JPH06279179A - Molecualr beam source cell - Google Patents
Molecualr beam source cellInfo
- Publication number
- JPH06279179A JPH06279179A JP8695893A JP8695893A JPH06279179A JP H06279179 A JPH06279179 A JP H06279179A JP 8695893 A JP8695893 A JP 8695893A JP 8695893 A JP8695893 A JP 8695893A JP H06279179 A JPH06279179 A JP H06279179A
- Authority
- JP
- Japan
- Prior art keywords
- heater
- wires
- beam source
- molecular beam
- source cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は分子線エピタキシ装置用
の分子線源セルに関し、特にヒータの寿命を長くし、か
つ、昇降温過程においても安定した加熱状態を保つこと
のできる分子線源セルに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a molecular beam source cell for a molecular beam epitaxy apparatus, and more particularly to a molecular beam source cell which can prolong the life of a heater and can maintain a stable heating state even during a temperature raising / lowering process. It is about.
【０００２】[0002]
【従来の技術】分子線源セルの基本構造を図１に示す。
原料を入れたるつぼ１はＴａ，Ｗ等から成るヒータ２に
より加熱され、熱せられた原料は分子線状となって、る
つぼ噴出口より飛び出し、基板上に蒸着される。ヒータ
への給電は、ベ−スフランジ１０から真空となっている
成長室内へフィードスルー３を介して真空外の電源から
真空内のヒータへ行われている。フィードスルー３はス
テンレス製の管体にアルミナ等の絶縁物を充填した中に
銅線を通したものである。ヒータ線とフィードスルーと
は、コネクタ４により固定されている。2. Description of the Related Art The basic structure of a molecular beam source cell is shown in FIG.
The crucible 1 containing the raw material is heated by a heater 2 made of Ta, W, etc., and the heated raw material becomes a molecular beam, which is ejected from the crucible ejection port and deposited on the substrate. Electric power is supplied to the heater from the base flange 10 into the vacuum growth chamber through the feedthrough 3 from the power supply outside the vacuum to the heater inside the vacuum. The feedthrough 3 is a stainless steel tubular body filled with an insulating material such as alumina, and then a copper wire is passed through the tubular body. The heater wire and the feedthrough are fixed by the connector 4.
【０００３】[0003]
【発明が解決しようとする課題】このような従来の分子
線源セルでは、ヒータへ電力が供給されて温度が上昇し
たときのヒータ線の膨張は、ヒータ線とフィードスルー
とがコネクタにより固定されているため、ヒータ線自体
のたわみにより緩和されていた。この様に、Ｇａ，Ａ
ｌ，Ｓｉ等、１０００℃以上の温度が必要となる分子線
源セルにおいて、昇降温をくり返すことにより、ヒータ
線の膨張・収縮による応力により断線を起こし、分子線
源セルの寿命が短かくなるという問題点があった。ま
た、ヒータ線のたわみで吸収できない膨張が起こるとる
つぼの位置を変化させてしまう恐れもあった。In such a conventional molecular beam source cell, when the electric power is supplied to the heater and the temperature rises, the heater wire expands because the heater wire and the feedthrough are fixed by the connector. Therefore, it was alleviated by the bending of the heater wire itself. In this way, Ga, A
In a molecular beam source cell that requires a temperature of 1000 ° C. or higher, such as 1, 1, Si, by repeatedly raising and lowering the temperature, a wire breakage occurs due to stress due to expansion and contraction of the heater wire, and the molecular beam source cell has a short life. There was a problem that Further, there is a possibility that the position of the melting pot where the expansion that cannot be absorbed due to the deflection of the heater wire occurs may be changed.
【０００４】[0004]
【課題を解決するための手段及び作用】本発明は上記の
欠点を解決するためになされたもので、本発明の目的は
昇降温のくり返しによるヒータ線にかかる応力をなく
し、ヒータの寿命を長くし、かつセル温度の再現性を向
上することにある。The present invention has been made in order to solve the above-mentioned drawbacks, and an object of the present invention is to eliminate the stress applied to the heater wire due to repeated heating and cooling, thereby extending the life of the heater. And to improve the reproducibility of the cell temperature.
【０００５】すなわち本発明は、原料を入れるるつぼ、
該るつぼを加熱するヒータおよび該ヒ−タへ給電するフ
ィードスルーからなる分子線源セルにおいて、該ヒータ
と該フィードスルーとの間に緩和部材を接続することを
特徴とする分子線源セルを提供するものである。That is, the present invention is a crucible for containing raw materials,
A molecular beam source cell comprising a heater for heating the crucible and a feedthrough for supplying power to the heater, wherein a relaxation member is connected between the heater and the feedthrough. To do.
【０００６】通常ヒータには、ＴａやＷが用いられる。
Ｔａ，Ｗの線膨張係数は、６〜７×１０-6程度である。
これらの材質を用いてヒーターを形成した場合、図１に
示すヒータ線の固定位置から、フィードスルーへの接続
点までの長さは３０〜４０ｃｍであり、室温から使用温
度である１０００℃まで加熱すると、約２ｍｍ膨張する
事になる。また、通常ヒーターは毎日、成長温度と、ア
イドリング温度（通常３００〜７００℃）との間で昇降
温をくり返す。この場合にも、ヒータ線は１ｍｍ程度の
膨張と収縮をくり返す。Usually, Ta or W is used for the heater.
The linear expansion coefficient of Ta and W is about 6 to 7 × 10 −6 .
When a heater is formed using these materials, the length from the fixed position of the heater wire shown in FIG. 1 to the connection point to the feedthrough is 30 to 40 cm, and the temperature is raised from room temperature to 1000 ° C. which is the operating temperature. Then, it expands by about 2 mm. In addition, the normal heater repeats the temperature rising and falling between the growth temperature and the idling temperature (usually 300 to 700 ° C.) every day. Also in this case, the heater wire repeats expansion and contraction of about 1 mm.
【０００７】本発明は、上記の膨張・収縮により、ヒー
タ線がたわんだり、動いてしまうことを防ぐために、ヒ
ータ線とフィードスルーとの間に、この膨張・収縮を吸
収するための緩和部材を接続する。この緩和部材として
は、コイル状に巻いたバネ状の部材を用いる。この様な
コイル状の緩和部材を用いることにより、ヒータの膨張
・収縮に伴う応力が減少し、ヒータの寿命が長くなると
共に、ヒータ本体の位置を安定化させることができる。
また、緩和部材は材質的にはヒ−タ線の膨張・収縮を吸
収できるような軟らかであり、自ら発熱しないような低
抵抗であり、原料と反応せず、かつ汚染源とならないよ
うなものが望ましく、例えば金や銀などが良い。In the present invention, in order to prevent the heater wire from bending or moving due to the expansion and contraction, a relaxation member for absorbing the expansion and contraction is provided between the heater wire and the feedthrough. Connecting. A spring-shaped member wound in a coil shape is used as the relaxing member. By using such a coil-shaped relaxing member, the stress associated with the expansion and contraction of the heater is reduced, the life of the heater is extended, and the position of the heater body can be stabilized.
In addition, the material for the relaxation member is soft enough to absorb the expansion and contraction of the heater wire, has low resistance so that it does not generate heat by itself, does not react with the raw material, and does not become a pollution source. Desirably, for example, gold or silver is preferable.
【０００８】[0008]
【実施例】本発明の実施例を第２図に示す。原料を入れ
るるつぼ１の外側に、Ｔａ製のヒーター２がＰＢＮ製の
ヒーターサポート５により、固定されている。ヒーター
サポートの外側はＴａ製の熱シールド板６でシールドさ
れている。ヒーターサポート５から出たヒーター線は絶
縁管７を通してセル本体下部に引き出されている。この
ヒーター線と分子線セルのベースフランジ１０を通した
フィードスルー３の端子との間に、２つのコネクタを通
してコイル状に形成された緩和部材８を挿入してある。
本実施例では、この緩和部材として０．１ｍｍの金線を
１０〜２０本のより線とし、さらにコイル状に形成した
ものを用いた。この緩和部材としては、前述した様に２
ｍｍ以上のヒーター線の膨張を吸収できるものであれば
良く、本実施例の様に、金のより線でなくとも良い。EXAMPLE An example of the present invention is shown in FIG. A heater 2 made of Ta is fixed by a heater support 5 made of PBN to the outside of the crucible 1 for containing the raw materials. The outside of the heater support is shielded by a heat shield plate 6 made of Ta. The heater wire extending from the heater support 5 is led out to the lower portion of the cell body through the insulating tube 7. Between the heater wire and the terminal of the feedthrough 3 passing through the base flange 10 of the molecular beam cell, a coil-shaped relaxation member 8 is inserted through two connectors.
In this embodiment, as the relaxing member, a wire having a diameter of 0.1 mm of 10 to 20 stranded wires and further formed in a coil shape is used. As the relaxing member, as described above, 2
As long as it can absorb the expansion of the heater wire of mm or more, it may not be a stranded wire of gold as in the present embodiment.
【０００９】本実施例の構造の分子線セルを III−Ｖ族
の分子線エピタキシャル成長のＧａ用の分子線源として
適用した。この結果、分子線セルヒータは、毎日５００
℃から１０００℃の昇降温をくり返しても２年以上断線
という事態は起こらず、安定的に使用が可能な状態を保
っている。The molecular beam cell having the structure of this example was applied as a molecular beam source for Ga in III-V group molecular beam epitaxial growth. As a result, the molecular beam cell heater is
Even if the temperature was raised or lowered from ℃ to 1000 ℃, the situation of disconnection did not occur for more than 2 years, and it remains stable.
【００１０】[0010]
【発明の効果】以上説明した様に、本発明の緩和部材を
ヒータ線とフィードスルーの間に設ける事により、ヒー
タ線の変形がなくなり、ヒータの寿命が長くなるだけで
なく、ヒータの位置が安定して、温度の再現性も向上す
るという利点がある。As described above, by providing the relaxing member of the present invention between the heater wire and the feedthrough, not only the heater wire is not deformed and the life of the heater is extended, but also the position of the heater is improved. It has the advantage of being stable and improving the reproducibility of temperature.
【図１】従来の分子線源セルの基本構造FIG. 1 Basic structure of a conventional molecular beam source cell
【図２】本発明の実施例FIG. 2 Example of the present invention
１．るつぼ ２．ヒータ線 ３．フィードスルー ４．コネクタ ５．ヒータサポート ６．熱シールド板 ７．絶縁管 ８．緩和部材 ９．熱電対 10．ベ−スフランジ 1. Crucible 2. Heater wire 3. Feedthrough 4. Connector 5. Heater support 6. Heat shield plate 7. Insulation tube 8. Relaxation member 9. Thermocouple 10. Base flange
Claims (1)
るヒータおよび該ヒ−タへ給電するフィードスルーから
なる分子線源セルにおいて、該ヒータと該フィードスル
ーとの間に緩和部材を接続することを特徴とする分子線
源セル。1. In a molecular beam source cell comprising a crucible for containing a raw material, a heater for heating the crucible and a feedthrough for supplying power to the heater, a relaxation member is connected between the heater and the feedthrough. Molecular beam source cell characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8695893A JPH06279179A (en) | 1993-03-23 | 1993-03-23 | Molecualr beam source cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8695893A JPH06279179A (en) | 1993-03-23 | 1993-03-23 | Molecualr beam source cell |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06279179A true JPH06279179A (en) | 1994-10-04 |
Family
ID=13901388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8695893A Pending JPH06279179A (en) | 1993-03-23 | 1993-03-23 | Molecualr beam source cell |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06279179A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210148314A (en) | 2019-07-26 | 2021-12-07 | 가부시키가이샤 시바타 | Fine bubble generator and water treatment device |
-
1993
- 1993-03-23 JP JP8695893A patent/JPH06279179A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210148314A (en) | 2019-07-26 | 2021-12-07 | 가부시키가이샤 시바타 | Fine bubble generator and water treatment device |
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