JPH0688252A - Metallic ornamental body and its production - Google Patents
Metallic ornamental body and its productionInfo
- Publication number
- JPH0688252A JPH0688252A JP11684492A JP11684492A JPH0688252A JP H0688252 A JPH0688252 A JP H0688252A JP 11684492 A JP11684492 A JP 11684492A JP 11684492 A JP11684492 A JP 11684492A JP H0688252 A JPH0688252 A JP H0688252A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- matte
- protective
- layer
- decorative body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はブラスト処理により部分
的にマット（艶消し）化された表面を有し、部分的に艶
の異なる意匠を有する金属装飾体及びその製造方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal decorative body having a surface partially matt (matted) by blasting and having a partially different gloss, and a method for producing the same.
【０００２】[0002]
【従来の技術】従来、艶の異なる部分が設けられた金属
装飾体の製造方法として、１）所望の部分をエッチング
により細かなテクスチャーで金属の表面を浅く広く腐食
させ艶の差を表現する所謂エッチング方法、２）全面に
サンドブラストする方法等がある。上記２）の方法は良
質なマット感が得られるものの、部分的に艶を異ならし
めるのは困難であり、そのために３）感光性樹脂等のレ
ジスト材料を用いて所望のパターンに保護層を形成し
て、該保護層の上から全面にサンドブラスト処理を施し
て艶消し部分を形成した後感光性樹脂を除去して、所望
の部分のみがブラスト処理されたものを得る方法等が知
られている。2. Description of the Related Art Conventionally, as a method of manufacturing a metal decorative body provided with parts having different luster, 1) so-called a so-called gloss difference is produced by etching a desired part with a fine texture to corrode the surface of the metal shallowly and widely. There are an etching method, 2) a method of sandblasting the entire surface, and the like. Although the method of 2) above gives a good matte feeling, it is difficult to make the luster partly different. Therefore, 3) form a protective layer in a desired pattern using a resist material such as a photosensitive resin. Then, a method is known in which a sandblasting treatment is applied to the entire surface of the protective layer to form a matte portion, and then the photosensitive resin is removed to obtain a product in which only a desired portion is blasted. .
【０００３】[0003]
【発明が解決しようとする課題】しかしながら上記従来
の製造方法で製造された金属装飾体は、１）のエッチン
グ法では完全なマット感を表現することが出来ず、意匠
性が劣るという欠点があった。また、上記３）のブラス
トによる方法は基材として樹脂表面に金属層を形成した
ものを用いた場合には、弱いブラスト処理で艶消し部を
形成可能であるため、部分的に良好なマット感を有する
ものが得られるが、基材が金属板のようにブラスト処理
を強く行う場合には、艶消し部を覆っている感光性樹脂
層のレジスト材料がサンドブラストに耐えられず金属素
材から剥離し易く所望の部分のみをマット感の優れた艶
消しに形成することが困難であり、従来金属基材を使用
した場合のブラストに耐える保護層がなかった。However, the metal decorative body manufactured by the above-mentioned conventional manufacturing method has a drawback that a perfect matte feeling cannot be expressed by the etching method of 1) and the design is inferior. It was Further, in the method of blasting in 3) above, when a base material having a metal layer formed on the resin surface is used, a matte portion can be formed by a weak blasting treatment, so that a partially good matte feeling can be obtained. However, when the base material is strongly blasted like a metal plate, the resist material of the photosensitive resin layer that covers the matte portion cannot withstand sandblasting and peels from the metal material. It is difficult to form only a desired portion into a matte finish with an excellent matt feeling, and there has conventionally been no protective layer that resists blasting when using a metal substrate.
【０００４】本発明は上記従来技術の欠点を解消しよう
とするもので、ブラスト処理により形成された優れたマ
ット感を有する艶消し部が、所望の部分のみに設けられ
ている優れた意匠性を有する金属装飾体とその製造方法
を提供することを目的とする。The present invention is intended to solve the above-mentioned drawbacks of the prior art, and has an excellent design property in which a matte portion having an excellent matt feeling formed by blasting is provided only in a desired portion. An object of the present invention is to provide a metal decorative body having the same and a manufacturing method thereof.
【０００５】[0005]
【課題を解決するための手段】本発明金属装飾体は金属
基材の表面に艶消しの微細な凹凸形状に形成された艶消
し部と、該艶消し部と艶の異なる部分とを有する金属装
飾体において、金属基材の表面に保護金属層を設け該保
護金属層の表面にレジストにより艶消し部以外に所望の
パターンを形成し、エッチングにより艶消し部の保護金
属層を除去し金属基材表面を露出させ、全体にブラスト
処理を施して金属基材に艶消し部を形成し、残っている
保護金属層を除去して、艶消し部とそれ以外の艶の異な
る部分とが形成されているものである。MEANS FOR SOLVING THE PROBLEMS The metal decorative body of the present invention is a metal having a matte portion formed on the surface of a metal substrate in the form of fine matte unevenness, and a matte portion and a portion having a different luster. In the decorative body, a protective metal layer is provided on the surface of the metal base material to form a desired pattern on the surface of the protective metal layer with a resist other than the matte portion, and the protective metal layer in the matte portion is removed by etching to remove the metal base. The surface of the material is exposed, and the entire surface is blasted to form a matte part on the metal substrate, and the remaining protective metal layer is removed to form a matte part and other parts with different luster. It is what
【０００６】また、上記金属装飾体は、ブラスト処理の
前にエッチングにより露出した金属基材表面を更にエッ
チングして腐食させて形成したり、金属基材の表面に予
め万線模様のミクロエンボスを形成しておくこともでき
る。Further, the metal decorative body is formed by further etching and corroding the surface of the metal base material exposed by etching before the blast treatment, or forming a line-shaped micro-emboss on the surface of the metal base material in advance. It can also be formed.
【０００７】本発明金属装飾体の製造方法は、下記の各
工程を順次行うことを特徴とするものである。 （Ａ）金属基材の表面に保護金属層を設ける第１工程 （Ｂ）保護金属層表面にレジストにより所望のパターン
を形成する第２工程 （Ｃ）エッチングにより艶消しにしたい部分の保護金属
層を除去して金属基材を露出させる第３工程 （Ｄ）全面にブラスト加工を施して露出した金属基材の
表面に艶消し部を形成する第４工程 （Ｅ）残っている保護金属を除去する第５工程The method for producing a metal decorative body of the present invention is characterized by sequentially performing the following steps. (A) First step of providing a protective metal layer on the surface of a metal substrate (B) Second step of forming a desired pattern on the surface of the protective metal layer with a resist (C) Protective metal layer of a portion to be matted by etching Third step of removing the metal base to expose the metal base (D) Fourth step of blasting the entire surface to form a matte portion on the exposed surface of the metal base (E) Removing the remaining protective metal The fifth step to do
【０００８】また上記製造方法において、第３工程と第
４工程の間にエッチングにより露出した部分の金属基材
を更に腐食させる工程を行ったり、また、金属基材の表
面に予め万線模様のミクロエンボスを形成しておくこと
もできる。Further, in the above manufacturing method, a step of further corroding the metal substrate of the portion exposed by etching is performed between the third step and the fourth step, and the surface of the metal substrate is preliminarily marked with a line pattern. It is also possible to form a micro emboss.
【０００９】本発明の金属装飾体とは、金属表面に少な
くとも艶消しの意匠を有し、装飾品としての機能を有す
るものであり、具体的には、ドア枠、窓枠、窓金具、ド
アノブ、鍵穴隠し、ドアの鍵穴部分、丁番、ドアノッカ
ー、ドアの表面化粧、バスルーム金物、その他各種住
宅、店舗等の外装、内装等に用いる金属パネルの如き建
材用化粧板類、電灯や電器スタンド等の照明器具、家具
金物、ハンドル、ツマミ、ホルダー、衣服掛け等のフッ
ク、水道廻りの金物、スイッチプレート、額縁、単なる
装飾品、創作品等がある。The metal decorative body of the present invention has at least a matte design on the metal surface and has a function as a decorative article. Specifically, it is a door frame, window frame, window fitting, door knob. , Hidden keyholes, Door keyholes, hinges, door knockers, door surface makeup, metal fittings for bathrooms, decorative panels for building materials such as metal panels used for exteriors and interiors of various houses and shops, electric lights and electric stands Lighting fixtures, furniture hardware, handles, knobs, holders, hooks such as clothes racks, hardware around water supplies, switch plates, picture frames, simple ornaments, and creative works.
【００１０】[0010]
【作用】金属基材２の表面の艶消しにする部分以外に保
護金属層５が形成されていることにより、全面にブラス
ト処理を行った際、金属基材２が露出した所望の部分の
みが微細な凹凸を形成して艶消し部３となり、保護金属
層５の部分が金属皮膜により形成されているために、レ
ジストの樹脂皮膜等のようにブラスト処理によって剥離
する虞れがなく、金属基材２の艶消し部３以外がブラス
ト処理されたりするのを防いで、所望の部分のみを正確
にブラスト処理することができる。Function Since the protective metal layer 5 is formed on the surface of the metal substrate 2 other than the portion to be delustered, only the desired portion where the metal substrate 2 is exposed is subjected to the blast treatment on the entire surface. There is no risk of peeling due to blast treatment like a resin film of a resist because a fine unevenness is formed to become the matte portion 3 and the portion of the protective metal layer 5 is formed of a metal film. It is possible to prevent the parts other than the matte part 3 of the material 2 from being blasted and to accurately blast only the desired part.
【００１１】[0011]
【実施例】以下、図面に基き本発明を詳細に説明する。
図面は本発明の実施例を示し図１は本発明製造方法の１
例を示す工程図である。The present invention will be described in detail below with reference to the drawings.
FIG. 1 shows an embodiment of the present invention, and FIG.
It is process drawing which shows an example.
【００１２】本発明金属装飾体１は図１（ｅ）に示すよ
うに、金属基材２の表面が艶消しの微際な凹凸形状に形
成されている艶消し部３と、光沢部４のように該艶消し
部３と艶の異なる部分を有するものである。この金属装
飾体１は下記の第１工程〜第５工程を順次行うことで製
造する。As shown in FIG. 1 (e), the metal decorative body 1 of the present invention has a matte portion 3 and a glossy portion 4 in which the surface of the metal base material 2 is formed in a slightly uneven matte surface. As described above, the matte portion 3 has a portion different in luster. The metal decorative body 1 is manufactured by sequentially performing the following first to fifth steps.
【００１３】〔第１工程〕本発明金属装飾体の製造方法
は、図１（ａ）に示すようにまず金属基材２表面の全面
に保護金属層５を設ける。本発明において用いられる金
属基材２の材質は通常金属装飾体に用いられるエッチン
グ、及びブラスト処理の可能な金属であればよく、例え
ば亜鉛、銅、真鍮、アルミニウム、鉄、ステンレス、ク
ロム等の金属板が挙げられる。金属基材２の厚み、形状
等は特に限定されず、金属装飾体の各用途に応じて適宜
選定すればよいが、形状は平坦な平板状のものが特に好
ましい。[First Step] In the method for producing a metal decorative body of the present invention, a protective metal layer 5 is first provided on the entire surface of the metal substrate 2 as shown in FIG. The material of the metal base material 2 used in the present invention may be any metal that can be etched and blasted, which is usually used for metal ornaments, and examples thereof include metals such as zinc, copper, brass, aluminum, iron, stainless steel and chromium. There is a board. The thickness, shape, etc. of the metal base material 2 are not particularly limited and may be appropriately selected according to each application of the metal ornament, but a flat plate shape is particularly preferable.
【００１４】本発明において用いられる保護金属層５は
アルミニウム、クロム、ニッケル、コバルト、銅、金、
銀、錫、亜鉛、黄銅、ステンレス等の金属を用いること
ができる。保護金属層の形成方法は、金属基材２の表面
に蒸着、溶射、電解メッキ、無電解メッキ、スパッタリ
ング等により形成可能である。保護金属層５は上記金属
基材２と異なるエッチング液による腐食特性を有する材
質が好ましい。また該保護金属層５の厚みは特に限定さ
れないが、後工程のブラスト処理の場合に剥離したり磨
滅せず、且つエッチングを行う場合に容易に剥離できる
程度の厚さが好ましく２〜２０μｍ程度に形成される。The protective metal layer 5 used in the present invention is made of aluminum, chromium, nickel, cobalt, copper, gold,
Metals such as silver, tin, zinc, brass and stainless can be used. The protective metal layer can be formed on the surface of the metal substrate 2 by vapor deposition, thermal spraying, electrolytic plating, electroless plating, sputtering or the like. The protective metal layer 5 is preferably made of a material having a corrosion property against an etching solution different from that of the metal base material 2. The thickness of the protective metal layer 5 is not particularly limited, but it is preferably about 2 to 20 μm so that the protective metal layer 5 does not peel off or wear during the blast treatment in the subsequent step, and can be easily peeled off during etching. It is formed.
【００１５】〔第２工程〕次いで上記保護金属層５の表
面にレジスト層６を全面に設け〔図１（ａ）〕、該レジ
スト層６を同図（ｂ）に示すように所望のパターンに形
成する。図２はレジスト層パターン形成方法の１例を示
す工程図である。レジスト層６を所望のパターンに形成
するには、図２（ア）に示すようにレジスト層６の表面
に所望のパターンに絵柄を形成した原版フィルム７を重
ね、該原版フィルム７の上からレジスト層６に光８を照
射（露光）してレジスト層６の所望部分のみを硬化させ
る〔図２（イ）〕。次いで現像しレジスト層６の未硬化
の感光性樹脂を除去して、硬化したレジスト層６のみか
らなる所望のパターンが得られる〔同図（ウ）〕。[Second Step] Next, a resist layer 6 is provided on the entire surface of the protective metal layer 5 [FIG. 1 (a)], and the resist layer 6 is formed into a desired pattern as shown in FIG. 1 (b). Form. FIG. 2 is a process chart showing an example of the resist layer pattern forming method. In order to form the resist layer 6 in a desired pattern, as shown in FIG. 2A, an original film 7 having a pattern formed in a desired pattern is superposed on the surface of the resist layer 6, and the resist film 6 is applied onto the original film 7. The layer 6 is irradiated (exposed) with light 8 to cure only a desired portion of the resist layer 6 [FIG. 2 (a)]. Then, development is performed to remove the uncured photosensitive resin in the resist layer 6 to obtain a desired pattern composed only of the cured resist layer 6 [FIG.
【００１６】原版フィルム７は艶消し部３としたい部分
を黒場とし光沢部４としたい部分を白場としたフィル
ム、又はその反対に艶消し部３としたい部分を白場とし
光沢部４としたい部分を黒場としたフィルムが用いられ
る。The original film 7 is a film in which the desired portion to be the matte portion 3 is black and the desired portion to be the glossy portion 4 is white, or vice versa. A film in which the desired part is black is used.
【００１７】レジスト層６はネガ型、ポジ型いずれを使
用してもよく原版フィルム７に応じて適宜選定する。例
えば原版フィルムが金属装飾体の艶消し部３を白場、光
沢部４を黒場に形成した場合、レジスト層６の材料にポ
ジ型を用いればよく、またその反対に艶消し部４が黒場
に形成されている原版フィルムを用いた場合にはネガ型
のレジスト材料を用いる。上記レジスト材料のポジ型と
は光を照射した部分が分解し現像により未照射の部分の
みが残り原版フィルムの黒場が所望のパターンに形成さ
れるものであり、またネガ型とは照射部分が架橋された
状態になり現像後に照射部分のみが残り原版フィルムの
白場がパターンとして形成されるものである。The resist layer 6 may be either a negative type or a positive type and is appropriately selected according to the original film 7. For example, when the original film is formed with the matte portion 3 and the glossy portion 4 of the metal decorative body in white and black areas, a positive type may be used as the material of the resist layer 6, and conversely, the matte portion 4 is black. When using the original film formed on the spot, a negative resist material is used. The positive type of the resist material means that the part irradiated with light is decomposed and only the non-irradiated part is left by development to form a black field of the original film in a desired pattern, and the negative type is the irradiated part. In the crosslinked state, only the irradiated portion remains after development and the white field of the original film is formed as a pattern.
【００１８】上記ポジ型のレジスト材料は例えばノボラ
ック樹脂−ｏ−キノンアジド化合物をベースとしたもの
等があり、またネガ型のレジスト材料としては、環状ゴ
ム系、ポリけい皮酸ビニル系等がある。レジスト材料は
通常ネガ型が用いられ、その材質としてポリビニルアル
コールをベースとした水溶性のものを用いるのが好まし
く、この場合現像工程において水洗するだけで未硬化の
レジストを除去可能なので現像が容易である。Examples of the positive resist material include those based on a novolac resin-o-quinone azide compound, and examples of the negative resist material include a ring rubber type and a polyvinyl cinnamate type. The resist material is usually a negative type, and it is preferable to use a water-soluble material based on polyvinyl alcohol as the material. In this case, the uncured resist can be removed only by washing with water in the developing step, so that development is easy. is there.
【００１９】〔第３工程〕次に図１（ｃ）に示すよう
に、保護金属層５表面に所望のパターンにレジスト層６
を形成した金属基材２にエッチングを施して、レジスト
層６のない部分の保護金属層５を腐食させて除去する。
尚、レジスト層６はエッチングの前に除去を行っても、
行わなくても何方でも良い。このエッチングに用いるエ
ッチング液は保護金属層５を腐食させるが金属基材２を
腐食させないものが望ましい。表１に保護金属層の材質
と該保護金属層を腐食可能なエッチング液の組み合わせ
の例を示す。[Third Step] Next, as shown in FIG. 1C, the resist layer 6 is formed in a desired pattern on the surface of the protective metal layer 5.
The metal base material 2 on which is formed is etched to corrode and remove the protective metal layer 5 in the portion where the resist layer 6 is not present.
Even if the resist layer 6 is removed before etching,
You don't have to do it. The etchant used for this etching is preferably one that corrodes the protective metal layer 5 but does not corrode the metal substrate 2. Table 1 shows examples of combinations of the material of the protective metal layer and an etching solution capable of corroding the protective metal layer.
【００２０】[0020]
【表１】 [Table 1]
【００２１】〔第４工程〕金属装飾体１の艶消し部３と
する箇所の保護金属層をエッチングで除去して、金属基
材２の表面を露出させたならば、次に同図（ｄ）に示す
ように全面にブラスト処理を施して露出部分の表面に微
細な凹凸を設け艶消し部３を形成する。ブラスト処理は
サンドブラスト、ショットブラストの公知のブラスト処
理が利用できる。サンドブラスト処理は粒子径１〜１０
０μｍ程度の鉄、炭化珪素、アルミナ、酸化クロム、酸
化鉄等の無機粒子を用い、圧縮空気等の力でノズルの先
端から金属基材の表面に吹きつけることで行われる。ま
たショットブラストは研削粒子に金属ショットを用い
る。[Fourth step] If the surface of the metal base material 2 is exposed by removing the protective metal layer of the metal decorative body 1 at the portion to be the matte portion 3 by etching, then the same figure (d) is used. 2), the entire surface is subjected to a blast treatment to form fine unevenness on the surface of the exposed portion to form the matte portion 3. As the blast processing, known blast processing such as sand blast and shot blast can be used. Sand blasting has a particle size of 1-10
It is carried out by using inorganic particles of iron, silicon carbide, alumina, chromium oxide, iron oxide or the like having a size of about 0 μm and blowing from the tip of the nozzle onto the surface of the metal base material with the force of compressed air or the like. In shot blasting, metal shot is used as the abrasive particles.
【００２２】艶消し部３は通常１０〜１０００μｍ程度
の深さに微細な凹凸を形成したものであり、その艶消し
度合いはブラストの研削粒子の粒径、ブラスト処理の時
間、ブラストを当てる強度等により任意に制御可能であ
り、金属装飾体の所望の艶消し度合いに応じて適宜選択
する。The matte portion 3 is usually formed with fine irregularities at a depth of about 10 to 1000 μm. The matte degree depends on the particle size of the blast grinding particles, the time of blast treatment, the strength of blasting, etc. Can be arbitrarily controlled by the method, and is appropriately selected according to the desired degree of matting of the metal decorative body.
【００２３】〔第５工程〕ブラスト処理が終了した後、
金属基材２表面に残存している保護金属層５を除去し
て、図１（ｅ）に示すように除去した部分がブラスト処
理されない光沢部４として形成され、ブラスト処理した
部分が艶消し部３が形成された金属装飾体１を得る。保
護金属層５の除去はエッチングにより残存している保護
金属層を腐食させればよく、この場合、エッチング液に
保護金属層５は腐食するが金属基材２は腐食しないエッ
チング液を用いるのが好ましく、保護金属層５のみを選
択的に除去して金属基材に影響を与えないで良好に処理
を行うことができる。[Fifth Step] After the blast treatment is completed,
The protective metal layer 5 remaining on the surface of the metal substrate 2 is removed, and the removed portion is formed as a blast-free glossy portion 4 as shown in FIG. 1E, and the blasted portion is a matte portion. The metal decorative body 1 on which 3 is formed is obtained. The removal of the protective metal layer 5 may be performed by corroding the protective metal layer remaining by etching. In this case, an etching solution that corrodes the protective metal layer 5 but does not corrode the metal substrate 2 is used. Preferably, only the protective metal layer 5 can be selectively removed and good treatment can be performed without affecting the metal substrate.
【００２４】このような保護金属層の除去に用いるエッ
チング液として、例えば金属基材に銅を用い保護金属層
にクロムを用いた場合は、エッチング液に塩化第２鉄溶
液を用いるとよく、該エッチング液は保護金属層のクロ
ムのみを選択的に腐食して、金属基材の銅を腐食させな
いために、不要の保護金属層のみ除去して、艶消し部３
や光沢部４等には影響を与えずに良好な金属装飾体表面
が得られ、エッチングの作業も容易に行うことができ
る。When copper is used as the metal substrate and chromium is used as the protective metal layer as the etching solution used for removing the protective metal layer, a ferric chloride solution is preferably used as the etching solution. The etching solution selectively corrodes only chromium in the protective metal layer and does not corrode copper in the metal base material. Therefore, only the unnecessary protective metal layer is removed to remove the matte portion 3
A good metal decorative body surface can be obtained without affecting the glossy portion 4 and the like, and the etching operation can be easily performed.
【００２５】本発明において、必要に応じて金属装飾体
の表面を保護するためにクロムのような硬い金属の保護
層９をメッキや蒸着により形成してもよい。保護層を形
成することにより金属装飾体の耐久性が向上し、またこ
のようなメッキ仕上げにより鏡面部の光沢（グロス）が
更に向上する。保護層９の厚みは１０μｍ前後程度に設
けるのが好ましい。In the present invention, a protective layer 9 of a hard metal such as chromium may be formed by plating or vapor deposition to protect the surface of the metal decorative body, if necessary. The formation of the protective layer improves the durability of the metal decorative body, and the plating finish further improves the gloss of the mirror surface portion. The thickness of the protective layer 9 is preferably about 10 μm.
【００２６】図３は本発明製造方法の他の例を示す説明
図である。本発明製造方法において、図１に示す上記第
３工程と第４工程との間に、エッチング液をそれまでの
保護金属層のみを腐食するエッチング液から、金属基材
を腐食する（保護金属層は腐食させない）エッチング液
に変えてエッチングを行うことができる。図３（ａ）に
示すように前述した方法でエッチングにより金属基材の
表面を露出させ、ブラスト処理を施す前に同図（ｂ）に
示すように、金属基材２を腐食するエッチング液を用い
て露出した金属基材２の表面を腐食させて金属基材２の
表面（艶消し部３となる部分）を凹部３１として形成
し、同図（ｃ）に示すように全面にブラスト処理を施し
て凹部３１を艶消し部３として、保護金属層５を除去し
て同図（ｄ）に示すように最終的に形成された金属装飾
体１の艶消し部３と光沢部４に段差を設けることもでき
る。FIG. 3 is an explanatory view showing another example of the manufacturing method of the present invention. In the manufacturing method of the present invention, between the third step and the fourth step shown in FIG. 1, the metal base material is corroded from the etching solution that corrodes only the protective metal layer until then (the protective metal layer). Can be etched instead of using an etching solution. As shown in FIG. 3 (a), the surface of the metal base material is exposed by the above-described method by etching, and before the blasting treatment, as shown in FIG. 3 (b), an etching solution that corrodes the metal base material 2 is used. The exposed surface of the metal substrate 2 is corroded to form the surface of the metal substrate 2 (the portion to be the matte portion 3) as the concave portion 31, and the entire surface is blasted as shown in FIG. By applying the concave portion 31 as the matte portion 3 and removing the protective metal layer 5, a step is formed between the matte portion 3 and the glossy portion 4 of the finally formed metal decorative body 1 as shown in FIG. It can also be provided.
【００２７】図４は本発明製造方法のその他の例を示す
説明図である。本発明では、金属基材２の表面に予め万
線模様のミクロエンボスを設けておくこともできる。図
４（ａ）に示すように金属基材２の表面の一部（例えば
図１の金属装飾体１の光沢部４）に予めミクロエンボス
からなる万線模様等を形成する。そして同図（ｂ）に示
すように保護金属層５、レジスト層６を全面に形成し、
同図（ｃ）に示すように万線模様１０の上にレジスト層
６と保護金属層５が形成されるようにレジスト層のパタ
ーンを設けエッチングを行い、ブラスト処理を施し艶消
し部３を形成し保護金属層５を剥離して該保護金属層の
パターン部分に万線模様１０が形成された金属装飾体１
が得られる（同図ｄ）。FIG. 4 is an explanatory view showing another example of the manufacturing method of the present invention. In the present invention, a line-patterned micro-emboss may be provided on the surface of the metal substrate 2 in advance. As shown in FIG. 4A, a line pattern or the like made of micro-embossing is previously formed on a part of the surface of the metal base material 2 (for example, the glossy portion 4 of the metal decorative body 1 in FIG. 1). Then, a protective metal layer 5 and a resist layer 6 are formed on the entire surface as shown in FIG.
As shown in FIG. 3C, a resist layer pattern is formed on the line pattern 10 so that the resist layer 6 and the protective metal layer 5 are formed, etching is performed, and blasting is performed to form the matte portion 3. Then, the protective metal layer 5 is peeled off, and a line pattern 10 is formed on the pattern portion of the protective metal layer 1.
Is obtained (d in the figure).
【００２８】ここで万線模様１０は、平行な直線群又は
曲線群状の溝を形成する凹部及び凸部の集合体よりなる
もので、凹部の幅、凸部の幅や凹部深さ及び凸部の高さ
は１〜１０００μｍ程度に形成されるものである。この
万線模様を形成することで視線方向の角度、光源の角度
等によって表面の艶が変化する効果が付与される。万線
模様１０を形成するには、前述のレジストパターンの形
成と同様に感光性樹脂等からなるレジストパターンを金
属基材２の表面に形成した後に、該レジストパターン以
外の部分をエッチング液で腐食させて金属素材２の表面
に万線模様１０のミクロエンボスを形成する。Here, the parallel line pattern 10 is composed of an assembly of concave portions and convex portions forming grooves in parallel straight line groups or curved line groups, and has a width of the concave portion, a width of the convex portion, a depth of the concave portion and a convex portion. The height of the part is about 1 to 1000 μm. By forming this line pattern, the effect that the gloss of the surface changes depending on the angle of the line of sight, the angle of the light source, and the like is imparted. In order to form the line pattern 10, a resist pattern made of a photosensitive resin or the like is formed on the surface of the metal substrate 2 as in the case of forming the resist pattern described above, and then a portion other than the resist pattern is corroded with an etching solution. Then, the line pattern 10 of micro-embossing is formed on the surface of the metal material 2.
【００２９】図４ではこの万線模様１０を光沢部の全部
に形成したが、形成部分は特に限定されず、光沢部の一
部に形成してもよい。Although the parallel line pattern 10 is formed on the entire glossy portion in FIG. 4, the formation portion is not particularly limited and may be formed on a part of the glossy portion.
【００３０】図５は本発明金属装飾体１の態様を示す断
面図であり、前述した段差の形成や万線模様を各種組み
合わせることもできる。図５（ａ）は光沢部４の一部に
万線模様１０を設けたものであり、光沢部４と万線模様
１０と艶消し部３の３種類の意匠を有する。FIG. 5 is a cross-sectional view showing an embodiment of the metal decorative body 1 of the present invention, and the above-described step formation and line pattern can be combined in various ways. In FIG. 5A, a line pattern 10 is provided on a part of the glossy portion 4, and the glossy portion 4, the line pattern 10, and the matte portion 3 have three types of designs.
【００３１】また、図５（ｂ）は図３に示す金属装飾体
の光沢部４を全て万線模様１０としてそれ以外の部分の
凹部には艶消し部３が形成されているものである。また
同図（ｃ）は万線模様１０、光沢部４、艶消し部３の３
つの意匠に加えて艶消し部３と万線模様１０又は光沢部
との間に段差が形成されたものである。Further, FIG. 5 (b) shows that all the glossy portions 4 of the metal decorative body shown in FIG. 3 are line patterns 10 and the matte portion 3 is formed in the recessed portions other than that. Further, FIG. 3C shows a line pattern 10, a glossy portion 4, and a matte portion 3
In addition to the three designs, a step is formed between the matte portion 3 and the line pattern 10 or the gloss portion.
【００３３】次に本発明の具体的実施例を挙げ、本発明
を更に詳細に説明する。 〔実施例１〕厚さ２m/m のしんちゅうの平面板の表面全
面にクロムメッキを行いクロム層を１０μｍ厚みに形成
し、該クロム層の表面全面にネガ型の感光性樹脂（ＴＰ
Ｒ：東京応化工業製）を約５μｍ厚みに形成してレジス
ト層を全面に設け、光沢部とする部分を白場としたネガ
フィルムを作成し上記レジスト層の表面に重ね露光、現
像を行いレジストパターンを形成した後、塩酸をエッチ
ング液として用い艶消し部のしんちゅう表面が露出する
までエッチングを行った。次に、クロム層がレジストパ
ターン状に残っている状態で全面にサンドブラストをか
け（♯１５０）艶消し部に微細凹凸を設けた後、全体を
エッチング液（塩酸）に浸漬して残っているクロム層を
全部除去したところ、光沢部と艶消し部が明確に形成さ
れた柄のある装飾用しんちゅう板が得られた。Next, the present invention will be described in more detail with reference to specific examples of the present invention. [Example 1] The entire surface of a brass flat plate having a thickness of 2 m / m was plated with chrome to form a chrome layer having a thickness of 10 µm, and a negative photosensitive resin (TP) was formed on the entire surface of the chrome layer.
R: manufactured by Tokyo Ohka Kogyo Co., Ltd.) to a thickness of about 5 μm, a resist layer is provided on the entire surface, and a negative film having a glossy part in a white field is prepared. After forming the pattern, etching was performed using hydrochloric acid as an etching solution until the brass surface of the matte portion was exposed. Next, after the chrome layer is left in the resist pattern shape, sandblasting is applied to the entire surface (# 150) to provide fine unevenness on the matte portion, and then the whole is immersed in an etching solution (hydrochloric acid) to leave the remaining chrome. When all the layers were removed, a decorative brass plate having a pattern in which glossy parts and matte parts were clearly formed was obtained.
【００３４】〔実施例２〕厚さ１m/m の銅板の表面全面
にクロムメッキを行いクロム層を１０μｍ厚みに形成
し、該クロム層の表面全面にネガ型の感光性樹脂（ＴＰ
Ｒ：東京応化工業製）を約５μｍ厚みに形成してレジス
ト層を全面に設け、光沢部とする部分を白場としたネガ
フィルムを作成し上記レジスト層の表面に重ね露光、現
像を行いレジストパターンを形成した後、塩酸をエッチ
ング液として用い艶消し部の銅表面が露出するまでエッ
チングを行った。次にエッチグ液を塩化第２鉄溶液に換
えて銅板の艶消し部とする部を３０μｍエッチングし、
クロム層がレジストパターン状に残っている状態で全面
にサンドブラストをかけ（♯１５０）艶消し部に微細凹
凸を設けた後、全体を腐食液（塩酸）に浸漬して残って
いるクロム層を全部除去したところ、凹部に光沢部が形
成され、凸部に艶消し部が形成され、艶の異なる部分が
段差を有する柄に形成され、しかも艶消し部の風合いが
従来にない外観を呈し優れた意匠性を有する金属装飾体
が得られた。Example 2 The entire surface of a copper plate having a thickness of 1 m / m was plated with chromium to form a chromium layer having a thickness of 10 μm, and a negative photosensitive resin (TP) was formed on the entire surface of the chromium layer.
R: manufactured by Tokyo Ohka Kogyo Co., Ltd.) to a thickness of about 5 μm, a resist layer is provided on the entire surface, and a negative film having a glossy part in a white field is prepared. After forming the pattern, etching was performed using hydrochloric acid as an etching solution until the copper surface of the matte portion was exposed. Next, the etching solution was changed to ferric chloride solution, and the portion to be the matte portion of the copper plate was etched by 30 μm,
Sandblast the entire surface with the chrome layer remaining in the resist pattern (# 150) to form fine irregularities on the matte part, and then immerse the whole in a corrosive solution (hydrochloric acid) to remove the remaining chrome layer. When removed, a glossy part was formed in the concave part, a matte part was formed in the convex part, a part with different gloss was formed into a pattern with steps, and the matte part had an unprecedented appearance and was excellent. A metallic decorative body having a design property was obtained.
【００３５】〔実施例３〕厚み１m/m のステンレス板の
表面全面に亜鉛メッキを行い亜鉛層を１０μｍ厚みに形
成し、該亜鉛層の表面に部分的に万線模様（万線比が３
０μｍ：３０μｍ、版深が５μｍ）のミクロエンボスを
レジスト−エッチングの手法で形成した。次いでネガ型
の感光性樹脂（ＴＰＲ：東京応化工業製）を約５μｍ厚
みに形成したレジスト層を全面に設け、ミクロエンボス
の部分を白場としたネガフィルムを作成し上記レジスト
層の表面に重ね露光、現像を行いレジストパターンを形
成した後、希硝酸をエッチング液として用い艶消し部の
ステンレス表面が露出するまでエッチングを行った。次
に亜鉛層がレジストパターン状に残っている状態で全面
にサンドブラストをかけ（♯２００）艶消し部に微細凹
凸を設けた後、全体を希硝酸を用いて残っている亜鉛層
を全部除去したところ、万線模様のミクロエンボス部と
艶消し部が明確に表現された柄が得られ、しかも艶消し
部の風合いが従来にない外観を呈し優れた意匠性を有す
る金属装飾体が得られた。[Embodiment 3] The entire surface of a stainless plate having a thickness of 1 m / m is galvanized to form a zinc layer having a thickness of 10 μm.
(0 μm: 30 μm, plate depth: 5 μm) was formed by a resist-etching method. Next, a negative type photosensitive resin (TPR: manufactured by Tokyo Ohka Kogyo Co., Ltd.) was formed on the entire surface to a thickness of about 5 μm, and a negative film having micro-embossed portions as white spots was formed and superposed on the surface of the resist layer. After exposure and development to form a resist pattern, etching was performed using dilute nitric acid as an etching solution until the stainless surface of the matte portion was exposed. Next, sand blasting is applied to the entire surface in the state where the zinc layer remains in the resist pattern (# 200) to form fine unevenness on the matte portion, and then the remaining zinc layer is completely removed using dilute nitric acid. However, a pattern in which the micro-embossed portion and the matte portion of the line pattern were clearly expressed was obtained, and furthermore, the metal ornament having an excellent appearance with the appearance that the matte portion had no texture was obtained. .
【００３６】〔実施例４〕厚み２００μｍの銅板の表面
全面にクロムメッキを行いクロム層を１０μｍ厚みに形
成し、該クロム層の表面に部分的に万線模様（万線比が
３０μｍ：３０μｍ、版深が５μｍ）のミクロエンボス
をレジスト−エッチングの手法で形成した。次いでネガ
型の感光性樹脂（ＴＰＲ：東京応化工業製）を約５μｍ
厚みに形成したレジスト層を全面に設け、ミクロエンボ
スの部分を白場としたネガフィルムを作成し上記レジス
ト層の表面にネガフィルムを重ね露光、現像を行いレジ
ストパターンを形成した後、塩酸をエッチング液として
用い艶消し部の銅表面が露出するまでエッチングを行っ
た。次にエッチング液を塩化第２鉄溶液に換えて銅板の
艶消し部とする部分を３０μｍ腐食させ、クロム層がレ
ジストパターン状に残っている状態で全面にサンドブラ
ストをかけ（♯１５０）、艶消し部に微細凹凸を設けた
後、塩酸を用いて残っているクロム層を全部除去したと
ころ、万線模様のミクロエンボス部と艶消し部が明確に
表現された柄が得られ、しかも艶消し部の風合いが従来
にない外観を呈し優れた意匠性を有する金属装飾体が得
られた。[Example 4] The entire surface of a copper plate having a thickness of 200 µm was plated with chromium to form a chromium layer having a thickness of 10 µm, and a line pattern (a line ratio of 30 µm: 30 µm; A microemboss having a plate depth of 5 μm) was formed by a resist-etching technique. Next, apply a negative photosensitive resin (TPR: made by Tokyo Ohka Kogyo) to about 5 μm.
A negative resist film is formed on the entire surface with a thick resist layer, and the micro-embossed portion is white. A negative film is overlaid on the surface of the resist layer, exposed and developed to form a resist pattern, and then etched with hydrochloric acid. It was used as a liquid and was etched until the copper surface of the matte portion was exposed. Next, the etching solution was changed to ferric chloride solution to corrode the matte portion of the copper plate by 30 μm, and the entire surface was sandblasted (# 150) with the chrome layer remaining in the resist pattern shape, and matte. After forming the fine unevenness on the part, all the remaining chromium layer was removed using hydrochloric acid, and a pattern in which the line-shaped micro-embossed part and the matte part were clearly expressed was obtained, and the matte part A metal decorative body having an unprecedented appearance and excellent designability was obtained.
【００３７】[0037]
【発明の効果】以上説明したように本発明金属装飾体は
艶消しとしない部分を保護金属層で覆った後にブラスト
処理を行って艶消し部を形成しているために、所望の部
分のみが優れたマット感を有する艶消し部として形成さ
れている金属装飾体が得られる。As described above, in the metal decorative body of the present invention, since the non-matting portion is covered with the protective metal layer and the blasting treatment is performed to form the matting portion, only the desired portion is formed. A metal decorative body formed as a matte portion having an excellent matt feeling can be obtained.
【００３８】本発明金属装飾体の製造方法は保護金属層
を設けた後にブラスト処理を行う方法を採用したことに
より、艶消し部以外は保護金属層にマスクされるので、
他の部分がマット化されて艶消しになる虞れが全くなく
所望の部分のみ艶消し化して、意匠性に優れる上記の金
属装飾体を確実に効率よく製造することが可能である。Since the method for producing the metal decorative body of the present invention adopts a method in which the protective metal layer is provided and then the blast treatment is carried out, the portions other than the matte portion are masked by the protective metal layer.
It is possible to surely and efficiently manufacture the above-mentioned metal decorative body having excellent designability by matting only a desired portion without any possibility of matting the other portion and matting.
【図１】本発明金属装飾体の製造方法の１例を示す説明
図である。FIG. 1 is an explanatory view showing an example of a method for producing a metal decorative body of the present invention.
【図２】露光工程を示す説明図である。FIG. 2 is an explanatory diagram showing an exposure process.
【図３】本発明金属装飾体の製造方法の他の例を示す説
明図である。FIG. 3 is an explanatory view showing another example of the method for producing a metal decorative body of the present invention.
【図４】本発明金属装飾体の製造方法のその他の例を示
す説明図である。FIG. 4 is an explanatory view showing another example of the method for producing a metal decorative body of the present invention.
【図５】本発明金属装飾体の態様を示す断面図である。FIG. 5 is a cross-sectional view showing an embodiment of the metal decorative body of the present invention.
１：金属装飾体 ２：金属基材 ３：艶消し部 ４：光沢部 ５：保護金属層 ６：レジスト層 1: Metal decoration 2: Metal base material 3: Matte part 4: Glossy part 5: Protective metal layer 6: Resist layer
Claims (6)
に形成された艶消し部と、該艶消し部と艶の異なる部分
とを有する金属装飾体において、金属基材の表面に保護
金属層を設け該保護金属層の表面にレジストにより艶消
し部以外に所望のパターンを形成し、エッチングにより
艶消し部の保護金属層を除去し金属基材表面を露出さ
せ、全体にブラスト処理を施して金属基材に艶消し部を
形成し、残っている保護金属層を除去して、艶消し部と
それ以外の艶の異なる部分とが形成されていることを特
徴とする金属装飾体。1. A metal decorative body having a matte portion formed on the surface of a metal base material in the form of fine matte unevenness and a portion having a different gloss from the matte portion, wherein the surface of the metal base material is provided. A protective metal layer is provided to form a desired pattern on the surface of the protective metal layer with a resist other than the matte portion, and the protective metal layer of the matte portion is removed by etching to expose the surface of the metal base material, and the entire surface is blasted. To form a matte portion on the metal base material, remove the remaining protective metal layer, and form a matte portion and a portion having a different luster other than that. .
出した金属基材表面を更にエッチングして腐食させてな
る請求項１記載の金属装飾体。2. The metal decorative body according to claim 1, wherein the metal base material surface exposed by etching is further etched and corroded before the blasting treatment.
ンボスを形成しておく請求項１又は２記載の金属装飾
体。3. The metal decorative body according to claim 1, wherein a line-patterned micro-embossing is formed on the surface of the metal base material in advance.
金属装飾体の製造方法。 （Ａ）金属基材の表面に保護金属層を設ける第１工程 （Ｂ）保護金属層表面にレジストにより所望のパターン
を形成する第２工程 （Ｃ）エッチングにより艶消しにしたい部分の保護金属
層を除去して金属基材を露出させる第３工程 （Ｄ）全面にブラスト加工を施して露出した金属基材の
表面に艶消し部を形成する第４工程 （Ｅ）残っている保護金属を除去する第５工程4. A method for producing a metal decorative body, which comprises sequentially performing the following steps. (A) First step of providing a protective metal layer on the surface of a metal substrate (B) Second step of forming a desired pattern on the surface of the protective metal layer with a resist (C) Protective metal layer of a portion to be matted by etching Third step of removing the metal base to expose the metal base (D) Fourth step of blasting the entire surface to form a matte portion on the exposed surface of the metal base (E) Removing the remaining protective metal The fifth step to do
り露出した部分の金属基材を更に腐食させる工程を行う
請求項４記載の金属装飾体の製造方法。5. The method for producing a metal decorative body according to claim 4, wherein a step of further corroding the metal base material exposed by etching is performed between the third step and the fourth step.
ンボスを形成しておく請求項４又は５記載の金属装飾体
の製造方法6. The method for producing a metal decorative body according to claim 4, wherein a line-patterned micro-emboss is formed on the surface of the metal substrate in advance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11684492A JPH0688252A (en) | 1992-04-09 | 1992-04-09 | Metallic ornamental body and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11684492A JPH0688252A (en) | 1992-04-09 | 1992-04-09 | Metallic ornamental body and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0688252A true JPH0688252A (en) | 1994-03-29 |
Family
ID=14697030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11684492A Pending JPH0688252A (en) | 1992-04-09 | 1992-04-09 | Metallic ornamental body and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0688252A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4014869A1 (en) * | 1989-05-10 | 1990-11-15 | Toyota Motor Co Ltd | Double torque-transmitting connection in vehicle gearbox - has two independent, coaxial and telescopic shafts connected to radially extending rotational element by splines |
| JP2001105796A (en) * | 1999-07-30 | 2001-04-17 | Sukegawa Electric Co Ltd | Metal decorative plate and its manufacturing method |
| KR100530356B1 (en) * | 2002-09-24 | 2005-11-22 | 최선곤 | Commemoration plate and manufacture method |
| KR100944044B1 (en) * | 2008-05-02 | 2010-02-24 | 양경윤 | The letter manufacturing hologram formation method on goods in compliance with the diffraction and a reflection of the light which uses a transparant glass |
| JP2016055160A (en) * | 2014-09-04 | 2016-04-21 | ダンロップスポーツ株式会社 | Article with metallic strip and method of making the same |
| JP2019126998A (en) * | 2018-01-26 | 2019-08-01 | 大日本印刷株式会社 | Decorative body and production method of decorative body |
-
1992
- 1992-04-09 JP JP11684492A patent/JPH0688252A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4014869A1 (en) * | 1989-05-10 | 1990-11-15 | Toyota Motor Co Ltd | Double torque-transmitting connection in vehicle gearbox - has two independent, coaxial and telescopic shafts connected to radially extending rotational element by splines |
| JP2001105796A (en) * | 1999-07-30 | 2001-04-17 | Sukegawa Electric Co Ltd | Metal decorative plate and its manufacturing method |
| KR100530356B1 (en) * | 2002-09-24 | 2005-11-22 | 최선곤 | Commemoration plate and manufacture method |
| KR100944044B1 (en) * | 2008-05-02 | 2010-02-24 | 양경윤 | The letter manufacturing hologram formation method on goods in compliance with the diffraction and a reflection of the light which uses a transparant glass |
| JP2016055160A (en) * | 2014-09-04 | 2016-04-21 | ダンロップスポーツ株式会社 | Article with metallic strip and method of making the same |
| JP2019126998A (en) * | 2018-01-26 | 2019-08-01 | 大日本印刷株式会社 | Decorative body and production method of decorative body |
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