JPH01207313A - Substrate of optical disk - Google Patents
Substrate of optical diskInfo
- Publication number
- JPH01207313A JPH01207313A JP63032358A JP3235888A JPH01207313A JP H01207313 A JPH01207313 A JP H01207313A JP 63032358 A JP63032358 A JP 63032358A JP 3235888 A JP3235888 A JP 3235888A JP H01207313 A JPH01207313 A JP H01207313A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- polymerizable compound
- resin
- formula
- tables
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 29
- 230000003287 optical effect Effects 0.000 title claims abstract description 23
- 150000001875 compounds Chemical class 0.000 claims abstract description 10
- 125000006850 spacer group Chemical group 0.000 claims abstract description 5
- 125000000217 alkyl group Chemical group 0.000 claims abstract 2
- 238000000016 photochemical curing Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims 5
- 238000010521 absorption reaction Methods 0.000 abstract description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000011347 resin Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 239000011521 glass Substances 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 229920005668 polycarbonate resin Polymers 0.000 description 4
- 239000004431 polycarbonate resin Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000001723 curing Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 2
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- ZVAFZTLAMCXAII-UHFFFAOYSA-N 2-(1-ethoxyethyl)-2-(hydroxymethyl)propane-1,3-diol Chemical compound CCOC(C)C(CO)(CO)CO ZVAFZTLAMCXAII-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical group C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- UJKWLAZYSLJTKA-UHFFFAOYSA-N edma Chemical compound O1CCOC2=CC(CC(C)NC)=CC=C21 UJKWLAZYSLJTKA-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- -1 vinyl compound Chemical class 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Landscapes
- Macromonomer-Based Addition Polymer (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光で読み出しを行う方式の光ディスク基板、特
にデジタル・オーディオディスク、ビデオディスク、メ
モリーディスク等の光ディスク基板に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical disc substrate of a type that performs reading with light, and particularly to an optical disc substrate for digital audio discs, video discs, memory discs, etc.
光ディスクメモリー用のディスク基板の製造法としては
、ポリカーボネート樹脂、アクリル樹脂をインジェクシ
ョン法で成型する方法、すなわち、片面にスタンパが設
置されている金型の中に重合度の低いプラスチックを高
温高圧で流し込んで成型する方法、又ガラス、アクリル
樹脂、ポリカーボネート樹脂、エポキシ樹脂等の平板上
に光硬化性の樹脂を流し込みその上から金属スタンパを
押しあて、基板側から放射線を照射して樹脂を硬化させ
、スタンバを剥離して光ディスク基板を製造する、所謂
２Ｐ法が知られている。The manufacturing method for disk substrates for optical disk memories is to mold polycarbonate resin or acrylic resin using the injection method.In other words, plastic with a low degree of polymerization is poured at high temperature and pressure into a mold with a stamper installed on one side. Alternatively, a photocurable resin is poured onto a flat plate of glass, acrylic resin, polycarbonate resin, epoxy resin, etc., a metal stamper is pressed onto it, and radiation is irradiated from the substrate side to harden the resin. A so-called 2P method is known in which an optical disk substrate is manufactured by peeling off a standby.
更に特開昭６０−１１２４０９号公報、特開昭６０−２
０２５５７号公報、特開昭６１−４４６８９号公報、特
開昭６１−９８７１０号公報、特開昭６１−１１５９１
３号公報、特開昭６１−１５９４１１号公報、特開昭６
１−１７６６１８号公報にアクリル系樹脂を光硬化させ
て光ディスク基板を製造する方法が提案されている。Furthermore, JP-A-60-112409, JP-A-60-2
02557, JP 61-44689, JP 61-98710, JP 61-11591
Publication No. 3, JP-A-61-159411, JP-A-6
Japanese Patent No. 1-176618 proposes a method of manufacturing an optical disc substrate by photocuring an acrylic resin.
光ディスク基板をインジェクション法で成形する方法は
生産性に優れるが、異物が混入しやすく、Ｃ／Ｎが低い
ばかりでなく、ポリカーボネート樹脂については、成形
時の残留応力のため分子が配向して光学的歪（複屈折）
が大きくなり易く、また表面硬度が低いため製造工程時
に傷がつきやすい欠点を有しており、ポリメチルメタク
リレート樹脂については、吸湿性が大きいためディスク
が反りやすく、かつ、耐熱性が低いため記録膜をっけた
溝の熱安定性が低いという問題点がある。The method of molding optical disk substrates by injection method has excellent productivity, but not only does it allow foreign matter to get mixed in and the C/N ratio is low, but in the case of polycarbonate resin, residual stress during molding causes the molecules to become oriented, resulting in optical problems. Distortion (birefringence)
Polymethyl methacrylate resin has the disadvantage of easily becoming large and easily scratched during the manufacturing process due to its low surface hardness.Polymethyl methacrylate resin has high hygroscopicity, which causes the disc to warp easily, and its heat resistance is low, making it difficult to record. There is a problem that the thermal stability of the film-coated groove is low.
又２Ｐ法による場合は、２段階で光ディスク基板を作成
するため作業上からも時間を要し、また基板と光硬化樹
脂との密着性の高信頼性も要求され、更に、透明な基板
の選定が重要であり、アクリル樹脂では低Ｔｇで吸湿性
による反りが大きいという問題、ポリカーボネート樹脂
では複屈折が大きいという問題、エポキシ樹脂では成形
時の硬化時間が長い等の問題がある。In addition, in the case of using the 2P method, the optical disc substrate is created in two steps, which takes time, and also requires high reliability of the adhesion between the substrate and the photocuring resin. is important, and acrylic resins have a problem of low Tg and large warpage due to hygroscopicity, polycarbonate resins have a large birefringence, and epoxy resins have problems such as a long curing time during molding.
特開昭６０−１１２４０９号公報、特開昭６０−２０２
５５７号公報、特開昭６１−４４６８９号公報、特開昭
６１−９８７１０号公報、特開昭６１−１１５９１３号
公報、特開昭６１４５９４１１号公報、特開昭６１−１
７６６１８号公報で提案された方法は、反りの低減、低
吸水、低吸湿、耐熱性等を特徴とするとされているがい
ずれもまだ実用化に至っていない。JP-A-60-112409, JP-A-60-202
557, JP 61-44689, JP 61-98710, JP 61-115913, JP 61459411, JP 61-1
The method proposed in Japanese Patent No. 76618 is said to be characterized by reduced warpage, low water absorption, low moisture absorption, heat resistance, etc., but none of these have yet been put into practical use.
本発明は、光学的歪（複屈折）、吸湿による反りが少な
く、表面硬度、耐熱性、機械的強度に優れ長期信頼性の
高い光ディスク基板を提供するものである。The present invention provides an optical disk substrate that is less warped due to optical distortion (birefringence) and moisture absorption, has excellent surface hardness, heat resistance, and mechanical strength, and has high long-term reliability.
本発明は一般式
〔式中、ＸはＣＨｚ＝Ｃ−Ｃ−０−ＣＨｚ−ＣＨ−ＣＨ
ｚ−１Ｒ，はＨまたはＣＨ，、Ｒ，はＨ、、Ｃｉ−Ｃｉ
、までのアルキたはＣＨ３、ｎはＯ〜３の数である〕
で表される重合性化合物を所定の形状に光硬化せしめて
成る光ディスク基板を提供するものである。The present invention is based on the general formula [wherein, X is CHz=C-C-0-CHz-CH-CH
z-1R, is H or CH, , R, is H, , Ci-Ci
, or CH3, where n is a number from O to 3] The present invention provides an optical disc substrate formed by photocuring a polymerizable compound represented by the following formula into a predetermined shape.
（１）は、フェノールボラック型エポキシ樹脂を（メタ
）アクリル酸で変性し、分子構造中のＯＨ基を種々官能
基で置換してエステル化したものである。(1) is a phenol borac type epoxy resin modified with (meth)acrylic acid and esterified by substituting the OH group in the molecular structure with various functional groups.
本発明では、前記一般式で表される重合性化合物に加え
て、公知の光重合可能なモノマー、具体的には、１，６
−ヘキサンシオールジ（メタ）アクリレート、トリメチ
ロールプロパントリ （メタ）アクリレート、ペンタエ
リスリトールテトラ（メタ）アクリレート、ジペンタエ
リスリトールヘキサ（メタ）アクリレート、エトオキシ
トリメチロールプロパントリ（メタ）アクリレート、ネ
オペンチルグリコールジ（メタ）アクリレート、イソボ
ニル（メタ）アクリレート、トリシクロデカニル（メタ
）アクリレート、スチレン、Ｎ−ビニルピロリドン等を
本発明の優れた特性を低下させない範囲で併用すること
も可能である。In the present invention, in addition to the polymerizable compound represented by the general formula, known photopolymerizable monomers, specifically 1,6
-Hexanethiol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, ethoxytrimethylolpropane tri(meth)acrylate, neopentyl glycoldi It is also possible to use (meth)acrylate, isobornyl (meth)acrylate, tricyclodecanyl (meth)acrylate, styrene, N-vinylpyrrolidone, etc. in combination within a range that does not reduce the excellent properties of the present invention.
上記重合性化合物を重合しディスク基板を製造するには
、スペーサーで所定の間隔を保つ透明板と金属又は透明
板のスタンバとの間、又は２枚の透明板の間にビニル化
合物を注入し、片面又は全面から紫外線等を照射し光硬
化させる。後者の場合は、その後光硬化させた基板の上
にスタンバの溝を転写した樹脂層を形成する。To produce a disk substrate by polymerizing the above-mentioned polymerizable compound, a vinyl compound is injected between a transparent plate and a metal or transparent plate stanbar, which are kept at a predetermined distance with a spacer, or between two transparent plates. The entire surface is irradiated with ultraviolet rays and photocured. In the latter case, a resin layer having the grooves of the stand bar transferred thereon is then formed on the photocured substrate.
本発明の重合性化合物には、一般に知られている光増感
剤、例えばジベンゾイル、ベンゾインメチルエーテル、
ベンゾインエチルエーテル、ベンゾインイソプロピルエ
ーテル、ベンゾインイソブチルエーテル、２−ヒドロキ
シ−２−ベンゾイルプロパン、アゾビスイソブチロニト
リル、ベンジル、チオキサントン、ジフェニルジスルフ
ィド、１−（４−イソプロピルフェニル）−２−ヒドロ
キシ−２−メチルプロパン−１−オン、２−ヒドロキシ
−２−メチル−１−フェニル−プロパン−１−オン、２
，２−ジメトキシ−２−フェニルアセトフェノン、■−
ヒドロキシシクロへキシルフェニルケトン等を使用する
ことができる。これらの光増感剤は、重合性化合物に対
して多くとも５重量％の量とすることが好ましい。The polymerizable compound of the present invention includes commonly known photosensitizers such as dibenzoyl, benzoin methyl ether,
Benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, 2-hydroxy-2-benzoylpropane, azobisisobutyronitrile, benzyl, thioxanthone, diphenyl disulfide, 1-(4-isopropylphenyl)-2-hydroxy-2- Methylpropan-1-one, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 2
, 2-dimethoxy-2-phenylacetophenone, ■-
Hydroxycyclohexylphenyl ketone and the like can be used. These photosensitizers are preferably used in an amount of at most 5% by weight, based on the polymerizable compound.
本発明の重合性化合物に、必要に応じて黄変防止剤、レ
ベリング剤、紫外線吸収剤等の添加剤を重合硬化を妨げ
ない範囲で添加することができる。Additives such as an anti-yellowing agent, a leveling agent, and an ultraviolet absorber can be added to the polymerizable compound of the present invention, if necessary, to the extent that they do not interfere with polymerization and curing.
以下、本発明を実施例に基づいて詳細に説明するが、本
発明はこれに限定されるものではない。Hereinafter, the present invention will be explained in detail based on Examples, but the present invention is not limited thereto.
実施例１
２枚の仮ガラスとスペーサーとからなるガラス鋳型を用
意し、この鋳型中に２重量部の１−（４−イソプロビル
フェニル）−２−ヒドロキシ−２−メチルプロパン−１
−オンを添加、混合した第１表Ｎｏ、１〜Ｎｏ、４の各
種樹脂を注入し、８０ Ｗ／ｃｍ高圧水銀灯を用いて周
囲から紫外線を照射した。６０秒間硬化した後、離型し
、厚さ１．２ｍｍ、直径３０ｃｍの均一な厚みの基板を
得た。この基板を用いて、以下（１）〜（４）の特性を
測定したところ第１表の結果を得た。Example 1 A glass mold consisting of two pieces of temporary glass and a spacer was prepared, and 2 parts by weight of 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane-1 was placed in the mold.
Various resins No. 1 to No. 4 in Table 1 were injected and mixed with -on, and ultraviolet rays were irradiated from the surroundings using an 80 W/cm high-pressure mercury lamp. After curing for 60 seconds, the mold was released to obtain a uniform substrate with a thickness of 1.2 mm and a diameter of 30 cm. Using this substrate, the following characteristics (1) to (4) were measured and the results shown in Table 1 were obtained.
（１）吸水率：６０°Ｃの水中に３００時間放置し、Ｊ
ＩＳ−に６９１１に準じて測定した。(1) Water absorption rate: left in water at 60°C for 300 hours, J
It was measured according to IS-6911.
（２）耐熱温度ｅＤＭＡ法によりガラス転移温度を測定
した。(2) Heat Resistant Temperature Glass transition temperature was measured by eDMA method.
（３）光学特性：厚さ１．２ｍｎ＋の樹脂板に８３０ｎ
ｍの光をあて、光透過率を分光光度計で求めた。(3) Optical properties: 830n on a resin plate with a thickness of 1.2mm+
The light transmittance was determined using a spectrophotometer.
又８３０ｎｍの光をあてて複屈折率を求めて、リターア
ーションも測定した。In addition, retardation was also measured by irradiating light of 830 nm to determine the birefringence.
（４）表面硬度：鉛筆硬度を求めた。(4) Surface hardness: Pencil hardness was determined.
（５）曲げ強度： Ｊ Ｉｓ−に６９１１に準じて測定
した。(5) Bending strength: Measured according to JIS-6911.
第１表かられかるように、本発明の基板はポリメチルメ
タアクリレートの基板に比較し、吸水率が小さく、耐熱
温度が高い。また、ポリカーボネートの基板との比較で
は、リターデーションおよび表面硬度に優れている。As can be seen from Table 1, the substrate of the present invention has a lower water absorption rate and a higher heat resistance than a polymethyl methacrylate substrate. Furthermore, compared to polycarbonate substrates, it has excellent retardation and surface hardness.
実施例２
溝状パターン付Ｎｉ製スタンパに対して、離型剤を塗布
したガラス板を向かい合わせに配置し、両者の間に１．
２ｍｍの空間を設けて樹脂注入型を形成した。Example 2 A glass plate coated with a release agent was placed facing a groove-patterned Ni stamper, and 1.
A resin injection mold was formed with a 2 mm space.
この型の中に、実施例１で示された第１表Ｎｏ。In this mold, Table 1 No. shown in Example 1 was found.
１−Ｎｏ、４の各樹脂を注入し、８０Ｗ／ｃｍ高圧水銀
灯を用いて、６０秒間ガラス板から紫外線を照射し、樹
脂を硬化させ、溝状パターン付基板を得た。溝付の透明
基板上にＴｅ系記録膜を約３０μｍｉさに蒸着した後、
基板全体を１００“０１時間の雰囲気にさらし、記録膜
の結晶化を行って、光ディスク記録媒体を作成した。得
られた光ディスク記録媒体は、情報出力時の出力レベル
は良好であり、かつ基板に反りが生じなかった。Each resin No. 1-No. and No. 4 was injected, and a glass plate was irradiated with ultraviolet rays for 60 seconds using an 80 W/cm high-pressure mercury lamp to harden the resins, thereby obtaining a grooved patterned substrate. After depositing a Te-based recording film to a thickness of approximately 30 μm on a grooved transparent substrate,
The entire substrate was exposed to an atmosphere for 100"01 hours, and the recording film was crystallized to create an optical disc recording medium.The obtained optical disc recording medium had a good output level when outputting information, and No warping occurred.
実施例３
離型剤を塗布した溝状パターン付ガラス製スタンパに対
して離型剤を塗布したガラス板を用い、実施例２の要領
で樹脂注入型を用意した。さらに、この型の中に、実施
例１で示された第１表Ｎｏｌ〜Ｎｏ４の各樹脂を注入し
た。８０Ｗ／ｃｍ高圧水銀灯を用いて、紫外線をガラス
板から３０秒間照射し、次にスタンパ側から紫外線を３
０秒間照射して、樹脂を硬化せしめた。得られた溝付パ
ターン付基板に実施例２と同一処理を施し光ディスク記
録媒体を作製した。Example 3 A resin injection mold was prepared in the same manner as in Example 2 using a glass plate coated with a release agent and a grooved patterned glass stamper coated with a release agent. Furthermore, each resin No. 1 to No. 4 in Table 1 shown in Example 1 was injected into this mold. Using an 80W/cm high-pressure mercury lamp, irradiate ultraviolet rays from the glass plate for 30 seconds, then irradiate ultraviolet rays from the stamper side for 30 seconds.
The resin was cured by irradiation for 0 seconds. The obtained grooved patterned substrate was subjected to the same treatment as in Example 2 to produce an optical disc recording medium.
得られた光ディスク記録媒体に反りは見られず、又、情
報の書き込み、読み出しを円滑に行うことができた。No warping was observed in the obtained optical disc recording medium, and information could be written and read smoothly.
本発明の光ディスク基板は、光学的歪（複屈折）、吸湿
による反りが少なく、表面硬度、機械的強度、耐熱性に
優れると共に、光硬化により短時間で成形出来るのでそ
の製造の生産性が高められる。The optical disk substrate of the present invention has less optical distortion (birefringence) and warpage due to moisture absorption, and has excellent surface hardness, mechanical strength, and heat resistance, and can be molded in a short time by photocuring, increasing manufacturing productivity. It will be done.
さらに、スペーサーで所定の間隔を保つガラス板とスタ
ンバとの間に樹脂組成物を注入し紫外線等を照射し光硬
化させ光ディスク基板を製造し得るのでその製造の生産
性が著しく高められる。Further, since the resin composition can be injected between the glass plate and the standber, which are maintained at a predetermined distance by a spacer, and photocured by irradiating the resin composition with ultraviolet rays or the like to produce an optical disk substrate, the productivity of the production is significantly increased.
代理人 弁理士 廣瀬 章（Agent: Patent Attorney Akira Hirose (
Claims (1)
６までのアルキル基、▲数式、化学式、表等があります
▼、▲数式、化学式、表等があります▼または▲数式、
化学式、表等があります▼、 Ｒ＿１はＨまたはＣＨ＿３、ｎは０〜３の数である〕で
表される重合性化合物を所定の形状に光硬化せしめて成
る光ディスク基板。 ２、前記、重合性化合物を、スペーサーで所定の間隔を
保つ透明板とスタンパの間に注入し、紫外線を照射し、
光硬化させて成る請求項１記載の光ディスク基板。[Claims] 1. General formula▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, X is ▲There are mathematical formulas, chemical formulas, tables, etc.▼, R_1 is H or CH_3, R_2 is H, C_1 to C_
Alkyl groups up to 6, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or ▲ Mathematical formulas,
There are chemical formulas, tables, etc. ▼, R_1 is H or CH_3, n is a number from 0 to 3] An optical disc substrate made by photocuring a polymerizable compound into a predetermined shape. 2. The above polymerizable compound is injected between the transparent plate and the stamper, which are maintained at a predetermined distance using a spacer, and irradiated with ultraviolet rays.
The optical disc substrate according to claim 1, which is photocured.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63032358A JPH01207313A (en) | 1988-02-15 | 1988-02-15 | Substrate of optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63032358A JPH01207313A (en) | 1988-02-15 | 1988-02-15 | Substrate of optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01207313A true JPH01207313A (en) | 1989-08-21 |
Family
ID=12356733
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63032358A Pending JPH01207313A (en) | 1988-02-15 | 1988-02-15 | Substrate of optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01207313A (en) |
-
1988
- 1988-02-15 JP JP63032358A patent/JPH01207313A/en active Pending
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