JP7274312B2 - 自動光学検査のための光学系 - Google Patents

自動光学検査のための光学系 Download PDF

Info

Publication number
JP7274312B2
JP7274312B2 JP2019045003A JP2019045003A JP7274312B2 JP 7274312 B2 JP7274312 B2 JP 7274312B2 JP 2019045003 A JP2019045003 A JP 2019045003A JP 2019045003 A JP2019045003 A JP 2019045003A JP 7274312 B2 JP7274312 B2 JP 7274312B2
Authority
JP
Japan
Prior art keywords
optical system
inspection
illumination
semi
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2019045003A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019194569A (ja
Inventor
ヨアブ ナチュム
ハーノイ デヴィル
フェルドマン ボリス
ハーヴィッツ タリ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orbotech Ltd
Original Assignee
Orbotech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbotech Ltd filed Critical Orbotech Ltd
Publication of JP2019194569A publication Critical patent/JP2019194569A/ja
Application granted granted Critical
Publication of JP7274312B2 publication Critical patent/JP7274312B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0636—Reflectors
    • G01N2201/0637—Elliptic

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Led Device Packages (AREA)
  • Semiconductor Lasers (AREA)
  • Eye Examination Apparatus (AREA)
JP2019045003A 2018-03-12 2019-03-12 自動光学検査のための光学系 Active JP7274312B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862641454P 2018-03-12 2018-03-12
US62/641,454 2018-03-12

Publications (2)

Publication Number Publication Date
JP2019194569A JP2019194569A (ja) 2019-11-07
JP7274312B2 true JP7274312B2 (ja) 2023-05-16

Family

ID=67913418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019045003A Active JP7274312B2 (ja) 2018-03-12 2019-03-12 自動光学検査のための光学系

Country Status (4)

Country Link
JP (1) JP7274312B2 (ko)
KR (1) KR20200068541A (ko)
CN (1) CN110261387A (ko)
TW (1) TWI817991B (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12010775B2 (en) 2022-02-28 2024-06-11 Guangzhou Haoyang Electronic Co., Ltd. Stage light fixture with optical parameter detection function
CN217763259U (zh) * 2022-02-28 2022-11-08 广州市浩洋电子股份有限公司 一种具有光参数检测功能的舞台灯

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020036750A1 (en) 2000-09-23 2002-03-28 Eberl Heinrich A. System and method for recording the retinal reflex image
JP2002540422A (ja) 1999-03-31 2002-11-26 インフィネオン テクノロジース エスシー３００ ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト 微細構造化表面での角度依存回折効果の高速測定装置
US20070024846A1 (en) 2005-07-06 2007-02-01 Chromasens Gmbh Device for Dark Field Illumination and Method for Optically Scanning of Object
JP2008523392A (ja) 2004-12-09 2008-07-03 ケーエルエー−テンカー テクノロジィース コーポレイション 複数入射角分光散乱計システム
JP2013007589A (ja) 2011-06-23 2013-01-10 Aisin Seiki Co Ltd 欠陥検出装置およびその方法
JP2014153326A (ja) 2013-02-13 2014-08-25 Lasertec Corp 検査装置、及び検査方法
JP2014211322A (ja) 2013-04-17 2014-11-13 花王株式会社 光学特性測定装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5637873A (en) * 1995-06-07 1997-06-10 The Boeing Company Directional reflectometer for measuring optical bidirectional reflectance
JPH10227721A (ja) * 1997-02-18 1998-08-25 Micronics Japan Co Ltd 液晶パネルの検査方法および装置
EP1035408A1 (en) * 1997-11-19 2000-09-13 Otsuka Electronics Co., Ltd. Apparatus for measuring characteristics of optical angle
US6987568B2 (en) * 2000-11-15 2006-01-17 Rutgers, The State University Of New Jersey Apparatus and method for measuring spatially varying bidirectional reflectance distribution function
JP3760234B2 (ja) * 2003-02-27 2006-03-29 独立行政法人産業技術総合研究所 双楕円柱面鏡を用いた対称ｘ型光学系
CN101718714B (zh) * 2009-11-25 2012-07-11 东旭集团有限公司 一种检测平板玻璃表面缺陷的***及方法
KR101832526B1 (ko) * 2010-08-05 2018-04-13 오르보테크 엘티디. 조명 시스템

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002540422A (ja) 1999-03-31 2002-11-26 インフィネオン テクノロジース エスシー３００ ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト 微細構造化表面での角度依存回折効果の高速測定装置
US20020036750A1 (en) 2000-09-23 2002-03-28 Eberl Heinrich A. System and method for recording the retinal reflex image
JP2008523392A (ja) 2004-12-09 2008-07-03 ケーエルエー−テンカー テクノロジィース コーポレイション 複数入射角分光散乱計システム
US20070024846A1 (en) 2005-07-06 2007-02-01 Chromasens Gmbh Device for Dark Field Illumination and Method for Optically Scanning of Object
JP2013007589A (ja) 2011-06-23 2013-01-10 Aisin Seiki Co Ltd 欠陥検出装置およびその方法
JP2014153326A (ja) 2013-02-13 2014-08-25 Lasertec Corp 検査装置、及び検査方法
JP2014211322A (ja) 2013-04-17 2014-11-13 花王株式会社 光学特性測定装置

Also Published As

Publication number Publication date
TWI817991B (zh) 2023-10-11
CN110261387A (zh) 2019-09-20
TW201939021A (zh) 2019-10-01
JP2019194569A (ja) 2019-11-07
KR20200068541A (ko) 2020-06-15

Similar Documents

Publication Publication Date Title
US6222624B1 (en) Defect inspecting apparatus and method
US8416402B2 (en) Method and apparatus for inspecting defects
US7355691B2 (en) Defect inspection apparatus and defect inspection method
US7714996B2 (en) Automatic inspection system for flat panel substrate
EP0935747B1 (en) Automated inspection system with bright field and dark field illumination
US8817249B2 (en) Device and method for inspecting moving semiconductor wafers
US8228496B2 (en) Defect inspection method and defect inspection apparatus
TWI404926B (zh) Surface defect inspection device and surface defect inspection method
US20110141272A1 (en) Apparatus and method for inspecting an object surface defect
JP4831607B2 (ja) パターン欠陥検査方法及びフォトマスクの製造方法
US20060158643A1 (en) Method and system of inspecting mura-defect and method of fabricating photomask
CN110073203B (zh) 检查透明基材上的缺陷的方法和设备
JP7274312B2 (ja) 自動光学検査のための光学系
JP2013235202A (ja) ハイブリッドレーザ走査装置
KR101320183B1 (ko) 패턴 결함 검사 방법, 패턴 결함 검사 장치, 포토마스크의 제조 방법, 및 표시 디바이스용 기판의 제조 방법
JP7208233B2 (ja) ガラスシートの表面欠陥の検出方法および装置
JP4736629B2 (ja) 表面欠陥検査装置
JP2007279047A (ja) 光学検査システム
JP3078784B2 (ja) 欠陥検査装置
JP2001289794A (ja) 欠陥検査装置
JP2005233695A (ja) 透明板欠陥検査装置
JP2000028535A (ja) 欠陥検査装置
JP2006208281A (ja) 周期性パターンムラ検査装置および周期性パターン撮像方法
US20240044741A1 (en) Photomask inspection apparatus and method of inspecting photomask using the same
CN111007077A (zh) 超薄板透明基板上表面异物检测装置

Legal Events

Date Code Title Description
RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20201001

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20201015

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220221

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20221221

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230110

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230310

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20230404

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20230501

R150 Certificate of patent or registration of utility model

Ref document number: 7274312

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150