JPH0718445A - Heat treating device - Google Patents
Heat treating deviceInfo
- Publication number
- JPH0718445A JPH0718445A JP19192793A JP19192793A JPH0718445A JP H0718445 A JPH0718445 A JP H0718445A JP 19192793 A JP19192793 A JP 19192793A JP 19192793 A JP19192793 A JP 19192793A JP H0718445 A JPH0718445 A JP H0718445A
- Authority
- JP
- Japan
- Prior art keywords
- heating resistor
- end portion
- heating
- heat insulating
- relay
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Resistance Heating (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、熱処理装置に関し、特
に、被処理体を高温下で熱処理する際に用いる発熱体の
構造に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat treatment apparatus and, more particularly, to a structure of a heating element used when heat treating an object to be processed at a high temperature.
【０００２】[0002]
【従来の技術】一般に、半導体ウエハ製造工程での各種
薄膜形成装置には、ＣＶＤ装置、エピタキシャル装置や
酸化膜形成装置あるいはドーピング装置の熱拡散装置等
の熱処理装置が用いられている。2. Description of the Related Art Generally, a heat treatment apparatus such as a CVD apparatus, an epitaxial apparatus, an oxide film forming apparatus, or a thermal diffusion apparatus of a doping apparatus is used for various thin film forming apparatuses in a semiconductor wafer manufacturing process.
【０００３】この種の半導体ウエハの各種熱処理に使用
される一般拡散型の熱処理装置は、被処理体である半導
体ウエハが配置される炉室を形成するプロセスチューブ
と、このプロセスチューブの外周に設けられる発熱抵抗
体と、この発熱抵抗体を包囲して設けられている断熱材
とを備え、この断熱材を介して上記発熱抵抗体が取り付
けられて支持されている。A general diffusion type heat treatment apparatus used for various heat treatments of this kind of semiconductor wafer is provided with a process tube forming a furnace chamber in which a semiconductor wafer which is an object to be processed is arranged, and an outer periphery of the process tube. The heat generating resistor and a heat insulating material surrounding the heat generating resistor are provided, and the heat generating resistor is attached and supported via the heat insulating material.
【０００４】この場合の発熱抵抗体としては、一例とし
て、バッチ処理が可能な熱処理装置の場合でいうと、水
平方向でスパイラル状に配線されたＦｅＣｒＡｌ製等か
らなるヒータが用いられ、炉室内を例えば１２００℃程
度まで高温加熱するようになっている。また、断熱材と
しては、一例として、セラミックスファイバ等が用いら
れ、輻射熱および伝導熱として奪われる熱量を減少させ
て効率良く加熱できるようになっている。As an example of the heating resistor in this case, in the case of a heat treatment apparatus capable of batch processing, a heater made of FeCrAl or the like, which is spirally wired in the horizontal direction, is used, and the inside of the furnace chamber is used. For example, high temperature heating is performed up to about 1200 ° C. Further, as the heat insulating material, for example, a ceramic fiber or the like is used, and the amount of heat taken as radiant heat and conductive heat is reduced to enable efficient heating.
【０００５】ところで、熱処理装置のうちでプロセスチ
ューブを縦置きした縦型熱処理装置では、プロセスチュ
ーブが縦方向で複数のゾーンに分割され、各ゾーンでの
温度管理が行なわれるようになっている。これは、発熱
抵抗体への給電効率や温度分布の管理が異なることに原
因しており、このため、前記したスパイラル状の発熱抵
抗体も各ゾーンに対応して結線されていることがある。
しかしながら、このような配線を行なうと、各ゾーンの
境界部で加熱されない部分が発生することが原因して安
定した温度管理が行なえないことがある。By the way, in the vertical type heat treatment apparatus in which the process tube is placed vertically in the heat treatment apparatus, the process tube is divided into a plurality of zones in the vertical direction, and the temperature is controlled in each zone. This is because the power supply efficiency to the heat generating resistor and the management of the temperature distribution are different, and therefore the spiral heat generating resistor may be connected corresponding to each zone.
However, when such wiring is performed, stable temperature control may not be performed due to the generation of unheated portions at the boundary of each zone.
【０００６】そこで、従来では、発熱抵抗体の配列方向
を水平方向ではなく、縦方向に設定する構造が提案され
ている（例えば、特開平４−１５５８８２号公報）。Therefore, conventionally, a structure has been proposed in which the arrangement direction of the heating resistors is set not in the horizontal direction but in the vertical direction (for example, Japanese Patent Laid-Open No. 4-155882).
【０００７】すなわち、上記公報によれば、発熱抵抗体
は、各ゾーン毎で、一本の線材を縦方向に伸ばして上下
部でＵ字状に折返すとともに、この折返し部に至る線材
の延長部を周方向で長短交互に形成し、各折返し部が対
向する各ゾーン間での発熱抵抗体同士で折返し部を相互
に噛み合わせた状態に配置されている。従って、縦方向
で相互に噛み合う状態に発熱抵抗体が配置されること
で、各ゾーンの縦方向、特に、境界部で加熱されない領
域をなくして均一な加熱ゾーンを形成することができ
る。That is, according to the above-mentioned publication, the heating resistor extends one wire in each zone in the vertical direction and folds it back and forth in a U-shape at the upper and lower portions, and extends the wire to reach the folded portion. The portions are alternately formed in the circumferential direction, and the folded portions are arranged such that the folded portions are engaged with each other by the heating resistors between the zones where the folded portions face each other. Therefore, by arranging the heat generating resistors so as to mesh with each other in the vertical direction, it is possible to form a uniform heating zone by eliminating the non-heated region in the vertical direction of each zone, particularly at the boundary.
【０００８】[0008]
【発明が解決しようとする課題】ところで、発熱抵抗体
は、近年、上記したＦｅＣｒＡｌ発熱体に代えて、二ケ
イ化モリブデンが用いられる場合がある。これは、上記
ＦｅＣｒＡｌ発熱体の最大表面負荷が１２００℃におい
て例えば２Ｗ／ｃｍ2 であるのに対し、２０Ｗ／ｃｍ2
と１０倍の発熱量であって、強力なパワー増加が得られ
ることを理由としている。つまり、二ケイ化モリブデン
は、従来用いられているＦｅＣｒＡｌ発熱体が１０℃／
分の温度上昇であるのに対し、１００℃／分と温度上昇
を急俊にすることができ、通常用いられる熱処理装置で
の昇降温度変化率である１０〜２０℃／分（昇温時）、
１０℃／分（降温時）に対して、１００℃／分（昇温
時）、６０℃／分（降温時）程度の温度変化速度を要求
される高速熱処理装置に好適とされているからである。By the way, in recent years, as the heating resistor, molybdenum disilicide may be used in place of the above FeCrAl heating element. This is because the maximum surface load of the FeCrAl heating element is, for example, 2 W / cm 2 at 1200 ° C., while it is 20 W / cm 2.
The reason is that the calorific value is 10 times higher and a powerful increase in power can be obtained. In other words, with molybdenum disilicide, the conventionally used FeCrAl heating element is 10 ° C /
In contrast to the temperature increase of 10 minutes / minute, the temperature increase can be rapidly increased to 100 ° C./minute, and the rate of temperature change is 10 to 20 ° C./minute (at the time of temperature increase), which is the rate of temperature change in a commonly used heat treatment apparatus. ,
This is because it is suitable for a high-speed heat treatment apparatus that requires a temperature change rate of about 100 ° C./min (when increasing temperature) and 60 ° C./min (when decreasing temperature) with respect to 10 ° C./min (when decreasing temperature). is there.
【０００９】しかしながら、二ケイ化モリブデンは、比
較的脆弱な材質である関係上、発熱抵抗体への給電のた
めの配線を直接発熱抵抗体の端部に接続して固定した場
合に折損する虞れがあった。つまり、発熱抵抗体に接続
される配線は、抵抗損失を抑えて高電流を流す必要があ
る関係でかなり大径の線材が用いられる。このため、配
線の重量が負荷となることで発熱抵抗体の端部に曲げモ
ーメントが発生する。従って、モーメントに対する耐久
性が発熱抵抗体に備わっていないことが原因して折れ易
くなる。However, since molybdenum disilicide is a relatively fragile material, it may break when the wiring for supplying power to the heating resistor is directly connected and fixed to the end of the heating resistor. There was That is, for the wiring connected to the heating resistor, a wire having a considerably large diameter is used because it is necessary to suppress the resistance loss and flow a high current. Therefore, the weight of the wiring becomes a load, and a bending moment is generated at the end of the heating resistor. Therefore, the heat generating resistor does not have the durability against the moment, so that the heat generating resistor easily breaks.
【００１０】一方、発熱抵抗体は、周方向で二分された
ものが組込まれることが多い。これは、発熱抵抗体の延
長距離による消費電力の増加を抑えるためである。この
ため、発熱抵抗体が取付けられてプロセスチューブの外
殻をなす断熱材も周方向で分割されていて、分割面に形
成したスリットから発熱抵抗体の端部を外側に突出させ
る構造が採用されている。しかしながら、分割された断
熱材の分割面に位置する発熱抵抗体同士の間隔が離れて
いると、分割位置近傍での加熱領域、つまり、発熱抵抗
体が存在しない範囲が大きくなることで、周方向での温
度分布が均一に得られなくなる虞れがあった。On the other hand, the heating resistor, which is divided into two in the circumferential direction, is often incorporated. This is to suppress an increase in power consumption due to the extension distance of the heating resistor. For this reason, the heat insulating material, which is attached to the heating resistor and forms the outer shell of the process tube, is also divided in the circumferential direction, and the structure in which the end of the heating resistor is projected outward from the slit formed in the dividing surface is adopted. ing. However, if the heating resistors located on the divided surfaces of the divided heat insulating material are spaced apart from each other, the heating region near the dividing position, that is, the range in which the heating resistor does not exist becomes large, so that the circumferential direction There is a possibility that the temperature distribution in the above may not be obtained uniformly.
【００１１】そこで、本発明の目的は、上記従来の熱処
理装置、特に、給電構造での問題に鑑み、給電用の配線
による発熱抵抗体の破損を未然に防止することができる
構造を備えた熱処理装置を提供することにある。Therefore, an object of the present invention is to provide a heat treatment apparatus having a structure capable of preventing damage to the heating resistor due to the wiring for power supply in view of the above problems in the conventional heat processing apparatus, particularly the power supply structure. To provide a device.
【００１２】また、本発明の目的は、周方向で分割され
た分割位置での間隔を広げることなく発熱抵抗体の端部
を取付けることができるようにすることで、周方向での
温度分布を均一化することができる構造を備えた熱処理
装置を提供することにある。Another object of the present invention is to allow the end portion of the heating resistor to be attached without widening the interval at the divided positions divided in the circumferential direction, so that the temperature distribution in the circumferential direction can be improved. It is an object of the present invention to provide a heat treatment apparatus having a structure that can be made uniform.
【００１３】[0013]
【課題を解決するための手段】上記目的を達成するた
め、請求項１記載の発明は、複数の非処理体をバッチ処
理する縦型プロセスチューブと、上記縦型プロセスチュ
ーブの周囲に配置された周方向で二分されている断熱材
と、上記各断熱材の内壁面にて周方向に間隔をおいて配
列され、端部が上記断熱材から外側に向け延長して取り
出されている発熱抵抗体と、上記縦型プロセスチューブ
に近接して設けられていて、上記発熱抵抗体の端部に対
向する電極端子を備えた縦型の中継端子部材と、を備
え、上記中継端子部材の電極端子と上記発熱抵抗体の端
部とが、軽量部材からなる平網状中継部材によって接続
されていることを特徴としている。In order to achieve the above object, the invention according to claim 1 has a vertical process tube for batch processing a plurality of non-processed objects, and is arranged around the vertical process tube. A heat insulating material that is divided into two parts in the circumferential direction, and a heating resistor that is arranged at intervals in the circumferential direction on the inner wall surface of each of the heat insulating materials and has an end extending outward from the heat insulating material and taken out. And a vertical relay terminal member that is provided in the vicinity of the vertical process tube and that includes an electrode terminal facing the end of the heating resistor, and an electrode terminal of the relay terminal member. It is characterized in that the end portion of the heating resistor is connected by a flat mesh relay member made of a lightweight member.
【００１４】請求項２記載の発明は、請求項１におい
て、上記発熱抵抗体の端部は、上記断熱材の分割面近傍
で互いに接近した状態で支持されていることを特徴とし
ている。According to a second aspect of the present invention, in the first aspect, the end portions of the heating resistor are supported in a state of being close to each other in the vicinity of the division surface of the heat insulating material.
【００１５】請求項３記載の発明は、請求項１または２
において、上記発熱抵抗体の端部は、上記中継部材が巻
付けられ、自己の弾性によって閉じる習性を有する挟持
部材によって上記中継部材と上記端部とが密着させられ
ていることを特徴としている。The invention according to claim 3 is the invention according to claim 1 or 2.
In the above, the relay member is wound around the end portion of the heating resistor, and the relay member and the end portion are brought into close contact with each other by a sandwiching member having a tendency to close due to its own elasticity.
【００１６】請求項４記載の発明は、請求項３におい
て、上記挟持部材は、断面形状が上記端部と相似形若し
くは端部の相対面に接触できる外周形状を設定されてい
て、外部に上記端部の相対面に接触するいちい該の位置
に上記端部を挿入できる口部が設けられ、自己の弾性に
よって、通常、上記口部を閉じる習性を備え、上記口部
には、上記口部を上記中継部材に装着する時、人手によ
り挟持部材の初期習性に抗して口部を開放する操作把持
部材が着脱可能に設けられていることを特徴としてい
る。According to a fourth aspect of the present invention, in the third aspect, the sandwiching member has a cross-sectional shape that is similar to the end portion or has an outer peripheral shape that can contact a relative surface of the end portion. The mouth portion is provided at the position where it comes into contact with the relative surface of the end portion, and the end portion can be inserted thereinto by its own elasticity, and usually has the habit of closing the mouth portion. When attaching to the relay member, an operation gripping member for opening the mouth portion against the initial habit of the sandwiching member by hand is detachably provided.
【００１７】[0017]
【作用】本発明では、発熱抵抗体の端部に直接電源から
の配線を接続しないことによって、発熱抵抗体に対する
配線からの負荷を軽減させている。つまり、発熱抵抗体
の端部と給電用電源側の端子との間には中継部材が設け
られている。このため、中継部材として、導電性の軽量
部材を用いることで、発熱抵抗体への重量を主とする負
荷を軽減することができる。従って、発熱抵抗体が切損
するような事態を未然に防止することができる。しか
も、中継部材と発熱抵抗体の端部とは、通常、閉じる向
きの習性を有する挟持部材が装着されることで、密着し
た状態を維持されることになる。In the present invention, the load from the wiring to the heating resistor is reduced by not connecting the wiring from the power source directly to the end of the heating resistor. That is, the relay member is provided between the end of the heating resistor and the terminal on the power supply side for power supply. For this reason, by using a conductive lightweight member as the relay member, it is possible to reduce the load mainly on the heat generating resistor. Therefore, it is possible to prevent a situation in which the heating resistor is cut off. In addition, the relay member and the end portion of the heating resistor are normally attached to each other by the holding member having the habit of closing, so that the contact state is maintained.
【００１８】また、本発明では、隣り合う発熱抵抗体の
端部間の間隔を小さくすることで、周方向で発熱抵抗体
が存在しない領域を少なくして温度分布を均一化するこ
とができる。つまり、中継部材を保持する挟持部材は、
操作把持部材によって中継部材に装着される際に口部が
開かれるが、装着された後には、操作把持部材が挟持部
材から取り外される。このため、隣り合う発熱抵抗体同
士に装着された挟持部材は、口部を開く際に用いられる
操作把持部材が干渉しない状態とされるので、配置間隔
を狭めることができる。Further, according to the present invention, by reducing the interval between the end portions of the adjacent heating resistors, it is possible to reduce the region where the heating resistor does not exist in the circumferential direction and to make the temperature distribution uniform. That is, the sandwiching member that holds the relay member is
The mouth is opened when the operation gripping member is mounted on the relay member, but after the mounting, the operation gripping member is removed from the sandwiching member. For this reason, the sandwiching member mounted between the adjacent heating resistors is in a state where the operation gripping member used when opening the mouth does not interfere with each other, so that the arrangement interval can be narrowed.
【００１９】[0019]
【実施例】以下、図１乃至図６に示す実施例によって本
発明の詳細を説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The details of the present invention will be described below with reference to the embodiments shown in FIGS.
【００２０】図１は、半導体ウエハの酸化拡散処理に用
いられる熱処理装置を示している。FIG. 1 shows a heat treatment apparatus used for oxidation diffusion treatment of a semiconductor wafer.
【００２１】この熱処理装置は、石英製のプロセスチュ
ーブ１０が例えばステンレススチールからなるベースプ
レート１２上で縦方向に立設支持されており、このプロ
セスチューブ１０の内側に炉室１４が形成されるように
なっている。また、上記プロセスチューブ１０はケーシ
ング３２内に納められるようになっている。In this heat treatment apparatus, a quartz process tube 10 is vertically erected and supported on a base plate 12 made of, for example, stainless steel, and a furnace chamber 14 is formed inside the process tube 10. Has become. The process tube 10 is housed in the casing 32.
【００２２】このプロセスチューブ１０によって形成さ
れる炉室１４内には、保温筒１８に載置されたボート２
０が挿脱可能となっていて、このボート２０に多数枚の
被処理体である半導体ウエハ２２が水平に、かつ、等間
隔に配列支持され、図示しない処理ガス供給源よりガス
を供給し半導体ウエハ２２に対して気相成長処理を実行
可能となっている。なお、保温筒１８は、フランジキャ
ップ２４上に搭載され、このフランジキャップ２４は図
示せぬエレベータアームに取り付けられて上下移動し、
上記保温筒１８及びボート２０を上下移動させるととも
に、上記プロセスチューブ１０のボート挿入孔２６を密
封しうるようになっている。In the furnace chamber 14 formed by the process tube 10, the boat 2 mounted on the heat retaining cylinder 18 is placed.
0 is insertable and removable, and a large number of semiconductor wafers 22 to be processed are arrayed and supported on the boat 20 horizontally and at equal intervals, and gas is supplied from a processing gas supply source (not shown). The vapor phase growth process can be executed on the wafer 22. The heat insulating cylinder 18 is mounted on a flange cap 24, and the flange cap 24 is attached to an elevator arm (not shown) to move up and down.
The heat retaining cylinder 18 and the boat 20 can be moved up and down, and the boat insertion hole 26 of the process tube 10 can be sealed.
【００２３】上記プロセスチューブ１０の外周には発熱
抵抗体３０が設けられており、この発熱抵抗体３０の外
側には発熱抵抗体３０を支持、包囲する断熱材３４が設
けられている。A heating resistor 30 is provided on the outer periphery of the process tube 10, and a heat insulating material 34 that supports and surrounds the heating resistor 30 is provided outside the heating resistor 30.
【００２４】発熱抵抗体３０は、上記炉室１４内を例え
ばトップ、センター及びボトムの３ゾーンに分けて、そ
れぞれを好適な温度条件下で加熱し得るようにトップ
側、センター側及びボトム側のそれぞれの発熱抵抗体３
０ａ，３０ｂ，３０ｃにて構成されるような３ゾーン方
式を採用されている。なお、ゾーン分割は３ゾーンに限
らず５ゾーンなど適宜必要に応じて決めればよい。ま
た、断熱材３４も上記トップ、センター及びボトムの３
ゾーンに対応してトップ側、センター側及びボトム側の
それぞれの断熱材３４ａ，３４ｂ，３４ｃに分割して構
成されている。The heating resistor 30 divides the inside of the furnace chamber 14 into, for example, three zones of a top, a center and a bottom, and heats each under a suitable temperature condition so that the top side, the center side and the bottom side are heated. Each heating resistor 3
A three-zone system such as 0a, 30b, 30c is adopted. It should be noted that the zone division is not limited to 3 zones, but may be 5 zones as appropriate. In addition, the heat insulating material 34 is also the top, center, and bottom 3
Corresponding to the zone, the top side, the center side and the bottom side are divided into heat insulating materials 34a, 34b, 34c.
【００２５】さらに、これら断熱材３４ａ，３４ｂ，３
４ｃは、円筒状のもので、半円筒状のものを２個組合せ
て形成されるようになっており、これに対応して上記発
熱抵抗体３０ａ，３０ｂ，３０ｃも周方向で二分された
のものを組合せるようになっている。Further, these heat insulating materials 34a, 34b, 3
4c is a cylindrical shape, and is formed by combining two semi-cylindrical shapes. Correspondingly, the heating resistors 30a, 30b, 30c are also bisected in the circumferential direction. Are designed to be combined.
【００２６】発熱抵抗体３０ａ，３０ｂ，３０ｃは、二
ケイ化モリブデン（ＭｏＳｉ2 ）製のものとしている。
具体的には、二ケイ化モリブデン（ＭｏＳｉ2 ）を主成
分としたヒーター（カンタル社製のカンタルスーパー発
熱体）が採用できる。この二ケイ化モリブデン製の発熱
抵抗体３０ａ，３０ｂ，３０ｃは、常温で抵抗値が非常
に小さく、高温になると抵抗値が大きくなる。二ケイ化
モリブデンは、従来用いられているＦｅＣｒＡｌ発熱体
の最大表面負荷が１２００℃において例えば２Ｗ／ｃｍ
2 であるのに対し、２０Ｗ／ｃｍ2 と１０倍の発熱量で
あって、強力なパワー増加が得られ、従来用いられてい
るＦｅＣｒＡｌ発熱体が１０℃／分の温度上昇であるの
に対し、１００℃／分と温度上昇を急俊にすることがで
き、前述した高速熱処理炉での昇温特性を得るために適
用しやすい。The heating resistors 30a, 30b, 30c are made of molybdenum disilicide (MoSi 2 ).
Specifically, a heater having a main component of molybdenum disilicide (MoSi 2 ) (a Kanthal super heating element manufactured by Kanthal) can be used. The heat generating resistors 30a, 30b, 30c made of molybdenum disilicide have a very small resistance value at room temperature and a large resistance value at a high temperature. Molybdenum disilicide has a maximum surface load of, for example, 2 W / cm at a maximum surface load of 1200 ° C. of a conventionally used FeCrAl heating element.
2 , the heat generation amount is 20 W / cm 2, which is 10 times as large as that of the conventional FeCrAl heating element, and the temperature rise is 10 ° C./min. , 100 ° C./min, the temperature rise can be made rapid, and it is easy to apply for obtaining the temperature rising characteristics in the above-mentioned fast heat treatment furnace.
【００２７】また、発熱抵抗体３０ａ，３０ｂ，３０ｃ
は、図２に示すように、各ゾーン毎で、一本の線材を縦
方向に延ばし、上下で交互にＵ字状に折返されて連続す
る形状（以下、この形状をミヤンダ状という）に設定さ
れている。Further, the heating resistors 30a, 30b, 30c
As shown in FIG. 2, one wire is vertically extended in each zone, and the wire is alternately folded back and forth in a U shape to be continuous (hereinafter, this shape is referred to as a meander shape). Has been done.
【００２８】そして、このミヤンダ状に形成した発熱抵
抗体３０ａ，３０ｂ，３０ｃをステープル３６にて上記
各断熱部材３４ａ，３４ｂ，３４ｃの内側面に取付け保
持させるようになっている。このステープル３６は、図
２および図３に示すように、発熱抵抗体３０ａ，３０
ｂ，３０ｃの上部では各々の折返し部の頂部に取り付け
て発熱抵抗体３０ａ，３０ｂ，３０ｃを吊下げ支持する
とともに、発熱抵抗体３０ａ，３０ｂ，３０ｃの下部で
は各々の折曲部を避けて直線部分を支持して位置を固定
されており、このように発熱抵抗体３０ａ，３０ｂ，３
０ｃの下部折返し部を解放状態にしておくことによっ
て、発熱抵抗体３０ａ，３０ｂ，３０ｃの熱膨張、収縮
による上下方向の長さ変化を許容できるようにしてい
る。The heat generating resistors 30a, 30b, 30c formed in the shape of a mound are attached and held by staples 36 on the inner surfaces of the heat insulating members 34a, 34b, 34c. As shown in FIGS. 2 and 3, the staple 36 has heating resistors 30a and 30a.
The heating resistors 30a, 30b, and 30c are suspended and supported by being attached to the tops of the folded portions at the upper portions of b and 30c, and the bent portions are avoided at the lower portions of the heating resistors 30a, 30b, and 30c to form a straight line. The position is fixed by supporting the portion, and thus the heating resistors 30a, 30b, 3
By keeping the lower folded portion of 0c open, it is possible to allow a vertical change in length due to thermal expansion and contraction of the heating resistors 30a, 30b, 30c.
【００２９】さらに、上記発熱抵抗体３０ａ，３０ｂ，
３０ｃは、加熱されると表面に二酸化ケイ素（Ｓｉ
Ｏ2 ）が析出される発熱抵抗体３０の表面保護膜を形成
し、発熱抵抗体３０が大気中の酸素と反応して酸化し、
断線することを防止している。上記発熱抵抗体３０ａ，
３０ｂ，３０ｃと直接接触する上記ステープル３６の少
なくとも表面を例えば１２００℃という高温においても
上記二酸化ケイ素に対して不活性な材料にて形成し、上
記の析出した二酸化ケイ素が浸蝕され発熱抵抗体３０が
ステープル３０の接触部で断線しないようにしている。
二酸化ケイ素に対して不活性な材料としては、例えば、
鉄（Ｆｅ）、銅（Ｃｕ）、ニッケル（Ｎｉ）などがあ
る。なお、ステープル３６全体を二酸化ケイ素に対して
不活性な材料あるいは発熱抵抗体３０ａ，３０ｂ，３０
ｃと同一の材料で形成するようにしてもよい。Further, the heating resistors 30a, 30b,
The surface of 30c is heated to the surface of silicon dioxide (Si).
O 2 ) forms a surface protective film of the heating resistor 30 on which the heating resistor 30 reacts with oxygen in the atmosphere and is oxidized.
Prevents disconnection. The heating resistor 30a,
At least the surface of the staple 36 that is in direct contact with 30b and 30c is formed of a material which is inactive to the silicon dioxide even at a high temperature of 1200 ° C., for example, the deposited silicon dioxide is corroded, and the heating resistor 30 is formed. The contact portion of the staple 30 does not break.
As the material inert to silicon dioxide, for example,
There are iron (Fe), copper (Cu), nickel (Ni), and the like. The entire staple 36 is made of a material inert to silicon dioxide or the heating resistors 30a, 30b, 30.
It may be formed of the same material as c.
【００３０】また、発熱抵抗体３０ａ，３０ｂ，３０ｃ
は、図２に示すように、各ゾーン毎の上下で折返された
位置までの延長部が周方向で交互に長短を設定され、こ
の長短をなす折返し部を各ゾーン間での境界部分におい
て相互に入り込ませることで噛み合う状態に配置されて
いる。従って、発熱抵抗体３０ａ，３０ｂ，３０ｃは、
各ゾーン間での境界部分において隙間なく配設され、そ
の結果トップ、センター、ボトムの各ゾーンの境界部に
おいて均一な加熱がなし得るようになっている。なお、
発熱抵抗体３０は、トップ、センター、ボトムの各ゾー
ン内において上下に複数組合せるようにしてもよく、そ
の場合には各隣接部分において上述のように交互に組合
せるようにすることでゾーン内を均一な温度に維持でき
る。また組合せ状態は上述の例に限らず、均一な温度に
維持できる各種の組合せが可能である。Further, the heating resistors 30a, 30b, 30c
As shown in FIG. 2, the extension parts up to the vertically folded position in each zone are alternately set to have a length in the circumferential direction, and the folded portions having the length are mutually connected at the boundary between the zones. It is arranged so that it can engage with each other by letting it enter. Therefore, the heating resistors 30a, 30b, 30c are
It is arranged without any gap at the boundary between the zones, and as a result, uniform heating can be achieved at the boundary between the top, center, and bottom zones. In addition,
A plurality of heating resistors 30 may be vertically combined in each of the top, center, and bottom zones. In that case, the heating resistors 30 are alternately combined in each adjacent portion as described above, so Can be maintained at a uniform temperature. Further, the combination state is not limited to the above example, and various combinations capable of maintaining a uniform temperature are possible.
【００３１】一方、発熱抵抗体３０ａ，３０ｂ，３０ｃ
の最外側に位置する折返し部から延長された端部３０ｄ
は、図４に示すように、周方向で二分されている断熱材
３４の分割面に形成されたスリット３４ｄから外側に向
け突出させてある。発熱抵抗体３０の端部３０ｄは、隣
り合うもの同士が平行な状態で延長されており、その間
の間隔（Ｌ）が、一例として、４０ｍｍ程度の極めて狭
い配置間隔を設定されていて、分割面での加熱されない
領域が大きくなるのを防止するようになっている。On the other hand, the heating resistors 30a, 30b, 30c
End 30d extended from the folded portion located on the outermost side of the
As shown in FIG. 4, is projected outward from the slit 34d formed in the divided surface of the heat insulating material 34 which is divided in two in the circumferential direction. The end portion 30d of the heating resistor 30 is extended in a state where adjacent ones are parallel to each other, and an interval (L) between them is set to an extremely narrow arrangement interval of, for example, about 40 mm. It is designed to prevent the unheated area of the machine from becoming large.
【００３２】そして、断熱材３４から外側に突出してい
る発熱抵抗体３０の端部３０ｄは、図４において二点鎖
線で示すように、断熱材３４の外壁に取付けられる絶縁
部材４０に挿通されて断熱剤を充填することで互いに絶
縁された状態にて支持されている。絶縁部材４０に挿通
される発熱抵抗体３０の端部３０ｄは分割された双方が
共に平行しているので、絶縁部材４０への挿通が容易に
行なえるようになっている。The end portion 30d of the heating resistor 30 protruding outward from the heat insulating material 34 is inserted into an insulating member 40 attached to the outer wall of the heat insulating material 34, as shown by the chain double-dashed line in FIG. It is supported by being insulated from each other by being filled with a heat insulating agent. Since the divided ends 30d of the heat generating resistor 30 that are inserted into the insulating member 40 are parallel to each other, they can be easily inserted into the insulating member 40.
【００３３】また、絶縁部材４０に挿通された発熱抵抗
体３０の先端は、例えばアルミニュウム等の導電層が形
成され、この導電層には、例えば、アルミニュウム等の
導電性部材を用いた平網線からなる中継部材４２が巻か
れている。平網線状の中継部材４２は、発熱抵抗体３０
への給電用配線をなすものであって、一端が上記発熱抵
抗体３０側の導電層に、そして、他端が、例えば、図１
に示すように、断熱材３４の外周とケーシング３２との
間の空間に立設された中継端子部材４４に取付けられて
いる端子４６にそれぞれ取付けられるようになってい
る。なお、端子４６側に位置する中継部材４２は、例え
ば、図４に示すように、末端部にラグ端子を取付け、こ
のラグ端子をネジ止めすることで取付けられる。Further, a conductive layer made of, for example, aluminum is formed at the tip of the heating resistor 30 inserted in the insulating member 40, and the conductive layer is made of, for example, a flat mesh wire made of a conductive member made of aluminum. A relay member 42 composed of is wound. The flat mesh wire-shaped relay member 42 is used for the heating resistor 30.
1 for supplying power to the conductive layer on the heating resistor 30 side, and the other end for example as shown in FIG.
As shown in FIG. 3, the terminals 46 are respectively attached to the terminals 46 attached to the relay terminal member 44 standing upright in the space between the outer periphery of the heat insulating material 34 and the casing 32. The relay member 42 located on the terminal 46 side is attached, for example, as shown in FIG. 4, by attaching a lug terminal to the end and screwing the lug terminal.
【００３４】従って、発熱抵抗体３０の端部３０ｄと中
継端子部材４４の端子４６とは、軽量部材であるアルミ
ニュウム製の平網線であるので、垂下した場合でもさほ
ど大きな負荷を端部３０ｄに与えることがない。しか
も、端部３０ｄと端子４６との間の距離もさほど広くな
いので、換言すれば、スパンが小さいので、端部３０ｄ
に作用する曲げモーメントも小さくすることができる。Therefore, since the end portion 30d of the heating resistor 30 and the terminal 46 of the relay terminal member 44 are flat wire made of aluminum, which is a lightweight member, even if the end portion 30d is drooped, a large load is applied to the end portion 30d. Never give. Moreover, since the distance between the end portion 30d and the terminal 46 is not so wide, in other words, the span is small, the end portion 30d
The bending moment acting on can also be reduced.
【００３５】一方、中継部材４２は、後述する挟持部材
４８によって発熱抵抗体３０の端部３０ｄに密着した状
態で保持されるようになっている。つまり、挟持部材４
８は、図５および図６に示すように、断面形状が発熱抵
抗体３０の端部３０ｄと相似形状を設定されたクリップ
状の弾性部材であって、その外周の一部に有する口部に
は端部３０ｄを挿入することができるようになってい
る。そして、挟持部材４８は、自己の弾性力によって、
通常、口部を閉じる習性を付与されている。また、挟持
部材４８の口部の両片には、着脱可能な操作把持部材５
０が取付けられており、この操作把持部材５０は、挟持
部材４８の口部と反対側に延長された把持部５０ａを備
えている。操作把持部材５０は、本体の胴部を支点とし
て把持部５０ａ側を揺動させることができるようになっ
ており、図６において、二点鎖線で示すように、把持部
５０ａ同士を近づける向きに揺動させることで挟持部材
４８の習性に抗して口部を開くことができる。このた
め、口部が開かれると、発熱抵抗体３０の端部３０ｄを
入り込ませることができ、所謂、挟持部材４８が端部３
０ｄに装着されることになる。このような操作把持部材
５０は、挟持部材４８の口部に発熱抵抗体３０の端部３
０ｄを挿入した後に挟持部材４８から取り外されるよう
になっている。つまり、操作把持部材５０は、弾性体か
らなる線材が用いられ、把持部５０ａと反対側が挟持部
材４８の長手方向にそって折返されている。この折返す
方向は、図５に示すように挟持部材４８の胴部に形成さ
れている筒部４８ａに挿入できる方向とされている。こ
のため、挟持部材４８の筒部４８ａに折返された端部３
０ｄが挿入された操作把持部材５０は、折返した端部３
０ｄを接近する方向に絞ることで挟持部４８の筒部４８
ａから抜取ることができる。On the other hand, the relay member 42 is held in close contact with the end portion 30d of the heat generating resistor 30 by a sandwiching member 48 described later. That is, the holding member 4
As shown in FIGS. 5 and 6, reference numeral 8 denotes a clip-shaped elastic member whose cross-sectional shape is set to be similar to the end portion 30d of the heating resistor 30, and which has a mouth portion at a part of its outer periphery. The end portion 30d can be inserted. Then, the holding member 48, by its own elastic force,
Usually, the habit of closing the mouth is given. In addition, the operation gripping member 5 which is detachable is attached to both pieces of the mouth portion of the holding member 48.
0 is attached, and the operation gripping member 50 includes a gripping portion 50a extended to the opposite side of the holding member 48 from the mouth portion. The operation gripping member 50 can swing on the gripping portion 50a side with the body of the main body as a fulcrum. As shown by the chain double-dashed line in FIG. By swinging, the mouth portion can be opened against the habit of the holding member 48. Therefore, when the mouth portion is opened, the end portion 30d of the heat generating resistor 30 can be inserted, and the so-called sandwiching member 48 causes the end portion 3 to move.
It will be attached to 0d. Such an operation gripping member 50 has the end portion 3 of the heating resistor 30 at the mouth of the holding member 48.
After inserting 0d, it is removed from the holding member 48. That is, the operation gripping member 50 is made of a wire rod made of an elastic body, and the side opposite to the gripping portion 50 a is folded back along the longitudinal direction of the sandwiching member 48. This folding back direction is a direction in which it can be inserted into the tubular portion 48a formed in the body portion of the holding member 48 as shown in FIG. Therefore, the end portion 3 of the holding member 48 that is folded back to the tubular portion 48a.
The operation gripping member 50 in which 0d is inserted has the folded end portion 3
By squeezing 0d in the approaching direction, the cylindrical portion 48 of the holding portion 48
It can be removed from a.
【００３６】本実施例は以上のような構成であるから、
発熱抵抗体３０の端部３０ｄは、プロセスチューブにお
けるアウタシェルの分割面に形成されたスリット３４ｄ
から外側に向け突出した状態で組付けられる。そして、
発熱抵抗体３０の端部３０ｄにおける導電層および中継
ブロック４４に有する端子４６とは、導電層および端子
４６に巻付けられた中継部材４２によって電気的に接続
される。中継部材４２は、発熱抵抗体３０の端部３０ｄ
は、挟持部材４８によって密着した状態を維持される。
すなわち、操作把持部材５０の把持部５０ａが人手によ
って絞られ、把持部５０ａ同士が近づく向きに揺動させ
られると口部が開かれるので、この状態を維持したまま
で上記端部３０ｄに対して挟持部材４８が差込まれる。
端部３０ｄに差込まれた操作把持部材５０の口部は、把
持部５０ａに対する人手からの揺動力が除かれると自己
の習性により閉じ、中継部材４２を端部３０ｄの導電層
に加圧することで中継部材４２を導電層に密着させる。
そして、操作把持部材５０は、挟持部材４８を端部３０
ｄに差込んだ後に折返し部が挟持部材４８の筒部４８ａ
から抜取られることで挟持部材４８から取り外される。Since this embodiment has the above-mentioned structure,
The end portion 30d of the heating resistor 30 has a slit 34d formed on the divided surface of the outer shell of the process tube.
It is assembled in a state of protruding outward from. And
The conductive layer at the end portion 30d of the heating resistor 30 and the terminal 46 included in the relay block 44 are electrically connected by the relay member 42 wound around the conductive layer and the terminal 46. The relay member 42 is the end portion 30d of the heating resistor 30.
Are held in close contact with each other by the holding member 48.
That is, when the grip 50a of the operation grip member 50 is manually squeezed and the grips 50a are swung in a direction in which the grips 50a approach each other, the mouth is opened. The holding member 48 is inserted.
The mouth portion of the operation gripping member 50 inserted into the end portion 30d is closed by its own habit when the swinging force from the human hand with respect to the gripping portion 50a is removed, and the relay member 42 is pressed against the conductive layer of the end portion 30d. Then, the relay member 42 is brought into close contact with the conductive layer.
Then, the operation gripping member 50 attaches the holding member 48 to the end portion 30.
After being inserted into d, the folded-back portion has a tubular portion 48a of the holding member 48.
It is removed from the holding member 48 by being pulled out from.
【００３７】従って、周方向で隣り合う発熱抵抗体３０
の端部３０ｄには、挟持部材４８のみが残されることに
なるので、操作把持部材５０の把持部５０ａ同士が干渉
するようなことがない。Therefore, the heating resistors 30 adjacent to each other in the circumferential direction are provided.
Since only the sandwiching member 48 is left at the end portion 30d, the holding portions 50a of the operation holding member 50 do not interfere with each other.
【００３８】本実施例によれば、発熱抵抗体３０の端部
３０ｄの外周には、隣り合う発熱抵抗体３０に装着され
た挟持部材４８の胴部から外側に向け延び出す部品がな
いので、分割面に形成されたスリット内から外側に突出
する発熱抵抗体３０の端部３０ｄ間の間隔を狭くするこ
とができる。この発熱抵抗体３０の端部３０ｄ間の間隔
に関していうと、従来構造では、８０〜１００ｍｍ程度
必要であったが、本実施例の場合、上記したように４０
ｍｍ程度に狭めることができる。According to the present embodiment, there is no part extending outward from the body of the sandwiching member 48 mounted on the adjacent heat generating resistors 30 on the outer periphery of the end 30d of the heat generating resistors 30, It is possible to narrow the interval between the end portions 30d of the heating resistor 30 protruding outward from the slit formed in the divided surface. Regarding the distance between the end portions 30d of the heat generating resistor 30, the conventional structure required about 80 to 100 mm, but in the case of the present embodiment, as described above, it is 40.
It can be narrowed to about mm.
【００３９】また、本実施例によれば、断熱材３４の分
割面に形成されているスリット３４ｄから外側に向け突
出する発熱抵抗体３０の端部３０ｄが平行に延び出して
いることにより、絶縁部材４０への挿通が容易に行なえ
る。Further, according to the present embodiment, since the end portion 30d of the heating resistor 30 protruding outward from the slit 34d formed in the divided surface of the heat insulating material 34 extends in parallel, insulation is achieved. It can be easily inserted into the member 40.
【００４０】なお、本発明は、上記実施例に限られるも
のではなく、本発明の要旨の範囲内で種々変形すること
が可能である。The present invention is not limited to the above embodiment, but can be variously modified within the scope of the gist of the present invention.
【００４１】例えば、本発明が対象とする被処理体は、
少なくとも面状形状の被処理体であればよく、半導体ウ
エハ以外にも、例えば、ＬＣＤ基板等であっても良い。
さらに本発明が適用される熱処理装置としては、酸化、
拡散装置以外にも、例えば、ＣＶＤ、アニールに適用さ
れる装置を対象とすることも可能である。For example, the object to be processed according to the present invention is
At least a planar object to be processed may be used, and other than the semiconductor wafer, for example, an LCD substrate or the like may be used.
Further, as a heat treatment apparatus to which the present invention is applied, oxidation,
Other than the diffusion device, for example, a device applied to CVD or annealing can be targeted.
【００４２】[0042]
【発明の効果】以上説明したように、本発明によれば、
発熱抵抗体に対して軽量な部材で構成された中継部材を
設けることで給電を行なうようにしたので、過大な曲げ
モーメントが発熱抵抗体に生じるような負荷を与えるこ
とがない。このため、発熱抵抗体が過大な負荷によって
折れるような事態を未然に防止することができる。As described above, according to the present invention,
Since power is supplied by providing the heat generating resistor with a relay member formed of a lightweight member, a load that would cause an excessive bending moment to the heat generating resistor is not applied. Therefore, it is possible to prevent the heating resistor from being broken by an excessive load.
【００４３】また、本発明によれば、プロセスチューブ
の分割面の両側に配置される発熱抵抗体同士の間隔を狭
くすることができるので、炉内の周方向での温度分布を
均一化することができる。Further, according to the present invention, since the interval between the heating resistors arranged on both sides of the divided surface of the process tube can be narrowed, the temperature distribution in the circumferential direction in the furnace can be made uniform. You can
【図１】本発明実施例による熱処理装置の一例を示す模
式的な断面図である。FIG. 1 is a schematic sectional view showing an example of a heat treatment apparatus according to an embodiment of the present invention.
【図２】図１に示した熱処理装置に用いられる発熱抵抗
体の構造を示す斜視図である。FIG. 2 is a perspective view showing a structure of a heating resistor used in the heat treatment apparatus shown in FIG.
【図３】図２に示した発熱抵抗体の固定構造を示す一部
断面図である。FIG. 3 is a partial cross-sectional view showing a fixing structure for the heating resistor shown in FIG.
【図４】本発明実施例による熱処理装置の要部構造を示
す断面図である。FIG. 4 is a sectional view showing a main structure of a heat treatment apparatus according to an embodiment of the present invention.
【図５】図４に示した要部の一部を取り出して示した斜
視図である。FIG. 5 is a perspective view showing a part of the main part shown in FIG.
【図６】図５中、符号Ｈで示す方向の矢視図である。FIG. 6 is a view in the direction of the arrow H in FIG.
１０ プロセスチューブ ３０ 発熱抵抗体 ３４ 断熱材 ４０ 絶縁部材 ４２ 中継部材 ４４ 中継ブロック ４６ 中継ブロック側の端子 ４８ 挟持部材 ５０ 操作把持部材 10 process tube 30 heat-generating resistor 34 heat insulating material 40 insulating member 42 relay member 44 relay block 46 relay block side terminal 48 clamping member 50 operation gripping member
Claims (4)
ロセスチューブと、 上記縦型プロセスチューブの周囲に配置された周方向で
二分されている断熱材と、 上記各断熱材の内壁面にて周方向に間隔をおいて配列さ
れ、端部が上記断熱材から外側に向け延長して取り出さ
れている発熱抵抗体と、 上記縦型プロセスチューブに近接して設けられていて、
上記発熱抵抗体の端部に対向する電極端子を備えた縦型
の中継端子部材と、 を備え、上記中継端子部材の電極端子と上記発熱抵抗体
の端部とが、軽量部材からなる平網状中継部材によって
接続されていることを特徴とする熱処理装置。1. A vertical process tube that batch-processes a plurality of non-processed bodies, a heat insulating material that is circumferentially divided into two halves arranged around the vertical process tube, and an inner wall surface of each heat insulating material. And a heating resistor which is arranged at intervals in the circumferential direction and whose end portion extends outward from the heat insulating material and is taken out, and is provided in proximity to the vertical process tube,
A vertical relay terminal member having an electrode terminal facing the end of the heating resistor; and an electrode terminal of the relay terminal member and an end of the heating resistor made of a lightweight member A heat treatment apparatus characterized by being connected by a relay member.
いに接近した状態で支持されていることを特徴とする熱
処理装置。2. The heat treatment apparatus according to claim 1, wherein the end portions of the heating resistor are supported in a state of being close to each other in the vicinity of the division surface of the heat insulating material.
自己の弾性によって閉じる習性を有する挟持部材によっ
て上記中継部材と上記端部とが密着させられていること
を特徴とする熱処理装置。3. The relay member is wound around an end portion of the heating resistor according to claim 1,
A heat treatment apparatus characterized in that the intermediary member and the end portion are brought into close contact with each other by a sandwiching member which has a tendency to close due to its own elasticity.
端部の相対面に接触できる外周形状を設定されていて、
外部に上記端部の相対面に接触する位置以外の位置に上
記端部を挿入できる口部が設けられ、自己の弾性によっ
て、通常、上記口部を閉じる習性を備え、上記口部に
は、上記口部を上記中継部材に装着する時、人手により
挟持部材の初期習性に抗して開放する操作把持部材が着
脱可能に設けられていることを特徴とする熱処理装置。4. The holding member according to claim 3, wherein the holding member has a cross-sectional shape that is similar to the end portion or has an outer peripheral shape that can contact a relative surface of the end portion.
A mouth portion capable of inserting the end portion at a position other than the position in contact with the relative surface of the end portion is provided on the outside, and by its own elasticity, usually has a habit of closing the mouth portion, and the mouth portion, A heat treatment apparatus, wherein an operation gripping member which is opened by hand against the initial habit of the sandwiching member when the mouth portion is mounted on the relay member is detachably provided.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5191927A JP2988810B2 (en) | 1993-07-06 | 1993-07-06 | Heat treatment equipment |
| US08/266,767 US5507639A (en) | 1993-06-30 | 1994-06-28 | Heat treatment apparatus and method thereof |
| KR1019940015458A KR100299113B1 (en) | 1993-06-30 | 1994-06-30 | Heat treatment apparatus and heat treatment method |
| TW083107383A TW275138B (en) | 1993-06-30 | 1994-08-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5191927A JP2988810B2 (en) | 1993-07-06 | 1993-07-06 | Heat treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0718445A true JPH0718445A (en) | 1995-01-20 |
| JP2988810B2 JP2988810B2 (en) | 1999-12-13 |
Family
ID=16282761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5191927A Expired - Lifetime JP2988810B2 (en) | 1993-06-30 | 1993-07-06 | Heat treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2988810B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004308959A (en) * | 2003-04-03 | 2004-11-04 | Nikko Materials Co Ltd | Furnace with heating element in inner wall surface |
| JP2005302593A (en) * | 2004-04-14 | 2005-10-27 | Nikko Materials Co Ltd | Ceramic platy heating element |
| JP2012033926A (en) * | 2011-07-19 | 2012-02-16 | Hitachi Kokusai Electric Inc | Insulation structure, heating apparatus and substrate processing apparatus |
| JP2014232577A (en) * | 2013-05-28 | 2014-12-11 | 光洋サーモシステム株式会社 | Thermal treatment device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008128580A (en) * | 2006-11-22 | 2008-06-05 | Alpha Oikos:Kk | Heating furnace |
-
1993
- 1993-07-06 JP JP5191927A patent/JP2988810B2/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004308959A (en) * | 2003-04-03 | 2004-11-04 | Nikko Materials Co Ltd | Furnace with heating element in inner wall surface |
| JP2005302593A (en) * | 2004-04-14 | 2005-10-27 | Nikko Materials Co Ltd | Ceramic platy heating element |
| JP2012033926A (en) * | 2011-07-19 | 2012-02-16 | Hitachi Kokusai Electric Inc | Insulation structure, heating apparatus and substrate processing apparatus |
| JP2014232577A (en) * | 2013-05-28 | 2014-12-11 | 光洋サーモシステム株式会社 | Thermal treatment device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2988810B2 (en) | 1999-12-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI315080B (en) | Baseplate processing equipment, heating device used on the baseplate processing equipment and method for manufacturing semiconductors with those apparatus, and heating element supporting structure | |
| US4950870A (en) | Heat-treating apparatus | |
| TW200803593A (en) | Planar heater | |
| JPH07209093A (en) | Thermometer | |
| US20030001475A1 (en) | Lamp design | |
| JP2001217059A (en) | Heating device | |
| KR19980071421A (en) | Heat treatment equipment | |
| JPH0718445A (en) | Heat treating device | |
| JP3307924B2 (en) | Heat treatment equipment | |
| JP3103896B2 (en) | Halogen lamp and heat treatment furnace | |
| JP2953744B2 (en) | Heat treatment equipment | |
| JP3014901B2 (en) | Heat treatment equipment | |
| JP2756566B2 (en) | Vertical heat treatment equipment | |
| JP2503077B2 (en) | Electric heater and heating method using the same | |
| JPH04155822A (en) | Heat treatment device | |
| JP3020773B2 (en) | Heat treatment equipment | |
| JPS63278227A (en) | Heat treatment equipment | |
| JP3020774B2 (en) | Heat treatment equipment | |
| JP3370416B2 (en) | thermometer | |
| JPS6287500A (en) | Diffusion furnace | |
| JPH0554690B2 (en) | ||
| JP3768093B2 (en) | MoSi2 module heater with excellent heat uniformity | |
| JPS61141123A (en) | Equipment for manufacturing semiconductor | |
| JPS6031259Y2 (en) | Electric furnace for semiconductor heat treatment | |
| JP4907222B2 (en) | Semiconductor wafer heating device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 19990914 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081008 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111008 Year of fee payment: 12 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111008 Year of fee payment: 12 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131008 Year of fee payment: 14 |
|
| EXPY | Cancellation because of completion of term |