JPH0579372B2 - - Google Patents
Info
- Publication number
- JPH0579372B2 JPH0579372B2 JP59239644A JP23964484A JPH0579372B2 JP H0579372 B2 JPH0579372 B2 JP H0579372B2 JP 59239644 A JP59239644 A JP 59239644A JP 23964484 A JP23964484 A JP 23964484A JP H0579372 B2 JPH0579372 B2 JP H0579372B2
- Authority
- JP
- Japan
- Prior art keywords
- container
- liquid
- mixing container
- mixing
- pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000002156 mixing Methods 0.000 claims description 61
- 239000007788 liquid Substances 0.000 claims description 38
- 238000003860 storage Methods 0.000 claims description 38
- 239000000126 substance Substances 0.000 claims description 37
- 239000011550 stock solution Substances 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 11
- 238000013329 compounding Methods 0.000 claims description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 44
- 229910021529 ammonia Inorganic materials 0.000 description 22
- 238000004140 cleaning Methods 0.000 description 15
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 239000000428 dust Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000012530 fluid Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/49—Mixing systems, i.e. flow charts or diagrams
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Accessories For Mixers (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、ウエハー処理プロセスに用いられる
半導体用化学薬品を調合する調合装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a compounding apparatus for compounding semiconductor chemicals used in wafer processing processes.
［従来技術］
一般に、半導体デバイスの製造に際しては、デ
バイスのベースとなるシリコン等のウエハーの表
面の洗浄、エツチングやホトリソグラフイ等を行
なう必要があり、それらの処理には夫々目的に応
じた化学薬品が使用される。[Prior Art] In general, when manufacturing semiconductor devices, it is necessary to perform cleaning, etching, photolithography, etc. on the surface of a wafer such as silicon that is the base of the device, and these processes require chemical treatment depending on the purpose. Chemicals are used.
ところで、このような化学薬品は、通常作業者
によつて調合するようにしているが、その場合は
処理の直前に調合することが難しいため、化学薬
品の貯蔵中に反応等によつて成分変化が生じると
いう問題がある。 By the way, such chemicals are usually mixed by workers, but in that case, it is difficult to mix them immediately before processing, so chemical components may change due to reactions etc. during storage. There is a problem that occurs.
又、化学薬品の調合に用いられる原液は、主と
してフツ化水素酸、硫酸、塩酸等の強酸や過酸化
水素水、アンモニア等の劇薬であるため、取扱い
が危険である上、調合を作業者によつて行なうよ
うにすると、最大の汚洗源である作業者から化学
薬品にダストが混入する確率が極めて高くなる。
良く知られているように、このようなダストの混
入は、半導体デバイスの精密化、高集積化にとつ
て大きなネツクとなるものである。 In addition, the stock solutions used for compounding chemicals are mainly strong acids such as hydrofluoric acid, sulfuric acid, and hydrochloric acid, and powerful chemicals such as hydrogen peroxide and ammonia, which are dangerous to handle and do not allow workers to prepare them. If this is done side by side, there is an extremely high probability that dust will be mixed into the chemicals from the workers, which is the biggest source of cleaning.
As is well known, such dust contamination is a major hindrance to the refinement and high integration of semiconductor devices.
又、作業者によつて調合を行なう場合は、ダス
トの混入を防止する必要があるため、化学薬品を
充分に攪拌して均一な組成を得ることが難しい。 Furthermore, when mixing is performed by an operator, it is difficult to sufficiently stir the chemicals to obtain a uniform composition because it is necessary to prevent dust from entering.
［発明の目的］
本発明は、上述の問題に鑑みてなされたもので
あつて、半導体材料の処理の直前に自動的に化学
薬品を調合しうるようにすることを目的としてい
る。本発明の別の目的は、ダスト等の異物の混入
が少なく、組成の均一な化学薬品を提供すること
である。[Object of the Invention] The present invention has been made in view of the above-mentioned problems, and it is an object of the present invention to enable automatic preparation of chemicals immediately before processing of semiconductor materials. Another object of the present invention is to provide a chemical agent with a uniform composition and less contamination with foreign substances such as dust.
［発明の構成］
このため、本発明に係る半導体材料の調合装置
は、半導体用化学薬品を調合するための複数の原
液を夫々貯留する複数の貯留容器と、各貯留容器
の原液を混合する密閉式の混合容器と、複数の貯
留容器の原液を混合容器に個別に供給する複数の
供給手段と、混合容器に供給される各原液の供給
量を計量する計量手段と、混合容器内の液を吸引
する吸引手段と液中の異物を除去するフイルタ手
段とを含み、上記吸引手段及びフイルタ手段を介
して混合容器内の液を循環させる循環路とを備え
て構成されたものである。[Structure of the Invention] Therefore, the semiconductor material blending device according to the present invention includes a plurality of storage containers each storing a plurality of stock solutions for blending semiconductor chemicals, and a sealed container for mixing the stock solutions in each storage container. a mixing container of the type, a plurality of supply means for individually supplying the stock solutions in the plurality of storage containers to the mixing container, a measuring means for measuring the supply amount of each stock solution to be supplied to the mixing container, and a The mixing container includes a suction means for sucking and a filter means for removing foreign matter from the liquid, and a circulation path for circulating the liquid in the mixing container via the suction means and the filter means.
［発明の効果］
本発明によると、半導体用化学薬品の調合が自
動化されるので、処理の直前に迅速に化学薬品を
調合して化学薬品の成分変化を防止することがで
きると共に、作業者の危険を回避することができ
る。[Effects of the Invention] According to the present invention, the preparation of chemicals for semiconductors is automated, so it is possible to quickly prepare the chemicals just before processing to prevent changes in the composition of the chemicals, and it also saves the operator's time. Danger can be avoided.
又、調合を自動化すると共に、調合に密閉式の
混合容器を使用したので、化学薬品へのダスト等
の異物の混入が防止されると共に、原液に混入し
ている異物も、上記循環路内で循環されるうちに
フイルタ手段によつて除去されるので、不純物の
少ない化学薬品を提供することができる。 In addition, we have automated the blending process and used a closed mixing container for blending, which prevents foreign matter such as dust from entering the chemicals, and also prevents foreign matter from entering the stock solution in the circulation path. As it is being circulated it is removed by filter means, thus providing a chemical with less impurities.
更に又、調合された化学薬品を循環路内で循環
させることにより、化学薬品を攪拌し、化学薬品
の組成を充分に均一化させることができる。 Furthermore, by circulating the prepared chemicals in the circulation path, the chemicals can be stirred and the composition of the chemicals can be made sufficiently uniform.
［実施例］ 以下、添付図面に基づいて実施例を説明する。[Example] Hereinafter, embodiments will be described based on the accompanying drawings.
第３図には半導体材料の洗浄用の化学薬品の調
合装置が示されており、該調合装置６は、アンモ
ニアNH4OHを貯留する第１貯留ボツクス１と、
過酸化水素水H2O2を貯留する第２貯留ボツクス
２と、硫酸H2SO4を貯留する第３貯留ボツクス
３と、アンモニアと過酸化水素水と純水とから第
１の洗浄用化学薬品を調合する第１調合ボツクス
４と、硫酸と過酸化水素水とから第２の洗浄用化
学薬品を調合する第２調合ボツクス５とを連設し
て構成されている。 FIG. 3 shows a compounding device for chemicals for cleaning semiconductor materials, and the compounding device 6 includes a first storage box 1 for storing ammonia NH 4 OH;
A second storage box 2 for storing hydrogen peroxide solution H 2 O 2 , a third storage box 3 for storing sulfuric acid H 2 SO 4 , and a first cleaning chemical from ammonia, hydrogen peroxide solution and pure water. It consists of a first mixing box 4 for mixing chemicals and a second mixing box 5 for mixing a second cleaning chemical from sulfuric acid and hydrogen peroxide solution.
第４図に示す如く、第１貯留ボツクス１内に
は、アンモニアを貯留する固定式の第１貯留容器
７と、該第１貯留容器７にアンモニアを補充する
移動可能な第１補充容器８等が収納されており、
該第１補充容器８は第１貯留ボツクス１外へ搬出
されうるようになつている。第２、第３貯留ボツ
クス２，３も同様に構成されている。 As shown in FIG. 4, the first storage box 1 includes a fixed first storage container 7 for storing ammonia, a movable first replenishment container 8 for replenishing the first storage container 7 with ammonia, etc. is stored,
The first replenishment container 8 can be carried out of the first storage box 1. The second and third storage boxes 2 and 3 are similarly constructed.
又、第５図に示す如く、第１調合ボツクス４内
には、第１の洗浄用化学薬品が調製される第１の
混合容器１０と、該第１混合容器１０が載置され
る台秤１１（自動平衡形電子天秤又はロードセル
形天秤等）と、第１の洗浄用化学薬品を過する
流体フイルタ１２等が収納されている。第２調合
ボツクス５も同様に構成されている。 As shown in FIG. 5, the first mixing box 4 includes a first mixing container 10 in which a first cleaning chemical is prepared, and a platform scale 11 on which the first mixing container 10 is placed. (such as a self-balancing electronic balance or a load cell type balance) and a fluid filter 12 for passing the first cleaning chemical. The second mixing box 5 is similarly constructed.
以下、本調合装置の構成をより具体的に説明す
る。 The configuration of this blending device will be explained in more detail below.
第１図に示すように、上記第１補充容器８と第
１貯留容器７は共に密閉式であり、第１貯留容器
７内のアンモニアの液面レベルが、常に予め設定
された上限レベルL1と下限レベルL2との間に位
置するように、第１補充容器８から開閉弁１３が
介設された送液配管１４を通して送液ポンプ１５
により第１貯留容器７にアンモニアが供給される
ようになつている。第１貯留容器７には、上述の
上限レベルL1と下限レベルL2とを検出するレベ
ル検出器１６，１７が設けられると共に、送液配
管１４にはアンモニアの流通状況を検出する液体
検出器１８が臨設されている。第１補充容器８か
ら第１貯留容器７にアンモニアが供給される際に
は、第１補充容器８内が負圧となるため、図示し
ない通気フイルタが設けられた給気管１９から第
１補充容器８内に清浄な空気が給気される一方、
給気用開閉弁２０を閉じて排気用開閉弁２１を開
くことにより、第１貯留容器７内のガスが前記第
１〜第３貯留ボツクス１〜３に夫々収容されてい
る第１〜第３の貯留容器７，２２，２３に共通の
排気管２４を通して排出されるようになつてい
る。このように、第１貯留容器７及び第１補充容
器８を密閉式とすることにより、アンモニア内へ
のダストの混入を最小限に抑えることができる。
又、上記排気管２４にはガスフイルタ２５が介設
され、このガスフイルタ２５によつて排ガス中の
液、蒸気が除去されるようになつている。 As shown in FIG. 1, the first replenishment container 8 and the first storage container 7 are both airtight, and the ammonia liquid level in the first storage container 7 is always at a preset upper limit level L1 . A liquid feeding pump 15 is supplied from the first replenishment container 8 through a liquid feeding pipe 14 in which an on-off valve 13 is interposed so as to be located between the lower limit level L2 and the lower limit level L2 .
Ammonia is supplied to the first storage container 7 by this. The first storage container 7 is provided with level detectors 16 and 17 that detect the above-mentioned upper limit level L1 and lower limit level L2 , and the liquid feed pipe 14 is provided with a liquid detector that detects the flow status of ammonia. 18 have been temporarily installed. When ammonia is supplied from the first replenishment container 8 to the first storage container 7, the inside of the first replenishment container 8 becomes negative pressure. While clean air is supplied into the
By closing the air supply on-off valve 20 and opening the exhaust on-off valve 21, the gas in the first storage container 7 is transferred to the first to third storage boxes 1 to 3, respectively. The storage containers 7, 22, 23 are discharged through a common exhaust pipe 24. In this way, by making the first storage container 7 and the first replenishment container 8 airtight, it is possible to minimize the mixing of dust into ammonia.
Further, a gas filter 25 is interposed in the exhaust pipe 24, and the gas filter 25 removes liquid and vapor from the exhaust gas.
上記第１貯留容器７の出口管２６は、管継手２
７を介して開閉弁２８を有する送液配管３０に接
続され、送液配管３０は、第２図に示す如く、固
定フレームＦ，Ｆ間に横架されたバーＢによつて
支持される管継手３１を介し螺旋管３２に接続さ
れて、送液配管３０及び螺旋管３２の重量が台秤
１１に作用しないように構成されている。上記螺
旋管３２はテフロン等の伸縮可能な樹脂からな
り、この螺旋管３２はパツキン２９を介して本体
に装着された密閉式の第１混合容器１０の蓋体３
３に固定される管継手３４を介して入口管３５に
接続され、第１貯留容器７からのアンモニアの供
給等に伴う台秤１１上での第１混合容器１０の上
下変位が上記螺旋管３２の伸縮によつて吸収され
るようになつている。 The outlet pipe 26 of the first storage container 7 is connected to the pipe joint 2
7 to a liquid feeding pipe 30 having an on-off valve 28, and the liquid feeding pipe 30 is a pipe supported by a bar B horizontally suspended between fixed frames F, F, as shown in FIG. It is connected to a spiral pipe 32 via a joint 31 so that the weight of the liquid feeding pipe 30 and the spiral pipe 32 does not act on the platform scale 11 . The spiral tube 32 is made of a stretchable resin such as Teflon, and the spiral tube 32 is connected to the lid 3 of the closed type first mixing container 10 attached to the main body via the packing 29.
The vertical displacement of the first mixing container 10 on the platform scale 11 due to the supply of ammonia from the first storage container 7 is connected to the inlet pipe 35 through a pipe joint 34 fixed to the spiral pipe 32. It is designed to be absorbed by expansion and contraction.
そして給気用開閉弁２０（第１図）を開くと共
に排気用開閉弁２１を閉じ、圧送用ガス供給口３
６と圧力計３７，３８とリリーフ弁４０，４１と
開閉弁４２，４３とガスフイルタ４４等を備えた
高圧ガス（窒素ガス等）による圧送系Ｐのガス配
管４５から第１貯留容器７に高圧ガスを送給する
ことにより、第１貯留容器７内のアンモニアを第
１混合容器１０に供給することができる。第１混
合容器１０へのアンモニアの供給量は、供給前と
供給後の第１混合容器１０の重量変化量として台
秤１１によつて計量され、アンモニアの供給量が
目標値に達した時点で開閉弁２８を閉じることに
より、供給が停止される。このように、供給量を
重量によつて計量するようにすれば、供給量を無
段階的に調節することができ、しかもアンモニア
の液温（粘度）等に影響されず、常に正確な計量
が行なえる。 Then, the air supply on-off valve 20 (Fig. 1) is opened, the exhaust on-off valve 21 is closed, and the pressurized gas supply port 3 is opened.
6, pressure gauges 37, 38, relief valves 40, 41, on/off valves 42, 43, gas filter 44, etc. High pressure gas is transferred from the gas piping 45 of the pressure feeding system P (nitrogen gas, etc.) to the first storage container 7. By feeding the ammonia in the first storage container 7, the ammonia can be supplied to the first mixing container 10. The amount of ammonia supplied to the first mixing container 10 is measured by the platform scale 11 as the amount of change in the weight of the first mixing container 10 before and after the supply, and the ammonia is opened and closed when the amount of ammonia supplied reaches the target value. By closing valve 28, the supply is stopped. By measuring the supply amount by weight in this way, the supply amount can be adjusted steplessly, and it is not affected by the ammonia liquid temperature (viscosity), etc., and accurate measurement is always possible. I can do it.
なお、入口管３５の下端３５ａは、該下端３５
ａが第１混合容器１０内の液に常時浸漬されるよ
うに、台秤１１の出力信号、つまり第１混合容器
１０の重量によつて検出される第１混合容器１０
内の液の下限レベルL3より下方に位置している。
それにより、開閉弁２８を閉じると即座にアンモ
ニアの供給が停止されると共に、入口管３５の下
端３５ａから第１混合容器１０内へのアンモニア
の噴出によつて台秤１１に作用する動圧（正荷
重）と、アンモニアの噴出に伴つて台秤１１に作
用する入口管３５の反力（負荷重）とが常時相殺
されてアンモニアの供給量が一層正確に計量でき
る。 Note that the lower end 35a of the inlet pipe 35 is
The first mixing container 10 is detected by the output signal of the platform scale 11, that is, the weight of the first mixing container 10, so that a is always immersed in the liquid in the first mixing container 10.
It is located below the lower limit level L3 of the liquid within.
As a result, when the on-off valve 28 is closed, the supply of ammonia is immediately stopped, and the dynamic pressure (positive The amount of ammonia supplied can be measured more accurately because the reaction force (load weight) of the inlet pipe 35 acting on the platform scale 11 as the ammonia is spouted out is always offset.
上記第２貯留容器２２には、第２補充容器４６
から開閉弁４７を有する送液配管４８を通して送
液ポンプ５０により過酸化水素水が補充されるよ
うになつている。そして圧送系Ｐから第２貯留容
器２２に高圧ガスを送給することにより、第２貯
留容器２２から送液配管５１の、開閉弁５２を有
する側の分岐管５１ａ、螺旋管５３及び入口管５
４を通して過酸化水素水が供給される。又、上記
第１混合容器１０には、純水供給口５５から流量
制御弁５６を有する純水配管５７の、開閉弁５８
が介設された分岐管５７ａ、螺旋管６０及び入口
管６１を通して純水が供給される。このように、
第１混合容器１０にアンモニアと過酸化水素水と
純水とが順次供給され、夫々の供給量が台秤１１
によつて計量されて所定の混合比で混合される。 The second storage container 22 includes a second replenishment container 46
Hydrogen peroxide solution is replenished by a liquid feeding pump 50 through a liquid feeding pipe 48 having an on-off valve 47. Then, by feeding high pressure gas from the pressure feeding system P to the second storage container 22, the branch pipe 51a, the spiral pipe 53, and the inlet pipe 5 of the liquid feeding pipe 51 on the side having the on-off valve 52 from the second storage container 22
Hydrogen peroxide solution is supplied through 4. Further, in the first mixing container 10, an on-off valve 58 is connected to a pure water pipe 57 having a flow rate control valve 56 from the pure water supply port 55.
Pure water is supplied through the branch pipe 57a, the spiral pipe 60, and the inlet pipe 61, in which the deionized water is interposed. in this way,
Ammonia, hydrogen peroxide solution, and pure water are sequentially supplied to the first mixing container 10, and each supply amount is adjusted to the platform scale 11.
and mixed at a predetermined mixing ratio.
第１混合容器１０の出口管６２は、螺旋管６
３、調合装置６内の第１吐出配管６４、管継手６
５及び調合装置６外の第２吐出配管６６を介して
内槽６７と外槽６８からなる２重構造の処理槽７
０に連通されている。上記螺旋管６３と、第１吐
出配管６４と、該第１吐出配管６４に接続される
復流配管７１と、該復流配管７１に接続される螺
旋管７２とは、第１混合容器１０内の液を吸引す
る循環・吐出ポンプ７３と、前記流体フイルタ１
２と、熱交換器７４とを含む循環路７５を形成し
ている。そしてアンモニアと過酸化水素水と純水
との混合後に、入口弁７６及び循環用開閉弁７７
を開くと共に吐出用開閉弁７８を閉じ、循環・吐
出ポンプ７３で第１混合容器１０内の混合液を吸
引して循環路７５中を循環させることにより、上
記混合液を攪拌して均一な組成の第１の洗浄用化
学薬品を調製することができる。又、循環中に流
体フイルタ１２により混合液中の異物を除去する
と共に、熱交換器７４によつて混合液の液温を調
整することができる。 The outlet pipe 62 of the first mixing container 10 is a spiral pipe 6
3. First discharge piping 64 in blending device 6, pipe fitting 6
5 and a second discharge pipe 66 outside the blending device 6 to a processing tank 7 with a double structure consisting of an inner tank 67 and an outer tank 68.
It is connected to 0. The spiral pipe 63, the first discharge pipe 64, the return flow pipe 71 connected to the first discharge pipe 64, and the spiral pipe 72 connected to the return flow pipe 71 are arranged inside the first mixing container 10. a circulation/discharge pump 73 that sucks the liquid; and the fluid filter 1.
2 and a heat exchanger 74. After mixing ammonia, hydrogen peroxide, and pure water, the inlet valve 76 and the circulation on/off valve 77
At the same time, the discharge on-off valve 78 is closed, and the mixed liquid in the first mixing container 10 is sucked by the circulation/discharge pump 73 and circulated through the circulation path 75, thereby stirring the mixed liquid and making the composition uniform. A first cleaning chemical can be prepared. Also, during circulation, the fluid filter 12 can remove foreign substances from the mixed liquid, and the heat exchanger 74 can adjust the temperature of the mixed liquid.
循環路７５内での循環によつて均一な組成の第
１の洗浄用化学薬品が調製された後に、循環用開
閉弁７７を閉じて吐出用開閉弁７８を開くことに
より、第１混合容器１０内の第１の洗浄用化学薬
品を第１及び第２吐出配管６４，６６を通して処
理槽７０に供給し、内槽６７内でシリコン等のウ
エハーを洗浄することができる。このように、本
実施例では、単一のポンプ７３により、混合液の
循環と吐出が行なえる。なお、第１混合容器１０
から処理槽７０への第１の洗浄用化学薬品の供給
量は、台秤１１によつて計量される。 After the first cleaning chemical having a uniform composition is prepared by circulating in the circulation path 75, the first mixing container 10 is prepared by closing the circulation on-off valve 77 and opening the discharge on-off valve 78. A first cleaning chemical in the inner tank 67 can be supplied to the processing tank 70 through the first and second discharge pipes 64 and 66 to clean wafers such as silicon in the inner tank 67. In this way, in this embodiment, the mixed liquid can be circulated and discharged using the single pump 73. Note that the first mixing container 10
The amount of the first cleaning chemical supplied from the first cleaning chemical to the processing tank 70 is measured by a platform scale 11.
第１混合容器１０の底部、復流配管７１、洗浄
槽７０の内槽６７及び外槽６８からは夫々ドレン
管８０〜８３が引き出されている。８４は第１混
合容器１０への液の給排に際して第１混合容器１
０に給気又は排気するための、図示しない通気フ
イルタが設けられた給排気管である。 Drain pipes 80 to 83 are drawn out from the bottom of the first mixing container 10, the return flow pipe 71, and the inner tank 67 and outer tank 68 of the cleaning tank 70, respectively. 84 refers to the first mixing container 1 when supplying and discharging liquid to the first mixing container 10.
This is an air supply/exhaust pipe provided with a ventilation filter (not shown) for supplying or exhausting air.
前記第３貯留容器２３には、第３補充容器８５
から送液ポンプ８６により硫酸が補充されるよう
になつている。そして前記第２調合ボツクス５に
収容されている第２混合容器８７には、第２貯留
容器２２から高圧ガスを駆動源として送液配管５
１の、開閉弁８８を有する側の分岐管５１ｂ及び
螺旋管、入口管を介して過酸化水素水が供給され
ると共に、第３貯留容器２３から開閉弁９０を有
する送液配管９１を介して硫酸が供給され、夫々
の供給量が台秤９２により計量されて所定の混合
比で混合される。この混合液は循環・吐出ポンプ
９３、流体フイルタ９４及び熱交換器９５を含む
循環路９６内で循環されて攪拌、過及び調温を
施され、このようにして調製された第２の洗浄用
化学薬品が吐出配管９７を介して処理槽９８に吐
出される。なお、第２混合容器８７には、純水配
管５７の、開閉弁９９が設けられた分岐管５７ｂ
を介して純水が供給されうるようになつている。 The third storage container 23 includes a third replenishment container 85.
From there, sulfuric acid is replenished by a liquid feed pump 86. The second mixing container 87 housed in the second mixing box 5 is supplied with a liquid feeding pipe 5 using high pressure gas from the second storage container 22 as a driving source.
1, the hydrogen peroxide solution is supplied through the branch pipe 51b on the side having the on-off valve 88, the spiral pipe, and the inlet pipe, and is also supplied from the third storage container 23 through the liquid feeding pipe 91 having the on-off valve 90. Sulfuric acid is supplied, and the amount of each supply is measured by a platform scale 92 and mixed at a predetermined mixing ratio. This mixed liquid is circulated in a circulation path 96 that includes a circulation/discharge pump 93, a fluid filter 94, and a heat exchanger 95, and is subjected to stirring, filtration, and temperature control, and the thus prepared second cleaning liquid is Chemicals are discharged into a processing tank 98 via discharge piping 97 . Note that the second mixing container 87 includes a branch pipe 57b of the pure water pipe 57 provided with an on-off valve 99.
Pure water can be supplied via the
次に、第６図に基づいて第２実施例を説明す
る。 Next, a second embodiment will be described based on FIG.
この第２実施例は、フツ化水素酸等の腐食性の
高い原液を流量によつて計量する場合に、汎用の
流量計を使用して計量できるように工夫したもの
である。 This second embodiment is devised so that a general-purpose flowmeter can be used to measure a highly corrosive stock solution such as hydrofluoric acid based on the flow rate.
すなわち、第２実施例による調合装置は、フツ
化水素酸等の原液を貯留容器７から混合容器１０
に供給すると共に、腐食性の低い計量液（水、油
等）を後述の循環路１７２内で原液の流量に対し
一定の流量比で反時計回りに循環させるベローズ
ポンプ１６３を設け、汎用の流量計１７４で計量
液の流量を計量することにより、原液の流量を求
めるようにしたものである。 That is, the blending device according to the second embodiment transfers the stock solution such as hydrofluoric acid from the storage container 7 to the mixing container 10.
A bellows pump 163 is provided to circulate a less corrosive metering liquid (water, oil, etc.) counterclockwise in a circulation path 172 (described later) at a constant flow rate with respect to the flow rate of the stock solution. The flow rate of the stock solution is determined by measuring the flow rate of the measuring liquid at a meter 174.
上記ベローズポンプ１６３は、本体１６４の両
側に固定した第１、第２シリンダ１６５，１６６
内に第１、第２ペローズ１６７，１６８を収容
し、両ベローズ１６７，１６８の底部を連結シヤ
フト１７０で連結してなり、空気配管１６０から
開閉弁１６１、絞り弁１６２を介して供給される
圧縮空気を第１、第２ベローズ１６７，１６８内
に交互に供給することにより、両ベローズ１６
７，１６８を交互に膨張及び収縮させうるように
構成されている。そして第１シリンダ１６５は、
上記計量液が貯留された貯留容器１７１を含む循
環路１７２内に位置する一方、第２シリンダ１６
６は第１貯留容器７と第１混合容器１０を連絡す
る送液配管１７３の途中に位置している。 The bellows pump 163 has first and second cylinders 165 and 166 fixed on both sides of the main body 164.
First and second bellows 167, 168 are housed in the interior, and the bottoms of both bellows 167, 168 are connected by a connecting shaft 170. By alternately supplying air into the first and second bellows 167 and 168, both bellows 16
7,168 can be inflated and deflated alternately. And the first cylinder 165 is
The second cylinder 16 is located in a circulation path 172 including a storage container 171 in which the measured liquid is stored.
6 is located in the middle of a liquid feeding pipe 173 that connects the first storage container 7 and the first mixing container 10.
上記ベローズポンプ１６３においては、連結シ
ヤフト１７０が右行する際に第１シリンダ１６５
内に計量液が吸入されると共に、第２シリンダ１
６６内の原液が第１混合容器１０側へ送出される
ので、連結シヤフト１７０の１回の右行行程中の
両シリンダ１６５，１６６の内容積の変化量で比
を予め求めておけば、流量計１７４で第１シリン
ダ１６５への計量液の吸入量を検出することによ
り、第１混合容器１０への原液の供給量を知るこ
とができる。このようにすれば、汎用の流量計等
安価で高精度の計量装置を用いて、フツ化水素酸
等の腐食性の高い原液の計量が可能になる。 In the bellows pump 163, when the connecting shaft 170 moves to the right, the first cylinder 165
The measuring liquid is sucked into the second cylinder 1.
Since the stock solution in 66 is sent to the first mixing container 10 side, if the ratio is determined in advance by the amount of change in the internal volume of both cylinders 165 and 166 during one rightward stroke of the connecting shaft 170, the flow rate can be adjusted. By detecting the amount of metered liquid sucked into the first cylinder 165 by the meter 174, the amount of the stock solution supplied to the first mixing container 10 can be known. In this way, it becomes possible to measure a highly corrosive stock solution such as hydrofluoric acid using an inexpensive and highly accurate measuring device such as a general-purpose flowmeter.
第１図は本発明を適用した半導体材料の洗浄用
化学薬品の調合装置の展開説明図、第２図は第１
図の部分拡大図、第３図は第１図の調合装置の斜
視図、第４図は第３図中Ａ−Ａ線に沿う内部機構
を一部省略した断面略図、第５図は第３図中Ｂ−
Ｂ線に沿う内部機構を一部省略した断面略図、第
６図は別の実施例の部分説明図である。
７，２２，２３……貯留容器、１０，８７……
混合容器、１１，９２……台秤（計量手段）、１
２，９４……流体フイルタ（フイルタ手段）、７
３，９３……循環・吐出ポンプ（吸引手段）、７
５，９６……循環路、Ｐ……圧送系（供給手段）。
Fig. 1 is a developed explanatory diagram of a compounding device for cleaning chemicals for semiconductor materials to which the present invention is applied;
FIG. 3 is a perspective view of the blending device shown in FIG. 1, FIG. 4 is a schematic cross-sectional view taken along line A-A in FIG. B- in the diagram
FIG. 6 is a schematic cross-sectional view taken along line B with the internal mechanism partially omitted, and is a partial explanatory view of another embodiment. 7, 22, 23... Storage container, 10, 87...
Mixing container, 11, 92... Platform scale (measuring means), 1
2,94...Fluid filter (filter means), 7
3,93... Circulation/discharge pump (suction means), 7
5,96... Circulation path, P... Pressure feeding system (supply means).
Claims (1)
液を夫々貯留する複数の貯留容器と、各貯留容器
の原液を混合する密閉式の混合容器と、複数の貯
留容器の原液を混合容器に個別に供給する複数の
供給手段と、混合容器に供給される各原液の供給
量を計量する計量手段と、混合容器内の液を吸引
する吸引手段と液中の異物を除去するフイルタ手
段とを含み、上記吸引手段及びフイルタ手段を介
して混合容器内の液を循環させる循環路とを備え
たことを特徴とする半導体用化学薬品の調合装
置。1. A plurality of storage containers each storing a plurality of stock solutions for preparing chemicals for semiconductors, a closed mixing container for mixing the stock solutions in each storage container, and a mixing container for separately storing the stock solutions in the plurality of storage containers. It includes a plurality of supply means for supplying, a measuring means for measuring the supply amount of each stock solution supplied to the mixing container, a suction means for sucking the liquid in the mixing container, and a filter means for removing foreign substances in the liquid, A compounding device for chemicals for semiconductors, comprising a circulation path for circulating the liquid in the mixing container via the suction means and filter means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59239644A JPS61118127A (en) | 1984-11-13 | 1984-11-13 | Mixing apparatus of chemical for semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59239644A JPS61118127A (en) | 1984-11-13 | 1984-11-13 | Mixing apparatus of chemical for semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61118127A JPS61118127A (en) | 1986-06-05 |
| JPH0579372B2 true JPH0579372B2 (en) | 1993-11-02 |
Family
ID=17047775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59239644A Granted JPS61118127A (en) | 1984-11-13 | 1984-11-13 | Mixing apparatus of chemical for semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61118127A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5409310A (en) * | 1993-09-30 | 1995-04-25 | Semitool, Inc. | Semiconductor processor liquid spray system with additive blending |
| AU4849499A (en) * | 1998-06-30 | 2000-01-17 | Adcs, Ltd. | System for supply of multiple chemicals to a process tool |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60122031A (en) * | 1983-12-02 | 1985-06-29 | Takeda Chem Ind Ltd | Apparatus for automatically preparing solution such as chemical liquid |
-
1984
- 1984-11-13 JP JP59239644A patent/JPS61118127A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60122031A (en) * | 1983-12-02 | 1985-06-29 | Takeda Chem Ind Ltd | Apparatus for automatically preparing solution such as chemical liquid |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61118127A (en) | 1986-06-05 |
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