JPH03200192A - Production of hologram - Google Patents
Production of hologramInfo
- Publication number
- JPH03200192A JPH03200192A JP1338639A JP33863989A JPH03200192A JP H03200192 A JPH03200192 A JP H03200192A JP 1338639 A JP1338639 A JP 1338639A JP 33863989 A JP33863989 A JP 33863989A JP H03200192 A JPH03200192 A JP H03200192A
- Authority
- JP
- Japan
- Prior art keywords
- hologram
- plate
- transferred
- metal material
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000000463 material Substances 0.000 claims abstract description 28
- 239000007769 metal material Substances 0.000 claims description 41
- 239000004033 plastic Substances 0.000 claims description 10
- 229920003023 plastic Polymers 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 abstract description 26
- 239000002184 metal Substances 0.000 abstract description 26
- 238000003825 pressing Methods 0.000 abstract description 6
- 238000000034 method Methods 0.000 description 20
- 229920002120 photoresistant polymer Polymers 0.000 description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 239000010410 layer Substances 0.000 description 14
- 238000012546 transfer Methods 0.000 description 14
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 229910052759 nickel Inorganic materials 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 229910001315 Tool steel Inorganic materials 0.000 description 2
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- -1 silver halide Chemical class 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910000680 Aluminized steel Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- GZCGUPFRVQAUEE-SLPGGIOYSA-N aldehydo-D-glucose Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C=O GZCGUPFRVQAUEE-SLPGGIOYSA-N 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- OIAUFEASXQPCFE-UHFFFAOYSA-N formaldehyde;1,3-xylene Chemical compound O=C.CC1=CC=CC(C)=C1 OIAUFEASXQPCFE-UHFFFAOYSA-N 0.000 description 1
- UPSIAUXDGWYOFJ-UHFFFAOYSA-N formaldehyde;furan Chemical compound O=C.C=1C=COC=1 UPSIAUXDGWYOFJ-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical compound [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000004439 roughness measurement Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000005028 tinplate Substances 0.000 description 1
- 238000013518 transcription Methods 0.000 description 1
- 230000035897 transcription Effects 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0244—Surface relief holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2270/00—Substrate bearing the hologram
- G03H2270/10—Composition
- G03H2270/13—Metallic
Landscapes
- Holo Graphy (AREA)
- Shaping Metal By Deep-Drawing, Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、ホログラムの製法に関するもので、より詳細
には、金属素材の表面にレリーフ型ホログラムを形成さ
せる方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing a hologram, and more particularly to a method for forming a relief hologram on the surface of a metal material.
（従来の技術）
ホログラムは物体の三次元像の再生が容易であると共に
、虹色に光る装飾性を有しており、ギフト、ノベルティ
、或は子供の玩具等のデイスプレィの分野、或は書籍、
雑誌の表紙、挿絵等の出版・印刷の分野に用いられてい
る。(Prior Art) Holograms are easy to reproduce three-dimensional images of objects, and have iridescent decorative properties, and are used in the field of displays such as gifts, novelties, and children's toys, and in books. ,
It is used in the field of publishing and printing, such as magazine covers and illustrations.
更にホログラムは多重記録、或は高密度記録も可能であ
り、光メモリーとして応用され、その製造には精密機器
が必要であることから、容易に偽造もできないので、有
価証券、クレジットカード、ＩＤカード等の分野でも用
いられている。Furthermore, holograms are capable of multiplex recording or high-density recording, and are used as optical memories, which require precision equipment to manufacture and cannot be easily counterfeited. It is also used in other fields.
ホログラムの複製については、感光材料を用いて露光及
び干渉等により直接ホログラムを作成する方法と、平滑
なプラスチック材料にエンホス加工して表面レリーフ型
のホログラムを作成する方法が知られている。Regarding the reproduction of holograms, two methods are known: one is to directly create a hologram using a photosensitive material through exposure and interference, and the other is to create a surface relief hologram by enforcing a smooth plastic material.
（発明か解決しようとする問題点）
しかしながら、これらの方法で形成されるホログラムは
耐久性や微細なパターンの再現性に欠けるという欠点が
ある。(Problems to be Solved by the Invention) However, holograms formed by these methods have drawbacks such as lack of durability and reproducibility of fine patterns.
即ち、前者の方法によるものは、一般に種々のデイスプ
レィ用品として使用されているが、この方法は手数がか
かりスピードの遅い感光、現像工程が必要で、大量生産
に向いていないという難点がある。That is, the former method is generally used for various display items, but this method requires laborious and slow exposure and development steps, and has the disadvantage that it is not suitable for mass production.
また、後者の方法は、工具表面に形成されている凹凸の
形のホログラムを溶融状態においてプラスデックの表面
にレリーフの形で写しとる方法であるか、グラスチック
は、溶融時と室温時とにおける密度差が犬で収縮傾向か
大てあり、寸法精度が低く、微細なパターンの再現性に
乏しい。成形時に生ずる内部歪により、ホログラムが変
形しやすいことも難点である。In addition, the latter method is a method in which a hologram in the form of irregularities formed on the tool surface is transferred in the form of a relief onto the surface of the plastic deck in a molten state. The density difference is large and tends to shrink, the dimensional accuracy is low, and the reproducibility of fine patterns is poor. Another drawback is that the hologram is easily deformed due to internal distortion that occurs during molding.
木発明者等は、凹凸の形てホログラムが形成されている
略平面状の版と、平滑な表面を有する平面状の金属素材
とを面に直角方向に圧介するときには、全く意外にも、
金属素材の表面にレリーフ型ホログラムを転写させるこ
とが可能となること、及びかくして形成されるホログラ
ムは、凹凸模様の寸法精度や再現性及びホログラムの強
度や耐久性に顕著に優れていることを見出した。When the wood inventors pressed together a substantially planar plate on which a hologram was formed in the form of an uneven surface and a planar metal material with a smooth surface in a direction perpendicular to the surface, they discovered that, quite unexpectedly,
We have discovered that it is possible to transfer a relief hologram onto the surface of a metal material, and that the hologram thus formed has outstanding dimensional accuracy and reproducibility of the uneven pattern, as well as hologram strength and durability. Ta.
即ち、本発明の目的は、金属素材の表面に、凹凸模様の
寸法精度や再現性に優れ、しかも該模様の強度や耐久性
にも優れたホログラムを形成させる方法を提供するにあ
る。That is, an object of the present invention is to provide a method for forming a hologram on the surface of a metal material, which has an uneven pattern with excellent dimensional accuracy and reproducibility, and also has excellent strength and durability of the pattern.
本発明の他の目的は、版の作成と正分操作とのみが必要
で、面倒で手数のかかる操作や精密な加工条件等が不要
であり、従って、前述した特性を有するホログラムを安
価にしかも効率よく製造し得る方法を提供するにある。Another object of the present invention is that only the preparation of a plate and the correct division operation are required, and no troublesome and time-consuming operations or precise processing conditions are required. The purpose is to provide an efficient manufacturing method.
本発明の更に他の目的は、面の全ゆる部分における凹凸
模様の再現が均一であるホログラムの製法を提供するに
ある。Still another object of the present invention is to provide a method for manufacturing a hologram in which the uneven pattern is uniformly reproduced on all parts of the surface.
（問題点を解決するための手段）
本発明によれば、凹凸の形でホログラムが形成されてい
る略平面状の版と、平滑な表面を有する平面状の金属素
材とを面に対して直角方向に圧介させ、該金属素材の塑
性変形によりその表面にレリーフ型ホログラムを転写さ
せることを特徴とするホログラムの製法が提供される。(Means for Solving the Problems) According to the present invention, a substantially planar plate on which a hologram is formed in the form of unevenness and a planar metal material having a smooth surface are arranged at right angles to the plane. A method for manufacturing a hologram is provided, which is characterized in that a relief-type hologram is transferred to the surface of the metal material by plastic deformation of the metal material.
本発明によればまた、凹凸の形でホログラムが形成され
ている平面状の薄い版を緩衝材の層を介して支持し、こ
の版と、平滑な表面を有する平面状の金属素材とを面に
対して直角方向に圧介させ、該金属素材の塑性変形によ
りその表面にレリフ型ホログラムを転写させることを特
徴とするホログラムの製法が提供される。According to the present invention, a planar thin plate on which a hologram is formed in the form of unevenness is supported via a layer of cushioning material, and this plate and a planar metal material having a smooth surface are connected to each other. Provided is a method for manufacturing a hologram, characterized in that the metal material is pressed in a direction perpendicular to the surface of the metal material, and a relief-type hologram is transferred to the surface of the metal material by plastic deformation of the metal material.
（作用）
本発明は、凹凸の形でホログラムが形成されている略平
面状の版と、平滑な表面を有する平面状の金属素材とを
、面に対して直角方向に圧介させた場合に、寸法精度の
高いホログラムが再現性よく金属素材上に転写されると
いう知見に基づくものである。(Function) The present invention is applicable to the case where a substantially planar plate on which a hologram is formed in the form of unevenness and a planar metal material having a smooth surface are pressed together in a direction perpendicular to the surface. This is based on the knowledge that holograms with high dimensional accuracy can be transferred onto metal materials with good reproducibility.
本発明に用いる加工法は、表面に凹凸のある版（型）で
圧し、素材面に型模様をつける加工である点て、コイニ
ング（圧印加工）に属するが、このようなコイニングで
微小凹凸のホログラムが形成されることは本発明以前全
く未知のことである。The processing method used in the present invention belongs to coining (coining) in that it presses with a plate (mold) with an uneven surface to create a pattern on the surface of the material. The formation of holograms was completely unknown prior to the present invention.
即ち、本発明に用いる平面状の版においては、ホログラ
ムが凹凸の形で形成されているが、この凹凸とは、像と
して表現すべき原稿からの光の波面に相当する干渉縞が
凹凸の形となっているものであり、そのピッチは多くの
場合０．１乃至５μｍの範囲にあって著しく微細のもの
である。このような微細な凹凸模様が前述したコイニン
グにより金属素材表面に転写されること自体全く予想外
の知見であった。That is, in the planar plate used in the present invention, the hologram is formed in the shape of an uneven shape, and this unevenness is the uneven shape of the interference fringes corresponding to the wavefront of light from the original that is to be expressed as an image. The pitch is extremely fine, often in the range of 0.1 to 5 μm. The fact that such a fine uneven pattern was transferred to the surface of the metal material by the above-mentioned coining was in itself a completely unexpected finding.
本発明に用いる金属素材は平面状でしかもその表面は可
及的に平滑であることも重要である。It is also important that the metal material used in the present invention is planar and that its surface is as smooth as possible.
層具体的には、金属素材の表面は中心線平均あらさが０
．５７１ｍ以下、特に０．３μｍ以下であれば、ホログ
ラムの寸法精度及び再現性に関して満足すべき結果か得
られる。Layer Specifically, the surface of the metal material has a center line average roughness of 0.
．． If it is 571 m or less, especially 0.3 μm or less, satisfactory results can be obtained regarding the dimensional accuracy and reproducibility of the hologram.
金属表面における中心線平均あらさ（ＪＩＳ Ｂ０１ｉ
０１）は、あらさ曲線からその中心線の方向に測定長さ
ｋの部分を抜き取り、この抜き取り部分の中心線をＸ軸
、縦倍率の方向をＹ軸とし、あらさ曲線をｙ＝ｆ （ｘ
）と表わしたとき、次式によって求められる値をマイク
ロメートル（μｍ）で表わしたものをいう。Center line average roughness on metal surface (JIS B01i
01) extracts a part of measurement length k from the roughness curve in the direction of its center line, sets the center line of this extracted part as the X axis, and the vertical magnification direction as the Y axis, and the roughness curve is y=f
) means the value obtained by the following formula expressed in micrometers (μm).
即ち、中心線平均あらさば、金属表面の垂直方向の凹凸
の程度（振幅の程度）に関係するものであり、一方ホロ
グラムの再現性は凹凸のピッチか面方向に如何に正確に
刻まれているかに依存するものであるにもかかわらず、
本発明においては、Ｒａが０．５ μｍを超えると凹凸
パターンか転写されない部分が生し、再現性のシグナル
／ノイズ比（ｓ ／ ｎ比）が小さくなり、再生像がノ
イズに埋没される傾向があるのに対して、Ｒａを０，５
μｍ以下とすることにより、シグナル／ノイズ比を実
用上差支えない範囲に向上させ得るものである。In other words, the centerline average roughness is related to the degree of unevenness (amplitude) in the vertical direction of the metal surface, while the reproducibility of a hologram is related to the pitch of the unevenness or how accurately it is carved in the surface direction. Although it depends on
In the present invention, if Ra exceeds 0.5 μm, there will be parts of the uneven pattern that are not transferred, the signal/noise ratio (s/n ratio) of reproducibility will become small, and the reproduced image will tend to be buried in noise. , while Ra is 0.5
By setting the thickness to .mu.m or less, the signal/noise ratio can be improved to a practically acceptable range.
ところで、剛体から成る版を型打加工（スタンピング）
に使用すると、接触圧力は周辺部において最も大ぎく、
中心部に向うに従って小さくなることから、これに接す
る金属素材においても前記周辺部に対応する部分では塑
性変形が大きく、前記中心部に対応する部分では塑性変
形が小さく、従って加工後の金属素材では、周辺部程凹
凸の程度が大きく中心部程凹凸の程度の小さい不均一な
ホログラムが形成される傾向が認められる。By the way, stamping is performed on a rigid plate.
When used in
Since the size decreases toward the center, the plastic deformation is large in the part corresponding to the peripheral part of the metal material that is in contact with it, and the plastic deformation is small in the part corresponding to the center, so that the metal material after processing has a large plastic deformation. There is a tendency for a non-uniform hologram to be formed in which the degree of unevenness is larger toward the periphery and smaller toward the center.
本発明の好適態様に従い、略平面状の版として、表面に
向けて凸でゆるやかな曲面を形成している版を使用する
と、版と金属との接触圧力が周辺部においても中心部分
においても−様となり、どの部分においても均−且つ−
様なホログラムを金属素材表面に形成させることが可能
となる。According to a preferred embodiment of the present invention, when a substantially flat plate having a gently curved surface convex toward the surface is used, the contact pressure between the plate and the metal is reduced both at the periphery and at the center. It is even and - in every part.
It becomes possible to form various holograms on the surface of metal materials.
また、本発明の別の態様では、版を薄くして可変形性を
持たせると共に、緩衝材層を介して正合操作を行うこと
により、接触圧力が接触面のどの部分においても−様と
なり、版の凹凸模様が金属素材に対して均一にしかも忠
実に転写され、再現されることになる。In another aspect of the present invention, the plate is thinned to have deformability, and the alignment operation is performed through a buffer layer, so that the contact pressure can be varied at any part of the contact surface. , the uneven pattern of the plate is transferred and reproduced uniformly and faithfully to the metal material.
更に、金属素材は如何に表面が平滑であるといっても、
その表面には無視できない程のうねりや山谷が存在する
ことが多いが、後者の版の構成を採用すると、これらの
非平滑性要因が版により吸収緩和され、これらの要因の
有無にかかわらず均−且つ−様なレリーフ型ホログラム
の転写が可能となる。Furthermore, no matter how smooth the surface of metal materials is,
The surface often has undulations and peaks and valleys that cannot be ignored, but if the latter plate configuration is adopted, these non-smooth factors will be absorbed and alleviated by the plate, and the surface will be smooth regardless of the presence or absence of these factors. -And--like relief type holograms can be transferred.
（発明の好適態様）
本発明の詳細な説明するための第１図において、撮影工
程Ａにおいて、レーザー光源１、ホトレジスト感光層２
、原′ｇ４３及び反射鏡４を、原稿３からの反射光線と
、反射鏡４からの参照反射光とが同時にホトレジスト層
に入射する位置関係で配置する。これによりホトレジス
ト層には、像として表現すべと原稿からの光の波面に相
当する干渉縞が形成される。ホトレジスト層２は、露光
部分が硬化するネガ型のものでも露光部が溶解するポジ
型のものであってもよい。(Preferred embodiment of the invention) In FIG. 1 for detailed explanation of the present invention, in the photographing step A, a laser light source 1, a photoresist photosensitive layer 2
, the original 43 and the reflecting mirror 4 are arranged in such a positional relationship that the reflected light from the original 3 and the reference reflected light from the reflecting mirror 4 are simultaneously incident on the photoresist layer. As a result, interference fringes are formed on the photoresist layer, which correspond to the wavefront of light from the original, which can be expressed as an image. The photoresist layer 2 may be of a negative type, in which exposed areas harden, or of positive type, in which exposed areas dissolve.
現像工程Ｂにおいて、露光部ホトレジスト層２′をそれ
自体公知の現像処理に付する。これにより未硬化の未露
光部分或は溶解性の露光部分５が溶解され表面に凹凸パ
ターン６を有するホトレジスト版７が形成される。In the development step B, the exposed photoresist layer 2' is subjected to a development process known per se. As a result, the uncured unexposed portions or the soluble exposed portions 5 are dissolved, and a photoresist plate 7 having a concavo-convex pattern 6 on its surface is formed.
金属版型の製作工程Ｃにおいて、ホトレジスト版７の表
面に金属薄膜層８を蒸着或は無電解メツキ等の手段によ
り形成させ、これを電気鋳造操作に付することによって
、ニッケルまたはクロム等の硬質金属から成る金属版型
９を形成させる。この金属版型からホトレジスト層７を
機械的に７１」離するか、化学的に溶解するかして、金
属版型９のみを取り出す。In the manufacturing process C of the metal plate mold, a metal thin film layer 8 is formed on the surface of the photoresist plate 7 by means such as vapor deposition or electroless plating, and this is subjected to an electroforming operation to form a hard metal such as nickel or chromium. A metal plate mold 9 made of metal is formed. The photoresist layer 7 is mechanically separated by 71'' from the metal plate mold, or it is chemically dissolved, and only the metal plate mold 9 is taken out.
金属素材への転写工程りにおいて、上側圧子１０に凹凸
パターン６゛を有する金属版型９を取付け、一方下側圧
子１１に金属素材１２を支持させ、これらの面に対し直
角方向（矢印方向）に両者を正分させて、金属素材１２
の表面にレリーフ型ホログラム６”を形成させる。In the process of transferring onto a metal material, a metal plate mold 9 having a concavo-convex pattern 6'' is attached to the upper indenter 10, while the metal material 12 is supported by the lower indenter 11, and the metal material 12 is supported in a direction perpendicular to these surfaces (in the direction of the arrow). ) to separate both metal materials 12
A relief hologram 6'' is formed on the surface of the hologram.
また、転写工程りの好適態様を示す第２図においては、
版９を支持する上側圧子１０の支持面１３を凸でゆるや
かな曲面（図では凸の程度が強調されている）として、
接触圧力がどの部分でも一様となるように配慮されてい
る。曲面の形状は、例えば球面、楕円回転面、放物線回
転面、双曲線回転面等の任意の二次曲線回転面であって
よいが、この例に限定されない。また、この曲面の径（
Ｄ）と凸出寸法（Ｐ）との比（Ｐ／Ｄ）は、般にＰ／Ｄ
＝１．ＯＸｌ０−５乃至５．ＯＸｌ０−２特に５、ＯＸ
１０−’乃至１．ＯＸｌ０−２の範囲にあるのがよい
。In addition, in FIG. 2 showing a preferred embodiment of the transfer process,
The support surface 13 of the upper indenter 10 that supports the plate 9 is a convex and gently curved surface (the degree of convexity is emphasized in the figure).
Care has been taken to ensure that the contact pressure is uniform throughout. The shape of the curved surface may be any quadratic surface of revolution, such as a spherical surface, an elliptical surface of revolution, a parabolic surface of revolution, or a hyperbolic surface of revolution, but is not limited to this example. Also, the diameter of this curved surface (
D) and the protrusion dimension (P) (P/D) is generally P/D
=1. OXl0-5 to 5. OXl0-2 especially 5, OX
10-' to 1. It is preferably in the range of OXl0-2.
また、本発明の最も好適な態様では、第３図及び第４図
に示す通り、変形可能な薄手の金属版型９ａを、緩衝材
層１４を介して第１図及び第２図の上側圧子１０に支持
されるようにする。Furthermore, in the most preferred embodiment of the present invention, as shown in FIGS. 3 and 4, the deformable thin metal plate mold 9a is inserted into the upper side pressure shown in FIGS. so that it is supported by the child 10.
ホトレジスト層のホログラムの作成方法は、従来公知の
方法を採用することができる。例えば、像として表現す
べき原稿（以下単に原稿という）にレーザー光（例えば
、Ａｒ’″レーザー、４８８ｎｍ、出力５ｍＷ）に照射
して得られる原稿からの反射光と、同一の光源から分割
した参照光とを同時にホトレジストを塗布した乾板に入
射させ、原稿からの光の波面に相当する干渉縞を乾板に
記録することにより、原稿の撮影を２乃至６０分間行っ
た後これを現像し、干渉縞の凹凸パターンを得えること
ができる。A conventionally known method can be used to create the hologram of the photoresist layer. For example, the reflected light from the original obtained by irradiating the original to be expressed as an image (hereinafter simply referred to as the original) with laser light (for example, Ar''' laser, 488 nm, output 5 mW), and the reference divided from the same light source. The light is simultaneously applied to a dry plate coated with photoresist, and interference fringes corresponding to the wavefront of the light from the original are recorded on the dry plate. After photographing the original for 2 to 60 minutes, this is developed and the interference fringes are recorded. A concavo-convex pattern can be obtained.
ホトレジストは、通常低感度であるので、−旦銀塩感光
材料を用いて撮影を行い原版ホログラムを得て、これを
ホトレジストと密着させた後、原版ホログラムを通して
ホトレジストに露光して原版ホログラムの干渉縞をホト
レジストに複写し、その後ホトレジストを現像する方法
も採用することができる。Since photoresists usually have low sensitivity, - an original hologram is obtained by photographing using a silver halide photosensitive material, this is brought into close contact with the photoresist, and then the photoresist is exposed through the original hologram to create interference patterns on the original hologram. It is also possible to adopt a method of copying the image onto a photoresist and then developing the photoresist.
ホトレジスト層としては、光遊離反応、光分解反応、光
レドックス反応、光重合反応、光橋かけ反応等を利用し
たそれ自体公知のホトレジスト材料、例えばジアゾ樹脂
、環化ポリイソプレン系樹脂、フェノール樹脂、ノボラ
ック樹脂等を使用することができる。The photoresist layer may be a photoresist material known per se that utilizes photo-release reaction, photo-decomposition reaction, photo-redox reaction, photo-polymerization reaction, photo-crosslinking reaction, etc., such as diazo resin, cyclized polyisoprene resin, phenol resin, etc. Novolac resin etc. can be used.
次いて、ホトレジスト原版表面に、蒸着法により金の薄
膜、或は無電解メツキ法により銀のＲ膜を形成すること
により導電性を与え、この薄膜を電極として通常の電気
メツキ法によりニッケルメッキ、クロムメツキ等の金属
メツキ層をホトレジスト原版表面に形成させる。版の厚
みは、２５乃至２００μｍ１特に３０乃至１． Ｏ０μ
ｍの範囲が適当である。Next, conductivity is imparted to the surface of the photoresist original plate by forming a thin gold film by vapor deposition or a silver R film by electroless plating, and this thin film is used as an electrode for nickel plating by ordinary electroplating. A metal plating layer such as chrome plating is formed on the surface of the photoresist original plate. The thickness of the plate is 25 to 200 μm, especially 30 to 1. O0μ
A range of m is appropriate.
緩衝材としては、圧縮弾性率がＩ Ｘ １０６Ｐａ乃至
Ｉ Ｘ １０１０Ｐａ、特に１ ｘ １０６Ｐａ乃至Ｉ
Ｘ １０９Ｐａの範囲にあり、弾性限界が高くて、復
原力の大きい任意の材料、例えばポリプロピレン、ポリ
エステル、ポリアミド、ポリ塩化ビニル等の各種プラス
チックや、天然又は合成の各種ゴム等が使用され、その
厚みは１０μｍ乃至２００μｍ５特に３０μｍ乃至１０
０μｍの範囲にあるのがよい。As a cushioning material, the compressive elastic modulus is I x 106Pa to I x 1010Pa, especially 1 x 106Pa to I
Any material with a high elastic limit and large restoring force in the range of is 10 μm to 200 μm5 especially 30 μm to 10
It is preferably in the range of 0 μm.
ホログラムが転写されるべき金属表面は、Ｒａが前述し
た範囲内にあるものであればよく、また版の凹凸のパタ
ーンを再現性よく転写すること及び金属版型の寿命を考
慮すると、転写されるべき金属表面の硬度が金属版型表
面の硬度より低いことが必要である。材料としては、一
般には表面のビッカーズ硬度が３００以下、特に２００
以下であるものが好ましく、例えば、純アルミニウムや
アルミニウム合金単独から成るものを使用し得る他、表
面に軟質金属をメツキ処理した鋼板類、例えば、ブリキ
、アルミメツキ鋼板、錫ニッケルメッキ鋼板等を使用で
きる。The metal surface to which the hologram is to be transferred may have Ra within the above-mentioned range, and in consideration of transferring the uneven pattern of the plate with good reproducibility and the life of the metal plate mold, it is sufficient that the hologram is transferred to the metal surface. It is necessary that the hardness of the metal surface to be molded is lower than the hardness of the metal plate mold surface. The material generally has a surface Vickers hardness of 300 or less, especially 200.
The following are preferred; for example, in addition to those made of pure aluminum or aluminum alloy alone, steel plates whose surfaces are plated with soft metals, such as tinplate, aluminized steel plates, tin-nickel plated steel plates, etc. can be used. .
また、金属素材としては、上述した金属板の他に、表面
が金属から成るという条件下で、金属板と他の材料、例
えば各種プラスチックとの積層体も用いることができる
。Further, as the metal material, in addition to the above-mentioned metal plate, a laminate of a metal plate and other materials such as various plastics can also be used, provided that the surface is made of metal.
正分に用いる圧力は、版の模様が金属素材表面にレリー
フ型ホログラムとして転写されるようなものであり、一
般に５乃至５０ ｋｇｆ／ｍｍ” 、特に１０乃至３０
ｋｇｆ／ｍｍ２の圧力が適当である。正分の際の温度
は室温で十分であるが、所望により加温したり或いは冷
却したりすることもできる。The pressure used for the press is such that the pattern of the plate is transferred to the surface of the metal material as a relief hologram, and is generally 5 to 50 kgf/mm, particularly 10 to 30 kgf/mm.
A pressure of kgf/mm2 is suitable. Room temperature is sufficient for the temperature during the minute, but it can be heated or cooled as desired.
レリーフ型ホログラムを形成させた金属素材は、種々の
用途に供することができる。例えばこのホログラムを形
成させた金属素材は絞り加工を施しても、ホログラムが
失われないことから、絞り缶胴やキャップ、缶蓋等への
加工に用いることができるし、また溶接や接着或いはハ
ンダ付による側面継目缶胴の製造に用いることができる
。勿論、このホログラム付金属素材を、各種表示用プレ
ート乃至ラベル或いはシールやメダルの用途に供するこ
ともできる。A metal material on which a relief hologram is formed can be used for various purposes. For example, the hologram will not be lost even if the metal material on which this hologram is formed is subjected to drawing processing, so it can be used for processing into drawn can bodies, caps, can lids, etc., and it can also be used for processing into drawn can bodies, caps, can lids, etc. Can be used to manufacture can bodies with side seams. Of course, this hologram-attached metal material can also be used for various display plates, labels, stickers, and medals.
本発明においては、金属表面にホログラムを転写させた
後に、該表面に透明樹脂保護層を形成させることもでき
る。塗料としてて用いることができるのは、これに限定
されないが、熱硬化性樹脂塗料、例えば、フェノール−
ホルムアルデヒド樹脂、フラン−ホルムアルデヒド樹脂
、キシレン−ホルムアルデヒド樹脂、ケトン−ホルムア
ルデヒド樹脂、尿素−ホルムアルデヒド樹脂、メラミン
−ホルムアルデヒド樹脂、アルキッド樹脂、不飽和ポリ
エステル樹脂、エポキシ樹脂、ビスマレイミド樹脂、ト
リアリルシアネレート樹脂、熱硬化型アクリル樹脂、シ
リコーン樹脂、油性樹脂、或は熱可塑性樹脂塗料、例え
ば、塩化ビニル−酢酸ビニル共重合体、塩化ビニル−酢
酸ビニル共重合体部分ケン化物、塩化ビニル−マレイン
酸共重合体、塩化ビニル−マレイン酸−酢酸ビニル共重
合体、アクリル重合体、飽和ポリエステル樹脂等を挙げ
ることができる。これらの樹脂塗料は単独でも２種以上
の組合せでも使用される。In the present invention, after the hologram is transferred to the metal surface, a transparent resin protective layer can also be formed on the surface. Examples of paints that can be used as paints include, but are not limited to, thermosetting resin paints such as phenol-
Formaldehyde resin, furan-formaldehyde resin, xylene-formaldehyde resin, ketone-formaldehyde resin, urea-formaldehyde resin, melamine-formaldehyde resin, alkyd resin, unsaturated polyester resin, epoxy resin, bismaleimide resin, triallyl cyanerate resin, Thermosetting acrylic resin, silicone resin, oil-based resin, or thermoplastic resin coating, such as vinyl chloride-vinyl acetate copolymer, partially saponified vinyl chloride-vinyl acetate copolymer, vinyl chloride-maleic acid copolymer , vinyl chloride-maleic acid-vinyl acetate copolymer, acrylic polymer, saturated polyester resin, and the like. These resin coatings may be used alone or in combination of two or more.
この際、形成される膜厚は１乃至１５μｍ、特に３乃至
１０μｍであることが好ましい。上記範囲よりも厚いと
ホログラムが鮮明に見えなくなるおそれがあり、また上
記範囲よりも薄いと保護層としての機能を果たさなくな
るおそれがある。塗布の方法としては、スプレー法、ロ
ール法等従来公知の方法により施すことができる。塗膜
の焼付けは１６０乃至２１０℃の温度で５乃至１５分間
行うことが好ましい。At this time, the thickness of the formed film is preferably 1 to 15 μm, particularly 3 to 10 μm. If it is thicker than the above range, the hologram may not be clearly visible, and if it is thinner than the above range, it may not function as a protective layer. The coating can be applied by conventionally known methods such as a spray method and a roll method. The coating film is preferably baked at a temperature of 160 to 210° C. for 5 to 15 minutes.
（発明の効果）
本発明によれば、凹凸の形でホログラムが形成されてい
る平面状の版と、平滑な表面を有する平面状の金属素材
とを、面に対して直角方向に圧介させることにより、金
属表面に、凹凸模様の寸法精度や再現性に優れしかも該
模様の強度や耐久性にも優れたレリーフ型ホログラムを
高い生産性をもって容易に形成することが可能となった
。(Effects of the Invention) According to the present invention, a planar plate on which a hologram is formed in the form of unevenness and a planar metal material having a smooth surface are pressed together in a direction perpendicular to the surface. As a result, it has become possible to easily form a relief-type hologram with high productivity on a metal surface, which has an uneven pattern with excellent dimensional accuracy and reproducibility, and also has excellent strength and durability of the pattern.
また表面に向けて凸でゆるやかな曲面を形成している版
や、薄い版が緩衝材の層を介して設けられているものを
用いることにより、版と金属素材との接触圧力がどの部
分でも−様となり、均−且つ−様なホログラムを金属素
材表面に形成させることが可能となった。また、後者の
場合には金属素材に非平滑性要因があっても、これを吸
収緩和して−様なレリーフ型ホログラムの形成が可能と
なった。In addition, by using a plate with a gently curved surface that is convex toward the surface, or a thin plate with a layer of cushioning material in between, the contact pressure between the plate and the metal material can be reduced at any point. It became possible to form a uniform and -like hologram on the surface of the metal material. Furthermore, in the latter case, even if there is a non-smoothness factor in the metal material, it is possible to absorb and relax the non-smoothness factor and form a --like relief hologram.
実施例１
ピッチか０．４〜５μｍにわたって分布し、溝深さが１
μｍの凹凸縞の形でホログラムが形成されている厚さ５
０μｍのニッケル版を、ロックウェル硬度６０に調質し
表面に硬質クロムメツキを施した工具鋼からなる平面度
０．１ μｍ、 ＲｍａｘＯ８０１μｍの平面を有する
支持具に取り付けて直径２０ｍｍの円形断面形状を有す
る転写用上型を製作した。この上型と、ロックウェル硬
度６０に調質し表面に硬質クロムメツキを施した工具鋼
からなる平面度０．１ μｍ、 Ｒｍａｘ Ｏ，０１
μｍの平面を有する下型をプレス装置に取り付け、厚さ
０．３２＋ｎｍ、中心線平均粗さ０．１μｍ、ビッカー
ス硬度９５のアルミニウム合金板（ＪＩＳ Ａ３００４
Ｐ）を上下型間に置いて、９ ｔｏｎの押圧力で版とア
ルミニウム合金板を圧介させたところ、表１に示すよう
に、版型の全領域にわたってホログラムが良好に転写さ
れた。転写されたホログラムの溝深さを触針式粗さ計で
測定したところ、溝深さは連続的に変化し、転写領域の
外縁部では１μｍ、中心部では０．２ μｍであった。Example 1 The pitch was distributed over 0.4 to 5 μm, and the groove depth was 1
Thickness 5 where the hologram is formed in the form of uneven stripes of μm
A nickel plate of 0 μm was attached to a support made of tool steel tempered to a Rockwell hardness of 60 and hard chrome plated on the surface and having a flatness of 0.1 μm and a flat surface of RmaxO of 801 μm and having a circular cross-sectional shape of 20 mm in diameter. The upper mold for transcription was manufactured. This upper mold is made of tool steel tempered to Rockwell hardness 60 and hard chrome plated on the surface, flatness 0.1 μm, Rmax O, 01
A lower mold having a flat surface of μm was attached to a press machine, and an aluminum alloy plate (JIS A3004
P) was placed between the upper and lower molds, and the plate and aluminum alloy plate were pressed together with a pressing force of 9 tons. As shown in Table 1, the hologram was transferred well over the entire area of the mold. When the groove depth of the transferred hologram was measured using a stylus roughness meter, the groove depth varied continuously, and was 1 μm at the outer edge of the transfer area and 0.2 μm at the center.
実施例２
上型支持具の表面形状が２０００ｍｍの球面形状である
ほかは実施例１と同様にしてホログラムを転写したとこ
ろ、表１に示すように、版型の全領域にわたってホログ
ラムが良好に転写された。転写されたホログラムの溝深
さは転写領域の全部にわたって均一に１μｍであった。Example 2 A hologram was transferred in the same manner as in Example 1 except that the surface shape of the upper die support was a 2000 mm spherical shape. As shown in Table 1, the hologram was transferred well over the entire area of the plate. It was done. The groove depth of the transferred hologram was uniformly 1 μm over the entire transfer area.
実施例３
ホログラムが形成されているニッケル版を厚さ５０μｍ
のゴム製緩衝材を介して上型支持具に取り付ける他は実
施例１と同様にしてホログラムを転写したところ、表１
に示すように、版型の全領域にわたってホログラムが良
好に転写された。転写されたホログラムの溝深さは転写
領域の外縁部では０９μｍ、中心部では０．６ μｍで
あった。Example 3 A nickel plate on which a hologram is formed has a thickness of 50 μm.
The hologram was transferred in the same manner as in Example 1 except that it was attached to the upper mold support via the rubber cushioning material, and Table 1
As shown, the hologram was successfully transferred over the entire area of the printing plate. The groove depth of the transferred hologram was 09 μm at the outer edge of the transfer area and 0.6 μm at the center.
実施例４
ホログラムが形成されているニッケル版を厚さ５０μｍ
のゴム製緩衝材を介して上型支持具に取り付りる他は実
施例２と同様にしてホログラムを転写したところ、表１
に示すように、版型の全領域にわたってホログラムが良
好に転写された。転写されたホログラムの溝深さは転写
領域の全部にわたって均一に０９μｍであった。Example 4 A nickel plate on which a hologram is formed has a thickness of 50 μm.
The hologram was transferred in the same manner as in Example 2, except that it was attached to the upper mold support via the rubber cushioning material, and the results are as shown in Table 1.
As shown, the hologram was successfully transferred over the entire area of the printing plate. The groove depth of the transferred hologram was uniformly 09 μm over the entire transfer area.
実施例５
被転写材の表面に表面粗さ測定のカットオフ値より長い
周期約１ｍｍ、高さ約２μｍのうねりを有する他は実施
例３と同様にしてホログラムを転写したところ、表１に
示すように、版型の全領域にねってホログラムが良好に
転写された。転写されたホログラムの溝深さは転写領域
の外縁部では０．９ μｍ１中心部では０．６μｍであ
った。Example 5 A hologram was transferred in the same manner as in Example 3, except that the surface of the transfer material had undulations with a period of about 1 mm longer than the cutoff value for surface roughness measurement and a height of about 2 μm. The results are shown in Table 1. The hologram was successfully transferred to the entire area of the printing plate. The groove depth of the transferred hologram was 0.9 μm at the outer edge of the transfer area and 0.6 μm at the center.
実施例６
被転写材が厚さ０．２４＋ｎｍ、錫メツキ量２．８ｇ／
ｍ２（片面当たり）、中心線平均粗さ０．０８μｍ、ビ
ッカース硬度９５の錫メツキ鋼板である他は実施例１と
同様にしてホログラムを転写したところ、表１に示すよ
うに、版型の全領域にわたってホログラムが良好に転写
された。転写されたホログラムの溝深さは転写領域の外
縁部では１μｍ、中心部では０．２ μｍであった。Example 6 Transfer material has a thickness of 0.24+nm and a tin plating amount of 2.8g/
The hologram was transferred in the same manner as in Example 1, except that it was a tin-plated steel plate with a centerline average roughness of 0.08 μm and a Vickers hardness of 95. As shown in Table 1, the entire plate shape was The hologram was well transferred over the area. The groove depth of the transferred hologram was 1 μm at the outer edge of the transfer area and 0.2 μm at the center.
比較例１
押圧力が１ ｔｏｎである他は実施例１と同様にしてホ
ログラムを転写したところ、表１に示すように、版の接
触した外縁部にはホログラムが転写されたが中心部の直
径８ｍｍ内の領域では転写されなかった。転写されたホ
ログラムの溝深さは最大でも０．２ μｍであった。Comparative Example 1 A hologram was transferred in the same manner as in Example 1 except that the pressing force was 1 ton. As shown in Table 1, the hologram was transferred to the outer edge where the plate contacted, but the diameter of the center No transfer was made in the area within 8 mm. The maximum groove depth of the transferred hologram was 0.2 μm.
比較例２
押圧力か２０ ｔｏｎである他は実施例１と同様にして
ホログラムを転写したところ、表１に示すように、直径
版型の形状に対応する凹みは形成されたか、ホログラム
は転写されなかった。また押圧による被転写材の反りが
起こり板材の品質が劣化した。Comparative Example 2 A hologram was transferred in the same manner as in Example 1, except that the pressing force was 20 tons. As shown in Table 1, a depression corresponding to the shape of the diameter plate was formed, and the hologram was not transferred. There wasn't. Furthermore, the transferred material warped due to the pressure, and the quality of the plate material deteriorated.
比較例３
上型支持具の表面形状が半径５００ｍｍの球面形状であ
るほかは実施例１と同様にしてホログラムを転写したと
ころ、表１に示すように、ホログラムは直径１６ｍｍの
範囲にしか転写されなかった。Comparative Example 3 A hologram was transferred in the same manner as in Example 1 except that the surface shape of the upper mold support was a spherical shape with a radius of 500 mm. As shown in Table 1, the hologram was transferred only in a range of 16 mm in diameter. There wasn't.
また抑圧による被転写材の反りが起こり板材の品質が劣
化した。In addition, the material to be transferred was warped due to the compression, and the quality of the plate material deteriorated.
比較例４
ホログラムが形成されているニッケル版の厚さが２０μ
ｍである他は実施例２と同様にしてホログラムを転写し
たところ、表１に示すように、押圧によって版が破れ、
ホログラムは転写されなかった。Comparative Example 4 The thickness of the nickel plate on which the hologram is formed is 20μ
When the hologram was transferred in the same manner as in Example 2 except that the number was m, as shown in Table 1, the plate was torn due to pressure.
The hologram was not transferred.
比較例５
ホログラムが形成されているニッケル版の厚さ、’＋）
２５０μｍである他は実施例２と同様にしてホログラム
を転写したところ、表１に示すように、抑圧によって版
が破れ、ホログラムは転写されなかった。Comparative Example 5 Thickness of the nickel plate on which the hologram is formed, '+)
When a hologram was transferred in the same manner as in Example 2 except that the thickness was 250 μm, as shown in Table 1, the plate was torn due to the pressure and the hologram was not transferred.
比較例６
ホログラムが形成されているニッケル版を厚さ３００μ
ｍのゴム製緩衝材を介して上型支持具に取り付ける他は
実施例１と同様にしてホログラムを転写したところ、表
１に示すように、緩衝材の変形によって押圧力が吸収さ
れ、ホログラムは転写されなかった。Comparative Example 6 A nickel plate on which a hologram is formed is 300μ thick.
The hologram was transferred in the same manner as in Example 1, except that it was attached to the upper die support via a rubber cushioning material of 1.5 m, and as shown in Table 1, the pressing force was absorbed by the deformation of the cushioning material, and the hologram was transferred. Not transcribed.
第１図は、本発明のレリーフ型ホログラムを作成するた
めの撮影工程Ａ、現像工程Ｂ、金属版型の作成工程Ｃ及
び金属素材の転写工程を示す説明図であり、
第２図は転写工程りの別の好適態様を示す説明図であり
、
′ｆＪ３図及び第４図は転写工程の更に別な好適態様を
示す断面図である。FIG. 1 is an explanatory diagram showing the photographing step A, the developing step B, the metal plate mold creation step C, and the metal material transfer step for creating a relief hologram of the present invention, and FIG. 2 is an explanatory diagram showing the transfer step. FIG. 4 is an explanatory diagram showing another preferred embodiment of the transfer process, and FIGS.
Claims (3)
の版と、平滑な表面を有する平面状の金属素材とを面に
対して直角方向に圧介させ、該金属素材の塑性変形によ
りその表面にレリーフ型ホログラムを転写させることを
特徴とするホログラムの製法。(1) A substantially planar plate on which a hologram is formed in the form of unevenness and a planar metal material with a smooth surface are pressed together in a direction perpendicular to the surface, and the plastic deformation of the metal material causes A hologram manufacturing method characterized by transferring a relief-type hologram onto the surface of the hologram.
を形成している請求項１記載の製法。(2) The manufacturing method according to claim 1, wherein the substantially planar plate forms a convex and gently curved surface toward the surface.
の薄い版を緩衝材の層を介して支持し、この版と、平滑
な表面を有する平面状の金属素材とを面に対して直角方
向に圧介させ、該金属素材の塑性変形によりその表面に
レリーフ型ホログラムを転写させることを特徴とするホ
ログラムの製法。(3) A thin, substantially planar plate on which a hologram is formed in the form of unevenness is supported via a layer of cushioning material, and this plate and a planar metal material with a smooth surface are placed face to face. 1. A method for producing a hologram, which comprises press-fitting the metal material in a right angle direction and transferring a relief-type hologram onto the surface of the metal material through plastic deformation.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1338639A JPH03200192A (en) | 1989-12-28 | 1989-12-28 | Production of hologram |
| US07/721,581 US5193014A (en) | 1989-11-28 | 1990-11-28 | Metal vessel having hologram of diffraction grating formed thereon |
| EP90917535A EP0455823A1 (en) | 1989-11-28 | 1990-11-28 | Metallic container equipped with hologram or diffraction grating |
| AU68765/91A AU634010B2 (en) | 1989-11-28 | 1990-11-28 | Metallic container equipped with hologram or diffraction grating |
| PCT/JP1990/001548 WO1991008525A1 (en) | 1989-11-28 | 1990-11-28 | Metallic container equipped with hologram or diffraction grating |
| AU26238/92A AU2623892A (en) | 1989-11-28 | 1992-10-07 | Metal vessel having hologram of diffraction grating formed thereon |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1338639A JPH03200192A (en) | 1989-12-28 | 1989-12-28 | Production of hologram |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03200192A true JPH03200192A (en) | 1991-09-02 |
| JPH0454238B2 JPH0454238B2 (en) | 1992-08-28 |
Family
ID=18320069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1338639A Granted JPH03200192A (en) | 1989-11-28 | 1989-12-28 | Production of hologram |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03200192A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002331312A (en) * | 2001-05-07 | 2002-11-19 | Sumitomo Metal Mining Co Ltd | Marking component for blanking die and blanking die using the same |
| WO2004062829A1 (en) * | 2003-01-09 | 2004-07-29 | Toyo Seikan Kaisha, Ltd. | Pattern transfer container and method of manufacturing the same |
| JP2009006745A (en) * | 2007-06-26 | 2009-01-15 | Enshu:Kk | Tongue and its manufacturing method |
| JP2010105386A (en) * | 2008-07-01 | 2010-05-13 | Key Tranding Co Ltd | Method of manufacturing decorative molding and decorative molding obtained by the method |
| JP2011079011A (en) * | 2009-10-06 | 2011-04-21 | Panasonic Corp | Coining die for metal, and compressor |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5865466A (en) * | 1981-10-15 | 1983-04-19 | Dainippon Printing Co Ltd | Duplicating method for hologram |
| JPS63138385A (en) * | 1986-11-29 | 1988-06-10 | Toppan Printing Co Ltd | Hologram press method |
-
1989
- 1989-12-28 JP JP1338639A patent/JPH03200192A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5865466A (en) * | 1981-10-15 | 1983-04-19 | Dainippon Printing Co Ltd | Duplicating method for hologram |
| JPS63138385A (en) * | 1986-11-29 | 1988-06-10 | Toppan Printing Co Ltd | Hologram press method |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002331312A (en) * | 2001-05-07 | 2002-11-19 | Sumitomo Metal Mining Co Ltd | Marking component for blanking die and blanking die using the same |
| WO2004062829A1 (en) * | 2003-01-09 | 2004-07-29 | Toyo Seikan Kaisha, Ltd. | Pattern transfer container and method of manufacturing the same |
| JP2009006745A (en) * | 2007-06-26 | 2009-01-15 | Enshu:Kk | Tongue and its manufacturing method |
| US8418324B2 (en) | 2007-06-26 | 2013-04-16 | Enshu Co., Ltd. | Tongue and method of manufacturing the same |
| JP2010105386A (en) * | 2008-07-01 | 2010-05-13 | Key Tranding Co Ltd | Method of manufacturing decorative molding and decorative molding obtained by the method |
| JP2011079011A (en) * | 2009-10-06 | 2011-04-21 | Panasonic Corp | Coining die for metal, and compressor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0454238B2 (en) | 1992-08-28 |
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