JPH08167553A - Work fixing device - Google Patents
Work fixing deviceInfo
- Publication number
- JPH08167553A JPH08167553A JP31028694A JP31028694A JPH08167553A JP H08167553 A JPH08167553 A JP H08167553A JP 31028694 A JP31028694 A JP 31028694A JP 31028694 A JP31028694 A JP 31028694A JP H08167553 A JPH08167553 A JP H08167553A
- Authority
- JP
- Japan
- Prior art keywords
- processed
- mask
- fixing
- points
- elastic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Jigs For Machine Tools (AREA)
- Electron Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体製造関連装置の
被処理材の固定装置に係り、詳しくは、マスクブランク
ス等の薄板平面形状物の被処理材をマスクホルダ等の被
処理材保持部材に固定する被処理材の固定装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device for fixing a material to be processed in a semiconductor manufacturing-related device, and more specifically, to a material to be processed such as a mask holder for a material to be processed such as a mask blank. The present invention relates to a fixing device for a material to be processed which is fixed to the substrate.
【０００２】[0002]
【従来の技術】通常、電子ビーム描画装置、又はマスク
検査装置等においては、被処理材であるマスクブランク
スをマスクホルダ（カセット）に固定した後、マスクホ
ルダをステージ上に位置決め固定し、ステージを移動さ
せながらマスクブランクスに描画したり、または検査す
るようになっている。2. Description of the Related Art Generally, in an electron beam drawing apparatus, a mask inspection apparatus, etc., after a mask blank as a material to be processed is fixed to a mask holder (cassette), the mask holder is positioned and fixed on the stage to set the stage. The mask blanks are drawn or inspected while being moved.
【０００３】従来、被処理材であるマスクブランクスを
マスクホルダに固定する場合の固定装置としては、図６
に示す機械式クランプ方式のもの、すなわち、マスクホ
ルダａに、平面度良く加工された基準面ｂを有する基準
片ｃを３点あるいは４点配設すると共に、これら基準片
ｃ…（１か所のみ図示）に対向してバネｄにより基準片
ｃ方向に付勢された支持部材ｅ…（１か所のみ図示）を
配設し、マスクブランクスｇの端縁部の３点あるいは４
点を、支持部材ｅ…により基準片ｃ…に押付けた状態で
支持することにより固定するものが知られている。Conventionally, a fixing device for fixing a mask blank as a material to be processed to a mask holder is shown in FIG.
In the mechanical clamp type shown in FIG. 1, that is, three or four reference pieces c having a reference surface b processed with good flatness are arranged on the mask holder a, and these reference pieces c ... (One place) (Only one is shown), which is urged in the direction of the reference piece c by the spring d so as to face (only one is shown), and three points or four points at the edge of the mask blank g are provided.
It is known that a point is fixed by being supported by a supporting member e while being pressed against a reference piece c.
【０００４】また、他の固定装置としては、図示しない
が、３点あるいは４点配設された基準片部に真空チャッ
クを設けて吸着固定する真空チャック方式のものがあ
る。しかしながら、このように、３点あるいは４点を支
持又は吸着固定する構造とした場合、１〜２μｍ以下の
高精度に加工されたマスクブランクスｇの平面度が、マ
スクブランクスｇの自重、また、マスクブランクスｇ自
身の平面度とマスクホルダａの３点あるいは４点のＺ方
向基準面ｂで形成される平面との相性（平面度傾向の
差）によって、マスクブランクスｇ自身の平面度が悪化
させられる問題があった。Further, as another fixing device, although not shown, there is a vacuum chuck type device in which a vacuum chuck is provided on a reference piece portion arranged at three points or four points and fixed by suction. However, when the structure is such that three points or four points are supported or fixed by suction as described above, the flatness of the mask blanks g processed with high accuracy of 1 to 2 μm or less depends on the weight of the mask blanks g and the mask blanks g. The flatness of the mask blank g itself is deteriorated by the compatibility (difference in flatness tendency) between the flatness of the blank g itself and the plane formed by the three or four Z-direction reference planes b of the mask holder a. There was a problem.
【０００５】特に「５００９マスク」、すなわち、１辺
が５インチの正方形で厚さが０．０９インチ（２．３ｍ
ｍ）の薄いガラスマスクは、自重たわみが大きく、マス
クの大きさと厚さで変わるが、１〜２μｍ、又はそれ以
上に平面度が悪化するといった問題がある。In particular, a "5009 mask", that is, a square having sides of 5 inches and a thickness of 0.09 inches (2.3 m)
The thin glass mask of m) has a large deflection under its own weight and varies depending on the size and thickness of the mask, but has a problem that the flatness deteriorates by 1 to 2 μm or more.
【０００６】また、同一マスクブランクスｇの固定精度
の繰り返し再現性についても、３点あるいは４点のＺ方
向基準面ｂとバネｄの力で押上げられる支持部材ｅ…の
押し点との微小なオフセットにより、マスクブランクス
ｇに曲げモーメントが発生し、平面度の再現性が悪くな
るといった問題がある。Regarding the repeatability of the fixing accuracy of the same mask blank g, the three or four Z-direction reference planes b and the pushing points of the supporting members e ... The offset causes a bending moment in the mask blank g, resulting in poor reproducibility of flatness.
【０００７】従来においては、電子ビーム描画装置に
て、「５００９マスク」に描画するパターンの位置精度
は、０．１〜０．１５μｍ／１００ｍｍピッチ程度で問
題がなかった。換言すれば、マスクブランクスｇの端縁
部の３点あるいは４点を支持又は吸着固定する構造で得
られる平面度で十分機能を満足していた。Conventionally, the position accuracy of the pattern drawn on the "5009 mask" in the electron beam drawing apparatus was about 0.1 to 0.15 μm / 100 mm pitch, and there was no problem. In other words, the flatness obtained by the structure of supporting or adsorbing and fixing three points or four points of the edge portion of the mask blank g sufficiently satisfied the function.
【０００８】しかし、近年は、描画するパターンの位置
精度として０．０６〜０．０８μｍ又はそれ以下が要求
されている。換言すれば、３点あるいは４点を支持又は
吸着固定する構造で得られる平面度では不十分となっ
た。However, in recent years, the positional accuracy of the pattern to be drawn is required to be 0.06 to 0.08 μm or less. In other words, the flatness obtained by the structure in which three or four points are supported or fixed by suction is insufficient.
【０００９】因みに、パターン位置精度の変化は、ｔ：
被処理材の厚さ、δ：平面度変化量、Ｌ：被処理材の長
さ、ΔＬ：水平方向の変化量（マスク表面の伸縮量）と
した場合、次式で表される。By the way, the change in pattern position accuracy is t:
When the thickness of the material to be processed, δ: flatness variation, L: length of the material to be treated, and ΔL: horizontal variation (expansion / contraction amount of the mask surface) are expressed by the following equations.
【００１０】（４ｔδ）／Ｌ＝ΔＬ たとえば、縦横１００ｍｍの正方形で、厚さが２．３ｍ
ｍのマスクの平面度が０．５μｍ（δ）変化したとする
と、上記式より、（４×２．３ｍｍ×０．５μｍ）／１
００ｍｍ＝約０．０５μｍとなり、１００ｍｍで約０．
０５μｍの処理精度の低下となる。(4tδ) / L = ΔL For example, a square having a length of 100 mm and a thickness of 2.3 m.
Assuming that the flatness of the mask of m changes by 0.5 μm (δ), from the above equation, (4 × 2.3 mm × 0.5 μm) / 1
00 mm = about 0.05 μm, and about 100 mm is about 0.
The processing accuracy is reduced by 05 μm.
【００１１】[0011]
【発明が解決しようとする課題】上記のように、従来の
被処理材の固定装置にあっては、マスクブランクス等の
薄板平面形状物の被処理材の端縁部を、３点あるいは４
点で支持又は吸着固定する構造であったため、被処理材
の自重による撓みや、固定時に発生する曲げモーメント
の影響で、平面度が損なわれ、結果として、電子ビーム
描画装置、又はマスク検査装置等の被処理材に対する処
理精度を向上させることができないといった問題があっ
た。As described above, in the conventional apparatus for fixing the material to be processed, the edge portion of the material to be processed of the thin plate planar shape such as the mask blanks has three or four points.
Since the structure is supported or fixed by suction at a point, the flatness is impaired due to the bending of the material to be processed due to its own weight or the bending moment generated at the time of fixing, and as a result, an electron beam drawing device, a mask inspection device, etc. However, there is a problem that the processing accuracy of the material to be processed cannot be improved.
【００１２】本発明は、上記事情に基づきなされたもの
で、マスクブランクス等の薄板平面形状物の被処理材の
平面度を損なうことなく保持でき、被処理材に対する処
理精度の向上を可能とした被処理材の固定装置を提供す
ることを目的とする。The present invention has been made in view of the above circumstances, and it is possible to hold a thin plate planar shape object such as a mask blank or the like without impairing the flatness of the object to be processed, and it is possible to improve the processing accuracy for the object to be processed. An object is to provide a fixing device for a material to be processed.
【００１３】[0013]
【課題を解決するための手段】本発明は、上記課題を解
決するための第１の手段として、薄板平面形状物の被処
理材を被処理材保持部材に固定する被処理材の固定装置
であって、前記被処理材保持部材に設けられ、前記被処
理材の下面を多数の弾性支持点で受け、前記被処理材の
重力方向の位置決めを行った状態で支持する支持手段
と、前記被処理材保持部材に設けられ、前記被処理材の
端部を重力方向には低剛性で水平面方向には高剛性な弾
性保持部材で連結保持する保持手段とを具備してなる構
成としたものである。The present invention provides, as a first means for solving the above-mentioned problems, a device for fixing a material to be processed, which fixes a material to be processed, which is a thin flat plate, to a material holding member to be processed. A support means provided on the member to be processed, which receives the lower surface of the member to be processed at a plurality of elastic support points and supports the member to be processed in a state of being positioned in the gravity direction; A holding member is provided on the processing material holding member, and has a holding means for connecting and holding the end portion of the processing target material with an elastic holding member having low rigidity in the gravity direction and high rigidity in the horizontal direction. is there.
【００１４】また、第２の手段として、薄板平面形状物
の被処理材を被処理材保持部材に固定する被処理材の固
定装置であって、前記被処理材保持部材に設けられ、前
記被処理材の下面を多数の弾性支持点で受け、前記被処
理材の重力方向の位置決めを行った状態で支持する支持
手段と、前記被処理材保持部材に設けられ、前記被処理
材の一端面側に設けられた複数の基準点及び他端面側に
設けられ水平面方向に前記被処理材を押圧する押圧部材
を有し、前記被処理材を複数の基準点に押付けて保持す
る保持手段とを具備してなる構成としたものである。As a second means, there is provided a device for fixing a material to be processed, which fixes a material to be processed, which is a thin plate planar shape, to a material to be processed holding member, the device being provided on the material to be processed holding member. Supporting means for receiving the lower surface of the processing material at a plurality of elastic supporting points and supporting the processing material in a state where the processing material is positioned in the direction of gravity, and one end surface of the processing material provided on the processing material holding member. A plurality of reference points provided on the side and a pressing member that is provided on the other end surface side and presses the material to be processed in a horizontal plane direction, and a holding unit that presses and holds the material to be processed at the plurality of reference points. It is configured as provided.
【００１５】[0015]
【作用】上記第１の手段の被処理材の固定装置によれ
ば、被処理材の下面を多数の弾性支持点で受けるため、
重力の影響を受け難い形で被処理材を支持でき、かつ、
被処理材の端部を重力方向には低剛性で水平面方向には
高剛性な弾性保持部材で連結保持するようにしたから、
被処理材をＸＹ方向には固定するが、その保持力が被処
理材の平面度を害することのない構造が得られる。これ
により、被処理材の自重による撓みの発生を防止でき、
また、曲げモーメントの発生を防止でき、被処理材の平
面度を損なうことなく、装置の処理精度の向上が可能と
なる。According to the apparatus for fixing a material to be processed of the first means, since the lower surface of the material to be processed is received by a large number of elastic supporting points,
The material to be processed can be supported in a form that is not easily affected by gravity, and
Since the end portion of the material to be processed is connected and held by an elastic holding member having low rigidity in the gravity direction and high rigidity in the horizontal plane,
Although the material to be processed is fixed in the XY directions, a structure can be obtained in which the holding force does not impair the flatness of the material to be processed. As a result, it is possible to prevent the occurrence of bending due to the weight of the material to be processed,
Further, generation of a bending moment can be prevented, and the processing accuracy of the device can be improved without impairing the flatness of the material to be processed.
【００１６】また、第２の手段の被処理材の固定装置に
よれば、被処理材の下面を多数の弾性支持点で受けるた
め、重力の影響を受け難い形で被処理材を支持でき、か
つ、被処理材の一端面側に設けられた複数の基準点及び
他端面側に設けられ水平面方向に被処理材を押圧する押
圧部材を有し、被処理材を複数の基準点に押付けて保持
するようにしたから、被処理材をＸＹ方向には固定する
が、その保持力が被処理材の平面度を害することのない
構造が得られる。これにより、被処理材の自重による撓
みの発生を防止でき、また、曲げモーメントの発生を防
止でき、被処理材の平面度を損なうことなく、装置の処
理精度の向上が可能となる。According to the apparatus for fixing a material to be processed of the second means, since the lower surface of the material to be processed is received by a large number of elastic supporting points, the material to be processed can be supported in a form which is hardly influenced by gravity. Further, it has a plurality of reference points provided on one end surface side of the material to be processed and a pressing member provided on the other end surface side to press the material to be processed in the horizontal direction, and press the material to be processed to the plurality of reference points. Since the material is held, the material to be processed is fixed in the XY directions, but a structure in which the holding force does not impair the flatness of the material to be processed can be obtained. As a result, it is possible to prevent the occurrence of bending due to the weight of the material to be processed and the bending moment, and it is possible to improve the processing accuracy of the device without impairing the flatness of the material to be processed.
【００１７】[0017]
【実施例】以下、本発明の一実施例について、図１ない
し図３を参照して説明する。まず、図１及び図２におい
て、図中１は、電子ビーム描画装置、又はマスク検査装
置等の半導体製造関連装置におけるＸ，Ｙ方向に移動可
能なステージであり、このステージ１の上面部には、直
交する２辺に沿って位置測定用の２本のレーザミラー
２，４が配設されている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIGS. First, in FIGS. 1 and 2, reference numeral 1 in the drawings denotes a stage movable in X and Y directions in a semiconductor manufacturing related apparatus such as an electron beam drawing apparatus or a mask inspection apparatus. , Two laser mirrors 2 and 4 for position measurement are arranged along two orthogonal sides.
【００１８】また、ステージ１の上面側には、平行な支
持台６，６を介して３つのステージ基準片８…が配設さ
れていると共に、これらステージ基準片８…に対向して
ステージホルダクランプバネ１０…が配設されており、
被処理材保持部材であるマスクホルダ（カセット）１２
が、前記ステージ基準片８…の下面に押付固定されてい
る。Further, on the upper surface side of the stage 1, three stage reference pieces 8 ... Are disposed via parallel support bases 6 and, and the stage holder is opposed to these stage reference pieces 8 ... Clamp springs 10 are provided,
Mask holder (cassette) 12 that is a member to be processed holding member
Are pressed and fixed to the lower surface of the stage reference pieces 8.
【００１９】また、マスクホルダ１２の上面には、三方
をコ字状の枠部１２Ａで囲繞された被処理材収容部とし
てのマスクブランクス収容部１４が形成されており、こ
のマスクブランクス収容部１４に、被処理材であるマス
クブランクス１６が後述する被処理材固定装置としての
マスクブランクス固定装置１８を介して固定されてい
る。Further, on the upper surface of the mask holder 12, there is formed a mask blanks accommodating portion 14 as a material to be treated accommodating portion surrounded by U-shaped frame portions 12A on three sides. Further, the mask blanks 16 as the material to be processed are fixed via a mask blanks fixing device 18 as a material to be processed fixing device described later.
【００２０】マスクブランクス固定装置１８は、マスク
ブランクス１６の下面を多数のコイルバネからなる弾性
支持点２０…で受け、マスクブランクス１６の重力方向
の位置決めを行った状態で支持する支持手段としての支
持機構２２と、マスクブランクス１６の端部を重力方向
（Ｚ方向）には低剛性で水平面方向（ＸＹ方向）には高
剛性な複数（この実施例では図１に示すように４セッ
ト）の弾性保持部材２４…で連結保持する保持手段とし
ての保持機構２６とで構成されている。The mask blanks fixing device 18 receives the lower surface of the mask blanks 16 at elastic supporting points 20 made up of a large number of coil springs, and supports the mask blanks 16 in a state where the mask blanks 16 are positioned in the gravity direction. 22 and a plurality of elastic holdings (4 sets as shown in FIG. 1 in this embodiment) 22 having low rigidity in the gravity direction (Z direction) and high rigidity in the horizontal direction (XY direction) at the end portions of the mask blanks 16. A holding mechanism 26 as a holding means for connecting and holding the members 24.
【００２１】保持機構２６を構成する弾性保持部材２４
は、図３に詳図するような構成となっている。すなわ
ち、マスクホルダ１２の枠部１２Ａに一端を固定したＸ
Ｙ方向には剛性が高く、Ｚ方向には低剛性の板バネ２８
と、この板バネ２８にてマスクホルダ１２と連結された
被処理材保持具としてのマスクバサミ３０を有した構成
となっている。Elastic holding member 24 constituting the holding mechanism 26
Has a configuration as shown in detail in FIG. That is, the X having one end fixed to the frame portion 12A of the mask holder 12
A leaf spring 28 having high rigidity in the Y direction and low rigidity in the Z direction
And a mask scissors 30 as a workpiece holder connected to the mask holder 12 by the leaf spring 28.
【００２２】マスクバサミ３０は、支持ピン３２により
連結された一対の挾持片３０Ａ，３０Ｂを有し、バネ３
４の付勢力でマスクブランクス１６の端をクランプする
ようになっている。The mask scissors 30 has a pair of holding pieces 30A and 30B connected by a support pin 32, and a spring 3
The urging force of 4 clamps the end of the mask blanks 16.
【００２３】また、マスクバサミ３０の下面側には、バ
ネ３６，３６が配設されており、これらバネ３６，３６
によってマスクバサミ３０の重量を相殺し、マスクブラ
ンクス１６にＺ方向外力をかけないようになっている。
また、バネ３６，３６の付勢力は、調整ねじ３８，３８
の締め込み量を変えることにより調整可能となってい
る。Further, springs 36, 36 are arranged on the lower surface side of the mask scissors 30, and these springs 36, 36 are provided.
Thus, the weight of the mask scissors 30 is offset and the Z-direction external force is not applied to the mask blanks 16.
The biasing force of the springs 36, 36 is
It can be adjusted by changing the tightening amount.
【００２４】また、ネジ４０は、図示しないマスクアン
クランプ機構によってマスクバサミ３０をリリースする
時の外力を受けるためのものである。しかして、上記の
ように構成された本発明の被処理材固定装置としてのマ
スクブランクス固定装置１８によれば、マスクブランク
ス１６の下面を多数のコイルバネからなる弾性支持点２
０…で受けるため、重力の影響を受け難い形でマスクブ
ランクス１６を保持でき、かつ、マスクブランクス１６
の端部を重力方向には低剛性で水平面方向には高剛性な
弾性保持部材２４…で保持するようにしたから、マスク
ブランクス１６をＸＹ方向には固定するが、その保持力
がマスクブランクス１６の平面度を害することのない構
造が得られる。これにより、マスクブランクス１６の自
重による撓みの発生を防止でき、また、曲げモーメント
の発生を防止でき、マスクブランクス１６の平面度を損
なうことなく、装置の処理精度の向上が可能となる。The screw 40 is for receiving an external force when the mask scissors 30 is released by a mask unclamp mechanism (not shown). According to the mask blanks fixing device 18 as the device to be treated fixing device of the present invention configured as described above, the lower surface of the mask blanks 16 is provided with the elastic support points 2 composed of a large number of coil springs.
Since it is received by 0 ..., the mask blanks 16 can be held in a shape that is not easily affected by gravity, and the mask blanks 16
Since the end portions of the mask blanks 16 are held by the elastic holding members 24 ... Which have low rigidity in the gravity direction and high rigidity in the horizontal direction, the mask blanks 16 are fixed in the XY directions. A structure that does not impair the flatness of As a result, it is possible to prevent the occurrence of bending of the mask blanks 16 due to its own weight, to prevent the occurrence of bending moments, and to improve the processing accuracy of the apparatus without impairing the flatness of the mask blanks 16.
【００２５】なお、上述の一実施例において、マスクブ
ランクス１６の下面を多数のコイルバネからなる弾性支
持点２０…で受けるものについて説明したが、図４に示
すように、ゴム、スポンジ等の非金属弾性体からなる弾
性支持点２０′…として、支持手段としての支持機構２
２′を構成するようにしても同様の効果が得られる。In the above-mentioned embodiment, the mask blank 16 is described as being supported by the elastic support points 20 formed of a large number of coil springs on the lower surface. However, as shown in FIG. 4, a nonmetal such as rubber or sponge is used. As the elastic support points 20 '... made of an elastic body, the support mechanism 2 as a support means.
The same effect can be obtained by configuring 2 '.
【００２６】また、板バネ２８とマスクバサミ３０を有
する弾性保持部材２４…の代わりに、図５のごとく、マ
スクブランクス１６の一端面側に設けられた複数の基準
点としてのＸＹ基準４２…を設けると共に、他端面側に
水平面方向（ＸＹ方向）にマスクブランクス１６を押圧
する押圧部材としてのバネ４４を設け、マスクブランク
ス１６を複数のＸＹ基準４２…に押付けて保持するよう
にしてもよい。そして、保持手段としての保持機構２
６′を構成するようにしてもよい。その他、本発明は上
記実施例に限らず、要旨を変えない範囲で種々変形実施
可能なことは勿論である。Further, instead of the elastic holding members 24 having the leaf spring 28 and the mask scissors 30, as shown in FIG. 5, there are provided XY references 42 ... As a plurality of reference points provided on one end face side of the mask blank 16. At the same time, the spring 44 as a pressing member for pressing the mask blanks 16 in the horizontal plane direction (XY direction) may be provided on the other end surface side, and the mask blanks 16 may be pressed against and held by a plurality of XY references 42. And the holding mechanism 2 as a holding means
6'may be configured. In addition, the present invention is not limited to the above-described embodiments, and it goes without saying that various modifications can be made without departing from the scope of the invention.
【００２７】[0027]
【発明の効果】以上説明したように、本発明によれば、
つぎのような効果を奏する。請求項１記載の被処理材の
固定装置によれば、被処理材の下面を多数の弾性支持点
で受けるため、重力の影響を受け難い形で被処理材を支
持でき、かつ、被処理材の端部を重力方向には低剛性で
水平面方向には高剛性な弾性保持部材で連結保持するよ
うにしたから、被処理材をＸＹ方向には固定するが、そ
の保持力が被処理材の平面度を害することのない構造が
得られる。これにより、被処理材の自重による撓みの発
生を防止でき、また、曲げモーメントの発生を防止で
き、被処理材の平面度を損なうことなく、装置の処理精
度の向上が可能となる。As described above, according to the present invention,
The following effects are obtained. According to the apparatus for fixing a material to be processed according to claim 1, since the lower surface of the material to be processed is supported by a large number of elastic supporting points, the material to be processed can be supported in a form less susceptible to the influence of gravity, and the material to be processed can be supported. Since the end portions of the workpieces are connected and held by an elastic holding member that has low rigidity in the gravity direction and high rigidity in the horizontal direction, the material to be processed is fixed in the XY directions. A structure that does not impair the flatness can be obtained. As a result, it is possible to prevent the occurrence of bending due to the weight of the material to be processed and the occurrence of bending moment, and it is possible to improve the processing accuracy of the apparatus without impairing the flatness of the material to be processed.
【００２８】また、請求項２記載の被処理材の固定装置
によれば、多数の弾性支持点が、バネで構成されている
から、構成が簡単かつ安価ですむ。また、請求項３記載
の被処理材の固定装置によれば、多数の弾性支持点が、
非金属弾性体で構成されているから、構成が簡単かつ安
価ですむ。According to the apparatus for fixing a material to be treated according to the second aspect of the invention, since a large number of elastic supporting points are constituted by springs, the constitution is simple and inexpensive. Further, according to the fixing device for a material to be treated according to claim 3, the plurality of elastic supporting points are
Since it is composed of a non-metallic elastic body, the structure is simple and inexpensive.
【００２９】また、請求項４記載の被処理材の固定装置
によれば、被処理材の下面を多数の弾性支持点で受ける
ため、重力の影響を受け難い形で被処理材を支持でき、
かつ、被処理材の一端面側に設けられた複数の基準点及
び他端面側に設けられ水平面方向に被処理材を押圧する
押圧部材を有し、被処理材を複数の基準点に押付けて保
持するようにしたから、被処理材をＸＹ方向には固定す
るが、その保持力が被処理材の平面度を害することのな
い構造が得られる。これにより、被処理材の自重による
撓みの発生を防止でき、また、曲げモーメントの発生を
防止でき、被処理材の平面度を損なうことなく、装置の
処理精度の向上が可能となる。Further, according to the apparatus for fixing a material to be processed according to claim 4, since the lower surface of the material to be processed is received by a large number of elastic supporting points, the material to be processed can be supported in a form less susceptible to the influence of gravity.
Further, it has a plurality of reference points provided on one end surface side of the material to be processed and a pressing member provided on the other end surface side to press the material to be processed in the horizontal direction, and press the material to be processed to the plurality of reference points. Since the material is held, the material to be processed is fixed in the XY directions, but a structure in which the holding force does not impair the flatness of the material to be processed can be obtained. As a result, it is possible to prevent the occurrence of bending due to the weight of the material to be processed and the bending moment, and it is possible to improve the processing accuracy of the device without impairing the flatness of the material to be processed.
【図１】本発明の一実施例を示す平面図。FIG. 1 is a plan view showing an embodiment of the present invention.
【図２】図１のＡ−Ａ線に沿う断面図。FIG. 2 is a sectional view taken along the line AA of FIG. 1;
【図３】同じく一実施例のマスク保持部の詳細図。FIG. 3 is a detailed view of the mask holding unit of the same embodiment.
【図４】本発明の他の実施例のマスク保持部の詳細図。FIG. 4 is a detailed view of a mask holder according to another embodiment of the present invention.
【図５】本発明のさらに異なる他の実施例のマスク保持
部の詳細図。FIG. 5 is a detailed view of a mask holder according to still another embodiment of the present invention.
【図６】従来例のマスク保持部の詳細図。FIG. 6 is a detailed view of a mask holding unit of a conventional example.
１…ステージ、１２…マスクホルダ（被処理材保持部
材）、１６…マスクブランクス（被処理材）、１８…マ
スクブランクス固定装置（被処理材固定装置）、２０…
コイルバネからなる弾性支持点、２０′…非金属弾性体
からなる弾性支持点、２２…支持機構（支持手段）、２
４…弾性保持部材、２６，２６′…保持機構（保持手
段）、２８…板バネ、３０…マスクバサミ（被処理材保
持具）、４２…ＸＹ基準（基準点）、４４…バネ（押圧
部材）。1 ... Stage, 12 ... Mask holder (processed material holding member), 16 ... Mask blanks (processed material), 18 ... Mask blanks fixing device (processed material fixing device), 20 ...
Elastic support points composed of coil springs, 20 '... Elastic support points composed of non-metallic elastic body, 22 ... Support mechanism (support means), 2
4 ... Elastic holding member, 26, 26 '... Holding mechanism (holding means), 28 ... Leaf spring, 30 ... Mask scissors (workpiece holder), 42 ... XY reference (reference point), 44 ... Spring (pressing member) ).
Claims (4)
部材に固定する被処理材の固定装置であって、 前記被処理材保持部材に設けられ、前記被処理材の下面
を多数の弾性支持点で受け、前記被処理材の重力方向の
位置決めを行った状態で支持する支持手段と、 前記被処理材保持部材に設けられ、前記被処理材の端部
を重力方向には低剛性で水平面方向には高剛性な弾性保
持部材で連結保持する保持手段と、を具備してなること
を特徴とする被処理材の固定装置。1. An apparatus for fixing a material to be processed, which fixes a material to be processed, which is a thin-plate planar object, to a material to be processed holding member, wherein a plurality of lower surfaces of the material to be processed are provided on the material to be processed holding member. Supporting means for receiving the elastic member at the elastic supporting points of the processed material and supporting the processed material in a state where the processed material is positioned in the gravitational direction. A device for fixing a material to be treated, comprising: a holding means that is connected and held by an elastic holding member that is rigid and highly rigid in the horizontal direction.
で構成されていることを特徴とする請求項１記載の被処
理材の固定装置。2. The apparatus for fixing a material to be treated according to claim 1, wherein a large number of elastic supporting points of the supporting means are constituted by springs.
属弾性体で構成されていることを特徴とする請求項１記
載の被処理材の固定装置。3. The apparatus for fixing a material to be processed according to claim 1, wherein a large number of elastic supporting points of the supporting means are made of a non-metallic elastic body.
部材に固定する被処理材の固定装置であって、 前記被処理材保持部材に設けられ、前記被処理材の下面
を多数の弾性支持点で受け、前記被処理材の重力方向の
位置決めを行った状態で支持する支持手段と、 前記被処理材保持部材に設けられ、前記被処理材の一端
面側に設けられた複数の基準点及び他端面側に設けられ
水平面方向に前記被処理材を押圧する押圧部材を有し、
前記被処理材を複数の基準点に押付けて保持する保持手
段と、を具備してなることを特徴とする被処理材の固定
装置。4. An apparatus for fixing a material to be processed, which fixes a material to be processed, which is a planar thin sheet, to a material to be processed holding member, wherein a plurality of lower surfaces of the material to be processed are provided on the material to be processed holding member. Supporting means for receiving at the elastic supporting points of the processed material in a state where the processed material is positioned in the direction of gravity, and a plurality of support means provided on the processed material holding member and provided on one end surface side of the processed material. Of the reference point and the other end surface side having a pressing member for pressing the material to be processed in the horizontal direction,
A holding device for holding the material to be processed by pressing it against a plurality of reference points, and a fixing device for the material to be processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31028694A JPH08167553A (en) | 1994-12-14 | 1994-12-14 | Work fixing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31028694A JPH08167553A (en) | 1994-12-14 | 1994-12-14 | Work fixing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08167553A true JPH08167553A (en) | 1996-06-25 |
Family
ID=18003403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31028694A Pending JPH08167553A (en) | 1994-12-14 | 1994-12-14 | Work fixing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08167553A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002198307A (en) * | 2000-10-17 | 2002-07-12 | Nikon Corp | Holding chuck for lithography system |
| US6480260B1 (en) | 1999-12-03 | 2002-11-12 | Asml Netherlands B.V. | Mask clamping apparatus, e.g. for a lithographic apparatus |
| US7307698B2 (en) | 2004-02-18 | 2007-12-11 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
| US20120158191A1 (en) * | 2009-06-12 | 2012-06-21 | Niek Rijnveld | active vibration isolation and damping system |
| CN111558918A (en) * | 2020-07-15 | 2020-08-21 | 苏州鼎纳自动化技术有限公司 | Floating support mechanism for thin workpiece |
-
1994
- 1994-12-14 JP JP31028694A patent/JPH08167553A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6480260B1 (en) | 1999-12-03 | 2002-11-12 | Asml Netherlands B.V. | Mask clamping apparatus, e.g. for a lithographic apparatus |
| USRE41307E1 (en) | 1999-12-03 | 2010-05-04 | Asml Netherlands B.V. | Mask for clamping apparatus, e.g. for a lithographic apparatus |
| JP2002198307A (en) * | 2000-10-17 | 2002-07-12 | Nikon Corp | Holding chuck for lithography system |
| US7307698B2 (en) | 2004-02-18 | 2007-12-11 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
| US20120158191A1 (en) * | 2009-06-12 | 2012-06-21 | Niek Rijnveld | active vibration isolation and damping system |
| US9488247B2 (en) * | 2009-06-12 | 2016-11-08 | Mecal B.V. | Active vibration isolation and damping system |
| CN111558918A (en) * | 2020-07-15 | 2020-08-21 | 苏州鼎纳自动化技术有限公司 | Floating support mechanism for thin workpiece |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR20070070047A (en) | Flat surface machining device and method of surport of flat stage machined by the same | |
| JPS6140085B2 (en) | ||
| JPH0897133A (en) | Sample holder | |
| US4711438A (en) | Mask holding | |
| JPS61125128A (en) | Positioning apparatus for work | |
| JPH08167553A (en) | Work fixing device | |
| JP3349572B2 (en) | Thin plate fixing device | |
| JPH08203988A (en) | Fixer of material to be treated | |
| JP2002530880A (en) | Substrate support device | |
| JPH05259263A (en) | Xy fine-moving stage | |
| US6960772B1 (en) | Mask carrier | |
| JP3368139B2 (en) | Sample stage for electron beam writing system | |
| JP3708984B2 (en) | Fixing device for workpiece | |
| JPH04121605A (en) | Mounting construction for laser interferometer mirror for detecting position | |
| JPS62139330A (en) | Fixation of material to be processed and device thereof | |
| JP2986556B2 (en) | Sample positioning mechanism | |
| JPH07125838A (en) | Positioning table device | |
| JPH11135412A (en) | Projection aligner and method for holding reticule | |
| JP4218916B2 (en) | Method of manufacturing support device for object to be measured | |
| JPH09205131A (en) | Apparatus for fixing material to be treated to stage for manufacture of semiconductor | |
| JPH08241849A (en) | Aligner | |
| JPH07147227A (en) | Substrate fixing method and substrate fixing structure | |
| JPH06216221A (en) | Positioning apparatus | |
| JPH0158652B2 (en) | ||
| JPH01106439A (en) | Work stage device |