JP7297136B1 - 露光装置、露光装置の制御方法、情報処理装置、情報処理方法、および物品製造方法 - Google Patents

露光装置、露光装置の制御方法、情報処理装置、情報処理方法、および物品製造方法 Download PDF

Info

Publication number: JP7297136B1
Authority: JP; Japan
Prior art keywords: prediction; exposure; substrate; lots; optical system
Prior art date: 2022-10-13
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

JP2022165019A

Other languages

English (en)

Japanese (ja)

Other versions

JP2024057976A (ja

Inventor

純茂泉

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2022-10-13

Filing date

2022-10-13

Publication date

2023-06-23

2022-10-13 Application filed by Canon Inc filed Critical Canon Inc

2022-10-13 Priority to JP2022165019A priority Critical patent/JP7297136B1/ja

2023-06-23 Application granted granted Critical

2023-06-23 Publication of JP7297136B1 publication Critical patent/JP7297136B1/ja

2023-09-26 Priority to KR1020230128719A priority patent/KR20240051826A/ko

2023-10-10 Priority to US18/483,918 priority patent/US20240126182A1/en

2023-10-13 Priority to CN202311332998.0A priority patent/CN117891137A/zh

2024-04-25 Publication of JP2024057976A publication Critical patent/JP2024057976A/ja

Status Active legal-status Critical Current

2042-10-13 Anticipated expiration legal-status Critical

Links

238000000034 method Methods 0.000 title claims description 38
238000004519 manufacturing process Methods 0.000 title claims description 12
230000010365 information processing Effects 0.000 title claims description 7
238000003672 processing method Methods 0.000 title claims description 4
230000003287 optical effect Effects 0.000 claims abstract description 83
239000000758 substrate Substances 0.000 claims abstract description 74
238000003384 imaging method Methods 0.000 claims abstract description 63
238000005259 measurement Methods 0.000 claims abstract description 57
230000008859 change Effects 0.000 claims abstract description 30
238000005286 illumination Methods 0.000 claims abstract description 26
230000008569 process Effects 0.000 claims description 8
238000010521 absorption reaction Methods 0.000 claims description 6
201000009310 astigmatism Diseases 0.000 claims description 5
238000010586 diagram Methods 0.000 abstract description 5
238000005516 engineering process Methods 0.000 abstract 1
238000012937 correction Methods 0.000 description 8
230000006870 function Effects 0.000 description 8
230000004075 alteration Effects 0.000 description 6
238000009826 distribution Methods 0.000 description 6
CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 5
230000007246 mechanism Effects 0.000 description 5
230000003068 static effect Effects 0.000 description 5
210000001747 pupil Anatomy 0.000 description 4
230000007423 decrease Effects 0.000 description 3
230000000694 effects Effects 0.000 description 3
210000003128 head Anatomy 0.000 description 3
206010073261 Ovarian theca cell tumour Diseases 0.000 description 2
230000008021 deposition Effects 0.000 description 2
230000004907 flux Effects 0.000 description 2
239000011521 glass Substances 0.000 description 2
239000004065 semiconductor Substances 0.000 description 2
208000001644 thecoma Diseases 0.000 description 2
238000002834 transmittance Methods 0.000 description 2
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
206010010071 Coma Diseases 0.000 description 1
238000003491 array Methods 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
238000001816 cooling Methods 0.000 description 1
238000005530 etching Methods 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
239000000463 material Substances 0.000 description 1
238000000691 measurement method Methods 0.000 description 1
239000000203 mixture Substances 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
238000004806 packaging method and process Methods 0.000 description 1
238000003825 pressing Methods 0.000 description 1

Images

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
- G03F7/70504—Optical system modelling, e.g. lens heating models
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706843—Metrology apparatus
- G03F7/706845—Calibration, e.g. tool-to-tool calibration, beam alignment, spot position or focus
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Health & Medical Sciences (AREA)
Manufacturing & Machinery (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Life Sciences & Earth Sciences (AREA)
Atmospheric Sciences (AREA)
Toxicology (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

JP2022165019A 2022-10-13 2022-10-13 露光装置、露光装置の制御方法、情報処理装置、情報処理方法、および物品製造方法 Active JP7297136B1 (ja)

Priority Applications (4)

Application Number	Priority Date	Filing Date	Title
JP2022165019A JP7297136B1 (ja)	2022-10-13	2022-10-13	露光装置、露光装置の制御方法、情報処理装置、情報処理方法、および物品製造方法
KR1020230128719A KR20240051826A (ko)	2022-10-13	2023-09-26	노광장치, 노광장치의 제어방법, 정보 처리장치, 정보 처리방법, 및 물품 제조방법
US18/483,918 US20240126182A1 (en)	2022-10-13	2023-10-10	Exposure apparatus, control method of exposure apparatus, information processing apparatus, information processing method, and article manufacturing method
CN202311332998.0A CN117891137A (zh)	2022-10-13	2023-10-13	装置、装置的控制方法、信息处理装置、信息处理方法、以及物品制造方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2022165019A JP7297136B1 (ja)	2022-10-13	2022-10-13	露光装置、露光装置の制御方法、情報処理装置、情報処理方法、および物品製造方法

Publications (2)

Publication Number	Publication Date
JP7297136B1 true JP7297136B1 (ja)	2023-06-23
JP2024057976A JP2024057976A (ja)	2024-04-25

Family

ID=86850215

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2022165019A Active JP7297136B1 (ja)	2022-10-13	2022-10-13	露光装置、露光装置の制御方法、情報処理装置、情報処理方法、および物品製造方法

Country Status (4)

Country	Link
US (1)	US20240126182A1 (zh)
JP (1)	JP7297136B1 (zh)
KR (1)	KR20240051826A (zh)
CN (1)	CN117891137A (zh)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2018116300A (ja)	2012-03-07	2018-07-26	エーエスエムエルネザーランズビー．ブイ．	リソグラフィ方法および装置
JP2018200390A (ja)	2017-05-26	2018-12-20	キヤノン株式会社	決定方法、露光方法、情報処理装置、プログラム及び物品の製造方法
US20210033979A1 (en)	2018-02-27	2021-02-04	Asml Netherlands B.V.	Measurement Apparatus and Method for Predicting Aberrations in a Projection System

2022
- 2022-10-13 JP JP2022165019A patent/JP7297136B1/ja active Active
2023
- 2023-09-26 KR KR1020230128719A patent/KR20240051826A/ko unknown
- 2023-10-10 US US18/483,918 patent/US20240126182A1/en active Pending
- 2023-10-13 CN CN202311332998.0A patent/CN117891137A/zh active Pending

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2018116300A (ja)	2012-03-07	2018-07-26	エーエスエムエルネザーランズビー．ブイ．	リソグラフィ方法および装置
JP2018200390A (ja)	2017-05-26	2018-12-20	キヤノン株式会社	決定方法、露光方法、情報処理装置、プログラム及び物品の製造方法
US20210033979A1 (en)	2018-02-27	2021-02-04	Asml Netherlands B.V.	Measurement Apparatus and Method for Predicting Aberrations in a Projection System

Also Published As

Publication number	Publication date
CN117891137A (zh)	2024-04-16
KR20240051826A (ko)	2024-04-22
US20240126182A1 (en)	2024-04-18
JP2024057976A (ja)	2024-04-25

Legal Events

Date	Code	Title	Description
2023-04-07	A521	Request for written amendment filed	Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230407
2023-04-07	A621	Written request for application examination	Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230407
2023-04-07	A871	Explanation of circumstances concerning accelerated examination	Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20230407
2023-05-10	TRDD	Decision of grant or rejection written
2023-05-15	A01	Written decision to grant a patent or to grant a registration (utility model)	Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230515
2023-06-15	A61	First payment of annual fees (during grant procedure)	Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230613
2023-06-15	R151	Written notification of patent or utility model registration	Ref document number: 7297136 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151

Publication	Publication Date	Title
TWI694487B (zh)	2020-05-21	製程窗優化器
TWI641959B (zh)	2018-11-21	處理窗識別符
JP6039932B2 (ja)	2016-12-07	露光装置、露光方法及び物品の製造方法
TWI636334B (zh)	2018-09-21	使用圖案化裝置形貌誘導相位之方法及設備
US8237913B2 (en)	2012-08-07	Lithographic apparatus and method
US9348235B2 (en)	2016-05-24	Exposure apparatus and method of manufacturing device
KR20020077815A (ko)	2002-10-14	마스크 오차 인자 보상에 의한 ｄｕｖ 스캐너 선폭 제어
TWI662357B (zh)	2019-06-11	用於增加圖案定位之準確度之方法、非暫時性電腦程式產品及系統
TWI654494B (zh)	2019-03-21	用以調整一微影裝置中之線寬粗糙度之方法
JP2009105097A (ja)	2009-05-14	露光装置及びデバイス製造方法
JP6422307B2 (ja)	2018-11-14	露光方法、露光装置、および物品の製造方法
TW201633003A (zh)	2016-09-16	使用圖案化裝置形貌誘導相位之方法及設備
US9152059B2 (en)	2015-10-06	Exposure apparatus and device fabrication method
US8234600B2 (en)	2012-07-31	Computer readable storage medium storing program for generating reticle data, and method of generating reticle data
JP6554141B2 (ja)	2019-07-31	決定方法、露光方法、情報処理装置、プログラム及び物品の製造方法
US10545413B2 (en)	2020-01-28	Evaluation method, exposure method, and method for manufacturing an article
JP7297136B1 (ja)	2023-06-23	露光装置、露光装置の制御方法、情報処理装置、情報処理方法、および物品製造方法
JP2009259870A (ja)	2009-11-05	露光装置、測定方法、安定化方法及びデバイスの製造方法
JP2007184378A (ja)	2007-07-19	露光装置における露光量および／または焦点合わせのための基板の位置を求める方法および装置
JP7022531B2 (ja)	2022-02-18	露光方法、露光装置、および物品の製造方法
US20240142879A1 (en)	2024-05-02	Exposure method, exposure apparatus, and method for manufacturing article
JP2022185871A (ja)	2022-12-15	露光方法、露光装置、および物品製造方法
JP2024065682A (ja)	2024-05-15	露光方法、露光装置及び物品の製造方法
JP2011009575A (ja)	2011-01-13	露光装置、調整方法及びデバイスの製造方法