JPH0744034Y2 - High frequency excitation gas laser device - Google Patents
High frequency excitation gas laser deviceInfo
- Publication number
- JPH0744034Y2 JPH0744034Y2 JP1988126307U JP12630788U JPH0744034Y2 JP H0744034 Y2 JPH0744034 Y2 JP H0744034Y2 JP 1988126307 U JP1988126307 U JP 1988126307U JP 12630788 U JP12630788 U JP 12630788U JP H0744034 Y2 JPH0744034 Y2 JP H0744034Y2
- Authority
- JP
- Japan
- Prior art keywords
- heat exchanger
- wind tunnel
- laser device
- laser
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Lasers (AREA)
Description
【考案の詳細な説明】 ［考案の目的］ （産業上の利用分野） 本考案は高周波励起方式のガスレーザ装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Field of Industrial Application) The present invention relates to a high frequency excitation type gas laser device.
（従来の技術） この種のガスレーザ装置の従来例を第２図に示す。ガス
レーザ装置の放電部１は、相対する誘電体よりなる誘電
体電極2a,2bと、その外側に設けられた一対の金属電極3
a,3bと、放電電力を供給するため、それら電極に接続さ
れた高周波電源４と、光共振器を構成する出力鏡５と、
後部鏡６とから構成される。この放電部１にレーザ発振
に必要なレーザ媒質ガス７を循環供給するため、風洞８
が設けられる。風洞８内部に封入されたレーザ媒質ガス
７は、温度上昇を防止するため、熱交換器９で熱交換さ
れたのち、ファン10により放電部１に供給される。これ
により、放電部１では、高周波電源４より供給された高
周波電圧が電極間に印加され、出力鏡５と後部鏡６で構
成される光共振器内でレーザ発振が起り、レーザ光線Ｌ
が出力される。(Prior Art) A conventional example of this type of gas laser device is shown in FIG. The discharge part 1 of the gas laser device includes dielectric electrodes 2a and 2b made of opposing dielectrics, and a pair of metal electrodes 3 provided outside the dielectric electrodes 2a and 2b.
a, 3b, a high-frequency power source 4 connected to the electrodes for supplying discharge power, an output mirror 5 forming an optical resonator,
It is composed of a rear mirror 6. In order to circulate and supply the laser medium gas 7 required for laser oscillation to the discharge unit 1, the wind tunnel 8
Is provided. The laser medium gas 7 sealed in the wind tunnel 8 is heat-exchanged by the heat exchanger 9 in order to prevent a temperature rise, and then supplied to the discharge unit 1 by the fan 10. As a result, in the discharge unit 1, the high frequency voltage supplied from the high frequency power source 4 is applied between the electrodes, laser oscillation occurs in the optical resonator constituted by the output mirror 5 and the rear mirror 6, and the laser beam L
Is output.
（考案が解決しようとする課題） 一般に、共振器の性能は出力鏡５と後部鏡６の向き合い
精度に依存し、共振器からレーザ光線Ｌを安定して出力
させるには、出力鏡５と後部鏡６の各中心軸を常に直交
するように配置する必要があり、その精度は数10μrad
程度が要求される。(Problems to be Solved by the Invention) Generally, the performance of the resonator depends on the facing accuracy of the output mirror 5 and the rear mirror 6, and in order to stably output the laser beam L from the resonator, the output mirror 5 and the rear mirror 6 are required to be stable. It is necessary to arrange the center axes of the mirror 6 so that they are always orthogonal to each other, and the accuracy is several tens of μrad.
Degree is required.
一方、その共振器は、放電部１を、レーザ媒質ガス７の
流れ方向に対して、直角な方向にはさむように位置され
るが、その共振器の支持は、風洞８に依存している。On the other hand, the resonator is positioned so as to sandwich the discharge unit 1 in a direction perpendicular to the flow direction of the laser medium gas 7, but the support of the resonator depends on the wind tunnel 8.
上記従来装置においては、放電部１の出口から入口に至
るレーザ媒質ガス７の循環経路のほぼ中間位置にファン
10を配置すると共に、そのファン10直前に全面を覆うよ
うに熱交換器９を設置している。このため、放電部１を
出る温度上昇したレーザ媒質ガス７が熱交換器９に入る
までの間、風洞８を温度上昇させる。一方、熱交換器９
の出口から放電部１の入口までの間レーザ媒質ガス７は
低温状態にあるため、風洞８も比較的低温に保たれる。
この結果、風洞８は熱交換器９を境として高温状態と低
温状態に２分され、熱変形が生じて共振器を構成する出
力鏡５と後部鏡６の直交性が保たれなくなる問題があっ
た。In the above conventional device, the fan is provided at a substantially intermediate position of the circulation path of the laser medium gas 7 from the outlet to the inlet of the discharge unit 1.
A heat exchanger 9 is installed immediately before the fan 10 so as to cover the entire surface. Therefore, the temperature of the wind tunnel 8 is increased until the laser medium gas 7 that has risen in temperature and exits the discharge section 1 enters the heat exchanger 9. On the other hand, the heat exchanger 9
Since the laser medium gas 7 is in a low temperature state from the outlet of the laser to the inlet of the discharge part 1, the wind tunnel 8 is also kept at a relatively low temperature.
As a result, the wind tunnel 8 is divided into a high temperature state and a low temperature state with the heat exchanger 9 as a boundary, and there is a problem that thermal deformation occurs and the orthogonality between the output mirror 5 and the rear mirror 6 forming the resonator cannot be maintained. It was
そこで本考案は、レーザ媒質ガスの温度上昇による風洞
の熱変形を防止し、共振器の出力鏡と後部鏡６の直交性
を精度良く保って、安定したレーザ光線を発生できる高
周波励起ガスレーザ装置を提供することを目的とする。Therefore, the present invention provides a high-frequency excitation gas laser device capable of preventing thermal deformation of the wind tunnel due to temperature rise of the laser medium gas, maintaining the orthogonality between the output mirror of the resonator and the rear mirror 6 with high accuracy, and generating a stable laser beam. The purpose is to provide.
［考案の構成］ （課題を解決するための手段） このため本考案は、熱交換器と放電部をそれぞれ１個で
構成して熱交換器を放電部の出口部にその全域をおおう
形で配置するようにしたものである。[Means for Solving the Problem] (Means for Solving the Problem) Therefore, in the present invention, the heat exchanger and the discharge part are each configured by one, and the heat exchanger is covered with the outlet part of the discharge part. They are arranged.
（作用） 熱交換器11を放電部１出口部にその全域をおおう形で配
置することによって、放電部１を出る温度上昇したレー
ザ媒質ガスが風洞８に接触する機会が無くなる。従っ
て、従来のように風洞８を２分して温度差を生じるよう
な個所が無くなり、風洞８の熱変形が防止される。これ
により、共振器の出力鏡５と後部鏡６の直交性は常に精
度良く保たれて、常に安定したレーザ光線を出力できる
ようになる。(Operation) By disposing the heat exchanger 11 at the outlet of the discharge section 1 so as to cover the entire area thereof, there is no chance that the laser medium gas, which has risen in temperature and exits the discharge section 1, comes into contact with the wind tunnel 8. Therefore, there is no place where a temperature difference is caused by dividing the wind tunnel 8 into two as in the conventional case, and thermal deformation of the wind tunnel 8 is prevented. As a result, the orthogonality between the output mirror 5 and the rear mirror 6 of the resonator is always maintained with high precision, and a stable laser beam can always be output.
（実施例） 第１図は本考案の一実施例による高周波励起ガスレーザ
装置の構成図を示したものである。図中、第２図と同一
符号は同一又は相当部分を示し、第１図の構成と異なる
点は熱交換器11と放電部１をそれぞれ１個で構成して熱
交換器11を放電部１の出口部にその全域をおおう形で熱
交換器11を配置している点である。(Embodiment) FIG. 1 is a block diagram of a high frequency excitation gas laser device according to an embodiment of the present invention. In the figure, the same reference numerals as those in FIG. 2 indicate the same or corresponding parts, and the difference from the configuration of FIG. The heat exchanger 11 is arranged so as to cover the entire area of the outlet of the heat exchanger 11.
この構成で、放電部１を通過後、温度上昇したレーザ媒
質ガス７は、放電部１出口部に配置された熱交換器11に
よって冷却され、更にファン10を通過して再び放電部１
に供給される動作を繰り返し、風洞８内部を循環する。
このとき、熱交換器11は、放電部出口全域をおおう形で
配置されるため、加熱されたレーザ媒質ガス７は、全て
冷却され、冷却されたレーザ媒質ガスだけが、風洞８に
接触することになる。このように、放電部１を通過する
ことによって温度上昇したレーザ媒質ガス７は、その出
口に設置された熱交換器11によって直ちに冷却されるた
め、加熱したレーザ媒質ガス７が風洞８に接触すること
が一切無くなる。これにより、従来装置に見られるよう
な熱交換器を挟んで両側の風洞８に大きな温度差が生じ
る不具合が無くなる。この結果、風洞８は使用中に熱変
形を起こす不具合も無くなり、その風洞８によって共振
器も安定に保持され、出力鏡5,後部鏡６の直交性も良好
に保たれる。With this configuration, the laser medium gas 7 whose temperature has risen after passing through the discharge unit 1 is cooled by the heat exchanger 11 arranged at the outlet of the discharge unit 1, further passes through the fan 10, and is again discharged.
The operation of being supplied to the wind tunnel 8 is repeated to circulate inside the wind tunnel 8.
At this time, since the heat exchanger 11 is arranged so as to cover the entire outlet of the discharge part, all the heated laser medium gas 7 is cooled, and only the cooled laser medium gas contacts the wind tunnel 8. become. In this way, the laser medium gas 7 whose temperature has risen by passing through the discharge part 1 is immediately cooled by the heat exchanger 11 installed at its outlet, so that the heated laser medium gas 7 contacts the wind tunnel 8. Nothing will happen. This eliminates the problem that a large temperature difference occurs between the wind tunnels 8 on both sides of the heat exchanger as seen in the conventional device. As a result, the wind tunnel 8 does not have the problem of causing thermal deformation during use, the wind tunnel 8 also stably holds the resonator, and the orthogonality between the output mirror 5 and the rear mirror 6 is also kept good.
［考案の効果］ 以上に説明したように本考案によれば、熱交換器と放電
部をそれぞれ１個で構成して熱交換器を放電部の出口部
にその全域をおおう形で配置するようにしたので、放電
部の通過により温度上昇したレーザ媒質ガスは風洞に接
触することなく冷却されて、風洞内を循環する。これに
より、従来のような熱交換器を挟んで生じる温度差等に
よる風洞の変形が防止される。この結果、風洞に支持さ
れる光共振器の安定性が図られ、常に安定したレーザ光
線を発生することができるようになる。[Effects of the Invention] As described above, according to the present invention, the heat exchanger and the discharge part are each configured as one, and the heat exchanger is arranged at the outlet of the discharge part so as to cover the entire area. Therefore, the laser medium gas whose temperature has risen due to passage through the discharge part is cooled without contacting the wind tunnel and circulates in the wind tunnel. As a result, deformation of the wind tunnel due to a temperature difference or the like that occurs across the heat exchanger as in the related art is prevented. As a result, the optical resonator supported by the wind tunnel is stabilized, and a stable laser beam can be generated at all times.
第１図は、本考案の一実施例を示す高周波励起ガスレー
ザ装置の模式図、第２図は、従来の高周波励起ガスレー
ザ装置の模式図である。 １……放電部、５……出力鏡、６……後部鏡、７……レ
ーザ媒質ガス、８……風洞、11……熱交換器。FIG. 1 is a schematic diagram of a high frequency excitation gas laser device showing an embodiment of the present invention, and FIG. 2 is a schematic diagram of a conventional high frequency excitation gas laser device. 1 ... Discharge part, 5 ... Output mirror, 6 ... Rear mirror, 7 ... Laser medium gas, 8 ... Wind tunnel, 11 ... Heat exchanger.
Claims (1)
波電源の印加される放電部に熱交換器を介して循環供給
し、前記放電部に設けられ前記風洞に支持される光共振
器内でレーザ発振を起こさせ、レーザ光線を放出させる
高周波励起ガスレーザ装置において、前記熱交換器と放
電部をそれぞれ１個で構成して前記熱交換器を前記放電
部の出口部にその全域をおおう形で配置したことを特徴
とする高周波励起ガスレーザ装置。1. A laser medium gas enclosed in a wind tunnel is circulated and supplied to a discharge section to which a high frequency power source is applied via a heat exchanger, and an optical resonator provided in the discharge section and supported by the wind tunnel is provided. In a high-frequency excitation gas laser device for causing laser oscillation to emit a laser beam by means of a single heat exchanger and one discharge part, the heat exchanger covers the entire area at the outlet of the discharge part. A high-frequency excited gas laser device characterized in that
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988126307U JPH0744034Y2 (en) | 1988-09-29 | 1988-09-29 | High frequency excitation gas laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988126307U JPH0744034Y2 (en) | 1988-09-29 | 1988-09-29 | High frequency excitation gas laser device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0249150U JPH0249150U (en) | 1990-04-05 |
| JPH0744034Y2 true JPH0744034Y2 (en) | 1995-10-09 |
Family
ID=31377716
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988126307U Expired - Lifetime JPH0744034Y2 (en) | 1988-09-29 | 1988-09-29 | High frequency excitation gas laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0744034Y2 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59124784A (en) * | 1982-12-30 | 1984-07-18 | Fujitsu Ltd | Gas laser device |
| JPS59182957U (en) * | 1983-05-23 | 1984-12-06 | 株式会社 アマダ | Gas laser oscillation device |
| JPS63269589A (en) * | 1987-04-28 | 1988-11-07 | Mitsubishi Electric Corp | Laser oscillator |
-
1988
- 1988-09-29 JP JP1988126307U patent/JPH0744034Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0249150U (en) | 1990-04-05 |
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