JPH0550377A - Magnetogrinding method - Google Patents
Magnetogrinding methodInfo
- Publication number
- JPH0550377A JPH0550377A JP3209343A JP20934391A JPH0550377A JP H0550377 A JPH0550377 A JP H0550377A JP 3209343 A JP3209343 A JP 3209343A JP 20934391 A JP20934391 A JP 20934391A JP H0550377 A JPH0550377 A JP H0550377A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- polishing
- polished
- abrasive grains
- permanent magnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はＮＣ工作機械等に切削工
具の替わりに磁気研磨ツールを取り付け、切削加工等の
形状出し加工後の金型等の仕上げ、自動研磨や、金属
製、セラミックス製等の製品の鏡面研磨、加工変質層除
去研磨等に使用される。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is to attach a magnetic polishing tool to an NC machine tool or the like instead of a cutting tool to finish a die or the like after shape forming processing such as cutting, automatic polishing, metal or ceramics. It is used for mirror polishing of products such as, polishing for removal of work-affected layer, etc.
【０００２】[0002]
【従来の技術】従来は図２に示すごとく、数１００μｍ
の粒径の強磁性材粒子４の表面に数μｍの酸化アルミニ
ウム等の研磨砥粒５を金属結合状態で付着させ、研磨砥
粒５と強磁性材粒子４が一体となった磁性研磨砥粒とな
っていた。2. Description of the Related Art Conventionally, as shown in FIG.
Magnetic abrasive grains in which the abrasive grains 5 and the ferromagnetic material particles 4 are integrated with each other by adhering the abrasive grains 5 of aluminum oxide or the like of several μm in a metal-bonded state to the surface of the ferromagnetic material particles 4 of It was.
【０００３】[0003]
【発明が解決しようとする課題】従来のように、研磨砥
粒５を強磁性材粒子４の表面に、ある厚さで結合させた
磁性研磨砥粒は、図１に示す磁気研磨装置及び、図３に
示す被研磨物周辺の部分拡大図に示すように、永久磁石
１と被研磨物２間に詰め込まれた場合、表面の酸化アル
ミニウムは強磁性材でないため、透磁率が鉄の数１００
０分の１と小さく、磁気回路としての磁気抵抗が非常に
大きくなってしまう。そのため、磁気回路に発生する磁
界の強さが小さく、しかも表面の酸化アルミニウム等の
研磨砥粒層５の厚さがバラつくと、その厚さに反比例し
て磁界の強さが弱くなるため、研磨量の制御が非常に困
難で、しかも、必要な磁界を発生するため永久磁石を強
力で非常に大きな物を必要としたため、装置が大型にな
ってしまうといった課題があった。また、同じ装置の場
合は研磨時間が数１０倍かかってしまうといった課題が
あった。As in the prior art, the magnetic polishing abrasive grains in which the polishing abrasive grains 5 are bonded to the surface of the ferromagnetic material particles 4 with a certain thickness are provided by the magnetic polishing apparatus shown in FIG. As shown in a partially enlarged view of the periphery of the object to be polished shown in FIG. 3, when the permanent magnet 1 and the object to be polished 2 are packed, the aluminum oxide on the surface is not a ferromagnetic material, so that the magnetic permeability is several hundreds of iron.
It is as small as 1/0, and the magnetic resistance as a magnetic circuit becomes very large. Therefore, the strength of the magnetic field generated in the magnetic circuit is small, and when the thickness of the polishing abrasive grain layer 5 such as aluminum oxide on the surface varies, the strength of the magnetic field weakens in inverse proportion to the thickness. It is very difficult to control the amount of polishing, and the permanent magnet requires a strong and very large object to generate a necessary magnetic field, which causes a problem that the device becomes large. Further, in the case of the same apparatus, there is a problem that the polishing time is several tens of times longer.
【０００４】[0004]
【課題を解決するための手段】前記、課題を解決するた
めに、本発明の磁気研磨方法は、被研磨物と対面する永
久磁石、強磁性体粒子、油性ワックス等で固められた研
磨砥粒、より構成され、被研磨物と永久磁石を相対的に
回転あるいは揺動させる磁気研磨方法において、被研磨
物に塗布するかまたは、強磁性体粒子と油性ワックス等
で混合する研磨砥粒を、強磁性体粒子と別体で充填し、
または補給したことを特徴とする。In order to solve the above-mentioned problems, the magnetic polishing method of the present invention is a polishing abrasive grain hardened with a permanent magnet, ferromagnetic particles, oily wax or the like facing an object to be polished. In the magnetic polishing method in which the object to be polished and the permanent magnet are relatively rotated or oscillated, the polishing abrasive particles applied to the object to be polished or mixed with the ferromagnetic particles and the oily wax, Filled with a separate body from the ferromagnetic particles,
Alternatively, it is characterized by being replenished.
【０００５】[0005]
【作用】このように、強磁性体でない研磨砥粒５で覆わ
れた磁性研磨砥粒の替わりに、強磁性体粒子と研磨力の
ある粒子を分け、しかもそれを油性ワックス等で保持さ
せることにより、鉄またはニッケル系の強磁性体粒子３
どうしが接触するため、酸化アルミニウム等の非磁性材
材料でできた研磨砥粒５が間に入らず、磁気回路に発生
する磁界の強さを従来の数倍から数十倍に高めることが
できる。As described above, in place of the magnetic polishing abrasive grains covered with the non-ferromagnetic polishing abrasive grains 5, the ferromagnetic particles and the particles having polishing ability are separated and held by oil wax or the like. According to, iron or nickel-based ferromagnetic particles 3
Since the two are in contact with each other, the abrasive grains 5 made of a non-magnetic material such as aluminum oxide do not intervene, and the strength of the magnetic field generated in the magnetic circuit can be increased from several times to several tens of times of the conventional one. ..
【０００６】以下に、磁気回路にはたらく磁気抵抗の大
きさを、従来の、磁性材料の外周部を非磁性の研磨砥粒
５で覆った磁性研磨材と、本発明の強磁性体粒子３のみ
の場合を比較し、磁気回路に働く磁界の強さの違いを説
明をする。Below, the magnitude of the magnetic resistance acting on the magnetic circuit is determined only by the conventional magnetic abrasive material in which the outer peripheral portion of the magnetic material is covered with non-magnetic abrasive grains 5 and the ferromagnetic particles 3 of the present invention. The difference in the strength of the magnetic field acting on the magnetic circuit will be explained by comparing the cases.
【０００７】図７のように磁性研磨材４が永久磁石１と
被研磨物２の間に１列に並んでいる場合で考えると、磁
性研磨材４の粒径を立方体で仮定し、一辺の長さを
ａ、研磨砥粒５の膜厚を ｂ、永久磁石１と被研磨物２
の間隙を Ｇ、とすると、間隙Ｇの間に磁性研磨材４は
Ｇ／ａ個、直列に並ぶ。研磨砥粒５は強磁性体ではな
いから透磁率は小さく、空隙部と考えても差し支えな
い。Assuming that the magnetic abrasives 4 are arranged in a line between the permanent magnet 1 and the object to be polished 2 as shown in FIG. 7, the particle size of the magnetic abrasives 4 is assumed to be a cube, and one side of the magnetic abrasive 4 is assumed. Length
a, the thickness of the abrasive grains 5 is b, the permanent magnet 1 and the object to be polished 2
If the gap G is G, the magnetic abrasives 4 are arranged in series in the gap G by G / a. Since the abrasive grains 5 are not a ferromagnetic substance, they have a low magnetic permeability and can be considered as voids.
【０００８】研磨砥粒部の、磁束の流れる方向１２の長
さの総和を Ｌbとすると Ｌb ＝２ｂ・Ｇ／ａ これに対し、強磁性材部４の長さの総和 Ｌa は Ｌa ＝（ａ−２ｂ）・Ｇ／ａ となり、強磁性体粒子４の透磁率を μa、非磁性体の研
磨砥粒５の透磁率を μb、強磁性体粒子４の磁界と垂直
な断面積を Ｓ＝ａ2とすると、非磁性材の透磁率 μb
は μb＝μa／１０００ 程度であるから、Ｇ の間の磁気抵抗 Ｒは Ｒ＝Ｌa／μa・Ｓ＋Ｌb／μb・Ｓ ＝（ａ＋１９９８ｂ）・Ｇ／μa・ａ3 となる。ここでａ＝２００μｍ、ｂ＝５μｍ程度である
から上式（ ）内のａに対し１９９８ｂの大きさは、約
５０倍と、磁気抵抗に及ぼす磁性研磨材の酸化アルミニ
ウム等の非磁性研磨砥粒５の大きさの要因が非常に大き
いことがわかる。すなわち表面を酸化アルミニウム等の
非磁性研磨砥粒５で覆われた磁性研磨材４を磁気研磨に
使った場合と、強磁性体粒子３と研磨砥粒６を分けた場
合では磁気回路に発生する磁界の強さが数１０倍違うこ
とがわかる。Let Lb be the total length of the polishing abrasive grains in the direction 12 in which the magnetic flux flows. Lb = 2b · G / a On the other hand, the total length La of the ferromagnetic material portion 4 is La = (a -2b) · G / a, the magnetic permeability of the ferromagnetic particles 4 is μa, the magnetic permeability of the non-magnetic abrasive grains 5 is μb, and the cross-sectional area perpendicular to the magnetic field of the ferromagnetic particles 4 is S = a. When set to 2 , the magnetic permeability of non-magnetic material μb
Is about μb = μa / 1000, the magnetic resistance R between G is R = La / μa · S + Lb / μb · S = (a + 1998b) · G / μa · a 3 . Since a = 200 μm and b = 5 μm, the size of 1998b is about 50 times that of a in the above formula (), which is about 50 times as large as that of non-magnetic abrasive grains such as aluminum oxide, which is a magnetic abrasive that affects the magnetic resistance. It can be seen that the factor of 5 is very large. That is, when the magnetic polishing material 4 whose surface is covered with the non-magnetic polishing abrasive grains 5 such as aluminum oxide is used for the magnetic polishing, and when the ferromagnetic particles 3 and the polishing abrasive grains 6 are separated, they occur in the magnetic circuit. It can be seen that the magnetic field strength is several tens of times different.
【０００９】[0009]
【実施例】以下に、実施例に基づいて説明する。Embodiments will be described below based on embodiments.
【００１０】図３は、円筒状の被研磨物２の周囲にパラ
フィン系のワックス７で覆われた研磨砥粒６を塗り付
け、フェライト製の粒径１００μｍ〜５００μｍの強磁
性体粒子３を永久磁石１と被研磨物２の間隙３ｍｍの間
に充填させ、被研磨物２を回転及び軸方向に揺動させた
磁気研磨方法である。In FIG. 3, abrasive grains 6 covered with paraffin wax 7 are applied to the periphery of a cylindrical object 2 to be polished, and ferromagnetic particles 3 made of ferrite and having a particle size of 100 μm to 500 μm are permanently applied. This is a magnetic polishing method in which the magnet 1 and the object to be polished 2 are filled in a gap of 3 mm and the object to be polished 2 is rotated and swung in the axial direction.
【００１１】この場合、最初は、研磨砥粒６とパラフィ
ン系ワックス７が被研磨物２の上を覆っているだけで全
く研磨されないが、被研磨物２の回転と揺動による摩擦
熱でパラフィンが溶け、研磨砥粒６が強磁性体粒子３の
外周部に付着し出して被研磨物２の表面の研磨を開始す
る。研磨砥粒６の被研磨物２に押し付けられる応力は、
磁気回路に発生する磁界の強さに比例し、従来の、表面
を研磨砥粒５で覆われた磁性研磨材４、を使用した場合
と比べ数十倍の力を発生し、研磨力が飛躍的に増大す
る。In this case, at first, the abrasive grains 6 and the paraffin wax 7 cover only the object to be polished 2 and are not polished at all, but the paraffin is generated by the frictional heat generated by the rotation and swing of the object 2 to be polished. Melts and the abrasive grains 6 adhere to the outer periphery of the ferromagnetic particles 3 to start polishing the surface of the object to be polished 2. The stress of the abrasive grains 6 pressed against the object to be polished 2 is
In proportion to the strength of the magnetic field generated in the magnetic circuit, a force of several tens of times is generated as compared with the case of using the conventional magnetic polishing material 4 whose surface is covered with polishing abrasive grains 5, and the polishing power is dramatically increased. Increase.
【００１２】図４は、同様に、円筒物の研磨においてパ
ラフィン系ワックス７、５μｍ〜１０μｍの粒子径の研
磨砥粒６、及び、１００μｍ〜５００μｍの粒子径の強
磁性体粒子３を混合した研磨材を、永久磁石１と被研磨
物２の間隙に充填させて、被研磨物２を揺動及び回転さ
せた例である。この場合も、摩擦熱でパラフィン系ワッ
クス７が溶けることにより、強磁性体粒子３が永久磁石
１と被研磨物２との間に間隙を作らず密着して直列に並
ぶため、磁気回路に非常に大きな磁界を発生し、図３の
例と同様の効果を出す。Similarly, FIG. 4 shows a mixture of a paraffin wax 7, a polishing abrasive grain 6 having a particle diameter of 5 μm to 10 μm, and a ferromagnetic particle 3 having a particle diameter of 100 μm to 500 μm. In this example, the material is filled in the gap between the permanent magnet 1 and the object to be polished 2 and the object to be polished 2 is swung and rotated. Also in this case, because the paraffin wax 7 is melted by frictional heat, the ferromagnetic particles 3 are closely arranged in series without forming a gap between the permanent magnet 1 and the object 2 to be polished, which is very important in the magnetic circuit. A large magnetic field is generated, and the same effect as the example of FIG. 3 is obtained.
【００１３】図５は、凹凸のある被研磨物８の表面に、
あらかじめパラフィン系のワックス７で固めた研磨砥粒
６を塗布しておき、回転及び揺動する永久磁石９と凹凸
のある被研磨物８との間に磁界をかけ、５ｍｍの間隙に
１００μｍ〜５００μｍの粒径の強磁性体粒子３を充填
させ、金型等の凹凸の有る被研磨物８を研磨した例であ
る。この場合は、ＮＣフライス等で形状を作った後、同
じ加工機を使って、先端のエンドミルに替えて磁気研磨
用永久磁石を装填し、引き続き金型研磨を同じＮＣソフ
トを使って行うことも出来る。また、仕上げのレベルに
応じて研磨材の種類を、研削力のあるものから、研削力
はやや落ちるが鏡面つや出しが可能なものへ替えること
により、同じ加工機で連続して鏡面仕上げまで可能とな
った。FIG. 5 shows the surface of the object to be polished 8 having irregularities,
The abrasive grains 6 hardened with a paraffin wax 7 are applied in advance, and a magnetic field is applied between the rotating and oscillating permanent magnet 9 and the uneven object 8 to be polished, and a gap of 5 mm is 100 μm to 500 μm. This is an example in which the ferromagnetic particles 3 having a particle size of 1 are filled and the object 8 having irregularities such as a mold is polished. In this case, after making a shape with an NC milling machine, etc., using the same processing machine, replace the end mill at the tip with a permanent magnet for magnetic polishing, and then perform die polishing with the same NC software. I can. Also, depending on the finishing level, the type of abrasive material can be changed from one with grinding power to one with a slightly lower grinding power but with a mirror-like finish, which allows continuous mirror finishing with the same processing machine. became.
【００１４】図６は、パラフィン系ワックス７で固めた
研磨砥粒６をあらかじめ塗布した平板状被研磨物１０
を、２個の向かい合った永久磁石１の間に、左右等間隔
の、１ｍｍ〜３ｍｍの間隙をもたせセットし、その間隙
に２００μｍ〜３００μｍの粒径の強磁性体粒子３を充
填させ、永久磁石１間に平板状被研磨物１０を上下左右
に摺動させて研磨した例である。この場合も前記の例と
同様に、研磨のレベルに合わせた研磨砥粒を選択するこ
とができる。FIG. 6 shows a plate-shaped object 10 to be polished, to which abrasive grains 6 hardened with paraffin wax 7 have been applied in advance.
Between the two facing permanent magnets 1 with a left-right equidistant gap of 1 mm to 3 mm set, and the gap is filled with ferromagnetic particles 3 having a particle diameter of 200 μm to 300 μm. This is an example in which the flat object 10 to be polished is slid vertically and horizontally between 1 and 1, and is polished. Also in this case, similar to the above-mentioned example, it is possible to select the polishing abrasive grains according to the polishing level.
【００１５】[0015]
【発明の効果】以上の実施例からわかるように、本発明
は磁気研磨装置の磁気回路を全て強磁性材料にて構成す
ることにより、磁気回路に発生する磁界が従来の数１０
倍と大きくでき研磨装置の小型化が計れた。また、従来
は研磨砥粒層の厚さのばらつきにより研磨量の制御が困
難であり均一な研磨ができにくかったが、本発明は強磁
性体粒子と研磨砥粒を別体にしたことにより、磁気回路
に発生する磁界が安定するため、制御が容易になり、均
一な研磨が可能となった。また、永久磁石と被研磨物と
の間隙が大きくても磁気回路に生ずる磁界は従来ほど変
化しないため、凹凸の有る物の研磨も、均一な研磨面を
得ることができる。又、強磁性体粒子と研磨砥粒を別体
にしたことにより、従来は時間の経過で研磨能力が劣化
した時、磁性研磨材を全て交換しなければならなかった
が、本発明の方法によれば、ワックスと混合した研磨砥
粒または研磨砥粒のみを加工中に補給することができる
ため、時間の経過によって研磨量が低下することがな
く、しかも、切削加工から研磨まで被研磨物を機械から
着脱することなくできるため、加工時間の短縮が計れ
た。以上、本発明は優れた効果を有するものである。As can be seen from the above embodiments, according to the present invention, since the magnetic circuit of the magnetic polishing apparatus is entirely made of a ferromagnetic material, the magnetic field generated in the magnetic circuit is equal to that of the conventional one.
The size was doubled and the polishing machine was downsized. Further, conventionally it was difficult to control the amount of polishing due to the variation in the thickness of the polishing abrasive grain layer, it was difficult to perform uniform polishing, the present invention, by making the ferromagnetic particles and polishing abrasive grains separate, Since the magnetic field generated in the magnetic circuit is stable, control is easy and uniform polishing is possible. Further, even if the gap between the permanent magnet and the object to be polished is large, the magnetic field generated in the magnetic circuit does not change as much as in the conventional case, so that even with the object having irregularities, a uniform polished surface can be obtained. Further, since the ferromagnetic particles and the abrasive grains are separated, conventionally, when the polishing ability deteriorated with the passage of time, it was necessary to replace all the magnetic abrasives. According to this, since the polishing abrasive grains mixed with wax or only the polishing abrasive grains can be replenished during the processing, the polishing amount does not decrease with the passage of time, and moreover, the workpiece to be polished from cutting processing to polishing Since it can be done without attaching and detaching from the machine, the processing time was shortened. As described above, the present invention has excellent effects.
【図１】本発明の磁気研磨方法の代表的な装置の全体側
面図。FIG. 1 is an overall side view of a typical apparatus for a magnetic polishing method of the present invention.
【図２】従来の磁気研磨方法で使用した磁性研磨材粒子
の断面図。FIG. 2 is a cross-sectional view of magnetic abrasive particles used in a conventional magnetic polishing method.
【図３】本発明の磁気研磨方法の図１に示す装置の研磨
部分の拡大側面図で、ワックスで固めた研磨砥粒を、被
研磨物に塗布した場合の図。3 is an enlarged side view of a polishing portion of the apparatus shown in FIG. 1 of the magnetic polishing method of the present invention, showing a case where polishing abrasive grains hardened with wax are applied to an object to be polished.
【図４】本発明の磁気研磨方法の、強磁性体粒子をワッ
クス及び研磨砥粒と混合し、円筒を研磨している部分拡
大斜視図。FIG. 4 is a partially enlarged perspective view of a magnetic polishing method of the present invention in which ferromagnetic particles are mixed with wax and abrasive grains to polish a cylinder.
【図５】本発明の磁気研磨方法で凹凸の有る金型等に、
ワックスで固めた研磨砥粒を塗布し、強磁性体粒子で研
磨している部分拡大斜視図。FIG. 5 shows a mold or the like having irregularities by the magnetic polishing method of the present invention,
FIG. 4 is a partially enlarged perspective view of applying abrasive grains hardened with wax and polishing with ferromagnetic particles.
【図６】本発明の磁気研磨方法の、平板両面研磨の部分
拡大斜視図。FIG. 6 is a partially enlarged perspective view of flat plate double-side polishing in the magnetic polishing method of the present invention.
【図７】本発明の磁気研磨方法の磁界の強さを説明する
永久磁石と被研磨物間の従来方法の部分拡大断面図。FIG. 7 is a partially enlarged cross-sectional view of a conventional method for explaining the strength of a magnetic field of the magnetic polishing method of the present invention between a permanent magnet and an object to be polished.
１．永久磁石 ２．円筒状被研磨物 ３．フェライトまたはパーマロイ等の強磁性体粒子 ４．磁性研磨材の強磁性体粒子 ５．強磁性体粒子と金属結合した研磨砥粒 ６．研磨砥粒 ７．油性またはパラフィン系ワックス ８．凹凸のある被研磨物 ９．回転する永久磁石 １０．平板状被研磨物 １１．被研磨物の回転または揺動方向 １２．磁界の方向 ａ．磁性研磨材の粒径 ｂ．研磨砥粒の粒径 Ｇ．永久磁石と被研磨物の間隙 1. Permanent magnet 2. Cylindrical object to be polished 3. Ferromagnetic particles such as ferrite or permalloy 4. 4. Ferromagnetic particles of magnetic abrasives 5. Abrasive grains that are metal-bonded with ferromagnetic particles. Abrasive grain 7. Oily or paraffin wax 8. Object to be polished 9. Rotating permanent magnet 10. Flat object to be polished 11. Rotation or swing direction of the object to be polished 12. Direction of magnetic field a. Particle size of magnetic abrasive b. Grain size of abrasive grains G. Gap between permanent magnet and object to be polished
Claims (3)
子、油性ワックス等で固められた研磨砥粒、より構成さ
れ、被研磨物と永久磁石を相対的に回転あるいは揺動さ
せる磁気研磨方法において、被研磨物表面に油性ワック
ス等で固めた研磨砥粒を塗布し、強磁性体粒子を研磨砥
粒と別体で、永久磁石と被研磨物との間隙に充填したこ
とを特徴とする磁気研磨方法。1. A magnetic field comprising a permanent magnet facing an object to be polished, ferromagnetic particles, abrasive grains hardened with oily wax, etc., for rotating or rocking the object to be polished and the permanent magnet relatively. In the polishing method, polishing abrasive particles hardened with an oily wax or the like are applied to the surface of the object to be polished, and the ferromagnetic particles are separate from the abrasive particles and are filled in the gap between the permanent magnet and the object to be polished. And magnetic polishing method.
載の強磁性体粒子と研磨砥粒を別体で油性ワックス等と
混合し、永久磁石と被研磨物との間隙に充填したことを
特徴とする、請求項１記載の磁気研磨方法。2. In the magnetic polishing method, the ferromagnetic particles according to claim 1 and the abrasive grains are separately mixed with oil wax or the like, and the mixture is filled in the gap between the permanent magnet and the object to be polished. The magnetic polishing method according to claim 1, which is characterized in that:
は２の研磨途中または初期において、請求項１記載の研
磨砥粒または油性ワックス等で固めた研磨砥粒を永久磁
石と被研磨物との間隙に補給したことを特徴とする、請
求項１記載の磁気研磨方法。3. In the above magnetic polishing method, the polishing abrasive grains according to claim 1 or the polishing abrasive grains hardened with oily wax or the like during the polishing or the initial stage of polishing according to claim 1 or a permanent magnet and an object to be polished. The magnetic polishing method according to claim 1, wherein the magnetic polishing is replenished in a gap between
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3209343A JPH0550377A (en) | 1991-08-21 | 1991-08-21 | Magnetogrinding method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3209343A JPH0550377A (en) | 1991-08-21 | 1991-08-21 | Magnetogrinding method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0550377A true JPH0550377A (en) | 1993-03-02 |
Family
ID=16571383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3209343A Pending JPH0550377A (en) | 1991-08-21 | 1991-08-21 | Magnetogrinding method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0550377A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010052123A (en) * | 2008-08-29 | 2010-03-11 | Utsunomiya Univ | Ultraprecise magnetic polishing method and polishing slurry for ultraprecise magnetic polishing |
| JP2019014004A (en) * | 2017-07-06 | 2019-01-31 | 日本特殊陶業株式会社 | Production method for ceramic product |
| JP2019030924A (en) * | 2017-08-07 | 2019-02-28 | 国立大学法人宇都宮大学 | Magnetic polishing method and magnetic polishing device |
| US11940683B2 (en) | 2019-06-26 | 2024-03-26 | Applied Materials, Inc. | Flexible multi-layered cover lens stacks for foldable displays |
-
1991
- 1991-08-21 JP JP3209343A patent/JPH0550377A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010052123A (en) * | 2008-08-29 | 2010-03-11 | Utsunomiya Univ | Ultraprecise magnetic polishing method and polishing slurry for ultraprecise magnetic polishing |
| JP2019014004A (en) * | 2017-07-06 | 2019-01-31 | 日本特殊陶業株式会社 | Production method for ceramic product |
| JP2019030924A (en) * | 2017-08-07 | 2019-02-28 | 国立大学法人宇都宮大学 | Magnetic polishing method and magnetic polishing device |
| US11940683B2 (en) | 2019-06-26 | 2024-03-26 | Applied Materials, Inc. | Flexible multi-layered cover lens stacks for foldable displays |
| US11940682B2 (en) | 2019-06-26 | 2024-03-26 | Applied Materials, Inc. | Flexible multi-layered cover lens stacks for foldable displays |
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