JPH0310761A - Cutter for semiconductor pellet - Google Patents

Cutter for semiconductor pellet

Info

Publication number
JPH0310761A
JPH0310761A JP14640489A JP14640489A JPH0310761A JP H0310761 A JPH0310761 A JP H0310761A JP 14640489 A JP14640489 A JP 14640489A JP 14640489 A JP14640489 A JP 14640489A JP H0310761 A JPH0310761 A JP H0310761A
Authority
JP
Japan
Prior art keywords
stage
groove
microscope
grinding stone
semiconductor pellet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14640489A
Other languages
Japanese (ja)
Inventor
Yukio Hayakawa
由紀夫 早川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Yamagata Ltd
Original Assignee
NEC Yamagata Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Yamagata Ltd filed Critical NEC Yamagata Ltd
Priority to JP14640489A priority Critical patent/JPH0310761A/en
Publication of JPH0310761A publication Critical patent/JPH0310761A/en
Pending legal-status Critical Current

Links

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

PURPOSE:To cut a semiconductor pellet without embedding the pellet in resin by a method wherein a rotary type diamond grinding stone is mounted in a groove vertically extending through the stage of a microscope, and the grinding stone is arranged movably within the groove in a state that the peripheral edge part of the grinding stone is protruded from the upper surface of the stage. CONSTITUTION:A semiconductor pellet is applied on a stage 2 of s microscope, and the target of a spot to be cut is positioned on a groove 3 of the stage 2. After the stage 2 is moved and the target is positioned in the center of the visual field of the microscope, the stage 2 and a diamond grinding stone 4 are moved in parallel to the groove 3. Further, the diamond stone 4 is moved in a direction extending vertically to the groove 3, and the center of the cutting edge of the grinding stone 4 is caused to coincide with the center of the width of the visual field of the microscope. Thereafter, the grinding stone 4 is rotated, and the stage 2 is horizontally moved in a direction paralleling the groove 3. The pellet is cut to its end part by means of the cutting edge of the diamond grinding stone 4, and cut is formed in the back of a cutting target of the pellet.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体ペレット用切削機に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a cutting machine for semiconductor pellets.

〔従来の技術〕[Conventional technology]

従来、半導体ペレットを切削して半導体ペレットに形成
された半導体素子の断面構造を観察するためには対象と
なる半導体ペレットを透明な硬い樹脂体に埋め込んで半
導体ペレットを保護し、樹脂体の外部から切削箇所の目
標が観察できる状態にして樹脂体を手の指あるいは治具
で固定してサンドペーパ及びアルミナ懸濁液を用いるパ
フ研磨法により半導体ペレットの端部から徐々に切削箇
所の目標に向って研磨すると云う方法が採用されていた
Conventionally, in order to observe the cross-sectional structure of a semiconductor element formed in a semiconductor pellet by cutting a semiconductor pellet, the target semiconductor pellet is embedded in a transparent hard resin body to protect the semiconductor pellet, and the semiconductor pellet is protected from the outside of the resin body. With the target of the cutting location visible, the resin body is fixed with fingers or a jig, and the powder is gradually polished from the edge of the semiconductor pellet toward the target of the cutting location using a puff polishing method using sandpaper and alumina suspension. A method called polishing was used.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記した従来の半導体ペレットの切削方法は、半導体ペ
レットを樹脂体に埋め込んでいるため、樹脂体への埋め
込みから樹脂硬化まで半日程の時間を要し、また切削箇
所の目標までサンドベーパやアルミナ懸濁液で徐々に研
磨して行かなければならないため、1個の半導体ペレッ
トの切削を完了するまでに8時間近くの工数を要してい
た。また、半導体ペレットが樹脂体内に埋め込まれてい
るため、切削箇所の目標の大きさが10μm以下になる
と、厘微鏡の対物レンズと目標の距離を近ずけられない
ため顕微鏡の倍率を高くできず、樹指体の外から顕微鏡
を使用して目標を明確に観察することが困難となり、目
標とする半導体素子の正確な位置の観察が得にくいと云
う欠点があった。
In the conventional semiconductor pellet cutting method described above, the semiconductor pellet is embedded in a resin body, so it takes half a day from embedding it in the resin body to resin hardening. Because polishing had to be done gradually with a liquid, it took nearly eight hours to complete the cutting of one semiconductor pellet. In addition, since the semiconductor pellet is embedded in the resin body, if the target size at the cutting point is less than 10 μm, the distance between the objective lens of the microscope and the target cannot be brought closer, so the magnification of the microscope cannot be increased. First, it is difficult to clearly observe the target from outside the resin using a microscope, and it is difficult to observe the exact position of the target semiconductor element.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の半導体ペレット用切削機は、顕微鏡のステージ
に設けて該ステージを上下に貫通する溝と、前記溝の内
部に設けて周縁部が前記ステージの上面に突き出すこと
の可能な円板状の回転式のダイヤモンド砥石と、前記ダ
イヤモンド砥石を前記溝によって水平及び垂直に移動さ
せる手段とを有する。
The cutting machine for semiconductor pellets of the present invention includes a groove provided on a stage of a microscope and penetrating the stage vertically, and a disk-shaped groove provided inside the groove so that a peripheral edge thereof can protrude above the top surface of the stage. It has a rotary diamond grindstone and means for moving the diamond grindstone horizontally and vertically through the groove.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

第1図(a)、(b)は本発明の一実施例の正面模式図
及び側面模式図である。
FIGS. 1(a) and 1(b) are a schematic front view and a schematic side view of an embodiment of the present invention.

第1図(a)、(b)に示すように、顕微鏡本体1の顕
微鏡の対物レンズの下に取付けられたステージ2の上下
の面を貫通して講3を設け、ステージ2の下側に制動ボ
ックス6に設けた軸にダイヤモンド砥石4が取付けられ
ている。
As shown in FIGS. 1(a) and 1(b), a tube 3 is provided penetrating the upper and lower surfaces of the stage 2 attached below the objective lens of the microscope main body 1, and is attached to the lower side of the stage 2. A diamond grindstone 4 is attached to a shaft provided in a brake box 6.

第2図(a)、(b)及び第3図は動作順に示した第1
図の部分平面図及びその側面図である。
Figure 2 (a), (b) and Figure 3 are the first
FIG. 3 is a partial plan view and a side view thereof.

まず、第2図(a)、(b)に示すように、半導体ペレ
ット7の切断箇所の目標18がステージ2の溝3上に位
置するように半導体ペレット7を両面テープ等でステー
ジ2の上に張り付け、ステージ2を移動して切断箇所の
目標8を顕微鏡視野の中心に位置させる。次に、ステー
ジ2とダイヤモンド砥石4を溝3と平行方向に水平移動
し、制動ボックス6を操作してダイヤモンド砥石4を講
3と垂直方向に移動してダイヤモンド砥石4の刃先の中
心を顕微鏡視野の中心に合せ、制動ボックス6を操作し
て刃先の高さを半導体ペレット7の表面と裏面との中間
に設定する。
First, as shown in FIGS. 2(a) and 2(b), the semiconductor pellet 7 is placed on the stage 2 using double-sided tape or the like so that the target 18 of the cutting point of the semiconductor pellet 7 is located on the groove 3 of the stage 2. and move the stage 2 to position the target 8 of the cutting location at the center of the microscope field of view. Next, the stage 2 and the diamond whetstone 4 are moved horizontally in a direction parallel to the groove 3, and the brake box 6 is operated to move the diamond whetstone 4 in a direction perpendicular to the stage 3, so that the center of the cutting edge of the diamond whetstone 4 can be seen under the microscope. , and operate the brake box 6 to set the height of the cutting edge to be midway between the front and back surfaces of the semiconductor pellet 7.

次に、第3図に示すようにダイヤモンド砥石4を回転さ
せ、ステージ2を溝3の平行方向に一定速度で水平移動
し、ダイヤモンド砥石4の刃先が半導体ペレット7の端
部に至るまで切削した所でダイヤモンド砥石4の回転を
停止する。
Next, as shown in FIG. 3, the diamond grinding wheel 4 was rotated, and the stage 2 was moved horizontally at a constant speed in the direction parallel to the groove 3, until the cutting edge of the diamond grinding wheel 4 reached the end of the semiconductor pellet 7. At this point, the rotation of the diamond grindstone 4 is stopped.

このようにして、半導体ペレット7に切削目標の裏側に
切り込みを入れた状態とした後に半導体ペレット7をス
テージ2から取り外し平な面上に置いて切削目標の延長
上の前記切り込み部を先端の細い針のようなもので押す
と、前記の切り込みに沿って半導体ペレット7が割れ切
断を完了する。
In this way, after the semiconductor pellet 7 has been cut on the back side of the cutting target, the semiconductor pellet 7 is removed from the stage 2 and placed on a flat surface, and the cut part on the extension of the cutting target is cut into a thin tip. When pressed with something like a needle, the semiconductor pellet 7 cracks along the cut and completes the cutting.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、半導体ペレットを樹脂に
埋め込むことなく切削が可能であるため、切削に要する
工数を従来の1/10以下とすることができる他、半導
体ペレットの切断箇所目標を直接語微鏡で観察し、位置
合せできるため、目標に合わせた正確な切削が可能とな
る。
As explained above, the present invention makes it possible to cut the semiconductor pellet without embedding it in resin, so the man-hours required for cutting can be reduced to 1/10 or less compared to the conventional method, and it is also possible to directly target the cutting point of the semiconductor pellet. Since it can be observed and aligned using a microscope, precise cutting can be performed according to the target.

及びその側面図である。and a side view thereof.

1・・・顕微鏡本体、2・・・ステージ、3・・・溝、
4・・・ダイヤモンド砥石、5・・・軸、6・・・制動
ボックス、7・・・半導体ペレット、8・・・切断箇所
目標。
1...Microscope body, 2...Stage, 3...Groove,
4... Diamond grindstone, 5... Shaft, 6... Brake box, 7... Semiconductor pellet, 8... Cutting point target.

Claims (1)

【特許請求の範囲】[Claims] 顕微鏡のステージに設けて該ステージを上下に貫通する
溝と、前記溝の下部に設けて周縁部が前記ステージの上
面に突き出すことの可能な円板状の回転式のダイヤモン
ド砥石と、前記ダイヤモンド砥石を前記溝にそって水平
及び垂直に移動させる手段を有することを特徴とする半
導体ペレット用切削機。
A groove provided on a stage of a microscope and passing through the stage vertically; a disc-shaped rotary diamond grindstone provided at the bottom of the groove so that a peripheral edge thereof can protrude above the top surface of the stage; and the diamond grindstone. A cutting machine for semiconductor pellets, comprising means for moving the pellet horizontally and vertically along the groove.
JP14640489A 1989-06-07 1989-06-07 Cutter for semiconductor pellet Pending JPH0310761A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14640489A JPH0310761A (en) 1989-06-07 1989-06-07 Cutter for semiconductor pellet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14640489A JPH0310761A (en) 1989-06-07 1989-06-07 Cutter for semiconductor pellet

Publications (1)

Publication Number Publication Date
JPH0310761A true JPH0310761A (en) 1991-01-18

Family

ID=15406937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14640489A Pending JPH0310761A (en) 1989-06-07 1989-06-07 Cutter for semiconductor pellet

Country Status (1)

Country Link
JP (1) JPH0310761A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04322442A (en) * 1991-04-22 1992-11-12 Sharp Corp Inspecting apparatus for semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04322442A (en) * 1991-04-22 1992-11-12 Sharp Corp Inspecting apparatus for semiconductor device

Similar Documents

Publication Publication Date Title
US7390242B2 (en) Diamond tool blade with circular cutting edge
JPS6135330A (en) Diamond knife for microtome and diamond tool and processing method thereof
JPS63120064A (en) Method of forming indentation in edge of semiconductor substrate in high-power semiconductor structure element
US4773186A (en) Portable polishing units for dental instruments
JPH0310761A (en) Cutter for semiconductor pellet
JP2001150356A (en) Mirror finish grinding wheel for grinder and mirror finish grinding method
JPS58191956U (en) Grinder
JPH10217076A (en) Work method of disk substrate, work device and outer peripheral blade grinding wheel used in this work method
JPS62264869A (en) Grinding stone for precision processing
JPS63113818A (en) Manufacture of thin film magnetic head
JPH0440853Y2 (en)
JPH02180554A (en) Method and device for notch grinding of semiconductor wafer
JPS5830111B2 (en) forming dresser
JP3126164B2 (en) Processing method of magnetic head slider
JP3035486B2 (en) Diamond dresser
JPH0752043A (en) Angular grinding wheel forming rotary dresser
KR960005296B1 (en) Device and method for centerless grinding cylinderical surfaces externally
JP2002096263A (en) Truing and dressing method
JPH0632887B2 (en) Chamfering method
JPH03126226A (en) Bevel forming method for semiconductor element
JPS6231016A (en) Floating slider for thin-film magnetic head
JPH0655426A (en) Grinder
JPH068140A (en) Circular arc shaping method for grinding wheel
JPS63200970A (en) Grinding wheel
JP3080019U (en) Whetstone with back plate