JPH0819927A - Vacuum sucking device and its manufacture - Google Patents
Vacuum sucking device and its manufactureInfo
- Publication number
- JPH0819927A JPH0819927A JP15244794A JP15244794A JPH0819927A JP H0819927 A JPH0819927 A JP H0819927A JP 15244794 A JP15244794 A JP 15244794A JP 15244794 A JP15244794 A JP 15244794A JP H0819927 A JPH0819927 A JP H0819927A
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- Prior art keywords
- porous
- adsorption
- suction
- plate
- raw material
- Prior art date
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- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、多孔質部からなる吸着
部と緻密質部からなる支持部とを備える吸着板を具備し
た真空吸着装置とその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum suction device provided with a suction plate having a suction portion made of a porous portion and a support portion made of a dense portion, and a method of manufacturing the same.
【０００２】[0002]
【従来の技術】従来より、真空吸着装置には、吸着板の
吸着部材が多孔質体からなるポーラスタイプのものと、
吸着部材に多数のピン孔を穿設した多ピンタイプのもの
があるが、被加工物を載置面の全面で均一に吸着固定で
きるポーラスタイプの吸着板を具備した真空吸着装置が
好適に使用されている。2. Description of the Related Art Conventionally, a vacuum suction device is of a porous type in which a suction member of a suction plate is made of a porous material,
There is a multi-pin type with a large number of pin holes on the suction member, but a vacuum suction device equipped with a porous suction plate that can uniformly suck and fix the workpiece on the entire mounting surface is suitable for use. Has been done.
【０００３】上記ポーラスタイプの吸着板は、例えば図
４（ａ），（ｂ）に示すように、中央に吸着部材１１と
して円板状の多孔質セラミック材を備え、その周囲に支
持部材１２としてリング状の緻密質セラミック材をガラ
ス１３で接合したものがあった。そして、吸着部材１１
をなす多孔質セラミック材の気孔を吸引孔とし、真空ポ
ンプ（不図示）により吸引することで被加工物１４を載
置面１０ａ上に吸着固定するようになっていた。このと
き載置面１０ａは、凹凸面であると被加工物１４との間
に隙間が生じ吸着力が低下することから、平滑平坦な面
に仕上げられていた。As shown in FIGS. 4 (a) and 4 (b), for example, the porous type adsorption plate is provided with a disk-shaped porous ceramic material as an adsorption member 11 in the center, and as a support member 12 around it. In some cases, a ring-shaped dense ceramic material was joined with glass 13. And the suction member 11
The pores of the porous ceramic material forming the above are used as suction holes, and the workpiece 14 is sucked and fixed on the mounting surface 10a by sucking with a vacuum pump (not shown). At this time, if the mounting surface 10a is an uneven surface, a gap is generated between the mounting surface 10a and the workpiece 14, and the suction force is reduced, so that the mounting surface 10a is finished as a smooth and flat surface.
【０００４】また、上記吸着板１０を構成するセラミッ
ク材としては、セラミック主原料に所定の焼結助剤とバ
インダーとをぞれぞれ添加して混練乾燥したのち顆粒を
製作し、この顆粒を金型中に充填して各々所定の形状に
成形し、支持部材１２をなす緻密質セラミック材は通常
の焼成温度で、吸着部材１１をなす多孔質セラミック材
は通常の焼成温度より少し低い温度で焼成されたもので
あった。As the ceramic material constituting the adsorption plate 10, a predetermined sintering aid and a binder are added to the ceramic main raw material, kneaded and dried, and then granules are produced. The fine ceramic material forming the support member 12 is filled in a mold and formed into a predetermined shape at a normal firing temperature, and the porous ceramic material forming the adsorption member 11 is set at a temperature slightly lower than the normal firing temperature. It was baked.
【０００５】[0005]
【発明が解決しようとする課題】ところが、上記のよう
な真空吸着装置の吸着板１０は、吸着部材１１と支持部
材１２をガラス接合するためにガラス１３の融点近傍ま
で加熱するために、軟化したガラス１３の一部が吸着部
材１１を構成する多孔質セラミック材の気孔中に流入し
て接合部全面にガラス１３を介在させることができず、
十分な接合強度を得ることができなかった。その為、こ
のような吸着板１０を真空吸着装置に装着して使用する
と、吸引力に耐えきれず吸着部材１１が支持部材１２か
ら脱落する恐れがあった。However, the suction plate 10 of the vacuum suction device as described above is softened in order to heat the suction member 11 and the support member 12 to the vicinity of the melting point of the glass 13 for glass bonding. A part of the glass 13 flows into the pores of the porous ceramic material forming the adsorbing member 11 and the glass 13 cannot be interposed on the entire joint surface,
It was not possible to obtain sufficient bonding strength. Therefore, when such a suction plate 10 is mounted on a vacuum suction device and used, the suction member 11 cannot withstand the suction force and the suction member 11 may fall off the support member 12.
【０００６】また、吸着部材１１をなす多孔質セラミッ
ク材は通常の焼成温度より低い温度で焼成されたもので
あるためにセラミック粒子同士が完全に焼結されておら
ず、支持部材１２をなす緻密質セラミック材に比べ硬度
が低かった。その為、載置面１０ａ全体に切削加工を施
すと、支持面１２ａに比べ吸着面１１ａが多く削られて
しまい、載置面１０ａ全体を平滑平坦な面とすることが
難しかった。Further, since the porous ceramic material forming the adsorbing member 11 is fired at a temperature lower than the normal firing temperature, the ceramic particles are not completely sintered, and the supporting member 12 is dense. Hardness was lower than that of high quality ceramic material. Therefore, when the entire mounting surface 10a is cut, the suction surface 11a is shaved more than the supporting surface 12a, and it is difficult to make the entire mounting surface 10a smooth and flat.
【０００７】さらに、被加工物１４がＳｉウエハなどで
ある場合、載置面１０ａをクリーンな状態に保たなけれ
ばならないことから頻繁に洗浄が繰り返えされるのであ
るが、上記多孔質セラミック材はセラミック粒子同士が
完全に焼結したものでないことから耐薬品性が低く、強
酸や強アルカリの洗浄液によってセラミック粒子同士を
結合させるガラス成分などが浸食を受け、数回の洗浄に
より表面のセラミック粒子が脱落して載置面１０ａが凹
凸面となり、その度に切削加工を施さなければならない
といった不都合があった。しかも、支持部材１２をなす
緻密質セラミック材と吸着部材１１をなす多孔質セラミ
ック材もガラス１３で接合されているために、洗浄の繰
り返しにより接合強度が低下し、使用中に吸着部材１１
が支持部材１２から脱落する恐れもあった。さらに、洗
浄以外でもＳｉウエハのエッチング又はラッピング処理
工程においても強アルカリの液が使用されるため、上述
のような課題があった。Further, when the workpiece 14 is a Si wafer or the like, the mounting surface 10a must be kept in a clean state, so that cleaning is frequently repeated. Has low chemical resistance because the ceramic particles are not completely sintered, and the glass component that binds the ceramic particles together is eroded by the cleaning solution of strong acid or strong alkali, and the ceramic particles on the surface are washed several times. However, there was an inconvenience that the mounting surface 10a became uneven and the cutting process had to be performed each time. Moreover, since the dense ceramic material forming the supporting member 12 and the porous ceramic material forming the adsorbing member 11 are also joined by the glass 13, the joining strength is lowered by repeated washing, and the adsorbing member 11 is used during use.
There is also a risk that they may fall off the support member 12. Further, since the strong alkaline liquid is used in the etching or lapping process of the Si wafer other than the cleaning, there is the above-mentioned problem.
【０００８】また、このような吸着板１０を製造する場
合、多孔質セラミック材と緻密質セラミック材とをそれ
ぞれ別々に製作したあとに、各セラミック材同士をガラ
ス１３で接合しなければならず製造効率が悪かった。When manufacturing such an adsorption plate 10, it is necessary to manufacture the porous ceramic material and the dense ceramic material separately and then bond the ceramic materials to each other with the glass 13. It was inefficient.
【０００９】[0009]
【課題を解決するための手段】そこで、本発明は上記問
題に鑑み、多孔質部からなる吸着部と緻密質部からなる
支持部とを備える真空吸着装置の吸着板全体を、同一組
成のセラミックスにより形成し、吸着部をなす多孔質部
と、該多孔質部を囲繞する支持部をなす緻密質部とを一
体構造としたものであり、さらに、吸着部をなす多孔質
部の気孔率を５．０〜３５％で、且つ平均気孔径を１５
〜４５μｍの範囲で設けたものである。また、本発明
は、アルミナ、ジルコニア、炭化珪素、窒化珪素のうち
一種からなる主原料に対し、所望の焼結助剤とバインダ
ーとをそれぞれ添加したセラミック原料と、さらに、焼
成時に燃えてなくなる焼失材を添加したセラミック原料
とを、金型中の所定位置にそれぞれ充填して圧縮成形
し、しかるのち１１００〜２０００℃の焼成温度にて焼
成することにより、支持部をなす多孔質部を一体的に形
成した真空吸着装置の吸着板を製造したものである。In view of the above problems, the present invention provides a ceramics having the same composition as the entire adsorption plate of a vacuum adsorption device having an adsorption part made of a porous part and a support part made of a dense part. The porous portion forming the adsorbing portion and the dense portion forming the supporting portion surrounding the porous portion are integrally structured, and the porosity of the porous portion forming the adsorbing portion is 5.0-35% and average pore size of 15
It is provided in the range of up to 45 μm. The present invention also provides a ceramic raw material in which a desired sintering aid and a binder are added to a main raw material made of one of alumina, zirconia, silicon carbide, and silicon nitride, and further burned out by burning out during firing. The ceramic raw material to which the material is added is filled in predetermined positions in the mold and compression-molded, followed by firing at a firing temperature of 1100 to 2000 ° C. to integrally form the porous portion forming the support portion. The suction plate of the vacuum suction device formed in FIG.
【００１０】[0010]
【作用】本発明によれば、吸着板全体を同一組成のセラ
ミックスにより一体的に形成してあるため、吸着部をな
す多孔質部と支持部をなす緻密質部との境界には接合部
が存在せず、また、多孔質部は完全に焼結されたセラミ
ックスからなる。その為、吸着板のどの部分をとっても
同程度の硬度を有するとともに、機械的強度、耐薬品性
及び耐熱性に優れている。According to the present invention, since the entire adsorption plate is integrally formed of ceramics having the same composition, a joining portion is formed at the boundary between the porous portion forming the adsorption portion and the dense portion forming the supporting portion. It is absent and the porous part consists of completely sintered ceramics. Therefore, any part of the suction plate has the same hardness and is excellent in mechanical strength, chemical resistance and heat resistance.
【００１１】また、本発明によれば、主原料に対し、所
望の焼結助剤とバインダーとをそれぞれ添加したセラミ
ック原料と、さらに、焼成時に燃えてなくなる焼失材を
添加したセラミック原料とを、金型中の所定位置にそれ
ぞれ充填して成形し、しかるのち主原料を完全に焼結さ
せる温度で焼成して吸着板を形成するというように、一
度の成形及び焼成工程を経るだけで、吸着部をなす多孔
質部と支持部をなす緻密質部とを一体的に形成した吸着
板を効率的に製造することができる。しかも、吸着板の
多孔質部を形成するために、主原料に焼失材を適宜調整
して添加してあることから、主原料を完全に焼結させる
温度で焼成することができる。その為、セラミック粒子
同士が完全に焼結した多孔質部とすることができるとと
もに、吸引面から吸着面にかけて連通する貫通気孔を備
えている。Further, according to the present invention, a ceramic raw material in which a desired sintering aid and a binder are respectively added to the main raw material, and a ceramic raw material in which a burned material that does not burn during firing is further added, Adhesion is performed by a single molding and firing process, such as filling and molding at prescribed positions in the mold, and then firing at a temperature that completely sinters the main raw material to form an adsorption plate. It is possible to efficiently manufacture an adsorption plate in which a porous portion forming a portion and a dense portion forming a supporting portion are integrally formed. Moreover, since the burnable material is appropriately adjusted and added to the main raw material to form the porous portion of the adsorption plate, the main raw material can be fired at a temperature at which it is completely sintered. Therefore, it is possible to form a porous portion in which the ceramic particles are completely sintered with each other, and through holes are provided which communicate with each other from the suction surface to the suction surface.
【００１２】[0012]
【実施例】以下、本発明実施例を説明する。EXAMPLES Examples of the present invention will be described below.
【００１３】図１（ａ）は本発明実施例に係る真空吸着
装置の概略を示す斜視図であり、図１（ｂ）は（ａ）に
示す吸着板１のＸ−Ｘ線断面図である。FIG. 1 (a) is a schematic perspective view of a vacuum suction device according to an embodiment of the present invention, and FIG. 1 (b) is a cross-sectional view of the suction plate 1 shown in FIG. .
【００１４】図１（ａ）に示すように、本発明実施例に
係る真空吸着装置は、中央に多孔質セラミックス４から
なる吸着部２と、該吸着部２の周囲に緻密質セラミック
ス５からなる支持部３とを備える円板状の吸着板１を具
備してなり、上記吸着板１の載置面１ａ上に被加工物１
４を載置して他方の吸引面２ｂより吸引管１５を介して
真空ポンプ（不図示）により吸引することで、被加工物
１４を載置面１ａ上に吸着固定するようになっている。
なお、吸着板１の載置面１０ａは、凹凸面であると被加
工物１４との間に隙間を生じ吸着力が低下することか
ら、平滑平坦な面に仕上げてある。As shown in FIG. 1 (a), the vacuum adsorption device according to the embodiment of the present invention comprises an adsorption part 2 made of a porous ceramics 4 in the center and a dense ceramics 5 around the adsorption part 2. A disk-shaped suction plate 1 having a support portion 3 is provided, and the workpiece 1 is placed on the mounting surface 1a of the suction plate 1.
The workpiece 4 is mounted on the mounting surface 1a by suctioning the workpiece 4 from the other suction surface 2b through a suction pipe 15 by a vacuum pump (not shown).
If the mounting surface 10a of the suction plate 1 is an uneven surface, a gap is created between the mounting surface 10a and the workpiece 14, and the suction force is reduced. Therefore, the mounting surface 10a is finished to be a smooth and flat surface.
【００１５】また、上記吸着板１は全体を同一組成のセ
ラミックスにより構成してあり、吸着部２をなす多孔質
部４と、該多孔質部４を囲繞する支持部３をなす緻密質
部５とは一体的に形成してある。即ち、図１（ｂ）に示
すように、吸着部２をなす多孔質部４及び支持部３をな
す緻密質部５は互いが完全に焼結した同一組成のセラミ
ックスからなるため、多孔質部４は、緻密質部５と同程
度の硬度を有するとともに、耐薬品性及び耐熱性に優れ
ている。さらに、多孔質部４と緻密質部５との境界には
接合部が存在しない一体構造となっているため、緻密質
部３を構成するセラミック粒子同士の結合力と同程度の
力で緻密質部３のセラミック粒子と多孔質部２のセラミ
ック粒子とが焼結しており機械的強度にも優れている。Further, the adsorption plate 1 is entirely made of ceramics having the same composition, and the porous portion 4 forming the adsorption portion 2 and the dense portion 5 forming the support portion 3 surrounding the porous portion 4 are formed. And are formed integrally. That is, as shown in FIG. 1B, since the porous portion 4 forming the adsorption portion 2 and the dense portion 5 forming the support portion 3 are made of completely sintered ceramics having the same composition, the porous portion No. 4 has the same hardness as that of the dense portion 5, and is excellent in chemical resistance and heat resistance. Furthermore, since there is no joint at the boundary between the porous portion 4 and the dense portion 5, it has an integrated structure, so that the dense portion 3 has the same strength as the bonding force between the ceramic particles forming the dense portion 3. The ceramic particles of the part 3 and the ceramic particles of the porous part 2 are sintered and excellent in mechanical strength.
【００１６】その為、この吸着板１の載置面１ａに切削
加工を施せば、多孔質部２及び緻密質部３とも同じ量だ
け切削することができることから、載置面１ａを容易に
平滑平坦な面とすることができる。しかも、耐薬品性及
び耐熱性にも優れることから、吸着板１を強酸や強アル
カリの洗浄液に浸したとしてもセラミック粒子の脱落
や、吸着板１の破損を生じることがなく、また、高温下
で使用したとしても図４（ａ），（ｂ）に示す従来の吸
着板１０のように大きな強度劣化を生じ吸着部材１１が
支持部材１２から脱落するといったことがない。Therefore, if the mounting surface 1a of the suction plate 1 is cut, both the porous portion 2 and the dense portion 3 can be cut by the same amount, so that the mounting surface 1a can be easily smoothed. It can be a flat surface. Moreover, since it is also excellent in chemical resistance and heat resistance, even if the adsorption plate 1 is immersed in a cleaning solution of strong acid or strong alkali, the ceramic particles will not fall off and the adsorption plate 1 will not be damaged. Even if it is used, the strength of the suction member 11 will not be greatly degraded unlike the conventional suction plate 10 shown in FIGS. 4A and 4B, and the suction member 11 will not fall off from the support member 12.
【００１７】また、被加工物１４を載置面１ａの全面で
均一に吸着固定するためには、吸着部２をなす多孔質部
４には、適度な大きさの径を有する気孔が吸着面２ａか
ら吸引面２ｂにかけて連通する貫通気孔２ｃを備えてい
なければならないことから、吸着部２をなす多孔質部４
の気孔率を５．０〜３５％で、且つ平均気孔径を１５〜
４５μｍの範囲に設けてある。Further, in order to uniformly adsorb and fix the workpiece 14 on the entire mounting surface 1a, the porous portion 4 forming the adsorbing portion 2 is provided with pores having an appropriate diameter. Since the through-holes 2c communicating from 2a to the suction surface 2b must be provided, the porous portion 4 forming the adsorption portion 2
Has a porosity of 5.0 to 35% and an average pore diameter of 15 to
It is provided in the range of 45 μm.
【００１８】即ち、多孔質部４の気孔率が５．０％未満
であると、内部に殆ど気孔が存在しておらず、吸着面２
ａから吸引面２ｂにかけて連通する貫通気孔２ｃが少な
いため十分な吸着力が得られないからである。ただし、
多孔質部４の気孔率が３５％より大きくなると、機械的
強度並びに硬度が大幅に低下するとともに、製造が困難
となる。また、多孔質部４の平均気孔径が１５μｍ未満
であると、気孔の径が小さすぎるために十分な吸引力を
得ることができず、載置面１ａ上に被加工物１４を吸着
固定することができず、逆に、多孔質部４の平均気孔径
を４５μｍより大きくすることは製造が困難となるから
である。That is, when the porosity of the porous portion 4 is less than 5.0%, there are few pores inside, and the adsorption surface 2
This is because a sufficient suction force cannot be obtained because there are few through-holes 2c communicating from a to the suction surface 2b. However,
When the porosity of the porous portion 4 is more than 35%, the mechanical strength and hardness are significantly lowered, and the manufacturing becomes difficult. Further, if the average pore diameter of the porous portion 4 is less than 15 μm, a sufficient suction force cannot be obtained because the pore diameter is too small, and the workpiece 14 is adsorbed and fixed on the mounting surface 1a. This is because, on the contrary, if the average pore diameter of the porous portion 4 is made larger than 45 μm, the production becomes difficult.
【００１９】さらに、上記吸着板１を構成することがで
きるセラミックスとしては、アルミナセラミックス、ジ
ルコニアセラミックスなどの酸化物系セラミックスや、
炭化珪素質セラミックスや窒化珪素質セラミックスなど
の非酸化物系セラミックスなどさまざまなものを使用す
ることができ、これらは使用目的および使用条件などに
応じて適宜設定すればよい。Further, as ceramics which can constitute the adsorption plate 1, oxide ceramics such as alumina ceramics and zirconia ceramics,
Various materials such as non-oxide ceramics such as silicon carbide ceramics and silicon nitride ceramics can be used, and these may be appropriately set according to the purpose of use and the conditions of use.
【００２０】次に、図１に示す吸着板１を例にとってそ
の製造方法を説明する。Next, the manufacturing method of the suction plate 1 shown in FIG. 1 will be described as an example.
【００２１】まず、主原料をなすセラミック粉末に、所
定の焼結助剤あるいは安定化剤とバインダーをそれぞれ
添加したセラミック原料を用意する。例えば、Ａｌ2 Ｏ
3 に対しては焼結助剤としてＭｇＯ、ＣａＯ、ＳｉＯ2
のうち少なくとも一種を添加し、ＺｒＯ2 に対しては安
定化剤としてＭｇＯ、ＣａＯ、Ｙ2 Ｏ3 、ＣｅＯ2 等の
うち少なくとも一種を、ＳｉＣに対してはＣ、Ｂ、Ｂ4
Ｃ、Ａｌ2 Ｏ3 、Ｙ2Ｏ3 等のうち少なくとも一種を、
Ｓｉ3 Ｎ4 に対しては周期律表2a、3a族元素の酸化物や
窒化物のうち少なくとも一種をそれぞれ焼結助剤として
添加する。また、高純度の吸着板１を製造する時には、
高純度のセラミック粉末を準備すれば良い。First, a ceramic raw material is prepared by adding a predetermined sintering aid or stabilizer and a binder to a ceramic powder as a main raw material. For example, Al 2 O
For 3 , as a sintering aid, MgO, CaO, SiO 2
At least one of them is added, and at least one of MgO, CaO, Y 2 O 3 and CeO 2 is added as a stabilizer for ZrO 2 , and C, B, B 4 for SiC.
At least one of C, Al 2 O 3 , Y 2 O 3, etc.,
At least one of oxides and nitrides of elements of groups 2a and 3a of the periodic table is added to Si 3 N 4 as a sintering aid. Further, when manufacturing the high-purity adsorption plate 1,
High-purity ceramic powder may be prepared.
【００２２】そして、このセラミック原料を２つに分
け、一方のセラミック原料に３〜２０重量％の範囲で焼
失材を添加混合する。ここで、焼失材とは焼成時に燃え
てなくなる材質のことであり、例えば、粉末ポリエチレ
ン、酢酸ビニール、セルロース、ポリプロピレン、ポリ
ビニルアルコール、アクリル樹脂などの樹脂剤、あるい
は炭酸マグネシウム、炭酸カルシウムなどを好適に用い
ることができる。Then, this ceramic raw material is divided into two, and one of the ceramic raw materials is added and mixed with a burnable material in the range of 3 to 20% by weight. Here, the burned material is a material that does not burn when fired. For example, resin agents such as powdered polyethylene, vinyl acetate, cellulose, polypropylene, polyvinyl alcohol, acrylic resin, or magnesium carbonate, calcium carbonate, etc. are preferable. Can be used.
【００２３】一方、図２に示すように、一軸方向加圧成
形機の金型２０中に、ステンレス、プラスチック、樹脂
などからなる薄肉円筒状の仕切り板２１を載置し、この
仕切り板２１により仕切られた円筒の内側２２に焼失材
を含むセラミック原料Ａを、円筒の外側２３に焼失材を
含まないセラミック原料Ｂをそれぞれ充填したあと、上
記仕切り板２１を取り除いて上下のパンチ２４，２５に
より圧縮成形することで、中央が焼失材を含んだセラミ
ック原料Ａからなり、焼失材を含まないセラミック原料
Ｂが上記セラミック原料Ａを囲繞した円板状の成形体を
得る。On the other hand, as shown in FIG. 2, a thin cylindrical partition plate 21 made of stainless steel, plastic, resin or the like is placed in a mold 20 of a uniaxial pressure molding machine, and this partition plate 21 is used. After filling the inside 22 of the partitioned cylinder with the ceramic raw material A containing the burnable material and the outside 23 of the cylinder with the ceramic raw material B containing no burnable material, the partition plate 21 is removed and the upper and lower punches 24, 25 are used. By compression molding, a disk-shaped molded body is obtained in which the center is made of the ceramic raw material A containing the burnable material, and the ceramic raw material B not containing the burnable material surrounds the ceramic raw material A.
【００２４】なお、上記成形工程において、焼失材を含
んだセラミック原料Ａと焼失材を含まないセラミック原
料Ｂとを区隔する仕切り板２１は、抜き取りの時、各々
のセラミック原料Ａ，Ｂに充填密度のバラツキを生じな
いようにするため、できるだけ薄肉のものを使用するこ
とが重要で、少なくとも肉厚ｈが１０ｍｍ以下、好まし
くは１ｍｍ以下の仕切り板２１を使用すれば、充填密度
のバラツキを生じることなく成形することができる。ま
た、一軸方向加圧成形機以外に、硬質ゴムからなる型の
中に仕切り板２１を配置して焼失材を含んだセラミック
原料Ａと焼失材を含まないセラミック原料Ｂとをそれぞ
れ所定位置に充填したあと、均一に静水圧をかけて成形
するＣＩＰ（冷間静水圧プレス）やＨＩＰ（熱間静水圧
プレス）により成形することもできる。In the molding step, the partition plate 21 for separating the ceramic raw material A containing the burned material and the ceramic raw material B not containing the burnable material is filled into the respective ceramic raw materials A and B at the time of extraction. In order to prevent variations in density, it is important to use the thinnest possible one. If the partition plate 21 having a wall thickness h of 10 mm or less, preferably 1 mm or less is used, the packing density varies. Can be molded without. In addition to the uniaxial pressure molding machine, the partition plate 21 is placed in a mold made of hard rubber, and the ceramic raw material A containing the burnable material and the ceramic raw material B containing no burnable material are filled in predetermined positions. After that, CIP (cold isostatic pressing) or HIP (hot isostatic pressing) for uniformly applying hydrostatic pressure for molding can be performed.
【００２５】このようにして得た成形体を、主原料がＡ
ｌ2 Ｏ3 に対しては１６００〜１７５０℃の焼成温度
で、主原料がＺｒＯ2 に対しては１４００〜１７００℃
の焼成温度で、主原料がＳｉＣに対しては、１７００〜
１９００℃の焼成温度で、Ｓｉ3 Ｎ4 に対しては１８０
０〜２０００℃の焼成温度というように、各セラミック
粉末を完全に焼結させる温度にて焼成すれば、セラミッ
ク原料Ａ中の焼失材が燃えてなくなり、その跡が気孔と
なって残るため、図１に示すような中央が多孔質部４か
らなり、緻密質部５が上記多孔質部４を囲繞するととも
に、多孔質部２と緻密質部３とが一体構造をなし完全に
焼結されている真空吸着装置の吸着板１を得ることがで
きる。The main material of the molded body thus obtained is A
Calcination temperature of 1600 to 1750 ° C. for 1 2 O 3 and 1400 to 1700 ° C. for main material ZrO 2 .
At the firing temperature of 1700 to 1100 for the main raw material SiC
180 ° for Si 3 N 4 at a firing temperature of 1900 ° C
If firing is performed at a temperature at which each ceramic powder is completely sintered, such as a firing temperature of 0 to 2000 ° C., the burned material in the ceramic raw material A will not burn, and the traces will remain as pores. As shown in FIG. 1, the central part is composed of the porous part 4, the dense part 5 surrounds the porous part 4, and the porous part 2 and the dense part 3 form an integral structure and are completely sintered. The suction plate 1 of the vacuum suction device can be obtained.
【００２６】なお、上記実施例では、中央が円板状の多
孔質部２からなり、その周囲を環状の緻密質部３が囲繞
した吸着板１についてのみ示したが、その他の実施例と
して、例えば、図３（ａ）に示すような緻密質部５から
なる円板状支持体３’の中央に２つの直方体をした吸着
部２をなす多孔質部４を並設した吸着板１を形成するこ
とができ、この場合、金型２０の中央に２つの角筒体を
した仕切り板２１を並設して載置し、各々の仕切り板２
１の内側にセラミック原料Ａを、その外側にセラミック
原料Ｂを充填して仕切り板２１を取り除いたあと、成形
及び焼成すれば良い。また、図３（ｂ）に示すような支
持部３，３''をなす緻密質部５，５''と吸着部２，２''
をなす多孔質部４，４''が同心円状に交互に設けられた
吸着板１も形成することができ、この場合、金型２０中
に直径の異なる３つの円筒状をした仕切り板２１を同心
円状に載置し、中央からセラミック原料Ａ、セラミック
原料Ｂ、セラミック原料Ａ、セラミック原料Ｂという順
序で充填して各仕切り板２１を取り除き、成形・焼成す
れば良い。特に図３（ｂ）に示す吸着板１は、一つの吸
着板１で大きさの異なる被加工物を吸着固定することが
でき、吸着板１として最適である。In the above embodiment, only the adsorption plate 1 having the disk-shaped porous portion 2 at the center and the ring-shaped dense portion 3 surrounding the porous portion 2 is shown, but as another embodiment, For example, as shown in FIG. 3A, the adsorption plate 1 in which the porous portion 4 forming the adsorption portion 2 formed of two rectangular parallelepipeds is juxtaposed is formed at the center of the disk-shaped support 3 ′ made of the dense portion 5. In this case, in the center of the mold 20, two partition plates 21 each having a rectangular tubular shape are arranged side by side, and each partition plate 2 is placed.
1 may be filled with the ceramic raw material A and the outside thereof may be filled with the ceramic raw material B to remove the partition plate 21, and then molding and firing. Further, as shown in FIG. 3 (b), the dense parts 5 and 5 '' and the adsorption parts 2 and 2 '' which form the supporting parts 3 and 3 ''.
It is also possible to form the adsorption plate 1 in which the porous parts 4, 4 ″ forming a circle are alternately provided concentrically, and in this case, the mold 20 is provided with three partition plates 21 having a cylindrical shape with different diameters. It suffices to place them concentrically, fill the ceramic raw material A, the ceramic raw material B, the ceramic raw material A, and the ceramic raw material B in this order from the center, remove each partition plate 21, and perform molding and firing. In particular, the suction plate 1 shown in FIG. 3B is suitable as the suction plate 1 because one suction plate 1 can suck and fix workpieces having different sizes.
【００２７】また、吸着部２をなす多孔質部４の気孔率
及び平均気孔径は、焼失材の粒子径や添加量を適宜調整
することにより、所望の大きさに調整することができ、
異なる気孔率及び平均気孔径を有する多孔質部４を持っ
た吸着板１を形成することもできる。Further, the porosity and the average pore diameter of the porous portion 4 forming the adsorption portion 2 can be adjusted to a desired size by appropriately adjusting the particle diameter and the addition amount of the burned material,
It is also possible to form the adsorption plate 1 having the porous portions 4 having different porosities and average pore diameters.
【００２８】上述のように製造すれば、一度の成形・焼
成工程を経ることにより、多孔質部２と緻密質部３とを
一体的に形成した吸着板１を効率的に製造することがで
き、従来のように各セラミック材を別々に製作したあと
ガラス接合する必要がない。しかも、この方法によれ
ば、多孔質部２及び緻密質部３ともに完全に焼結した吸
着板１とすることができるため、図４（ａ），（ｂ）に
示す従来の吸着板１０と比べ機械的強度並びに硬度が高
く、且つ耐薬品性、耐熱性に優れた吸着板１とすること
ができる。When manufactured as described above, the suction plate 1 in which the porous portion 2 and the dense portion 3 are integrally formed can be efficiently manufactured through a single molding / firing step. Unlike the conventional method, it is not necessary to glass-bond each ceramic material separately. Moreover, according to this method, since the adsorption plate 1 in which both the porous portion 2 and the dense portion 3 are completely sintered can be obtained, the adsorption plate 10 of the related art shown in FIGS. In comparison, the adsorption plate 1 has high mechanical strength and hardness, and excellent chemical resistance and heat resistance.
【００２９】（実施例）ここで、アルミナセラミック製
の吸着板の具体的実施例を示す。(Example) Here, a specific example of the adsorption plate made of alumina ceramic will be described.
【００３０】まず、主原料として純度９９％、平均粒子
径０．１〜１．０μｍ程度のアルミナ粒子を用い、この
アルミナ粉末に焼結助剤としてＭｇＯ、ＳｉＯ2 、Ｃａ
Ｏとバインダーとをそれぞれ所定量添加して２種類のセ
ラミック原料を用意するとともに、そのうちの一方に焼
失材として直径９０μｍの球状をした粉末ポリエチレン
を７重量％添加混合した。次に、肉厚１ｍｍ程度のステ
ンレスにより形成した薄肉円筒状の仕切り板を金型中に
配置し、仕切り板の内側に焼失材を混合したセラミック
原料を、仕切り板の外側には焼失材を混合していないセ
ラミック原料をそれぞれ充填したあと、仕切り板を取り
除き１ｔｏｎ／ｃｍ2 の成形圧で圧縮形成した。次に、
得られた成形体を焼成温度１７００℃程度で焼成するこ
とにより、中央の多孔質部と、該多孔質部を囲繞する緻
密質部からなるアルミナセラミック製の吸着板を得た。
なお、この吸着板の特性はアルミナ純度が９３％で、吸
着部をなす多孔質部の気孔率が１０．６％、ロックウエ
ル硬度（ＨR15Y）が９７．９ｋｇ／ｃｍ2 であり、吸着
面から吸引面にかけて連通する貫通気孔を備えていた。First, alumina particles having a purity of 99% and an average particle diameter of about 0.1 to 1.0 μm are used as a main raw material, and MgO, SiO 2 , Ca as a sintering aid are added to the alumina powder.
Two kinds of ceramic raw materials were prepared by adding a predetermined amount of O and a binder, respectively, and 7% by weight of spherical polyethylene powder having a diameter of 90 μm was added and mixed to one of them as a burnout material. Next, a thin cylindrical partition plate made of stainless steel with a thickness of about 1 mm is placed in the mold, and a ceramic raw material mixed with burned material is mixed inside the partition plate and burned material is mixed outside the partition plate. After filling each of the ceramic raw materials that were not formed, the partition plate was removed and compression molding was performed at a molding pressure of 1 ton / cm 2 . next,
The obtained molded body was fired at a firing temperature of about 1700 ° C. to obtain an alumina ceramic adsorption plate including a central porous portion and a dense portion surrounding the porous portion.
Incidentally, the characteristic 93% alumina purity of the suction plate, 10.6% porosity of the porous portion forming a suction unit, Rockwell hardness (H R15Y) is 97.9kg / cm 2, from the attraction surface It was equipped with through-holes that communicated to the suction surface.
【００３１】（実験例）ここで、焼失材の添加量をそれ
ぞれ変えて、上記アルミナセラミック製の吸着板を形成
したときの成形性および吸着板としての使用可能性につ
いて実験を行った。(Experimental Example) Here, an experiment was conducted on the formability when the adsorption plate made of the alumina ceramic was formed and the applicability as an adsorption plate by changing the addition amount of the burned material.
【００３２】吸着板の製造条件は上記実施例の通り行
い、まず、焼失材として直径９０μｍの球状をした粉末
ポリエチレンを０〜３０重量％の範囲でそれぞれ添加し
て成形体を形成した時の成形性を確認し、次に、成形体
を焼成して得た吸着板の載置面上に被加工物として８イ
ンチのＳｉウエハを載置し、真空ポンプにより吸引して
吸着固定できるか否かの使用可能性について確認した。The adsorbing plate was manufactured under the same conditions as in the above-mentioned embodiment. First, a spherical powdered polyethylene having a diameter of 90 μm was added as a burnable material in the range of 0 to 30% by weight to form a molded body. Whether or not it is possible to mount an 8-inch Si wafer as a workpiece on the mounting surface of the suction plate obtained by firing the molded body and suck and fix it by suction with a vacuum pump We confirmed the possibility of using.
【００３３】それぞれの結果は表１に示す通りである。The respective results are shown in Table 1.
【００３４】[0034]
【表１】 [Table 1]
【００３５】表１より判るように、比較例の試料Ｎｏ．
１は、焼失材の添加量が０重量％であるために内部に殆
ど気孔が存在せず、また、吸着面から吸引面にかけて連
通する貫通気孔を備えていなかった。その為、８インチ
のＳｉウエハを載置面上に吸着固定することができなか
った。As can be seen from Table 1, the sample No. of the comparative example.
In No. 1, since the amount of burned material added was 0% by weight, there were almost no pores inside, and there were no through pores communicating from the adsorption surface to the suction surface. Therefore, it was not possible to suck and fix the 8-inch Si wafer on the mounting surface.
【００３６】また、比較例の試料Ｎｏ．２は、焼失材を
１重量％添加してあるため、吸着面から吸引面にかけて
連通する貫通気孔を備えていたものの、吸着部の平均気
孔径が小さすぎるため、充分な吸引力を得ることができ
ず、８インチのＳｉウエハを載置面上に吸着固定するこ
とができなかった。Further, the sample No. of the comparative example. In No. 2, since the burned material was added at 1% by weight, it had through pores communicating from the adsorption surface to the suction surface, but the average pore diameter of the adsorption part was too small, so sufficient suction force could be obtained. However, it was not possible to suck and fix the 8-inch Si wafer on the mounting surface.
【００３７】一方、比較例の試料Ｎｏ．９では、焼失材
の添加量が３０重量％と多すぎるために、成形工程にお
いて焼失材の弾性回復が大きすぎ、成形体にラミネーシ
ョンを生じ、吸着板を製造することができなかった。On the other hand, the sample No. of the comparative example. In No. 9, since the amount of the burned material added was too large, 30% by weight, the elastic recovery of the burned material was too large in the molding step, lamination occurred in the molded body, and the adsorption plate could not be manufactured.
【００３８】これに対し、本発明の範囲にある試料Ｎ
ｏ．３〜８は、焼失材を３〜２０重量％の範囲で添加し
てあるため、吸着部の気孔率が５．０〜３５％で、且つ
平均気孔径が１５〜４５μｍの範囲にあり、吸着面から
吸引面まで連通する貫通気孔を備えていた。その為、充
分な吸引力が得られ、８インチのＳｉウエハを載置面上
に強固に吸着固定することができた。On the other hand, sample N within the scope of the present invention
o. In Nos. 3 to 8, since the burned material was added in the range of 3 to 20% by weight, the porosity of the adsorption part was 5.0 to 35%, and the average pore diameter was in the range of 15 to 45 μm. It had through-pores that communicated from the surface to the suction surface. Therefore, a sufficient suction force was obtained, and the 8-inch Si wafer could be firmly adsorbed and fixed onto the mounting surface.
【００３９】この結果より、吸着板として使用するため
には、焼失材の添加量は３〜２０重量％の範囲で添加す
れば良いことが判る。From these results, it can be seen that the burned material should be added in an amount of 3 to 20% by weight for use as an adsorption plate.
【００４０】なお、上記実験例では、アルミナセラミッ
ク製の吸着板についてのみ示したが、他にジルコニアセ
ラミックスや窒化珪素質セラミックス、あるいは炭化珪
素質セラミックスにより形成した吸着板であっても、焼
失材を３〜２０重量％の範囲で添加すれば、吸着部をな
す多孔質部の気孔率が５．０〜３５％で、且つ平均気孔
径が１５〜４５μｍの範囲あり、且つ吸引面から吸着面
にかけて連通する貫通気孔を備えた吸着板を形成するこ
とができ、Ｓｉウエハなどの被加工物を載置面上に強固
に吸着固定することができた。In the above experimental examples, only the adsorption plate made of alumina ceramics is shown, but other adsorption plates made of zirconia ceramics, silicon nitride ceramics, or silicon carbide ceramics can also be used as burnable materials. If added in the range of 3 to 20% by weight, the porosity of the porous portion forming the adsorption portion is 5.0 to 35%, the average pore diameter is in the range of 15 to 45 μm, and the suction surface to the adsorption surface It was possible to form a suction plate having communicating through pores, and it was possible to firmly suction and fix a workpiece such as a Si wafer onto the mounting surface.
【００４１】[0041]
【発明の効果】以上のように、本発明の真空吸着装置に
備える吸着板は、吸着部をなす多孔質部と支持部をなす
緻密質部とが共に同一組成のセラミックスにより一体的
に形成してあることから、多孔質部は緻密質部と同程度
の硬度を有するとともに、機械的強度、耐薬品性、及び
耐熱性に優れている。その為、載置面を容易に平滑平坦
な面とすることができるため、被加工物を強固に吸着固
定することができるととに、吸引力により支持部から吸
着部が脱落することがない。また、洗浄を繰り返したと
してもセラミック粒子の脱落がなく、高温下での使用に
おいても大幅な強度劣化を生じることがないため、長期
間にわたり使用することができる。As described above, in the suction plate provided in the vacuum suction apparatus of the present invention, the porous portion forming the suction portion and the dense portion forming the support portion are integrally formed of ceramics having the same composition. Therefore, the porous portion has hardness similar to that of the dense portion and is excellent in mechanical strength, chemical resistance, and heat resistance. Therefore, since the mounting surface can be easily made into a smooth and flat surface, the workpiece can be firmly adsorbed and fixed, and the adsorption portion does not fall off from the support portion due to the suction force. . Further, even if the washing is repeated, the ceramic particles do not fall off, and the strength is not significantly deteriorated even at the time of use at a high temperature, so that it can be used for a long period of time.
【００４２】また、本発明は、吸着板の吸着部をなす多
孔質部を構成するために、セラミック原料中に焼成時に
燃えてなくなる焼失材を添加して成形し、しかるのちセ
ラミック粉末を完全に焼結させる温度で焼成して製造し
たことにより、従来のように各セラミック材を別々に制
作し、その後ガラス接合するというような面倒な作業を
することなく、一度の成形・焼成工程を経るだけで、多
孔質部と緻密質部とを一体的に形成した吸着板を効率良
く製造することができる。しかも、この方法により製造
すれば多孔質部も完全に焼結したセラミックスとするこ
とができる。Further, according to the present invention, in order to form the porous portion which constitutes the adsorption portion of the adsorption plate, the burnable material which does not burn during firing is added to the ceramic raw material for molding, and then the ceramic powder is completely removed. By firing at a sintering temperature to manufacture, each ceramic material is produced separately, and then only one molding and firing process is performed without the troublesome work of glass bonding. Thus, it is possible to efficiently manufacture the adsorption plate in which the porous portion and the dense portion are integrally formed. In addition, if the porous portion is manufactured by this method, the porous portion can be completely sintered ceramics.
【００４３】その為、上記吸着板を備える本発明の真空
吸着装置を用いれば、長期間にわたり被加工物を吸着板
の載置面上に強固に固定することができる。Therefore, by using the vacuum suction device of the present invention equipped with the suction plate, it is possible to firmly fix the workpiece on the mounting surface of the suction plate for a long period of time.
【図１】（ａ）は本発明に係る真空吸着装置の概略を示
す斜視図であり、（ｂ）は（ａ）に示す吸着板のＸーＸ
線断面図である。FIG. 1 (a) is a perspective view showing the outline of a vacuum suction device according to the present invention, and FIG. 1 (b) is an X-X of the suction plate shown in FIG.
It is a line sectional view.
【図２】本発明の真空吸着装置に備える吸着板の成形工
程を示す斜視図である。FIG. 2 is a perspective view showing a forming process of a suction plate provided in the vacuum suction device of the present invention.
【図３】（ａ），（ｂ）はそれぞれ本発明に係る真空吸
着装置に備える吸着板の他の実施例を示す斜視図であ
る。3 (a) and 3 (b) are perspective views showing another embodiment of a suction plate provided in the vacuum suction device according to the present invention.
【図４】（ａ）は従来の真空吸着装置の概略を示す斜視
図であり、（ｂ）は（ａ）に示す吸着板のＹーＹ線断面
図である。4A is a perspective view showing an outline of a conventional vacuum suction device, and FIG. 4B is a sectional view taken along line YY of the suction plate shown in FIG.
１…吸着板 ２…吸着部 ３…支持部 ４…多孔質部 ５…緻密質部 ２０…金型 ２１…仕切り板 1 ... Adsorption plate 2 ... Adsorption part 3 ... Support part 4 ... Porous part 5 ... Dense part 20 ... Mold 21 ... Partition plate
───────────────────────────────────────────────────── フロントページの続き (72)発明者 山口 新一 鹿児島県国分市山下町１番１号 京セラ株 式会社鹿児島国分工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shinichi Yamaguchi 1-1, Yamashita-cho, Kokubun-shi, Kagoshima Prefecture Kyocera Corporation Kokubun Factory Kagoshima
Claims (3)
る支持部とを備える吸着板を具備した真空吸着装置であ
って、該吸着板を構成する多孔質部と、該多孔質部を囲
繞する緻密質部とを共に同一組成のセラミックスにより
一体的に形成してなる真空吸着装置。1. A vacuum adsorption device comprising an adsorption plate having an adsorption portion made of a porous portion and a support portion made of a dense portion, the porous portion constituting the adsorption plate, and the porous portion. A vacuum adsorption device in which the dense part surrounding the is integrally formed of ceramics having the same composition.
０〜３５％で、且つ平均気孔径が１５〜４５μｍの範囲
ある請求項１に記載の真空吸着装置。2. The porosity of the porous portion forming the adsorption portion is 5.
The vacuum adsorption device according to claim 1, wherein the vacuum adsorption device has an average pore diameter of 0 to 35% and an average pore diameter of 15 to 45 μm.
素のうち一種からなる主原料に対し、所望の焼結助剤と
バインダーを添加したセラミック原料と、さらに、焼成
時に燃えてなくなる焼失材を添加したセラミック原料と
を型内の所定位置にそれぞれ充填して圧縮成形し、しか
るのち１１００〜２０００℃の温度範囲にて焼成するこ
とにより、吸着部をなす多孔質部と、支持部をなす多孔
質部を一体的に形成した吸着板を製作する工程からなる
真空吸着装置の製造方法。3. A ceramic raw material obtained by adding a desired sintering aid and a binder to a main raw material made of one kind of alumina, zirconia, silicon carbide and silicon nitride, and further a burned material that does not burn during firing. The ceramic raw material and the ceramic raw material are filled in predetermined positions in a mold, compression-molded, and then fired in a temperature range of 1100 to 2000 ° C. to form a porous part forming an adsorption part and a porous part forming a support part. A method for manufacturing a vacuum suction device, the method including the step of manufacturing a suction plate having integrally formed parts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15244794A JP3663215B2 (en) | 1994-07-04 | 1994-07-04 | Vacuum adsorption apparatus and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15244794A JP3663215B2 (en) | 1994-07-04 | 1994-07-04 | Vacuum adsorption apparatus and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0819927A true JPH0819927A (en) | 1996-01-23 |
| JP3663215B2 JP3663215B2 (en) | 2005-06-22 |
Family
ID=15540730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15244794A Expired - Fee Related JP3663215B2 (en) | 1994-07-04 | 1994-07-04 | Vacuum adsorption apparatus and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3663215B2 (en) |
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