JPH04255288A - Manufacture of glass woven fabric for laminated board use - Google Patents
Manufacture of glass woven fabric for laminated board useInfo
- Publication number
- JPH04255288A JPH04255288A JP3809491A JP3809491A JPH04255288A JP H04255288 A JPH04255288 A JP H04255288A JP 3809491 A JP3809491 A JP 3809491A JP 3809491 A JP3809491 A JP 3809491A JP H04255288 A JPH04255288 A JP H04255288A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- fabric
- tensile strength
- silicate
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000002759 woven fabric Substances 0.000 title 1
- 239000004744 fabric Substances 0.000 claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 25
- 239000003365 glass fiber Substances 0.000 claims abstract description 14
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000009990 desizing Methods 0.000 claims description 2
- 238000005553 drilling Methods 0.000 abstract description 11
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000001035 drying Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- 238000004381 surface treatment Methods 0.000 description 7
- 239000004111 Potassium silicate Substances 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 6
- 229910052913 potassium silicate Inorganic materials 0.000 description 6
- 235000019353 potassium silicate Nutrition 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000012756 surface treatment agent Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- -1 silane compound Chemical class 0.000 description 3
- 238000004513 sizing Methods 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000012812 general test Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- RLQWHDODQVOVKU-UHFFFAOYSA-N tetrapotassium;silicate Chemical compound [K+].[K+].[K+].[K+].[O-][Si]([O-])([O-])[O-] RLQWHDODQVOVKU-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、積層板の製造に用いる
ガラス織物を製造する方法に係り、更に詳しくはドリリ
ング性に優れた積層板用ガラス織物を製造する方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a glass fabric for use in manufacturing laminates, and more particularly to a method of manufacturing a glass fabric for use in laminates with excellent drilling properties.
【０００２】0002
【従来の技術】ガラス織物を補強基材とする積層板は、
機械的特性，電気的特性，耐熱性，耐薬品性等において
非常に優れている。このため、電子機器，電気通信機等
に使用される、電気絶縁板または印刷回路用銅張積層板
を補強する基材として、ガラス織物が主として用いられ
ている。しかしながら、ガラス織物を補強基材とする積
層板はドリリング性が悪いという欠点がある。[Prior Art] Laminated plates using glass fabric as a reinforcing base material are
It has excellent mechanical properties, electrical properties, heat resistance, chemical resistance, etc. For this reason, glass fabrics are mainly used as base materials for reinforcing electrical insulating boards or copper-clad laminates for printed circuits used in electronic equipment, telecommunications equipment, and the like. However, a laminate using glass fabric as a reinforcing base material has a drawback of poor drilling properties.
【０００３】近年、プリント配線板の高密度化，多層化
が進んだことにより、回路の配線密度が大きくなり、Ｉ
Ｃ，ＬＳＩ等のチップが表面実装されるようになった。
その結果、ドリル穴径の小径化が進み、ドリルの穴位置
精度の向上が必要となった。またドリル内壁の粗さに対
する要求も一層平滑度の良いものが要求されている。[0003] In recent years, as printed wiring boards have become more dense and multilayered, the wiring density of circuits has increased, and I
Chips such as C and LSI began to be surface mounted. As a result, the diameter of drill holes has become smaller, and it has become necessary to improve the accuracy of drill hole position. In addition, the inner wall of the drill is required to have even better smoothness.
【０００４】更に、両面板等の汎用品の分野においては
、低コスト化の要求に対してドリル加工費低減のため、
ドリル加工時の重ね枚数の増加が指向され、ドリル摩耗
の少ない基材の検討がなされている。Furthermore, in the field of general-purpose products such as double-sided boards, in order to reduce drilling costs in response to the demand for lower costs,
The aim is to increase the number of overlapping sheets during drilling, and studies are being conducted on base materials that will cause less drill wear.
【０００５】上述の事情に鑑みて、例えば（ア）ガラス
織物をアルコキシシラン化合物で処理し、該シラン化合
物が付着した状態で加熱する方法（特公昭６３−５５１
２号公報）、（イ）ガラス織物を特定の高温で連続的に
加熱処理する方法（特開平２−４２７８５号公報）、（
ウ）ガラス織物をテトラアルコキシシランで処理する方
法（特開平２−８８４４８号公報）、が提案されている
。In view of the above-mentioned circumstances, for example, (a) a method of treating glass fabric with an alkoxysilane compound and heating it with the silane compound attached (Japanese Patent Publication No. 63-551
2 Publication No. 2), (a) Method of continuously heat-treating glass fabric at a specific high temperature (Japanese Unexamined Patent Publication No. 2-42785), (
C) A method of treating glass fabric with tetraalkoxysilane (Japanese Patent Application Laid-open No. 2-88448) has been proposed.
【０００６】しかしながら、（ア）の方法では高温で長
時間処理する必要があり、これを工業的に行うにはアル
コキシシラン化合物の付着したガラス織物を巻き取り、
これをバッチ式で加熱することが必須である。このため
巻厚方向での表面層と内層との間、更に織物の巾方向で
の端部と中央部との間で熱履歴が異なるため、ガラス繊
維の強度低下にバラツキを生ずる。また処理工程も連続
でなく、作業能率及び経済性が悪いといった問題点があ
る。However, method (a) requires treatment at high temperatures for a long time, and in order to carry out this process industrially, a glass fabric coated with an alkoxysilane compound is wound up,
It is essential to heat this batchwise. For this reason, the thermal history differs between the surface layer and the inner layer in the winding thickness direction, and also between the end portion and the center portion in the width direction of the fabric, resulting in variations in the strength reduction of the glass fibers. Furthermore, the processing steps are not continuous, resulting in poor working efficiency and economic efficiency.
【０００７】一方、（ロ）の方法では、極めて高温で処
理するものであり、多大なエネルギーを必要とし、更に
高温処理用の専有設備も必要になるといった問題点があ
る。On the other hand, the method (b) involves processing at an extremely high temperature, which requires a large amount of energy and also requires dedicated equipment for high-temperature processing.
【０００８】更に、（ア）及び（ハ）の方法では、後工
程のシラン系表面処理剤で表面処理を施す前のガラス繊
維の引張強度が極めて低いため、作業上の不都合を生じ
易いといった問題点がある。Furthermore, methods (a) and (c) have the problem that the tensile strength of the glass fibers before surface treatment with a silane-based surface treatment agent in the subsequent process is extremely low, which tends to cause operational inconveniences. There is a point.
【０００９】このほか、単に４００℃以上の高温で長時
間処理する方法もあるが、（ア）と同様の問題点がある
。また、酸あるいはアルカリの溶液中に浸漬する方法も
考えられるが、強度低下の程度を制御するのが難しいほ
か、電気的性質等に悪影響を及ぼす可能性がある。[0009] In addition, there is a method of simply treating at a high temperature of 400°C or higher for a long time, but this method has the same problems as (a). Alternatively, a method of immersing the material in an acid or alkali solution may be considered, but it is difficult to control the degree of decrease in strength and may adversely affect electrical properties.
【００１０】0010
【発明が解決しようとする課題】本発明者等は、上記問
題点に鑑み鋭意研究した結果、ケイ酸塩で処理すること
により、ガラス繊維の強度が低下することを見出し本発
明を完成したものであって、本発明の目的はドリリング
性に優れた積層板の製造に好適なガラス織物を効率よく
製造する方法を提供するにある。[Problems to be Solved by the Invention] As a result of intensive research in view of the above-mentioned problems, the present inventors have discovered that the strength of glass fibers is reduced by treatment with silicate, and have completed the present invention. An object of the present invention is to provide a method for efficiently manufacturing a glass fabric suitable for manufacturing a laminate with excellent drilling properties.
【００１１】[0011]
【課題を解決するための手段】上記目的は、脱糊処理さ
れたガラス織物をケイ酸塩で処理して、織物を構成する
ガラス繊維の引張強度を低下せしめることを特徴とする
積層板用ガラス織物の製造方法によって達成される。[Means for Solving the Problems] The above object is to provide a glass for laminated plate, which is characterized in that a desized glass fabric is treated with a silicate to reduce the tensile strength of the glass fibers constituting the fabric. This is achieved by a textile manufacturing method.
【００１２】本発明で処理するガラス織物の製造に使用
される繊維は、ガラス長繊維であれば単糸径，収束本数
等に制限はない。また、ガラスの組成も特に限定される
ものでなく、例えば一般に電気絶縁板またはプリント配
線板に用いられている、アルカリ成分の少いＥガラス，
誘電率の低いＤガラス，高強度であるＳガラス等を挙げ
ることができる。ガラス織物の織組織は、例えば平織り
，綾織り，朱子織り等を挙げることができるが、これら
に限定されるものではない。[0012] As long as the fibers used in the production of the glass fabric treated in the present invention are long glass fibers, there are no restrictions on the diameter of the single fibers, the number of converged fibers, etc. Furthermore, the composition of the glass is not particularly limited; for example, E glass, which has a low alkaline content and is generally used for electrical insulating boards or printed wiring boards,
Examples include D glass, which has a low dielectric constant, and S glass, which has high strength. Examples of the weave structure of the glass fabric include, but are not limited to, plain weave, twill weave, and satin weave.
【００１３】本発明で用いるガラス織物は、一般に原糸
紡糸時および経糸整経時に収束剤として用いた糊剤が付
着しているため、製織後にヒートクリーニングや洗浄な
どの方法で脱糊する必要がある。[0013] The glass fabric used in the present invention is generally coated with a sizing agent used as a sizing agent during yarn spinning and warping, so it is necessary to remove the sizing agent by heat cleaning or washing after weaving. be.
【００１４】ケイ酸塩による処理は、例えば脱糊処理し
たガラス織物をケイ酸塩の水溶液に浸漬したのち乾燥す
る方法、あるいは該溶液をガラス織布に散布して加圧ロ
ーラー等で絞液後乾燥する方法等を挙げることができる
が、ガラス繊維にケイ酸塩を付着せしめる方法であれば
公知の適宜な方法によって行なえばよい。Treatment with silicate can be carried out, for example, by immersing a desized glass fabric in an aqueous solution of silicate and then drying it, or by spraying the solution on the glass fabric and squeezing it with a pressure roller or the like. Examples include a drying method, but any known suitable method may be used as long as it is a method of attaching silicate to glass fibers.
【００１５】本発明においてガラス織物に付着せしめる
ケイ酸塩とは、一般式In the present invention, the silicate to be attached to the glass fabric has the general formula
【化１】
で表わされる二酸化ケイ素と金属酸化物とからなる塩で
、水溶性のものである。上記ケイ酸塩としてはアルカリ
金属塩が好ましく、具体的にはケイ酸カリウム，ケイ酸
ナトリウム，ケイ酸リチウム等を挙げることができ、中
でもケイ酸カリウム，ケイ酸ナトリウムが好適である。It is a water-soluble salt consisting of silicon dioxide and a metal oxide represented by the following formula. The silicate is preferably an alkali metal salt, and specific examples include potassium silicate, sodium silicate, lithium silicate, and the like, with potassium silicate and sodium silicate being particularly preferred.
【００１６】ガラス織物に付着せしめる上記ケイ酸塩の
付着量は、好ましくは０．０１〜３重量％である。付着
量は、所望する強度低下の大きさに応じて適宜選定すれ
ばよい。The amount of the silicate deposited on the glass fabric is preferably 0.01 to 3% by weight. The amount of adhesion may be appropriately selected depending on the desired magnitude of strength reduction.
【００１７】乾燥は通常の乾燥条件で行えばよく、例え
ば乾燥温度は１００〜１５０℃、乾燥時間は２０秒〜１
０分を挙げることができ、乾燥速度及びガラス織物の種
類等を考慮して適宜選定すればよい。Drying may be carried out under normal drying conditions, for example, the drying temperature is 100 to 150°C, and the drying time is 20 seconds to 1.
For example, the time may be 0 minutes, and may be appropriately selected in consideration of the drying rate, the type of glass fabric, etc.
【００１８】なお、ガラス繊維の引張強度をどの程度低
下させるかは、得られる積層板の機械的強度，ドリリン
グ性，その他の特性および積層成形工程での適合性が満
足されるものであれば、特に限定されない。得られるガ
ラス繊維の引張強度が高過ぎるとドリリング性が悪く、
低過ぎると後工程の表面処理工程やプリプレグ工程での
作業性に不都合を生じる。The degree to which the tensile strength of the glass fibers is reduced is determined by the following conditions, as long as the resulting laminate's mechanical strength, drillability, other properties, and compatibility in the laminate molding process are satisfied. Not particularly limited. If the tensile strength of the resulting glass fiber is too high, drilling properties will be poor;
If it is too low, it will cause problems in workability in the subsequent surface treatment process and prepreg process.
【００１９】こうして得られたガラス織物は、次いで、
通常はシラン化合物のようなカップリング剤で表面処理
されて積層板用基材となる。カップリング剤は、ガラス
と樹脂との架橋効果を発揮し、両者間の結合力を高める
。The glass fabric thus obtained is then processed into
Usually, the surface is treated with a coupling agent such as a silane compound to form a base material for a laminate. The coupling agent exhibits a crosslinking effect between the glass and the resin and increases the bonding strength between the two.
【００２０】一般にガラスクロスの引張強度は、通常の
加熱による脱糊処理（ヒートクリーニング）により、も
との引張強度の１５〜３５％に低下するが、シラン系の
表面処理剤による表面処理により４０〜７０％程度に回
復する。Generally, the tensile strength of glass cloth decreases to 15 to 35% of the original tensile strength by normal heating treatment (heat cleaning), but by surface treatment with a silane-based surface treatment agent, the tensile strength decreases to 40%. It recovers to about 70%.
【００２１】一方、特公昭６３−５５１２号公報及び特
開平２−８８４４８号公報で開示されたテトラアルコキ
シシランによって処理する方法では、処理後のガラスク
ロスの引張強度が、もとの５〜１５％まで低下し、続い
て行なわれるシラン系表面処理剤による表面処理により
１０〜３５％程度に回復するとされている。しかしなが
ら、引張強度が５〜１５％程度まで低下すると強度的に
極めて弱いものであり、糸切れを起し易く、後工程であ
る表面処理工程において、作業上の不都合を生じ易い。On the other hand, in the method of treatment with tetraalkoxysilane disclosed in Japanese Patent Publication No. 63-5512 and Japanese Patent Application Laid-Open No. 2-88448, the tensile strength of the glass cloth after treatment is 5 to 15% of the original. It is said that it can be recovered to about 10 to 35% by subsequent surface treatment with a silane-based surface treatment agent. However, when the tensile strength decreases to about 5 to 15%, the strength is extremely weak, and thread breakage is likely to occur, resulting in operational inconvenience in the subsequent surface treatment step.
【００２２】この点、本発明の方法によれば、ケイ酸塩
で処理したガラスクロスの引張強度は、脱糊処理後のガ
ラスクロスと同程度の１５〜３５％の低下にとどまる。
このため、シラン系表面処理剤による表面処理工程にお
いて、作業性に何ら問題を生じない。また表面処理剤に
よる処理後の引張強度は２０〜４５％に回復し、ドリリ
ング性に優れた基材となる。In this regard, according to the method of the present invention, the tensile strength of the glass cloth treated with silicate is reduced by only 15 to 35%, which is about the same as that of the glass cloth after desizing treatment. Therefore, no problem arises in workability in the surface treatment step using the silane surface treatment agent. Furthermore, the tensile strength after treatment with a surface treatment agent is recovered to 20 to 45%, resulting in a base material with excellent drilling properties.
【００２３】[0023]
【実施例】以下、実施例および比較例により本発明を具
体的に説明する。なお、その前に本明細書における種々
の特性値の測定法を記述する。[Examples] The present invention will be specifically explained below with reference to Examples and Comparative Examples. Before that, methods for measuring various characteristic values in this specification will be described.
【００２４】＜引張強度＞ＪＩＳ Ｒ３４２０，５，
４「ガラス繊維一般試験法」に準じて測定した。処理後
の織物について、長さ方向に中央部を１００ｍ間隔で１
０ケ所サンプリングして測定した。<Tensile strength> JIS R3420, 5,
4. Measured according to "Glass Fiber General Test Method". After treatment, the center part of the treated fabric is 100m apart in the length direction.
Measurements were taken by sampling 0 locations.
【００２５】＜積層板の曲げ強度＞得られた銅張積層板
の曲げ強度をＭＩＬ（米国軍用規格）−Ｐ−１３９４９
／２Ａに従って測定した。<Bending strength of laminate> The bending strength of the obtained copper clad laminate was measured according to MIL (US military standard)-P-13949.
/2A.
【００２６】＜小径ドリルの穴位置精度＞得られた銅張
積層板を３枚重ね合わせ、上部に厚さ０．４ｍｍの紙フ
ェノール板を、下部に厚さ１．５ｍｍの紙フェノール板
をあて板として重ねた。これをドリル径０．３５ｍｍ，
刃長７ｍｍのドリルで送り速度２０μ／ｒｅｖ．，回転
数８０００ｒｐｍでドリリングした。３枚目の積層板の
穴の上下位置のずれの大きさを測定した。<Hole position accuracy of small diameter drill> Three sheets of the obtained copper-clad laminates were stacked, and a paper phenol board with a thickness of 0.4 mm was placed on the top, and a paper phenol board with a thickness of 1.5 mm was placed on the bottom. Stacked as a board. Drill this with a drill diameter of 0.35mm,
A drill with a blade length of 7 mm and a feed rate of 20 μ/rev. , drilling was performed at a rotational speed of 8000 rpm. The magnitude of the shift in the vertical position of the hole in the third laminate was measured.
【００２７】＜ドリル内壁粗さ＞得られた銅張積層板に
ついて、ドリリング条件を穴位置精度測定の場合と同じ
にし、９０００ヒット後の穴内壁の粗さを顕微鏡により
観察した。<Drill Inner Wall Roughness> Regarding the obtained copper-clad laminate, the drilling conditions were the same as in the hole position accuracy measurement, and the roughness of the hole inner wall after 9000 hits was observed using a microscope.
【００２８】実施例１
ガラス織物ＫＳ１６００〔鐘紡（株）製、糸：ＥＣＧ７
５ １／０、糸密度：タテ４１本／２５ｍｍ，ヨコ３
２本／２５ｍｍ〕を４００℃で２０時間ヒートクリーニ
ングし付着糊剤を除去した。次に、このガラス織物を０
．３重量％のケイ酸カリウム水溶液に浸漬し、絞液後乾
燥した。続いて、１．０重量％エポキシシラン加水分解
溶液に浸漬し、絞液乾燥して処理織物を得た。Example 1 Glass fabric KS1600 (manufactured by Kanebo Co., Ltd., thread: ECG7)
5 1/0, thread density: vertical 41/25mm, horizontal 3
2 pieces/25 mm] were heat cleaned at 400° C. for 20 hours to remove the adhering adhesive. Next, this glass fabric is
．． It was immersed in a 3% by weight aqueous potassium silicate solution, squeezed out and dried. Subsequently, the fabric was immersed in a 1.0% by weight epoxysilane hydrolysis solution and squeezed and dried to obtain a treated fabric.
【００２９】得られた処理織物に下記配合組成のエポキ
シ樹脂ワニスを含浸し、１６０℃で乾燥してプリプレグ
を作成した。このプリプレグ８枚を積層し、更に両側に
厚さ３５μの銅箔を重ね合せて、１７０℃，３０ｋｇ／
ｃｍ２ で６０分間加熱加圧して、厚さ１．６ｍｍの銅
張積層板を得た。結果は表１の通りであった。The obtained treated fabric was impregnated with an epoxy resin varnish having the following composition and dried at 160° C. to prepare a prepreg. These 8 sheets of prepreg were laminated, and copper foil with a thickness of 35μ was overlaid on both sides.
cm2 for 60 minutes to obtain a copper-clad laminate having a thickness of 1.6 mm. The results are shown in Table 1.
【００３０】＜樹脂ワニスの配合組成＞<Blending composition of resin varnish>
【００３１】実
施例２
実施例１において用いたケイ酸カリウムの水溶液濃度を
０．６重量％とする以外は、実施例１と同様にして、処
理織物および銅張積層板を得た。結果は表１の通りであ
った。Example 2 A treated fabric and a copper-clad laminate were obtained in the same manner as in Example 1, except that the concentration of the potassium silicate aqueous solution used in Example 1 was 0.6% by weight. The results are shown in Table 1.
【００３２】実施例１においてケイ酸塩として用いたケ
イ酸カリウムに代えて、ケイ酸ナトリウム（濃度０．３
重量％水溶液）を用いた以外は、実施例１と同様にして
、処理織物および銅張積層板を得た。結果は表１の通り
であった。In place of the potassium silicate used as the silicate in Example 1, sodium silicate (concentration 0.3
A treated fabric and a copper-clad laminate were obtained in the same manner as in Example 1, except that aqueous solution (wt% aqueous solution) was used. The results are shown in Table 1.
【００３３】比較例１
実施例１において、ヒートクリーニングしたガラス織物
を、ケイ酸カリウムで処理することなく、エポキシシラ
ン１．０％加水分解溶液に浸漬し、絞液後乾燥して処理
織物を得た。引き続き、実施例１と同様にして銅張積層
板を作成した。結果は表１の通りであった。Comparative Example 1 In Example 1, the heat-cleaned glass fabric was immersed in a 1.0% epoxysilane hydrolyzed solution without being treated with potassium silicate, and the treated fabric was squeezed and dried to obtain a treated fabric. Ta. Subsequently, a copper-clad laminate was produced in the same manner as in Example 1. The results are shown in Table 1.
【００３４】比較例２
実施例１において、ケイ酸カリウムで処理する代りに、
テトラエトキシシラン０．５％水溶液に浸漬し、絞液乾
燥後、４００℃で２０時間加熱処理した。引き続き実施
例１と同様にしてエポキシシラン処理をし、同様にプリ
プレグおよび銅張積層板を作成した。結果は表１の通り
であった。Comparative Example 2 In Example 1, instead of treating with potassium silicate,
It was immersed in a 0.5% aqueous solution of tetraethoxysilane, squeezed and dried, and then heat-treated at 400° C. for 20 hours. Subsequently, epoxy silane treatment was performed in the same manner as in Example 1, and prepregs and copper-clad laminates were similarly produced. The results are shown in Table 1.
【００３５】[0035]
【表１】[Table 1]
【００３６】[0036]
【発明の効果】本発明の方法により得られたガラス織物
を用いて製造されたプリント配線板は、小径ドリルの穴
位置精度が従来品に比べ優れており、かつ穴内壁粗さの
平滑度も良い。Effects of the Invention: The printed wiring board manufactured using the glass fabric obtained by the method of the present invention has better hole position accuracy with a small-diameter drill than conventional products, and has a smoother inner hole wall roughness. good.
【００３７】ドリリング性が良くなる結果、ドリル摩耗
も少なくなり、ドリル加工時の加工枚数も増やすことが
可能となった。[0037] As a result of improved drilling performance, drill wear is reduced, and it is now possible to increase the number of pieces drilled.
【００３８】本発明の方法では、途中の工程において、
ガラス織物の引張強度を極端に低下させることがないた
め、安定して連続的に処理することができる。また、高
温を使わずに処理することができるため、実施する際に
特別な装置を必要とせず、一般に使用されているガラス
織物の表面処理をする装置で充分処理可能である。[0038] In the method of the present invention, in the intermediate steps,
Since the tensile strength of the glass fabric is not extremely reduced, it can be stably and continuously processed. Furthermore, since the treatment can be carried out without using high temperatures, no special equipment is required when carrying out the treatment, and the treatment can be sufficiently carried out with commonly used equipment for surface treatment of glass fabrics.
Claims (1)
で処理して、織物を構成するガラス繊維の引張強度を低
下せしめることを特徴とする積層板用ガラス織物の製造
方法。1. A method for manufacturing a glass fabric for a laminate, which comprises treating a desizing-treated glass fabric with a silicate to reduce the tensile strength of the glass fibers constituting the fabric.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3809491A JPH04255288A (en) | 1991-02-06 | 1991-02-06 | Manufacture of glass woven fabric for laminated board use |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3809491A JPH04255288A (en) | 1991-02-06 | 1991-02-06 | Manufacture of glass woven fabric for laminated board use |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04255288A true JPH04255288A (en) | 1992-09-10 |
Family
ID=12515890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3809491A Pending JPH04255288A (en) | 1991-02-06 | 1991-02-06 | Manufacture of glass woven fabric for laminated board use |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04255288A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003055034A (en) * | 2001-08-21 | 2003-02-26 | Nippon Electric Glass Co Ltd | Laminated glass ceramic material and laminated glass ceramic sintered body |
-
1991
- 1991-02-06 JP JP3809491A patent/JPH04255288A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003055034A (en) * | 2001-08-21 | 2003-02-26 | Nippon Electric Glass Co Ltd | Laminated glass ceramic material and laminated glass ceramic sintered body |
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