JP7227048B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7227048B2 JP7227048B2 JP2019056904A JP2019056904A JP7227048B2 JP 7227048 B2 JP7227048 B2 JP 7227048B2 JP 2019056904 A JP2019056904 A JP 2019056904A JP 2019056904 A JP2019056904 A JP 2019056904A JP 7227048 B2 JP7227048 B2 JP 7227048B2
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- 239000004065 semiconductor Substances 0.000 title claims description 25
- 239000000758 substrate Substances 0.000 claims description 7
- 239000012212 insulator Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 230000004048 modification Effects 0.000 description 14
- 238000012986 modification Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 10
- 230000005684 electric field Effects 0.000 description 7
- 230000015556 catabolic process Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000003071 parasitic effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Junction Field-Effect Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Description
図8(a)は、変形例1に係る半導体装置100Aの断面図であり、図8(b)は、電界の強度分布を示す図であり、図8(c)は、プレーナ型トランジスタ20Aの平面図である。
図9は、変形例2に係るプレーナ型トランジスタ20Bの平面図である。このプレーナ型トランジスタ20Bは、マルチフィンガー構造を有しており、フィンガー(ゲート電極とソース電極のペア)ごとに、フィールドプレートが設けられる。
実施の形態では、プレーナ型トランジスタ20がHEMTである場合を説明したがその限りでなく、Si-FET(Field Effect Transistor)であってもよいし、SiC-FETであってもよく、半導体材料やデバイス構造は限定されない。
22 ゲート電極
24 ソース電極
26 ドレイン電極
28,28A,28B フィールドプレート
30 接続配線
32 アクティブ領域
50 インバータ回路
52 トランジスタ
54 抵抗
60 ドライバ
100 半導体装置
102 エピタキシャル基板
Claims (7)
- プレーナ型トランジスタを備える半導体装置であって、
前記プレーナ型トランジスタは、ソース電極、ゲート電極、ドレイン電極および複数のフィールドプレートを有し、前記ソース電極と前記複数のフィールドプレートとが、前記プレーナ型トランジスタのアクティブ領域の外で接続され、
前記複数のフィールドプレートは異なる高さに設けられており、
前記複数のフィールドプレートおよび前記ソース電極は第1方向に伸びており、
前記複数のフィールドプレートを前記ソース電極と接続する複数の接続配線は、前記アクティブ領域の外において前記第1方向と垂直な第2方向に伸びる部分を含んでおり、前記第2方向に伸びる部分がオーバーラップして形成されることを特徴とする半導体装置。 - 前記フィールドプレートの高さは、前記ゲート電極の高さより高いことを特徴とする請求項1に記載の半導体装置。
- 前記フィールドプレートの高さは、前記ゲート電極から遠ざかるに従い高いことを特徴とする請求項1に記載の半導体装置。
- 前記プレーナ型トランジスタは、マルチフィンガー構造を有することを特徴とする請求項1から3のいずれかに記載の半導体装置。
- 前記プレーナ型トランジスタは、GaN-HEMT(High Electron Mobility Transistor)、GaAs-HEMT、Si-FET、SiC-FETのいずれかであることを特徴とする請求項1から4のいずれかに記載の半導体装置。
- 前記ゲート電極とエピタキシャル基板との間に絶縁膜が形成されるMIS(Metal Insulator Semiconductor)構造を有することを特徴とする請求項1から5のいずれかに記載の半導体装置。
- 前記ゲート電極とエピタキシャル基板が接触するショットキー構造を有することを特徴とする請求項1から6のいずれかに記載の半導体装置。
Priority Applications (3)
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JP2019056904A JP7227048B2 (ja) | 2019-03-25 | 2019-03-25 | 半導体装置 |
TW108146311A TWI737084B (zh) | 2019-03-25 | 2019-12-18 | 半導體裝置 |
US16/742,062 US20200312968A1 (en) | 2019-03-25 | 2020-01-14 | Semiconductor apparatus |
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JP2019056904A JP7227048B2 (ja) | 2019-03-25 | 2019-03-25 | 半導体装置 |
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JP2020161553A JP2020161553A (ja) | 2020-10-01 |
JP7227048B2 true JP7227048B2 (ja) | 2023-02-21 |
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JP2019056904A Active JP7227048B2 (ja) | 2019-03-25 | 2019-03-25 | 半導体装置 |
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US (1) | US20200312968A1 (ja) |
JP (1) | JP7227048B2 (ja) |
TW (1) | TWI737084B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US11769807B2 (en) * | 2020-08-03 | 2023-09-26 | Semiconductor Components Industries, Llc | Lateral transistor with extended source finger contact |
US11749726B2 (en) * | 2020-10-27 | 2023-09-05 | Wolfspeed, Inc. | Field effect transistor with source-connected field plate |
US11658234B2 (en) | 2020-10-27 | 2023-05-23 | Wolfspeed, Inc. | Field effect transistor with enhanced reliability |
CN118173584A (zh) * | 2022-12-09 | 2024-06-11 | 苏州能讯高能半导体有限公司 | 一种半导体器件及其制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007537593A (ja) | 2004-05-11 | 2007-12-20 | クリー インコーポレイテッド | ソース接続フィールドプレートを備えるワイドバンドギャップhemt |
JP2008277604A (ja) | 2007-05-01 | 2008-11-13 | Oki Electric Ind Co Ltd | 電界効果トランジスタ |
JP2012028423A (ja) | 2010-07-20 | 2012-02-09 | Sumitomo Electric Device Innovations Inc | 半導体装置 |
JP2017123432A (ja) | 2016-01-08 | 2017-07-13 | 株式会社東芝 | 半導体装置 |
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US10700188B2 (en) * | 2017-11-02 | 2020-06-30 | Rohm Co., Ltd. | Group III nitride semiconductor device with first and second conductive layers |
JP7095982B2 (ja) * | 2017-12-07 | 2022-07-05 | 住友電工デバイス・イノベーション株式会社 | 半導体装置 |
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2019
- 2019-03-25 JP JP2019056904A patent/JP7227048B2/ja active Active
- 2019-12-18 TW TW108146311A patent/TWI737084B/zh active
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2020
- 2020-01-14 US US16/742,062 patent/US20200312968A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007537593A (ja) | 2004-05-11 | 2007-12-20 | クリー インコーポレイテッド | ソース接続フィールドプレートを備えるワイドバンドギャップhemt |
JP2008277604A (ja) | 2007-05-01 | 2008-11-13 | Oki Electric Ind Co Ltd | 電界効果トランジスタ |
JP2012028423A (ja) | 2010-07-20 | 2012-02-09 | Sumitomo Electric Device Innovations Inc | 半導体装置 |
JP2017123432A (ja) | 2016-01-08 | 2017-07-13 | 株式会社東芝 | 半導体装置 |
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TW202101600A (zh) | 2021-01-01 |
TWI737084B (zh) | 2021-08-21 |
JP2020161553A (ja) | 2020-10-01 |
US20200312968A1 (en) | 2020-10-01 |
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