JP3120817B2 - Automatic developer dilution system - Google Patents
Automatic developer dilution systemInfo
- Publication number
- JP3120817B2 JP3120817B2 JP4793792A JP4793792A JP3120817B2 JP 3120817 B2 JP3120817 B2 JP 3120817B2 JP 4793792 A JP4793792 A JP 4793792A JP 4793792 A JP4793792 A JP 4793792A JP 3120817 B2 JP3120817 B2 JP 3120817B2
- Authority
- JP
- Japan
- Prior art keywords
- developer
- concentration
- control valve
- amount
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体製造工程などで
ポジ型レジストを現像する際に用いられるアルカリ系現
像液を製造するための現像液の自動希釈装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an automatic developer diluting apparatus for producing an alkaline developer used for developing a positive resist in a semiconductor manufacturing process or the like.
【０００２】[0002]
【従来の技術】近年の半導体工業の発展は著しく、特に
最近の半導体集積回路は、超ＬＳＩに代表されるよう
に、高集積化に伴い回路を描画する際の最小線幅を次第
に微細化し、レジストパターンを精度良く形成すること
が要望されている。この要望に応えるものとしてポジ型
レジストがあり、従来のネガ型レジストよりも解像度が
優れていることから、高集積化された回路の描画などに
多く用いられている。2. Description of the Related Art In recent years, the development of the semiconductor industry has been remarkable. Particularly, in recent semiconductor integrated circuits, as represented by a super LSI, a minimum line width for drawing a circuit has been gradually reduced along with high integration. It is desired to form a resist pattern with high accuracy. Positive resists meet this demand, and have higher resolution than conventional negative resists, and are therefore often used for drawing highly integrated circuits.
【０００３】ポシ型レジストの現像液としては、一般に
アルカリ性水溶液が使用されるが、レジストの高解像
力、正確な寸法精度を得るために、この現像液はレジス
トと同程度の重要性を持つと言われている。即ち画像の
きれ、優れた解像力、安定性を得るためには、使用する
ポジ型レジストに合わせた濃度の現像液が必要である。
特に近年の半導体の高集積化に伴い、パターン寸法も微
細化が進んでサブミクロン時代に入り、レジストの実効
感度のばらつきを小さくするために現像濃度の精度の向
上が課題となっている。An alkaline aqueous solution is generally used as a developing solution for the positive resist. However, in order to obtain a high resolution and accurate dimensional accuracy of the resist, this developing solution is considered to be as important as the resist. It is said. That is, in order to obtain image sharpness, excellent resolution and stability, a developing solution having a concentration suitable for the positive resist to be used is required.
In particular, with the recent increase in the degree of integration of semiconductors, the pattern dimensions have been miniaturized, and the submicron era has been entered. In order to reduce the variation in the effective sensitivity of the resist, there has been an issue of improving the accuracy of the development density.
【０００４】この現像液の濃度を高精度で管理すること
は極めて困難であり、これまで半導体工場などの現像液
を使用する側ではこの管理を行うことができないので、
現像現液を超純水で希釈して所望の濃度に調製された現
像液を購入して使用されている。現像原液の希釈倍率
は、原液の濃度や使用目的等により異なるが、通常は５
〜１０倍程度である。なお現像原液の希釈装置としては
特開昭６２−２７６２４号に導電率測定によって濃度を
調製する装置が提案されている。[0004] It is extremely difficult to control the concentration of the developer with high accuracy, and this control cannot be performed by a developer using a developer such as a semiconductor factory.
A developing solution prepared by diluting a developing solution with ultrapure water to a desired concentration is purchased and used. The dilution ratio of the undiluted developing solution varies depending on the concentration of the undiluted solution, the purpose of use, and the like.
It is about 10 to 10 times. As an apparatus for diluting an undiluted developing solution, Japanese Patent Application Laid-Open No. 62-27624 proposes an apparatus for adjusting the concentration by conductivity measurement.
【０００５】[0005]
【発明が解決しようとする課題】調製した現像液は希釈
倍率に応じて液量が増大し、またその種類が多くなる。
従って半導体工場などの現像液を使用する側で所望の濃
度に調製された現像液を購入して使用する場合には、容
器への充填作業、多くの種類の容器の管理、その運搬等
の費用がかさみ、結果として現像液のコストが増大す
る。また現像液が調製されてから使用されるまでの期間
が長くなることから、その現像液が劣化するという課題
もある。The amount of the prepared developer increases in accordance with the dilution ratio, and the type of the developer increases.
Therefore, when purchasing and using a developer adjusted to a desired concentration on the side of a developer using a developer such as a semiconductor factory, costs for filling the containers, managing many types of containers, transporting the containers, and the like. And the cost of the developer increases as a result. Further, since the period from when the developer is prepared to when it is used becomes longer, there is another problem that the developer deteriorates.
【０００６】また特開昭６２−２７６２４号に記載され
ている如き導電率測定によって濃度を調製・制御する装
置は、精度が不充分であり、半導体の高集積化に伴って
要求される現像液の精度に対応することが困難である。
本発明の目的は、ポジ型レジストの現像液を半導体工場
などの使用する側で所望の濃度に調製することができる
ように、極めて高い精度で自動的に管理する現像液の希
釈装置を提供することにある。An apparatus for adjusting and controlling the concentration by conductivity measurement as described in Japanese Patent Application Laid-Open No. 62-27624 has insufficient precision, and a developing solution required with high integration of semiconductors. It is difficult to cope with the accuracy of.
SUMMARY OF THE INVENTION An object of the present invention is to provide a developer diluting apparatus which automatically manages a positive type resist developer with extremely high precision so that a developer used in a semiconductor factory or the like can adjust a developer to a desired concentration. It is in.
【０００７】[0007]
【課題を解決するための手段】発明者等は上記の如き課
題を有する現像液の自動希釈装置について鋭意検討した
結果、調合槽にロードセルを用いて現像原液と希釈水量
を測定し、電位差測定による自動滴定装置により現像液
の濃度を測定し、シーケンスコントローラーにより管理
すれば、極めて高い精度で現像液濃度を自動的に管理す
ることができることを見出し、本発明に到達した。Means for Solving the Problems As a result of diligent studies on an automatic developer diluting apparatus having the above-mentioned problems, the inventors measured the amounts of undiluted developing solution and diluting water using a load cell in a mixing tank, and measured the potential difference. The present inventors have found that the developer concentration can be automatically controlled with extremely high precision by measuring the developer concentration with an automatic titrator and controlling the concentration with a sequence controller, and arrived at the present invention.
【０００８】即ち本発明は、ポジ型レジストの現像原液
を超純水で希釈するに際し、調合槽3 の液量の重量を測
定するロードセル8 と、電位差測定による自動滴定装置
12、現像原液の送液量を制御する制御弁5 および微量制
御弁13、超純水の送液量を制御する制御弁7 および微量
制御弁14を備え、シーケンスコントローラー9 により制
御することを特徴とする現像原液の自動希釈装置であ
る。That is, the present invention provides a load cell 8 for measuring the weight of the solution in the preparation tank 3 when diluting a positive resist developing stock solution with ultrapure water, and an automatic titration apparatus for measuring a potential difference.
12 、 Control valve 5 for controlling the amount of undiluted solution
Control valve 13, control valve 7 for controlling the amount of ultrapure water delivered, and a small amount
This is an automatic diluting device for developing undiluted solution , comprising a control valve 14 and controlled by a sequence controller 9 .
【０００９】ポシ型レジストの現像液としては、燐酸ソ
ーダ、苛性ソーダ、珪酸ソーダ、またはその他の無機ア
リカリ等との混合物からなる無機アルカリ水溶液が用い
られるが、アルカリメタルの汚染が心配される場合には
メタルを含まないアミン系の有機アルカリ水溶液が用い
られる。このようなアミン系のポシ型レジストの現像液
としてはテトラメチルアンモニウムハイドロオキサイド
（以下、ＴＭＡＨと称する）が挙げられ、広く使用され
ている。As a developing solution for the posi-type resist, an aqueous solution of an inorganic alkali consisting of sodium phosphate, caustic soda, sodium silicate, or a mixture with other inorganic alkalis is used. Is a metal-free amine-based organic alkali aqueous solution. Such tetramethyl Le ammonium hydroxide as a developing solution for Po sheet resist the amine (hereinafter, referred to as TMAH) and the like, are widely used.
【００１０】本発明において調合槽の液量測定にロード
セルを用いる。ロードセルは重量の変動を幾つかの差圧
検出端（Dpセル）に信号として取り出して制御するため
に一般に用いられるものであり、通常に４ケ所にDpセル
を使用し偏荷重をすばやく吸収する方式が用いられる。
本発明ではこのロードセルを用いて調合槽の重量を測定
することにより、調合槽に導入された現像原液量および
希釈水量を正確且つ迅速に測定でき、希釈装置を好適に
制御・管理することができる。In the present invention, a load cell is used for measuring the amount of liquid in the mixing tank. Load cells are generally used to control the fluctuation of weight by taking out signals as signals to several differential pressure detection terminals (Dp cells). Normally, four types of Dp cells are used to quickly absorb uneven loads. Is used.
In the present invention, by measuring the weight of the mixing tank using this load cell, the amount of the undiluted developing solution and the amount of dilution water introduced into the mixing tank can be accurately and quickly measured, and the diluting apparatus can be suitably controlled and managed. .
【００１１】また本発明において現像液の濃度は電位差
測定による自動滴定装置により行われる。自動滴定装置
には、濃度測定に供する電位差滴定部、試料自動採取等
の前処理部および洗浄・廃液処理等の後処理部が組み込
まれる。濃度測定は試料採取管に試料を導入して充分に
置換した後、一定量の試料を滴定瓶に移し、電位差測定
による自動滴定が行われる。滴定終了後、液の排出、洗
浄が行われて一回の分析が終了し、測定した濃度値はシ
ーケンスコントローラーへ伝送される。現像液の濃度を
高精度で測定するにためには外気の影響をできるだけ排
除する必要がある。このため自動滴定装置における試料
採取部（サンプラー）を恒温槽に入れ設定温度を０．０
１℃以内の温度に管理する必要があり、また調合槽や原
料槽を乾燥した不活性ガスでシールする必要がある。In the present invention, the concentration of the developing solution is measured by an automatic titrator based on potential difference measurement. The automatic titration device incorporates a potentiometric titration unit for concentration measurement, a pre-processing unit for automatic sample collection, and a post-processing unit for washing and waste liquid treatment. In the concentration measurement, after a sample is introduced into a sample collection tube and sufficiently replaced, a fixed amount of the sample is transferred to a titration bottle, and automatic titration by potential difference measurement is performed. After the titration is completed, the solution is drained and washed to complete one analysis, and the measured concentration value is transmitted to the sequence controller. In order to measure the concentration of the developer with high accuracy, it is necessary to eliminate the influence of the outside air as much as possible. For this reason, the sample collection section (sampler) of the automatic titrator is placed in a thermostat and the set temperature is set to 0.0.
It is necessary to control the temperature within 1 ° C., and it is necessary to seal the mixing tank and the raw material tank with a dry inert gas.
【００１２】本発明に用いられるシーケンスコントロー
ラーは、通常、小型電算機が用いられ、濃度設定値によ
り決められた量を調合槽に送液し、各液量および濃度測
定値等を記憶させ、これらのデータを基に補充すべき現
像原液量および希釈水量が計算され、コントローラーに
より制御弁の操作が行われる。これらの補充すべき液量
の操作には別に微量制御弁を設置することが望ましい。
またシーケンスコントローラーには各制御弁、ポンプ、
滴定装置等で行われる各々の操作がタイマーにより自動
的に行われるように設定されており、従って本発明の自
動希釈装置では目的とする現像液の濃度と製造量をシー
ケンスコントローラーに入力することにより目的とする
高精度の濃度の現像液が自動的に得られる。As the sequence controller used in the present invention, a small computer is usually used, and the amount determined by the concentration set value is sent to the preparation tank, and each liquid amount and measured concentration value are stored. Is calculated based on the above data, and the controller operates the control valve by the controller. It is desirable to separately install a minute control valve for the operation of the liquid amount to be replenished.
The sequence controller has control valves, pumps,
Each operation performed in the titrator and the like is set so as to be automatically performed by a timer.Therefore, in the automatic dilution device of the present invention, the concentration and the production amount of the target developer are input to the sequence controller. The desired high-precision concentration developer is automatically obtained.
【００１３】次に図面を用いて本発明を説明する。図１
は本発明による現像液の希釈装置の系統図の一例を示
す。本発明の希釈装置は、上記のロードセルを有する調
合槽3および自動滴定装置12の他に現像原液を貯留する
原料槽1 、現像原液の移送ポンプ2 、調合槽の循環ポン
プ10および各制御弁とそれらを制御するシーケンスコン
トロールユニット9 、各機器を接続する配管類、電気計
装類などによって構成される。Next, the present invention will be described with reference to the drawings. FIG.
FIG. 1 shows an example of a system diagram of a developer diluting apparatus according to the present invention. The diluting apparatus of the present invention includes a mixing tank 3 having the load cell and an automatic titrator 12, a raw material tank 1 for storing an undiluted developing solution, a transfer pump 2 for the undiluted developing solution, a circulating pump 10 for the mixing tank, and various control valves. The sequence control unit 9 for controlling them is constituted by piping and electrical instrumentation for connecting each device.
【００１４】現像液の調合は、最初に現像原液槽1 より
移送ポンプ2 を用いて現像原液を調合槽3 に送液し、所
定量になったら移送ポンプ2 を停止する。現像原液の移
送量は制御弁4 および制御弁5 によって制御される。次
に配管6 より超純水が調合槽3 に送液される。超純水量
は制御弁7 により制御され、設定量となったら閉止す
る。調合槽に送液される各液量はロードセル8 により測
定し、シーケンスコントローラー9 を通して各制御弁お
よびポンプが迅速・正確に制御される。To prepare the developing solution, first, the developing solution is supplied from the developing solution tank 1 to the preparing tank 3 by using the transfer pump 2, and when the amount of the developing solution reaches a predetermined value, the transfer pump 2 is stopped. The transfer amount of the developing solution is controlled by the control valve 4 and the control valve 5. Next, ultrapure water is sent to the preparation tank 3 from the pipe 6. The ultrapure water amount is controlled by the control valve 7, and is closed when the set amount is reached. The amount of each liquid sent to the preparation tank is measured by the load cell 8, and each control valve and pump are controlled quickly and accurately through the sequence controller 9.
【００１５】調合槽に現像原液および超純水が送液され
た後、調合槽内の液を循環ポンプ10を用いて制御弁11に
より循環液量が制御されながら一定時間混合する。次に
混合液の一部が自動滴定装置12に送られ、混合液の濃度
が測定される。この濃度測定は電位差測定による自動滴
定装置を用いることにより、高精度の測定値が得られ
る。After the undiluted developing solution and ultrapure water have been sent to the blending tank, the liquid in the blending tank is mixed for a certain period of time using the circulating pump 10 while the amount of circulating liquid is controlled by the control valve 11. Next, a part of the mixture is sent to the automatic titrator 12, and the concentration of the mixture is measured. In this concentration measurement, a highly accurate measured value can be obtained by using an automatic titrator by potentiometric measurement.
【００１６】現像原液および超純水の送液量の制御に
は、制御弁5 および7 の他に微量制御弁13および14が設
置されている。混合液の濃度が目的とする設定値と比較
され、設定値を下回る場合にはシーケンスコントローラ
ー9 により微量制御弁13を制御して測定結果より求めら
れた現像原液の追加量が送液される。また混合液の濃度
が設定値を上回る場合には微量制御弁14を制御して測定
結果より求められた超純水の追加量が送液される。For controlling the feed rates of the undiluted developing solution and the ultrapure water, control valves 13 and 14 are provided in addition to the control valves 5 and 7. The concentration of the mixed solution is compared with the target set value. If the concentration is lower than the set value, the sequence controller 9 controls the minute control valve 13 to send an additional amount of the undiluted developing solution obtained from the measurement result. If the concentration of the mixed solution exceeds the set value, the micro control valve 14 is controlled to send an additional amount of ultrapure water obtained from the measurement result.
【００１７】シーケンスコントローラー9 においては、
設定時間により各ポンプの稼働停止が行われると共に、
調合槽に送液された各液量および濃度測定値が記憶され
ており、これらのデータを基に追加すべき送液量が計算
されて各微量制御弁の操作が行われる。またシーケンス
コントローラー9 では、各機器、ポンプおよび制御弁の
一連の操作がタイマーにより自動的に操作されて目的と
する濃度の現像液が得られる。In the sequence controller 9,
While the operation of each pump is stopped by the set time,
The amount of each liquid sent to the mixing tank and the measured value of the concentration are stored, and the amount of liquid to be added is calculated based on these data, and the operation of each minute control valve is performed. In the sequence controller 9, a series of operations of each device, pump, and control valve are automatically operated by a timer to obtain a developer having a target concentration.
【００１８】測定精度を考慮して調合槽内の現像液の濃
度が所定の濃度規格範囲内であることが確認された後、
制御弁15を用いて調合槽より現像液を製品として抜き出
して配管16から製品槽に送られる。なお前述の如くポレ
ジスト用のアルカリ系現像液は外気と接触すると空気中
の酸素や炭酸ガスとの反応や水分の吸収等による影響を
受けるので、現像原液槽、調合槽および製品槽等は全て
乾燥した不活性ガスによるシールが行われる。After it has been confirmed that the concentration of the developer in the preparation tank is within a predetermined concentration specification range in consideration of measurement accuracy,
The developer is extracted as a product from the preparation tank using the control valve 15 and sent to the product tank via the pipe 16. As mentioned above, the alkaline developing solution for photoresist is affected by the reaction with oxygen and carbon dioxide in the air and the absorption of water when it comes into contact with the outside air. Sealing with the inert gas is performed.
【００１９】[0019]
【実施例】図１において３m3の現像原液槽および５m3の
調合槽を用い、ポシ型レジストの現像原液としてＴＭＡ
Ｈ約15重量% からＴＭＡＨ設定濃度 2.380重量% 及び
3.000重量% の現像液を製造した。各 5バッチの操作に
おける製品濃度は表１に示す通りであり、ＴＭＡＨ濃度
の誤差範囲が 0.002重量% 以内であった。EXAMPLES Using blending tank of the undiluted developer solution tank and 5 m 3 of 3m 3 in FIG. 1, TMA as a developing stock Po Shi resist
H about 15% by weight to TMAH concentration 2.380% by weight and
A 3.000% by weight developer was prepared. The product concentration in each of the five batch operations was as shown in Table 1, and the error range of the TMAH concentration was within 0.002% by weight.
【００２０】 表１ 設定値 (重量%) 2.380 3.000 ────────────────────────── 製品濃度 (重量%) 1 バッチ 2.3811 3.0020 2 バッチ 2.3814 3.0013 3 バッチ 2.3786 3.0006 4 バッチ 2.3791 2.9989 5 バッチ 2.3817 3.0019 ──────────────────────────Table 1 Set value (wt%) 2.380 3.000 ────────────────────────── Product concentration (wt%) 1 batch 2.3811 3.0020 2 Batch 2.3814 3.0013 3 Batch 2.3786 3.0006 4 Batch 2.3791 2.9989 5 Batch 2.3817 3.0019 ──────────────────────────
【００２１】[0021]
【発明の効果】本発明の現像液希釈装置では実施例に示
される如くＴＭＡＨ濃度の誤差範囲が0.002重量% 以内
の高精度に制御することができる。本発明の現像液希釈
装置はロードセルにより調合槽の液量を自動的に測定
し、自動滴定装置を用い、シーケンスコントローラーに
より各機器および制御弁等の操作が行われることから、
殆ど人手を要せずに目的とする濃度の現像液が高精度で
得られる。これにより半導体工場などの現像液を使用す
る側で目的とする濃度の現像液を迅速に得られることに
なり、容器への充填作業や、運搬・管理等の費用が削減
されると共に、高精度の濃度の現像液が容易に得られる
ことから従来のものに比べてより高精度のレジストパタ
ーンの現像を行うことができるようになる。According to the present invention, the error range of the TMAH concentration can be controlled with high accuracy within 0.002% by weight as shown in the embodiment. The developer diluting apparatus of the present invention automatically measures the amount of liquid in the preparation tank using a load cell, uses an automatic titrator, and performs operations of various devices and control valves by a sequence controller.
A developer having a desired concentration can be obtained with high accuracy with little manual work. As a result, a developer having a desired concentration can be quickly obtained on the side where a developer is used, such as in a semiconductor factory, so that costs for container filling work, transportation and management, etc. are reduced, and high precision is achieved. Since a developer having a concentration of is easily obtained, it becomes possible to develop a resist pattern with higher precision than the conventional one.
【００２２】[0022]
【図１】系統図本発明による現像液の希釈装置の系統図
の一例を示す。FIG. 1 is a system diagram showing an example of a system diagram of a developer diluting apparatus according to the present invention.
1 現像原液槽 2 移送ポンプ 3 調合槽 8 ロードセル 9 シーケンスコントローラー 10 循環ポンプ 12 自動滴定装置 1 Development solution tank 2 Transfer pump 3 Mixing tank 8 Load cell 9 Sequence controller 10 Circulation pump 12 Automatic titrator
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭64−27624（ＪＰ，Ａ) 特開 昭63−274438（ＪＰ，Ａ) 特開 平２−16417（ＪＰ，Ａ) 特開 昭54−155092（ＪＰ，Ａ) 特開 昭51−35390（ＪＰ，Ａ) 特開 平２−268271（ＪＰ，Ａ) 実開 平３−21740（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.7，ＤＢ名) G03F 7/30 501 H01L 21/027 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-64-27624 (JP, A) JP-A-63-274438 (JP, A) JP-A-2-16417 (JP, A) JP-A-54-274 155092 (JP, A) JP-A-51-35390 (JP, A) JP-A-2-268271 (JP, A) JP-A-3-21740 (JP, U) (58) Fields investigated (Int. Cl. 7 , DB name) G03F 7/30 501 H01L 21/027
Claims (1)
するに際し、調合槽3の液量の重量を測定するロードセ
ル8 と、電位差測定による自動滴定装置12、現像原液の
送液量を制御する制御弁5 および微量制御弁13、超純水
の送液量を制御する制御弁7 および微量制御弁14を備
え、シーケンスコントローラー9 により制御することを
特徴とする現像原液の自動希釈装置。1. A load cell 8 for measuring the weight of a solution in a preparation tank 3 when diluting an undiluted developing solution for a positive resist with ultrapure water, an automatic titration device 12 for measuring a potential difference ,
Control valve 5 and micro control valve 13 for controlling the amount of liquid sent, ultrapure water
An automatic diluting device for developing undiluted solution , comprising a control valve 7 and a micro control valve 14 for controlling the amount of liquid to be supplied, and controlled by a sequence controller 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4793792A JP3120817B2 (en) | 1992-02-04 | 1992-02-04 | Automatic developer dilution system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4793792A JP3120817B2 (en) | 1992-02-04 | 1992-02-04 | Automatic developer dilution system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05216241A JPH05216241A (en) | 1993-08-27 |
| JP3120817B2 true JP3120817B2 (en) | 2000-12-25 |
Family
ID=12789291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4793792A Expired - Fee Related JP3120817B2 (en) | 1992-02-04 | 1992-02-04 | Automatic developer dilution system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3120817B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09326A (en) * | 1995-06-20 | 1997-01-07 | Phoenix:Kk | Compound reinforced resin rod and umbrella using the same |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2670211B2 (en) * | 1992-07-10 | 1997-10-29 | 東京応化工業株式会社 | How to adjust the developer |
| JPH06190256A (en) * | 1992-12-28 | 1994-07-12 | Sumitomo Chem Co Ltd | Developer compounding device and developer compounding method |
| JP3741811B2 (en) * | 1996-12-25 | 2006-02-01 | 三菱化学エンジニアリング株式会社 | Method and apparatus for diluting alkaline developer stock solution |
| KR20040005355A (en) * | 2002-07-10 | 2004-01-16 | 주식회사 하이닉스반도체 | A Pellicle Seperating Type Frame Structure |
| US6752547B2 (en) * | 2002-10-28 | 2004-06-22 | Applied Materials Inc. | Liquid delivery system and method |
| US7155319B2 (en) | 2005-02-23 | 2006-12-26 | Applied Materials, Inc. | Closed loop control on liquid delivery system ECP slim cell |
-
1992
- 1992-02-04 JP JP4793792A patent/JP3120817B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09326A (en) * | 1995-06-20 | 1997-01-07 | Phoenix:Kk | Compound reinforced resin rod and umbrella using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05216241A (en) | 1993-08-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100394181B1 (en) | Two-stage chemical mixing system | |
| US7101517B2 (en) | Processing solution preparation and supply method and apparatus | |
| KR0119116B1 (en) | Apparatus for controlling a developing solution | |
| JP3120817B2 (en) | Automatic developer dilution system | |
| TW583516B (en) | Alkaline system working fluid, method and apparatus for preparing working fluid and method and apparatus for feeding working fluid | |
| US5992437A (en) | Method for diluting acid or alkaline stock solution and apparatus therefor | |
| JP3183308B2 (en) | Continuous automatic dilution system for developer | |
| US5476320A (en) | Developer preparing apparatus and developer preparing method | |
| EP1136817B1 (en) | Method and apparatus for detecting concentration of solution, and apparatus for diluting and preparing agents | |
| US6588927B2 (en) | Purified developer producing equipment and method | |
| JPH067910B2 (en) | Development stock solution diluter | |
| KR100270946B1 (en) | Developer Preparation Device and Developer Preparation Method | |
| EP0578505B1 (en) | Method of adjusting concentration of developer | |
| JP2751849B2 (en) | Undiluted solution for developing solution | |
| CN116651832A (en) | Stable wafer cleaning control method | |
| WO2000000815A1 (en) | Method and apparatus for the measurement of surface tension-related characteristics of liquids | |
| US6800409B2 (en) | System and method for recycling developer solution containing tetra-methyl-ammonia hydroxide (TMAH) | |
| JPH0871389A (en) | Preparation of developing solution | |
| JPH08262739A (en) | Device and method for preparing developer | |
| JPH0724289A (en) | Device and method for preparing developer | |
| TW201827950A (en) | Developing apparatus capable of maintaining desired developing performance and maintaining a desired line width and residual film thickness of a wiring pattern on a substrate | |
| JPH0775727A (en) | Device for blending liquids | |
| JP3235530B2 (en) | Chemical solution quantitative cleaning device | |
| KR100610004B1 (en) | Mixing apparatus using weight of chemical | |
| TW202407314A (en) | Calibration curve solution production system, measurement system, and calibration curve solution production method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |