JPH02139556A - Small-sized automatic developing machine for photographic sensitive material - Google Patents
Small-sized automatic developing machine for photographic sensitive materialInfo
- Publication number
- JPH02139556A JPH02139556A JP21829289A JP21829289A JPH02139556A JP H02139556 A JPH02139556 A JP H02139556A JP 21829289 A JP21829289 A JP 21829289A JP 21829289 A JP21829289 A JP 21829289A JP H02139556 A JPH02139556 A JP H02139556A
- Authority
- JP
- Japan
- Prior art keywords
- processing
- tank
- liquid
- processing tank
- processing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 34
- 238000012545 processing Methods 0.000 claims abstract description 166
- 239000007788 liquid Substances 0.000 claims abstract description 80
- 238000007789 sealing Methods 0.000 claims abstract description 29
- 230000003647 oxidation Effects 0.000 claims description 12
- 238000007254 oxidation reaction Methods 0.000 claims description 12
- 239000011261 inert gas Substances 0.000 claims description 8
- 238000007599 discharging Methods 0.000 claims description 6
- 230000002265 prevention Effects 0.000 claims description 5
- 230000007246 mechanism Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 9
- 230000008569 process Effects 0.000 abstract description 7
- 125000006850 spacer group Chemical group 0.000 abstract description 6
- 230000006866 deterioration Effects 0.000 abstract description 4
- 239000012530 fluid Substances 0.000 abstract description 4
- 238000010276 construction Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000011161 development Methods 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000010808 liquid waste Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Photographic Processing Devices Using Wet Methods (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、写真感光材料を現像処理するのに用いられる
自動現像機、更に詳しくは、少量の処理液で処理を行な
うものであって、処理液の酸化ないし劣化を有効に防止
するよう改良された超小型の自動現像機に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an automatic developing machine used for developing photographic materials, and more specifically, to an automatic developing machine that processes photographic materials using a small amount of processing liquid. This invention relates to an ultra-compact automatic developing machine that has been improved to effectively prevent oxidation or deterioration of processing liquid.
［従来の技術］
通常の写真感光材料（写真フィルム・印画紙）を自動的
に現像処理する自動現像機としては、大型の集中処理施
設（以下、大ラボと称する）で利用する大型のものから
、比較的小規模の店舗内に設置して利用する比較的小型
のもの（以下、ミニラボと称する）が−船釣であるが、
更に小型のものとしては、身分証明用等のダイレクトポ
ジ写真をセルフサービスで処理するもの、Ｘ線フィルム
を処理するもの或いは、所謂手現像の要素を含む超小型
のものが知られている。[Prior art] Automatic processing machines that automatically process ordinary photographic materials (photographic film and photographic paper) include large machines used in large centralized processing facilities (hereinafter referred to as large laboratories). , A relatively small-sized device (hereinafter referred to as a mini-lab) that is installed and used in a relatively small-scale store is - boat fishing.
As smaller-sized devices, there are known devices that process direct positive photographs for identification purposes in a self-service manner, devices that process X-ray films, and ultra-small devices that include so-called manual development elements.
これら従来の自動現像機では、処理槽に処理液を溜めて
おき、搬送ラック或いはガイド板等で写真感光材料を処
理槽に案内して、処理液に浸漬して処理する所謂浸漬処
理方式によるのが普通である。These conventional automatic processing machines use a so-called immersion processing method, in which a processing solution is stored in a processing tank, and the photosensitive material is guided to the processing tank using a transport rack or a guide plate, and then immersed in the processing solution. is normal.
また、比較的小型の自動現像機にあっては、浸漬処理方
式の変形として、スリット状に形成した処理漕に処理液
を溜めておき、このスリット中で写真感光材料を搬送し
ながら処理液に接触させて処理するものや、乳剤面を下
側にして写真感光材料を水平に搬送し、乳剤面を処理液
面に接触させるもの、ロールで処理液をすくい上げて乳
剤面に塗布するもの、下面から処理液を噴射して供給す
るもの等がある。In addition, in a relatively small automatic processing machine, as a modification of the immersion processing method, a processing solution is stored in a processing tank formed in the shape of a slit, and the photographic material is transported through the slit while being soaked in the processing solution. There are those in which the photographic material is processed in contact, those in which the photographic material is conveyed horizontally with the emulsion side facing down, and the emulsion side is brought into contact with the processing liquid surface, those in which the processing liquid is scooped up with a roll and applied to the emulsion side, and the bottom side. There are some that supply processing liquid by spraying it from there.
処理液を空気に接触させたま＼放置しておくと空気中の
酸素と反応して酸化したり、劣化し、処理性能に重要な
影響を与えることになる。If the processing liquid is left in contact with air, it will react with oxygen in the air, oxidize or deteriorate, which will have a significant impact on processing performance.
大型の自動現像機にあっては、処理槽に溜められる処理
液が１０１以上と大量であるために、所謂「処理液上面
の開口面積／処理液量Ｊ比が小さいので、処理槽の上方
を蓋等で密閉するだけで、処理液上面にはかなりの解放
空間が残されたままの状態になっている。In large automatic processing machines, the processing liquid stored in the processing tank is large, 101 or more, so the so-called "opening area on the top surface of the processing liquid/processing liquid volume J ratio is small, so the upper part of the processing tank is By simply sealing the container with a lid or the like, a considerable amount of open space remains on the top surface of the processing liquid.
小型の自動現像機てあっても、処理槽に溜められる処理
液の量が４文以上と比較的多いもりあっては、大型の自
動現像機と同様の対策で済ませるか、或いは、特開昭５
４−２７９６８号公報に記載されている如く、処理漕の
上面に浮き蓋を設けたりする対策がとられている。Even if you have a small automatic processor, if the amount of processing solution stored in the processing tank is relatively large (4 or more), you should take measures similar to those for large automatic processors, or 5
As described in Japanese Patent No. 4-27968, measures such as providing a floating lid on the top surface of the processing tank have been taken.
これに対し、本発明が対象とする、処理槽に溜められる
処理液の量が２文以下の少量である自動現像機にあって
は、所謂ｒ処理液上面の開口面積／処理液量ｊ比が大き
く、蓋をした程度では、処理液の上面と蓋との間に存在
する空気によりて処理液の酸化が進んでしまうので１例
えば、米国特許３，２７３，４８５号、特開昭６０−２
８３：１８号公開公報等に記載されている如く貯蔵タン
クに溜められている処理液をスリット状の処理槽に供給
し、このスリットに写真感光材料を搬送させて処理する
方式、米国特許：ｌ、：ｌ：１０，１９６号等に記載さ
れている如く、処理液を塗布ローうですくい上げて写真
感光材料に塗布する方式が提案されている。On the other hand, in the case of an automatic developing machine, which is the subject of the present invention, in which the amount of processing liquid stored in the processing tank is small, 2 or less, the so-called ratio r of the opening area of the upper surface of the processing liquid/processing liquid amount j. is large, and if the lid is closed, the oxidation of the treatment liquid will proceed due to the air existing between the top surface of the treatment liquid and the lid.1For example, U.S. Pat. 2
As described in Publication No. 83:18, etc., a method in which a processing liquid stored in a storage tank is supplied to a slit-shaped processing tank, and a photographic material is transported through the slit for processing, US Patent: l As described in No. 10,196, etc., a method has been proposed in which a processing liquid is scooped up with a coating wax and applied to a photographic light-sensitive material.
［発明が解決しようとする課題］
近年、所謂ミニラボの普及により、１時間仕上げといフ
た迅速処理を可能にしたＤＰＥサービス店が出現してい
るが、それでも全処理量の約７５％は大ラボで取り扱わ
れているのが現状である。[Problems to be Solved by the Invention] In recent years, with the spread of so-called mini-labs, DPE service shops have appeared that are able to complete processing as quickly as one hour. Currently, it is being handled in
然しなから、大ラボでの処理では、ＤＰＥ取次店を経由
する集配の問題があるので仕上げ時間の短縮には限界が
あり、ミニラボの普及が進めば１時間以内の超迅速処理
が普通の観念となり、ミニラボての処理が多数を占める
に至るものと思われる。However, when processing in a large laboratory, there is a limit to the reduction in finishing time due to the problem of collection and delivery via a DPE agent, and if minilabs become more widespread, ultra-quick processing within one hour will become the norm. Therefore, it is thought that the majority of processing will be carried out in minilabs.
更に将来を展望すると、ミニラボによる処理から、ＯＡ
機器の如き超小型の自動現像機を利用したセルフサービ
スによるＤＰＥ処理へまで発展することが考えられる。Looking further into the future, from processing in minilabs to OA
It is conceivable that this will develop to self-service DPE processing using ultra-compact automatic processors such as machines.
このような処理システムでは、自動現像機は。In such a processing system, an automatic processor is.
従来のミニラボの如き専門店に限定されずに、ＯＡａ器
の如く様々な場所に設置されなければならないので、現
在のミニラボよりも更に超小型の自動現像機でなければ
対応できないものになるものと予想される。It is not limited to specialty stores like conventional minilabs, but must be installed in various locations like OAa equipment, so it will only be possible to handle it with automatic processors that are even more compact than the current minilabs. is expected.
けだし、現在のミニラボは、小型とはいっても相当の大
きさがあり、狭い店舗等では設置することができず、ま
た、写真感光材料や処理液の取り扱い、ジャムが発生し
た場合や、ローラやフィルタの洗浄等のメンテナンスが
煩雑であり操作には熟練を要するから、設置スペースや
操作上の制約があるからである。However, although current minilabs are small, they are quite large and cannot be installed in small stores, etc., and they also have trouble handling photographic materials and processing solutions, handling problems such as jams, rollers, etc. This is because maintenance such as filter cleaning is complicated and operation requires skill, and there are restrictions on installation space and operation.
そこで、将来型の処理システムで利用可能な自動現像機
には、超小型で軽量であること、誰にでも操作できるも
のであること、＃ｊ＆構が簡易で搬送トラブル等が発生
しにくものであること、使用する処理液が少量であり、
廃液や廃棄物が少量であり、悪臭、振動、騒音が少ない
こと、安価に製造できること１等が要請される。Therefore, automatic processors that can be used in future processing systems must be ultra-compact and lightweight, can be operated by anyone, have a simple structure, and are unlikely to cause transportation problems. , the amount of processing liquid used is small;
The following requirements are required: a small amount of liquid waste or waste, low odor, vibration, and noise, and low manufacturing cost.
本ｙＡＩＪ］者らは、上記要請を満足させる自動現像機
の改良を鋭意研究し、本発明の完成に至ったものであり
、特に本発明は、利用する処理液をできるだけ少量化す
ること、処理液を少量とした場合に特に影響の大きい処
理液の酸化や劣化を如何に有効に防止するか、に関する
対策を明らかにすることを主目的とするものであって、
本発明の他の目的ないし利益は以下の記述から明白とな
るであろう。[YAIJ] have conducted extensive research into improving automatic processing machines that satisfy the above requirements, and have completed the present invention.In particular, the present invention aims to reduce the amount of processing liquid used as much as possible; The main purpose of this study is to clarify measures to effectively prevent oxidation and deterioration of processing liquids, which have a particularly large effect when the liquid is used in small quantities.
Other objects and advantages of the invention will become apparent from the description below.
［課題を解決するための手段］
上記目的を達成する本発明の写真感光材料の小型自動現
像機は、■処理槽をスリット状に形成して、この処理槽
に処理液を供給すると共に写真感光材料を搬送して現像
処理する自動現像機において、処理液液面に近い処理槽
上部に密封手段が設けられていること、■処理槽をスリ
ウド状に形成して、この処理槽に処理液を供給すると共
に写真感光材料を搬送して現像処理する自動現像機にお
いて、処理液の液面上部に不活性気体ないし液体を封入
ないし供給して処理液と空気とを遮断すること、又は■
処理液を処理槽外に排出する機構と共に、写真感光材料
の搬送状態を検知する手段を設け、写真感光材料の不存
在が一定時間以上継続した場合に、処理液を処理槽外の
空気酸化防止槽に排出する構成を有すること、を特徴と
する。[Means for Solving the Problems] A compact automatic developing machine for photographic light-sensitive materials according to the present invention that achieves the above-mentioned object has: (1) a processing tank formed in a slit shape, a processing solution being supplied to the processing tank, and a photosensitive material In an automatic developing machine that conveys and processes materials, a sealing means is provided at the top of the processing tank near the surface of the processing solution. In an automatic processor that supplies and conveys photographic light-sensitive materials for development processing, an inert gas or liquid is enclosed or supplied above the liquid level of the processing solution to block the processing solution from air, or
In addition to a mechanism for discharging the processing solution to the outside of the processing tank, a means for detecting the transportation status of the photographic material is provided, and if the absence of the photographic material continues for a certain period of time, the processing solution is removed from the air outside the processing tank to prevent oxidation. It is characterized by having a configuration for discharging into a tank.
本発明は、（ａ）密封手段が、処理漕の入口及び出口に
配置される搬送ローラを処理液液面に近い処理槽上面に
配置して、該搬送ローラによ゛り処理槽を密封する構成
であること、（ｂ）密封手段が、処理槽の上面開口部に
移動する密閉用可動片により処理液液面に近い処理槽上
面を密刻する構成であること、（Ｃ）密封手段が、処理
漕の上面に設けられる搬送用スリットを有する棒状バル
ブにより処理液液面に近い処理槽上面を密封する構成で
あること、（ｄ）密封手段が、処理槽にフレキシブルな
パックを内装して処理液を溜め、バックの上端近くをシ
ールすることにより処理液を密封する構成であること、
又は（ｅ）密封手段が、処理槽の上昇ないし、蓋部材の
下降により処理槽上面を密封する構成であること、が好
ましい。In the present invention, (a) the sealing means arranges transport rollers disposed at the inlet and outlet of the processing tank on the upper surface of the processing tank near the processing liquid level, and seals the processing tank with the transport rollers. (b) the sealing means is configured to seal the top surface of the processing tank close to the processing liquid level by a movable sealing piece that moves to the top opening of the processing tank; (C) the sealing means (d) The sealing means includes a flexible pack inside the processing tank; The structure is such that the processing liquid is sealed by storing the processing liquid and sealing near the top of the bag;
Or (e) it is preferable that the sealing means is configured to seal the top surface of the processing tank by raising the processing tank or lowering the lid member.
［作用］
従来の自動現像機の処理槽では、例え上部を蓋等で密閉
したものであっても、処理液液面の上部に少なからず空
気が存在している０本発明が対象とするような小型の自
動現像機であり、利用する処理液の量が極めて少量であ
るもの（処理槽に溜められる処理液量が２文以下）にあ
っては、処理液の酸化防止は極めて重要な課題となる。[Function] In the processing tank of a conventional automatic processing machine, even if the upper part is sealed with a lid or the like, there is a considerable amount of air above the processing liquid level. For small automatic processing machines that use extremely small amounts of processing liquid (the amount of processing liquid stored in the processing tank is less than 2 centimeters), preventing oxidation of the processing liquid is an extremely important issue. becomes.
処理液液面が少量であっても空気に晒されていると酸化
して現像処理に使用できないものとなり、新液と交換し
なければならなくなり、結果的に処理液の使用量が増加
することになる。Even if the level of the processing solution is small, if it is exposed to the air, it will oxidize and become unusable for development processing, and it will have to be replaced with new solution, resulting in an increase in the amount of processing solution used. become.
本発明によれば、処理液の液面に近い処理槽の上部が密
封手段で密封されるので、或いは不活性気体や流体を用
いて空気置換したり、又は処理槽外の空気酸化防止槽に
、非処理時は処理液を移すので、処理液に接触する空気
の量が極めて少なく、上記したような弊害が除去される
。According to the present invention, the upper part of the processing tank near the liquid level of the processing liquid is sealed with a sealing means, or the air is replaced using an inert gas or fluid, or the air is removed from the oxidation prevention tank outside the processing tank. Since the processing liquid is transferred during non-processing, the amount of air that comes into contact with the processing liquid is extremely small, eliminating the above-mentioned disadvantages.
［実施例］
次に、添付の図面に従って本発明の各態様を順次詳細に
説明する。[Example] Next, each aspect of the present invention will be described in detail in accordance with the accompanying drawings.
■第１図に示されているもので、密封手段が、処理漕の
入口及び出口に配置される搬送ローラを処理液液面に近
い処理槽上面に配置して、該搬送ローラにより処理槽を
密封する構成である態様である。■The sealing means is shown in Fig. 1, and the sealing means is arranged so that conveyance rollers placed at the inlet and outlet of the treatment tank are placed on the upper surface of the treatment tank close to the processing liquid level, and the treatment tank is closed by the conveyance rollers. This embodiment has a sealed configuration.
図面において、 １０は処理槽であって、下側部材１１
と蓋側部材とでスリット状に形成されており、液面１３
まで図示していない処理液供給手段により処理液が供給
され、写真感光材料Ｆは矢符方向に搬送される途中で浸
漬処−理される。In the drawing, 10 is a processing tank, and a lower member 11
It is formed in a slit shape by the and lid side member, and the liquid level 13
A processing liquid is supplied by a processing liquid supply means (not shown), and the photographic material F is subjected to an immersion treatment while being conveyed in the direction of the arrow.
２０は一対となっている搬送ローラであって、少なくと
も、処理槽１０の入口側と出口側に各一対か配置される
。この搬送ローラ２０の軸は一対全体が蓋側部材１２．
ないし下側部材１１に固定される構成でもよいし、或い
は、下側の搬送ローラ２１の軸だけを下側部材１１に固
定する構成であってもよい。Reference numeral 20 denotes a pair of conveying rollers, and at least one pair is disposed on the inlet side and the outlet side of the processing tank 10. A pair of shafts of this conveyance roller 20 are entirely connected to the lid side member 12.
Alternatively, it may be configured such that it is fixed to the lower member 11, or it may be configured that only the shaft of the lower conveyance roller 21 is fixed to the lower member 11.
さて、下側部材１１と蓋側部材１２には、処理液の液面
１３の若干上方に、搬送ローラ２０を配置するための凹
部が設けられる。この凹部は、下側部材１１ないし蓋側
部材１２を加工して直接設けるようにしてよいし、凹部
の形成された部材を下側部材１１ないし蓋側部材１２に
取り付けるようにしてもよい。Now, the lower member 11 and the lid member 12 are provided with a recessed portion slightly above the liquid level 13 of the processing liquid, in which the conveyance roller 20 is disposed. The recess may be directly provided by processing the lower member 11 or the lid member 12, or the member in which the recess is formed may be attached to the lower member 11 or the lid member 12.
凹部の曲面寸法は、搬送ローラ２０の直径に対応してお
り、ローラの回転が阻害されない程度の空隙を残すか、
或いは、下側部材１１ないし蓋側部材１２とは独立して
凹部部材を設け、これをローラ方向に緩やかなバネで押
圧して空隙が生じないように構成する。更に、ローラと
凹部部分との間に、好ましくは、摩擦係数の低い材料で
形成したスペーサ２１’を配置して空隙をなくすように
する。また、このような態様では、スペーサ２１′が搬
送ローラ２０の汚れを取るためのクリーニング部材を兼
用するように構成すること、或いは、スペーサ２１′が
搬送ローラ２０に付着した処理液を取り去るスクイズ用
の部材を兼用するように構成すること、更には、これら
の構成とは全く独立してスクイズ用の部材を配置するこ
と、等も有益である。The curved surface dimension of the recess corresponds to the diameter of the conveyance roller 20, and a gap is left to the extent that rotation of the roller is not inhibited.
Alternatively, a concave member may be provided independently of the lower member 11 or the lid member 12, and this may be pressed in the direction of the roller with a gentle spring so that no gap is created. Further, a spacer 21' preferably made of a material with a low coefficient of friction is disposed between the roller and the recessed portion to eliminate air gaps. In addition, in such an embodiment, the spacer 21' may also be configured to serve as a cleaning member for removing dirt from the transport roller 20, or the spacer 21' may be configured to serve as a squeeze member to remove processing liquid adhering to the transport roller 20. It is also advantageous to arrange the squeezing member so that it can also be used as the other members, and furthermore, to arrange the squeeze member completely independently of these members.
■第２図〜第６図に示されているもので、密閉手段が、
処理槽の上面開口部に移動する密閉用可動片により処理
液液面に近い処理槽上面を密封する構成である態様であ
る。■As shown in Figures 2 to 6, the sealing means is
In this embodiment, the upper surface of the processing tank near the surface of the processing liquid is sealed by a movable sealing piece that moves to the upper opening of the processing tank.
第２図において、３０は密閉用可動片であり、バネ・ソ
レノイド或いは流体圧力等で矢符方向に移動されて処理
槽１０を密閉するものである。In FIG. 2, reference numeral 30 denotes a movable sealing piece, which is moved in the direction of the arrow by a spring, solenoid, fluid pressure, etc. to seal the processing tank 10.
第３図〜ＭＳ５図に示したものは、密閉用可動片３０を
回転運動させて処理槽１０を密封する構成である。What is shown in FIGS. 3 to MS5 is a configuration in which the processing tank 10 is sealed by rotationally moving the sealing movable piece 30.
第６図に示したものは、断面円形の棒状に形成された密
閉用可動片３０を処理槽ｌＯの上部に形成した係止部ま
で移動させて処理槽ｌＯを密閉する構成である。What is shown in FIG. 6 is a configuration in which a movable sealing piece 30 formed in the shape of a bar with a circular cross section is moved to a locking portion formed at the upper part of the processing tank 1O to seal the processing tank 1O.
■第７図及び第８図に示されているものは、密閉手段が
、処理槽の上面に設けられる搬送用スリットを有する棒
状バルブにより処理液液面に近い処理槽上面を密封する
構成である。■In the case shown in FIGS. 7 and 8, the sealing means is configured to seal the top surface of the processing tank near the processing liquid level using a rod-shaped valve having a conveyance slit provided on the top surface of the processing tank. .
第７図及び第８図において、 ３１は内部に搬送路が形
成されている断面円形の棒状バルブであって、下側部材
１１及び蓋側部材１２に用意されている円形凹部に配置
されている。第７図に示した状態は、搬送路が形成され
ている状態で、処理槽１０の上面は解放状態になってい
る。この状態から。In FIGS. 7 and 8, reference numeral 31 denotes a rod-shaped valve with a circular cross section and a conveyance path formed inside, and is arranged in a circular recess provided in the lower member 11 and the lid member 12. . In the state shown in FIG. 7, the transport path is formed and the top surface of the processing tank 10 is in an open state. From this state.
９０度だけ回転させれば、棒状バルブ３１内の搬送路は
横向きとなり、処理槽１０の上面は密封されることにな
る。If it is rotated by 90 degrees, the conveyance path within the rod-shaped valve 31 will be oriented horizontally, and the upper surface of the processing tank 10 will be sealed.
■第９図に示されているものは、密閉手段が。■The one shown in Figure 9 has a sealing means.
処理槽にフレキシブルなパックを内装して処理液を溜め
、パックの上端近くをシールすることにより処理液を密
封する構成である。The processing tank is equipped with a flexible pack to store the processing liquid, and the upper end of the pack is sealed to seal the processing liquid.
同図において、３２は、例えば合成樹脂製シート等て形
成したフレキシブルなパック（袋）であり、解放端を下
側部材１１の上部に固定し、内側に処理液を溜めて利用
するもので、可動片３０をバネ・ソレノイド或いは流体
圧力等で矢符方向に移動させることにより、パック３２
の上部を蓋側部材１２の側面に押圧して処理槽ｌＯの上
面を密閉する。In the figure, 32 is a flexible pack (bag) made of, for example, a synthetic resin sheet, the open end of which is fixed to the upper part of the lower member 11, and the processing liquid is stored inside for use. The pack 32 is moved by moving the movable piece 30 in the direction of the arrow using a spring, solenoid, fluid pressure, etc.
is pressed against the side surface of the lid-side member 12 to seal the upper surface of the processing tank IO.
■第１０図に示されているものは、密閉手段が、処理槽
の上昇ないし、蓋部材の下降により処理槽上面を密封す
る構成である。(2) The structure shown in FIG. 10 is such that the sealing means seals the upper surface of the processing tank by raising the processing tank or lowering the lid member.
第１０図に示す如く、下側部材１１と蓋側部材１２とは
ｆＬｌと見２で示す間隙で搬送路が形成されており、従
って、この状態では処理槽１０の上面は解放状態になっ
ており、蓋ｇｆ１部材１２を鬼１から又２まで下降させ
るか、或いは、処理槽（下側部材１１）を１２から文１
まで上昇させることにより、下側部材１１の上部が蓋側
部材１２に接触して、処理槽１０を密閉する。As shown in FIG. 10, a conveyance path is formed between the lower member 11 and the lid member 12 with a gap shown by fLl and 2, and therefore, in this state, the upper surface of the processing tank 10 is in an open state. Then, lower the lid gf1 member 12 from 1 to 2, or lower the processing tank (lower member 11) from 12 to 1.
The upper part of the lower member 11 comes into contact with the lid member 12, thereby sealing the processing tank 10.
■第１１図に示されているものは、密閉手段が、処理液
の液面上部に不活性気体ないし液体を封入ないし供給し
て処理液と空気とを遮断する構成である。(2) The structure shown in FIG. 11 is such that the sealing means seals or supplies an inert gas or liquid above the surface of the processing liquid to shut off the processing liquid and air.
少なくとも処理Ｉ！！１０の出入口付近に区画空間を形
成し、この空間内に不活性ガス等を封入ないし供給して
処理液と空気との接触を遮断するものである。At least process I! ! A partitioned space is formed near the entrance and exit port 10, and an inert gas or the like is sealed or supplied into this space to block contact between the processing liquid and air.
封入の場合には、少なくとも処理槽１０の上面の一部を
区画した密閉空間を形成する必要があるが、供給の場合
には、空間の密閉は緩やかでよく不活性ガス等が供給口
から処理液液面を通フて排出口に流れるように流路な形
成する。In the case of enclosing, it is necessary to form a sealed space that partitions at least a part of the upper surface of the processing tank 10, but in the case of supply, the sealing of the space may be loose and the inert gas etc. may be supplied from the supply port to the processing tank. A flow path is formed so that the liquid flows through the liquid surface to the outlet.
不活性ガスではなく液体を利用する態様では、処理液よ
りも比重の軽いものであり、写真感光材料に付着せず、
処理液に悪影響を与えない物性のものを利用することが
好ましい。In the embodiment where a liquid is used instead of an inert gas, the specific gravity is lighter than that of the processing liquid, and it does not adhere to the photographic material.
It is preferable to use materials with physical properties that do not adversely affect the processing solution.
また、上記した不活性気体ないし液体の封入ないし供給
操作は、各処理種別に個々に行なってもよいし全体をま
とめて行なうようにしてもよい。Further, the above-described operation of enclosing or supplying the inert gas or liquid may be performed individually for each treatment type, or may be performed all at once.
■第１２図に示されているものは、処理液を処理槽外に
排出する機構と共に、写真感光材料の搬送状態を検知す
る手段を設け、写真感光材料の不存在が一定時間以上継
続した場合に、処理液を処理槽外の密閉容器の如き空気
酸化防止槽１４に排出し、必要に応じて再使用すること
により、処理液の酸化を防止する態様である。■The device shown in Figure 12 is equipped with a mechanism for discharging the processing liquid out of the processing tank and a means for detecting the conveyance state of the photographic material, and when the absence of the photographic material continues for a certain period of time or more. In this embodiment, oxidation of the processing liquid is prevented by discharging the processing liquid into an air oxidation prevention tank 14 such as a closed container outside the processing tank and reusing it as necessary.
処理液を処理４ａｔｏから処理液タンク１４に戻すだけ
の態様と、空になった処理槽ｌＯに水タンク１５から水
を処理槽１０に供給して処理槽ｌＯ内を水置換しておく
態様がある。再利用する際には、水を水タンク１５に戻
すか、或いは外部に廃棄してから処理液を供給する。There are two modes: a mode in which the processing liquid is simply returned from the processing tank 4ato to the processing liquid tank 14, and a mode in which water is supplied from the water tank 15 to the processing tank 10 to replace the inside of the processing tank 10 with water. be. When reusing the water, the water is returned to the water tank 15 or disposed of outside before supplying the treatment liquid.
処理液ＩＯを水置換する態様にあっては、供給する水を
加熱しておき、置換水を定期的に交換するようにして処
理槽１０の恒温状態を維持させておく構成にすることに
より、利用再開時の時間待ちを短くするのに有益である
。In the embodiment in which the treatment liquid IO is replaced with water, the supplied water is heated and the replacement water is periodically replaced to maintain a constant temperature state of the treatment tank 10. This is useful for shortening the waiting time when resuming use.
以上説明した本発明の密閉手段の作動を制御するには、
搬送系路内に写真感光材料の終端を検知するセンサを設
けておき、終端検知から一定秒後に処理液酸化防止手段
を作動させること、或いは、・一定時間以上の不使用を
検知して作動させること、更には、マニュアル操作によ
り行なうようにする。To control the operation of the sealing means of the present invention explained above,
A sensor for detecting the end of the photosensitive material is provided in the conveyance system, and the processing liquid oxidation prevention means is activated a certain number of seconds after the end is detected, or the processing liquid oxidation prevention means is activated when non-use for a certain period of time or more is detected. In addition, it should be done manually.
［発明の効果］
以上説明した本発明は、利用する処理液が極めて少量で
ある場合にあっても、処理液の酸化や劣化を有効に防止
することができ、将来型の処理システムに利用する超小
型の自動現像機を現実のものとするものであるから、頭
記した目的の達成が可能である。[Effects of the Invention] The present invention described above can effectively prevent oxidation and deterioration of the processing liquid even when the processing liquid is used in an extremely small amount, and can be used in future processing systems. Since an ultra-compact automatic developing machine is made a reality, the above-mentioned purpose can be achieved.
第１図〜第７図は夫々本発明の一実施例を示す断面図、
第８図は同じく斜視図、第９図〜ｉｌ１図は同じく断面
図、第１２図は同じく概略図である。
図中において各符号は下記を指示する。
Ｆ：写真感光材料
１０：処理槽
１１：下側部材
１２：蓋側部材
１３：処理液液面
１４：処理液タンク
１５；水タンク
２０：搬送ローラ
２１：下側搬送ローラ
２１′ニスペーサ
３０：密閉用可動片
３１：搬送路付きバルブ
３２：フレキシブルバック
２１′：スペーサFIGS. 1 to 7 are cross-sectional views showing one embodiment of the present invention, respectively;
8 is a perspective view, FIGS. 9 to 11 are sectional views, and FIG. 12 is a schematic view. In the figure, each symbol indicates the following. F: Photographic photosensitive material 10: Processing tank 11: Lower member 12: Lid member 13: Processing liquid level 14: Processing liquid tank 15; Water tank 20: Conveyance roller 21: Lower conveyance roller 21' varnish spacer 30: Sealing Movable piece 31: Valve with conveyance path 32: Flexible back 21': Spacer
Claims (1)
液を供給すると共に写真感光材料を搬送して現像処理す
る自動現像機において、処理液液面に近い処理槽上部に
密封手段が設けられていることを特徴とする写真感光材
料の小型自動現像機。 ２、処理槽をスリット状に形成して、この処理槽に処理
液を供給すると共に写真感光材料を搬送して現像処理す
る自動現像機において、処理液の液面上部に不活性気体
ないし液体を封入ないし供給して処理液と空気とを遮断
することを特徴とする写真感光材料の小型自動現像機。 ３、処理液を処理槽外に排出する機構と共に、写真感光
材料の搬送状態を検知する手段を設け、写真感光材料の
不存在が一定時間以上継続した場合に、処理液を処理槽
外の空気酸化防止槽に排出する構成を有することを特徴
とする写真感光材料の小型自動現像機。[Scope of Claims] 1. In an automatic processing machine in which a processing tank is formed in a slit shape and a processing solution is supplied to the processing tank and a photographic light-sensitive material is conveyed and processed, processing near the processing solution surface is possible. A small automatic developing machine for photographic materials, characterized in that a sealing means is provided in the upper part of the tank. 2. In an automatic processor in which a processing tank is formed in the form of a slit and a processing liquid is supplied to the processing tank and the photographic light-sensitive material is conveyed and processed, an inert gas or liquid is placed above the surface of the processing liquid. A small automatic developing machine for photographic materials characterized by sealing or supplying a processing solution to shut off air. 3. In addition to a mechanism for discharging the processing liquid to the outside of the processing tank, a means for detecting the transportation state of the photographic light-sensitive material is provided, and if the absence of the photographic light-sensitive material continues for a certain period of time, the processing liquid is discharged into the air outside the processing tank. A small automatic developing machine for photographic materials, characterized by having a configuration for discharging into an oxidation prevention tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1218292A JP2811008B2 (en) | 1988-08-31 | 1989-08-23 | Small automatic developing machine for photographic photosensitive materials |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63-217436 | 1988-08-31 | ||
| JP21743688 | 1988-08-31 | ||
| JP1218292A JP2811008B2 (en) | 1988-08-31 | 1989-08-23 | Small automatic developing machine for photographic photosensitive materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02139556A true JPH02139556A (en) | 1990-05-29 |
| JP2811008B2 JP2811008B2 (en) | 1998-10-15 |
Family
ID=26522023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1218292A Expired - Lifetime JP2811008B2 (en) | 1988-08-31 | 1989-08-23 | Small automatic developing machine for photographic photosensitive materials |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2811008B2 (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55147046U (en) * | 1979-04-05 | 1980-10-22 | ||
| JPS61250648A (en) * | 1985-04-30 | 1986-11-07 | Konishiroku Photo Ind Co Ltd | Developing device |
| JPS629350A (en) * | 1985-07-08 | 1987-01-17 | Fuji Photo Film Co Ltd | Photographic developing device |
| JPS6267543A (en) * | 1985-09-20 | 1987-03-27 | Konishiroku Photo Ind Co Ltd | Photosensitive material treatment device |
| JPS6365041U (en) * | 1986-10-17 | 1988-04-28 | ||
| JPH01159649A (en) * | 1987-12-16 | 1989-06-22 | Hanshin Gijutsu Kenkyusho:Kk | Development processing tank |
-
1989
- 1989-08-23 JP JP1218292A patent/JP2811008B2/en not_active Expired - Lifetime
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55147046U (en) * | 1979-04-05 | 1980-10-22 | ||
| JPS61250648A (en) * | 1985-04-30 | 1986-11-07 | Konishiroku Photo Ind Co Ltd | Developing device |
| JPS629350A (en) * | 1985-07-08 | 1987-01-17 | Fuji Photo Film Co Ltd | Photographic developing device |
| JPS6267543A (en) * | 1985-09-20 | 1987-03-27 | Konishiroku Photo Ind Co Ltd | Photosensitive material treatment device |
| JPS6365041U (en) * | 1986-10-17 | 1988-04-28 | ||
| JPH01159649A (en) * | 1987-12-16 | 1989-06-22 | Hanshin Gijutsu Kenkyusho:Kk | Development processing tank |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2811008B2 (en) | 1998-10-15 |
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