JPH0543096B2 - - Google Patents
Info
- Publication number
- JPH0543096B2 JPH0543096B2 JP60222346A JP22234685A JPH0543096B2 JP H0543096 B2 JPH0543096 B2 JP H0543096B2 JP 60222346 A JP60222346 A JP 60222346A JP 22234685 A JP22234685 A JP 22234685A JP H0543096 B2 JPH0543096 B2 JP H0543096B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- insulating film
- liquid crystal
- substrate
- crystal display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002184 metal Substances 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 14
- 239000004973 liquid crystal related substance Substances 0.000 claims description 11
- 239000012212 insulator Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
Description
【発明の詳細な説明】
＜産業上の利用分野＞
本発明は、金属・酸化絶縁膜・金属の構造を有
する非線形抵抗素子（以下、MIM素子と略す）
を組み込んだ液晶表示素子の製造方法に関する。[Detailed Description of the Invention] <Industrial Application Field> The present invention provides a nonlinear resistance element (hereinafter abbreviated as MIM element) having a structure of metal, oxide insulating film, and metal.
The present invention relates to a method of manufacturing a liquid crystal display element incorporating the above.
＜発明の概要＞
本発明は、MIM素子を形成した基板上に、上
側金属以外の金属部に絶縁膜を形成し、その上面
に透明画素電極が前記上側金属を覆うように形成
したことにより、高良品率、コストダウンを可能
とするものである。<Summary of the Invention> The present invention includes forming an insulating film on a metal part other than the upper metal on a substrate on which an MIM element is formed, and forming a transparent pixel electrode on the upper surface of the insulating film so as to cover the upper metal. This enables a high quality product rate and cost reduction.
＜従来の技術＞
第２図に従来より用いられているMIM素子を
組み込んだ液晶表示素子の片側基板の斜視図を示
す。この基板に液晶を配向させる処理をした後、
透明電極を有する対向基板（図示せず）を貼り合
せ、液晶を注入、封止することによりMIM素子
を組み込んだ液晶表示素子が実現される。前記液
晶表示素子は、現在多く用いられているTN型液
晶表示素子のコントラストを大きく改善するもの
として期待を集めている。<Prior Art> FIG. 2 shows a perspective view of one side substrate of a liquid crystal display element incorporating a conventionally used MIM element. After processing to orient the liquid crystal on this substrate,
A liquid crystal display element incorporating an MIM element is realized by bonding a counter substrate (not shown) having a transparent electrode, injecting liquid crystal, and sealing. The liquid crystal display element is attracting attention as it can significantly improve the contrast of the currently widely used TN type liquid crystal display element.
第２図において、ガラス基板１１上にTaなど
の配線用の下側金属１２、及びMIM素子の面積
を規制する絶縁体としての絶縁膜１３を形成し、
下側金属１２の側面に酸化絶縁膜１４を形成す
る。そして、上側金属１５を形成して、下側金属
１２−酸化絶縁膜１４−上側金属１５による
MIM素子を完成させる。さらにこの後、上側金
属１５の一部と接続されるような形で透明画素電
極１６を形成し、液晶表示素子の一方の電極基板
とする。 In FIG. 2, a lower metal 12 for wiring such as Ta and an insulating film 13 as an insulator for regulating the area of the MIM element are formed on a glass substrate 11,
An oxide insulating film 14 is formed on the side surface of the lower metal 12. Then, the upper metal 15 is formed, and the lower metal 12 - the oxide insulating film 14 - the upper metal 15 are formed.
Complete the MIM element. Furthermore, after this, a transparent pixel electrode 16 is formed so as to be connected to a part of the upper metal 15, and serves as one electrode substrate of the liquid crystal display element.
＜発明が解決しようとする問題点＞
ところが、上記のようにして製造すると、下側
金属１２は、透明画素電極１６の間に配置されね
ばならず、その線幅は数十ミクロンとなり、断線
が多発する。さらに、上側金属１５、透明画素電
極１６を形成する際のマスク合せ精度は数ミクロ
ンになり、良品率の向上は非常に困難である。ま
た、配線用の下側金属１２が透明画素電極１６の
間に配されることから開口率が悪化する。<Problems to be Solved by the Invention> However, when manufactured as described above, the lower metal 12 must be placed between the transparent pixel electrodes 16, the line width of which is several tens of microns, and disconnection may occur. Occurs frequently. Furthermore, the mask alignment accuracy when forming the upper metal 15 and the transparent pixel electrode 16 is several microns, making it extremely difficult to improve the yield rate. Furthermore, since the lower metal 12 for wiring is disposed between the transparent pixel electrodes 16, the aperture ratio deteriorates.
本発明は、上記の欠点を解消する為に成された
ものである。 The present invention has been made in order to eliminate the above-mentioned drawbacks.
＜問題点を解決するための手段＞
本発明は、MIM素子を形成した基板上に感光
性の絶縁体を塗布する。そして、基板裏面から露
光することにより、上側金属以外の金属部に絶縁
膜を形成し、その上面に透明画素電極が前記上側
金属を覆うように形成したことを特徴とする。<Means for Solving the Problems> In the present invention, a photosensitive insulator is coated on a substrate on which an MIM element is formed. The present invention is characterized in that an insulating film is formed on a metal portion other than the upper metal by exposing from the back surface of the substrate, and a transparent pixel electrode is formed on the upper surface of the insulating film so as to cover the upper metal.
＜作用＞
上記の方法で製造したことにより、配線の下側
金属が透明画素電極の下に配し得、マスク合わせ
精度が数百ミクロンで良くなり、又、透明画素電
極の間隔を充分小さくして開口率を向上できる。<Function> By manufacturing with the above method, the lower metal of the wiring can be placed under the transparent pixel electrode, the mask alignment accuracy is improved to several hundred microns, and the interval between the transparent pixel electrodes can be made sufficiently small. can improve the aperture ratio.
＜実施例＞
第１図ａ〜ｆは本発明の一実施例の製造工程を
順次図式的に示した斜視図である。<Example> Figures 1a to 1f are perspective views sequentially showing schematically the manufacturing process of an example of the present invention.
(a) パイレツクスガラスなどのガラス基板１上に
Taを約4000Åの厚さでスパツタリングにより
形成し、この上にポリイミドを約4000Å塗布
し、ドライエツチング法を用いて２層同時にパ
ターニングすることにより、ガラス基板１上に
下側金属２と絶縁膜３を形成する。(a) On a glass substrate 1 such as Pyrex glass
By forming Ta to a thickness of about 4000 Å by sputtering, applying polyimide to a thickness of about 4000 Å on top, and patterning the two layers simultaneously using a dry etching method, the lower metal 2 and the insulating film 3 are formed on the glass substrate 1. form.
(b) 次に前記ガラス基板１を0.01重量％水溶液中
で陽極酸化を行ない、下側金属２の側面部に酸
化絶縁膜４を約500Åの厚さで形成する。(b) Next, the glass substrate 1 is anodized in a 0.01% by weight aqueous solution to form an oxide insulating film 4 on the side surface of the lower metal 2 to a thickness of about 500 Å.
(c) さらに、Crを約2000Å形成し、パターニン
グして上側金属５を形成する。(c) Furthermore, approximately 2000 Å of Cr is formed and patterned to form the upper metal 5.
(d) 次に、感光性ポリイミド等の絶縁体６を約
4000Å塗布し、裏面より露光する。(d) Next, insulator 6 such as photosensitive polyimide is
Apply 4000Å and expose from the back side.
(e) このとき、下側金属２上および上側金属５上
は感光せず、感光性の絶縁体６は残らない。す
なわち下側金属２上の絶縁膜３と上側金属５が
露出した形となり、他の部分は全て感光性の絶
縁体６にて覆われている。(e) At this time, the areas on the lower metal 2 and the upper metal 5 are not exposed to light, and no photosensitive insulator 6 remains. That is, the insulating film 3 on the lower metal 2 and the upper metal 5 are exposed, and all other parts are covered with a photosensitive insulator 6.
(f) この基板上に上側金属５を覆うようにして
ITOなどの透明電極を形成し、パターニングし
て透明画素電極７とする。(f) Cover the upper metal 5 on this board.
A transparent electrode such as ITO is formed and patterned to form a transparent pixel electrode 7.
以降の工程は従来の液晶表示素子と同様にして
製造される。 The subsequent steps are the same as those for conventional liquid crystal display elements.
＜発明の効果＞
以上のように本発明を用いれば、透明画素電極
間に金属配線を配する必要がないため、配線幅を
充分にとれる。配線と画素電極のマスク合せ精度
が数百ミクロンでよい。画素電極の間隔を充分小
さくできる。など多くの利点があり、ひいては高
良品率、コストダウンが可能となる。<Effects of the Invention> As described above, if the present invention is used, it is not necessary to arrange metal wiring between transparent pixel electrodes, so that a sufficient wiring width can be secured. The precision of mask alignment between wiring and pixel electrodes is only a few hundred microns. The interval between pixel electrodes can be made sufficiently small. It has many advantages such as high yield rate and cost reduction.
第１図ａ，ｂ，ｃ，ｄ，ｅ，ｆは本発明の一実
施例の製造工程を示す斜視図、第２図は従来例を
示す斜視図である。
１……ガラス基板、２……下側金属、３……絶
縁膜、４……酸化絶縁膜、５……上側金属、６…
…感光性の絶縁体、７……透明画素電極。
Figures 1a, b, c, d, e, and f are perspective views showing the manufacturing process of an embodiment of the present invention, and Figure 2 is a perspective view showing a conventional example. DESCRIPTION OF SYMBOLS 1...Glass substrate, 2...Lower metal, 3...Insulating film, 4...Oxide insulating film, 5...Upper metal, 6...
...Photosensitive insulator, 7...Transparent pixel electrode.
Claims (1)
形抵抗素子を組み込んだ液晶表示素子において、 上記非線形抵抗素子を形成した基板上に感光性
の絶縁体を塗布する工程、 上記基板裏面からの露光により上記感光性の絶
縁体を感光し除去する工程、 及び、上記除去により感光性の絶縁体から露出
した、上記非線形抵抗素子の上側金属を覆つて透
明画素電極を形成する工程、とを有することを特
徴とする液晶表示素子の製造方法。[Scope of Claims] 1. In a liquid crystal display device incorporating a nonlinear resistance element having a metal/oxide insulating film/metal structure, a step of coating a photosensitive insulator on a substrate on which the nonlinear resistance element is formed; A step of exposing and removing the photosensitive insulator by exposure from the back side of the substrate, and a step of forming a transparent pixel electrode by covering the upper metal of the nonlinear resistance element exposed from the photosensitive insulator by the removal. A method for manufacturing a liquid crystal display element, comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60222346A JPS6280629A (en) | 1985-10-03 | 1985-10-03 | Production of liquid crystal display element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60222346A JPS6280629A (en) | 1985-10-03 | 1985-10-03 | Production of liquid crystal display element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6280629A JPS6280629A (en) | 1987-04-14 |
| JPH0543096B2 true JPH0543096B2 (en) | 1993-06-30 |
Family
ID=16780899
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60222346A Granted JPS6280629A (en) | 1985-10-03 | 1985-10-03 | Production of liquid crystal display element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6280629A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63265286A (en) * | 1987-04-23 | 1988-11-01 | セイコーエプソン株式会社 | Active matrix liquid crystal panel |
| JP2600929B2 (en) * | 1989-01-27 | 1997-04-16 | 松下電器産業株式会社 | Liquid crystal image display device and method of manufacturing the same |
-
1985
- 1985-10-03 JP JP60222346A patent/JPS6280629A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6280629A (en) | 1987-04-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |