surface of the insulating substrate. And a bottom surface of the insulating substrate is joined to the metal hermetic base surface with solder.

即ち、混成集積回路におけるセラミックス基板即ち、
絶縁基板をハンダでメタルハーメチックパッケージベー
スに接合する製造方法において、リードピンの通る基板
側の穴の周囲にハンダの流れを防ぐガイドを設けたもの
である。
That is, the ceramic substrate in the hybrid integrated circuit, that is,
In a manufacturing method of joining an insulating substrate to a metal hermetic package base with solder, a guide is provided around a hole on the substrate side through which a lead pin passes so as to prevent the flow of solder.

絶縁基板の接合面に厚膜導体を印刷し、焼成すること
に加え、絶縁基板の底面での接合するためのハンダの流
れを防止する防止ガイドを印刷焼成し、その後に、ハン
ダ接合できるような構造にしたものである。
In addition to printing and firing thick film conductors on the joint surface of the insulating substrate, printing and firing a preventive guide that prevents the flow of solder for joining at the bottom surface of the insulating substrate, and then performing solder joining It is structured.

本発明の混成集積回路は、セラミックス基板に、即
ち、絶縁基板に厚膜印刷することにより、メタルパッケ
ージとのハンダ接続するときに、リードピンとパッケー
ジベース間の短絡を完全に防止し、メタルハーメチック
パッケージの歩留りと信頼性を向上し、それにより、得
られたパッケージの放熱特性と、基板端のワイヤーボン
デイング性(接着性)が向上できる。
The hybrid integrated circuit of the present invention is capable of completely preventing a short circuit between a lead pin and a package base during solder connection with a metal package by performing thick film printing on a ceramic substrate, that is, an insulating substrate, and thus providing a metal hermetic package. Yield and reliability are improved, and thereby, the heat dissipation characteristics of the obtained package and the wire bondability (adhesiveness) of the substrate edge can be improved.

本発明は、混成集積回路におけるセラミックス基板を
メタルハーメチックパッケージベースにハンダで容易に
かつ簡便に接合することのできるパッケージ構造体を提
供するものである。即ち、セラミックス基板の接合面に
厚膜導体を印刷し、焼成することに加え、絶縁基板の接
合面上でのハンダ流れを防止するガイドを、印刷焼成し
て、形成し、その後、ハンダ接合する構造のものであ
る。
The present invention provides a package structure capable of easily and conveniently joining a ceramic substrate in a hybrid integrated circuit to a metal hermetic package base with solder. That is, in addition to printing and firing a thick film conductor on the joint surface of the ceramic substrate, a guide for preventing solder flow on the joint surface of the insulating substrate is printed and fired to form a solder joint. It is of structure.

本発明で使用するセラミックス基板即ち絶縁基板は、
通常のセラミックス基板、例えば、アルミナ基板などを
利用する。
The ceramic substrate or insulating substrate used in the present invention is
A normal ceramics substrate such as an alumina substrate is used.

また、本発明によるハンダ流れ防止凸条部(即ちガイ
ド部)は、前記のように厚膜印刷技術で容易に作製でき
る。
Also, the solder flow preventing ridge (that is, the guide) according to the present invention can be easily manufactured by the thick film printing technique as described above.

更に、本発明により用いられるハンダは、電子部品或
いは混成集積回路用として広く使用され、入手しやすい
ソルダーペーストやプリフォームハンダである。1例を
示すと、Pb−Sn共晶ハンダ、Ag入りPb−Snハンダ、Ag入
りPb−Sn共晶ハンダ等のPb−Sn系ハンダ或いはこれにAg
を微量加えた組成のものであり、厚膜印刷技術やデイス
ペンス或いはプリフォームハンダをリフローハンダ付け
するものである。
Further, the solder used according to the present invention is a solder paste or preform solder that is widely used for electronic parts or hybrid integrated circuits and is easily available. For example, Pb-Sn eutectic solder, Ag-containing Pb-Sn solder, Ag-containing Pb-Sn eutectic solder, or other Pb-Sn-based solder or Ag
It has a composition in which a small amount of is added and is used for reflow soldering thick film printing technology, dispensation or preform solder.

次に、本発明の絶縁基板構造を、具体的な実施例によ
り、説明するが、本発明は、その説明により限定される
ものではない。
Next, the insulating substrate structure of the present invention will be described with reference to specific examples, but the present invention is not limited to the description.

[実施例1] 第1図(a)は、本発明によるガイド(凸状部)付き
セラミックス基板の接合面の正面図であり、第1図
(b)は,接合された状態の断面図である。
[Example 1] Fig. 1 (a) is a front view of a bonding surface of a ceramics substrate with guides (projections) according to the present invention, and Fig. 1 (b) is a sectional view of the bonded state. is there.

即ち、リードピン3の通る穴8を複数有するセラミッ
クス基板1は、その面の大部分が、メタライズ導体又は
ハンダパターン2で覆われる。そして、リードピン穴8
の周囲に絶縁ガイド5を設ける。第1図(b)に示され
るように、絶縁ガイド5があるために、ハンダ2がはみ
だして、リードピン3と接触することが防止される。ま
た、絶縁基板1の表面の殆どに、このハンダ2を載せる
ことができるために、絶縁基板1の周辺においても、ベ
ース9と絶縁基板1との間に隙間が生じず。構造的に故
障の生じ難いものが得られる。
That is, the ceramic substrate 1 having a plurality of holes 8 through which the lead pins 3 pass has most of its surface covered with the metallized conductor or the solder pattern 2. And lead pin hole 8
An insulating guide 5 is provided around the. As shown in FIG. 1B, the insulating guide 5 prevents the solder 2 from protruding and coming into contact with the lead pin 3. Further, since the solder 2 can be placed on most of the surface of the insulating substrate 1, no gap is formed between the base 9 and the insulating substrate 1 even in the periphery of the insulating substrate 1. It is possible to obtain a product that is structurally resistant to failure.

これに対して、従来のパッケージでは、第2図に示す
構造である。即ち、第2図(a)は,従来のセラミック
ス基板の裏表面の接合面の正面図である。第2図(b)
は,それの接合された状態の断面図である。即ち、セラ
ミックス基板1は、リードピン3の通る穴8を複数有
し、メタライズ導体又はハンダパターン2は、表面の一
部にだけ形成される。そして、第2図(b)の断面図に
示すように,ハンダが、流れ、リードピンとメタルパッ
ケージベース間に短絡を起こし易いものである。また、
絶縁基板1の周辺部ではベースとの間に隙間があるの
で、ワイヤーボンデイングがし難いものになるおそれが
ある。
On the other hand, the conventional package has the structure shown in FIG. That is, FIG. 2 (a) is a front view of the bonding surface on the back surface of the conventional ceramics substrate. Fig. 2 (b)
FIG. 4 is a cross-sectional view of the joined state. That is, the ceramic substrate 1 has a plurality of holes 8 through which the lead pins 3 pass, and the metallized conductor or solder pattern 2 is formed only on a part of the surface. Then, as shown in the cross-sectional view of FIG. 2 (b), the solder flows, and a short circuit easily occurs between the lead pin and the metal package base. Also,
Since there is a gap between the insulating substrate 1 and the base in the peripheral portion, wire bonding may be difficult.

次に、このような構成の本発明の絶縁基板の構造の製
造方法を第3図(a),(b),(c)により、更に説
明する。
Next, a method of manufacturing the structure of the insulating substrate of the present invention having such a configuration will be further described with reference to FIGS. 3 (a), (b) and (c).

即ち、第3図(a)に示すようなセラミックス基板1
の分離面に、厚膜導体ペースト[デュポン(Dupont)65
02]を乾燥膜厚25μmに印刷し、厚膜メタライズ導体4
を形成し、25℃、10分間レベリングし、150℃で10分間
乾燥した後に、絶縁体ペースト[デュポン(Dupont)57
04]を乾燥膜厚40μm以上に印刷形成し、ハンダ防止絶
縁ガイド5を形成し、25℃で10分間レベリングし、150
℃で10分間乾燥した後に、850℃で10分間ピークの全部
で1時間の焼成プロフィルで焼成した。
That is, the ceramic substrate 1 as shown in FIG.
Thick film conductor paste [Dupont 65
02] is printed to a dry film thickness of 25 μm, and thick film metallized conductor 4 is printed.
Formed, leveled at 25 ° C. for 10 minutes, dried at 150 ° C. for 10 minutes, and then subjected to insulation paste [Dupont 57
04] is printed to a dry film thickness of 40 μm or more to form a solder-preventing insulating guide 5, leveled at 25 ° C for 10 minutes, then
After drying at 0 ° C. for 10 minutes, the peak was baked at 850 ° C. for 10 minutes with a total of 1 hour baking profile.

次に、第3図(b)に示すように、ソルダーペースト
(千住金属SP−60−OF−2063:Sn63 Pb35 Ag2固相178℃
液相192℃又は日本ゲンマ6220SMT262 Sn62 Pb35 Ag2共
晶179℃)のAg入り共晶ハンダを印刷し、ハンダ層4を
形成した。
Next, as shown in FIG. 3 (b), solder paste (Senju Metal SP-60-OF-2063: Sn63 Pb35 Ag2 solid phase 178 ° C.)
Liquid phase 192 ° C. or Nippon Genma 6220 SMT262 Sn62 Pb35 Ag2 eutectic 179 ° C.) eutectic solder containing Ag was printed to form a solder layer 4.

更に、第3図(c)に示すように,メタルハーメチッ
クパッケージベース上に、上記のような構造の絶縁基板
を載置し、接合部が液相温度以上になるように、加熱
し、はんだ層2が溶融した箇所で、基板の上から押さ
え、絶縁体のハンダ流れ防止ガイド5がメタルパッケー
ジベース9に接触するようにした状態で25℃で冷却す
る。
Further, as shown in FIG. 3 (c), the insulating substrate having the above-mentioned structure is placed on the metal hermetic package base and heated so that the temperature of the bonding portion becomes higher than the liquidus temperature. It is cooled at 25 ° C. in a state where 2 is melted and pressed from above the substrate so that the solder flow prevention guide 5 of the insulator comes into contact with the metal package base 9.

[発明の効果] 本発明による絶縁基板構造体では、セラミックス基板
接合面に厚膜導体を印刷、焼成することに加えて、絶縁
体のハンダ流れ防止ガイドを印刷、焼成し、その後、ハ
ンダ接合することができるもので、 第1に、リードピンとパッケージベース間が短絡しな
い構造を提供すること、 第2に、従来のように、リードピンとパッケージベー
ス間を距離をとって分離する必要がないこと、 第3に、絶縁基板とパッケージベースの間に、大きな
接合面積を確保でき、また十分な平行度をとれ、そし
て、基板間に隙間のできない絶縁基板の構造が得られる
こと、 第4に、リードピンとパッケージベース間の構造体の
製造の信頼性と歩留りを向上させ、絶縁基板構造の放熱
特性を向上させ、基板端のワイヤーボンデイング特性を
向上させることなどの顕著な技術的効果が得られた。
[Advantages of the Invention] In the insulating substrate structure according to the present invention, in addition to printing and firing a thick film conductor on the ceramic substrate joining surface, a solder flow prevention guide of the insulator is printed and firing, and then solder joining is performed. First, it is necessary to provide a structure in which the lead pin and the package base are not short-circuited. Secondly, there is no need to separate the lead pin and the package base with a distance as in the conventional case. Third, a large bonding area can be secured between the insulating substrate and the package base, sufficient parallelism can be obtained, and an insulating substrate structure having no gap between the substrates can be obtained. It improves the reliability and yield of the structure between the pin and the package base, improves the heat dissipation property of the insulating substrate structure, and improves the wire bonding property of the substrate edge. Remarkable technical effects, such as it is obtained.

【図面の簡単な説明】[Brief description of drawings]

第1図(a)、(b)は、本発明による絶縁基板の接合
面の正面図と接合された状態の断面図である。 第2図(a)、(b)は、従来の絶縁基板の接合面の正
面図と接合された状態の断面図である。 第3図(a)、(b)、(c)は、本発明による絶縁基
板パッケージの製造方法を説明する断面図である。 [主要部分の符号の説明] 1……絶縁基板 2……ハンダ層 3……リードピン 4……メタライズ導体層 5……ハンダ流れ防止ガイド 6……ICチップ 7……ワイヤーボンデイング 8……リードピン用穴 9……メタスパッケージベース
FIGS. 1 (a) and 1 (b) are cross-sectional views showing a state where the insulating substrate according to the present invention is joined to a front view of a joint surface. 2 (a) and 2 (b) are cross-sectional views showing a state of being joined with a front view of a joining surface of a conventional insulating substrate. 3 (a), (b), and (c) are cross-sectional views illustrating a method of manufacturing an insulating substrate package according to the present invention. [Description of symbols of main parts] 1 ... Insulating substrate 2 ... Solder layer 3 ... Lead pin 4 ... Metallized conductor layer 5 ... Solder flow prevention guide 6 ... IC chip 7 ... Wire bonding 8 ... For lead pin Hole 9: Metas package base

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】リード差込用穴を有する絶縁基板を有する
メタルハーメチックパッケージ構造体において、 該絶縁基板の底表面の該リード差込用穴の周囲に、絶縁
体厚膜によるハンダ流れ防止凸条部を設け、 ハンダで該絶縁基板の底面にメタライズされた導体層を
メタルハーメチックベース面に接合した構造を有するこ
とを特徴とする絶縁基板を有するメタルハーメチックパ
ッケージ構造体。
1. A metal hermetic package structure having an insulating substrate having a lead insertion hole, wherein a solder flow preventing convex strip made of a thick insulator film is formed around the lead insertion hole on the bottom surface of the insulating substrate. A metal hermetic package structure having an insulating substrate, characterized in that a conductor layer metallized to the bottom surface of the insulating substrate with a solder is joined to a metal hermetic base surface with a solder.
JP63105494A 1988-04-30 1988-04-30 Package structure Expired - Lifetime JPH0821643B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63105494A JPH0821643B2 (en) 1988-04-30 1988-04-30 Package structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63105494A JPH0821643B2 (en) 1988-04-30 1988-04-30 Package structure

Publications (2)

Publication Number Publication Date
JPH01278051A JPH01278051A (en) 1989-11-08
JPH0821643B2 true JPH0821643B2 (en) 1996-03-04

Family

ID=14409152

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63105494A Expired - Lifetime JPH0821643B2 (en) 1988-04-30 1988-04-30 Package structure

Country Status (1)

Country Link
JP (1) JPH0821643B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110098172A (en) * 2018-01-30 2019-08-06 深圳市振华微电子有限公司 A kind of thick film hybrid pin connection structure and connection method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748643B2 (en) * 1975-06-24 1982-10-18

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748643U (en) * 1980-09-04 1982-03-18

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748643B2 (en) * 1975-06-24 1982-10-18

Also Published As

Publication number Publication date
JPH01278051A (en) 1989-11-08

Similar Documents

Publication Publication Date Title
US5889326A (en) Structure for bonding semiconductor device to substrate
JP2915888B1 (en) Wiring board and manufacturing method thereof
JPH0613726A (en) Ceramic circuit substrate
JP2534881B2 (en) Hermetically sealed circuit device
JPH0821643B2 (en) Package structure
JPH09232462A (en) Manufacture of package for semiconductor chip
JP2961859B2 (en) Multilayer ceramic substrate
JP3585806B2 (en) Wiring board with pins
JP3279844B2 (en) Semiconductor device and manufacturing method thereof
JPH0636601Y2 (en) Circuit board
JPH025542Y2 (en)
JP3279846B2 (en) Method for manufacturing semiconductor device
JPH11168171A (en) Hybrid integrated circuit device and manufacture thereof
JP2721793B2 (en) Manufacturing method of wiring board
JPH10139559A (en) Glass-ceramic substrate and its manufacture
JP2522739B2 (en) Ceramics wiring board
JP3847220B2 (en) Wiring board
JP3810335B2 (en) Wiring board
JP3808358B2 (en) Wiring board
JPH0314292A (en) Manufacture of high-density mounting module
JPH0736429B2 (en) Method for manufacturing ceramic wiring board
JP3420362B2 (en) Semiconductor device mounting structure
JPH05235108A (en) Manufacture of film carrier tape
JPH08125080A (en) Semiconductor device and manufacture thereof
JPH09266265A (en) Semiconductor package