JPH04323620A - Color filter - Google Patents
Color filterInfo
- Publication number
- JPH04323620A JPH04323620A JP3092249A JP9224991A JPH04323620A JP H04323620 A JPH04323620 A JP H04323620A JP 3092249 A JP3092249 A JP 3092249A JP 9224991 A JP9224991 A JP 9224991A JP H04323620 A JPH04323620 A JP H04323620A
- Authority
- JP
- Japan
- Prior art keywords
- zinc oxide
- color filter
- target
- film
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 46
- 239000011787 zinc oxide Substances 0.000 claims abstract description 23
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 18
- 238000004544 sputter deposition Methods 0.000 claims description 16
- 230000001681 protective effect Effects 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 10
- 230000005540 biological transmission Effects 0.000 abstract description 7
- 238000010438 heat treatment Methods 0.000 abstract description 6
- 239000001257 hydrogen Substances 0.000 abstract description 6
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052786 argon Inorganic materials 0.000 abstract description 5
- 239000007789 gas Substances 0.000 abstract description 5
- 229910052782 aluminium Inorganic materials 0.000 abstract description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 40
- 239000004973 liquid crystal related substance Substances 0.000 description 11
- 239000010410 layer Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000009291 secondary effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Optical Filters (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、カラーフィルターに関
し、とくに透明電極膜を有する液晶表示装置用のカラー
フィルターに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter, and more particularly to a color filter for a liquid crystal display device having a transparent electrode film.
【０００２】0002
【従来の技術】液晶表示装置は、透明電極を設けたガラ
ス等の透明な基板を数μｍ程度のギャップを設けてその
間に液晶物質を封入し、電極間に印加した電圧によって
液晶を一定の方向に配向させて透明部分と不透明部分を
形成して画像を表示している。カラー液晶表示装置はい
ずれかの透明基板上に光の三原色に対応する赤（Ｒ）、
緑（Ｇ）、青（Ｂ）の三色のカラーフィルターを設けて
いる。[Prior Art] A liquid crystal display device consists of a transparent substrate, such as glass, provided with transparent electrodes, with a gap of approximately several micrometers, and a liquid crystal substance sealed in between.The liquid crystal is oriented in a certain direction by a voltage applied between the electrodes. The image is displayed by aligning the film to form transparent and opaque parts. A color liquid crystal display device displays red (R), which corresponds to the three primary colors of light, on one of the transparent substrates.
It has three color filters: green (G) and blue (B).
【０００３】カラー液晶表示装置用のカラーフィルター
は、透明基板、着色層、保護層、透明電極という順に積
層されており、ＲＧＢの三原色の位置に対向する電極あ
るいは薄膜トランジスタを形成した透明基板とを数μｍ
の間隔を保持し液晶物質を封入して液晶表示装置を形成
している。[0003] Color filters for color liquid crystal display devices are laminated in this order: a transparent substrate, a colored layer, a protective layer, and a transparent electrode. μm
A liquid crystal display device is formed by filling a liquid crystal material with a gap of .
【０００４】0004
【発明が解決しようとする課題】カラーフィルターはガ
ラスなどの透明基板上に顔料分散法、染色法、電着法、
印刷法等によってＲ、Ｇ、Ｂの三原色を所定の形状とし
た着色層を形成し、着色層上には着色層を保護する目的
で保護層を形成し、更に保護層の上には、液晶を駆動す
るための透明電極が形成されている。[Problems to be Solved by the Invention] Color filters are produced by pigment dispersion, dyeing, electrodeposition, etc. on a transparent substrate such as glass.
A colored layer with the three primary colors of R, G, and B in a predetermined shape is formed by a printing method, a protective layer is formed on the colored layer for the purpose of protecting the colored layer, and a liquid crystal layer is further formed on the protective layer. A transparent electrode for driving is formed.
【０００５】透明電極には、酸化錫、酸化インジウムお
よびＩＴＯと称するそれらの複合酸化物が使用されてい
る。透明電極の成膜方法には、蒸着、イオンプレーティ
ング、スパッタリング等の各種の方法があるが、カラー
フィルターの透明電極の基体となる保護膜は合成樹脂で
形成されているので保護膜の耐熱性の面から比較的低温
での成膜が可能な方法が求められている。このためにカ
ラーフィルター用の透明電極の製造にはスパッタリング
が広く用いられている。[0005] Tin oxide, indium oxide, and a composite oxide thereof called ITO are used for the transparent electrode. There are various methods for forming transparent electrodes, such as vapor deposition, ion plating, and sputtering. However, since the protective film that forms the base of the transparent electrode of the color filter is made of synthetic resin, the heat resistance of the protective film is limited. In view of this, there is a need for a method that allows film formation at relatively low temperatures. For this reason, sputtering is widely used to manufacture transparent electrodes for color filters.
【０００６】蒸着、スパッタリング等の薄膜形成方法で
製造したＩＴＯ膜等の薄膜はその成膜条件によって得ら
れる膜の特性が異なることが知られている。It is known that thin films such as ITO films produced by thin film forming methods such as vapor deposition and sputtering have different properties depending on the film forming conditions.
【０００７】カラーフィルター用の透明電極として使用
されるＩＴＯ膜には、各種の特性が要求されているが、
なかでも、カラー液晶表示装置の特性に影響を与える光
の透過特性やＩＴＯ膜の熱による安定性は重要な要素で
ある。[0007] ITO films used as transparent electrodes for color filters are required to have various properties.
Among these, the light transmission characteristics and the thermal stability of the ITO film, which affect the characteristics of the color liquid crystal display device, are important factors.
【０００８】第２図（Ｂ）には、ＩＴＯ膜の光の透過特
性の一例を示すが、このＩＴＯ膜は、従来からの成膜条
件であるアルゴン圧力３×１０−３ｔｏｒｒで成膜した
ものであるが、単波長、特に青色光（λ＝４５０ｎｍ）
付近での吸収が大きいことを示している。したがって、
ＩＴＯ膜を有するカラーフィルターは青の透過率が低下
するために自然なカラー画像を得るためには問題があっ
た。FIG. 2(B) shows an example of the light transmission characteristics of an ITO film, which was formed under the conventional film forming conditions of argon pressure of 3 x 10-3 torr. However, single wavelength light, especially blue light (λ=450 nm)
This shows that the absorption in the vicinity is large. therefore,
A color filter having an ITO film has a problem in obtaining a natural color image because of a decrease in blue transmittance.
【０００９】また、ＩＴＯ膜は熱的な安定性に劣るので
、カラーフィルターの製造工程において、２００℃以上
の高温にさらされると膜の比抵抗が増加したり、透過率
の変化が生じることがあった。[0009] Furthermore, since the ITO film has poor thermal stability, when exposed to high temperatures of 200°C or higher during the color filter manufacturing process, the specific resistance of the film may increase or the transmittance may change. there were.
【００１０】0010
【課題を解決するための手段】本発明者らは上記した問
題点を解決する手段を検討した結果、ＩＴＯ膜に代えて
酸化亜鉛あるいはアルミナをドープした酸化亜鉛からな
る透明電極を成膜したカラーフィルターは、光の透過特
性も良好で、カラーフィルターの製造工程で曝される程
度の温度では透明電極の特性は悪影響を受けないことを
見いだしたものである。[Means for Solving the Problems] The present inventors have investigated means for solving the above-mentioned problems, and have developed a collar in which a transparent electrode made of zinc oxide or zinc oxide doped with alumina is formed instead of the ITO film. It was discovered that the filter also has good light transmission properties, and the properties of the transparent electrode are not adversely affected by the temperatures exposed in the color filter manufacturing process.
【００１１】すなわち、本発明のカラーフィルターの透
明電極は、ガラス基板上に形成した着色層上に保護膜を
形成し、保護膜上にスパッタリングによって成膜するも
のであるが、とくに高周波マグネトロンスパッタリング
法によって、酸化亜鉛のターゲットあるいはドーピング
剤としてアルミナを混合した酸化亜鉛をターゲットとし
て成膜することによって、比抵抗が小さく透明電極とし
ての特性に優れた透明電極膜を製造することができる。That is, the transparent electrode of the color filter of the present invention is formed by forming a protective film on a colored layer formed on a glass substrate, and forming a film on the protective film by sputtering, particularly by high frequency magnetron sputtering method. By forming a film using a zinc oxide target or a zinc oxide mixed with alumina as a doping agent as a target, it is possible to produce a transparent electrode film with low resistivity and excellent properties as a transparent electrode.
【００１２】透明電極膜のスパッタリング条件は、水素
分圧を１×１０−５ｔｏｒｒないし４×１０−５ｔｏｒ
ｒとした圧力が６×１０−４ｔｏｒｒ〜４×１０−２ｔ
ｏｒｒのアルゴンと水素の混合ガスを放電ガスとするも
のであるが、透明電極を形成する基板の温度は成膜する
透明電極の比抵抗に影響を及ぼし、基板の温度が低い方
が比抵抗が小さな膜を得ることができるので、基板の温
度は低い方が好ましい。The sputtering conditions for the transparent electrode film are hydrogen partial pressure of 1×10-5 torr to 4×10-5 torr.
The pressure set to r is 6 x 10-4 torr to 4 x 10-2 t.
The discharge gas is a mixed gas of argon and hydrogen, but the temperature of the substrate on which the transparent electrode is formed affects the specific resistance of the transparent electrode to be formed, and the lower the substrate temperature, the lower the specific resistance. Lower substrate temperatures are preferred because smaller films can be obtained.
【００１３】基板はとくに加熱をしなくてもスパッタリ
ング時には温度の自然上昇が生じ、百数十℃に加熱され
るが、この程度の温度であれば十分に比抵抗の低い膜が
得られる。[0013] Even if the substrate is not particularly heated, the temperature naturally rises during sputtering and is heated to several tens of degrees Celsius, but a film with sufficiently low resistivity can be obtained at this temperature.
【００１４】また、本発明で使用する酸化亜鉛からなる
透明電極は、エッチング特性や熱安定性の面でも優れた
特性を有している。[0014] Furthermore, the transparent electrode made of zinc oxide used in the present invention has excellent properties in terms of etching properties and thermal stability.
【００１５】[0015]
【作用】本発明は、基板上に形成した着色層上に設けた
保護膜上に透明電極を設けたカラーフィルターにおいて
、透明電極を酸化亜鉛あるいはアルミナをドープした酸
化亜鉛の透明な薄膜としたものであって、可視光線の透
過特性が良好で、色の特性に優れたカラー画像の表示が
可能なカラーフィルターが得られる。[Operation] The present invention provides a color filter in which a transparent electrode is provided on a protective film provided on a colored layer formed on a substrate, in which the transparent electrode is a transparent thin film of zinc oxide or zinc oxide doped with alumina. Thus, a color filter can be obtained that has good visible light transmission characteristics and can display a color image with excellent color characteristics.
【００１６】以下に本発明の実施例を示し、更に詳細に
説明する。Examples of the present invention will be shown below and explained in more detail.
【００１７】[0017]
【実施例】図面を参照して本発明を説明する。図１は本
発明のカラーフィルターを製造するスパッタリング装置
の一例を示すものである。スパッタリング装置１は、透
明電極を形成するカラーフィルター２を導入するロード
室３、カラーフィルターを移送する搬送装置４、カラー
フィルターを所定の温度に加熱する加熱室５、スパッタ
リングによって透明電極を形成する成膜室６、基板の温
度を冷却する冷却室７、基板を取り出すためのアンロー
ド室８から構成されている。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be explained with reference to the drawings. FIG. 1 shows an example of a sputtering apparatus for manufacturing the color filter of the present invention. The sputtering apparatus 1 includes a load chamber 3 into which a color filter 2 for forming a transparent electrode is introduced, a transport device 4 for transporting the color filter, a heating chamber 5 for heating the color filter to a predetermined temperature, and a structure for forming a transparent electrode by sputtering. It consists of a film chamber 6, a cooling chamber 7 for cooling the temperature of the substrate, and an unloading chamber 8 for taking out the substrate.
【００１８】ロード室、成膜室、アンロード室はそれぞ
れ排気装置９、１０、１１に結合されており、成膜室６
を十分に真空ポンプで真空排気した後に、アルゴンおよ
び水素からなる放電ガスを所定の分圧となるように供給
し、高周波電圧を印加したターゲット１２の近傍には陽
極１３を配置し、ターゲットの放電面とは逆の面には陽
極に向かう電子に螺旋運動を起こす磁石１４を設けてい
る。The loading chamber, the film forming chamber, and the unloading chamber are connected to exhaust devices 9, 10, and 11, respectively, and the film forming chamber 6
After sufficiently evacuating with a vacuum pump, a discharge gas consisting of argon and hydrogen is supplied to a predetermined partial pressure, and an anode 13 is placed near the target 12 to which a high frequency voltage is applied, and the discharge of the target is performed. A magnet 14 is provided on the opposite surface to cause a spiral movement in the electrons heading toward the anode.
【００１９】透明電極を形成すべきカラーフィルター２
は加熱室５において所定の温度に加熱された後に、成膜
室に送られターゲットから所定の距離に配置して透明電
極を形成し、目的とする厚さの膜を形成した後にアンロ
ード室から取り出す。Color filter 2 on which transparent electrodes are to be formed
After being heated to a predetermined temperature in the heating chamber 5, it is sent to the film forming chamber and placed at a predetermined distance from the target to form a transparent electrode, and after forming a film of the desired thickness, it is sent from the unloading chamber. Take it out.
【００２０】ターゲットには酸化亜鉛もしくはアルミナ
を混合した酸化亜鉛のターゲット、または酸化亜鉛ター
ゲット上にアルミナ板を面積比で１ないし１０％として
設置したものを使用し得る。[0020] The target may be a zinc oxide target mixed with zinc oxide or alumina, or a zinc oxide target with an alumina plate set at an area ratio of 1 to 10%.
【００２１】実施例１
大きさ３００ｍｍ×３２０ｍｍ、厚さ１．１ｍｍのガラ
ス基板（旭硝子（株）製ＡＬ材）を充分に洗浄し、その
上に、赤色感光性樹脂を１ないし２μｍの膜厚になるよ
うに塗布し、その後温度７０℃で３０分間オ−ブン中で
乾燥させ、水銀ランプを用いて露光し、水によるスプレ
ー現像を１分間行い、赤色画素を形成すべき領域に赤色
のレリーフ画像を形成し、さらに１５０℃で３０分間、
加熱硬化させた。Example 1 A glass substrate (AL material manufactured by Asahi Glass Co., Ltd.) with a size of 300 mm x 320 mm and a thickness of 1.1 mm was thoroughly cleaned, and a red photosensitive resin was applied on it to a thickness of 1 to 2 μm. The film was then dried in an oven for 30 minutes at a temperature of 70°C, exposed using a mercury lamp, and spray developed with water for 1 minute to create a red relief in the area where the red pixels were to be formed. Form an image and further heat at 150°C for 30 minutes.
Cured by heating.
【００２２】同様の工程を繰り返して、緑色画素を形成
すべき領域に緑色のレリーフ画素を形成し、青色画素を
形成すべき領域に青色のレリーフ画素を形成して着色層
を形成した。The same process was repeated to form a green relief pixel in the area where the green pixel was to be formed, and a blue relief pixel in the area where the blue pixel was to be formed, thereby forming a colored layer.
【００２３】続いて光硬化性アクリレートオリゴマーと
して、ビスフェノールＡアクリレート（分子量１５００
〜２０００）を５０重量部、多官能重合性モノマーとし
て、トリメチロールプロパントリアクリレート（日本化
薬製ＴＭＰＴＡ）を５０重量部、さらに重合開始剤とし
てイルガキュアー６５１（チバガイギー社製）２重量部
を混合した配合物を、エチルセルソルブアセテート２０
０重量部中に溶解させ、その溶液１０ｇを用いてスピン
コーターで前記着色層上に２．０μｍの厚さに塗布した
。塗布膜に接してフォトマスクを配置して、２．０ｋＷ
の超高圧水銀ランプによって着色層上のみに紫外線を１
０秒間照射した。 続いて温度２５℃の１，１，２，
２−テトラクロロエタンからなる現像液中に１分間浸漬
して、塗布膜の未硬化部分のみを除去した。Next, as a photocurable acrylate oligomer, bisphenol A acrylate (molecular weight 1500
~2000), 50 parts by weight of trimethylolpropane triacrylate (TMPTA manufactured by Nippon Kayaku) as a polyfunctional polymerizable monomer, and 2 parts by weight of Irgacure 651 (manufactured by Ciba Geigy) as a polymerization initiator. The formulation was treated with ethylcellosolve acetate 20
0 parts by weight, and 10 g of the solution was applied onto the colored layer to a thickness of 2.0 μm using a spin coater. A photomask is placed in contact with the coating film, and 2.0kW is applied.
Ultra-high-pressure mercury lamps are used to emit ultraviolet rays only on the colored layer.
Irradiated for 0 seconds. Next, 1, 1, 2 at a temperature of 25°C.
It was immersed in a developer consisting of 2-tetrachloroethane for 1 minute to remove only the uncured portion of the coating film.
【００２４】次に、得られた保護膜を形成した基板をス
パッタリング装置に入れ、１０−６ｔｏｒｒまで減圧し
た後に、水素分圧が４×１０−５ｔｏｒｒとなるように
アルゴンと水素の混合ガスを４×１０−４ｔｏｒｒ〜２
×１０−２ｔｏｒｒの圧力となるように成膜室に導入し
た。Next, the substrate on which the obtained protective film has been formed is placed in a sputtering device, and after the pressure is reduced to 10-6 torr, a mixed gas of argon and hydrogen is added to the sputtering device so that the hydrogen partial pressure becomes 4×10-5 torr. ×10-4torr~2
The film was introduced into the film forming chamber at a pressure of x10-2 torr.
【００２５】スパッタリング装置のターゲットと基板保
持具の間には１３．５６ＭＨｚ、１．５ｋＷの高周波電
力を供給し、ターゲットと基板の距離を８０ｍｍとし、
４０分間スパッタリングをして、厚さ０．２４μｍの透
明電極を形成した。A high frequency power of 13.56 MHz and 1.5 kW was supplied between the target and the substrate holder of the sputtering apparatus, and the distance between the target and the substrate was 80 mm.
Sputtering was performed for 40 minutes to form a transparent electrode with a thickness of 0.24 μm.
【００２６】得られた透明電極の比抵抗は９×１０−４
Ω・ｃｍであり、この透明電極の光の透過特性は図２（
Ａ）のように可視光線全域にわたりほぼ均一な特性を有
しており、カラーフィルターの色特性上、特に重要な青
色部（λ＝４５０ｎｍ）での透過率が９１％〜９２％で
あり、図２（Ｂ）に示すＩＴＯ膜の青色部（λ＝４５０
ｎｍ）での透過率８８％に比べて優れたものであった。The specific resistance of the obtained transparent electrode was 9×10−4
Ω・cm, and the light transmission characteristics of this transparent electrode are shown in Figure 2 (
As shown in A), it has almost uniform characteristics over the entire visible light range, and the transmittance in the blue region (λ = 450 nm), which is particularly important in terms of the color characteristics of color filters, is 91% to 92%. The blue part of the ITO film shown in 2(B) (λ=450
This was excellent compared to the transmittance of 88% at 100 nm).
【００２７】[0027]
【発明の効果】液晶を使用したカラーディスプレイ装置
に使用するカラーフィルターにおいて、有機物の被膜を
形成した基板上に形成する透明電極を酸化亜鉛、あるい
はアルミニウムをドープした酸化亜鉛からなる膜によっ
て形成したもので光の透過特性が可視光線全域にわたり
一様であるので、色の特性の良好なカラーフィルターが
得られると共に、透明電極に使用する酸化亜鉛はＩＴＯ
膜の材料に比べて資源的にも十分存在する安価な材料で
あるので製造コストが低いという副次的な効果も有する
。[Effect of the invention] In a color filter used in a color display device using liquid crystal, the transparent electrode formed on the substrate coated with an organic substance is formed of a film made of zinc oxide or zinc oxide doped with aluminum. Since the light transmission characteristics are uniform over the entire visible light range, a color filter with good color characteristics can be obtained, and the zinc oxide used for the transparent electrode is ITO.
Since it is an inexpensive material with sufficient resources compared to membrane materials, it also has the secondary effect of lower manufacturing costs.
【図１】本発明のカラーフィルターを製造するスパッタ
リング装置の一例を示す。FIG. 1 shows an example of a sputtering apparatus for producing a color filter of the present invention.
【図２】ＩＴＯ膜および酸化亜鉛膜の透過特性を示す。FIG. 2 shows the permeation characteristics of an ITO film and a zinc oxide film.
１…スパッタリング装置、２…カラーフィルター、３…
ロード室、４…搬送装置、５…加熱室、６…成膜室、７
…冷却室、８…アンロード室、９、１０、１１…排気装
置、１２…ターゲット、１３…陽極、１４…磁石、１５
…高圧電源1... Sputtering device, 2... Color filter, 3...
Loading chamber, 4...Transporting device, 5...Heating chamber, 6...Film forming chamber, 7
...Cooling chamber, 8...Unloading chamber, 9, 10, 11...Exhaust device, 12...Target, 13...Anode, 14...Magnet, 15
…High voltage power supply
Claims (1)
護膜上に透明電極を設けたカラーフィルターにおいて、
透明電極が酸化亜鉛あるいはアルミナをドープした酸化
亜鉛からなる透明電極を有することを特徴とするカラー
フィルター。 【請求項１】 透明電極が酸化亜鉛またはアルミナを
含む酸化亜鉛をターゲットとしたスパッタリングによっ
て形成したものであることを特徴とする請求項１記載の
カラーフィルター。Claim 1: A color filter in which a transparent electrode is provided on a protective film provided on a colored layer formed on a substrate,
A color filter characterized in that the transparent electrode is made of zinc oxide or zinc oxide doped with alumina. 1. The color filter according to claim 1, wherein the transparent electrode is formed by sputtering using zinc oxide or zinc oxide containing alumina as a target.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3092249A JPH04323620A (en) | 1991-04-23 | 1991-04-23 | Color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3092249A JPH04323620A (en) | 1991-04-23 | 1991-04-23 | Color filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04323620A true JPH04323620A (en) | 1992-11-12 |
Family
ID=14049154
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3092249A Pending JPH04323620A (en) | 1991-04-23 | 1991-04-23 | Color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04323620A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20080064269A (en) * | 2007-01-04 | 2008-07-09 | 주식회사 엘지화학 | Method for preparing zinc oxide-based thin film by sputtering and zinc oxide-based thin film prepared thereby |
| WO2009093580A1 (en) * | 2008-01-24 | 2009-07-30 | Ulvac, Inc. | Process for producing liquid crystal display device |
-
1991
- 1991-04-23 JP JP3092249A patent/JPH04323620A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20080064269A (en) * | 2007-01-04 | 2008-07-09 | 주식회사 엘지화학 | Method for preparing zinc oxide-based thin film by sputtering and zinc oxide-based thin film prepared thereby |
| WO2009093580A1 (en) * | 2008-01-24 | 2009-07-30 | Ulvac, Inc. | Process for producing liquid crystal display device |
| JP5193232B2 (en) * | 2008-01-24 | 2013-05-08 | 株式会社アルバック | Manufacturing method of liquid crystal display device |
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