JPH0424365B2 - - Google Patents

Info

Publication number: JPH0424365B2
Authority: JP; Japan
Prior art keywords: group; formula; general formula; polysilane; molecular weight
Prior art date: 1987-09-17
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP23328687A

Other languages

English (en)

Japanese (ja)

Other versions

JPS6475529A (en

Inventor

Naotake Sudo

Shigeki Higuchi

Yoshitaka Naoi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

JUKI GOSEI YAKUHIN KOGYO KK

Original Assignee

JUKI GOSEI YAKUHIN KOGYO KK

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-09-17

Filing date

1987-09-17

Publication date

1992-04-24

1987-09-17 Application filed by JUKI GOSEI YAKUHIN KOGYO KK filed Critical JUKI GOSEI YAKUHIN KOGYO KK

1987-09-17 Priority to JP23328687A priority Critical patent/JPS6475529A/ja

1989-03-22 Publication of JPS6475529A publication Critical patent/JPS6475529A/ja

1992-04-24 Publication of JPH0424365B2 publication Critical patent/JPH0424365B2/ja

Status Granted legal-status Critical Current

Links

229920000548 poly(silane) polymer Polymers 0.000 claims description 16
125000000217 alkyl group Chemical group 0.000 claims description 7
125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
229910052783 alkali metal Inorganic materials 0.000 claims description 6
150000001340 alkali metals Chemical class 0.000 claims description 6
125000003277 amino group Chemical group 0.000 claims description 6
-1 Dimethyl (substituted phenyl) Chemical group 0.000 claims description 5
238000004519 manufacturing process Methods 0.000 claims description 5
125000003545 alkoxy group Chemical group 0.000 claims description 4
229910052736 halogen Inorganic materials 0.000 claims description 4
150000002367 halogens Chemical class 0.000 claims description 4
125000006239 protecting group Chemical group 0.000 claims description 4
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
238000006482 condensation reaction Methods 0.000 claims description 3
RQJRLVCBMAKXFG-UHFFFAOYSA-N phenyl(silyl)silane Chemical class [SiH3][SiH2]C1=CC=CC=C1 RQJRLVCBMAKXFG-UHFFFAOYSA-N 0.000 claims description 2
229910052751 metal Inorganic materials 0.000 claims 1
239000002184 metal Substances 0.000 claims 1
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 9
238000006243 chemical reaction Methods 0.000 description 7
229920000642 polymer Polymers 0.000 description 7
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
229910052784 alkaline earth metal Inorganic materials 0.000 description 5
150000001342 alkaline earth metals Chemical class 0.000 description 5
125000001424 substituent group Chemical group 0.000 description 5
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
125000003118 aryl group Chemical group 0.000 description 3
239000000126 substance Substances 0.000 description 3
YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
239000007810 chemical reaction solvent Substances 0.000 description 2
150000001875 compounds Chemical class 0.000 description 2
125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
239000012776 electronic material Substances 0.000 description 2
239000003480 eluent Substances 0.000 description 2
239000000463 material Substances 0.000 description 2
VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
230000003287 optical effect Effects 0.000 description 2
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
229920002120 photoresistant polymer Polymers 0.000 description 2
239000002994 raw material Substances 0.000 description 2
239000004065 semiconductor Substances 0.000 description 2
238000003756 stirring Methods 0.000 description 2
239000011232 storage material Substances 0.000 description 2
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
239000000010 aprotic solvent Substances 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
238000009835 boiling Methods 0.000 description 1
229920001577 copolymer Polymers 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000000706 filtrate Substances 0.000 description 1
238000005227 gel permeation chromatography Methods 0.000 description 1
238000005259 measurement Methods 0.000 description 1
238000000034 method Methods 0.000 description 1
239000000203 mixture Substances 0.000 description 1
238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
230000000704 physical effect Effects 0.000 description 1
239000000843 powder Substances 0.000 description 1
238000000746 purification Methods 0.000 description 1
230000035484 reaction time Effects 0.000 description 1
238000001226 reprecipitation Methods 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000011734 sodium Substances 0.000 description 1
159000000000 sodium salts Chemical class 0.000 description 1
239000002904 solvent Substances 0.000 description 1
125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
125000004665 trialkylsilyl group Chemical group 0.000 description 1

Landscapes

Silicon Polymers (AREA)

JP23328687A 1987-09-17 1987-09-17 Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof Granted JPS6475529A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP23328687A JPS6475529A (en)	1987-09-17	1987-09-17	Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP23328687A JPS6475529A (en)	1987-09-17	1987-09-17	Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof

Publications (2)

Publication Number	Publication Date
JPS6475529A JPS6475529A (en)	1989-03-22
JPH0424365B2 true JPH0424365B2 (fr)	1992-04-24

Family

ID=16952720

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP23328687A Granted JPS6475529A (en)	1987-09-17	1987-09-17	Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof

Country Status (1)

Country	Link
JP (1)	JPS6475529A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4000836B2 (ja) *	2001-11-28	2007-10-31	セイコーエプソン株式会社	膜パターンの形成方法

1987
- 1987-09-17 JP JP23328687A patent/JPS6475529A/ja active Granted

Also Published As

Publication number	Publication date
JPS6475529A (en)	1989-03-22

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Legal Events

Date	Code	Title	Description
2007-04-24	LAPS	Cancellation because of no payment of annual fees