JPH075678A - Production of mask for exposing and its device - Google Patents
Production of mask for exposing and its deviceInfo
- Publication number
- JPH075678A JPH075678A JP32224691A JP32224691A JPH075678A JP H075678 A JPH075678 A JP H075678A JP 32224691 A JP32224691 A JP 32224691A JP 32224691 A JP32224691 A JP 32224691A JP H075678 A JPH075678 A JP H075678A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- foreign matter
- mask body
- thin film
- pattern layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000010409 thin film Substances 0.000 claims abstract description 48
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000000428 dust Substances 0.000 claims abstract description 5
- 238000001459 lithography Methods 0.000 claims abstract description 5
- 230000001681 protective effect Effects 0.000 claims 1
- 238000007689 inspection Methods 0.000 abstract description 8
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、例えば液晶・半導体等
用の露光用マスク製造方法及びその装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure mask manufacturing method and apparatus for liquid crystals, semiconductors, and the like.
【０００２】[0002]
【従来の技術】従来、パターン層の形成されたマスク本
体に防塵用の薄膜体を貼着する際には、先ずパターン層
が上方に向くようにマスク本体を支持した後にパターン
層全面を開口した状態でその一端側より順次検査し、塵
埃等の異物がマスク本体の上面に付着していればエアー
の噴射等で洗浄して取り除き、その後薄膜体を作業者に
よりマスク本体に貼着して取り付けられていた。2. Description of the Related Art Conventionally, when attaching a dustproof thin film to a mask body having a pattern layer formed thereon, first the mask body is supported so that the pattern layer faces upward, and then the entire surface of the pattern layer is opened. In this state, sequentially inspect from one end side, and if foreign matter such as dust adheres to the upper surface of the mask body, wash and remove with air jet, etc., then attach the thin film body to the mask body by an operator It was being done.
【０００３】[0003]
【発明が解決しようとする課題】上記従来の露光マスク
の製造において、薄膜体をマスク本体に貼着する前に行
う異物の有無の検査は、マスク本体の上方を開放した状
態でパターン層の一方より順次検査するので検査中にす
でに検査済の部分に塵埃等の異物が付着したり、また薄
膜体を作業者がマスク本体に貼着する際にパターン層に
異物が付着するおそれがあり、これらの異物が薄膜体を
貼着した後に行う検査において発見された場合には、一
度貼着した薄膜を剥がして取り除き、パターン層を洗浄
し、その後再度薄膜を貼着しなければならない等の作業
が必要となり、作業が煩雑で作業能率の低下を招く等の
問題があった。In the manufacture of the above-mentioned conventional exposure mask, the inspection for the presence of foreign matter before adhering the thin film body to the mask body is performed by using one of the pattern layers with the upper side of the mask body open. Since the inspection is performed more sequentially, foreign matter such as dust may be attached to the already-inspected portion during the inspection, or foreign matter may be attached to the pattern layer when the worker attaches the thin film body to the mask body. If foreign matter is found in the inspection performed after the thin film is attached, the thin film that has been once attached must be peeled off and removed, the pattern layer must be washed, and then the thin film must be attached again. However, there is a problem that the work becomes complicated and the work efficiency is lowered.
【０００４】また、上記のように異物が薄膜体を貼着し
た後に発見された場合には、薄膜体を剥がして、異物を
除去しなければならないことから、薄膜体の使用量が多
くなり不経済であるという問題点があった。Further, when the foreign matter is found after the thin film body is adhered as described above, the thin film body must be peeled off to remove the foreign matter, so that the amount of the thin film body used becomes large, which is a problem. There was a problem that it was an economy.
【０００５】本発明は上記問題点に鑑みて発明されたも
ので、パターン層における異物の検査においては、検査
中に異物がパターン層に付着するのを防止するととも
に、薄膜体をマスク本体に取り付ける際に、パターン層
に異物が付着するのを防止でき、しかも異物の混入のた
め一旦貼着した薄膜体を剥がす必要がなく作業が容易
で、且つ迅速に行うことができ、しかも経済的な露光用
マスクの製造方法及びその装置を提供することを課題と
する。The present invention has been invented in view of the above problems, and in the inspection of foreign matter in a pattern layer, the foreign matter is prevented from adhering to the pattern layer during the inspection and the thin film body is attached to the mask body. At this time, it is possible to prevent foreign matter from adhering to the pattern layer, and it is not necessary to peel off the thin film body once attached due to the inclusion of foreign matter, so the work can be performed easily and quickly, and economical exposure is possible. An object of the present invention is to provide a method for manufacturing a mask for use in a mask and an apparatus therefor.
【０００６】[0006]
【課題を解決するための手段】本発明は、上記課題を解
決するために露光用マスクの製造方法及びその装置とし
てなされるもので露光用マスクの製造方法としての特徴
は、リソグラフィ工程等によりパターン層２ａをマスク
本体２に形成した後に、パターン層２ａを塵埃等の異物
より保護するための薄膜体７をマスク本体２のパターン
層２ａ側に貼着する露光用マスクの製造方法において、
前記マスク本体２を支持し、その後に薄膜体７をその貼
着部がマスク本体２と隙間を有するように保持し、その
状態でマスク本体２の上面の異物の有無の検査を行い、
異物の無い場合に、薄膜体７をマスク本体２に貼着こと
にある。The present invention is implemented as a method and apparatus for manufacturing an exposure mask in order to solve the above problems. The characteristic of the method for manufacturing an exposure mask is that a pattern is formed by a lithography process or the like. In the method of manufacturing an exposure mask, after the layer 2a is formed on the mask body 2, a thin film body 7 for protecting the pattern layer 2a from foreign matter such as dust is attached to the pattern layer 2a side of the mask body 2.
The mask main body 2 is supported, and then the thin film body 7 is held so that the adhered portion has a gap with the mask main body 2. In that state, the presence or absence of foreign matter on the upper surface of the mask main body 2 is inspected.
The purpose is to attach the thin film body 7 to the mask body 2 when there is no foreign matter.
【０００７】また、露光用マスク製造装置としての特徴
は、リソグラフィ工程等によりパターン層２ａの形成さ
れたマスク本体２を支持可能な支持部本体４と、該支持
部本体４のパターン層２ａ側に保護用の薄膜体７を貼着
すべく該薄膜体７を移動自在で且つその貼着部がマスク
本体２と隙間を有する対向位置で保持可能な保持体６と
を備えてなることにある。A feature of the exposure mask manufacturing apparatus is that it has a support body 4 capable of supporting the mask body 2 having a pattern layer 2a formed by a lithography process and the like, and that the support body 4 has a pattern layer 2a side. The thin film body 7 is movable so that the thin film body 7 for protection is stuck, and the sticking portion is provided with the holding body 6 which can hold the mask body 2 at a position facing the mask body 2 with a gap.
【０００８】[0008]
【作用】すなわち、本発明の露光用マスクの製造方法及
びその装置において、マスク本体２を支持装置４で支持
し、薄膜体７をその貼着部と前記マスク本体２の貼着部
とが隙間を有する状態で保持体６により保持する。この
ように薄膜体７をマスク本体２の近傍でお互いに対向す
る状態に保持した状態でマスク本体２の上面を検査す
る。このとき、マスク本体２の上面は薄膜体７で被覆さ
れているため、異物がパターン層２ａ等に付着するおそ
れはない。また、仮にこの検査時に異物が発見された時
には薄膜体７を移動してマスク本体２を洗浄する。異物
の発見されない時には、薄膜体７を移動させて薄膜体７
をマスク本体２に貼着する。That is, in the exposure mask manufacturing method and apparatus according to the present invention, the mask body 2 is supported by the supporting device 4, and the thin film body 7 has a gap between the attachment portion and the attachment portion of the mask body 2. It is held by the holding body 6 in the state of having. In this way, the upper surface of the mask body 2 is inspected while the thin film bodies 7 are held in a state of facing each other in the vicinity of the mask body 2. At this time, since the upper surface of the mask body 2 is covered with the thin film body 7, there is no possibility that foreign matter will adhere to the pattern layer 2a or the like. Further, if a foreign substance is found during this inspection, the thin film body 7 is moved to wash the mask body 2. When no foreign matter is found, the thin film body 7 is moved to move it.
Is attached to the mask body 2.
【０００９】[0009]
【実施例】以下、本発明の一実施例について図面に従っ
て説明する。図１において、１は露光マスク製造装置を
示し、略矩形で内部にマスク本体２を収納可能な収納凹
部３を有する支持部本体４と、該支持部本体４の両側面
５に設けられた移動手段１０と、該移動手段１０の上端
に取り付けられ、フレーム８に薄膜体７を保持可能な略
矩形の保持体６とで構成されている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. In FIG. 1, reference numeral 1 denotes an exposure mask manufacturing apparatus, which is a support body 4 having a substantially rectangular shape and a storage recess 3 capable of storing the mask body 2 therein, and a movement provided on both side surfaces 5 of the support body 4. It comprises a means 10 and a substantially rectangular holding body 6 attached to the upper end of the moving means 10 and capable of holding the thin film body 7 on the frame 8.
【００１０】前記支持部本体４は図２に示すように、そ
の収納凹部３の底面の四隅には、軟質のラバー体１３が
敷設され、上面にはバネ１１ａにより突出方向に付勢さ
れた支持体１１がそれぞれ出退自在に設けられている。As shown in FIG. 2, the support portion main body 4 has soft rubber bodies 13 laid at the four corners of the bottom surface of the accommodating concave portion 3, and a support urged in the protruding direction by springs 11a on the top surface. Each body 11 is provided so as to be able to move in and out.
【００１１】前記移動手段１０は、一対の板体を支軸１
０ａを中心にして交差して形成され、その下端が支持部
本体４に、上端を保持体６にそれぞれ回動自在に軸着さ
れている。支持部本体４の両側画５には、図３及び図４
に示すように、前記保持体６を上方位置で保持すべく移
動手段１０に係脱自在に係止する阻止体１２が、出退自
在に設けられている。尚、１２ａは阻止体１２と突出方
向に付着するバネである。The moving means 10 comprises a pair of plate bodies as a support shaft 1.
It is formed so as to intersect with 0a as a center, and the lower end thereof is pivotally attached to the support portion main body 4 and the upper end thereof is pivotally attached to the holding body 6, respectively. 3 and 4 are provided on both sides 5 of the support body 4.
As shown in FIG. 3, a blocking body 12 that is releasably engaged with the moving means 10 to hold the holding body 6 in the upper position is provided so as to be able to move back and forth. A spring 12a is attached to the blocking body 12 in the protruding direction.
【００１２】前記保持体６は、略矩形状の枠体よりな
り、その側面には図５に示すように一対の係止体１４が
挿通され、該係止体１４の先端部１４ｂをフレーム８の
側面の中央に周設された凹部８ａに嵌入させることでフ
レーム８を保持可能に形成されている。また、この係止
体１４はバネ１４ｃにより突出方向に付勢されている。The holding body 6 is composed of a substantially rectangular frame body, and a pair of locking bodies 14 are inserted into the side surfaces thereof as shown in FIG. 5, and a tip portion 14b of the locking body 14 is attached to the frame 8. The frame 8 is formed so that it can be held by being fitted into a recessed portion 8a provided around the center of the side surface of the frame. The locking body 14 is biased in the protruding direction by a spring 14c.
【００１３】次に、上記構成からなる装置を使用して露
光マスクを製造する場合について説明する。先ず、リソ
グラフィ工程により製造されたマスク本体２のパターン
層２ａを、エアーの噴射により洗浄し、その後前記パタ
ーン層２ａに異物の有無を検査する。そして、異物の付
着していないマスク本体２をパターン層２ａが上向とな
るように前記支持部本体４の収納凹部３に嵌入する。Next, a case where an exposure mask is manufactured using the apparatus having the above structure will be described. First, the pattern layer 2a of the mask body 2 manufactured by the lithographic process is cleaned by jetting air, and then the pattern layer 2a is inspected for foreign matter. Then, the mask body 2 on which no foreign matter is attached is fitted into the accommodating recess 3 of the support body 4 so that the pattern layer 2a faces upward.
【００１４】一方、パターン層２ａに異物が付着してい
れば、再度エアーの噴射によりパターン層を洗浄する。On the other hand, if foreign matter is attached to the pattern layer 2a, the pattern layer is washed again by jetting air.
【００１５】次に、薄膜体７のフレーム８を保持体６に
位置し且つフレーム８の外周凹部８ａに係止体１４の先
端部１４ｂを挿入する。 このとき保持体６は上方位置
にある（図２参照）。次に、保持体６を下方に押すと移
動手段１０が支軸１０ａを中心にして回動することによ
り、保持体６は下降し支持体１１の上端に当接する（図
６参照）。この際に、薄膜体７は、接着剤の塗布された
フレーム８の下端がマスク本体２の上面の貼着部と隙間
を有するように保持される。Next, the frame 8 of the thin film body 7 is positioned on the holding body 6, and the tip portion 14b of the locking body 14 is inserted into the outer peripheral recess 8a of the frame 8. At this time, the holding body 6 is in the upper position (see FIG. 2). Next, when the holding body 6 is pushed downward, the moving means 10 rotates about the support shaft 10a, so that the holding body 6 descends and comes into contact with the upper end of the support body 11 (see FIG. 6). At this time, the thin film body 7 is held so that the lower end of the frame 8 coated with the adhesive has a gap with the attachment portion on the upper surface of the mask body 2.
【００１６】異物が無い場合は更に保持体６を支持体１
１の弾性に抗して押圧することでフレーム８の下面がマ
スク本体２の上面に当接し、これにより薄膜体７は接着
剤を介してマスク本体２に貼着される（図７参照）。When there is no foreign matter, the holder 6 is further attached to the support 1
By pressing against the elasticity of No. 1, the lower surface of the frame 8 contacts the upper surface of the mask main body 2, whereby the thin film body 7 is attached to the mask main body 2 via an adhesive (see FIG. 7).
【００１７】一方、異物が検出された場合には、支持体
１１で支持された保持体６を押しあげマスク本体２を支
持部本体４より取り外し、エアー等の噴射で洗浄して異
物を取り除き、再度支持部本体４に嵌入して、さらに異
物の有無の検査を行う。On the other hand, when foreign matter is detected, the holding body 6 supported by the support body 11 is pushed up to remove the mask body 2 from the support body 4, and the foreign matter is removed by washing with air or the like. It is fitted into the support portion main body 4 again, and the presence or absence of foreign matter is further inspected.
【００１８】このように、薄膜体７をマスク本体２の近
傍で対向状に設置して、薄膜７の上方より異物の検査を
行うことができるので、異物の付着を発見した場合で
も、貼着された薄膜体７をフレーム８から取り外す必要
がなく、このため高価な薄膜体７を無駄に使用すること
がないと言う利点がある。As described above, since the thin film body 7 is installed in the opposed state near the mask main body 2 and the foreign matter can be inspected from above the thin film 7, even if the foreign matter is found to be adhered, the sticking is performed. There is no need to remove the formed thin film body 7 from the frame 8, and therefore, there is an advantage that the expensive thin film body 7 is not wastefully used.
【００１９】尚、上記実施例では移動手段１０として２
本の板体を用いて上下動可能にしたが、同様な上下動を
するもので有れば特にその形状は限定するものでなく、
例えば図８に示すように、案内棒２０を介して上下動自
在に取り付けられたフレーム６のアーム部２１をシリン
ダー２２のロット２２ａに連結することもできる。In the above embodiment, the moving means 10 is 2
Although it was made possible to move up and down using the plate body of the book, its shape is not particularly limited as long as it can move up and down in the same manner,
For example, as shown in FIG. 8, the arm portion 21 of the frame 6 mounted to be movable up and down via the guide rod 20 can be connected to the lot 22a of the cylinder 22.
【００２０】又、上記実施例ではマスク本体２をそのパ
ターン層２ａが上向きに位置するように支持したが、パ
ターン層２ａの向きは上向きに限定するものでなく、例
えば下向きに支持することで同様な効果を得ることがで
きる。Further, in the above embodiment, the mask body 2 was supported so that the pattern layer 2a thereof was positioned upward, but the direction of the pattern layer 2a is not limited to the upward direction. It is possible to obtain various effects.
【００２１】尚、本考案は上記実施例に限定されるもの
でなく支持部本体４と保持体６の形状は特に問うもので
はなく、薄膜体７の形状に応じて適時に決定自在であ
る。The present invention is not limited to the above-mentioned embodiment, and the shapes of the supporting portion main body 4 and the holding body 6 are not particularly limited, and can be determined in a timely manner according to the shape of the thin film body 7.
【発明の効果】叙上の様に、本発明は、マスク本体を支
持し、その後に薄膜体をその貼着部がマスク本体と隙間
を有するように保持し、その状態でマスク本体の上面の
異物の有無の検査を行い、異物の無い場合に、薄膜体を
マスク本体に貼着するので、マスク本体の上面を薄膜体
で覆うことができ、これによりパターン層の異物の検査
においては検査中に異物がパターン層に付着するのを容
易に防止するができ、且マスク本体に薄膜体を取り付け
る際にもパターン層に異物が付着するのを防止でき、し
かも従来のように異物混入のために一旦付着した薄膜体
を剥がすことがないので、作業が容易で且つ迅速に行う
ことができる。しかも何度も薄膜体を張り替える必要が
ないので、経済的であるという特別顕著な利点がある。As described above, according to the present invention, the mask main body is supported, and thereafter the thin film body is held so that the attaching portion has a gap with the mask main body, and in that state, the upper surface of the mask main body is The presence or absence of foreign matter is inspected, and when there is no foreign matter, the thin film body is attached to the mask body, so the upper surface of the mask body can be covered with the thin film body. It is possible to easily prevent foreign matter from adhering to the pattern layer, and also to prevent foreign matter from adhering to the pattern layer when the thin film body is attached to the mask body. Since the thin film body once adhered is not peeled off, the work can be performed easily and quickly. Moreover, since it is not necessary to replace the thin film member many times, there is a special remarkable advantage that it is economical.
【図１】本発明の露光用マスク製造装置を示す斜視図。FIG. 1 is a perspective view showing an exposure mask manufacturing apparatus of the present invention.
【図２】本発明の露光用マスク製造装置を示す断面図。FIG. 2 is a sectional view showing an exposure mask manufacturing apparatus of the present invention.
【図３】本発明の移動装置を示す正面図。FIG. 3 is a front view showing a moving device of the present invention.
【図４】本発明の移動装置を示す基部側拡大断面図。FIG. 4 is a base side enlarged cross-sectional view showing a moving device of the present invention.
【図５】本発明の保持体の係止体を示す拡大断面図。FIG. 5 is an enlarged cross-sectional view showing a locking body of the holding body of the present invention.
【図６】本発明の使用状態を示す断面図。FIG. 6 is a cross-sectional view showing a usage state of the present invention.
【図７】本発明の使用状態を示す断面図。FIG. 7 is a sectional view showing a usage state of the present invention.
【図８】他実施例を示す断面図。FIG. 8 is a sectional view showing another embodiment.
１・・収納装置 ２・・マスク本体 ２ａ・・パターン層 ４・・支持部本体 ６・・保持体 ７・・薄膜体 ８・・フレーム １０・・移動装置 1 ... Storing device 2 ... Mask body 2a ... Pattern layer 4 ... Support part body 6 ... Holding body 7 ... Thin film body 8 ... Frame 10 ... Moving device
Claims (2)
ａをマスク本体２に形成した後に、パターン層２ａを塵
埃等の異物より保護するための薄膜体７をマスク本体２
のパターン層２ａ側に貼着する露光用マスクの製造方法
において、前記マスク本体２を支持し、その後に薄膜体
７をその貼着部がマスク本体２と隙間を有するように保
持し、その状態でマスク本体２の上面の異物の有無の検
査を行い、異物の無い場合に、薄膜体７をマスク本体２
に貼着することを特徴とする露光用マスクの製造方法。1. A pattern layer 2 formed by a lithography process or the like.
After forming a on the mask body 2, the mask body 2 is provided with a thin film body 7 for protecting the pattern layer 2a from foreign matter such as dust.
In the method for manufacturing an exposure mask to be adhered to the pattern layer 2a side, the mask body 2 is supported, and then the thin film body 7 is held so that the adhered portion has a gap with the mask body 2 Then, the upper surface of the mask body 2 is inspected for the presence of foreign matter.
A method for manufacturing an exposure mask, comprising:
の形成されたマスク本体２を支持可能な支持部本体４
と、該支持部本体４のパターン層２ａ側に保護用の薄膜
体７を貼着すべく該薄膜体７を移動自在で、且つその貼
着部がマスク本体２と隙間を有する対向位置で保持可能
な保持体６とを備えてなることを特徴とする露光用マス
クの製造装置。2. A pattern layer 2a formed by a lithography process or the like.
Support body 4 capable of supporting the mask body 2 in which the
And the thin film body 7 is movable so as to adhere the protective thin film body 7 to the pattern layer 2a side of the support body 4, and the adhered portion is held at a position facing the mask body 2 with a gap. An apparatus for manufacturing an exposure mask, which is provided with a possible holder 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32224691A JP2607193B2 (en) | 1991-09-30 | 1991-09-30 | Manufacturing method of exposure mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32224691A JP2607193B2 (en) | 1991-09-30 | 1991-09-30 | Manufacturing method of exposure mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH075678A true JPH075678A (en) | 1995-01-10 |
| JP2607193B2 JP2607193B2 (en) | 1997-05-07 |
Family
ID=18141537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32224691A Expired - Lifetime JP2607193B2 (en) | 1991-09-30 | 1991-09-30 | Manufacturing method of exposure mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2607193B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006030947A (en) * | 2004-07-16 | 2006-02-02 | Toppan Chunghwa Electronics Co Ltd | Method for cleaning semiconductor component and apparatus therefor |
| JP2013097046A (en) * | 2011-10-28 | 2013-05-20 | Shin Etsu Chem Co Ltd | Pellicle storage container |
| JP2013097047A (en) * | 2011-10-28 | 2013-05-20 | Shin Etsu Chem Co Ltd | Pellicle storage container |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59193457A (en) * | 1983-04-18 | 1984-11-02 | Toppan Printing Co Ltd | Plate having high-precision pattern |
| JPS6371852A (en) * | 1986-09-16 | 1988-04-01 | Hitachi Ltd | Assembling device |
-
1991
- 1991-09-30 JP JP32224691A patent/JP2607193B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59193457A (en) * | 1983-04-18 | 1984-11-02 | Toppan Printing Co Ltd | Plate having high-precision pattern |
| JPS6371852A (en) * | 1986-09-16 | 1988-04-01 | Hitachi Ltd | Assembling device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006030947A (en) * | 2004-07-16 | 2006-02-02 | Toppan Chunghwa Electronics Co Ltd | Method for cleaning semiconductor component and apparatus therefor |
| JP2013097046A (en) * | 2011-10-28 | 2013-05-20 | Shin Etsu Chem Co Ltd | Pellicle storage container |
| JP2013097047A (en) * | 2011-10-28 | 2013-05-20 | Shin Etsu Chem Co Ltd | Pellicle storage container |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2607193B2 (en) | 1997-05-07 |
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