JP7216537B2 - 加熱炉 - Google Patents
加熱炉 Download PDFInfo
- Publication number
- JP7216537B2 JP7216537B2 JP2018233819A JP2018233819A JP7216537B2 JP 7216537 B2 JP7216537 B2 JP 7216537B2 JP 2018233819 A JP2018233819 A JP 2018233819A JP 2018233819 A JP2018233819 A JP 2018233819A JP 7216537 B2 JP7216537 B2 JP 7216537B2
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- JP
- Japan
- Prior art keywords
- heating furnace
- storage chamber
- heated
- gas
- main body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
- F27B5/18—Arrangement of controlling, monitoring, alarm or like devices
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/02—Annealing glass products in a discontinuous way
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/02—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated of multiple-chamber type
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/04—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
- F27B5/13—Arrangement of devices for discharging
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
- F27B5/14—Arrangements of heating devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
- F27B5/16—Arrangements of air or gas supply devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/02—Supplying steam, vapour, gases, or liquids
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
- F27B5/16—Arrangements of air or gas supply devices
- F27B2005/161—Gas inflow or outflow
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27M—INDEXING SCHEME RELATING TO ASPECTS OF THE CHARGES OR FURNACES, KILNS, OVENS OR RETORTS
- F27M2003/00—Type of treatment of the charge
- F27M2003/01—Annealing
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Furnace Details (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Description
以下、本発明の実施の形態1に係る加熱炉1について、図1~図3を参照しながら説明する。加熱炉1は、プレス成形された光学素子(レンズ)をアニール処理(加熱処理)するためのものである。加熱炉1は、炉内に熱源が配置された内熱式の加熱炉であり、図1に示すように、加熱炉本体11と、断熱蓋12と、気体供給源21と、管路22と、を備えている。
以下、本発明の実施の形態2に係る加熱炉1Aについて、図4を参照しながら説明する。加熱炉1Aは、炉外に熱源が配置された外熱式の加熱炉であり、同図に示すように、真空チャンバ41Aと、真空チャンバ扉42Aと、気体供給源21と、管路22Aと、を備えている。
11 加熱炉本体
111 収容室
112 ヒータ(熱源)
113 排出口
12 断熱蓋
21 気体供給源
22,22A 管路
221,221A 管路本体
222,222A 吐出口
31 パレット
32 保持台
41,41A 真空チャンバ
42,42A 真空チャンバ扉
43 ロータリーポンプ
44 酸素濃度計
45 ヒータ(熱源)
46 冷却部
47 パッキン
51 加熱炉本体
511 収容室
512 ヒータ(熱源)
513 流入口
52 断熱蓋
O 光学素子(被加熱物)
Claims (4)
- 被加熱物を収容可能な収容室を備える加熱炉本体と、
前記収容室内を、前記被加熱物をアニール処理するために設定された徐冷点まで加熱可能な熱源と、
前記加熱炉本体の外部に配置された気体供給源と、
前記収容室内に配置され、前記熱源によって加熱される管路本体であって、前記気体供給源から供給された気体を保持し、当該気体を前記徐冷点まで加熱する管路本体と、前記管路本体の端部に形成され、前記収容室内で開口する吐出口であって、前記徐冷点まで加熱された気体を前記収容室内に吐出する吐出口と、を有する管路と、
を備える加熱炉。 - 前記管路本体は、前記収容室内において、前記熱源に対向する領域内に配置されている請求項1に記載の加熱炉。
- 前記管路本体は、螺旋状に形成されており、
前記被加熱物は、前記管路本体の内部に配置される、
請求項1または請求項2に記載の加熱炉。 - 前記吐出口は、前記収容室の中間高さ位置において開口している請求項1から請求項3のいずれか一項に記載の加熱炉。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018233819A JP7216537B2 (ja) | 2018-12-13 | 2018-12-13 | 加熱炉 |
PCT/JP2019/045890 WO2020121789A1 (ja) | 2018-12-13 | 2019-11-22 | 加熱炉 |
CN201980080724.2A CN113165939A (zh) | 2018-12-13 | 2019-11-22 | 加热炉 |
US17/340,321 US20210318066A1 (en) | 2018-12-13 | 2021-06-07 | Heating furnace |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018233819A JP7216537B2 (ja) | 2018-12-13 | 2018-12-13 | 加熱炉 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020094765A JP2020094765A (ja) | 2020-06-18 |
JP7216537B2 true JP7216537B2 (ja) | 2023-02-01 |
Family
ID=71076398
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018233819A Active JP7216537B2 (ja) | 2018-12-13 | 2018-12-13 | 加熱炉 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20210318066A1 (ja) |
JP (1) | JP7216537B2 (ja) |
CN (1) | CN113165939A (ja) |
WO (1) | WO2020121789A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6778880B1 (ja) | 2020-06-29 | 2020-11-04 | 千住金属工業株式会社 | はんだ付け装置及びパッキンの異常の検知方法 |
CN113233748A (zh) * | 2021-06-25 | 2021-08-10 | 成都光明光电有限责任公司 | 掺钕磷酸盐激光玻璃的退火方法及玻璃退火炉 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002299273A (ja) | 2001-04-04 | 2002-10-11 | Sharp Corp | 半導体基板用熱処理装置 |
JP2007263480A (ja) | 2006-03-29 | 2007-10-11 | Mitsubishi Materials Techno Corp | マッフル炉 |
JP2010265124A (ja) | 2009-05-12 | 2010-11-25 | Olympus Corp | ガラス光学部材の熱処理方法およびガラス光学素子の製造方法 |
WO2014203733A1 (ja) | 2013-06-20 | 2014-12-24 | 株式会社村田製作所 | ガス供給管および熱処理装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0468522A (ja) * | 1990-07-10 | 1992-03-04 | Tokyo Electron Sagami Ltd | 縦型熱処理装置 |
US5279670A (en) * | 1990-03-31 | 1994-01-18 | Tokyo Electron Sagami Limited | Vertical type diffusion apparatus |
US5146869A (en) * | 1990-06-11 | 1992-09-15 | National Semiconductor Corporation | Tube and injector for preheating gases in a chemical vapor deposition reactor |
TW239164B (ja) * | 1992-08-12 | 1995-01-21 | Tokyo Electron Co Ltd | |
JP3073627B2 (ja) * | 1993-06-14 | 2000-08-07 | 東京エレクトロン株式会社 | 熱処理装置 |
US5948300A (en) * | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating |
US6407367B1 (en) * | 1997-12-26 | 2002-06-18 | Canon Kabushiki Kaisha | Heat treatment apparatus, heat treatment process employing the same, and process for producing semiconductor article |
JP3897276B2 (ja) * | 2000-12-28 | 2007-03-22 | 國夫 鶴巻 | 過熱水蒸気処理炉 |
KR100481008B1 (ko) * | 2002-06-03 | 2005-04-07 | 주성엔지니어링(주) | 화학기상증착공정용 기체 가열장치 및 이를 이용한반도체소자 제조방법 |
JP6480275B2 (ja) * | 2015-06-23 | 2019-03-06 | 株式会社モトヤマ | 電気炉 |
CN107324644A (zh) * | 2017-06-27 | 2017-11-07 | 信利(惠州)智能显示有限公司 | 玻璃加工设备以及玻璃的加工方法 |
-
2018
- 2018-12-13 JP JP2018233819A patent/JP7216537B2/ja active Active
-
2019
- 2019-11-22 CN CN201980080724.2A patent/CN113165939A/zh active Pending
- 2019-11-22 WO PCT/JP2019/045890 patent/WO2020121789A1/ja active Application Filing
-
2021
- 2021-06-07 US US17/340,321 patent/US20210318066A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002299273A (ja) | 2001-04-04 | 2002-10-11 | Sharp Corp | 半導体基板用熱処理装置 |
JP2007263480A (ja) | 2006-03-29 | 2007-10-11 | Mitsubishi Materials Techno Corp | マッフル炉 |
JP2010265124A (ja) | 2009-05-12 | 2010-11-25 | Olympus Corp | ガラス光学部材の熱処理方法およびガラス光学素子の製造方法 |
WO2014203733A1 (ja) | 2013-06-20 | 2014-12-24 | 株式会社村田製作所 | ガス供給管および熱処理装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2020094765A (ja) | 2020-06-18 |
CN113165939A (zh) | 2021-07-23 |
US20210318066A1 (en) | 2021-10-14 |
WO2020121789A1 (ja) | 2020-06-18 |
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