JP7373698B1 - 防汚層付き光学フィルムおよびその製造方法 - Google Patents
防汚層付き光学フィルムおよびその製造方法 Download PDFInfo
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- JP7373698B1 JP7373698B1 JP2023540467A JP2023540467A JP7373698B1 JP 7373698 B1 JP7373698 B1 JP 7373698B1 JP 2023540467 A JP2023540467 A JP 2023540467A JP 2023540467 A JP2023540467 A JP 2023540467A JP 7373698 B1 JP7373698 B1 JP 7373698B1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
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Abstract
Description
以下の工程を順次に実施して、防汚層付き光学フィルムを製造した。
転写抑制処理工程において、第1転写抑制層の代わりに第2転写抑制層を形成したこと以外は、実施例1の光学フィルムと同様にして、実施例2の光学フィルム(長尺でロール状の防汚層付き光学フィルム)を作製した。本実施例における転写抑制処理工程では、ロールトゥロール方式でワークフィルムを搬送しながら、上述のHC層付きのPETフィルムの第2面上に、まず、厚さ1.5nmのインジウムスズ酸化物(ITO)層とその上の厚さ10nmのSiO2層とをスパッタリングで順次に成膜して密着層を形成し、その後、真空蒸着法によって厚さ10nmの第2転写抑制層を密着層上に形成した。この真空蒸着法では、蒸着源として、パーフルオロポリエーテル基含有のアルコキシシラン化合物(信越化学工業社製の「KY1903-1」を乾燥して得た固形分)を用い、蒸着源の加熱温度を260℃とした(実施例1における防汚層形成工程の真空蒸着法と同様である)。実施例2の光学フィルムは、透明基材フィルム(ハードコート層が一方面をなし、第2転写抑制層が他方面としての裏面をなす)と、ハードコート層と、密着層と、反射防止層と、防汚層とをこの順で備える。
転写抑制処理工程を実施しないこと以外は、実施例1の光学フィルムと同様にして、比較例1の光学フィルム(長尺でロール状の防汚層付き光学フィルム)を作製した。
実施例1,2および比較例1の各光学フィルムにおける防汚層の厚さを測定した。測定には、走査型蛍光X線分析装置(商品名「ZSX PrimusII」,リガク社製)を用いた。測定された防汚層の厚さT1(nm)を、表1に示す。
実施例1,2および比較例1の各光学フィルムにおける透明基材フィルムの第2面(裏面)への防汚層材料の転写の程度を調べた。具体的には、透明基材フィルムの裏面に転写された防汚層材料の厚さを測定した。測定には、走査型蛍光X線分析装置(商品名「ZSX PrimusII」,リガク社製)を用いた。測定された厚さT2(nm)を、表1に示す。
実施例1,2および比較例1の各光学フィルムにおける透明基材フィルムの裏面(第2面)の表面自由エネルギーを、次のようにして求めた。まず、23℃および相対湿度55%の条件下、水平に載置された透明基材フィルムの第2面(表面自由エネルギー同定対象面)に接する水(H2O)、ヨウ化メチレン(CH2I2)および1-ブロモナフタレンの各液滴(約1μL)について、接触角計を使用して接触角を測定した。この測定には、接触角計(品名「CA-X型 接触角計」,共和界面科学社製)を使用した。次に、測定された水の接触角θw、ヨウ化メチレンの接触角θi、および1-ブロモナフタレンの接触角θbの値を用い、日本接着協会誌のVol.8, No.3, p.131-141(1972)に記載の方法(北崎-畑の理論)に従って3元連立方程式を解くことにより、γ=γd+γp+γhの式におけるγd,γp,γhを求めた。式中のγdは、表面自由エネルギーの分散成分であり、γpは、表面自由エネルギーの極性成分であり、γhは、表面自由エネルギーの水素結合成分である。そして、γd,γp,γhを和して得られる値(γ)を、透明基材フィルムの裏面の表面自由エネルギーとして求めた。その表面自由エネルギー(mN/m)を表1に示す。
実施例1,2および比較例1の各光学フィルムの製造過程における防汚層形成工程でのロールトゥロール搬送性を評価した。具体的には、防汚層形成工程(ワークフィルムは、張力がかけられてロールトゥロール方式で搬送される)において、搬送用ロールの回転速度を設定値の±10%以内に制御できた場合(即ち、ロールの滑りが発生しなかった場合)を“良”と評価し、搬送用ロールの回転速度を設定値の±10%以内に制御できなかった場合(即ち、ロールの滑りが発生した場合)を“不良”と評価した。その結果を表1に示す。
D 厚さ方向
10 透明基材フィルム
11 樹脂フィルム
10a 表面
10b 裏面
12 ハードコート層
13 転写抑制層
21 密着層
22 反射防止層
22a 第1高屈折率層
22b 第1低屈折率層
22c 第2高屈折率層
22d 第2低屈折率層
23 防汚層
23a 表面
Claims (6)
- 透明基材フィルムをロールトゥロール方式で搬送しながら、当該透明基材フィルムの厚さ方向一方面側にドライコーティング法によって防汚層を形成する、防汚層形成工程と、
前記防汚層形成工程の後に、前記防汚層が形成された前記透明基材フィルムとしての防汚層付き光学フィルムを巻取りローラーに巻き取ってロール状にする巻取り工程と、を含み、
前記防汚層形成工程において、前記防汚層はパーフルオロポリエーテル基含有アルコキシシラン化合物から形成され、
前記透明基材フィルムの厚さ方向他方面としての前記透明基材フィルムの裏面の表面自由エネルギーが43mN/m以下であり、
前記ロール状の前記防汚層付き光学フィルムにおいて、前記透明基材フィルムの前記裏面と前記防汚層とが接触する、防汚層付き光学フィルムの製造方法。 - 前記表面自由エネルギーが20mN/m以上である、請求項1に記載の防汚層付き光学フィルムの製造方法。
- 前記防汚層が、6nm以上の厚さを有する、請求項1または2に記載の防汚層付き光学フィルムの製造方法。
- 透明基材フィルムと、
前記透明基材フィルムの厚さ方向一方面側に配置された防汚層であって、パーフルオロポリエーテル基含有アルコキシシラン化合物のドライコーティング膜である防汚層と、を備える防汚層付き光学フィルムであって、
前記透明基材フィルムの厚さ方向他方面としての前記透明基材フィルムの裏面の表面自由エネルギーが43mN/m以下であり、
ロール状の前記防汚層付き光学フィルムでは、前記透明基材フィルムの前記裏面と前記防汚層とが接触する、防汚層付き光学フィルム。 - 前記表面自由エネルギーが20mN/m以上である、請求項4に記載の防汚層付き光学フィルム。
- 前記防汚層が、6nm以上の厚さを有する、請求項4または5に記載の防汚層付き光学フィルム。
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