JPH07107913B2 - Substrate transfer mechanism in vacuum device - Google Patents
Substrate transfer mechanism in vacuum deviceInfo
- Publication number
- JPH07107913B2 JPH07107913B2 JP6218886A JP6218886A JPH07107913B2 JP H07107913 B2 JPH07107913 B2 JP H07107913B2 JP 6218886 A JP6218886 A JP 6218886A JP 6218886 A JP6218886 A JP 6218886A JP H07107913 B2 JPH07107913 B2 JP H07107913B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- arm
- magnet
- substrate
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Manipulator (AREA)
- Non-Mechanical Conveyors (AREA)
Description
【発明の詳細な説明】 〔概要〕 半導体の製造においては真空槽内で処理を行うウエハー
・プロセスが多く適用される。真空槽内で簡単な方法に
て、基板をある位置より他の位置に搬送する手段として
マグネット・カップル式マニプレータが使用されるが、
動作時負荷保持部の位置精度に欠ける問題がある。本発
明はマニプレータの他端側に滑車、真空槽側にレールを
設けて精度の向上を図った。DETAILED DESCRIPTION [Outline] In semiconductor manufacturing, a wafer process in which processing is performed in a vacuum chamber is often applied. A magnet-coupled manipulator is used as a means to transfer a substrate from one position to another by a simple method in a vacuum chamber.
There is a problem in that the position accuracy of the load holding unit during operation is lacking. In the present invention, a pulley is provided on the other end side of the manipulator and a rail is provided on the vacuum chamber side to improve accuracy.
本発明は、真空槽内の基板搬送機構としてのマグネット
・カップル式マニプレータの改良に関する。The present invention relates to an improvement of a magnet-coupled manipulator as a substrate transfer mechanism in a vacuum chamber.
半導体装置の製造では真空槽内でのプロセスが数多く適
用される。この場合真空槽の真空度の維持、プロセスの
効率化等のため真空槽を多槽化し、真空槽間をゲートバ
ルブで接続せる構造が使用される。Many processes in a vacuum chamber are applied in the manufacture of semiconductor devices. In this case, in order to maintain the degree of vacuum of the vacuum tanks, improve the efficiency of the process, etc., a structure is used in which the vacuum tanks are multi-tubular and the vacuum tanks are connected by a gate valve.
このような構造で、一つの真空槽より次の真空槽に基板
を移動するのにマグネット・カップル式マニプレータが
使用される。With such a structure, a magnet-coupled manipulator is used to move a substrate from one vacuum chamber to the next.
然し、従来より使用されている構造では、基板搬送の位
置精度が低い欠点があり改善が要望されている。However, in the structure used conventionally, there is a defect that the positional accuracy of the substrate transfer is low, and improvement is desired.
従来の装置で使用されているマグネット・カップル式マ
ニプレータの構造を第２図により設明する。The structure of the magnet-coupled manipulator used in the conventional apparatus is shown in FIG.
１は図面の右側の真空槽８より突出するように接続され
た円筒形の真空シールドで、内部に負荷保持部２（基板
支持台）が固定されたアーム３が挿入される。Reference numeral 1 denotes a cylindrical vacuum shield connected so as to project from a vacuum chamber 8 on the right side of the drawing, and an arm 3 to which a load holder 2 (substrate support) is fixed is inserted therein.
アーム３の一端にはスライド・ベアリングによる支持機
構４が固定され、真空シールド１内をスライドしつつ移
動可能となっている。真空シールドの真空槽側の端部に
は、別に内側にスライド・ベアリングを持つ支持機構５
が固定され、スライドするアーム３を保持する。A support mechanism 4 by a slide bearing is fixed to one end of the arm 3 and is movable while sliding inside the vacuum shield 1. At the end of the vacuum shield on the side of the vacuum chamber, there is a separate support mechanism 5 with a slide bearing inside.
Is fixed and holds the sliding arm 3.
また、アーム３の一端に固定された支持機構４の近傍に
は内部マグネット６が固定され、その内部マグネット６
と真空シールド１の外側にその長さ方向にスライド可能
に設けた外部マグネット７とでマグネット・カップルを
構成し、外部マグネット７を左右に移動させることによ
り内部マグネット６を固定せるアーム３を左右に移動せ
しめる。An internal magnet 6 is fixed near the support mechanism 4 fixed to one end of the arm 3, and the internal magnet 6 is
And an external magnet 7 slidably provided outside the vacuum shield 1 in the longitudinal direction thereof to form a magnet couple, and by moving the external magnet 7 left and right, the arm 3 for fixing the internal magnet 6 to the left and right Move it.
第２図の構造では支持機構４が真空シールド１の端面11
に接する位置より内部マグネット６が支持機構５に接す
る迄の移動距離ｌが最大基板搬送距離となる。In the structure of FIG. 2, the support mechanism 4 has the end face 11 of the vacuum shield 1.
The maximum substrate transfer distance is the moving distance 1 from the position where the internal magnet 6 contacts the support mechanism 5 to the position where the internal magnet 6 contacts.
上記に述べた、従来のマグネット・カップル式マニプレ
ータでは、アーム３を前記真空槽８側に最大搬送距離移
動させた状態ではアームは極めて短距離を隔てた二つの
支持機構4,5により保持された片持梁に近い状態とな
る。In the above-described conventional magnet-coupled manipulator, when the arm 3 is moved to the vacuum chamber 8 side by the maximum transport distance, the arm is held by the two support mechanisms 4 and 5 which are separated by an extremely short distance. The state is close to a cantilever.
この結果、負荷保持部２は上下方向にたわみを生じ、上
下の位置精度は著しく低下する。従って、アーム３を移
動した後の負荷保持部２上に載置された図示しない基板
を移動先の図示しない真空槽内の基板ホルダーに移す作
業性が著しく悪くなる。As a result, the load holding unit 2 is bent in the vertical direction, and the vertical position accuracy is significantly reduced. Therefore, the workability of transferring the substrate (not shown) mounted on the load holding unit 2 after moving the arm 3 to the substrate holder in the vacuum tank (not shown) at the destination of movement is significantly deteriorated.
上記、従来の構造のマグネット・カップル式マニプレー
タの問題点は、アームの移動距離が増大し真空槽内に深
く挿入された位置では、該アームが片持梁となることに
起因している。The above-mentioned problem of the magnet-coupled manipulator having the conventional structure is caused by the fact that the arm becomes a cantilever at a position deeply inserted into the vacuum chamber due to an increase in the moving distance of the arm.
本発明ではアームの他端側に基板搭載機能をもつ負荷保
持部に滑車を設け、真空槽側には該滑車を支持し、かつ
その移動をガイドするレールを設けることによって問題
点の解決をはかるものである。In the present invention, the problem is solved by providing a pulley on the load holding portion having a substrate mounting function on the other end side of the arm and a rail for supporting the pulley and guiding the movement of the pulley on the vacuum chamber side. It is a thing.
上記の如く負荷保持部に滑車、真空槽側には該滑車該滑
車を支持し、かつその移動をガイドするレールを設ける
ことにより、基板を載置する負荷保持部を支持したアー
ムは両端の支持点を含む３点支持となり、負荷保持部に
載置された基板の位置は常に所定位置に一定となり、そ
の精度は極めて高くなる。As described above, the load holding unit supports the pulley, and the vacuum tank side supports the pulley and the rails that guide the movement of the pulley. The arm supporting the load holding unit on which the substrate is placed is supported at both ends. It becomes a three-point support including points, and the position of the substrate placed on the load holding part is always fixed at a predetermined position, and the accuracy thereof is extremely high.
本発明による一実施例を図面により詳細説明する。従来
の技術の項において用いた符号と同一のものは説明を省
略する。An embodiment according to the present invention will be described in detail with reference to the drawings. Descriptions of the same symbols as those used in the section of the related art will be omitted.
第１図は２槽の真空槽を用いて、両真空槽間で基板の搬
送を行う場合の搬送機構を模式的に示す断面図である。FIG. 1 is a sectional view schematically showing a transfer mechanism when a substrate is transferred between both vacuum tanks by using two vacuum tanks.
真空槽８は予備真空槽と考えてもよいが、基板のロー
ド、アンロードを行う真空室とする。作業を行う真空槽
９とはゲートバルブ10を介して接続されている。真空槽
９内に基板の搬送の終わった後、ゲートバルブ10を閉じ
て、基板の処理を行う。The vacuum chamber 8 may be considered as a preliminary vacuum chamber, but it is a vacuum chamber for loading and unloading the substrate. It is connected to a vacuum chamber 9 for working through a gate valve 10. After the substrate has been transferred into the vacuum chamber 9, the gate valve 10 is closed and the substrate is processed.
真空槽8,9内に挿入されて移動するアーム３の他端側負
荷保持部２には滑車12を備え、一方ゲートバルブの前後
の真空槽8,9にはそれぞれレール13が設置されている。The other end side load holding portion 2 of the arm 3 which is inserted into the vacuum tanks 8 and 9 and moves is provided with a pulley 12, while rails 13 are respectively installed in the vacuum tanks 8 and 9 before and after the gate valve. .
上記レール13は、その高さは負荷保持部がレール上を滑
る時、アームが水平となる如く設置され、またレールの
前後は幾分下方に曲率をもって曲げられていて、滑車12
がレール上に進行するのを容易にしている。The rail 13 has a height such that when the load holder slides on the rail, the arm is installed so that the arm is horizontal.
Makes it easy to move on the rail.
基板14は真空槽８内でマニプレータの負荷保持部２の上
に搭載され、ゲートバルブ10を開いて外部マグネット７
を動かすことにより真空槽９内に移動する。基板を基板
ホルダー15に移した後、アームをもとの位置に戻し、ゲ
ートバルブを閉じてプロセスが行われる。作業が終わっ
た後の基板を取出す工程も、基板の取扱いが逆となるだ
けである。The substrate 14 is mounted on the load holding portion 2 of the manipulator in the vacuum chamber 8 and the gate valve 10 is opened to open the external magnet 7.
Is moved to move into the vacuum chamber 9. After transferring the substrate to the substrate holder 15, the arm is returned to its original position and the gate valve is closed to perform the process. In the process of taking out the substrate after the work is finished, the handling of the substrate is only reversed.
以上に説明せるごとく本発明の機構を使用せるマグネッ
ト・カップル式マニプレータにより搬送された基板の位
置精度は著しく向上し、基板のハンドリングの作業効率
の改善効果大である。As explained above, the positional accuracy of the substrate conveyed by the magnet-coupled manipulator using the mechanism of the present invention is remarkably improved, and the working efficiency of the substrate handling is greatly improved.
第１図は本発明にかかわる真空装置内の基板搬送機構を
説明する模式図、 第２図は従来のマグネット・カップル式マニプレータの
構造、 を示す。 図面において、 １は真空シールド、 ２は負荷保持部、 ３はアーム、 4,5は支持機構、 ６は内部マグネット、 ７は外部マグネット、 8,9は真空槽、 10はゲートバルブ、 11は端面、 12は滑車、 13はレール、 14は基板、 15は基板ホルダー、 をそれぞれ示す。FIG. 1 is a schematic view for explaining a substrate transfer mechanism in a vacuum device according to the present invention, and FIG. 2 shows a structure of a conventional magnet-coupled manipulator. In the drawings, 1 is a vacuum shield, 2 is a load holding part, 3 is an arm, 4 and 5 are support mechanisms, 6 is an internal magnet, 7 is an external magnet, 8 and 9 are vacuum chambers, 10 is a gate valve, 11 is an end face. , 12 is a pulley, 13 is a rail, 14 is a substrate, and 15 is a substrate holder.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｂ６５Ｈ 5/00 Ｆ Ｃ２３Ｃ 14/00 Ｃ 8414−4Ｋ 16/44 Ｆ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location B65H 5/00 F C23C 14/00 C 8414-4K 16/44 F
Claims (1)
設けた筒状の真空シールドの外側に外部マグネットが該
真空シールドの長さ方向にスライド可能に設けられ、該
筒状の真空シールド内に、一端に内部マグネットと他端
に負荷保持部を備えたアームの該負荷保持部が前記真空
槽内に設けられて、前記外部マグネットを筒状の真空シ
ールドの長さ方向にスライドさせることにより該外部マ
グネットと内部マグネットとがカップルとなってアーム
を該筒状の真空シールドの長さ方向に滑動せしめ、前記
負荷保持部を移動させるマニプレータ機構において、 該アームの他端側の負荷保持部に滑車を設け、前記真空
槽内に該滑車を支持し、かつその移動をガイドするレー
ルを備えたことを特徴とする真空装置内の基板搬送機
構。1. An external magnet is slidably provided in the length direction of the vacuum shield on the outside of a cylindrical vacuum shield provided so as to project outward from a side portion inside the vacuum chamber. Inside the vacuum shield, the load holding part of an arm having an internal magnet at one end and a load holding part at the other end is provided in the vacuum chamber, and the external magnet is slid along the length of the cylindrical vacuum shield. In this manipulator mechanism for moving the load holding portion by sliding the arm in the lengthwise direction of the cylindrical vacuum shield by the outer magnet and the inner magnet forming a couple, the load on the other end side of the arm is moved. A substrate transfer mechanism in a vacuum device, wherein a pulley is provided in a holding portion, and a rail that supports the pulley in the vacuum chamber and guides its movement is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6218886A JPH07107913B2 (en) | 1986-03-19 | 1986-03-19 | Substrate transfer mechanism in vacuum device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6218886A JPH07107913B2 (en) | 1986-03-19 | 1986-03-19 | Substrate transfer mechanism in vacuum device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62219509A JPS62219509A (en) | 1987-09-26 |
| JPH07107913B2 true JPH07107913B2 (en) | 1995-11-15 |
Family
ID=13192912
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6218886A Expired - Fee Related JPH07107913B2 (en) | 1986-03-19 | 1986-03-19 | Substrate transfer mechanism in vacuum device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07107913B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02152820A (en) * | 1988-12-01 | 1990-06-12 | Tel Sagami Ltd | Magnetic carrying device |
| JPH02282476A (en) * | 1989-04-24 | 1990-11-20 | Sanko Seisakusho:Kk | Vacuum deposition device |
| US5417537A (en) * | 1993-05-07 | 1995-05-23 | Miller; Kenneth C. | Wafer transport device |
| DE102019007042A1 (en) * | 2019-10-10 | 2021-04-15 | Atec Pharmatechnik Gmbh | Containers and methods for transporting sterile goods and for removal in an isolator, as well as a combination of isolator and docked container |
| CN112849983B (en) * | 2021-02-05 | 2022-09-09 | 保利长大海外工程有限公司 | A locomotive for construction |
-
1986
- 1986-03-19 JP JP6218886A patent/JPH07107913B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62219509A (en) | 1987-09-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |