JPH01219157A - Formation of extra thin metallic vapor-deposited film - Google Patents
Formation of extra thin metallic vapor-deposited filmInfo
- Publication number
- JPH01219157A JPH01219157A JP4259488A JP4259488A JPH01219157A JP H01219157 A JPH01219157 A JP H01219157A JP 4259488 A JP4259488 A JP 4259488A JP 4259488 A JP4259488 A JP 4259488A JP H01219157 A JPH01219157 A JP H01219157A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- vapor
- metal
- strip
- boats
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015572 biosynthetic process Effects 0.000 title description 2
- 229910052751 metal Inorganic materials 0.000 claims abstract description 52
- 239000002184 metal Substances 0.000 claims abstract description 52
- 239000000463 material Substances 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 25
- 239000002131 composite material Substances 0.000 claims abstract description 24
- 238000003860 storage Methods 0.000 claims abstract description 20
- 238000007740 vapor deposition Methods 0.000 claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims abstract description 3
- 239000000758 substrate Substances 0.000 claims description 11
- 150000002739 metals Chemical class 0.000 abstract description 2
- 230000001174 ascending effect Effects 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 19
- 238000001704 evaporation Methods 0.000 description 11
- 230000008020 evaporation Effects 0.000 description 10
- 238000001883 metal evaporation Methods 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011104 metalized film Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000005022 packaging material Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 238000010025 steaming Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 239000005003 food packaging material Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野〕
本発明は真空中で高分子フィルム、紙などの帯状基材表
面に金属を蒸着する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method of vapor depositing metal onto the surface of a strip-shaped substrate such as a polymer film or paper in vacuum.
高分子フィルム、紙などの帯状基材の表面にアルミニウ
ムなどの金属を蒸着すると、膓材木来の特性に加え、美
麗な金属光沢が得られる他、ガスおよび水蒸気などに対
する気密性が向上し、また遮光性も極めて向上するとい
った数々の特長が付加されるので、最近極めて使用量が
多くなっている。特に表面色感の向上、高い気密性と優
れた遮光性ｔよ食品用包装材として最適の特性であるた
め、最近この用途に多くの金属蒸着フィルムが使用され
ている。金属蒸着の方法としては真空中で上方より一定
速度で下降して来た帯状基材を水平に設置した回転する
プロセスドラムによって反転し上方に移送さける工程で
、プロセスドラムの下方に金属蒸発用のコンポジットボ
ートを設け、該ボート上に金属を供給し、加熱、蒸発さ
せることにより、金属蒸気を基材下面に蒸着させる方法
が一般的である。一般に使用されているコンポジットボ
ートの貯槽部の水平断面積は１５０〇−程度が普通であ
る。そして、金属蒸着の膜厚は基材の移送速度または金
属蒸気の発生量をコントロールすることにより調節され
、包装袋に要求される気密性、遮光性を十分発揮する５
００〜１０００人の範囲の膜厚を持つ金属蒸着フィルム
が多り１！Ｊ造されていた。When metals such as aluminum are vapor-deposited on the surface of strip-shaped substrates such as polymer films and paper, in addition to the characteristics of the wood, it not only provides a beautiful metallic luster, but also improves airtightness against gases and water vapor. Recently, it has been used in an extremely large amount because it has many additional features such as extremely improved light-shielding properties. In particular, many metallized films have recently been used for this purpose because they have properties that are ideal for food packaging materials, such as improved surface color, high airtightness, and excellent light-shielding properties. The metal evaporation method is a process in which a strip-shaped substrate descends from above at a constant speed in a vacuum, is reversed by a horizontally installed rotating process drum, and transported upwards. A common method is to provide a composite boat, supply metal onto the boat, and heat and evaporate the metal vapor to deposit the metal vapor onto the lower surface of the substrate. The horizontal cross-sectional area of the storage tank of a commonly used composite boat is normally about 1,500 mm. The thickness of the metal vapor deposition film is adjusted by controlling the transfer speed of the base material or the amount of metal vapor generated, and the film achieves the airtightness and light-shielding properties required for packaging bags.
There are many metallized films with film thicknesses in the range of 00 to 1000 1! It was built in J.
しかしながら、上記した帯状基材の移送速度をコントロ
ールする方法および金属の蒸発量をコントロールして膜
厚を調節する方法では、最近普及の著しい電子レンジ加
工食品のこげ目付き調理を可能とする包材においで要求
される４０〜１ｏ人という極めて薄い蒸着膜を得ること
は困難であった。However, the method of controlling the transfer speed of the strip-shaped base material and the method of adjusting the film thickness by controlling the amount of metal evaporation cannot be used as a packaging material that enables browning of microwave-processed foods, which have recently become popular. It was difficult to obtain an extremely thin evaporated film of 40 to 100 ml as required.
すなわち通常は５００〜１０００人程度の比較的厚い膜
厚の金属蒸着を行っているが、この装置で４０〜７０人
の膜厚にするためには、現行の帯状基材の移送速度２０
０〜６００ｍ ／分を１０倍以上にも速めなければなら
ない。しかし移送速度を１０＠以上にも速めることは機
械構造上実質的に困難であり、たとえ数倍程度速めるこ
とが可能であっても騒音が異常に大きくなるばかりでな
く、帯状基材は薄い上に金属蒸着部は加熱されているの
で、これを高速で移送すると回転しているプロセスドラ
ムの所で帯状基材が捩じれてしわが出来るなど品質管理
上好ましくない点が多数発生した。In other words, normally 500 to 1,000 people perform metal vapor deposition with a relatively thick film thickness, but in order to achieve a film thickness of 40 to 70 people with this equipment, the current transfer speed of the strip substrate is 20%.
The speed from 0 to 600 m/min must be increased by more than 10 times. However, it is practically difficult to increase the transfer speed to 10@ or more due to the mechanical structure, and even if it were possible to increase the transfer speed by several times, not only would the noise be abnormally large, but the strip-shaped base material is thin and Since the metal-deposited part is heated, when it is transferred at high speed, the belt-shaped base material is twisted and wrinkled at the rotating process drum, which causes many unfavorable quality control problems.
一方、帯状基材の移送速度は変えずに金属蒸発量を１／
１０に減少させることによっても蒸着膜厚を薄くするこ
とが可能である。この場合は通常熱源の温度は一定にし
て、コンポジットボートに供給する金属の供給速度を変
えて蒸発量を調節することになるが、供給の速度が極端
に遅いと、供給金属が瞬時に蒸発してしまい、供給追＝
蒸発１となって供給速度の変動が直接金属蒸着ｍの変動
となるという欠点があり、また、コンポジットボートの
貯槽の水平断面積に比べて溶融する金属Ｑが少なすぎる
ため、該貯槽の底に部分的に溜るので蒸発が一様でなく
、従って蒸着膜厚の変動も大きいという問題点のあるこ
とが判った。On the other hand, the amount of metal evaporation is reduced by 1/1 without changing the transfer speed of the strip-shaped base material.
It is also possible to reduce the thickness of the deposited film by reducing the thickness to 10. In this case, the temperature of the heat source is usually kept constant and the amount of evaporation is adjusted by changing the supply rate of the metal supplied to the composite boat, but if the supply rate is extremely slow, the supplied metal will evaporate instantly. Because of this, the supply is delayed.
There is a disadvantage that fluctuations in the supply rate directly result in fluctuations in the metal vapor deposition m due to evaporation 1, and also because there is too little metal Q to melt compared to the horizontal cross-sectional area of the storage tank of the composite boat, It has been found that there is a problem that evaporation is not uniform due to partial accumulation, and therefore, there is a large variation in the thickness of the deposited film.
さらには上記した、帯状基材の移送速度および金属の供
給速度の両者をコントロールした場合であっても、前述
のような極めて薄い蒸着膜を、均一にコントロールする
ことは、実際上不可能であることも判った。Furthermore, even if both the transport speed of the strip base material and the metal supply speed are controlled, it is practically impossible to uniformly control the extremely thin vapor deposited film as described above. I also realized that.
（ｉ！題を解決するための手段）
本発明は上記した従来技術の持つ課題を考慮してなされ
たもので、真空中で帯状基材が上方より下降し、水平に
設置された回転するプロセスドラムによって反転上昇す
る工程で、プロセスドラムおよび帯状基材の下方に、水
平断面積が３００〜７００−１深さ２ｍｌ＋！Ｘ上の貯
槽を有するコンポジットボートを帯状基材の幅方向に２
００．以下の開隔で配置し、該コンポジットボートに金
属を連続的に供給、加熱し、金属蒸気を発生させて該基
材の下面に設けた露出距離１００〜３００ｍｍの蒸着部
に金属を蒸着させることを特徴とする極薄金属蒸着膜の
形成方法を提供するものである。(i!Means for solving the problem) The present invention has been made in consideration of the problems of the prior art described above, and is a rotating process in which a strip base material is lowered from above in a vacuum and is placed horizontally. In the process of being reversed and raised by the drum, the horizontal cross-sectional area is 300 to 700-1 and the depth is 2 ml+ below the process drum and the strip-shaped substrate! A composite boat with a storage tank on
00. Arranged with the following spacing, metal is continuously supplied to the composite boat, heated, and generates metal vapor to deposit the metal on the evaporation portion with an exposed distance of 100 to 300 mm provided on the lower surface of the base material. The present invention provides a method for forming an ultra-thin metal vapor deposition film characterized by the following.
本発明になる金属蒸着膜の形成方向においては真空中で
帯状基材が上方より一定速度で下降、水平に設置された
プロセスドラムによって反転上昇する工程において、プ
ロセスドラムおよび帯状基材の下方に設けたコンポジッ
トボートの貯槽の水平断面積が十分小さいので、該ボー
トに連続供給される金属は溶融されて該ボートの貯槽内
に溜る。In the formation direction of the metal vapor deposited film according to the present invention, in a process in which a strip-shaped substrate descends from above at a constant speed in a vacuum, and is reversed and raised by a horizontally installed process drum, the strip-shaped substrate is provided below the process drum and the strip-shaped substrate. The horizontal cross-sectional area of the composite boat storage tank is sufficiently small that the metal continuously fed to the boat is melted and collected in the boat storage tank.
貯槽は２ｍｍ以上の深さとしているので、溶融金属の深
さを監視しながら金属を供給することにより、コンポジ
ットボートの貯槽内で不足したり、溢れ出たりすること
がなく、溶融金属の表面積は常に一定し、該表面から蒸
発する金属蒸気の量も一定する。従って立ち登って来る
金属蒸気は帯状基材の下面に請けた露出距離１００〜３
００ｍの蒸着部に一様に蒸着される。The storage tank has a depth of 2 mm or more, so by supplying metal while monitoring the depth of the molten metal, there is no shortage or overflow in the storage tank of the composite boat, and the surface area of the molten metal is It is always constant and the amount of metal vapor evaporating from the surface is also constant. Therefore, the rising metal vapor has an exposure distance of 100 to 3
It is uniformly deposited on a deposition area of 00 m.
（実施例〕 つぎに本発明を実施例に基づいて詳細に説明する。(Example〕 Next, the present invention will be explained in detail based on examples.
第１図は本発明になる真空蒸着方法の要部を示したもの
で巻き出しロール（図示せず）に巻かれていた前処理を
施した幅５０Ｇｍｍの帯状基材（例えばポリエチレン）
１が右手上方より一定の速度（例えば５００ｍ／分）で
下降して来て、回転しているプロセスドラム２によって
反転、左手上方の巻き取りロール（図示せず）に巻かれ
ている。ブロセスドラム２および帯状基材１の直下に該
基材全幅に渡って該基材の移送方向の露出距離３が自在
に調節できる一対のマスク４が配置され、露出距離３が
１８０＃＋１に調整されている。マスク４によって形成
された帯状基材１の蒸着部１０の下方に、線状のアルミ
ニウムを連続供給する供給ノズル（図示せず）を備えた
コンポジットボート（グラファイト製金属蒸発用容器）
５が帯状基材１の幅方向に等間隔に５個配置されている
。該ボートは水平断面積４５０ｓ！ （幅１５１Ｉｌ＃
Ｉ、長さ３０Ｉｌｌ＃Ｉ）、深さ３麿の貯槽を備え、抵
抗加熱により供給された線状の金属（例えばアルミニウ
ム）を大略２Ｍの深さになるように溶融し、金属蒸気６
を発生させている。そして、マスク４によって形成され
た露出距離３の間を上昇する金属蒸気６のみが帯状基材
１の下面の蒸着部１０に蒸着している。帯状基材１の表
面にはアルミニウムが５０〜６０人の厚さで幅および長
手方向に均一に蒸着した。FIG. 1 shows the main parts of the vacuum deposition method according to the present invention, in which a pretreated strip-shaped base material (for example, polyethylene) with a width of 50 Gmm is wound around an unwinding roll (not shown).
1 comes down from above the right hand at a constant speed (for example, 500 m/min), is reversed by the rotating process drum 2, and is wound onto a take-up roll (not shown) above the left hand. Directly below the process drum 2 and the strip-shaped base material 1, a pair of masks 4 are arranged over the entire width of the base material, and the exposure distance 3 in the transport direction of the base material can be freely adjusted, and the exposure distance 3 is adjusted to 180#+1. has been done. A composite boat (graphite metal evaporation container) equipped with a supply nozzle (not shown) that continuously supplies linear aluminum below the evaporation area 10 of the strip base material 1 formed by the mask 4
5 are arranged at equal intervals in the width direction of the strip-shaped base material 1. The horizontal cross-sectional area of this boat is 450s! (Width 151Il#
It is equipped with a storage tank with a length of 30 Ill#I) and a depth of 3 mm, and a linear metal (for example, aluminum) supplied by resistance heating is melted to a depth of approximately 2 m, and the metal vapor is heated to a depth of 6 m.
is occurring. Then, only the metal vapor 6 rising through the exposure distance 3 formed by the mask 4 is deposited on the deposition portion 10 on the lower surface of the strip-shaped base material 1 . Aluminum was uniformly deposited on the surface of the strip base material 1 to a thickness of 50 to 60 mm in the width and length directions.
コンポジットボート５の貯４ｆｆ５０の水平断面積は３
００〜７００−が望ましい。３００−未満では金属の蒸
発Φが少ないため、幅が２００〜６００ｓの帯状基材１
を２００〜７００ｍ ／分の移送速度で電子レンジ用包
材に望ましい４０〜７０人の範囲の蒸＠膜を得るには多
数のコンポジットボートを配置しな各プればならず、全
てのコンポジットボートの蒸発口を一定に制御するのが
困難であり、一方、７０〇−超では貯槽５０の水平断面
積が大きくなり過ぎて底の一部にしか溶融金属が溜らな
くなるという問題点が発生７る。また、貯槽５０に温度
ムラが生じて、蒸発量が均一でなくなるという問題点も
発生量る。The horizontal cross-sectional area of the storage 4ff50 of composite boat 5 is 3
00-700- is desirable. If it is less than 300, the metal evaporation Φ is small, so the strip base material 1 with a width of 200 to 600 s
In order to obtain the desired 40 to 70 steaming film for microwave packaging at a transfer speed of 200 to 700 m/min, a large number of composite boats must be arranged, and each composite boat must be It is difficult to control the evaporation port to a constant level, and on the other hand, if the evaporation port exceeds 700, the horizontal cross-sectional area of the storage tank 50 becomes too large, causing the problem that molten metal only accumulates in a part of the bottom. . Further, there is a problem that temperature unevenness occurs in the storage tank 50, and the amount of evaporation becomes uneven.
貯槽５０の深さを２Ｍ以上とするのは、溶融金属を安定
して貯えるためである。２＃１未満の深さでは、金属の
供給量と蒸発量が常に一致していないと、不足して底が
露出したり、過剰となって、溢れるという危険がある。The reason why the depth of the storage tank 50 is set to 2M or more is to stably store the molten metal. At a depth of less than 2#1, if the amount of metal supplied and the amount of evaporation do not always match, there is a risk that there will be a shortage and the bottom will be exposed, or there will be an excess and it will overflow.
しかし、２ｓａ＋以上の深さがあれば供給量と蒸発量に
少し位いの誤差があっても溶融金属の深さを監視しなが
ら装置を運転中に調整することが充分可能である。尚、
５ｍ＋以上深くすると帯状基材１とコンポジットボート
５の位置関係、即ち、上下の距離と帯状基材１の幅方向
への配列の関係によっては、金属蒸気６の発生方向に方
向性が生じるので、帯状基材１の幅方向の蒸着膜厚に変
動が生じる危険がある。この様な場合はコンポジットボ
ー１・５の配置間隔を小さくするなどの配慮が必要とな
る。露出距ｆｉ１３は狭い方が金属の蒸＠吊をより正確
に制御可能となるが、１００ｓ＋未満ではマスク４に付
着する金属のｍが多くなり経済的ではない。一方３００
＃１ｌｌＩを越すと貯槽５０の水平断面積及び配置関係
にもよるが、蒸着量を制御するのが困難となる。従って
、本発明では露出距離は１００〜３００ｓ＋とした。However, if the depth is 2 sa+ or more, even if there is a slight error between the supply amount and the evaporation amount, it is possible to adjust the depth of the molten metal while the device is in operation while monitoring the depth of the molten metal. still,
If the depth is 5 m+ or more, depending on the positional relationship between the strip base material 1 and the composite boat 5, that is, the vertical distance and the arrangement of the strip base material 1 in the width direction, directionality will occur in the direction in which the metal vapor 6 is generated. There is a risk that the thickness of the deposited film in the width direction of the strip-shaped base material 1 will vary. In such a case, consideration must be given to reducing the interval between composite bows 1 and 5. The narrower the exposure distance fi13, the more accurately the metal evaporation can be controlled, but if it is less than 100 seconds, the amount of metal attached to the mask 4 increases, which is not economical. On the other hand, 300
If #1llI is exceeded, it becomes difficult to control the amount of vapor deposition, although it depends on the horizontal cross-sectional area and arrangement of the storage tank 50. Therefore, in the present invention, the exposure distance was set to 100 to 300 s+.
コンポジットボート５を帯状基材１の幅方向に２００、
以下の間隔で配置するのは、蒸着金属の歩留り向上と幅
方向に金属蒸着膜厚の変動を小さく抑えるためである。200 of composite boats 5 in the width direction of the strip-shaped base material 1;
The reason why they are arranged at the following intervals is to improve the yield of deposited metal and to suppress variations in the thickness of the deposited metal film in the width direction.
２００ｍを超える間隔で配置し、金属蒸着膜の変動を抑
えるためにはコンポジットボート５を帯状基材１の可成
り下に設けなければならないが、この様な配置では帯状
基材１の下側に設けたマスク４に付着する邑が多くなる
。従って、本発明ではコンポジットボート５は２００．
以下の間隔で帯状基材１の下方幅方向に配置する。In order to arrange the composite boats 5 at intervals of more than 200 m and to suppress fluctuations in the metal vapor deposition film, the composite boats 5 must be provided considerably below the strip-shaped base material 1. This increases the number of particles that adhere to the provided mask 4. Therefore, in the present invention, the composite boat 5 is 200.
The strip base material 1 is arranged in the lower width direction at the following intervals.
帯状基材１の移送速度は２５０〜５ｏｏＴｒＬ／分位で
行うと経済的にも安定した金属蒸暑が行われる。Economically stable metal steaming can be carried out when the belt-shaped base material 1 is transferred at a rate of about 250 to 5 ooTrL/min.
以上説明した様に、本発明になる金属熱＠膜の形成方法
によれば、帯状基材の下方に水平断面積３００〜７００
−１深さ２麿以上の貯槽を有するコンポジットボートを
帯状基材の幅方向に２００ａ＋ｓ＋以下の間隔で配置し
、幅１００〜３００＃ＩｌＮの蒸着部に金属を蒸もさせ
る方法であるので、供給する金属のｍが少１であっても
貯槽の水平断面積が十分小さいため溶融金属が安定して
貯槽に溜る。As explained above, according to the method of forming a metal heat film according to the present invention, a horizontal cross-sectional area of 300 to 700
-1 Composite boats having storage tanks with a depth of 2 mm or more are arranged at intervals of 200a+s+ or less in the width direction of the strip-shaped base material, and the metal is vaporized in the vapor deposition area with a width of 100 to 300 #IIN. Even if the m of the metal to be melted is as small as 1, the horizontal cross-sectional area of the storage tank is sufficiently small, so that the molten metal can stably accumulate in the storage tank.
従って、電子レンジ用包材で要求される４０〜７０人と
いう極薄金属蒸着膜の製造においても溶融金属の表面か
ら蒸発する金属蒸気の発生量が安定づるので、帯状基材
に蒸着する金属の膜厚が極めて安定した。Therefore, the amount of metal vapor evaporated from the surface of the molten metal remains stable even in the production of the ultra-thin metal vapor deposition film required for microwave packaging materials by 40 to 70 people. The film thickness was extremely stable.
第１図は本発明の一実施例を示す説明図である。 １・・・帯状基材、 ２・・・ブＯセスドラム、 ３・・・露出距離、 ４・・・マスク、 ５・・・コンポジットボート、 ６・・・金属蒸気、 ５０・・・貯槽。 特許出願人 凸版印刷株式会社外１名 第１図 FIG. 1 is an explanatory diagram showing one embodiment of the present invention. 1... band-shaped base material, 2...Boo Seth Drum, 3...Exposure distance, 4...Mask, 5...Composite boat, 6...metal vapor, 50...Storage tank. Patent applicant: 1 person other than Toppan Printing Co., Ltd. Figure 1
Claims (1)
回転するプロセスドラムによって反転上昇する工程で、
プロセスドラムおよび帯状基材の下方に、水平断面積が
３００〜７００ｍｍ、深さ２ｍｍ以上の貯槽を有するコ
ンポジットボートを帯状基材の幅方向に２００ｍｍ以下
の間隔で配置し、該コンポジットボートに金属を連続的
に供給、加熱し、金属蒸気を発生させて該基材の下面に
設けた露出距離１００〜３００ｍｍの蒸着部に金属を蒸
着させることを特徴とする極薄金属蒸着膜の形成方法。A process in which the strip-shaped substrate is lowered from above in a vacuum, and then reversed and raised by a rotating process drum installed horizontally.
Composite boats having storage tanks with a horizontal cross-sectional area of 300 to 700 mm and a depth of 2 mm or more are placed below the process drum and the strip base material at intervals of 200 mm or less in the width direction of the strip base material, and metal is placed in the composite boats. A method for forming an ultra-thin metal vapor deposition film, which comprises continuously supplying and heating to generate metal vapor to vapor deposit a metal onto a vapor deposition area with an exposed distance of 100 to 300 mm provided on the lower surface of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4259488A JPH01219157A (en) | 1988-02-25 | 1988-02-25 | Formation of extra thin metallic vapor-deposited film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4259488A JPH01219157A (en) | 1988-02-25 | 1988-02-25 | Formation of extra thin metallic vapor-deposited film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01219157A true JPH01219157A (en) | 1989-09-01 |
Family
ID=12640389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4259488A Pending JPH01219157A (en) | 1988-02-25 | 1988-02-25 | Formation of extra thin metallic vapor-deposited film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01219157A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5242500A (en) * | 1990-08-27 | 1993-09-07 | Leybold Aktiengesellschaft | Apparatus for the continuous coating of band-type substrate |
| WO2006037516A1 (en) * | 2004-10-01 | 2006-04-13 | Leybold Optics Gmbh | Apparatus for coating a band-shaped substrate |
-
1988
- 1988-02-25 JP JP4259488A patent/JPH01219157A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5242500A (en) * | 1990-08-27 | 1993-09-07 | Leybold Aktiengesellschaft | Apparatus for the continuous coating of band-type substrate |
| WO2006037516A1 (en) * | 2004-10-01 | 2006-04-13 | Leybold Optics Gmbh | Apparatus for coating a band-shaped substrate |
| DE102004047938A1 (en) * | 2004-10-01 | 2006-04-13 | Leybold Optics Gmbh | Device for coating a band-shaped substrate |
| DE102004047938B4 (en) * | 2004-10-01 | 2008-10-23 | Leybold Optics Gmbh | Apparatus for the evaporator coating of a belt-shaped substrate |
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